CN107278011A - rectangular waveguide microwave and plasma interaction device - Google Patents
rectangular waveguide microwave and plasma interaction device Download PDFInfo
- Publication number
- CN107278011A CN107278011A CN201610210808.1A CN201610210808A CN107278011A CN 107278011 A CN107278011 A CN 107278011A CN 201610210808 A CN201610210808 A CN 201610210808A CN 107278011 A CN107278011 A CN 107278011A
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- Prior art keywords
- microwave
- plasma
- rectangular waveguide
- waveguide
- source
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Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
- H05H1/4622—Microwave discharges using waveguides
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
A kind of rectangular waveguide microwave and Plasma Interaction device.Microwave source is insulated attenuator, directional coupler by ferrite, is connected at vacuum sealing microwave window with rectangular waveguide, for producing microwave, and by microwave transmission to the waveguide zone of action.Ferrite insulation attenuator is arranged at after microwave source, before directional coupler, the frequency for adjusting output microwave.It is connected on the left of rectangular waveguide with microwave generating apparatus, carrier load is is inhaled in right side, so as to control microwave to be propagated along waveguide.Rectangular waveguide side is connected by metal grill with plasma generating device, including tof tube, the plasma generator on tof tube top and vacuum pumping source.Opposite side is then connected by barrier film with plasma probe group.The process that the present apparatus can be such that the microwave of frequency-adjustable envisions with plasma according to experimenter interacts, and detects after interaction generation, the parameter of plasma and microwave.
Description
Technical field
The present invention relates to can realize microwave to interact under certain condition in rectangular waveguide with plasma, and detect that interaction is micro- after occurring
The experimental provision of ripple and plasma parameter, belongs to electromagnetic field field.
Background technology
Plasma is a kind of by the physical form of free electron and charged ion for main component, if to gas continuous heating, being decomposed into molecule
Atom is simultaneously ionized, and is formed " gas " being made up of ion, electronics and neutral particle, and this state is referred to as plasma.In addition to heating,
Also the method that having other method can produce in plasma, the present apparatus for producing plasma is to use spark form plasma source.
Microwave refers to radio frequency electromagnetic of the wavelength between infrared ray and superfrequency.Experiment institute is directly produced in the present apparatus by high-power microwave source
The microwave needed.
When plasma and microwave interact, one side plasma has the ability of certain absorption and reflection to microwave, another aspect,
Microwave also can plasma occur heating etc. effect.But, the intensity and efficiency of these interactions, and whether there are other to react, I
Be inadequate to this understanding, it is therefore desirable to one can make the device that both meet and interacted, so that therefrom observation experiment result,
And the characteristic of both summary and inductions interaction.The device needs to have following characteristics：
1st, because in plasma, material exists in the form of electronics and ion, therefore environment is needed inside vacuum, i.e. device to a certain extent
Air pressure should be sufficiently low；
2nd, because microwave wavelength is longer, to reduce power loss as far as possible, waveguide should be used, and microwave is propagated wherein；
3rd, there should be detection probe to obtain required experimental data；
4th, the frequency and power of microwave can should be adjusted；
5th, reacted microwave and plasma can should be handled.
Accordingly, it would be desirable to which a device for meeting above-mentioned condition simultaneously, to provide the environment of plasma and microwave, promotes what both envisioned
Interaction, and test experience data.
The content of the invention
The present invention is one and interacted to provide the process that the microwave of frequency-adjustable can be made to envision with plasma according to experimenter, and detects phase
After interaction occurs, the device of the parameter of plasma and microwave.
Rectangular waveguide microwave of the present invention and Plasma Interaction device, it includes microwave source (1), and ferrite insulation attenuator (2) is fixed
To coupler (3), vacuum sealing microwave window (4), rectangular waveguide (5), metal grill (6), tof tube (7), plasma generator (8),
Vacuum pumping source (9), multiple-grid plasma probe (10), barrier film (11) inhales carrier load (12), multi-electrode high pressure plasma probe groups (13).
Multi-electrode high pressure plasma probe groups (13) include again：Shield microwave concussion probe (15), microwave in plasma probe (14), plasma
Antenna (16).
Microwave source (1) is by ferrite insulation attenuator (2), directional coupler (3), in vacuum sealing microwave window (4) place and rectangular waveguide
(5) it is connected, for producing microwave, and by microwave transmission to the waveguide zone of action.Ferrite insulation attenuator (2) is arranged at microwave source (1)
Afterwards, before directional coupler (3), the frequency for adjusting output microwave.It is connected on the left of rectangular waveguide (5) with microwave generating apparatus, right side is
Carrier load (12) is inhaled, so as to control microwave to be propagated along waveguide.Rectangular waveguide (5) side is produced by metal grill (6) and plasma
Device is connected, including tof tube (7), the plasma generator (8) and vacuum pumping source (9) on tof tube top.Opposite side then passes through barrier film (11)
It is connected with plasma probe group.
