CN107255907A - A kind of compensation device, exposure device and exposure compensation - Google Patents
A kind of compensation device, exposure device and exposure compensation Download PDFInfo
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- CN107255907A CN107255907A CN201710707431.5A CN201710707431A CN107255907A CN 107255907 A CN107255907 A CN 107255907A CN 201710707431 A CN201710707431 A CN 201710707431A CN 107255907 A CN107255907 A CN 107255907A
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- compensation
- solution box
- exposure
- film layer
- colored solutions
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
Abstract
The invention provides a kind of compensation device, exposure device and exposure compensation.Wherein, the exposure device that the present invention is provided, can be by the compensation device between exposure machine base station and exposure machine light-emitting window, and the colored solutions for adjusting out various concentrations are blocked to the light of exposure machine outgoing.The thinner position of thickness in pending film layer, the concentration of colored solutions is higher at projected position, so as to which the photosensitive depth for treating processing film layer carries out quantitative compensation, to realize the matching of light exposure and pending film layer thickness so that form the physical dimension of precision after exposure on substrate.
Description
Technical field
The present invention relates to technical field of lithography, more particularly to a kind of compensation device, exposure device and exposure compensation.
Background technology
TFT-LCD flat-panel monitors, with its excellent performance, be easy to large-scale production characteristic, become current main flow
Display device.With developing rapidly for TFT-LCD production technologies, the requirement for producing precision is also constantly being lifted.
Photoetching technique in TFT-LCD preparation process is the Main Means to form specific pattern, is also influence production precision
Important technology.Photoetching needs the cooperation of photoresist (photoresistance) material, but the equipment of prior art will for the precision of gluing
Ask relatively low, it is necessary to reach the homogeneity of photoresist by the technique of follow-up whirl coating.In process of production, automatic double surface gluer
Rubberization thickness is not homogeneous enough, and this phenomenon may result under same film speed so that diverse location critical size is present
Larger difference.The difference has had a strong impact on the homogeneity of product size.Especially for high-resolution products, crucial portion will be caused
The size of position produces fluctuation, and serious reduction product becomes more meticulous degree.
The content of the invention
The technical problem to be solved in the present invention is to provide a kind of compensation device, exposure device and exposure compensation, to solve
Certainly pending film layer thickness heterogeneity cause product size become more meticulous degree it is low the problem of.
On the one hand there is provided a kind of compensation device, applied to exposure machine, the compensation device includes solution box；
Colored solutions are marked with the solution box, wherein, the colored solutions are used to adjust the saturating of exposure machine emergent ray
Rate is crossed, quantitative compensation is carried out with the photosensitive depth for treating processing film layer.
Further, the compensation device also includes resin outer box, and the resin outer box include at least one groove position, each groove
Position is respectively used to the accommodating solution box for being marked with the colored solutions.
Further, the concentration of colored solutions is pre-configured with the solution box in each groove position, wherein, Mei Yirong
The concentration of colored solutions in liquid box is homogeneous；The concentration of colored solutions is respectively by projected position in solution box in each groove position
The photosensitive depth compensation amount for locating the pending film layer is determined.
Further, the side external surface of solution box one is provided with least two contact electrodes, the periphery of the solution box
Provided with being matched with the contact electrode to electrode, the contact electrode and it is described to electrode with it is coloured in the solution box
Solution is connected, wherein, chromogenic ion is included in the colored solutions；The compensation device also includes：Brush；The one of the brush
End can be electrically connected with the contact electrode；When carrying out quantitative compensation, the brush moves to targeted contact electrode, the compensation dress
The voltage being applied on the brush by adjusting is put to control at the targeted contact electrode and the solution box peripheral position
To the voltage difference between electrode, change the distribution of chromogenic ion in the colored solutions, to adjust at the targeted contact electrode
The concentration of colored solutions.
Further, the contact electrode is made of clear material；Multiple contact electrodes are in the solution box side
It is in matrix distribution on outer surface.
On the other hand, a kind of exposure device is additionally provided, including：Exposure machine base station and exposure machine light-emitting window, and it is above-mentioned
Compensation device；
When being exposed using the exposure device, the compensation device is located at the exposure machine base station and the exposure
Between machine light-emitting window, the photosensitive depth of the pending film layer for being pointed to below the solution box carries out quantitative compensation.
On the other hand, a kind of exposure compensation is additionally provided, including：
According to the film thickness distribution of pending film layer, the sense of pending film layer at compensatory zone and the compensatory zone is determined
Optical depth compensation rate；
Compensation device is adjusted, makes the concentration of colored solutions and the photosensitive depth compensation in solution box flux matched；
The pending film layer is exposed using the compensation device.
Further, before regulation compensation device, in addition to：Previously prepared solution box；The step for preparing solution box
Suddenly further comprise：Obtain the corresponding relation between the concentration of the colored solutions and the photosensitive depth compensation amount；According to institute
State corresponding relation prepare colored solutions in solution box, the solution box concentration it is corresponding with the photosensitive depth compensation amount.
Further, when the film thickness distribution of compensatory zone in the pending film layer meets first condition, the regulation
The step of compensation device, including：According to the photosensitive depth compensation amount and the corresponding relation, it is determined that having with corresponding concentration
At least one solution box of color solution；At least one described solution box is arranged on to the correspondence position of the compensatory zone, with right
The photosensitive depth of the pending film layer of compensatory zone carries out quantitative compensation.
Further, when the film thickness distribution of compensatory zone in the pending film layer meets second condition, the regulation
The step of compensation device, including：Brush is moved to the center position of the compensatory zone；According to the photosensitive depth compensation
Amount and the corresponding relation, determine the contact electrode of the center position with the solution box peripheral position to electrode
Between voltage difference；The brush and the voltage difference on electrode are adjusted, the solution box is controlled according to the voltage difference
The concentration distribution of middle colored solutions and the photosensitive depth compensation of the compensatory zone are flux matched.
Compared with prior art, the present invention includes advantages below：
The invention provides a kind of compensation device, exposure device and exposure compensation, the exposure dress provided in the present invention
In putting, the colored solutions of various concentrations can be adjusted out by the compensation device between exposure machine base station and exposure machine light-emitting window
The light of exposure machine outgoing is blocked.In pending film layer at the thinner position of thickness, projected position colored solutions it is dense
Degree is higher, so that the photosensitive depth for treating processing film layer carries out quantitative compensation, to realize light exposure and pending film layer thickness
Matching so that form the physical dimension of precision after exposure on substrate.
Brief description of the drawings
Fig. 1 is a kind of cross-sectional view of compensation device provided in an embodiment of the present invention；
Fig. 2 is a kind of cross-sectional view of exposure device provided in an embodiment of the present invention；
Fig. 3 is the dimensional structure diagram of compensation device in another exposure device provided in an embodiment of the present invention；
Fig. 4 is the cross-sectional view of another exposure device provided in an embodiment of the present invention；
Fig. 5 is the dimensional structure diagram of solution box and brush in another compensation device provided in an embodiment of the present invention；
Fig. 6 is a kind of flow chart of exposure method provided in an embodiment of the present invention；
Fig. 7 is the flow chart of another exposure method provided in an embodiment of the present invention；
Fig. 8 is the flow chart of another exposure method provided in an embodiment of the present invention.
Embodiment
In order to facilitate the understanding of the purposes, features and advantages of the present invention, it is below in conjunction with the accompanying drawings and specific real
Applying mode, the present invention is further detailed explanation.
In the description of the invention, unless otherwise indicated, " multiple " are meant that two or more；Term " on ",
" under ", "left", "right", " interior ", the orientation of the instruction such as " outer " or position relationship be based on orientation shown in the drawings or position relationship,
The description present invention and simplified description are for only for ease of, rather than indicates or imply that the machine or element of meaning must be with specific
Orientation, with specific azimuth configuration and operation, therefore be not considered as limiting the invention.
In the description of the invention, it is necessary to illustrate, unless otherwise clearly defined and limited, term " installation ", " phase
Even ", " connection " should be interpreted broadly, for example, it may be being fixedly connected or being detachably connected, or be integrally connected；Can
To be mechanical connection or electrical connection；Can be joined directly together, can also be indirectly connected to by intermediary.For this
For the those of ordinary skill in field, the concrete meaning of above-mentioned term in the present invention can be understood with concrete condition.
The embodiment to the present invention is described in further detail with reference to the accompanying drawings and examples.Following examples
For illustrating the present invention, but it is not limited to the scope of the present invention.
Reference picture 1, shows a kind of cross-sectional view of compensation device provided in an embodiment of the present invention.The compensation is filled
Put and can apply to technical field of lithography, for example, can apply in exposure machine.
Compensation device 11 provided in an embodiment of the present invention includes solution box 111.Colored solutions are marked with the solution box 111,
Wherein, the colored solutions are used for the transmitance for adjusting exposure machine emergent ray, are determined with the photosensitive depth for treating processing film layer
Amount compensation.Wherein, the pending film layer is the film layer that photosensitive material is made, for example, the pending film layer can be photoresist layer.
Specifically, when uneven thickness a period of time of pending film layer, each area of processing film layer is treated according to identical light exposure
Domain is exposed, and the regional exposure for causing thickness thickness partially in pending film layer is not enough, or causes thickness in pending film layer
Partially thin regional exposure is excessive, and the thickness and average film thickness deviation at certain position are bigger, and photosensitive depth compensation amount is also bigger.It is logical
Cross and treat processing film layer each region and pointedly compensated, can effectively reduce pending film layer thickness homogeneity poor to product
The influence of size.Because colored solutions can generally be blocked to light, so that the transmitance of light is reduced, moreover, coloured
The concentration of solution is bigger, and the occlusion effect to light is stronger, and transmitance of light when through the colored solutions will be caused also to get over
It is low.It therefore, it can the concentration by adjusting colored solutions, effectively the transmitance of regulation exposure machine emergent ray, and then control to shine
The light exposure penetrated in pending film layer, realizes that the photosensitive depth for treating processing film layer carries out quantitative compensation.
In actual applications, because exposure machine generally pertains only to the irradiation of ultraviolet light, therefore the benefit of purple can be chosen
Color yellow as colored solutions color, so as to play more preferable occlusion effect to the emergent ray of exposure machine.For example, the yellow
Colored solutions can be made up of Fe3+ solution, or be not construed as limiting in iodine solution, the embodiment of the present invention.
In summary, compensation device 11 provided in an embodiment of the present invention, can be by adjusting colored solutions in solution box 111
Concentration, adjust exposure machine emergent ray transmitance, and then treat processing film layer photosensitive depth carry out quantitative compensation, realize
Light exposure and the matching of pending film layer thickness, so as to realize the physical dimension for forming precision after exposure on substrate.
Reference picture 2, shows a kind of cross-sectional view of exposure device provided in an embodiment of the present invention.With reference to Fig. 2
Understand, exposure device provided in an embodiment of the present invention includes：Exposure machine base station 12, exposure machine light-emitting window 13 and compensation device 11.
Wherein, compensation device 11 is located between exposure machine base station 12 and exposure machine light-emitting window 13, including resin outer box 112 and solution box
111.The resin outer box 112 include outer box body 1121 and frame support 1122, wherein, outer box body 1121 is located at pending film
Between layer 15 and exposure machine light-emitting window 13, for housing solution box 111, frame support 1122 is used in the restocking of exposure machine base station 12
Play the outer box body 1121.Colored solutions are marked with solution box 111, wherein, the colored solutions are used to block from exposure machine light extraction
The light of outgoing at mouth 13, the thickness of the concentration of the colored solutions and pending film layer 15 at projected position is inversely proportional.
Understand the embodiment of the present invention to easily facilitate, below by being marked with the solution box 111 of colored solutions this structure,
It is briefly described：
Solution box 111 is the critical piece of compensation device 11, it is possible to use the colored solutions pair inside injection solution box 111
Blocked from the light of outgoing at exposure machine light-emitting window 13, it is possible to played in various degree using the colored solutions of various concentrations
Occlusion effect, so as to realize the regulation to transmitance.
Specifically, because the surface of solution is generally more smooth, therefore, the light of outgoing is being worn at exposure machine light-emitting window 13
When crossing the colored solutions inside solution box 111, the change of light is less prone to.Particularly with the solution box 111 full of colored solutions,
It is possible to prevente effectively from the fluctuation of liquid level, so that the colored solutions in solution box 111 remain even curface, and then accurately
Control the regulation to transmitance.Compared to electrochromism technology, not only control mode is simple, and preparation price is low, and effectively reduction makes
Use cost.
In actual use, the solution box 111 can be one, or multiple, can be according to pending film
The film thickness distribution of layer 15, is adjusted flexibly the occupation mode of solution box 111.It is additionally, since exposure machine and generally pertains only to ultraviolet light
Irradiation, therefore the complementary color yellow of purple can be chosen as the color of colored solutions, so as to going out at exposure machine light-emitting window 13
The light penetrated plays more preferable occlusion effect.For example, the colored solutions of the yellow can be by Fe3+Solution is made, or iodine
It is not construed as limiting in solution, the embodiment of the present invention.If specifically, thickness of the pending film layer 15 at X regions and the pending film
The difference of 15 average film thickness of layer is more than threshold value thickness, then can use corresponding concentration in the position according to the degree of thickness deviation
Yellow solution blocks the part ultraviolet light of outgoing during exposure, to avoid the pending film layer 15 at the position from excessively being exposed
Light.
In summary, in exposure device provided in an embodiment of the present invention, it can be gone out by exposure machine base station 12 and exposure machine
Compensation device 11 between optical port 13, the colored solutions for adjusting out various concentrations are blocked to the light of exposure machine outgoing.Treat
The concentration for handling colored solutions at the thinner position of thickness, projected position in film layer 15 is higher, so as to reduce identical light exposure pair
The influence of thickness weak location in pending film layer 15, to realize matching for light exposure and the thickness of the pending film layer of substrate 14 15
Property, so as to form homogeneous physical dimension on substrate after realizing exposure., can be effective and liquid level is smooth in solution box 111
Improve the degree that becomes more meticulous of physical dimension in substrate 14.
On the basis of the exposure device that a upper embodiment is provided, reference picture 3 is shown provided in an embodiment of the present invention another
A kind of dimensional structure diagram of compensation device 21 in exposure device, the China and foreign countries' box body 2121 of compensation device 21 includes at least one
Individual groove position 21211, each groove position 21211 is respectively used to the accommodating solution box 211 for being marked with colored solutions.Wherein, in each groove position 21211
Solution box 211 in the concentration of colored solutions be pre-configured with, the concentration of the colored solutions in each solution box 211 is homogeneous.
When needing to block the light of exposure machine outgoing with the solution box 211 with a certain concentration colored solutions,
Directly the solution box 211 with the concentration colored solutions can be inserted into corresponding groove position 21211.Wherein, have with the concentration
The solution box 211 of color solution can be selected from multiple solution boxes 211.The plurality of solution box 211 is previously implanted respectively
The concentration of colored solutions can linearly be distributed in the colored solutions of various concentrations, each solution box 211, so as to meet different make
Use demand.For example, can be in advance the coloured molten of 80%X, 90%X, 100%X, 110%X, 120%X this 5 kinds of concentration by concentration
Liquid is injected separately into A, B, C, D, E this 5 solution boxes 211, when needing to use the solution box with 90%X concentration colored solutions
When 211, directly the solution box 211B with the concentration colored solutions can be inserted in corresponding groove position 21211.In practical application
In, the colored solutions of same concentration can be previously implanted in multiple solution boxes 211 in case using.Tool can also needed to use
When having the solution box 211 of a certain concentration colored solutions, then by the concentration colored solutions being pre-configured with injection solution box 211.
Specifically, the concentration of colored solutions is pending by projected position respectively in solution box 211 in each groove position 21211
The photosensitive depth compensation amount of film layer 15 is determined.If it is thinner that the thickness at pending certain position of film layer 15 compares average film thickness, that is, feel
Optical depth compensation rate is bigger, then needs the colored solutions of corresponding concentration to block the light of exposure machine outgoing, so as to avoid
The position is over-exposed, causes to form physical dimension generation deviation after exposure on substrate.In actual applications, it can lead in advance
The corresponding relation crossed between the change in concentration and the Thickness Variation of corresponding pending film layer 15 of experiment acquisition colored solutions, for example
Show the corresponding relation in the form of relation curve, and according at the corresponding relation and projected position pending film layer 15 it is photosensitive
Depth compensation amount determines the concentration of colored solutions in solution box 211 in corresponding groove position 21211.If for example, tetra- regions of M, N, P, Q
Pending film layer 15 thickness it is relatively thin, it is necessary to by the solution box 211 with corresponding concentration colored solutions to light
Blocked.Wherein, M regions and n-quadrant need to use the solution box 211 with 110%X concentration colored solutions to be blocked, P
Region and Q regions need to use the solution box 211 with 120%X concentration colored solutions to be blocked, and M regions and n-quadrant are respectively needed
2 solution boxes 211 are inserted in the position of the groove at projected position 21211 to block the region, P regions and Q regions respectively need to exist
Insert 1 solution box 211 to block the region in groove position 21211 at projected position.Then can there will be 110%X dense respectively
4 solution boxes 211 for spending colored solutions are inserted in the groove position 21211 at M regions and n-quadrant projected position, and will have 120%
In groove position 21211 at 2 solution boxes 211 insertion P regions of X concentration colored solutions and Q region projections position, so that correspondingly
The light exposure to the pending film layer in these regions 15 is reduced, and then ensures the homogeneity of physical dimension on exposure metacoxal plate.Therefore,
Although the film thickness distribution of pending film layer 15 coated on the substrate 14 every time is not quite similar, solution box 211 need to be only replaced, will be had
Have in the insertion corresponding groove of solution box 211 position 21211 of various concentrations colored solutions, just can realize and be pointed to different zones difference
The pending film layer 15 of thickness is blocked.
In summary, in compensation device 21 provided in an embodiment of the present invention, outer box body 2121 includes at least one groove position
21211, each groove position 21211 is respectively used to the accommodating solution box 211 for being marked with colored solutions.Can be by having to being marked with various concentrations
Multiple solution boxes 211 of color solution are combined, and realize and the pending film layer 15 of the different thickness of different zones is blocked, enter
And realize the matching of light exposure and the pending thickness of film layer 15 of substrate 14., only need to be to molten when the region for needing to block is different
Liquid box 211 is replaced to carry out having and pointedly effectively blocked, and operates very simple and convenient.
A upper embodiment provide exposure device on the basis of, reference picture 4, show it is provided in an embodiment of the present invention again
A kind of cross-sectional view of exposure device, reference picture 5 is shown in another compensation device provided in an embodiment of the present invention
The dimensional structure diagram of solution box 311 and brush 313.The compensation device also includes brush 313, and one end of brush 313 can be with
The contact electrode 3111 of respective amount is electrically connected at least two contact electrodes 3111, and the other end of brush 313 can be with exposure
The synchronizing moving of machine light-emitting window 13.Therefore, the brush 313 can be with the synchronizing moving of exposure machine light-emitting window 13, precise positioning to needs
The position of exposure.And it can be accurately powered by the brush 313 to the contact electrode 3111 at projected position, so that with this
Stable concentration gradient annulus is formed centered on position.
Specifically, the side external surface of solution box 311 1 is provided with least two contact electrodes 3111 in the compensation device 31, it is molten
The periphery of liquid box 311 be provided with matched with contact electrode 3111 to electrode, one end of at least two contact electrode 3111 and
Electrode is connected with colored solutions.Wherein, the contact electrode 3111 can by tin indium oxide (Indium Tin Oxide,
) etc. ITO transparent material is made, and multiple contact electrodes 3111 can be in matrix distribution on the side external surface of solution box 311 1.
In actual applications, chromogenic ion is included in the colored solutions, for example, chromogenic ion in the colored solutions can be with
For Fe3+, so that solution is in yellow.The chromogenic ion can be moved under voltage effect in solution box 311, so that molten
The concentration distribution of chromogenic ion changes in liquid box 311, and then changes regulation of each region to light transmission rate in solution box 311
Effect.If for example, the difference of the thickness at the average film thickness of pending film layer 15 and compensatory zone is more than threshold value thickness, i.e. compensatory zone
The thickness of pending film layer 15 at place is less than average film thickness, then can be by adjusting in solution box 311 colored solutions at each region
Concentration, is compensated to the compensatory zone, i.e., control the concentration at the position to increase by adjusting voltage, so as to play to light
More preferable occlusion effect, wherein, compensatory zone refers to that thickness is more than threshold value with respect to the difference of average film thickness in pending film layer 15
The region of thickness.In actual applications, the pending thickness of film layer 15 be more than average film thickness or less than average film thickness region all
Compensatory zone can be used as.
When due to carrying out photoresist coating using spin coating proceeding, open and apply the pending film layer 15 in region often relatively
Thickness, can shift to the periphery of solution box 311 by the region chromogenic ion with power control, so as to reduce the dense of chromogenic ion in the region
Degree, and then the light exposure at the relative increase position, the thickness of pending film layer 15 and surrounding thickness for making the region tend to be homogeneous.
Wherein, painting region is opened when referring to start to coat pending film layer 15, and photoresist is dropped in the region in substrate.Specifically, working as to enter
During row quantitative compensation, exposure machine light-emitting window 13 can drive brush 313 to move to the centre bit of compensatory zone in pending film layer 15
Put, electric current can be conducted by brush 313 to the contact electrode 3111 of center position, and then conduct as the contact electrode
3111 colored solutions communicated.At the contact electrode 3111 and the peripheral position of solution box 311 of center position between electrode
Voltage difference, can be used for change colored solutions in chromogenic ion distribution, to adjust the concentration of colored solutions at compensatory zone.
For example, if the contact electrode 3111 of center position is led at positive charge, peripheral position leads to negative electrical charge to electrode, chromogenic ion is
Fe3+.Then central area Fe3+It will be moved to 311 peripheral positions of solution box, so that center position Fe3+Concentration is reduced,
And then play a part of the center position transmitance of increase solution box 311.
In summary, in compensation device 31 provided in an embodiment of the present invention, solution box 311 is close to exposure machine light-emitting window 13
Side is provided with least two contact electrodes 3111, and one end of at least two contact electrode 3111 is connected with colored solutions, another
Hold and connected with the external world of solution box 311, it is coloured so as to which the electric charge led on brush 313 is imported by contact electrode 3111
In solution, the opposite charges led to electrode at the peripheral position of conjugate solutions box 311 can form voltage difference, and utilize the electricity
Pressure difference changes the distribution of chromogenic ion in colored solutions, reaches the effect of the concentration of colored solutions at regulation compensatory zone.And then
Play a part of the center position transmitance of regulation solution box 311., can be in solution box 311 under being acted in the voltage difference
Concentration gradient annulus of the interior generation centered on point, therefore circular compensatory zone can be precisely compensated for.
The embodiment of the present invention additionally provides a kind of exposure method.The exposure method can apply to above-mentioned exposure device.
Reference picture 6, shows a kind of flow chart of exposure method provided in an embodiment of the present invention.
Step 601, according to the film thickness distribution of pending film layer, pending film at compensatory zone and the compensatory zone is determined
The photosensitive depth compensation amount of layer.
, can be by each region of pending film layer after the film thickness distribution of pending film layer is obtained by thickness test equipment
Thickness and the average film thickness of the pending film layer are compared, and determine the thickness and the pending film layer in each region of pending film layer
Average film thickness between deviation, and then determine the photosensitive depth compensation amount of pending film layer at the compensatory zone, wherein, this is inclined
Difference can be defined as compensatory zone more than the region of threshold value thickness.In actual applications, position can also be adjoined according to compensatory zone
The thickness put, extends the compensatory zone, is more precisely compensated for realizing.In addition, treat the thickness in processing film layer each region with
When the average film thickness of the pending film layer is compared, it is possible to use average film thickness and pending film layer entirety in each region
Average film thickness is compared, and can also be carried out using the thickness of each zone boundary position with the overall average film thickness of pending film layer
Compare.
Step 602, compensation device is adjusted.
Specifically, because the colored solutions of various concentrations are to having different screenings from the light of outgoing at exposure machine light-emitting window
Keep off effect.The concentration of colored solutions is bigger, and the transmitance of light is lower, is radiated at the light exposure of pending film layer at projected position
With regard to smaller.Conversely, the concentration of colored solutions is smaller, the transmitance of light is higher, is radiated at pending film layer at projected position
Light exposure is bigger.Therefore, treated using the compensation device before processing film layer is exposed, it is necessary to according to pending film layer
Film thickness distribution, the compensation device at compensatory zone projected position is adjusted, to control the dense of colored solutions in solution box
The pending film layer film thickness distribution spent with compensatory zone matches.For example, when thickness is partially thin at certain position for pending film layer,
The concentration of colored solutions in solution box at the position projected position can accordingly be increased, wait to locate so as to reduce and be radiated at the position
Manage film layer light exposure, to realize the matching of light exposure and pending film layer thickness, thus realize expose after on substrate shape
Into homogeneous physical dimension.In the thickness according to the pending film layer applied in substrate, complete at projected position in solution box
After the regulation of colored solution concentration, processing film layer just can be treated using the compensation device comprising the solution box and is carried out pointedly
Compensation.For example, the solution box with certain concentration colored solutions can be inserted in corresponding groove position, or solution box is led to
Electricity, makes the concentration of colored solutions in solution box change and stably, to realize the regulation to compensation device.
Step 603, processing film layer is treated using the compensation device to be exposed.
Compensatory zone regulation compensation device after, in compensation device in solution box the concentration of colored solutions can realize to from
Effective regulation of the light of outgoing at exposure machine light-emitting window, treats processing film layer using the compensation device and is exposed, Ke Yiyou
Effect avoids making under the irradiation of identical light exposure the partially thin position of the pending film layer thickness that is applied in substrate over-exposed, so that
Homogeneous physical dimension is formed on substrate after ensureing exposure.
In summary, in exposure method provided in an embodiment of the present invention, by the film thickness distribution according to pending film layer, really
Determine compensatory zone, and compensation device is adjusted in the compensatory zone, make at compensatory zone projected position colored solutions in solution box
Concentration and the pending film layer Thickness Matching of compensatory zone, recycle the compensation device to treat processing film layer and are exposed, effectively keep away
Exempt to make under the irradiation of identical light exposure the partially thin position of the pending film layer thickness that is applied in substrate over-exposed, so as to ensure
Homogeneous physical dimension is formed after exposure on substrate.
The embodiment of the present invention additionally provides another exposure method.Reference picture 7, shows provided in an embodiment of the present invention another
A kind of flow chart of exposure method.
Step 701, the corresponding relation between the concentration and photosensitive depth compensation amount of colored solutions is obtained.
The degree that colored solution concentration changes in solution box is different, the influence of the light exposure to exposing to pending film layer
It is different.In order to accurately adjust the transmitance of solution box position, to control the thickness of pending film layer after exposure imaging to become
Change, the corresponding relation between the concentration and photosensitive depth compensation amount of colored solutions can be determined beforehand through experiment, clearly to exist
When needing not photosensitive depth compensation amount, the colored solutions for being respectively necessary for which kind of concentration are blocked.
Specifically, the original thickness of pending film layer can be measured first, treat process film tunic thickness for example with K-MAC and enter
Row measurement.And exposed after covering the solution box with various concentrations colored solutions respectively at the diverse location of pending film layer
Light, for example, covering the solution box with the first concentration colored solutions in first position, being covered in the second place has second
The pending film layer is exposed after the solution box of concentration colored solutions.Pending film layer position after development is measured again
Thickness Variation, so as to obtain corresponding between the change in concentration of colored solutions and the photosensitive change in depth of corresponding pending film layer
Relation, and then determine the corresponding relation between the concentration and photosensitive depth compensation amount of colored solutions.In actual applications, in order to just
, can be with the corresponding relation between pre-production critical size and colored solution concentration in the control to critical size.
Step 702, according to the photosensitive depth compensation amount and the corresponding relation of pending film layer at compensatory zone, it is determined that tool
There is at least one solution box of corresponding concentration colored solutions.
When the film thickness distribution of compensatory zone in pending film layer meets first condition, i.e., compensatory zone can be divided at least one
Block subregion, during the pending film layer uniform film thickness of each of which subregion, can wait to locate according to all subregion in compensatory zone
The thickness and the corresponding relation of film layer are managed, determines that all subregion projected position is respectively necessary for having which kind of concentration in compensatory zone
The solution box of colored solutions is blocked, to realize the accurate compensation to compensatory zone.Wherein, compensatory zone refers to pending film
The difference of the thick relative average film thickness of tunic is more than the region of threshold value thickness.
Step 703, at least one solution box is arranged on to the correspondence position of compensatory zone, with to the pending film of compensatory zone
The photosensitive depth of layer carries out quantitative compensation.
In actual applications, can be according to benefit if compensatory zone includes at least one subregion with similar shape
The shape and size in region are repaid, at least one solution box is inserted corresponding with pending film layer all subregion in compensation device respectively
Projected position, to block corresponding all subregion.For example, i.e., compensatory zone for rectangle bad for the gluing of wire,
Correspondingly-sized can be combined into using the solution box of rectangle to be blocked.That is, it is determined that coloured molten with corresponding concentration
After at least one rectangle solution box of liquid, at least one rectangle solution box can be inserted to the square of correspondence position in compensation device
In shape groove position, to be spliced into shape and size corresponding with compensatory zone, the compensatory zone is blocked.
Step 704, processing film layer is treated using the compensation device to be exposed.
After regulation to compensation device is completed, in compensation device in solution box the concentration of colored solutions can realize to from
Effective control of the light of outgoing at exposure machine light-emitting window, treats processing film layer using the compensation device and is exposed, Ke Yiyou
Effect avoids making under the irradiation of identical light exposure the partially thin position of the pending film layer thickness that is applied in substrate over-exposed, so that
Homogeneous physical dimension is formed on substrate after ensureing exposure.
In summary, in exposure method provided in an embodiment of the present invention, by the concentration and photosensitive depth that obtain colored solutions
The corresponding relation spent between compensation rate, and the photosensitive depth compensation amount according to pending film layer at compensatory zone and the correspondence pass
System, it is determined that at least one solution box with corresponding concentration colored solutions, then at least one solution box is arranged on compensating basin by this
The correspondence position in domain, to carry out quantitative compensation to the photosensitive depth of the pending film layer of compensatory zone.So as to by being marked with difference
Multiple solution boxes of concentration colored solutions are combined, and realize and the pending film layer of the different thickness of different zones is blocked,
And then realize the matching of light exposure and pending film layer thickness.When the region for needing to block is different, solution box need to only be entered
Row replacement can be carried out having and pointedly effectively blocked, and be operated very simple and convenient.
The embodiment of the present invention additionally provides another exposure method.Reference picture 8, show it is provided in an embodiment of the present invention again
A kind of flow chart of exposure method.
Step 801, the corresponding relation between the concentration and photosensitive depth compensation amount of colored solutions is obtained.
Specifically, the change in concentration of colored solutions and the thickness of corresponding pending film layer can be determined beforehand through experiment
Corresponding relation between change, is become with the change in concentration of accurate description colored solutions to the thickness of pending film layer after exposure imaging
The influence of change.
Step 802, brush is moved to the center position of compensatory zone.
In actual applications, when the film thickness distribution of compensatory zone in pending film layer meets second condition, i.e. compensating basin
The pending film layer thickness in domain is incremented by gradient, or when successively decreasing in gradient, can determine the benefit according to the shape of the compensatory zone
Repay the center in region, and change by round dot of the center concentration distribution of colored solutions in solution box.For example, working as base
The pending film layer that is coated on bottom exist circular gluing it is bad when, i.e., when compensatory zone is circle, can by with exposure machine
The brush of light-emitting window connection is moved to the circle centre position of compensatory zone, so as to change colored solutions in solution box by round dot of this center of circle
Concentration distribution.
Step 803, according to the photosensitive depth compensation amount and the corresponding relation of pending film layer at compensatory zone, it is determined that in
At contact electrode and solution box peripheral position at heart position to the voltage difference between electrode.
It is determined that the center of the compensatory zone, and the brush being connected with exposure machine light-emitting window is moved to the centre bit
Put behind place, the contact of center position can be determined according to the thickness and corresponding relation of pending film layer at the compensatory zone
At electrode and solution box peripheral position to the voltage difference between electrode.
Specifically, when exposure machine light-emitting window drives brush to move to the center of compensatory zone in pending film layer, electricity
Stream can be conducted by brush to the contact electrode of center position, so conduct as the contact electrode communicate it is coloured molten
Liquid.At the contact electrode and solution box peripheral position of center position to the voltage difference between electrode, can be used for change has
The distribution of chromogenic ion in color solution, to adjust the concentration of colored solutions at compensatory zone.If for example, the contact of center position
Electrode leads at positive charge, peripheral position and leads to negative electrical charge to electrode, and chromogenic ion is Fe3+.Then central area Fe3+ will be to solution
The peripheral position movement of box, so that center position Fe3+ concentration is reduced, and then it is saturating to play increase solution box center position
Cross the effect of rate.
Step 804, adjust brush and to the voltage difference on electrode, colored solutions in solution box are controlled according to the voltage difference
The photosensitive depth compensation of concentration distribution and compensatory zone is flux matched.
During colored solution concentration distribution is adjusted by the voltage difference, touching at control centre position can be passed through
At point electrode and solution box peripheral position to the voltage between electrode, the change in concentration of colored solutions, makes in regulation solution box
The concentration distribution of colored solutions is stable to make the light exposure through the compensation device and the degree of pending film layer Thickness Matching.With
Realize the accurate compensation to the compensatory zone.
Step 805, processing film layer is treated using the compensation device to be exposed.
After regulation to compensation device is completed, in compensation device in solution box the concentration of colored solutions can realize to from
Effective control of the light of outgoing at exposure machine light-emitting window, treats processing film layer using the compensation device and is exposed, Ke Yiyou
Effect avoids making under the irradiation of identical light exposure the partially thin position of the pending film layer thickness that is applied in substrate over-exposed, so that
Homogeneous physical dimension is formed on substrate after ensureing exposure.
In summary, in exposure method provided in an embodiment of the present invention, by the concentration and photosensitive depth that obtain colored solutions
The corresponding relation spent between compensation rate, and the photosensitive depth compensation amount according to pending film layer at compensatory zone and the correspondence pass
System, determine at the contact electrode and solution box peripheral position of center position to the voltage difference between electrode, then adjust brush
And to the voltage difference on electrode, the photosensitive of the concentration distribution of colored solutions and compensatory zone in solution box is controlled according to the voltage difference
Depth compensation is flux matched.So as to change the distribution of chromogenic ion in colored solutions using the voltage difference, regulation compensation is reached
The effect of the concentration of colored solutions at region.And then play a part of solution box transmitance at regulation compensatory zone projected position.
Due under voltage difference effect, the concentration gradient annulus centered on point can be produced in solution box, therefore can be to circle
The compensatory zone of shape is precisely compensated for.
Each embodiment in this specification is described by the way of progressive, what each embodiment was stressed be with
Between the difference of other embodiment, each embodiment identical similar part mutually referring to.
A kind of exposure device and exposure method provided by the present invention are described in detail above, it is used herein
Specific case is set forth to the principle and embodiment of the present invention, and the explanation of above example is only intended to help and understands this
The method and its core concept of invention；Simultaneously for those of ordinary skill in the art, according to the thought of the present invention, specific
It will change in embodiment and application, in summary, this specification content should not be construed as to the present invention's
Limitation.
Claims (10)
1. a kind of compensation device, applied to exposure machine, it is characterised in that
The compensation device includes solution box；
Colored solutions are marked with the solution box, wherein, the colored solutions are used for the transmitance for adjusting exposure machine emergent ray,
Quantitative compensation is carried out with the photosensitive depth for treating processing film layer.
2. compensation device according to claim 1, it is characterised in that
The compensation device also includes resin outer box, and the resin outer box include at least one groove position, and each groove position is respectively used to hold
Put the solution box for being marked with the colored solutions.
3. compensation device according to claim 2, it is characterised in that
The concentration of colored solutions is pre-configured with solution box in each groove position, wherein, it is coloured in each solution box
The concentration of solution is homogeneous；
The concentration of colored solutions is respectively by the photosensitive of the projected position pending film layer in solution box in each groove position
Depth compensation amount is determined.
4. compensation device according to claim 1, it is characterised in that
The side external surface of solution box one is provided with least two contact electrodes, and the periphery of the solution box is provided with and the contact
Electrode matching to electrode, the contact electrode and it is described electrode is connected with the colored solutions in the solution box, wherein,
Chromogenic ion is included in the colored solutions；
The compensation device also includes：Brush；One end of the brush can be electrically connected with the contact electrode；
When carrying out quantitative compensation, the brush moves to targeted contact electrode, and the compensation device is applied to described by regulation
Voltage on brush control at the targeted contact electrode and the solution box peripheral position to the voltage difference between electrode, change
Become the distribution of chromogenic ion in the colored solutions, to adjust the concentration of colored solutions at the targeted contact electrode.
5. compensation device according to claim 4, it is characterised in that
The contact electrode is made of clear material；
Multiple contact electrodes are in matrix distribution on the side external surface of solution box one.
6. a kind of exposure device, including exposure machine base station and exposure machine light-emitting window, it is characterised in that the exposure device also includes
Compensation device as any one of claim 1 to 5；
When being exposed using the exposure device, the compensation device is located at the exposure machine base station and the exposure machine goes out
Between optical port, the photosensitive depth of the pending film layer for being pointed to below the solution box carries out quantitative compensation.
7. a kind of exposure compensation, applied to exposure device as claimed in claim 6, it is characterised in that including：
According to the film thickness distribution of pending film layer, the photosensitive depth of pending film layer at compensatory zone and the compensatory zone is determined
Spend compensation rate；
Compensation device is adjusted, makes the concentration of colored solutions and the photosensitive depth compensation in solution box flux matched；
The pending film layer is exposed using the compensation device.
8. method according to claim 7, it is characterised in that before regulation compensation device, in addition to：It is previously prepared molten
Liquid box；
It is described to further comprise the step of prepare solution box：
Obtain the corresponding relation between the concentration of the colored solutions and the photosensitive depth compensation amount；
The concentration of colored solutions in solution box, the solution box and the photosensitive depth compensation are prepared according to the corresponding relation
Amount correspondence.
9. method according to claim 8, it is characterised in that when the film thickness distribution of compensatory zone in the pending film layer
When meeting first condition, the step of the regulation compensation device, including：
According to the photosensitive depth compensation amount and the corresponding relation, it is determined that at least one with corresponding concentration colored solutions
Solution box；
At least one described solution box is arranged on to the correspondence position of the compensatory zone, with to the pending film of the compensatory zone
The photosensitive depth of layer carries out quantitative compensation.
10. method according to claim 8, it is characterised in that when the thickness point of compensatory zone in the pending film layer
When cloth meets second condition, the step of the regulation compensation device, including：
Brush is moved to the center position of the compensatory zone；
According to the photosensitive depth compensation amount and the corresponding relation, determine the contact electrode of the center position with it is described
At solution box peripheral position to the voltage difference between electrode；
The brush and the voltage difference on electrode are adjusted, colored solutions in the solution box are controlled according to the voltage difference
Concentration distribution and the photosensitive depth compensation of the compensatory zone it is flux matched.
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| CN201710707431.5A CN107255907B (en) | 2017-08-17 | 2017-08-17 | Compensation device, exposure device and exposure compensation method |
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