CN107123583A - A kind of film plating process of discharge tube - Google Patents
A kind of film plating process of discharge tube Download PDFInfo
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- CN107123583A CN107123583A CN201710355058.1A CN201710355058A CN107123583A CN 107123583 A CN107123583 A CN 107123583A CN 201710355058 A CN201710355058 A CN 201710355058A CN 107123583 A CN107123583 A CN 107123583A
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- Prior art keywords
- discharge tube
- film
- plating process
- alkoxide solution
- silanol
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Silicon Compounds (AREA)
- Chemically Coating (AREA)
Abstract
The invention discloses a kind of film plating process of discharge tube, including prepare silane mixed alkoxide solution；Discharge tube is completely immersed in into the silane mixed alkoxide solution；The discharge tube is at the uniform velocity lifted to the discharge tube upwards and leaves the silane mixed alkoxide solution completely, now, uniform fold has silanol film on the inside and outside wall of the discharge tube；Gradient increased temperature heating is carried out to the discharge tube covered with silanol film, the discharge tube with silicon dioxide film is obtained.The film plating process process of the present invention is simple, and film forming thickness is uniform, controllable and yields is high；And having plated the intensity increase of the discharge tube after film so that discharge tube also possesses small size while having high intensity, meets the use of microflash.
Description
Technical field
The present invention relates to a kind of film plating process of discharge tube, more particularly to a kind of flash lamp plated film side of miniature discharge tube
Method.
Background technology
In recent years, with the miniature requirement of the mobile phone to camera installation or with camera function, for being configured at it
On the flash lamp used as artificial light source also require that miniaturization.Therefore, the discharge tube in flash lamp needs to the greatest extent may be used
The high pressure of abrupt release is born in volume that can be small.
Conventional discharge tube critical piece is xenon lamp, and the bulb of xenon lamp is the glow discharge for filling low pressure xenon
Pipe.Xenon lamp is connected to an electric usable big capacity electrolyte capacitor of storage by one by the circuit arrangement of shutter control.It is flat
In the case of often, the electrochemical capacitor is charged in the presence of control circuit, and its voltage is identical with the voltage of camera battery.But
When being taken pictures, if opening flash lamp, meeting trigger flashing lamp control circuit starts when shutter is pressed, and control circuit produces high
Voltage lights xenon lamp, the electric energy meeting abrupt release then stored in electrochemical capacitor so that xenon lamp brightness steeply rises, also
Generate the effect of flash of light.
According to the use process of above-mentioned flash lamp, frequent multiple high voltage stimulus may result in discharge tube and produce breakage.
Now conventional method is that the intensity of discharge tube is improved by increasing discharge vessel wall thickness, but the increase of discharge tube pipe thickness
The increase of electric discharge pipe volume can be caused, and excessive electric discharge pipe volume is unfavorable for the use of small-sized image pickup flash device.
The content of the invention
Embodiment of the present invention is mainly solving the technical problems that provide a kind of film plating process of discharge tube, using the present invention
Discharge tube film plating process, can, yields high surfaces externally and internally in discharge tube uniform with simple to operate, film forming be respectively formed two
Silica diaphragm, so that the intensity of enhanced discharge pipe so that discharge tube also possesses small size while having high intensity, meets
The use of microflash.
In order to solve the above technical problems, the technical scheme that embodiment of the present invention is used is：A kind of discharge tube is provided
Film plating process, comprise the following steps：
S1, prepares silane mixed alkoxide solution；
S2, discharge tube is completely immersed in into the silane mixed alkoxide solution；
S3, the discharge tube is at the uniform velocity lifted to the discharge tube upwards and leaves the silane mixed alkoxide solution completely, this
When, uniform fold has silanol film on the inside and outside wall of the discharge tube；
S4, carries out gradient increased temperature heating to the discharge tube covered with silanol film, obtains with silicon dioxide film
Discharge tube.
In wherein some embodiments, the silane mixed alkoxide solution by mass percent for 8% positive silicic acid, 5%
Metasilicic acid, 50% alcohols solvent, 25.8% methyl acetate, 11% ethyl acetate and 0.2% phosphorus pentoxide it is mixed
Close and formed.
In wherein some embodiments, the alcohols solvent is in methanol, ethanol, isopropanol, n-butanol or propane diols
One or more mixing.
In wherein some embodiments, the pull rate in step S3 is 100-100000 μm/min.
