CN107145034A - A kind of intermediate tone mask plate - Google Patents
A kind of intermediate tone mask plate Download PDFInfo
- Publication number
- CN107145034A CN107145034A CN201710496938.0A CN201710496938A CN107145034A CN 107145034 A CN107145034 A CN 107145034A CN 201710496938 A CN201710496938 A CN 201710496938A CN 107145034 A CN107145034 A CN 107145034A
- Authority
- CN
- China
- Prior art keywords
- opening
- mask plate
- tone mask
- intermediate tone
- bore
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
The invention discloses a kind of intermediate tone mask plate, including open region and shading region, the open region includes the first opening of portion's some printing opacities and the second opening of multiple full impregnated light；The bore of multiple first openings is incomplete same, and the light transmittance of multiple first openings is also incomplete same, so that the size of the figure of each first opening exposure is equal, cylindrical spacer supplemented by the figure of the first opening exposure, the figure of the second opening exposure is main cylindrical spacer.The present invention can prevent Thin Film Transistor-LCD from producing brightness irregularities and easy to use.
Description
Technical field
The present invention relates to a kind of intermediate tone mask plate, belong to display panel preparing technical field.
Background technology
In TFT-LCD (Thin Film Transistor-LCD) processing procedure, PS (Post Spacer；Cylindrical spacer) be
One critical process of color filter (colored filter) layer.Exposure is the critical processes of PS processes, mask plate (Mask)
It is a basic tool of exposure.There are Main PS (main PS) and Sub simultaneously due to general on small size Panel (glass substrate)
Two kinds of highly different PS of PS (auxiliary PS), if making Main PS and Sub PS respectively using twice Mask exposures, can cause
The production capacities of PS processes reduces half, while will also result in the materials such as photoresist and developer solution doubles loss.Therefore, using together
Mask exposures make Main PS and Sub PS and are very important, and this Mask is commonly referred to as Halftone Mask (halftonings
Mask plate).
Halftone Mask technologies are, by reducing Sub PS aperture portion light transmittance, to be received with to reduce Sub PS
Light exposure so that the height of Sub PS after development is less than Main PS.For example in the thin gold of Sub PS aperture portion plating last layer
Belong to Cr(chromium), can so reduce the light transmittance of Sub PS opening portions, and cause the low regional exposure development of Sub PS light transmittances
Dimension of picture CD values afterwards reduce.As shown in figure 1, but be due to that existing Partial exposure machine is designed using special microscope group splicing,
Therefore, the splicing position 11 between adjacent two microscope group 1 can produce Mura (brightness irregularities), and commonly referred to as Lens Mura are (thoroughly
Mirror brightness irregularities).So, during exposure (as shown in Figure 1) using intermediate tone mask plate 2, the Sub in corresponding Lens Mura areas
PS height can be significantly lower than the Sub PS height in normal area, when being further combined into screen, cause Lens Mura areas brightness occur
It is different with other regions, so that producing Mura on TFT-LCD.
The content of the invention
In view of the above-mentioned problems, can prevent Thin Film Transistor-LCD from producing bright it is an object of the invention to provide one kind
The uneven and easy to use intermediate tone mask plate of degree.
To achieve the above object, the present invention takes following technical scheme：A kind of intermediate tone mask plate, including open region and screening
Light area, the open region includes the first opening of some printing opacities and the second opening of multiple full impregnated light；Multiple described first
The bore of opening is incomplete same, and the light transmittance of multiple first openings is also incomplete same, so that each described first opens
The size of the figure of mouth exposure is equal, cylindrical spacer supplemented by the figure of the first opening exposure, second opening
The figure of exposure is main cylindrical spacer.
The mouth of each first opening corresponding with exposure machine microscope group splicing position on the intermediate tone mask plate
Footpath is identical, on the intermediate tone mask plate with microscope group splicing position is corresponding described in the exposure machine each described first opens
The light transmittance of mouth is identical.
The bore of each first opening corresponding with microscope group splicing position on the intermediate tone mask plate
More than the bore of remaining first opening on the intermediate tone mask plate, and it is located on the intermediate tone mask plate and institute
The light transmittance for stating corresponding each first opening in microscope group splicing position is more than remaining institute on the intermediate tone mask plate
State the light transmittance of the first opening.
The bore of each first opening corresponding with microscope group splicing position on the intermediate tone mask plate
Bore than remaining first opening on intermediate tone mask plate is big 0.5 micron, and on the intermediate tone mask plate
Splice the corresponding each described first light transmittance ratio being open in position with the microscope group and be located at remaining on the intermediate tone mask plate
The light transmittance of first opening is big by 2%.
The bore of each first opening corresponding with microscope group splicing position on the intermediate tone mask plate
For 6~10 microns, each first opening corresponding with microscope group splicing position on the intermediate tone mask plate
Light transmittance is 15~25%.
Multiple first openings and multiple second openings are respectively in arranged for interval；The bore of each first opening
It is all higher than the bore of each second opening.
Plating is provided with for reducing the chromium film of light transmittance in each first opening.
The section of each first opening and each second opening is octagon.
It is 120 millimeters that the intermediate tone mask plate splices the distance between position with the microscope group.
The intermediate tone mask plate is made of quartz, and the thickness of the intermediate tone mask plate is 5~20 millimeters.
The present invention is due to taking above technical scheme, and it has advantages below：The present invention is provided with multiple first openings, many
The bore of individual first opening is incomplete same, and the light transmittance of multiple first openings is also incomplete same, to make up
Exposure figure size is uneven caused by there is microscope group splicing position on exposure machine, so that the figure of each the first opening exposure
The size of shape is equal, can prevent Thin Film Transistor-LCD from producing brightness irregularities.
Other features and advantages of the present invention will be illustrated in the following description, also, the partial change from specification
Obtain it is clear that or being understood by implementing the present invention.The purpose of the present invention and other advantages can be by specification, rights
Specifically noted structure is realized and obtained in claim and accompanying drawing.
Brief description of the drawings
In order to it is clearer explanation the embodiment of the present invention in technical scheme, in being described below to embodiment required for
Accompanying drawing does simple introduction：
Fig. 1 is the structural representation that prior art intermediate tone mask plate is used cooperatively with exposure machine microscope group；
Fig. 2 is the structural representation of the present invention；
Fig. 3 is the structural representation that the present invention is used cooperatively with exposure machine microscope group.
Embodiment
Describe embodiments of the present invention in detail below with reference to drawings and Examples, how the present invention is applied whereby
Technological means solves technical problem, and reaches the implementation process of technique effect and can fully understand and implement according to this.Need explanation
As long as not constituting each embodiment in conflict, the present invention and each feature in each embodiment can be combined with each other,
The technical scheme formed is within protection scope of the present invention.
As shown in Fig. 2 intermediate tone mask plate proposed by the present invention, it includes open region 3 and shading region 4.Open region 2 includes
First opening 31 of some printing opacities and the second opening 32 of multiple full impregnated light.It is exposed using each first opening 31, and
Auxiliary cylindrical spacer can be made on the glass substrate by follow-up developing manufacture process, while being exposed using each second opening 32
Light, and main cylindrical spacer can be made on the glass substrate by follow-up developing manufacture process.Wherein, multiple first openings 31
Bore and light transmittance are differed respectively, so that the size of the figure of each exposure of first opening 31 is equal.
In above-described embodiment, splice position 11 (such as Fig. 1, Fig. 3 institute with the microscope group of exposure machine on intermediate tone mask plate
Showing) bore of corresponding each first opening 31 is identical and corresponding with microscope group splicing position 11 on intermediate tone mask plate
It is each first opening 31 light transmittance it is identical.
