CN107056986A - A kind of chitosan-based high hydroscopic resin process for cleanly preparing - Google Patents
A kind of chitosan-based high hydroscopic resin process for cleanly preparing Download PDFInfo
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- CN107056986A CN107056986A CN201710201231.2A CN201710201231A CN107056986A CN 107056986 A CN107056986 A CN 107056986A CN 201710201231 A CN201710201231 A CN 201710201231A CN 107056986 A CN107056986 A CN 107056986A
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F251/00—Macromolecular compounds obtained by polymerising monomers on to polysaccharides or derivatives thereof
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08B—POLYSACCHARIDES; DERIVATIVES THEREOF
- C08B37/00—Preparation of polysaccharides not provided for in groups C08B1/00 - C08B35/00; Derivatives thereof
- C08B37/0006—Homoglycans, i.e. polysaccharides having a main chain consisting of one single sugar, e.g. colominic acid
- C08B37/0024—Homoglycans, i.e. polysaccharides having a main chain consisting of one single sugar, e.g. colominic acid beta-D-Glucans; (beta-1,3)-D-Glucans, e.g. paramylon, coriolan, sclerotan, pachyman, callose, scleroglucan, schizophyllan, laminaran, lentinan or curdlan; (beta-1,6)-D-Glucans, e.g. pustulan; (beta-1,4)-D-Glucans; (beta-1,3)(beta-1,4)-D-Glucans, e.g. lichenan; Derivatives thereof
- C08B37/0027—2-Acetamido-2-deoxy-beta-glucans; Derivatives thereof
- C08B37/003—Chitin, i.e. 2-acetamido-2-deoxy-(beta-1,4)-D-glucan or N-acetyl-beta-1,4-D-glucosamine; Chitosan, i.e. deacetylated product of chitin or (beta-1,4)-D-glucosamine; Derivatives thereof
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/44—Preparation of metal salts or ammonium salts
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Abstract
The invention discloses a kind of cleaning procedure that chitosan-based super absorbent resin is directly produced with chitin.After the technique is mixed by a small amount of high concentration highly basic with chitin powder, base molecule is forced to penetrate into inside crust crude granule with vacuum or Frozen-thawed cycled processing, chitin homogeneous phase solution is obtained after dilution, under low alkaline concentration different desacetylated degree chitosans solution is obtained by gentle homogeneous deacetylated processing, initiator, acrylic acid and crosslinking agent are directly added thereto, and chitosan-based high hydroscopic resin is obtained after standing polymerization through constant temperature.Using in deacetylated remaining base molecule and acrylic acid, product exists with form of hydrogels, is both discharged without Excess reagents, in turn simplify aftertreatment technology, can effectively mitigate environmental pollution, reduces production cost.
Description
Technical field
The present invention relates to macromolecule hydrogel field, and in particular to a kind of chitosan-based high hydroscopic resin clean manufacturing work
Skill.
Background technology
Chitosan is unique alkaline polysaccharide largely existed that the mankind have found so far, with good bio-compatible
Property, multiple biological activities and excellent physicochemical properties and machinability, chitosan-based material have been widely used in
The multiple fields such as biological medicine, physiological hygiene, food industry, chemical, textile printing and dyeing, agricultural, environmental protection.High hydroscopic resin is
A kind of new appropriately crosslinked material with three dimensional gell network structure, can not only absorb equivalent to itself dry weight hundreds of
Thousands of times of water, and the hydrogel formed after water absorption and swelling has good water-retaining property and weatherability, has been widely used
In fields such as agricultural, building, food, oil drilling, health care, environmental protection.Chitosan-based high hydroscopic resin not only has
The premium properties of traditional high hydroscopic resin, and with unique bacteriostasis property, pH value and ion responsitivity, drug carrying ability etc.,
There is extensive and important potential using value in medicine, health and nursing field.At present, the system of chitosan-based high hydroscopic resin
Preparation Method has polymerisation in solution, inverse suspension polymerization, microwave radiation technology polymerization, ATRP and reversible addition-fracture
Chain tra nsfer radical polymerization technique etc., but the laboratory research stage is in mostly.It is general by deacetylation be more than 55% can be molten
It is considered as chitosan in the soluble chitin of 1% hydrochloric acid or acetic acid, but in nature, the amount of chitosan is considerably less, mainly
It is to be widely present in the form of its precursor chitin in the fungal cell such as the arthropods such as shrimp, crab, insect and mushroom, aspergillus.
The production of chitosan mainly carries out deacetylated processing using high concentration alkali to chitin, although production technology is highly developed,
But need to chitin be up to 10h deacetylated processing at 90 DEG C with the 45-50% of 10 times of volumes NaOH solution, not only
Energy consumption is big, the time is long, and only very small amount NaOH is used to participate in deacetylation, and substantial amounts of NaOH discharges not only cause resource
Waste, and bring serious environmental pollution.How making full use of resource and mitigating environmental pollution is vast chemist weight
One of problem of point concern.
The content of the invention
The technical problems to be solved by the invention are：Propose that one kind is directly synthesized with chitosan-based using chitin as raw material
The pH response high hydroscopic resin synthesis techniques of super absorbent resin excellent properties, to meet resource-conserving, environment-friendly type industry
Metaplasia production needs.
The technical solution used in the present invention is：
A kind of chitosan-based high hydroscopic resin process for cleanly preparing, the technique is accomplished by the following procedure：
（1）Pretreatment of raw material：1 parts by weight chitin powder is scattered in 3-7 parts by weight 25-45wt% strong base solutions, by freezing
Melt circular treatment, force strong base solution to penetrate into inside crust crude granule；
（2）The preparation of alkali chitin solution：To step（1）20-40 parts by weight are added in pretreated alkali chitin mixture
Pure water, is directly used using or by the homogeneous deacetylated chitosan solution that is made；
（3）Constant temperature stands polymerization：To step（2）0.075-0.1 is directly added into the chitin solution or chitosan solution of acquisition
Parts by weight initiator ammonium persulfate, 10-14 parts by weight of acrylic acid and a certain amount of crosslinking agent, are placed in 60-75 DEG C of water bath with thermostatic control anti-
2-7h is answered, white or transparent aquagel is obtained；
（4）The drying of high hydroscopic resin：A small amount of ethanol is added in the hydrogel obtained one step up, the gel being cut into small pieces is prevented
Adhesion again, forced air drying in 50-70 DEG C of baking oven is placed in by gel piece, obtains chitosan-based high hydroscopic resin.
Further, the strong base solution is one kind in LiOH, NaOH and KOH.
Further, the cryogenic temperature of Frozen-thawed cycled processing is -15~-25 DEG C, is thawed using naturally to thaw, water bath with thermostatic control
One kind in defrosting, autoclaving or microwave thawing.
Further, described Frozen-thawed cycled before processing by chitin and highly basic mixture in -0.9MPa vacuum drying ovens
Room temperature 2h.
Further, by controlling the deacetylated of thawing mode, thawing time or homogeneous disposal time control chitin
Degree.
Further, crosslinking agent is 0.02 parts by weight N, N '-methylene-bisacrylamide, 0.075 parts by weight ethylenediamine tetraacetic
Acetic acid disodium or 1 parts by weight sodium acetate.
Further, acrylic acid is removed by filtration after sediment and is directly added into chitosan solution, utilizes deacetylated residue
Alkali it is neutralized, it is not necessary to add alkali in addition, control the acrylic acid degree of neutralization to be according to the usage amount of alkali during Feedstock treating
30-80%。
Further, for prevent adhesion add ethanol reused after filtering and distillation recovery.
The beneficial effects of the invention are as follows：
1）High concentration alkali chitin mixture is handled using forced penetration, had both ensured that highly basic molecule infiltration entered in crust crude granule
Portion, meets deacetylated needs, and 50% of the not enough traditional handicraft of highly basic usage amount in base amount, the present invention can be substantially reduced again.
2）Chitin is handled using forced penetration, while chitin deacetylase, forming alkalization chitin can be directly molten
Yu Shuizhong.
3）Gentle deacetylated processing, the chitosan dissolving of acquisition are further carried out to alkalization chitin under homogeneous phase condition
Performance is more preferable.
