CN107026153B - Packaging part - Google Patents
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- CN107026153B CN107026153B CN201611046177.0A CN201611046177A CN107026153B CN 107026153 B CN107026153 B CN 107026153B CN 201611046177 A CN201611046177 A CN 201611046177A CN 107026153 B CN107026153 B CN 107026153B
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- Prior art keywords
- tube core
- voltage regulator
- core
- integrated voltage
- encapsulating material
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- 238000004806 packaging method and process Methods 0.000 title claims abstract description 79
- 239000000463 material Substances 0.000 claims abstract description 126
- 229910052751 metal Inorganic materials 0.000 claims abstract description 86
- 239000002184 metal Substances 0.000 claims abstract description 86
- 239000000758 substrate Substances 0.000 claims abstract description 64
- 238000003780 insertion Methods 0.000 claims abstract description 28
- 230000037431 insertion Effects 0.000 claims abstract description 28
- 239000004065 semiconductor Substances 0.000 claims description 41
- 238000012545 processing Methods 0.000 claims description 21
- 238000005538 encapsulation Methods 0.000 claims description 8
- 229910000679 solder Inorganic materials 0.000 claims description 6
- 239000010410 layer Substances 0.000 description 38
- 238000000034 method Methods 0.000 description 25
- 230000008569 process Effects 0.000 description 17
- 238000000465 moulding Methods 0.000 description 10
- 239000012790 adhesive layer Substances 0.000 description 7
- 238000004088 simulation Methods 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000000227 grinding Methods 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000033228 biological regulation Effects 0.000 description 3
- 239000003990 capacitor Substances 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 229920002577 polybenzoxazole Polymers 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 239000000206 moulding compound Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 239000013047 polymeric layer Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- HMDDXIMCDZRSNE-UHFFFAOYSA-N [C].[Si] Chemical compound [C].[Si] HMDDXIMCDZRSNE-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000006399 behavior Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/16—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/93—Batch processes
- H01L24/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L24/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/065—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
- H01L25/0657—Stacked arrangements of devices
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- H—ELECTRICITY
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- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/065—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
- H01L25/0652—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00 the devices being arranged next and on each other, i.e. mixed assemblies
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05F—SYSTEMS FOR REGULATING ELECTRIC OR MAGNETIC VARIABLES
- G05F3/00—Non-retroactive systems for regulating electric variables by using an uncontrolled element, or an uncontrolled combination of elements, such element or such combination having self-regulating properties
- G05F3/02—Regulating voltage or current
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/561—Batch processing
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3121—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
- H01L23/3128—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation the substrate having spherical bumps for external connection
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3157—Partial encapsulation or coating
- H01L23/3185—Partial encapsulation or coating the coating covering also the sidewalls of the semiconductor body
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/481—Internal lead connections, e.g. via connections, feedthrough structures
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/5226—Via connections in a multilevel interconnection structure
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- H—ELECTRICITY
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- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/5227—Inductive arrangements or effects of, or between, wiring layers
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/525—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body with adaptable interconnections
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
- H01L23/5389—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates the chips being integrally enclosed by the interconnect and support structures
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- H01L23/645—Inductive arrangements
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- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/18—High density interconnect [HDI] connectors; Manufacturing methods related thereto
- H01L24/19—Manufacturing methods of high density interconnect preforms
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- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/18—High density interconnect [HDI] connectors; Manufacturing methods related thereto
- H01L24/20—Structure, shape, material or disposition of high density interconnect preforms
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- H01L24/23—Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
- H01L24/25—Structure, shape, material or disposition of the high density interconnect connectors after the connecting process of a plurality of high density interconnect connectors
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- H01L24/96—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being encapsulated in a common layer, e.g. neo-wafer or pseudo-wafer, said common layer being separable into individual assemblies after connecting
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- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
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- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
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- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
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- H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
- H10B63/80—Arrangements comprising multiple bistable or multi-stable switching components of the same type on a plane parallel to the substrate, e.g. cross-point arrays
- H10B63/84—Arrangements comprising multiple bistable or multi-stable switching components of the same type on a plane parallel to the substrate, e.g. cross-point arrays arranged in a direction perpendicular to the substrate, e.g. 3D cell arrays
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K19/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic element specially adapted for rectifying, amplifying, oscillating or switching, covered by group H10K10/00
- H10K19/10—Integrated devices, or assemblies of multiple devices, comprising at least one organic element specially adapted for rectifying, amplifying, oscillating or switching, covered by group H10K10/00 comprising field-effect transistors
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Abstract
The embodiment provides a kind of packaging parts, including integrated voltage regulator (IVR) tube core, wherein IVR tube core includes the metal column at the top surface of the first IVR tube core.Packaging part further includes the first encapsulating material for wherein encapsulating the first IVR tube core, wherein the first encapsulating material has the top surface coplanar with the top surface of metal column.A plurality of redistribution lines are located above the first encapsulating material and IVR tube core.A plurality of redistribution lines are electrically coupled to metal column.Core chips is Chong Die with a plurality of redistribution lines and is bonded to a plurality of redistribution lines.Core chips is encapsulated in second encapsulating material, wherein the corresponding edge of the edge of the first encapsulating material and the second encapsulating material is vertically aligned with one another.Insertion piece or package substrate are located at below IVR tube core and are bonded to IVR tube core.
Description
Technical field
The embodiment of the present invention is related to semiconductor field, relates more specifically to a kind of packaging part.
Background technique
The power requirement with higher that central processing unit (CPU) consumes input/output (IO) and CPU.For example,
CPU may include multiple cores and need to consume sizable power.On the other hand, the requirement to the power of offer is also very
It is high.For example, supply voltage needs are highly stable.Therefore, multiple pressure regulators can connect to same cpu chip to provide power supply.
Summary of the invention
The embodiment provides a kind of packaging parts, comprising: the first integrated voltage regulator (IVR) tube core, wherein described
First integrated voltage regulator tube core includes: metal column, at the top surface of the first integrated voltage regulator tube core;First encapsulating material
Material, by the first integrated voltage regulator die encapsulation in first encapsulating material, wherein first encapsulating material has
The top surface coplanar with the top surface of the metal column;A plurality of redistribution lines are located at first encapsulating material and described first and integrate
Above pressure regulator tube core, wherein a plurality of redistribution lines are electrically coupled to the metal column;First core chips is and described more
Redistribution lines are overlapped and are bonded to a plurality of redistribution lines;Second encapsulating material encapsulates first core chips
In second encapsulating material, wherein the corresponding side at the edge of first encapsulating material and second encapsulating material
Edge is vertically aligned with one another;And insertion piece or package substrate, below the first integrated voltage regulator tube core and engage
To the first integrated voltage regulator tube core.