It is corresponding with microscope group splicing position 11 (as shown in Figure 1, Figure 3) on intermediate tone mask plate in above-described embodiment
The bore of each first opening 31 be more than the bore for being located at remaining the first opening 31 on intermediate tone mask plate, and covered positioned at halftoning
The light transmittance of each first opening 31 corresponding with microscope group splicing position 11, which is more than, on diaphragm plate is located at remaining on intermediate tone mask plate
The light transmittance of first opening 31, so that the dimension of picture of each exposure of first opening 31 is equal in magnitude.
It is corresponding with microscope group splicing position 11 (as shown in Figure 1, Figure 3) on intermediate tone mask plate in above-described embodiment
Each first opening 31 relative aperture be located at remaining the first opening 31 on intermediate tone mask plate bore it is big 0.5 micron, and be located at
The light transmittance ratio of each first opening 31 corresponding with microscope group splicing position 11 is located at intermediate tone mask plate on intermediate tone mask plate
The light transmittance of remaining upper the first opening 31 is big by 2%, can improve the printing opacity uniformity of intermediate tone mask plate.
It is corresponding with microscope group splicing position 11 (as shown in Figure 1, Figure 3) on intermediate tone mask plate in above-described embodiment
The bore of each first opening 31 be 6~10 microns, it is and corresponding with microscope group splicing position 11 on the intermediate tone mask plate
The light transmittance of each first opening 31 is 15~25%.
In above-described embodiment, as shown in Figure 2 and Figure 3, multiple first openings 31 and multiple second openings 32 are respectively in interval cloth
Put.The bore of each first opening 31 is all higher than the bore of each second opening 32, so can be using each first opening 31 in glass
Auxiliary cylindrical spacer is made on substrate, and main cylindrical spacer is made on the glass substrate using each second opening 32.
In above-described embodiment, plating is provided with for reducing the metal film of light transmittance in each first opening 31, makes each first
Light transmittance in opening 31 is below the light transmittance of each second opening 32.And then make auxiliary cylindrical spacer on glass substrate corresponding
Dimension of picture CD values after the low regional exposure of light transmittance reduce.The metal film can be chromium film.
In above-described embodiment, as shown in Figure 2 and Figure 3, the section of each first opening 31 and each second opening 32 is positive eight side
Shape.
In above-described embodiment, it is 120mm that intermediate tone mask plate splices the distance between position 11 with microscope group.
In above-described embodiment, as shown in figure 3, exposure machine is projection exposure machine.In a preferred embodiment, exposure machine is
Nikon (Nikon) exposure machine.
In above-described embodiment, intermediate tone mask plate is made of quartz, and the thickness of intermediate tone mask plate is 5~20 millimeters.
As shown in figure 3, in use, the present invention is used cooperatively with exposure machine, with adjacent two mirror on intermediate tone mask plate
Group 1 between microscope group splicing position 11 it is corresponding it is each first opening 31 bore it is identical and more than be located at intermediate tone mask plate on
Remaining it is each first opening 31 bore, while on intermediate tone mask plate with microscope group splice position 11 it is corresponding each first
The light transmittance of opening 31 is identical and more than the light transmittance for being located at remaining each first opening 31 on intermediate tone mask plate, to make up exposure
Exposure figure size is uneven caused by microscope group splicing position 11 present on ray machine, so that each first opening 31 exposes
Figure size it is equal.
Enumerate a specific embodiment
Photoresistance is coated with the glass substrate, as shown in figure 3, and the intermediate tone mask plate using the present invention and Nikon exposure
Machine, 60 MJs of light exposure, each first opening corresponding with the microscope group splicing position 11 of exposure machine on intermediate tone mask plate
When 31 bore increases by 1 micron, while light transmittance is 15%, the now graphic scale at the top of the auxiliary cylindrical spacer on glass substrate
It is very little to increase by 0.6 microns.Intermediate tone mask plate each first opening 31 corresponding with the microscope group splicing position 11 of exposure machine
Bore when being 9 microns, while light transmittance increase by 5%, the now dimension of picture at the top of the auxiliary cylindrical spacer on glass substrate
It will increase by 0.15 microns.
While it is disclosed that embodiment as above, but described content is only to facilitate understanding the present invention and adopting
Embodiment, is not limited to the present invention.Any those skilled in the art to which this invention pertains, are not departing from this
On the premise of the disclosed spirit and scope of invention, any modification and change can be made in the implementing form and in details,
But the scope of patent protection of the present invention, still should be subject to the scope of the claims as defined in the appended claims.
Claims (10)
1. a kind of intermediate tone mask plate, it is characterised in that including open region and shading region, it is saturating that the open region includes some
First opening of light and the second opening of multiple full impregnated light；The bore of multiple first openings is incomplete same, and multiple institutes
The light transmittance for stating the first opening is also incomplete same, so that the size of the figure of each first opening exposure is equal, institute
Cylindrical spacer supplemented by the figure of the first opening exposure is stated, the figure of the second opening exposure is main cylindrical spacer.
2. intermediate tone mask plate according to claim 1, it is characterised in that with exposure on the intermediate tone mask plate
The bore of corresponding each first opening in machine microscope group splicing position is identical, is exposed on the intermediate tone mask plate with described
The light transmittance of corresponding each first opening in microscope group splicing position described in ray machine is identical.
3. intermediate tone mask plate according to claim 2, it is characterised in that on the intermediate tone mask plate with it is described
The bore of corresponding each first opening in microscope group splicing position be more than be located on the intermediate tone mask plate remaining described the
The bore of one opening, and corresponding with microscope group splicing position each first opening on the intermediate tone mask plate
Light transmittance be more than be located at the intermediate tone mask plate on remaining it is described first opening light transmittance.
4. intermediate tone mask plate according to claim 3, it is characterised in that on the intermediate tone mask plate with it is described
The relative aperture of corresponding each first opening in microscope group splicing position is located at remaining described first opening on intermediate tone mask plate
Bore it is big 0.5 micron, and each described first that with the microscope group to splice position on the intermediate tone mask plate corresponding
The light transmittance of opening is bigger by 2% than the light transmittance of remaining first opening on the intermediate tone mask plate.
5. intermediate tone mask plate according to claim 2, it is characterised in that on the intermediate tone mask plate with it is described
Microscope group splicing position it is corresponding it is each it is described first opening bore be 6~10 microns, on the intermediate tone mask plate with
The light transmittance of corresponding each first opening in the microscope group splicing position is 15~25%.
6. intermediate tone mask plate according to claim 1, it is characterised in that multiple first openings and multiple described the
Two openings are in arranged for interval respectively；The bore of each first opening is all higher than the bore of each second opening.
7. intermediate tone mask plate according to claim 1, it is characterised in that plating is provided with use in each first opening
In the chromium film of reduction light transmittance.
8. intermediate tone mask plate according to claim 1, it is characterised in that each first opening and each described second is opened
The section of mouth is octagon.
9. intermediate tone mask plate according to claim 2, it is characterised in that the intermediate tone mask plate is spelled with the microscope group
The distance between socket part position is 120 millimeters.
10. intermediate tone mask plate according to claim 1, it is characterised in that the intermediate tone mask plate is made using quartz
Into the thickness of the intermediate tone mask plate is 5~20 millimeters.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710496938.0A CN107145034B (en) | 2017-06-23 | 2017-06-23 | Half-tone mask plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710496938.0A CN107145034B (en) | 2017-06-23 | 2017-06-23 | Half-tone mask plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107145034A true CN107145034A (en) | 2017-09-08 |
| CN107145034B CN107145034B (en) | 2020-11-27 |
Family
ID=59785582
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710496938.0A Active CN107145034B (en) | 2017-06-23 | 2017-06-23 | Half-tone mask plate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107145034B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107703714A (en) * | 2017-09-26 | 2018-02-16 | 武汉华星光电技术有限公司 | A kind of manufacture method and light shield of the substrate of display |
| CN111323978A (en) * | 2020-04-08 | 2020-06-23 | Tcl华星光电技术有限公司 | Pixel unit, array substrate and display panel |
Citations (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030128309A1 (en) * | 2001-12-26 | 2003-07-10 | Chi Mei Electronics Corp | Liquid crystal display device and color filter substrate thereof |
| KR100719932B1 (en) * | 2006-02-24 | 2007-05-18 | 비오이 하이디스 테크놀로지 주식회사 | Liquid crystal display device |
| US20070291206A1 (en) * | 2006-06-20 | 2007-12-20 | Quanta Display Inc. | Methods of fabricating active device array substrate and fabricating color filter substrate |
| CN102103323A (en) * | 2009-12-21 | 2011-06-22 | 北京京东方光电科技有限公司 | Half-tone mask plate and manufacturing method thereof |
| CN201974632U (en) * | 2011-04-12 | 2011-09-14 | 京东方科技集团股份有限公司 | Masking film plate and masking film plate module |
| CN201974631U (en) * | 2011-04-12 | 2011-09-14 | 京东方科技集团股份有限公司 | Mask plate and mask plate group |
| CN102483568A (en) * | 2009-06-25 | 2012-05-30 | Lg伊诺特有限公司 | Manufacturing method of half tone mask |
| CN102981356A (en) * | 2012-12-14 | 2013-03-20 | 京东方科技集团股份有限公司 | Method for reducing mask board splicing errors |
| CN104317094A (en) * | 2014-08-28 | 2015-01-28 | 京东方科技集团股份有限公司 | Black matrix structure, mask plate, color membrane substrate and display device |
| CN104570611A (en) * | 2013-10-21 | 2015-04-29 | 合肥京东方光电科技有限公司 | Mask plate and method for reducing splicing exposure mula phenomenon |
| CN105070719A (en) * | 2015-07-10 | 2015-11-18 | 深圳市华星光电技术有限公司 | Thin film transistor array substrate and manufacturing method thereof |
| CN205420527U (en) * | 2016-03-18 | 2016-08-03 | 合肥鑫晟光电科技有限公司 | Coating by vaporization mask slice and display substrates |
| CN106154631A (en) * | 2016-09-13 | 2016-11-23 | 合肥京东方光电科技有限公司 | A kind of mask plate, display base plate and preparation method thereof, display device |
| CN106444106A (en) * | 2016-10-24 | 2017-02-22 | 深圳市华星光电技术有限公司 | Mosaic area splicing method and system |
| CN106873240A (en) * | 2017-02-07 | 2017-06-20 | 深圳市华星光电技术有限公司 | Backlight assembly and liquid crystal display module |
-
2017
- 2017-06-23 CN CN201710496938.0A patent/CN107145034B/en active Active
Patent Citations (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030128309A1 (en) * | 2001-12-26 | 2003-07-10 | Chi Mei Electronics Corp | Liquid crystal display device and color filter substrate thereof |
| KR100719932B1 (en) * | 2006-02-24 | 2007-05-18 | 비오이 하이디스 테크놀로지 주식회사 | Liquid crystal display device |
| US20070291206A1 (en) * | 2006-06-20 | 2007-12-20 | Quanta Display Inc. | Methods of fabricating active device array substrate and fabricating color filter substrate |
| CN102483568A (en) * | 2009-06-25 | 2012-05-30 | Lg伊诺特有限公司 | Manufacturing method of half tone mask |
| CN102103323A (en) * | 2009-12-21 | 2011-06-22 | 北京京东方光电科技有限公司 | Half-tone mask plate and manufacturing method thereof |
| CN201974631U (en) * | 2011-04-12 | 2011-09-14 | 京东方科技集团股份有限公司 | Mask plate and mask plate group |
| CN201974632U (en) * | 2011-04-12 | 2011-09-14 | 京东方科技集团股份有限公司 | Masking film plate and masking film plate module |
| CN102981356A (en) * | 2012-12-14 | 2013-03-20 | 京东方科技集团股份有限公司 | Method for reducing mask board splicing errors |
| CN104570611A (en) * | 2013-10-21 | 2015-04-29 | 合肥京东方光电科技有限公司 | Mask plate and method for reducing splicing exposure mula phenomenon |
| CN104317094A (en) * | 2014-08-28 | 2015-01-28 | 京东方科技集团股份有限公司 | Black matrix structure, mask plate, color membrane substrate and display device |
| CN105070719A (en) * | 2015-07-10 | 2015-11-18 | 深圳市华星光电技术有限公司 | Thin film transistor array substrate and manufacturing method thereof |
| CN205420527U (en) * | 2016-03-18 | 2016-08-03 | 合肥鑫晟光电科技有限公司 | Coating by vaporization mask slice and display substrates |
| CN106154631A (en) * | 2016-09-13 | 2016-11-23 | 合肥京东方光电科技有限公司 | A kind of mask plate, display base plate and preparation method thereof, display device |
| CN106444106A (en) * | 2016-10-24 | 2017-02-22 | 深圳市华星光电技术有限公司 | Mosaic area splicing method and system |
| CN106873240A (en) * | 2017-02-07 | 2017-06-20 | 深圳市华星光电技术有限公司 | Backlight assembly and liquid crystal display module |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107703714A (en) * | 2017-09-26 | 2018-02-16 | 武汉华星光电技术有限公司 | A kind of manufacture method and light shield of the substrate of display |
| CN111323978A (en) * | 2020-04-08 | 2020-06-23 | Tcl华星光电技术有限公司 | Pixel unit, array substrate and display panel |
| CN111323978B (en) * | 2020-04-08 | 2021-03-16 | Tcl华星光电技术有限公司 | Pixel unit, array substrate and display panel |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107145034B (en) | 2020-11-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7692744B2 (en) | Liquid crystal display device having diffusion reflective electrodes and a manufacturing method thereof | |
| KR20100049518A (en) | Mask for photolithography, method of forming thin film, and method of producing the liquid crystal display device | |
| CN101324750A (en) | Light mask for liquid crystal display device and method for making colour filter using the same | |
| US10495920B2 (en) | Color filter substrate and method of manufacturing the same | |
| KR20000047768A (en) | Liquid Crystal Display Device and Method for Fabricating the Same | |
| US10365523B2 (en) | Display panel and manufacturing method based on BOA technology | |
| US6606137B2 (en) | Method of fabricating color filter using a single mask having plurality of patterns, each having different aperture ratios | |
| KR100190855B1 (en) | Color filter for lcd and method of fabricating the same | |
| CN106154631A (en) | A kind of mask plate, display base plate and preparation method thereof, display device | |
| CN108363233A (en) | Colored filter substrate and preparation method thereof | |
| JP2000075305A (en) | Color filter for liquid crystal display device and its production | |
| US6037084A (en) | Method of making a color filter plate with multi-gap for LCD | |
| KR100236613B1 (en) | Manufacturing method of black matrix in active matrix liquid crystal display device | |
| CN107145034A (en) | A kind of intermediate tone mask plate | |
| CN205992105U (en) | A kind of mask plate, display base plate and display device | |
| TW200807039A (en) | A color filter and a photomask used to manufacture it | |
| JP2000098126A (en) | Production of color filter | |
| JP2007010845A (en) | Pixel forming method and color filter | |
| KR101070796B1 (en) | Color filter substrate and Fabricating method of the same | |
| KR101082906B1 (en) | Display panel and method of manufacturing the same | |
| CN104199203B (en) | Liquid crystal display panel and method for manufacturing same | |
| CN106646990A (en) | Display substrate, preparation method thereof and display device | |
| WO2013021884A1 (en) | Method for producing liquid crystal panel, and liquid crystal panel | |
| JP4715337B2 (en) | Manufacturing method of color filter | |
| JP2009244523A (en) | Method of manufacturing color filter |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |