CN107248490A - A kind of new ion gun draws accelerating structure - Google Patents
A kind of new ion gun draws accelerating structure Download PDFInfo
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- CN107248490A CN107248490A CN201710368331.4A CN201710368331A CN107248490A CN 107248490 A CN107248490 A CN 107248490A CN 201710368331 A CN201710368331 A CN 201710368331A CN 107248490 A CN107248490 A CN 107248490A
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- electrode
- strip
- extraction
- extraction electrode
- accelerate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
Drawn the invention discloses a kind of new ion gun and accelerate electrode structure, wherein, extraction electrode is drawn by circular hole is designed as wide strip extraction shape, accelerate the distance between electrode no longer constant simultaneously, the extraction spacing of consecutive variations is designed as, that is, accelerates the distance between electrode to be changed into variable interval 3 7mm from 5mm.By implementing the present invention, obvious change occurs for the shape of ion beam spot, strip beam spot is become by original circular beam spot, beam spot size can be (100 200mm) × (300 800mm), the longitudinally wide of ion beam spot is substantially increased, has obviously advantage when handling strip workpiece.Meanwhile, accelerate the change ion beam current of electrode to greatly increase by drawing, the life-span of cathode targets can be greatly increased under identical beam intensity.
Description
Technical field
The present invention is new for what is proposed the problem of solving ion beam uniformity during strip workpiece metal ion processing
Ion gun extraction-accelerating structure.
Technical background
Metal vapor vacuum arc source (Metal Vapor Vacuum Arc), abbreviation MEVVA sources.This technology be
Last century the mid-80 is by Brown, Adler and Burkhart of Univ California-Berkeley et al. because nuclear physics is ground
Study carefully needs to develop.Because MEVVA sources can produce the ion beam of various high current metals and conductive compound, with line
By force, the characteristics of ionic species is more, purity is high, charge state is high, extraction voltage is high and porous large area is drawn, utilize these ions
Beam can improve the performances such as wear-resistant metal material surface, resistance to high temperature oxidation, corrosion-resistant and reduction skin-friction coefficient,
Ceramics, welding performance of diamond surface etc. can also be improved, tool and mould and parts after being handled through metal ion implantation make
It will be greatly improved with the life-span.Therefore MEVVA source technologies have quick development in nearly 20 years, are the weights of material surface optimization processing
One of technological means is wanted, the industries such as machining, machine manufacture, instrument and meter manufacture are widely used in, to ion implanting material
Material Research on Surface Modification is with applying and playing important influence.
The operation principle in MEVVA sources is to produce substantial amounts of metal plasma using the vacuum arc discharge between negative electrode and anode
Body, be brought out in the presence of electric field formed by high-current metal ion beam.MEVVA sources can be produced in the periodic table of elements from lithium
To all metal ions of uranium, metal ion line is strong, beam spot big, is particularly suitable for use in scientific research and commercial Application.MEVVA sources
High current ion implanting is realized, material surface composition and structure can be changed, therefore plant after new high-current metal ion source appearance
It is applied to that non-semiconducting material is ion-implanted surface-modified soon, and causes a leather of high-current metal ion injection
Life, this unique ion implantation apparatus is referred to as first-generation metal ion implantation apparatus.
MEVVA source technologies are somewhat following：：
(1) the intense beam stream of 10 milliamperes of magnitudes can be produced to the solid metal element (conjunction carbon) on the periodic table of elements；
(2) ionic purity depends on the purity of cathode material, therefore can reach very high purity, while can save high
Expensive and complicated mass analyzer；
(3) metal ion typically has several charge states, and higher ion energy can be so obtained with relatively low extraction voltage
Amount, and can realize that the superposition (ion) of several energy is injected with an extraction voltage；
The shortcoming of MEVVA source technologies：
1st, realized when MEVVA will handle big workpiece often by scanning system or increase cathode size and system
So that the structure of ion implantation apparatus becomes more complicated；
2nd, to improve processing size, workpiece typically exports distant apart from beamlet, greatly reduces the density of ion beam,
The life-span of negative electrode is greatly reduced in the case of equal beam intensity.
The content of the invention
In view of the above-mentioned problems, the present invention is based on original MEVVA systems, extraction electrode and acceleration electrode are set again
Meter, it is proposed that a kind of novel ion source draws-accelerate electrode structure.
The first purpose of the embodiment of the present invention is that to draw-accelerate electrode structure effectively right by designing new ion gun
Ion beam current is regulated and controled, and realization can handle the strip beam spot of wider workpiece, while cathode life can be greatly improved.
For further, new ion gun draws-and accelerate electrode structure to include：The extraction electrode of strip, Yi Jiti
The acceleration electrode of tee section；
In certain embodiments, extraction electrode includes：Extraction electrode hole is strip, and adjacent two strip draws pitch of holes
For 1.2-2.0mm, strip extraction electrode hole size is (1.5-2.5mm) × (80-100mm)；Extraction electrode thickness 2-5mm；
In certain embodiments, electrode is accelerated to include：Acceleration electrode hole is strip, and adjacent two strip draws pitch of holes
For 1.2-2.0mm, acceleration electrode surface is arcuate shape, and the radius of arc is 9-12m；Accelerate the section of the elongate holes of electrode
Conventional rectangle, but trapezoidal shape, trapezoidal top face (close to extraction electrode end face) size be (1.5-2.5mm) ×
(80-100mm), trapezoidal following face size is (2-3mm) × (80-100mm), accelerates electrode thickness 2-5mm.
Relative to prior art, various embodiments of the present invention have the advantage that：
1st, it is 800mm that the new extraction that the embodiment of the present invention is proposed-acceleration electrode structure, which draws beam spot size most long, most
Width can be 400mm, and this is the 3-5 of the metal vacuum steam plasma source same position length of existing a diameter of 10mm cathode constructions
Times；
2nd, compared to the metal vacuum steam plasma source of existing a diameter of 10mm cathode constructions, line size improves 1-2 times,
1-2 times of the life-span of cathode targets can be improved under identical line size cases；
It should be noted that for foregoing embodiment of the method, in order to be briefly described, therefore it is all expressed as a series of
Combination of actions, but those skilled in the art should know, the present invention is not limited by described sequence of movement, because according to
According to the present invention, some steps can be carried out sequentially or simultaneously using other.Secondly, those skilled in the art should also know,
Embodiment described in this description belongs to preferred embodiment, and involved action is not necessarily essential to the invention.
The foregoing is only embodiments of the invention, be not intended to limit the invention, it is all the present invention spirit and
Within principle, any modification, equivalent substitution and improvements made etc. should be included in the scope of the protection.
Embodiment after is explained by the more features and advantage of the embodiment of the present invention.
Brief description of the drawings
The accompanying drawing for constituting a part of the embodiment of the present invention is used for providing further understanding the embodiment of the present invention, the present invention
Schematic description and description be used for explain the present invention, do not constitute inappropriate limitation of the present invention.In the accompanying drawings：
Fig. 1 is extraction electrode top view provided in an embodiment of the present invention and side view；
Fig. 2 is extraction electrode provided in an embodiment of the present invention and accelerates electrode side view；
Fig. 3 is metal vacuum steam plasma source (MEVVA) schematic diagram provided in an embodiment of the present invention and pictorial diagram；
Fig. 4 is metal vacuum steam plasma source (MEVVA)：Extraction electrode：Strip pitch of holes 1.5mm, strip draws electricity
Pole hole size is 2mm × 90mm；Extraction electrode thickness 3mm；
Accelerate electrode：Strip pitch of holes 1.5mm, acceleration electrode surface is arcuate shape, and the radius of arc is 10m；Accelerate
The trapezoidal top face in section (close to extraction electrode end face) size of the elongate holes of electrode is 2mm × 90mm, trapezoidal following face chi
Very little is 2.2mm × 90mm, accelerates electrode thickness 2mm, and it is 3mm, real work voltage with extraction electrode minimum spacing to accelerate electrode
8kV；
Fig. 5 is metal vacuum steam plasma source (MEVVA)：Extraction electrode：Strip pitch of holes 1.5mm, strip draws electricity
Pole hole size is 2mm × 90mm；Extraction electrode thickness 3mm；
Accelerate electrode：Strip pitch of holes 1.5mm, acceleration electrode surface is arcuate shape, and the radius of arc is 10m；Accelerate
The trapezoidal top face in section (close to extraction electrode end face) size of the elongate holes of electrode is 2mm × 90mm, trapezoidal following face chi
Very little is 2.4mm × 90mm, accelerates electrode thickness 2mm, and it is 3mm, real work voltage with extraction electrode minimum spacing to accelerate electrode
8kV；
Fig. 6 is metal vacuum steam plasma source (MEVVA)：Extraction electrode：Strip pitch of holes 1.5mm, strip draws electricity
Pole hole size is 2mm × 90mm；Extraction electrode thickness 3mm；
Accelerate electrode：Strip pitch of holes 1.5mm, acceleration electrode surface is arcuate shape, and the radius of arc is 10m；Accelerate
The trapezoidal top face in section (close to extraction electrode end face) size of the elongate holes of electrode is 2mm × 90mm, trapezoidal following face chi
Very little is 3mm × 90mm, accelerates electrode thickness 2mm, and it is 3mm, real work voltage 8kV with extraction electrode minimum spacing to accelerate electrode；
Fig. 7 is (subscript 1,2,3 in corresponding diagram 7 respectively), operating voltage 8kV, line under Fig. 4,5,6 three kinds of different situations
Life span comparison's figure of cathode targets during 6mA.
Description of reference numerals
100 extraction electrode elongate holes
101 extraction electrode positioning holes
102 extraction electrode strip pitchs of holes
103 extraction electrodes
200 extraction electrode side views
201 accelerate electrode side view
202 accelerate electrode strip hole trapezoid cross section
300 MEVVA cathode targets and pictorial diagram
301 extraction electrode schematic diagrames and pictorial diagram
302 accelerate electrode schematic diagram and pictorial diagram
303 trigger electrodes
304 ion beams
Embodiment of the method
In the present embodiment, extraction electrode dimensional parameters are：Strip pitch of holes 1.5mm, strip extraction electrode hole size is
2mm×90mm；Extraction electrode thickness 3mm；
Accelerate electrode size parameter be：Strip pitch of holes 1.5mm, acceleration electrode surface is arcuate shape, the radius of arc
For 10m；The trapezoidal top face in section (close to the extraction electrode end face) size for accelerating the elongate holes of electrode is 2mm × 90mm, plus
Fast electrode thickness 2mm, it is 3mm, real work voltage 8kV with extraction electrode minimum spacing to accelerate electrode；Wherein change trapezoidal following
Face size takes (2.2,2.4 and 3mm) × 90mm, and ion implanting substrate 10min, wherein substrate are blank sheet of paper, and the outlet of blank sheet of paper distance is equal
For 100mm.
From the point of view of complex chart 4-6 result of the tests, new extraction-acceleration electrode can be good at regulating and controlling ion, in the moon
Pole size is that Φ 10mm can form the ion beam spot of strip, is being separated out at mouthful 100mm, beam spot length is more than 500mm, than original
The beam spot diameter, 180 come improves nearly 3 times of length, is very beneficial for the processing of strip workpiece, while coming from beam spot color
See, beam homogeneity is significantly improved, without obvious intense beam Liu Qiang areas and weak area.Such as Fig. 7, in identical 6mA ion beam currents intensity
The life-span of lower cathode targets is all higher than 40 hours, and more than 5 times are improved than original 8h.
Claims (5)
1. a kind of new metal ion source extraction electrode-accelerating structure, it is characterised in that including：Extraction electrode 100, accelerates
Electrode 201.
2. the electrode leading structure according to claims 1, its feature includes：Extraction electrode hole is strip, adjacent two length
It is 1.2-2.0mm that pitch of holes is drawn in bar shaped, and strip extraction electrode hole size is (1.5-2.5mm) × (80-100mm).
3. accelerating electrode structure according to claims 1, its feature includes：Acceleration electrode hole is strip, adjacent two length
It is 1.2-2.0mm that pitch of holes is drawn in bar shaped, and acceleration electrode surface is arcuate shape, and the radius of arc is 9-12m.
4. according to claims 3, the spacing between extraction electrode and acceleration electrode is centered on mechanical dimension, along half
Footpath direction is continuously reduced, and the spacing between extraction electrode and acceleration electrode is 3-7mm.
5. according to claims 3, the section for accelerating the elongate holes of electrode is not conventional rectangle, but trapezoidal shape
Shape, trapezoidal top face (close to extraction electrode end face) size is (1.5-2.5mm) × (80-100mm), and trapezoidal following face size is
(2-3mm)×(80-100mm)。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710368331.4A CN107248490B (en) | 2017-05-23 | 2017-05-23 | A kind of novel ion source extraction-accelerating structure |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710368331.4A CN107248490B (en) | 2017-05-23 | 2017-05-23 | A kind of novel ion source extraction-accelerating structure |
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| CN107248490A true CN107248490A (en) | 2017-10-13 |
| CN107248490B CN107248490B (en) | 2019-02-22 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108441832A (en) * | 2018-03-28 | 2018-08-24 | 北京师范大学 | A kind of centrifugal pump impeller surface treatment method and equipment |
| CN111668080A (en) * | 2020-04-30 | 2020-09-15 | 北京师范大学 | Metal ion source emitter |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3511930B2 (en) * | 1999-02-09 | 2004-03-29 | 日新電機株式会社 | Ion source and ion beam irradiation apparatus using the same |
| CN2610487Y (en) * | 2002-10-08 | 2004-04-07 | 北京师范大学 | Strong beam source, large beam spot metal steam vacuum arc ion source |
| US20060152164A1 (en) * | 2005-01-07 | 2006-07-13 | Yung Hee Lee | Ion beam extractor |
| CN101851747A (en) * | 2009-03-30 | 2010-10-06 | 核工业西南物理研究院 | High-current metal ion source |
| CN102347190A (en) * | 2010-08-02 | 2012-02-08 | 北京中科信电子装备有限公司 | Split type ion source extraction electrode system |
-
2017
- 2017-05-23 CN CN201710368331.4A patent/CN107248490B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3511930B2 (en) * | 1999-02-09 | 2004-03-29 | 日新電機株式会社 | Ion source and ion beam irradiation apparatus using the same |
| CN2610487Y (en) * | 2002-10-08 | 2004-04-07 | 北京师范大学 | Strong beam source, large beam spot metal steam vacuum arc ion source |
| US20060152164A1 (en) * | 2005-01-07 | 2006-07-13 | Yung Hee Lee | Ion beam extractor |
| CN101851747A (en) * | 2009-03-30 | 2010-10-06 | 核工业西南物理研究院 | High-current metal ion source |
| CN102347190A (en) * | 2010-08-02 | 2012-02-08 | 北京中科信电子装备有限公司 | Split type ion source extraction electrode system |
Non-Patent Citations (2)
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| 吴先映等: "M E V V A 离子源凸形引出电极的研制", 《核技术》 * |
| 吴先映等: "MEVVA离子束技术的发展及应用", 《北京师范大学学报》 * |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108441832A (en) * | 2018-03-28 | 2018-08-24 | 北京师范大学 | A kind of centrifugal pump impeller surface treatment method and equipment |
| CN111668080A (en) * | 2020-04-30 | 2020-09-15 | 北京师范大学 | Metal ion source emitter |
| CN111668080B (en) * | 2020-04-30 | 2021-06-08 | 北京师范大学 | Metal ion source emitter |
| US11373837B2 (en) | 2020-04-30 | 2022-06-28 | Beijing Normal University | Metal ion source emitting device |
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| Publication number | Publication date |
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| CN107248490B (en) | 2019-02-22 |
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