4）Acrylic acid directly reacts with chitosan-aqueous slkali, using in deacetylated remaining alkali and acrylic acid, it is not necessary to add
Plus extra alkali is neutralized to acrylic acid, technique is both simplified, and is discharged without unnecessary alkali lye, environmental pollution is reduced.
5）Reaction is completed under homogeneous phase condition, it is only necessary to static state insulation, it is not necessary to stir, reduce energy consumption.
6）Reaction product exists with gel form, and no excess of solvent discharge, aftertreatment technology is simple, reduces and is processed into
This.
Brief description of the drawings
Fig. 1 is a kind of process flow diagram of chitosan-based high hydroscopic resin process for cleanly preparing of the present invention；
Fig. 2 is that chitosan-based high hydroscopic resin soaks different time in 0.1mol/L HCl and 3.5mmol/L NaOH respectively
Water absorption rate；
Fig. 3 is that chitosan-based super absorbent resin soaks different number of times in 0.1mol/L HCl and 3.5mmol/L NaOH respectively
Water absorption rate；
Fig. 4 is the water absorption rate that chitosan-based super absorbent resin soaks different number of times in 0.1mol/L HCl and pure water respectively.
Embodiment
The embodiment to the present invention is described in detail below in conjunction with the accompanying drawings.
Embodiment 1：
Flow according to Fig. 1, weighs 1 parts by weight of powder chitin, adds 4 parts by weight 40wt% NaOH solutions, and stirring is equal
Freeze overnight in -18 DEG C of refrigerators is put into after even, takes out in the bath that discharges water and thaws, continues freeze/thaw processing twice, pressure NaOH oozes
Penetrate into inside crust crude granule, add and chitin solution is obtained after 20 parts by weight of purified water, stirring and dissolving；Directly into the solution
It is separately added into 12 parts by weight of acrylic acid（AA）, 0.1 parts by weight ammonium persulfate（APS）With 0.02 parts by weight N, N '-di-2-ethylhexylphosphine oxide third
Acrylamide（MBA）, 65 DEG C of water-baths are placed in after stirring and stand reaction 5h；The gel formed after reaction is cut into small pieces, added
A small amount of absolute ethyl alcohol prevents gel adhesion again, and gel piece is placed in into 65 DEG C of forced air drying 12h, 15 parts by weight super absorbent resins are obtained
Fat.
Water absorbent rate in pure water, running water, physiological saline and artificial urine is respectively 981 ± 25,510 ± 15,86 ± 2
With 95 ± 1g/g；As shown in Fig. 2 it is 14 ± 2g/g that water absorption rate after 2h is soaked in 0.1mol/L HCl；Directly 3 are soaked with pure water
Secondary, each 6h, water absorption rate is 420 ± 38g/g, if directly with 3.5mmol/L NaOH immersion about 15h, water absorption rate for 646 ±
16g/g；As shown in figure 3, not soaked even more than after HCl-NaOH circulation immersions 10 times, then with distilled water immersion water absorption rate
Before, up to 1145 ± 10g/g, resin has obvious pH value response.
Embodiment 2：
1 parts by weight of powder chitin is weighed, 4 parts by weight 40wt%NaOH solution is added, is put into after stirring in -18 DEG C of refrigerators
Freeze overnight, is taken out in the bath that discharges water and thaws, and continues freeze/thaw processing twice, and pressure NaOH is penetrated into crust crude granule
Portion, adds and chitin solution is obtained after 20 parts by weight of purified water, stirring and dissolving；Chitin solution is placed 4 days in room temperature；Directly to
12 parts by weight of acrylic acid are separately added into the solution（AA）, 0.1 parts by weight ammonium persulfate（APS）With 0.02 parts by weight N, N '-Asia
Bisacrylamide（MBA）, 65 DEG C of water-baths are placed in after stirring and stand reaction 5h；The gel formed after reaction is cut into small
Block, adding a small amount of absolute ethyl alcohol prevents gel adhesion again, and gel piece is placed in into 65 DEG C of forced air drying 12h, 15 parts by weight are obtained
High hydroscopic resin；Water absorbent rate in pure water, running water, physiological saline and artificial urine is respectively 1395 ± 22,340 ± 16,
76 ± 7 and 86 ± 2g/g；After HCl-NaOH circulation immersions 10 times, water absorption rate remains to reach 383 ± 1g/g.
Embodiment 3：
1 parts by weight of powder chitin is weighed, 4 parts by weight 40wt%NaOH solution is added, is put into after stirring in -18 DEG C of refrigerators
Freeze overnight, is taken out in the bath that discharges water and thaws, and continues freeze/thaw processing twice, and pressure NaOH is penetrated into crust crude granule
Portion, adds and chitin solution is obtained after 20 parts by weight of purified water, stirring and dissolving；Chitin solution is placed 10 days in room temperature；Directly
12 parts by weight of acrylic acid are separately added into the solution（AA）, 0.1 parts by weight ammonium persulfate（APS）With 0.02 parts by weight N, N '-
Methylene-bisacrylamide（MBA）, 65 DEG C of water-baths are placed in after stirring and stand reaction 5h；The gel formed after reaction is cut into
Fritter, adding a small amount of absolute ethyl alcohol prevents gel adhesion again, and gel piece is placed in into 65 DEG C of forced air drying 12h, 15 weight are obtained
Part high hydroscopic resin；Water absorbent rate in pure water, running water, physiological saline and artificial urine is respectively 2150 ± 32,530 ± 4,
86 ± 2 and 90 ± 3g/g, after HCl-NaOH circulation immersions 10 times, water absorption rate remains to reach 489 ± 52g/g.
Embodiment 4：
1 parts by weight of powder chitin is weighed, 4 parts by weight 40wt%NaOH solution is added, is put into after stirring in -18 DEG C of refrigerators
Freeze overnight, is taken out in the bath that discharges water and thaws, and continues freeze/thaw processing twice, and pressure NaOH is penetrated into crust crude granule
Portion, adds and chitin solution is obtained after 20 parts by weight of purified water, stirring and dissolving；Chitin solution is placed 2 days in 35 DEG C；Directly to
12 parts by weight of acrylic acid are separately added into the solution（AA）, 0.1 parts by weight ammonium persulfate（APS）With 0.02 parts by weight N, N '-Asia
Bisacrylamide（MBA）, 65 DEG C of water-baths are placed in after stirring and stand reaction 4h；The gel formed after reaction is cut into small
Block, adding a small amount of absolute ethyl alcohol prevents gel adhesion again, and gel piece is placed in into 65 DEG C of forced air drying 12h, 15 parts by weight are obtained
High hydroscopic resin；Water absorbent rate in pure water, running water, physiological saline and artificial urine is respectively 2182 ± 45,557 ± 9,91
± 2 and 90 ± 1g/g.
Embodiment 5：
1 parts by weight of powder chitin is weighed, 5 parts by weight 40wt%NaOH solution is added, is put into after stirring in -15 DEG C of refrigerators
Freeze overnight, is taken out in the bath that discharges water and thaws, and continues freeze/thaw processing twice, and pressure NaOH is penetrated into crust crude granule
Portion, adds and chitin solution is obtained after 20 parts by weight of purified water, stirring and dissolving；14 parts by weight third are directly separately added into the solution
Olefin(e) acid（AA）, 0.1 parts by weight ammonium persulfate（APS）With 0.075 parts by wt EDTA-disodium（EDTA）, after stirring
It is placed in 70 DEG C of water-baths and stands reaction 3h；The gel formed after reaction is cut into small pieces, adding a small amount of absolute ethyl alcohol prevents gel again
Secondary adhesion, 65 DEG C of forced air drying 12h are placed in by gel piece, obtain 16 parts by weight high hydroscopic resins；As shown in figure 4, in pure water
Water absorbent rate be 1136 ± 34g/g, after HCl circulation immersions 10 times, water absorption rate remains to reach 270 ± 15g/g in pure water.
Embodiment 6：
1 parts by weight of powder chitin is weighed, 2.67 parts by weight NaOH are added, 4 parts by weight of purified water are added, room temperature is placed 1 day, cold
Jelly/defrosting processing once, obtains chitin solution after adding the dissolving of 40 parts by weight of purified water, is directly separately added into 10 into the solution
Parts by weight of acrylic acid（AA）, 0.1 parts by weight ammonium persulfate（APS）With 1 parts by weight sodium acetate, 70 DEG C of water-baths are placed in after stirring
Stand reaction 2h；The gel formed after reaction is cut into small pieces, adding a small amount of absolute ethyl alcohol prevents gel adhesion again, by gel
Block is placed in 65 DEG C of forced air drying 12h, obtains 7 parts by weight high hydroscopic resins；As shown in figure 4, the water absorbent rate in pure water is
1157g/g, after HCl soaks 1 time, water absorption rate is 367g/g in pure water, after HCl circulation immersions 10 times, is inhaled in pure water
Water rate remains to reach 170 ± 22g/g.
Embodiment 7：
1 parts by weight of powder chitin is weighed, 6 parts by weight 35wt%NaOH solution is added, is put into after stirring in -25 DEG C of refrigerators
Freeze overnight, taking-up, which is put into micro-wave oven, thaws 5 minutes, adds and chitin solution is obtained after 20 parts by weight of purified water, stirring and dissolving；
10 parts by weight of acrylic acid are directly separately added into the solution（AA）, 0.075 parts by weight ammonium persulfate（APS）With 0.02 parts by weight
N, N '-methylene-bisacrylamide（MBA）, 65 DEG C of water-baths are placed in after stirring and stand reaction 5h；It is solidifying by what is formed after reaction
Glue is cut into small pieces, and adding a small amount of absolute ethyl alcohol prevents gel adhesion again, and gel piece is placed in into 65 DEG C of forced air drying 12h, 9 are obtained
Parts by weight high hydroscopic resin；Water absorbent rate in pure water is 769 ± 19g/g.
Embodiment 8：
Weigh 1 parts by weight of powder chitin, add 2.67 parts by weight NaOH, add 4 parts by weight of purified water, after stirring-
Room temperature 2h in 0.9MPa vacuum drying ovens, is then placed in freeze overnight in -18 DEG C of refrigerators, takes out in the bath that discharges water and thaws, continues
Freeze/thaw processing once, forces NaOH to penetrate into inside crust crude granule, adds after 25 parts by weight of purified water, stirring and dissolving
Obtain chitin solution；Chitin solution is placed 1 day in 25 DEG C；Directly acrylic acid is separately added into the solution（AA）, mistake
Ammonium sulfate（APS）With parts by weight N, N '-methylene-bisacrylamide（MBA）, 65 DEG C of water-baths are placed in after stirring and stand reaction
5h；The gel formed after reaction is cut into small pieces, adding a small amount of absolute ethyl alcohol prevents gel adhesion again, and gel piece is placed in into 65
DEG C forced air drying 12h, obtains high hydroscopic resin, the chemical feeding quantity and product water absorbent rate relative to every parts by weight chitin are listed in table
In lattice.
General principle, principal character and the advantages of the present invention of the present invention has been shown and described above.The present invention is not by upper
State the limitation of embodiment, merely illustrating the principles of the invention described in above-described embodiment and specification is not departing from the present invention
Various changes and modifications of the present invention are possible on the premise of spirit and scope, and these changes and improvements both fall within claimed sheet
In the range of invention.The claimed scope of the invention is defined by appended claims and its equivalent.
Claims (8)
1. a kind of chitosan-based high hydroscopic resin process for cleanly preparing, it is characterised in that the technique is to have come through the following steps
Into：
（1）Pretreatment of raw material：1 parts by weight chitin powder is scattered in 3-7 parts by weight 25-45wt% strong base solutions, by freezing
Melt circular treatment, force strong base solution to penetrate into inside crust crude granule；
（2）The preparation of alkali chitin solution：To step（1）20-40 parts by weight are added in pretreated alkali chitin mixture
Pure water, is directly used using or by the homogeneous deacetylated chitosan solution that is made；
（3）Constant temperature stands polymerization：To step（2）0.075-0.1 is directly added into the chitin solution or chitosan solution of acquisition
Parts by weight initiator ammonium persulfate, 10-14 parts by weight of acrylic acid and a certain amount of crosslinking agent, are placed in 60-75 DEG C of water bath with thermostatic control anti-
2-7h is answered, white or transparent aquagel is obtained；
（4）The drying of high hydroscopic resin：A small amount of ethanol is added in the hydrogel obtained one step up, the gel being cut into small pieces is prevented
Adhesion again, forced air drying in 50-70 DEG C of baking oven is placed in by gel piece, obtains chitosan-based high hydroscopic resin.
2. a kind of chitosan-based high hydroscopic resin process for cleanly preparing as claimed in claim 1, it is characterised in that the highly basic
Solution is one kind in LiOH, NaOH and KOH.
3. a kind of chitosan-based high hydroscopic resin process for cleanly preparing as claimed in claim 1, it is characterised in that Frozen-thawed cycled
The cryogenic temperature of processing is -15~-25 DEG C, is thawed using in naturally to thaw, water bath with thermostatic control defrosting, autoclaving or microwave thawing
One kind.
4. a kind of chitosan-based high hydroscopic resin process for cleanly preparing as described in claim 1 or 3, it is characterised in that described
Frozen-thawed cycled before processing by chitin and highly basic mixture room temperature 2h in -0.9MPa vacuum drying ovens.
5. a kind of chitosan-based high hydroscopic resin process for cleanly preparing as claimed in claim 1, it is characterised in that pass through control
The deacetylation of thawing mode, thawing time or homogeneous disposal time control chitin.
6. a kind of chitosan-based high hydroscopic resin process for cleanly preparing as claimed in claim 1, it is characterised in that crosslinking agent is
0.02 parts by weight N, N '-methylene-bisacrylamide, 0.075 parts by wt EDTA-disodium or 1 parts by weight sodium acetate.
7. a kind of chitosan-based high hydroscopic resin process for cleanly preparing as claimed in claim 1, it is characterised in that acrylic acid is passed through
It is filtered to remove after sediment and is directly added into chitosan solution, it is neutralized using deacetylated remaining alkali, it is not necessary to is another
Outer addition alkali, controls acrylic acid degree of neutralization to be 30-80% according to the usage amount of alkali during Feedstock treating.
8. a kind of chitosan-based high hydroscopic resin process for cleanly preparing as claimed in claim 1, it is characterised in that to prevent from gluing
The ethanol even added is reused after filtering and distillation recovery.
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| CN107446066A (en) * | 2017-10-10 | 2017-12-08 | 福建师范大学 | The preparation method of water soluble chitosan |
| CN107955099A (en) * | 2017-12-26 | 2018-04-24 | 安徽省东乾食品有限公司 | A kind of preparation method of the absorbing membrane based on vegetable and fruit packaging |
| CN108219070A (en) * | 2017-12-29 | 2018-06-29 | 中国科学院海洋研究所 | A kind of novel salt tolerant super absorbent resin and preparation method thereof |
| CN112321749A (en) * | 2020-11-23 | 2021-02-05 | 池州学院 | Neutral chitin capable of being directly dissolved in alkali liquor and preparation method thereof |
| CN112390910A (en) * | 2020-11-30 | 2021-02-23 | 池州学院 | Preparation method of super absorbent resin without chemical cross-linking agent |
| CN112592431A (en) * | 2020-12-16 | 2021-04-02 | 陈凤春 | Degradable cellulose grafted acrylic acid-based high-water-absorptivity hydrogel and preparation method thereof |
| CN113663654A (en) * | 2021-08-09 | 2021-11-19 | 江苏大学 | Preparation method of modified biomass charcoal composite chitosan-based adsorbent |
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| CN112390910A (en) * | 2020-11-30 | 2021-02-23 | 池州学院 | Preparation method of super absorbent resin without chemical cross-linking agent |
| CN112592431A (en) * | 2020-12-16 | 2021-04-02 | 陈凤春 | Degradable cellulose grafted acrylic acid-based high-water-absorptivity hydrogel and preparation method thereof |
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