In wherein some embodiments, the gradient increased temperature in step S4 is heated to be by 50 DEG C to 640 DEG C gradient liters
Temperature, the temperature of each gradient is kept 2 seconds to 120 minutes respectively.
In wherein some embodiments, step is also included between step S3 and step S4：Using air or inert gas
Discharge tube is dried up, with the silanol film formed on the inside and outside wall of discharge tube in drying steps S3.
The beneficial effect of embodiment of the present invention is：Film forming agent of the present invention, namely silane mixed alkoxide solution is
Mixed once is prepared, and process for preparation is simple；And the thickness of silanol film can be carried out by the change of the pull rate to discharge tube
Adjustment, so that the film forming thickness of final silicon dioxide film is uniform, controllable and yields is high.Using the plating of embodiment of the present invention
The silicon dioxide film that film method is carried out on the discharge tube of plated film, discharge tube can prevent electric discharge tracheal rupture caused by electric power input, i.e.,
Just electric discharge tracheal rupture has been formed, and silica coating can also prevent rupture from continuing to expand.Put because silicon dioxide film is strengthened
The intensity of fulgurite, in the case where there is identical luminous quantity with traditional uncoated discharge tube, the electric discharge with silicon dioxide film
Light has less volume, therefore photo flash equipment and the small volume of camera installation using the discharge tube, consequently facilitating
Carry.
Brief description of the drawings
Fig. 1 is the schematic diagram that plated film is carried out using the film plating process of the discharge tube of embodiment of the present invention.
Fig. 2 is the section signal that the discharge tube after plated film is carried out using the film plating process of the discharge tube of embodiment of the present invention
Figure.
Embodiment
The technical scheme in the embodiment of the present invention will be clearly and completely described below, it is clear that described implementation
Example only a part of embodiment of the invention, rather than whole embodiments.Based on the embodiment in the present invention, this area is common
The every other embodiment that technical staff is obtained under the premise of creative work is not made, belongs to the model that the present invention is protected
Enclose.
Unless otherwise defined, all of technologies and scientific terms used here by the article is with belonging to technical field of the invention
The implication that technical staff is generally understood that is identical.Term used in the description of the invention herein is intended merely to description tool
The purpose of the embodiment of body, it is not intended that in the limitation present invention.
Discharge tube in embodiment of the present invention is preferably glass tube, it is to be understood that if the discharge tube is not to use
In flash lamp, then the discharge tube can also be other materials, such as ceramics material.
The film plating process of the discharge tube of embodiment of the present invention comprises the following steps：
S1：Prepare silane mixed alkoxide solution.
Specifically, in embodiment of the present invention, the silane mixed alkoxide solution is by positive silicic acid, metasilicic acid, alcohols solvent, second
Sour methyl esters, ethyl acetate and phosphorus pentoxide are mixed to form, wherein the alcohols solvent is methanol, ethanol, isopropanol, n-butanol
Or one or more mixing in propane diols.
Further, the silane mixed alkoxide solution is preferably positive silicic acid, the 5% inclined silicon by mass percent for 8%
Acid, 50% alcohols solvent (methanol, ethanol, isopropanol, n-butanol, propane diols), 25.8% methyl acetate, 11% acetic acid
Ethyl ester and 0.2% phosphorus pentoxide are mixed to form.The silane mixed alkoxide solution being mixed to form using above-mentioned mass percent, can
So that the silanol film film forming formed in following step is uniform, yields is higher.
S2：Discharge tube is completely immersed in into the silane mixed alkoxide solution.
Referring to Fig. 1, in embodiment of the present invention, the silane mixed alkoxide solution 1 prepared in step S1 is placed in into container 3
In, container 3 is open containers, and discharge tube 2 is hollow tubular, and the openend of discharge tube 2 from container 3 is completely immersed in silanol mixing
In solution 1." being completely immersed in " described herein, refers to that all surface of the inner and outer wall of discharge tube 2 is mixed with silanol
Solution 1 is contacted.
S3：The discharge tube is at the uniform velocity lifted to the discharge tube upwards and leaves the silane mixed alkoxide solution completely, this
When, uniform fold has silanol film on the inside and outside wall of the discharge tube.
It is understood that to the different pull rate of the discharge tube, the silanol film of different-thickness can be obtained.
In embodiment of the present invention, in order that the even intensity of the discharge tube, employs and at the uniform velocity lift, and pull rate is preferably
100-100000 μm/min, so that the discharge tube for finally giving silica overlay film has suitable intensity, and ultimately form
The thickness of silica overlay film meets the requirement of small size, and then meets the use of microflash.
S4：Gradient increased temperature heating is carried out to the discharge tube covered with silanol film, obtained with silicon dioxide film
Discharge tube.
In embodiment of the present invention, the gradient increased temperature heating is preferably by 50 DEG C to 640 DEG C gradient increased temperatures, each gradient
Temperature keep respectively 2 seconds to 120 minutes.
Further, in embodiment of the present invention, the gradient increased temperature is preferably progressively to be warming up to 200 DEG C from 50 DEG C, then
Temperature is gradually heating to 300 DEG C, 450 DEG C, 550 DEG C and 640 DEG C, and kept for 2 seconds respectively according to demand in each gradient temperature
To 120 minutes.
Referring to Fig. 2, be the schematic cross-section of the discharge tube with silicon dioxide film finally given, can from figure
Go out, by step S4, equal uniform fold has silicon dioxide film 4 on the inside and outside wall surface of the discharge tube 2 finally given.
It can be drawn from the film plating process of the discharge tube of the invention described above embodiment, film forming of the present invention
Agent, namely silane mixed alkoxide solution are prepared for mixed once, and process for preparation is simple；And the thickness of silanol film can be by electric discharge
The change of the pull rate of pipe is adjusted, so that the film forming thickness of final silicon dioxide film is uniform, controllable and yields is high.
Carrying out the silicon dioxide film on the discharge tube of plated film, discharge tube using the film plating process of embodiment of the present invention can prevent
Only electric power input caused by electric discharge tracheal rupture, even if electric discharge tracheal rupture formed, silica coating can also prevent rupture after
It is continuous to expand.Because silicon dioxide film strengthens the intensity of discharge tube, there is identical luminous quantity with traditional uncoated discharge tube
In the case of, the discharging light with silicon dioxide film has less volume, therefore uses the photo flash equipment of the discharge tube
With the small volume of camera installation, consequently facilitating carry.
Can also include it is understood that in the film plating process of above-mentioned discharge tube, between step S3 and step S4 with
Lower step：
S3’：Discharge tube is dried up using air or inert gas, with the inside and outside wall of discharge tube in drying steps S3
The silanol film of formation.
In step S3 ', add and the silanol film in step S3 is dried in advance, so as to be used in subsequent step S4
Gradient increased temperature, enables silanol film reaction formation silicon dioxide film evenly and fully.
The film plating process of the discharge tube of embodiment of the present invention is described further with reference to specific embodiment, but this
The embodiment not limited to this of invention.
Embodiment 1
S1：The positive silicic acid, 5% metasilicic acid, 50% alcohols solvent that are 8% by mass percent are prepared in a reservoir
(methanol, ethanol, isopropanol, n-butanol, propane diols), 25.8% methyl acetate, 11% ethyl acetate and 0.2% five oxygen
Change the silane mixed alkoxide solution that two phosphorus are mixed to form.
S2：External diameter 1.5mm discharge tube is completely immersed in the silane mixed alkoxide solution into S1, and by the one of discharge tube
End is fixed on the fixture of pulling machine.
S3：Using pulling machine, discharge tube is subjected to lifting until whole discharge tube is complete upwards with 2000 μm/min speed
The silane mixed alkoxide solution is left entirely, now, one layer of silanol film of uniform fold on the inwall and outer wall of discharge tube.
S3’：Discharge tube is dried up with air, with the silanol formed on the inside and outside wall of discharge tube in drying steps S3
Film.
S4：The discharge tube is placed in high temperature furnace, 200 DEG C are progressively warming up to from 50 degree, 15 minutes are incubated；Again by temperature
300 DEG C are gradually heating to, 15 minutes are incubated；Temperature is warming up to 450 DEG C again, 15 minutes are incubated；Temperature is warming up to 550 by continuation
DEG C, it is incubated 90 seconds；640 DEG C are finally warming up to, 2 seconds is incubated, obtains the discharge tube with silicon dioxide film.
The thickness of the silicon dioxide film of the discharge tube obtained in embodiment 1 is measured and obtained, the silicon dioxide film
Thickness be about 0.08 μm.
Stroboscopic test is carried out under certain voltage to the discharge tube obtained in embodiment 1, to detect the strong of the discharge tube
Degree.In embodiment 1, it is 240V in voltage specification, when trigger voltage is 3.84KV, the discharge tube is undergone after 20000 stroboscopics,
Booster or light leakage phenomena are not produced.
Therefore, the discharge tube prepared using the method for embodiment 1 is in the case of coating film thickness is less, and its intensity is obtained
To enhancing.
Embodiment 2
S1：The positive silicic acid, 5% metasilicic acid, 50% alcohols solvent that are 8% by mass percent are prepared in a reservoir
(methanol, ethanol, isopropanol, n-butanol, propane diols), 25.8% methyl acetate, 11% ethyl acetate and 0.2% five oxygen
Change the silane mixed alkoxide solution that two phosphorus are mixed to form.
S2：External diameter 4mm discharge tube is completely immersed in the silane mixed alkoxide solution into S1, and by one end of discharge tube
It is fixed on the fixture of pulling machine.
S3：Using pulling machine, discharge tube is subjected to lifting until whole discharge tube is complete upwards with 2000 μm/min speed
The silane mixed alkoxide solution is left entirely, now, one layer of silanol film of uniform fold on the inwall and outer wall of discharge tube.
S3’：Discharge tube is dried up with air, with the silanol formed on the inside and outside wall of discharge tube in drying steps S3
Film.
S4：The discharge tube is placed in high temperature furnace, 200 DEG C are progressively warming up to from 50 DEG C, 120 minutes are incubated；Again by temperature
Degree is gradually heating to 300 DEG C, is incubated 15 minutes；Temperature is warming up to 450 DEG C again, 15 minutes are incubated；Temperature is warming up to by continuation
550 DEG C, it is incubated 90 seconds；640 DEG C are finally warming up to, 10 seconds is incubated, obtains the discharge tube with silicon dioxide film.
The thickness of the silicon dioxide film of the discharge tube obtained in embodiment 2 is measured and obtained, the silicon dioxide film
Thickness be about 0.08 μm.
Stroboscopic test is carried out under certain voltage to the discharge tube obtained in embodiment 2, to detect the strong of the discharge tube
Degree.In embodiment 2, it is 240V in voltage specification, when trigger voltage is 3.84KV, the discharge tube is undergone after 45000 stroboscopics,
Booster or light leakage phenomena are not produced.
Therefore, the discharge tube prepared using the method for embodiment 2 is in the case of coating film thickness is less, and its intensity is obtained
To enhancing.
Embodiment 3
S1：The positive silicic acid, 5% metasilicic acid, 50% alcohols solvent that are 8% by mass percent are prepared in a reservoir
(methanol, ethanol, isopropanol, n-butanol, propane diols), 25.8% methyl acetate, 11% ethyl acetate and 0.2% five oxygen
Change the silane mixed alkoxide solution that two phosphorus are mixed to form.
S2：External diameter 4mm discharge tube is completely immersed in the silane mixed alkoxide solution into S1, and by one end of discharge tube
It is fixed on the fixture of pulling machine.
S3：Using pulling machine, discharge tube is subjected to lifting until whole discharge tube is complete upwards with 1500 μm/min speed
The silane mixed alkoxide solution is left entirely, now, one layer of silanol film of uniform fold on the inwall and outer wall of discharge tube.
S3’：Discharge tube is dried up with air, with the silanol formed on the inside and outside wall of discharge tube in drying steps S3
Film.
S4：The discharge tube is placed in high temperature furnace, 550 DEG C are progressively warming up to from 50 degree, 20 seconds are incubated；It is warming up to again
640 DEG C, 20 seconds are incubated, the discharge tube with silicon dioxide film is obtained.
The thickness of the silicon dioxide film of the discharge tube obtained in embodiment 3 is measured and obtained, the silicon dioxide film
Thickness be about 0.11 μm.
Stroboscopic test is carried out under certain voltage to the discharge tube obtained in embodiment 3, to detect the strong of the discharge tube
Degree.In embodiment 3, it is 175V in voltage specification, when trigger voltage is 2.44KV, the discharge tube is undergone after 30000 stroboscopics,
Booster or light leakage phenomena are not produced.
Therefore, the discharge tube prepared using the method for embodiment 3 is in the case of coating film thickness is less, and its intensity is obtained
To enhancing.
Embodiment 4
The film plating process of the discharge tube of embodiment 4 is roughly the same with embodiment 1, and difference part is only that in embodiment 4
In step S3, discharge tube is subjected to lifting until whole discharge tube leaves silanol and mixed completely upwards with 3000 μm/min speed
Close solution.
The thickness of the silicon dioxide film of the discharge tube obtained in embodiment 4 is measured and obtained, the silicon dioxide film
Thickness be about 0.07 μm.
Stroboscopic test is carried out under certain voltage to the discharge tube obtained in embodiment 4, to detect the strong of the discharge tube
Degree.In embodiment 4, it is 240V in voltage specification, when trigger voltage is 3.84KV, the discharge tube is undergone after 20000 stroboscopics,
Booster or light leakage phenomena are not produced.
Therefore, the discharge tube prepared using the method for embodiment 4 is in the case of coating film thickness is less, and its intensity is obtained
To enhancing.
Embodiment 5
The film plating process of the discharge tube of embodiment 5 is roughly the same with embodiment 1, and difference part is only that in embodiment 5
In step S3, discharge tube is subjected to lifting until whole discharge tube leaves silanol and mixed completely upwards with 5000 μm/min speed
Close solution.
The thickness of the silicon dioxide film of the discharge tube obtained in embodiment 5 is measured and obtained, the silicon dioxide film
Thickness be about 0.06 μm.
Stroboscopic test is carried out under certain voltage to the discharge tube obtained in embodiment 5, to detect the strong of the discharge tube
Degree.In embodiment 5, it is 240V in voltage specification, when trigger voltage is 3.84KV, the discharge tube is undergone after 20000 stroboscopics,
Booster or light leakage phenomena are not produced.
Therefore, the discharge tube prepared using the method for embodiment 5 is in the case of coating film thickness is less, and its intensity is obtained
To enhancing.
Embodiment 6
The film plating process of the discharge tube of embodiment 6 is roughly the same with embodiment 1, and difference part is only that in embodiment 6
In step S3, discharge tube is subjected to lifting until whole discharge tube leaves silanol and mixed completely upwards with 7000 μm/min speed
Close solution.
The thickness of the silicon dioxide film of the discharge tube obtained in embodiment 6 is measured and obtained, the silicon dioxide film
Thickness be about 0.05 μm.
Stroboscopic test is carried out under certain voltage to the discharge tube obtained in embodiment 6, to detect the strong of the discharge tube
Degree.In embodiment 6, it is 240V in voltage specification, when trigger voltage is 3.84KV, the discharge tube is undergone after 20000 stroboscopics,
Booster or light leakage phenomena are not produced.
Therefore, the discharge tube prepared using the method for embodiment 6 is in the case of coating film thickness is less, and its intensity is obtained
To enhancing.
Embodiment 7
The film plating process of the discharge tube of embodiment 7 is roughly the same with embodiment 2, and difference part is only that in embodiment 7
In step S3, discharge tube is subjected to lifting until whole discharge tube leaves silanol and mixed completely upwards with 3000 μm/min speed
Close solution.
The thickness of the silicon dioxide film of the discharge tube obtained in embodiment 7 is measured and obtained, the silicon dioxide film
Thickness be about 0.07 μm.
Stroboscopic test is carried out under certain voltage to the discharge tube obtained in embodiment 7, to detect the strong of the discharge tube
Degree.In embodiment 7, it is 240V in voltage specification, when trigger voltage is 3.84KV, the discharge tube is undergone after 45000 stroboscopics,
Booster or light leakage phenomena are not produced.
Therefore, the discharge tube prepared using the method for embodiment 7 is in the case of coating film thickness is less, and its intensity is obtained
To enhancing.
Embodiment 8
The film plating process of the discharge tube of embodiment 8 is roughly the same with embodiment 2, and difference part is only that in embodiment 8
In step S3, discharge tube is subjected to lifting until whole discharge tube leaves silanol and mixed completely upwards with 5000 μm/min speed
Close solution.
The thickness of the silicon dioxide film of the discharge tube obtained in embodiment 8 is measured and obtained, the silicon dioxide film
Thickness be about 0.06 μm.
Stroboscopic test is carried out under certain voltage to the discharge tube obtained in embodiment 8, to detect the strong of the discharge tube
Degree.In embodiment 8, it is 240V in voltage specification, when trigger voltage is 3.84KV, the discharge tube is undergone after 45000 stroboscopics,
Booster or light leakage phenomena are not produced.
Therefore, the discharge tube prepared using the method for embodiment 8 is in the case of coating film thickness is less, and its intensity is obtained
To enhancing.
Embodiment 9
The film plating process of the discharge tube of embodiment 9 is roughly the same with embodiment 2, and difference part is only that in embodiment 9
In step S3, discharge tube is subjected to lifting until whole discharge tube leaves silanol and mixed completely upwards with 7000 μm/min speed
Close solution.
The thickness of the silicon dioxide film of the discharge tube obtained in embodiment 9 is measured and obtained, the silicon dioxide film
Thickness be about 0.05 μm.
Stroboscopic test is carried out under certain voltage to the discharge tube obtained in embodiment 9, to detect the strong of the discharge tube
Degree.In embodiment 9, it is 240V in voltage specification, when trigger voltage is 3.84KV, the discharge tube is undergone after 45000 stroboscopics,
Booster or light leakage phenomena are not produced.
Therefore, the discharge tube prepared using the method for embodiment 9 is in the case of coating film thickness is less, and its intensity is obtained
To enhancing.
Embodiments of the present invention are the foregoing is only, are not intended to limit the scope of the invention, it is every to utilize this
Equivalent structure or equivalent flow conversion that description of the invention content is made, or directly or indirectly it is used in other related technology necks
Domain, is included within the scope of the present invention.
Claims (6)
1. a kind of film plating process of discharge tube, it is characterised in that comprise the following steps：
S1, prepares silane mixed alkoxide solution；
S2, discharge tube is completely immersed in into the silane mixed alkoxide solution；
S3, the discharge tube is at the uniform velocity lifted to the discharge tube upwards and leaves the silane mixed alkoxide solution, now, institute completely
Stating uniform fold on the inside and outside wall of discharge tube has silanol film；
S4, carries out gradient increased temperature heating to the discharge tube covered with silanol film, obtains the electric discharge with silicon dioxide film
Pipe.
2. the film plating process of discharge tube according to claim 1, it is characterised in that the silane mixed alkoxide solution is by quality
Percentage is 8% positive silicic acid, 5% metasilicic acid, 50% alcohols solvent, 25.8% methyl acetate, 11% acetic acid second
Ester and 0.2% phosphorus pentoxide are mixed to form.
3. the film plating process of discharge tube according to claim 2, it is characterised in that the alcohols solvent be methanol, ethanol,
One or more mixing in isopropanol, n-butanol or propane diols.
4. the film plating process of discharge tube according to claim 1, it is characterised in that the pull rate in step S3 is 100-
100000μm/min。
5. the film plating process of discharge tube according to claim 1, it is characterised in that the gradient increased temperature in step S4 adds
Heat is that the temperature of each gradient is kept 2 seconds to 120 minutes respectively by 50 DEG C to 640 DEG C gradient increased temperatures.
6. the film plating process of discharge tube according to claim 1, it is characterised in that also include between step S3 and step S4
Step：Discharge tube is dried up using air or inert gas, with what is formed on the inside and outside wall of discharge tube in drying steps S3
Silanol film.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201710355058.1A CN107123583A (en) | 2017-05-19 | 2017-05-19 | A kind of film plating process of discharge tube |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201710355058.1A CN107123583A (en) | 2017-05-19 | 2017-05-19 | A kind of film plating process of discharge tube |
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ID=59727634
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62206761A (en) * | 1986-03-04 | 1987-09-11 | Stanley Electric Co Ltd | Flash discharging bulb |
| CN100401456C (en) * | 2001-02-19 | 2008-07-09 | 松下照相·照明株式会社 | Electric discharge tube, stroboscopic device using the tube, and camera |
| CN102062487A (en) * | 2010-12-27 | 2011-05-18 | 武汉力诺太阳能集团股份有限公司 | Solar heat collector glass tube and manufacturing method thereof |
| CN106140576A (en) * | 2014-12-09 | 2016-11-23 | 株式会社东芝 | Dip-coating keeps fixture and uses its dip coating system |
-
2017
- 2017-05-19 CN CN201710355058.1A patent/CN107123583A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62206761A (en) * | 1986-03-04 | 1987-09-11 | Stanley Electric Co Ltd | Flash discharging bulb |
| CN100401456C (en) * | 2001-02-19 | 2008-07-09 | 松下照相·照明株式会社 | Electric discharge tube, stroboscopic device using the tube, and camera |
| CN102062487A (en) * | 2010-12-27 | 2011-05-18 | 武汉力诺太阳能集团股份有限公司 | Solar heat collector glass tube and manufacturing method thereof |
| CN106140576A (en) * | 2014-12-09 | 2016-11-23 | 株式会社东芝 | Dip-coating keeps fixture and uses its dip coating system |
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Application publication date: 20170901 |