The embodiments of the present invention also provide a kind of packaging parts, comprising: the first integrated voltage regulator (IVR) tube core and the second collection
It at pressure regulator tube core, each includes: metal column;Regulator circuit is electrically coupled to the metal column;And inductor, it is electrically coupled
To the regulator circuit;First encapsulating material, by the first integrated voltage regulator tube core and the second integrated voltage regulator pipe
Core is encapsulated in first encapsulating material, wherein first encapsulating material has and the first integrated voltage regulator tube core
The top surface coplanar with the top surface of the metal column in the second integrated voltage regulator tube core;Dielectric layer, it is integrated with described first
Pressure regulator tube core, the second integrated voltage regulator tube core and first encapsulating material overlapping;A plurality of redistribution lines have position
Part in the dielectric layer, wherein a plurality of redistribution lines are electrically coupled to the first integrated voltage regulator tube core and institute
State the second integrated voltage regulator tube core;First central processing unit (CPU) chip and the second central processing unit chip, respectively with institute
It states the first integrated voltage regulator tube core and the second integrated voltage regulator tube core is overlapped and is electrically coupled to described first and integrates
Pressure regulator tube core and the second integrated voltage regulator tube core;And second encapsulating material, by the first central processing unit core
Piece and second central processing unit chip are encapsulated in second encapsulating material.
The embodiments of the present invention also provide a kind of packaging parts, comprising: the first component pipe core, comprising: semiconductor substrate;The
One through hole and the second through hole run through the semiconductor substrate;Active circuit, at the surface of the semiconductor substrate;
First metal column, at the top surface of first component pipe core, wherein first metal column is electrically coupled to the active electricity
Road and first through hole;And second metal column, at the top surface of first component pipe core, wherein described second
Metal column is electrically coupled to second through hole, and second metal column with it is all active in first component pipe core
Circuit is electrically disconnected;First component pipe core is encapsulated in first encapsulating material by the first encapsulating material;Second device pipe
Core, it is Chong Die with first component pipe core and be electrically coupled to first component pipe core;And packaging part component, it is located at described
Below first component pipe core and it is bonded to first component pipe core, wherein second through hole and second metal
The packaging part component is electrically coupled to second component pipe core by column.
Detailed description of the invention
When reading in conjunction with the accompanying drawings, the embodiment that the present invention may be better understood according to the following detailed description.
It is emphasized that according to the standard practices in industry, being not necessarily to scale to various parts.In fact, in order to clear
It discusses, the size of various parts can be arbitrarily increased or reduced.
Fig. 1 to Fig. 9 shows the centre in accordance with some embodiments in the formation of packaging part for including integrated voltage regulator
The sectional view in stage.
Figure 10 shows the sectional view of the packaging part in accordance with some embodiments including integrated voltage regulator.
Figure 11 shows the process flow in accordance with some embodiments for being used to form packaging part.
Specific embodiment
Following disclosure provides many different embodiments or example for realizing different characteristic of the invention.Below
The specific example of component and arrangement is described to simplify the present invention.Certainly, these are only example, are not intended to limit this hair
It is bright.For example, in the following description, above second component or the upper formation first component may include the first component and second
Part is formed as the embodiment directly contacted, and also may include can be formed between the first component and second component it is additional
Component, so that the embodiment that the first component and second component can be not directly contacted with.In addition, the present invention can be in each example
Middle repeat reference numerals and/or letter.The repetition is for purposes of simplicity and clarity, and itself not indicate to be discussed
Relationship between each embodiment and/or configuration.
Moreover, for ease of description, can be used herein such as " ... below ", " in ... lower section ", " lower part ", " ... on
The spatially relative term in face ", " top " etc., in order to describe an element or component and another element or component as shown in the figure
Relationship.Other than orientation shown in figure, spatially relative term is intended to include the different direction of device in use or operation.
Device can otherwise orient (be rotated by 90 ° or in other directions), and spatial relative descriptor as used herein can be with
Similarly make corresponding explain.
A kind of multi-layer packaging part and forming method thereof is provided according to each exemplary embodiment.It can be used on substrate
Chip (Chip-on-Wafer-on-Substrate, CoWoS) technique forms multi-layer packaging part on wafer.It shows to form this
The intermediate stage of packaging part.Discuss some modifications of some embodiments.It is identical through each view and illustrative embodiments
Reference label is for indicating identical element.
Fig. 1 to Fig. 9 shows the section in the intermediate stage in accordance with some embodiments in the formation of multi-layer packaging part
Figure.It is schematically shown in the process flow 200 that step shown in Fig. 1 to Fig. 9 is also shown in FIG. 11.
Referring to Fig.1, carrier 20 is provided, and adhesive layer 22 is set above carrier 20.Carrier 20 can be blank glass
Glass carrier, blank ceramic monolith, organic carrier etc., and can have the shape of the semiconductor crystal wafer of circular top view shape.
Sometimes, carrier 20 is referred to as carrier wafer.For example, adhesive layer 22 can be formed by photothermal conversion (LTHC) material, and can also
To use other kinds of adhesive.According to some embodiments of the present invention, adhesive layer 22 can decompose under the heat of light, and
And it therefore can be from the structure release carrier 20 being formed thereon.
Referring to Fig. 2, mask placement device tube core 24 (including 24A, 24B, 24C, 24D and 24E) above adhesive layer 22.Accordingly
Step is shown as the step 202 in process flow shown in Figure 11.Through specification, component pipe core 24 is also known as level 1
Tube core.It should be understood that implementing the processing step then discussed under wafer scale.Therefore, have with include component pipe core 24A,
The identical multiple tube core groups of the tube core group of 24B, 24C, 24D and 24E.Multiple tube core groups may be arranged to include rows and columns
Array.Component pipe core 24 can be the same or different from each other.For example, component pipe core 24A, 24B, 24C and 24D can be with those
This is identical, and is different from component pipe core 24E.
According to some embodiments of the present invention, component pipe core 24 is to include for supplying for tube core adjusting voltage above
Integrated voltage regulator (IVR) tube core of pressure regulator.Circuit schematic in IVR is shown as formed in semiconductor substrate 28 26.
According to an alternative embodiment of the invention, component pipe core 24 includes logic dice or such as static random access memory (SRAM) is managed
The memory dice of core, dynamic random access memory (DRAM) tube core etc..
IVR circuit 26 may include simulation pump circuit (pump circuit), digital control piece and for adjusting voltage
Other circuits.For example, simulation pump circuit is used to electric current being pumped into logic dice above.Digital control piece has determining simulation
When circuit needs to pump the function of electric current (pump current).When being used for advanced IVR, digital control piece can be determined
Need to open how much phases of simulation pump, to be optimized to the electric current output of component pipe core above.In addition, component pipe core 24 may be used also
To include the inductor 30 for being electrically coupled to simulation pump circuit sum number word control block.IVR circuit can also include being located at component pipe core
Down detection circuit under voltage in 52 (including 52A, 52B and 52C, Fig. 9).Down detection circuit is by device pipe above under voltage
Core 52 (Fig. 8) is used detecting voltage decline, digitizing and feeding back to the simulation pump circuit in component pipe core 24.
According to some embodiments of the present invention, component pipe core 24 is independent IVR tube core, wherein in addition to by regulator circuit
Those of use, it is arranged in component pipe core 24 without other logic circuits.According to alternative embodiment, some logic circuits or deposit
Memory circuit is arranged in inside component pipe core 24 together with regulator circuit.
Component pipe core 24 includes semiconductor substrate 28, can be silicon substrate, silicon-carbon substrate, III-V compound and partly leads
Body substrate etc..Component pipe core 24 further includes interconnection structure 32.According to some embodiments of the present invention, interconnection structure 32 includes multiple
Dielectric layer 34 and metal wire and through-hole (not shown) in dielectric layer 34.Dielectric layer 34 may include can be by low k dielectric
Inter-metal dielectric (IMD) layer that material is formed, for example, the dielectric constant (k value) of low k dielectric lower than 3.5, below about 3.0,
Or it is below about 2.5.In addition, close to the top surface of component pipe core 24, such as silicon nitride layer, silicon oxide layer, undoped can have
The non-low k passivation layer of silicate glass (USG) layer, and/or polymeric layer.In addition, the metal column 40 in surface dielectric layer 34
(including 40A and 40B) is located at the surface of interconnection structure 32.Metal column 40 can be containing copper pad, containing aluminum pad etc..According to one
One top surface of a little embodiments, the top of dielectric layer 34 is coplanar with the top surface of metal column 40.According to some embodiments, surface is situated between
A part covering metal column 40 of electric layer 34.Surface dielectric layer 34 can be polymeric layer, for example, it can be by polybenzoxazoles
(PBO) it is formed.
Inductor 30 is embedded in interconnection structure 32, and the still part of regulator circuit.30 company of can be used of inductor
The metal wire and through-hole connect is formed with the shape with coil.Therefore, according to some embodiments of the present invention, inductor 30 is collection
On-chip inductors in the identical chip of Cheng Yu IVR circuit.According to an alternative embodiment of the invention, inductor 30 is formed in
The outside of IVR tube core 24 is as separate inductor.
Component pipe core 24 further include through hole (being alternatively referred to as silicon through hole or substrate through hole) 36 (including 36A and
36B).It should be understood that although through hole 36 is shown as the semiconductor substrate in Fig. 2, the placer above carrier 20
When part tube core 24, through hole 36 can be not extend at the bottom surface of semiconductor substrate 28.In addition, through hole 36 is extended between half
Mid-plane between the top and bottom of conductor substrate 28, and as shown in fig. 7, the bottom end of through hole 36 will be in subsequent back
It is exposed in the grinding steps of face.Each through hole 36 is by the dielectric layer (not shown) around corresponding through hole 36 and accordingly
Semiconductor substrate 28 be electrically insulated.
Through hole 36A and 36B are used to the conductive component of 28 top of semiconductor substrate being connected to corresponding semiconductor substrate
Conductive component below 28.Through hole 36B be electrically coupled to inside corresponding component pipe core 24 device (such as IVR circuit is led
Line, inductor 30 etc.).Through hole 36B can also be electrically coupled to metal column 40B.On the other hand, the through hole in component pipe core 24
36A is used separately for the conductive component (component pipe core 52 in such as Fig. 8) of corresponding 24 top of component pipe core being connected to device
Conductive component (metal pad in insertion piece 70 in such as Fig. 8) below part tube core 24.Through hole 36A is not attached to device
Inside tube core 24 any other circuit (active device including such as transistor and diode and such as capacitor, inductor,
The passive device of resistor etc.).Therefore, through hole 36A is for the component outside interconnection devices tube core 24, and is not used in device
The interior connection of circuit inside tube core 24.In other words, through hole 36A has function identical with molding through hole (not shown),
And it moulds through hole and the outside in component pipe core 24 can be set and run through encapsulating material 44 (Fig. 8).However, in component pipe core 24
Inside forms the not additional manufacturing cost of through hole 36A, this is because, through hole 36A and perforation different from molding through hole
Hole 36B is formed simultaneously.Further, since the technology that through hole 36A is used to form component pipe core is formed, so through hole 36 can
To have than the molding higher density of through hole and smaller size, and the sum of through hole 36A can be higher than molding perforation
Hole.
As shown in Fig. 2, each through hole 36A, which is connected to, is electrically coupled to leading for metal column 40A for corresponding through hole 36A
One in power path 38.Conductive path 38 can be single routing path of no branch/bifurcated, and be not attached to corresponding device
Any other metal column 40B, inductor, resistor, capacitor, transistor, diode in part tube core 24 etc..Therefore, although
In component pipe core 24, but through hole 36A is not related to adjusting related voltage/signal transmission with voltage.In addition, although leading
Power path 38 is shown as straight path, but they may include horizontal metal wire.Use through hole 36A (and conductive path
38) with substitute molding through hole beneficial aspects with conductive path 38 has the function of to be routed again, and metal column 40A need not be overlapped
Corresponding through hole 36A, and it is straight and vertical for moulding through hole, and cannot be routed again.
Referring to Fig. 3, encapsulating material 44 is encapsulated on component pipe core 24.Corresponding step is shown as technique shown in Figure 11
Step 204 in process.Encapsulating material 44 is assigned, and then for example, being cured in heat curing process.Encapsulating material 44
The gap between component pipe core 24 is filled, and can be contacted with adhesive layer 22.Encapsulating material 44 may include moulding compound, molding
Bottom filler, epoxy resin and/or resin.After encapsulating process, the top surface of encapsulating material 44 is higher than metal column 40 and passes through
The top of through-hole 14.
Next, implementing such as to chemically-mechanicapolish polish the planarisation step of (CMP) step or grinding steps to planarize packet
Closure material 44, until the metal column 40 of exposure component pipe core 24.Corresponding step is shown as in process flow shown in Figure 11
Step 206.The structure of generation is shown in Fig. 3.Due to planarization, so the top surface of the top surface of metal column 40 and encapsulating material 44
It is substantially flush (coplanar).
With reference to Fig. 4, dielectric layer 46 and corresponding redistribution lines (RDL) are formed above encapsulating material 44 and component pipe core 24
48 one or more layers.Corresponding step is shown as the step 208 in process flow shown in Figure 11.According to the present invention one
A little embodiments, dielectric layer 46 are formed by the polymer of PBO, polyimides etc..According to an alternative embodiment of the invention, dielectric
Layer 46 is formed by the Inorganic Dielectric Material of silicon nitride, silica, silicon oxynitride etc..
RDL 48 is formed as being electrically coupled to metal column 40.RDL 48 may include metal trace (metal wire) and through-hole, be somebody's turn to do
Through-hole is located at below corresponding metal trace and is connected to corresponding metal trace.According to some embodiments of the present invention, lead to
It crosses shikishima plating process and forms RDL 48, wherein each RDL 48 includes seed layer (not shown) and the plating above seed layer
Deposited metal material.The metal material of seed layer and plating can be formed by identical material or different materials.
During the formation of RDL 48, pattern dielectric layer 46 to be formed via openings (being occupied by RDL 48), and on
Layer RDL 48 is extended in via openings to contact lower layer RDL 48 or metal column 40.In addition, some RDL 48 can be electrically interconnected
Component pipe core 24.(for example, using laser) top dielectric 46 can be patterned to form opening 50 wherein, thus exposure
Some metal pads in RDL 48.
Fig. 5 shows the metal pad that component pipe core 52 (including 52A, 52B and 52C) is bonded to the exposure in RDL 48
On.Corresponding step is shown as the step 210 in process flow shown in Figure 11.Through specification, component pipe core 52 also claims
For 2 tube core of level.Component pipe core 52 can be bonded to metal pad 48 by solder areas 56.Each component pipe core 52 can wrap
Including makes the semiconductor substrate 58 of its back side upward.Component pipe core 52 further includes the front (table directed downwardly positioned at semiconductor substrate 58
Face) at integrated circuit device 54 (active device such as including such as transistor, be not shown).Component pipe core 52A and 52B can
To include the logic pipe of central processing unit (CPU) tube core, image processing unit (GPU) tube core, mobile application tube core etc.
Core.Component pipe core 52A and 52B can be mutually the same.Component pipe core 52C can be the input for component pipe core 52A and 52B/
(high speed) input/output (IO) tube core of output.The RDL 60 being shown in broken lines is set to indicate component pipe core 52A and 52B to IO pipe
The electrical connection of core 52C.
It is some embodiments of CPU tube core according to wherein component pipe core 52A and 52B, integrated circuit 54 may include multiple
Functional circuit, control unit, memory assembly, clock circuit, pad transceiver circuit, logic gate library etc..Control
The data path of unit control CPU.Memory assembly includes register file, cache memory (sram cell) etc..When
Clock circuit includes clock driver, phaselocked loop (PLL), clock distribution network etc..Using logic gate library to execute logic behaviour
Make.
Component pipe core 52A is electrically connected to component pipe core 24A and 24B.In addition, component pipe core 24A and 24B adjust voltage supply
To be used for component pipe core 52A.Component pipe core 52B is connected to component pipe core 24C and 24D.In addition, component pipe core 24C and 24D are adjusted
Voltage is for giving for component pipe core 52B.Each of component pipe core 52A and component pipe core 52B can include multiple cores
The heart, and component pipe core 52A and component pipe core 52B are alternatively referred to as core chips.The component pipe core 52C that can be I/O chip connects
It is connected to component pipe core 24E, component pipe core 24E adjusts voltage to be used for I/O chip 52C.According to some embodiments of the present invention, device
Part tube core 52A and component pipe core 24A and 24B are completely overlapped.Component pipe core 52A can also be extended transversely with more than component pipe core 24A
With the edge of 24B.Component pipe core 52B and component pipe core 24C and 24D are completely overlapped.Component pipe core 52B can also extend transversely with super
Cross the edge of component pipe core 24C and 24D.
Referring to Fig. 6, encapsulating material 64 is encapsulated on component pipe core 52.Corresponding step is shown as technique shown in Figure 11
Step 212 in process.Encapsulating material 64 may include moulding compound, molded bottom filler, epoxy resin or resin.Encapsulate material
The top surface of the bottom surface physical contact top dielectric 46 of material 64.After the distribution, for example, solidifying encapsulating material in heat curing process
Material 64.According to some embodiments of the present invention, implement planarisation step to planarize encapsulating material 64 until encapsulating material 64
Top surface is coplanar with the top surface of component pipe core 52.Corresponding step is shown as the step 214 in process flow shown in Figure 11.Root
According to alternative embodiment of the invention, do not implement to planarize, and in final structure, encapsulating material 64 includes and 52 weight of component pipe core
Folded some parts.Through specification, the structure above layer 22 is known as packaging part 66, and packaging part 66 includes multiple packaging parts, often
A packaging part all includes component pipe core 24A, 24B, 24C, 24D, 24E and 52A, 52B and 52C.
Next, packaging part 66 is detached from from carrier 20.Corresponding step is shown as in process flow shown in Figure 11
Step 216.The structure of generation is shown in Fig. 7.For example, by the way that UV light or laser projection are implemented packaging part 66 on adhesive layer 22
From the disengaging of carrier 20.For example, cause LTHC to decompose by the thermal conductivity that UV light or laser generate when adhesive layer 22 is formed by LTHC,
And therefore carrier 20 is separated from packaging part 66.Implement grinding back surface with the base portion of grinding elements tube core 24 and encapsulating material 44
Point.Implement grinding back surface until the bottom end of exposure through hole 36A and 36B.According to some embodiments, in the bottom of component pipe core 24
Place forms metal pad and/or metal trace (not shown) to be electrically connected to through hole 36A and 36B.According to alternative embodiment,
Metal pad and/or metal trace are not formed at the bottom of component pipe core 24.
In a subsequent step, implement tube core sawing with by 66 sawing of packaging part be discrete packaging part 68, discrete envelope
Piece installing 68 is mutually the same, and one in discrete packaging part 68 shows in fig. 8.Corresponding step technique stream shown in Figure 11
Journey is illustrated as step 216.
Since packaging part 68 is from 68 sawing of packaging part, so the edge of encapsulating material 44 is corresponding to encapsulating material 64
Edge-perpendicular alignment.In addition, the edge of encapsulating material 44 also with the respective edges perpendicular alignmnet of dielectric layer 46.
Next, packaging part 68 is bonded to insertion piece 70 with reference to Fig. 8.According to some exemplary embodiments, pass through solder areas
71 implement engagement.According to alternative embodiment, the other joint methods for such as mixing engagement can be used.Corresponding step is shown as
Step 218 in process flow shown in Figure 11.Engagement can be chip on wafer (CoW) engagement, wherein multiple packaging parts
(chip) 68 is bonded to same insertion piece wafer, which includes multiple insertions identical with the insertion piece 70 shown
Part.According to some embodiments of the present invention, interconnection structure (not shown) substantially identical with the interconnection structure 84 in Figure 10 can be with
It is formed at the bottom of packaging part 68, wherein the RDL in interconnection structure is electrically coupled to through hole 36A and 36B.Insertion piece 70 can
To include the interconnection structure 74 of 72 top of semiconductor substrate 72 (it can be silicon substrate) and semiconductor substrate.In interconnection structure 74
Middle formation metal wire and through-hole 76.Through hole 78 is formed in semiconductor substrate 72.Insertion piece 70 is without such as transistor and two
The active device of pole pipe.Insertion piece 70 can not have or may include the passive device of resistor, inductor, capacitor etc.
Part (not shown).Bottom filler 73 can be distributed between packaging part 68 and insertion piece 70.Then, insertion piece wafer can be by
Cut into multiple packaging parts, each packaging part includes insertion piece 70 and component pipe core 24 and 52 above.
Referring to Fig. 9, for example, insertion piece 70 is bonded to package substrate 80 by solder areas 82.Corresponding step is shown as
Step 220 in process flow shown in Figure 11.Package substrate 80 can be laminated substrates (few core) or can have
Core.Conductive trace and/or core (not shown) in package substrate 80 are electrically connected to solder areas 82.Package substrate 80 can
To have the top surface area bigger than the top surface area of part 70 inserted above.
Figure 10 shows the packaging part according to alternative embodiment.In addition to using insertion piece, these embodiments are not similar to
Embodiment in Fig. 9, and packaging part 68 is spliced directly to package substrate 80.According to some embodiments of the present invention, it encapsulates
Part 68 includes the interconnection structure 84 formed at the bottom surface of component pipe core 24 and encapsulating material 44.It can be used and be used to form Jie
Electric layer 46 and the essentially identical method of RDL 48 and material form interconnection structure, and therefore details are not described herein.
The embodiment of the present invention has some advantageous features.As shown in Figure 9 and Figure 10, component pipe core 52A can have
The top surface area bigger than total top surface area of component pipe core 24A and 24B.It correspondingly, can be below corresponding core chips 52A
Direct mask placement device tube core 24A and 24B, and total top surface area of component pipe core 24A, 24B and 52A are substantially device pipe
The top surface area of core 52A.It is (all by the way that IVR tube core (such as 24A and 24B) is directly placed at its corresponding core devices tube core
Such as 52A) in the following, the distance from core devices tube core to its pressure regulator is minimized.Similarly, by the way that IVR tube core 24E is direct
Be placed on component pipe core 52C in the following, the pressure regulator of the component pipe core from component pipe core 52C to IVR in tube core 24E distance quilt
It minimizes.Therefore power-efficient is improved.As control, if IVR tube core is placed near core chips, because of IVR
Tube core is closer to some cores in core chips and far from other cores in core chips, so layout is uneven.Pass through
IVR tube core 24 is directly placed at core chips that IVR tube core 24 services in the following, making arrangement balancing.
Further, since component pipe core 24 is smaller, so molding through hole can be substituted by through hole 36A, otherwise, molding is passed through
Through-hole will be formed (if without using the embodiment of the present invention) so that 70/ package substrate 80 of insertion piece is connected to component pipe core
52.This eliminate be used to form molding through hole cost, while be not used to form through hole 36A generation cost (because
Through hole 36A and through hole 36B are formed simultaneously).In addition, IVR tube core 24 usually has low-density in their interconnection structure
Metal wire and through-hole.Therefore, the interconnection structure of IVR tube core can be used for being formed embedded-type electric sensor.
According to some embodiments of the present invention, a kind of packaging part includes IVR tube core, wherein IVR tube core includes being located at first
Metal column at the top surface of IVR tube core.Packaging part further includes by the first IVR die encapsulation in the first encapsulating material wherein,
In, the first encapsulating material has the top surface coplanar with the top surface of metal column.A plurality of redistribution lines are located at the first encapsulating material and IVR
Above tube core.A plurality of redistribution lines are electrically coupled to metal column.Core chips it is Chong Die with a plurality of redistribution lines and be bonded to it is a plurality of again
Distributing line.Second encapsulating material encapsulates core chips wherein, wherein the edge of the first encapsulating material and the second encapsulating material
Corresponding edge be vertically aligned with one another.Insertion piece or package substrate are located at below IVR tube core and are bonded to IVR tube core.
According to some embodiments of the present invention, a kind of packaging part includes the first IVR tube core and the 2nd IVR tube core, each IVR
Tube core all includes metal column, is electrically coupled to the regulator circuit of metal column and is electrically coupled to the inductor of regulator circuit.The
One encapsulating material by the first IVR tube core and the 2nd IVR die encapsulation wherein.First encapsulating material has and is located at the first IVR
The coplanar top surface in the top surface of tube core and the metal column in the 2nd IVR tube core.Dielectric layer and the first IVR tube core, the 2nd IVR tube core,
It is overlapped with the first encapsulating material.A plurality of redistribution lines include the part in dielectric layer.A plurality of redistribution lines are electrically coupled to
One IVR tube core and the 2nd IVR tube core.First cpu chip and the second cpu chip respectively with the first IVR tube core and the 2nd IVR tube core
It is overlapped and is electrically coupled to the first IVR tube core and the 2nd IVR tube core.Second encapsulating material is by the first cpu chip and the 2nd CPU
Chip package is wherein.
According to some embodiments of the present invention, a kind of packaging part includes: the first component pipe core, and the first component pipe core includes half
Conductor substrate, the first through hole and the second through hole through semiconductor substrate;Active circuit at the surface of semiconductor substrate;
The first metal column at the top surface of first component pipe core;And first component pipe core top surface at the second metal column.First gold medal
Belong to column and is electrically coupled to active circuit and the first through hole.Second metal column is electrically coupled to the second through hole, and with the first device pipe
All active circuits in core are electrically disconnected.Packaging part further includes that the first component pipe core is encapsulated in the first encapsulating material therein,
And the second component pipe core is Chong Die with the first component pipe core and is electrically coupled to the first component pipe core.Packaging part component is located at device pipe
Below core and it is bonded to component pipe core.Packaging part component is electrically coupled to the second device pipe by the second through hole and the second metal column
Core.
The embodiment provides a kind of packaging parts, comprising: the first integrated voltage regulator (IVR) tube core, wherein described
First integrated voltage regulator tube core includes: metal column, at the top surface of the first integrated voltage regulator tube core;First encapsulating material
Material, by the first integrated voltage regulator die encapsulation in first encapsulating material, wherein first encapsulating material has
The top surface coplanar with the top surface of the metal column;A plurality of redistribution lines are located at first encapsulating material and described first and integrate
Above pressure regulator tube core, wherein a plurality of redistribution lines are electrically coupled to the metal column;First core chips is and described more
Redistribution lines are overlapped and are bonded to a plurality of redistribution lines;Second encapsulating material encapsulates first core chips
In second encapsulating material, wherein the corresponding side at the edge of first encapsulating material and second encapsulating material
Edge is vertically aligned with one another;And insertion piece or package substrate, below the first integrated voltage regulator tube core and engage
To the first integrated voltage regulator tube core.
According to one embodiment of present invention, wherein the first integrated voltage regulator tube core includes: semiconductor substrate;With
And through hole, it is located in the semiconductor substrate, wherein first core chips is electrically coupled to described insert by the through hole
Enter part or the package substrate, without the circuit being electrically coupled in the first integrated voltage regulator tube core.
According to one embodiment of present invention, wherein the first integrated voltage regulator tube core includes: semiconductor substrate;Mutually
Link structure, is located above the semiconductor substrate;And built-in inductor, it is located in the interconnection structure.
According to one embodiment of present invention, packaging part further includes and the first integrated voltage regulator tube core identical second
Integrated voltage regulator tube core, the second integrated voltage regulator die encapsulation is in first encapsulating material, wherein second collection
It is Chong Die with first core chips at pressure regulator tube core and be electrically coupled to first core chips.
According to one embodiment of present invention, packaging part further include: third integrated voltage regulator tube core is encapsulated in described first
In encapsulating material;And input/output tube core, it is encapsulated in second encapsulating material, wherein the input/output tube core
It is Chong Die with the third integrated voltage regulator tube core and be electrically coupled to the third integrated voltage regulator tube core.
According to one embodiment of present invention, packaging part further include: the 4th integrated voltage regulator tube core and the 5th integrated pressure regulation
Device tube core is encapsulated in first encapsulating material, wherein the 4th integrated voltage regulator tube core and the 5th integrated pressure regulation
Device tube core is identical as the first integrated voltage regulator tube core;And second core chips, with the 4th integrated voltage regulator tube core
The 4th integrated voltage regulator tube core and the described 5th is overlapped and is electrically coupled to the 5th integrated voltage regulator tube core to integrate
Pressure regulator tube core.
According to one embodiment of present invention, wherein the first integrated voltage regulator tube core includes semiconductor substrate, described
The bottom surface of semiconductor substrate is coplanar with the bottom surface of first encapsulating material.
According to one embodiment of present invention, wherein the insertion piece is bonded to the first integrated voltage regulator tube core, with
And the insertion piece extends transversely with the edge more than first encapsulating material.
According to one embodiment of present invention, wherein the insertion piece includes: additional semiconductor substrate;And it is additional
Through hole, run through the additional semiconductor substrate.
The embodiments of the present invention also provide a kind of packaging parts, comprising: the first integrated voltage regulator (IVR) tube core and the second collection
It at pressure regulator tube core, each includes: metal column;Regulator circuit is electrically coupled to the metal column;And inductor, it is electrically coupled
To the regulator circuit;First encapsulating material, by the first integrated voltage regulator tube core and the second integrated voltage regulator pipe
Core is encapsulated in first encapsulating material, wherein first encapsulating material has and the first integrated voltage regulator tube core
The top surface coplanar with the top surface of the metal column in the second integrated voltage regulator tube core;Dielectric layer, it is integrated with described first
Pressure regulator tube core, the second integrated voltage regulator tube core and first encapsulating material overlapping;A plurality of redistribution lines have position
Part in the dielectric layer, wherein a plurality of redistribution lines are electrically coupled to the first integrated voltage regulator tube core and institute
State the second integrated voltage regulator tube core;First central processing unit (CPU) chip and the second central processing unit chip, respectively with institute
It states the first integrated voltage regulator tube core and the second integrated voltage regulator tube core is overlapped and is electrically coupled to described first and integrates
Pressure regulator tube core and the second integrated voltage regulator tube core;And second encapsulating material, by the first central processing unit core
Piece and second central processing unit chip are encapsulated in second encapsulating material.
According to one embodiment of present invention, wherein the first integrated voltage regulator tube core and the second integrated pressure regulation
Device tube core is mutually the same, and first central processing unit chip and second central processing unit chip phase each other
Together.
According to one embodiment of present invention, wherein the edge of first encapsulating material and second encapsulating material
Corresponding edge-perpendicular alignment.
According to one embodiment of present invention, packaging part further include: insertion piece or package substrate are located at first collection
At below pressure regulator tube core and the second integrated voltage regulator tube core and being bonded to the first integrated voltage regulator tube core and institute
State the second integrated voltage regulator tube core.
According to one embodiment of present invention, packaging part further include: third integrated voltage regulator tube core is encapsulated in described first
In encapsulating material;And input/output tube core, it is encapsulated in second encapsulating material, wherein the input/output tube core
It is Chong Die with the third integrated voltage regulator tube core and be electrically coupled to the third integrated voltage regulator tube core.
The embodiments of the present invention also provide a kind of packaging parts, comprising: the first component pipe core, comprising: semiconductor substrate;The
One through hole and the second through hole run through the semiconductor substrate;Active circuit, at the surface of the semiconductor substrate;
First metal column, at the top surface of first component pipe core, wherein first metal column is electrically coupled to the active electricity
Road and first through hole;And second metal column, at the top surface of first component pipe core, wherein described second
Metal column is electrically coupled to second through hole, and second metal column with it is all active in first component pipe core
Circuit is electrically disconnected;First component pipe core is encapsulated in first encapsulating material by the first encapsulating material;Second device pipe
Core, it is Chong Die with first component pipe core and be electrically coupled to first component pipe core;And packaging part component, it is located at described
Below first component pipe core and it is bonded to first component pipe core, wherein second through hole and second metal
The packaging part component is electrically coupled to second component pipe core by column.
According to one embodiment of present invention, wherein first component pipe core includes integrated voltage regulator (IVR) tube core,
It include integrated voltage regulator circuit and inductor in the integrated voltage regulator tube core and second component pipe core includes centre
Manage unit (CPU) tube core.
According to one embodiment of present invention, packaging part further includes and the first integrated voltage regulator tube core identical second
Integrated voltage regulator tube core, wherein the second integrated voltage regulator tube core is Chong Die with second component pipe core and is electrically coupled to
Second component pipe core.
According to one embodiment of present invention, packaging part further include: a plurality of redistribution lines are located at first encapsulating material
Above first component pipe core, wherein a plurality of redistribution lines are electrically coupled to first metal column and described second
Metal column;And second encapsulating material, second component pipe core is encapsulated in second encapsulating material, wherein described
The corresponding edge of the edge of first encapsulating material and second encapsulating material is vertically aligned with one another.
According to one embodiment of present invention, packaging part further include: multiple dielectric layers, a plurality of redistribution lines are located at institute
It states in multiple dielectric layers;And solder areas, it extends in a dielectric layer at the top of the multiple dielectric layer.
According to one embodiment of present invention, wherein second metal column is not electrically coupled to first component pipe core
In any passive device.
Foregoing has outlined the component of several embodiments, make those skilled in the art that reality of the invention may be better understood
Apply example.It should be appreciated by those skilled in the art that they can easily be used for using based on the present invention to design or modify
It realizes and other process and structures in the identical purpose of this introduced embodiment and/or the identical advantage of realization.Art technology
Personnel it should also be appreciated that this equivalent constructions without departing from the spirit and scope of the present invention and without departing substantially from of the invention
In the case where spirit and scope, they can make a variety of variations, replace and change herein.
Claims (20)
1. a kind of packaging part, comprising:
First integrated voltage regulator (IVR) tube core, wherein the first integrated voltage regulator tube core includes:
Metal column, at the top surface of the first integrated voltage regulator tube core;
First encapsulating material, by the first integrated voltage regulator die encapsulation in first encapsulating material, wherein described
One encapsulating material has the top surface coplanar with the top surface of the metal column;
A plurality of redistribution lines are located above first encapsulating material and the first integrated voltage regulator tube core, wherein described more
Redistribution lines are electrically coupled to the metal column;
First core chips, it is Chong Die with a plurality of redistribution lines and be bonded to a plurality of redistribution lines;
First core chips is encapsulated in second encapsulating material by the second encapsulating material, wherein first encapsulating
The corresponding edge of the edge of material and second encapsulating material is vertically aligned with one another;And
Insertion piece or package substrate below the first integrated voltage regulator tube core and are bonded to the described first integrated tune
Depressor tube core.
2. packaging part according to claim 1, wherein the first integrated voltage regulator tube core includes:
Semiconductor substrate;And
Through hole is located in the semiconductor substrate, wherein first core chips is electrically coupled to described by the through hole
Insertion piece or the package substrate, without the circuit being electrically coupled in the first integrated voltage regulator tube core.
3. packaging part according to claim 1, wherein the first integrated voltage regulator tube core includes:
Semiconductor substrate;
Interconnection structure is located above the semiconductor substrate;And
Built-in inductor is located in the interconnection structure.
4. packaging part according to claim 1 further includes identical with the first integrated voltage regulator tube core second integrated
Pressure regulator tube core, the second integrated voltage regulator die encapsulation is in first encapsulating material, wherein the described second integrated tune
Depressor tube core is Chong Die with first core chips and is electrically coupled to first core chips.
5. packaging part according to claim 1, further includes:
Third integrated voltage regulator tube core is encapsulated in first encapsulating material;And
Input/output tube core is encapsulated in second encapsulating material, wherein the input/output tube core and the third collection
It is overlapped at pressure regulator tube core and is electrically coupled to the third integrated voltage regulator tube core.
6. packaging part according to claim 1, further includes:
4th integrated voltage regulator tube core and the 5th integrated voltage regulator tube core are encapsulated in first encapsulating material, wherein described
4th integrated voltage regulator tube core and the 5th integrated voltage regulator tube core are identical as the first integrated voltage regulator tube core;And
Second core chips, and thermocouple Chong Die with the 4th integrated voltage regulator tube core and the 5th integrated voltage regulator tube core
It is bonded to the 4th integrated voltage regulator tube core and the 5th integrated voltage regulator tube core.
7. packaging part according to claim 1, wherein the first integrated voltage regulator tube core includes semiconductor substrate, institute
The bottom surface for stating semiconductor substrate is coplanar with the bottom surface of first encapsulating material.
8. packaging part according to claim 1, wherein the insertion piece is bonded to the first integrated voltage regulator tube core,
And the insertion piece extends transversely with the edge more than first encapsulating material.
9. packaging part according to claim 8, wherein the insertion piece includes:
Additional semiconductor substrate;And
Additional through hole runs through the additional semiconductor substrate.
10. a kind of packaging part, comprising:
First integrated voltage regulator (IVR) tube core and the second integrated voltage regulator tube core, each include:
Metal column;
Regulator circuit is electrically coupled to the metal column;With
Inductor is electrically coupled to the regulator circuit;
First encapsulating material, by the first integrated voltage regulator tube core and the second integrated voltage regulator die encapsulation described
In one encapsulating material, wherein first encapsulating material has to be integrated with the first integrated voltage regulator tube core and described second
The coplanar top surface in the top surface of the metal column in pressure regulator tube core;
Dielectric layer, with the first integrated voltage regulator tube core, the second integrated voltage regulator tube core and first encapsulating material
Overlapping;
A plurality of redistribution lines have the part being located in the dielectric layer, wherein a plurality of redistribution lines are electrically coupled to described
First integrated voltage regulator tube core and the second integrated voltage regulator tube core;
First central processing unit (CPU) chip and the second central processing unit chip, respectively with first integrated voltage regulator
Tube core and the second integrated voltage regulator tube core are overlapped and are electrically coupled to the first integrated voltage regulator tube core and described
Second integrated voltage regulator tube core;And
First central processing unit chip and second central processing unit chip are encapsulated in institute by the second encapsulating material
It states in the second encapsulating material.
11. packaging part according to claim 10, wherein the first integrated voltage regulator tube core and the second integrated tune
Depressor tube core is mutually the same, and first central processing unit chip and second central processing unit chip phase each other
Together.
12. packaging part according to claim 10, wherein the edge of first encapsulating material and the second encapsulating material
The corresponding edge-perpendicular alignment of material.
13. packaging part according to claim 10, further includes: it is integrated to be located at described first for insertion piece or package substrate
Below pressure regulator tube core and the second integrated voltage regulator tube core and it is bonded to the first integrated voltage regulator tube core and described
Second integrated voltage regulator tube core.
14. packaging part according to claim 10, further includes:
Third integrated voltage regulator tube core is encapsulated in first encapsulating material;And
Input/output tube core is encapsulated in second encapsulating material, wherein the input/output tube core and the third collection
It is overlapped at pressure regulator tube core and is electrically coupled to the third integrated voltage regulator tube core.
15. a kind of packaging part, comprising:
First component pipe core, comprising:
Semiconductor substrate;
First through hole and the second through hole run through the semiconductor substrate;
Active circuit, at the surface of the semiconductor substrate;
First metal column, at the top surface of first component pipe core, wherein first metal column, which is electrically coupled to, described to be had
Source circuit and first through hole;And
Second metal column, at the top surface of first component pipe core, wherein second metal column is electrically coupled to described
Two through holes, and second metal column and all active circuits in first component pipe core are electrically disconnected;
First component pipe core is encapsulated in first encapsulating material by the first encapsulating material;
Second component pipe core, it is Chong Die with first component pipe core and be electrically coupled to first component pipe core;And
Packaging part component below first component pipe core and is bonded to first component pipe core, wherein described
The packaging part component is electrically coupled to second component pipe core by two through holes and second metal column.
16. packaging part according to claim 15, wherein first component pipe core includes the first integrated voltage regulator
(IVR) tube core includes integrated voltage regulator circuit and inductor and second device in the first integrated voltage regulator tube core
Tube core includes central processing unit (CPU) tube core.
17. packaging part according to claim 16, first component pipe core further include and first integrated voltage regulator
The identical second integrated voltage regulator tube core of tube core, wherein the second integrated voltage regulator tube core and the second component pipe core weight
It folds and is electrically coupled to second component pipe core.
18. packaging part according to claim 15, further includes:
A plurality of redistribution lines are located above first encapsulating material and first component pipe core, wherein described a plurality of to divide again
Wiring is electrically coupled to first metal column and second metal column;And
Second component pipe core is encapsulated in second encapsulating material by the second encapsulating material, wherein first encapsulating
The corresponding edge of the edge of material and second encapsulating material is vertically aligned with one another.
19. packaging part according to claim 18, further includes:
Multiple dielectric layers, a plurality of redistribution lines are located in the multiple dielectric layer;And
Solder areas extends in a dielectric layer at the top of the multiple dielectric layer.
20. packaging part according to claim 15, wherein second metal column is not electrically coupled to the first device pipe
Any passive device in core.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201562260832P | 2015-11-30 | 2015-11-30 | |
US62/260,832 | 2015-11-30 | ||
US15/007,714 | 2016-01-27 | ||
US15/007,714 US9627365B1 (en) | 2015-11-30 | 2016-01-27 | Tri-layer CoWoS structure |
Publications (2)
Publication Number | Publication Date |
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CN107026153A CN107026153A (en) | 2017-08-08 |
CN107026153B true CN107026153B (en) | 2019-08-02 |
Family
ID=58692990
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CN201611046177.0A Active CN107026153B (en) | 2015-11-30 | 2016-11-22 | Packaging part |
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US (4) | US9627365B1 (en) |
KR (1) | KR101917418B1 (en) |
CN (1) | CN107026153B (en) |
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US11282761B2 (en) * | 2018-11-29 | 2022-03-22 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor packages and methods of manufacturing the same |
US11195816B2 (en) * | 2019-07-23 | 2021-12-07 | Taiwan Semiconductor Manufacturing Company, Ltd. | Integrated circuit packages comprising a plurality of redistribution structures and methods of forming the same |
US11404316B2 (en) * | 2019-12-27 | 2022-08-02 | Taiwan Semiconductor Manufacturing Co., Ltd. | System, device and methods of manufacture |
US11482484B2 (en) * | 2020-02-27 | 2022-10-25 | Taiwan Semiconductor Manufacturing Co., Ltd. | Symmetrical substrate for semiconductor packaging |
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2016
- 2016-01-27 US US15/007,714 patent/US9627365B1/en active Active
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- 2017-04-17 US US15/488,933 patent/US10163851B2/en active Active
-
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Also Published As
Publication number | Publication date |
---|---|
TWI627722B (en) | 2018-06-21 |
KR101917418B1 (en) | 2018-11-09 |
CN107026153A (en) | 2017-08-08 |
DE102016102108A1 (en) | 2017-06-01 |
TW201733068A (en) | 2017-09-16 |
DE102016102108B4 (en) | 2022-06-09 |
US20200381392A1 (en) | 2020-12-03 |
US10163851B2 (en) | 2018-12-25 |
US11244924B2 (en) | 2022-02-08 |
US20170221858A1 (en) | 2017-08-03 |
US20190123019A1 (en) | 2019-04-25 |
US10748870B2 (en) | 2020-08-18 |
KR20170063324A (en) | 2017-06-08 |
US9627365B1 (en) | 2017-04-18 |
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