The cross section of the rectangular waveguide (5) is 120*60mm, and its length is 1300mm.
It is 10 that the plasma generator (8), which can produce density,10~1011cm-3Plasma.
System vacuum can be extracted into 10 by the pumping source-4pa。
Advantages of the present invention：In the present invention, ferrite insulation attenuator can adjust the frequency and intensity into the microwave of waveguide, spark-type plasma
Transmitter can adjust plasma density by way of adjusting voltage, and the major parameter of whole experiment process can be controlled, it is adaptable to which observation is each
Plant the interaction process of the microwave and plasma under different primary condition.
Apparatus of the present invention are relatively simple for structure, and the most equipment to have gone into operation of the equipment used, produce more convenient.
Brief description of the drawings
Fig. 1 is the structural representation that rectangular waveguide microwave of the present invention is cut vertically with Plasma Interaction device.
Embodiment
Embodiment one：Illustrate present embodiment, rectangular waveguide microwave of the present invention and Plasma Interaction device with reference to Fig. 1,
It include microwave source (1), ferrite insulation attenuator (2), directional coupler (3), vacuum sealing microwave window (4), rectangular waveguide (5),
Metal grill (6), tof tube (7), plasma generator (8), vacuum pumping source (9), multiple-grid plasma probe (10), barrier film (11),
Inhale carrier load (12), multi-electrode high pressure plasma probe groups (13).
Multi-electrode high pressure plasma probe groups (13) include again：Shield microwave concussion probe (15), microwave in plasma probe (14), plasma
Antenna (16).
Microwave source (1) is by ferrite insulation attenuator (2), directional coupler (3), in vacuum sealing microwave window (4) place and rectangular waveguide
(5) it is connected, for producing microwave, and by microwave transmission to the waveguide zone of action.Ferrite insulation attenuator (2) is arranged at microwave source (1)
Afterwards, before directional coupler (3), the frequency for adjusting output microwave.It is connected on the left of rectangular waveguide (5) with microwave generating apparatus, right side is
Carrier load (12) is inhaled, so as to control microwave to be propagated along waveguide.Rectangular waveguide (5) side is produced by metal grill (6) and plasma
Device is connected, including tof tube (7), the plasma generator (8) and vacuum pumping source (9) on tof tube top.Opposite side then passes through barrier film (11)
It is connected with plasma probe group.
Present embodiment in use, first turns on pumping source (9), and environment in waveguide is evacuated to the vacuum for meeting and requiring.Using power supply to fire
The particle emitters such as flower pattern (8) are powered, and wait particle emitter (8) to project plasma into tof tube (7), and its density is determined by supply voltage
It is fixed.Then the microwave needed for being produced using microwave source (1), and its frequency is adjusted by ferrite insulation attenuator (2), it is allowed to meet experiment institute
Need, enter the zone of action by sealing microwave window (4).Plasma interacts with microwave in rectangular waveguide (5), finally by
The probe groups being placed on rectangular waveguide (5) obtain experimental data.
The rectangular waveguide microwave is axially symmetric structure with Plasma Interaction device, and the microwave that microwave source (1) is produced declines through ferrite insulation
Subtract device (2) to interact with plasma into rectangular waveguide (5) by vacuum sealing microwave window (4) conduction, finally born in suction ripple
(12) are carried to be absorbed.
Embodiment two：Present embodiment is further illustrating to embodiment one, the horizontal stroke of rectangular waveguide described in present embodiment (5)
Section is 120*60mm, and its length is 1300mm.
Claims (3)
1. a kind of rectangular waveguide microwave and Plasma Interaction device, it includes microwave source (1), ferrite insulation attenuator (2), orientation
Coupler (3), vacuum sealing microwave window (4), rectangular waveguide (5), metal grill (6), tof tube (7), plasma generator (8),
Vacuum pumping source (9), multiple-grid plasma probe (10), barrier film (11) inhales carrier load (12), multi-electrode high pressure plasma probe groups (13).
Multi-electrode high pressure plasma probe groups (13) include again：Shield microwave concussion probe (15), microwave antenna in plasma probe (14), plasma
(16)。
Microwave source (1) is by ferrite insulation attenuator (2), directional coupler (3), in vacuum sealing microwave window (4) place and rectangular waveguide
(5) it is connected, for producing microwave, and by microwave transmission to the waveguide zone of action.Ferrite insulation attenuator (2) is arranged at microwave source (1)
Afterwards, before directional coupler (3), the frequency for adjusting output microwave.It is connected on the left of rectangular waveguide (5) with microwave generating apparatus, right side is
Carrier load (12) is inhaled, so as to control microwave to be propagated along waveguide.Rectangular waveguide (5) side is produced by metal grill (6) and plasma
Device is connected, including tof tube (7), the plasma generator (8) and vacuum pumping source (9) on tof tube top.Opposite side then passes through barrier film (11)
It is connected with plasma probe group.
2. rectangular waveguide microwave according to claim 1 and Plasma Interaction device, it is characterised in that the device is axial symmetry knot
Structure.
3. rectangular waveguide microwave according to claim 1 and Plasma Interaction device, it is characterised in that the device rectangular waveguide
(5) cross section is 120*60mm, and its length is 1300mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610210808.1A CN107278011A (en) | 2016-04-07 | 2016-04-07 | rectangular waveguide microwave and plasma interaction device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610210808.1A CN107278011A (en) | 2016-04-07 | 2016-04-07 | rectangular waveguide microwave and plasma interaction device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107278011A true CN107278011A (en) | 2017-10-20 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610210808.1A Pending CN107278011A (en) | 2016-04-07 | 2016-04-07 | rectangular waveguide microwave and plasma interaction device |
Country Status (1)
| Country | Link |
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| CN (1) | CN107278011A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108091412A (en) * | 2017-12-28 | 2018-05-29 | 中国科学院近代物理研究所 | Proton source |
| CN112235930A (en) * | 2020-10-10 | 2021-01-15 | 哈尔滨工业大学 | Measuring device for interaction of glow discharge plasma and microwave waveguide |
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| CN103968882A (en) * | 2014-05-22 | 2014-08-06 | 哈尔滨工业大学 | Test device for mutual action of microwaves and flux-weakening plasma |
| CN103974516A (en) * | 2014-05-22 | 2014-08-06 | 哈尔滨工业大学 | Microwave and plasma interacting device in magnetic plasma under condition that magnetic field and electric field are perpendicular |
| CN103983861A (en) * | 2014-05-22 | 2014-08-13 | 哈尔滨工业大学 | Microwave and plasma interaction device |
| US20140287162A1 (en) * | 2007-01-18 | 2014-09-25 | Amastan Llc | Microwave plasma apparatus and method for materials processing |
| CN104507249A (en) * | 2014-12-09 | 2015-04-08 | 吉林大学 | Rectangular waveguide microwave plasma source generating device |
| KR101579139B1 (en) * | 2014-12-11 | 2015-12-21 | (주)그린사이언스 | Plasma Torch Having WaveGuide Having Providing Part of Swirl Current Removal Gas |
-
2016
- 2016-04-07 CN CN201610210808.1A patent/CN107278011A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20140287162A1 (en) * | 2007-01-18 | 2014-09-25 | Amastan Llc | Microwave plasma apparatus and method for materials processing |
| CN103968882A (en) * | 2014-05-22 | 2014-08-06 | 哈尔滨工业大学 | Test device for mutual action of microwaves and flux-weakening plasma |
| CN103974516A (en) * | 2014-05-22 | 2014-08-06 | 哈尔滨工业大学 | Microwave and plasma interacting device in magnetic plasma under condition that magnetic field and electric field are perpendicular |
| CN103983861A (en) * | 2014-05-22 | 2014-08-13 | 哈尔滨工业大学 | Microwave and plasma interaction device |
| CN104507249A (en) * | 2014-12-09 | 2015-04-08 | 吉林大学 | Rectangular waveguide microwave plasma source generating device |
| KR101579139B1 (en) * | 2014-12-11 | 2015-12-21 | (주)그린사이언스 | Plasma Torch Having WaveGuide Having Providing Part of Swirl Current Removal Gas |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108091412A (en) * | 2017-12-28 | 2018-05-29 | 中国科学院近代物理研究所 | Proton source |
| CN112235930A (en) * | 2020-10-10 | 2021-01-15 | 哈尔滨工业大学 | Measuring device for interaction of glow discharge plasma and microwave waveguide |
| CN112235930B (en) * | 2020-10-10 | 2022-09-23 | 哈尔滨工业大学 | Measuring device for interaction of glow discharge plasma and microwave waveguide |
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| CB03 | Change of inventor or designer information | ||
| CB03 | Change of inventor or designer information |
Inventor after: Zhao Hailong Inventor after: Chen Yingcai Inventor after: Lin Zhongying Inventor before: Lin Zhongying Inventor before: Zhao Hailong Inventor before: Zhang Yan Inventor before: Fu Guangjie Inventor before: Lin Yuqing Inventor before: Peng Weisong |
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| TA01 | Transfer of patent application right |
Effective date of registration: 20180205 Address after: No. 605, Dayang street, Dongfang Road, Linghai City, Taizhou City, Zhejiang Province, Zhejiang Applicant after: Taizhou University Address before: 150040 Xiangfang District, Heilongjiang, and Hing Road, No. 26, Harbin Applicant before: Northeast Forestry University Applicant before: Lin Zhongying |
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| RJ01 | Rejection of invention patent application after publication | ||
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Application publication date: 20171020 |