CN107043925B - Molded article having functional layer, method for producing same, and use thereof - Google Patents

Molded article having functional layer, method for producing same, and use thereof Download PDF

Info

Publication number
CN107043925B
CN107043925B CN201610816001.2A CN201610816001A CN107043925B CN 107043925 B CN107043925 B CN 107043925B CN 201610816001 A CN201610816001 A CN 201610816001A CN 107043925 B CN107043925 B CN 107043925B
Authority
CN
China
Prior art keywords
plasma
gas
molded article
range
precursor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201610816001.2A
Other languages
Chinese (zh)
Other versions
CN107043925A (en
Inventor
迈克尔·赛恩福鲁克
马雷克·马勒卡
罗伯特·马古尼亚
佛罗莱恩·埃德尔
妮娜·柏盖
菲利克斯·诺图马斯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lisa Draexlmaier GmbH
Original Assignee
Lisa Draexlmaier GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lisa Draexlmaier GmbH filed Critical Lisa Draexlmaier GmbH
Publication of CN107043925A publication Critical patent/CN107043925A/en
Application granted granted Critical
Publication of CN107043925B publication Critical patent/CN107043925B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26Deposition of carbon only
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • C23C16/401Oxides containing silicon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/515Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/62Plasma-deposition of organic layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/08Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain an anti-friction or anti-adhesive surface

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

The invention relates to a molded article, the surface of which is at least partially covered by a functional layer, to a method for producing the molded article, and to the use thereof; the invention further relates to a system, in particular a tool, comprising a moulding according to the invention, which has an increased stability against wear forces.

Description

Molded article having functional layer, method for producing same, and use thereof
Technical Field
The invention relates to a molded part whose surface is at least partially covered with a functional layer, to a method for producing said molded part, and to the use thereof; in particular the invention relates to a tool coated with a plasma polymer functional layer having a counteracting effect on the adhesion of adhesives such as so-called hot melt adhesives and dispersion adhesives. The invention further relates to a system, in particular a tool, with increased stability against frictional forces.
Background
Molded articles or target parts having plasma polymer functional layers are known in the art. A target part made of silver, which has a so-called plasma coating, is already described in german patent document DE 4216999 a 1.
Due to the gradual change of the process parameters, the coating has a layer structure comprising a coupling layer, a permeation barrier and a hard, scratch-resistant surface seal.
For producing the scratch-resistant layer, a mixture of oxygen and Hexamethyldisiloxane (HMDSO) is used.
Furthermore, a method for producing thin, strong hydrophobic polymeric layers by means of plasma polymerization is disclosed in german patent document DE 19543133 a 1. It is pointed out that vinylmethylsilane and vinyltrimethoxysilane as monomers are used for the plasma polymerization, they are monomers having at least one group which is low in affinity for oxygen, and they are capable of plasma polymerization with the structure being maintained as much as possible.
The monomer may be added with a gas incapable of polymerization, such as an inert gas, nitrogen gas or hydrogen gas, as an auxiliary gas or a carrier gas. Such an auxiliary or carrier gas is advantageous for improving the uniformity of the plasma and increasing the pressure in the gas phase.
A disadvantage of the coating disclosed in DE 19543133 is in particular that it is easily removable from the substrate as described above.
Furthermore, german patent document DE 19748240 a1 describes a method for the corrosion-resistant coating of a metal substrate by means of plasma polymerization, wherein the metal substrate is first mechanically, chemically and/or electrochemically polished in a first pretreatment step and plasma activated in a second process step before the plasma-polymerized coating is applied.
Hydrocarbon compounds and/or organosilicon compounds are disclosed as the main constituents of the plasma polymers, with particular preference being emphasized by the use of hexamethyldisiloxane and hexamethylcyclotrisiloxane.
Hexamethyldisiloxane is used in the examples in the above patent documents, in which oxygen or nitrogen can be mixed as an additional or auxiliary gas.
Detailed information such as the ratio of monomer to oxygen cannot be inferred in the above document. Furthermore, this patent document does not disclose how to apply the plasma polymerized coating or on which substrate the plasma polymerized coating is applied in order to be able to obtain a surface which is particularly easy to clean.
Disclosure of Invention
The object of the present invention is to provide a molded part, in particular a tool, with a functional layer, i.e. with a functional coating, the coating of which has anti-adhesive properties, in particular with respect to adhesives, for example with respect to so-called hot-melt adhesives or dispersion adhesives, and also corrosion-resistant properties, so that the downtime for cleaning (removal of adhering residues) or for replacement of damaged or worn tools in industrial production can be minimized, as well as a method for producing such a molded part with a functional coating.
The object is solved by a molded part which can be produced by the following method:
i. introducing and positioning the substrate or the molded part in an ADP (atmospheric pressure plasma) system, an NP (low pressure plasma) system or in a PACVD (plasma activated chemical vapor deposition) system;
treating the coated molded article under plasma conditions of each selected plasma such that a non-adherent coating having abrasion resistance is formed at least on at least a portion of the surface of the substrate/molded article.
In recent years, plasma technology has been established in almost all technical fields. Accordingly, a wide range of prior art is known in part for various embodiments. In addition to the fine purification and activation of the surface, in particular for the adjustment of the surface properties, plasma technology is also suitable for the coating of surfaces, for example for the coating of hydrophilic or hydrophobic layers, friction-reducing layers or barrier layers. The latter use is particularly important for solving the above-mentioned objects of the invention, with regard to the coating of components or workpieces of different kinds (substrates).
The plasma-assisted coating process according to the invention can be carried out in particular on the basis of three different process variants, including the low-pressure process (low-pressure plasma NP), the atmospheric-pressure process (atmospheric-pressure plasma ADP) and the so-called PACVD (plasma-activated chemical vapor deposition) process.
In the case of the low-pressure method, the gas is excited in a vacuum by an energy supply, for example by UV radiation. Thereby, in addition to electrons or other reactive particles, energetic ions forming a plasma are generated. This glow discharge type of low pressure plasma is used for coating. Here, a dispersed gas discharge (dispersion Gasendlaugen) in the range from 50 to 1000mm (Ausdehnnung) is generated in a pressure range from 1 to 100 Pa. Arc discharge is applied in a wide pressure range from low pressure to normal pressure, and is generally suitable for producing localized plasmas in the range of a few millimeters (ausdehnnung). Through these hot zones, either the gas to be treated is circulated for the conversion of the gas or energy is transported from the arc to the treatment zone by means of working gas jets (see variants at atmospheric pressure). When the reactive gas is supplied, the reactive gas decomposes in the discharge region and layer deposition occurs on the surface in the ambient environment, which may belong to the workpiece. The ionized gas chemically reacts with the surface of the substrate. Thus, the surface can be effectively conditioned or coated.
In the case of atmospheric variants, the gas is excited by means of a high pressure at ambient pressure, so that the plasma is ignited. The plasma is discharged from the nozzle under the application of compressed air.
By varying process parameters, such as the process rate and the distance from the substrate surface, as in the case of low-pressure processes, the process results may be influenced in different directions.
In the case of generating plasma in the atmospheric pressure range, barrier discharge or corona discharge is mainly used, which allows non-thermal energy distribution to be generated despite high collision frequency between electrons and heavy particles. In the case of barrier discharges, energy is introduced during a short time window of about 5-50ns by the automatic stopping of the discharge, while the corona discharge generates a very inhomogeneous electric field by means of a tip electrode (spitzer Elektroden) or a tank electrode (kantiger Elektroden). In both cases, the electrodes are energized only briefly, so that only a small number of collisions can occur.
Plasma-enhanced chemical vapor deposition-PACVD (PECVD) is a special form of Chemical Vapor Deposition (CVD), in which case chemical deposition is supported by a plasma. The plasma can be ignited directly at the substrate to be coated (direct plasma process) or in a separate chamber (remote plasma process). In CVD, molecules of the reaction gas are decomposed (spalled) by externally applied heat and a subsequent energy release of the chemical reaction takes place, whereas in PECVD, this task is taken up by accelerated electrons in the plasma. In addition to the radicals formed in this way, ions are also generated in the plasma, which together with the radicals cause the deposition of a layer on the substrate. The gas temperature in the plasma therefore generally rises only by a few hundred degrees celsius, so that it is also possible to coat heat-sensitive materials compared to CVD.
In the case of the direct plasma method, a strong electric field is established between the substrate to be coated and the counter electrode, by means of which field the plasma is ignited. In the case of the remote plasma method, the plasma is arranged without direct contact with the substrate. The advantage of selective stimulation of the individual components of the process gas mixture is thereby achieved and the probability of plasma damage to the substrate surface is reduced by the ions. It is also possible to inductively/capacitively generate plasma by transforming the radiation of an electromagnetic field
Within the framework of the invention, low-pressure plasmas or atmospheric plasmas are used in the given embodiment variants, atmospheric plasmas being preferred. Such a plasma may be present AS a commercially available device for plasma treatment, for example the plasma processor device AS 400(Plasmatreater AS 400) of the manufacturer pusima plasma treatment limited (statnarhagen GmbH, steinhagen (de)) of staunto, germany.
In the case of plasma polymerization, under the current control conditions, gaseous organic precursor compounds (precursor monomers) in the process chamber are first activated by the plasma. The ionized molecules produced by the activation have formed the first molecular fragments in the form of clusters or chains in the gas phase. Subsequent condensation of these fragments on the substrate surface leads to polymerization under the influence of substrate temperature, electron impact and ion impact and ultimately to the formation of a sealing layer.
It has surprisingly been found that, preferably in the case of the use of hydrocarbons and/or siloxanes as precursors, by means of plasma treatment of the moldings, it is possible to obtain coatings on the moldings used which have the desired adhesive counteraction with respect to adhesives, in particular hot-melt adhesives and dispersion adhesives, and which help the coated workpieces to obtain an increased protection against abrasive forces.
In this case, preferred among the above-mentioned hydrocarbon precursors are short-chain (1 to 10 carbon atoms) saturated or unsaturated hydrocarbons, among which methane, ethane and acetylene (acetylene) are particularly preferred.
Furthermore, preferred among the hydrocarbons are halogenated hydrocarbons, in particular saturated or unsaturated, cyclic fluorinated hydrocarbons, such as hexafluoroethane. Furthermore, octafluorocyclobutane and perfluorocyclopentene are particularly preferable as the cyclic hydrocarbon.
In the case of siloxane, poly (dimethylsiloxane) is preferred, including cyclosiloxanes such as hexamethylcyclotrisiloxane. Hexamethyldisiloxane is particularly preferred in the case of poly (dimethylsiloxane).
Mixtures of the above precursors can also be used.
Depending on the precursors used, it may be advantageous to heat the substrate, i.e. the molding or the tool, during coating.
The use of gases as process gases or ionized gases is likewise known from the prior art. They include gases such as argon, oxygen and/or nitrogen or inert gases, or gas mixtures such as air or compressed air, or nitrogen-hydrogen mixtures (gas mixtures of 95% nitrogen and 5% hydrogen).
Gas molecules are ionized in a (vacuum) processing apparatus, wherein a plasma is obtained by means of an electric field. The plasma for treating the composite material is preferably obtained by means of microwave radiation and a high-frequency alternating voltage, while pulsed direct-current plasma is preferably used in the plasma coating of substrates made of metal.
Detailed Description
The following exemplary plasma parameters give the plasma states for carbon-based and siloxane-based coatings, respectively:
A) parameters of the equipment
Free jet nozzle made of tungsten and copper, d-4 mm
Pulsed AC arc discharge (alternating current arc discharge) with target channel:
effective power 300W (effective voltage 1kV, effective current 0.3A)
2 pulses per period, 3.8kV peak value and 1.4 mu s pulse width
Tolerance is approximately +/-25% (achievable using a plasma processor AS 400 device)
Plasma voltage: 280V
Plasma frequency: 21kHz
Plasma cycle time: 10 to 20 percent
B) For an exemplary layer formulation of the organic carbon-based layer:
ionized gas: nitrogen (15001/h)
Precursor: acetylene (. about.381/h), 1-point-feed (1-Punkt-Einstemisung)
Nozzle outlet-substrate distance: 5-10mm
Track pitch of the planar (meandering) coating: 1-4mm (thickness of each layer)
Air injection speed: 5-10m/min (thickness of each layer)
Optionally: for example, annealing at 200 ℃ for 1.5h to improve adhesion/rapid case hardening (Soforteinatz).
C) For an exemplary layer formulation of the silicone base layer:
ionized gas: compressed air (-15001/h)
Precursor: hexamethyldisiloxane (. about.30 g/h), 1-point-feed
Nozzle outlet-substrate distance: 5-10 mm;
track pitch of the planar (meandering) coating: 1-4mm (thickness of each layer)
Air injection speed: 20-80m/min (thickness of each layer)
Optionally: for example, annealing at 200 c for 1.5h to improve adhesion/rapid case hardening.

Claims (23)

1. A molded article having a non-stick coating against abrasion of a hot melt adhesive and/or a dispersion adhesive, which molded article can be produced by:
treating uncoated mouldings with a plasma in the presence of a process gas and an ionized gas in the presence of an organic precursor or an organosilicon precursor in a plasma treatment apparatus having a tungsten-copper free jet nozzle, in which apparatus: the tungsten-copper free jet nozzle has a diameter of 4mm and has a pulse alternating current arc discharge of a target channel with an effective power of 300W, wherein the effective voltage of the effective power is 1kV, and the effective current is 0.3A; and 2 pulses per cycle, with a peak voltage of 3.8kV and a pulse width of 1.4. mu.s, with a tolerance of +/-25%; the plasma voltage is 280V, the plasma frequency is 21KHz, the plasma cycle time is 10-20%,
wherein the organic precursor is selected from the group consisting of methane, ethane, and acetylene, the organosilicon precursor is polydimethylsiloxane, and the plasma is an atmospheric pressure plasma.
2. The molded article of claim 1, wherein the molded article is a tool.
3. The molded article of claim 2, wherein the tool is a capping device or a sewing knife.
4. The molded article according to claim 1, wherein the plasma is implemented as a coating with plasma-assisted chemical vapor deposition.
5. The molded article of claim 1, wherein the ionized gas is selected from the group consisting of oxygen, nitrogen, a gas mixture, and an inert gas.
6. The molded article of claim 5, wherein the gas mixture is selected from the group consisting of air, and a nitrogen-hydrogen mixture.
7. The molded article of claim 6, wherein the air is compressed air.
8. The molded article of claim 5, wherein the inert gas is argon.
9. The molding according to claim 5, characterized in that the ionized gas is nitrogen and is fed into the plasma chamber at a rate of-1500L/h and the precursor is acetylene, which is fed into the plasma chamber at a rate of-38L/h, wherein the distance from the nozzle outlet to the substrate is in the range of 5 to 10mm and is embodied as a planar, meandering coating having a layer thickness in the range of from 1 to 4mm with a gas jet speed in the range of 5 to 10 m/min.
10. The molding according to claim 1, characterized in that the ionized gas is compressed air and is fed into the plasma chamber at a rate of-1500L/h and the precursor is hexamethyldisiloxane, which is fed into the plasma chamber at a rate of-30 g/h, wherein the distance from the nozzle outlet to the substrate is in the range of 5 to 10mm and is implemented as a planar, meandering coating having a layer thickness in the range of from 1 to 4mm with a gas jet speed in the range of 20 to 80 m/min.
11. The molding according to claim 1, characterized in that in a further reaction step an annealing at 200 ℃ is carried out for 1.5 h.
12. A method for producing a molded article which is a non-stick coating according to one of claims 1 to 11 with an anti-abrasion against hot melt adhesives and/or dispersion adhesives, comprising the following process steps:
treating uncoated mouldings with a plasma in the presence of a process gas and an ionized gas in the presence of an organic precursor or an organosilicon precursor in a plasma treatment apparatus having a tungsten-copper free jet nozzle, in which apparatus: the diameter of the tungsten-copper free jet nozzle is-4 mm, and the tungsten-copper free jet nozzle is provided with a pulse alternating current arc discharge of a target channel with-300W effective power, wherein the effective voltage of the effective power is-1 kV, and the effective current is 0.3A; 2 pulses per cycle, with peak voltage 3.8kV and pulse width 1.4. mu.s, with a tolerance of +/-25%; the plasma voltage is 280V, the plasma frequency is 21KHz, the plasma cycle time is 10-20%,
wherein the organic precursor is selected from the group consisting of methane, ethane and acetylene, the organosilicon precursor is polydimethylsiloxane, and the plasma used in the method is atmospheric pressure plasma.
13. Method according to claim 12, characterized in that in the method the coating is carried out by means of plasma-assisted chemical vapor deposition.
14. The method according to any one of claims 12 to 13, wherein the ionized gas is selected from the group consisting of oxygen, nitrogen, a gas mixture and an inert gas.
15. The method of claim 14, wherein the gas mixture is selected from the group consisting of air, compressed air, and a nitrogen-hydrogen mixture.
16. The method of claim 15, wherein the air is compressed air.
17. The method of claim 14, wherein the inert gas is argon.
18. Method according to claim 12, characterized in that the ionized gas is nitrogen and is fed into the plasma chamber at a rate of-1500L/h and the precursor is acetylene, which is fed into the plasma chamber at a rate of-38L/h, wherein the distance from the nozzle outlet to the substrate is in the range of 5 to 10mm and is implemented as a planar, meandering coating with a layer thickness in the range of 1 to 4mm with a gas jet velocity in the range of 5 to 10 m/min.
19. The method according to claim 12, characterized in that the ionized gas is compressed air and is fed into the plasma chamber at a rate of-1500L/h and the precursor is hexamethyldisiloxane, which is fed into the plasma chamber at a rate of-30 g/h, wherein the distance from the nozzle outlet to the substrate is in the range of 5 to 10mm and is implemented as a planar, meandering coating with a layer thickness in the range of from 1 to 4mm with a gas jet velocity in the range of 20 to 80 m/min.
20. The method according to claim 12, characterized in that in a further reaction step the annealing is carried out at 200 ℃ for 1.5 h.
21. A system comprising a molded article according to one of claims 1 to 11.
22. The system of claim 21, wherein the system is embodied as a press lamination tool or a sewing machine.
23. Use of a molded article according to one of claims 1 to 11 as a means for pressure lamination or for producing a sewn connection.
CN201610816001.2A 2015-09-09 2016-09-09 Molded article having functional layer, method for producing same, and use thereof Active CN107043925B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102015115167.7A DE102015115167B4 (en) 2015-09-09 2015-09-09 Shaped body comprising a functional layer, process for its preparation and its use
DE102015115167.7 2015-09-09

Publications (2)

Publication Number Publication Date
CN107043925A CN107043925A (en) 2017-08-15
CN107043925B true CN107043925B (en) 2021-08-27

Family

ID=58054934

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610816001.2A Active CN107043925B (en) 2015-09-09 2016-09-09 Molded article having functional layer, method for producing same, and use thereof

Country Status (2)

Country Link
CN (1) CN107043925B (en)
DE (1) DE102015115167B4 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102016226191B4 (en) * 2016-12-23 2018-12-13 HS-Group GmbH Method and device for producing a substrate coated with a barrier layer and a protective layer
US11432869B2 (en) * 2017-09-22 2022-09-06 Covidien Lp Method for coating electrosurgical tissue sealing device with non-stick coating

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4216999C2 (en) 1992-05-22 1996-03-14 Fraunhofer Ges Forschung Process for the surface coating of silver objects and protective layer produced by this process
DE19543133C2 (en) 1995-11-18 1999-05-06 Fraunhofer Ges Forschung Process for producing highly hydrophobic polymer layers by means of plasma polymerization
TW347363B (en) * 1996-11-12 1998-12-11 Bae-Hyeock Chun Method for improving demolding effect of a mold by a low temperature plasma process
US6372303B1 (en) 1997-06-16 2002-04-16 Robert Bosch Gmbh Method and device for vacuum-coating a substrate
US6110544A (en) * 1997-06-26 2000-08-29 General Electric Company Protective coating by high rate arc plasma deposition
DE19748240C2 (en) 1997-10-31 2001-05-23 Fraunhofer Ges Forschung Process for the corrosion-resistant coating of metal substrates by means of plasma polymerization and its application
GB0211354D0 (en) 2002-05-17 2002-06-26 Surface Innovations Ltd Atomisation of a precursor into an excitation medium for coating a remote substrate
DE102014100385A1 (en) * 2014-01-15 2015-07-16 Plasma Innovations GmbH Plasma coating method for depositing a functional layer and separator

Also Published As

Publication number Publication date
DE102015115167A1 (en) 2017-03-09
CN107043925A (en) 2017-08-15
DE102015115167B4 (en) 2017-03-30

Similar Documents

Publication Publication Date Title
Wolf et al. Role of plasma surface treatments on wetting and adhesion
Hegemann 4.09 Plasma Polymer Deposition and Coatings on Polymers
Johansson Surface modification of plastics
EP1492631B1 (en) Protective coating composition
US20020012756A1 (en) Method of surface treating or coating of materials
US20050241582A1 (en) Atmospheric pressure plasma assembly
EP1929065A1 (en) Bonding an adherent to a substrate via a primer
US11384420B2 (en) Method and device for promoting adhesion of metallic surfaces
US20020025387A1 (en) Process for the surface activation of materials
EP2205049A1 (en) Apparatus and method for treating an object
EP2268846B1 (en) A method for stable hydrophilicity enhancement of a substrate by atmospheric pressure plasma deposition
US20020018897A1 (en) Plasma-treated materials
CN107043925B (en) Molded article having functional layer, method for producing same, and use thereof
US20030012890A1 (en) Method for producing a plasma by microwave irradiation
JP6052470B1 (en) Resin modification method
EP2279801B1 (en) Coating methods using plasma jet and plasma coating apparatus
US20220016835A1 (en) Apparatus and method for the additive production of components
CN107406725B (en) Low temperature plasma treatment
Liu et al. Plasma enhanced CVD of fluorocarbon films by low-pressure dielectric barrier discharge
US11214861B2 (en) Arrangement for coating substrate surfaces by means of electric arc discharge
Buyle et al. Plasma systems for surface treatment
Batocki et al. Amorphous silicon carbonitride films modified by plasma immersion ion implantation
Oshima et al. Development of atmospheric pressure plasma jet with slit nozzle
Kwong et al. Improvement on Hydrophobicity of Synthetic Textiles by Plasma Treatment–A Review
PL194799B1 (en) Method of depositing on surfaces of dielectric materials a layer containing siliceous compounds

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant