CN107024176A - Displacement measurement system and method based on diffraction grating - Google Patents
Displacement measurement system and method based on diffraction grating Download PDFInfo
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- CN107024176A CN107024176A CN201610072573.4A CN201610072573A CN107024176A CN 107024176 A CN107024176 A CN 107024176A CN 201610072573 A CN201610072573 A CN 201610072573A CN 107024176 A CN107024176 A CN 107024176A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
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Abstract
The present invention provides a kind of displacement measurement system and method based on grating, by setting light source, prism and diffraction grating and photodetector, and configure corresponding control system, because prism is fixed on the workbench that can be moved, diffraction grating is fixed on complete machine framework, when the workbench that can be moved makees displacement relative to the complete machine framework of litho machine, the light that light source is sent then is changed by the interference fringe produced after diffraction grating diffraction, therefore displacement of the workbench that can be moved relative to the general frame of litho machine can be calculated to the change of interference fringe by control system.This simple in measurement system structure, it is easy for installation, measured due to being placed in airtight package casing, the interference in measurement by the external world is smaller therefore higher relative to traditional interferometer measurement precision.
Description
Technical field
The present invention relates to semiconductor lithography machine field, more particularly to a kind of position based on diffraction grating
Shift measurement system and method.
Background technology
As integrated circuit requires that device size constantly reduces, litho machine as in integrated circuit,
Pattern image on mask plate is transferred to the equipment in substrate, to its required precision also continuous
Improve, especially need to improve constantly the measurement accuracy to movable component position in litho machine.
Movable component is primarily referred to as carrying the mask stage and carrying silicon of mask plate in litho machine
The work stage of piece, in a photolithographic process, mask stage or work stage are all whole relative to litho machine
Body framework makees displacement, measures the position of mask stage or work stage relative to the general frame of litho machine
Shifting amount can grasp photoetching progress, speed in real time, so as to control photoetching process.
The displacement of movable component is measured using interferometer measuring system in the prior art, will be interfered
Instrument measuring system is arranged on each side of mask stage or work stage, when mask stage or work
When part platform is moved relative to complete machine framework, the change that interferometer is produced by the optical signal of transmitting
Measure the displacement of mask stage or work stage relative to complete machine framework.But traditional interferometer
The measurement light of displacement measurement system exposes in atmosphere with reference light, is influenceed by air agitation
It is larger, the required precision increasingly improved can not have gradually been met.
Art describes a kind of displacement measurement system, contain two parts six from
On degree relative displacement measurement function, its structure comprising at least two diffraction grating, sensor,
Linear polarizer, at least two level of radiation detectors etc., but because its structure is more complicated, take
Space is big, therefore installation is wasted time and energy.
, can it is therefore desirable to invent a kind of displacement measurement system based on diffraction grating and method
Simplify structure, and improve the measurement accuracy of displacement measurement system.
The content of the invention
To solve the above problems, the present invention proposes a kind of displacement measurement system based on diffraction grating
System and method, by setting light source, prism and diffraction grating and photodetector, and are configured
Corresponding control system, because prism is fixed on the workbench that can be moved, diffraction grating is solid
It is scheduled on complete machine framework, when the workbench that can be moved relative to the complete machine framework of litho machine makees position
During shifting, the light that light source is sent then is changed by the interference fringe produced after diffraction grating diffraction,
Therefore the workbench that can be moved can be calculated to the change of interference fringe by control system
Relative to the displacement of the general frame of litho machine.
To reach above-mentioned purpose, the present invention provides a kind of displacement measurement system based on diffraction grating,
Include successively：
One light source, for providing measurement light；
One prism, is fixed on the workbench side that can be moved, for reflection measurement light；
One diffraction grating, is fixed on complete machine framework, for receiving by the measurement after prismatic reflection
Light；
One photodetector, for receiving measurement light from the diffraction light after diffraction grating diffraction, spreads out
Penetrate light and form interference fringe on the photodetector；
One airtight package casing, for wrap up the light source, the prism, the diffraction grating,
The photodetector；
One control system, connects the photodetector for circuit, is connect according to photodetector
The position of interference fringe of the diffraction light formation of receipts and the change of phase calculate the work that can be moved
Make displacement of the platform relative to complete machine framework.
Preferably, having vacuum environment in the airtight package casing.
Preferably, the prism is reflecting prism.
Preferably, light and the diffraction that measurement light is formed after being reflected by the reflecting prism
Grating surface intersects.
Preferably, light and the diffraction that measurement light is formed after being reflected by the reflecting prism
Grating surface is vertical.
Preferably, the photodetector is located at measurement light diffraction on the diffraction grating
On optical diffraction.
Preferably, the plane of the photodetector is parallel with the diffractive grating surface.
Preferably, the photodetector is line array CCD.
Preferably, the prism is Amici prism.
Preferably, also including coupler system, measurement light spreading out from diffraction grating diffraction is received
Penetrate light and measurement light is split the reference light of refraction by prism formation, and be sent to the photodetection
Device.
Preferably, the coupler system and the Amici prism, the photodetector it
Between connected respectively by optical fiber.
Preferably, the coupler system includes receiving respectively measurement light from diffraction grating diffraction
Diffraction light first coupler, receive measurement light and be split the reference light of refraction by prism formation
The light that second coupler, the first coupler of reception and the second coupler are transmitted by optical fiber respectively is believed
Number the 3rd coupler.
Preferably, the photodetector is area array CCD.
Preferably, the workbench that can be moved is the mask stage of carrying mask plate or held
Carry the work stage of silicon chip.
Preferably, the length of the prism workbench that can be moved corresponding with the prism
Edge lengths it is equal.
Preferably, the workbench that can be moved is based on diffraction light per a line described in correspondence one
The displacement measurement system of grid, and the arrangement of all displacement measurement systems based on diffraction grating
On the Central Symmetry for the workbench that can be moved.
Preferably, also include interferometer measuring system, positioned at the workbench side that can be moved,
And the bottom surface of the least significant end of interferometer measuring system and the workbench that can be moved is located at same water
Plane.
Preferably, the material of the airtight package casing is light-proof material.
Preferably, the diffraction grating is transmission-type binary phase grat.
The present invention provides a kind of using the displacement measurement system as described above based on diffraction grating
Displacement measurement method, by light source to prism emission measurement light, and by the prism will measure
Light reflexes to diffraction grating and forms the diffraction light interfered, and photodetector receives mutually dry
The interference fringe of the diffraction light formation related to, when the workbench that can be moved is made relative to complete machine framework
During displacement, phase place change occurs for interference fringe, by control system according to dry on photodetector
The change for relating to fringe phase calculates the workbench that can be moved relative to made by complete machine framework
Displacement.
Preferably, the prism is reflecting prism.
Preferably, the prism is Amici prism, light is sent to Amici prism by light source,
And light is divided into measurement light and reference light by Amici prism, Amici prism, which will measure light and reflex to, to spread out
Grating formation diffraction light is penetrated, anaclasis will be referred to, sets coupler to receive diffraction light and reference light
Collect and fed back to after coupling on photodetector, photodetector and be shown as the dry of diffraction light formation
The reference striations of striped and reference light formation is related to, when the workbench that can be moved is relative to whole
When machine frame makees displacement, relative to reference to striations phase place change occurs for interference fringe, by controlling
System is according to the interference fringe on photodetector relative to the phase occurred with reference to striations
Change calculates the workbench that can be moved relative to the displacement made by complete machine framework.
Compared with prior art, the beneficial effects of the invention are as follows：The present invention provides one kind and is based on spreading out
The displacement measurement system of grating is penetrated, is included successively：
One light source, for providing measurement light；
One prism, is fixed on the workbench side that can be moved, for reflection measurement light；
One diffraction grating, is fixed on complete machine framework, for receiving by the measurement after prismatic reflection
Light；
One photodetector, for receiving measurement light from the diffraction light after diffraction grating diffraction, spreads out
Penetrate light and form interference fringe on the photodetector；
One airtight package casing, for wrap up the light source, the prism, the diffraction grating,
The photodetector；
One control system, connects the photodetector for circuit, is connect according to photodetector
The position of interference fringe of the diffraction light formation of receipts and the change of phase calculate the work that can be moved
Make displacement of the platform relative to complete machine framework.
The present invention provides a kind of using the displacement measurement system as described above based on diffraction grating
Displacement measurement method, by light source to prism emission measurement light, and by the prism will measure
Light reflexes to diffraction grating and forms the diffraction light interfered, and photodetector receives mutually dry
The interference fringe of the diffraction light formation related to, when the workbench that can be moved is made relative to complete machine framework
During displacement, phase place change occurs for interference fringe, by control system according to dry on photodetector
The change for relating to fringe phase calculates the workbench that can be moved relative to made by complete machine framework
Displacement.
The present invention is configured by setting light source, prism and diffraction grating and photodetector
Corresponding control system, because prism is fixed on the workbench that can be moved, diffraction grating is solid
It is scheduled on complete machine framework, when the workbench that can be moved relative to the complete machine framework of litho machine makees position
During shifting, the light that light source is sent then is changed by the interference fringe produced after diffraction grating diffraction,
Therefore the workbench that can be moved can be calculated to the change of interference fringe by control system
Relative to the displacement of the general frame of litho machine.This simple in measurement system structure, installation side
Just, measure, disturbed in measurement by the external world due to being placed in airtight package casing
It is smaller therefore higher relative to traditional interferometer measurement precision.
It is preferred that the present invention also provides a kind of using the displacement as described above based on diffraction grating
The displacement measurement method of measuring system, prism therein is Amici prism, by light source to light splitting
Prism sends light, and light is divided into measurement light and reference light by Amici prism, and Amici prism will be surveyed
Amount light reflexes to diffraction grating formation diffraction light, will refer to anaclasis, sets coupler by diffraction
Light and reference light, which are collected and feed back to be shown as on photodetector, photodetector after coupling, to spread out
The interference fringe of light formation and the reference striations of reference light formation are penetrated, when the work that can be moved
When making platform and making displacement relative to complete machine framework, relative to reference to striations phase occurs for interference fringe
Change, by control system according to the interference fringe on photodetector relative to reference to striations hair
The change of raw phase calculates the workbench that can be moved relative to made by complete machine framework
Displacement.This measuring method is due to will measure the interference fringe of light formation with making with reference to striations
To contrast, therefore when calculating, due to the presence of reference quantity, computational accuracy is higher.
Brief description of the drawings
Fig. 1 is the displacement measurement system structural representation of the embodiment of the present invention one；
Fig. 2 is the shear interference measuring principle schematic diagram of the embodiment of the present invention one；
Fig. 3 is the schematic diagram that the light intensity of the embodiment of the present invention one changes with phase；
Fig. 4 is the litho machine global displacement measuring system distribution schematic diagram of the embodiment of the present invention one；
Fig. 5 is the displacement measurement system structural representation of the embodiment of the present invention two；
Fig. 6 is the shear interference measuring principle schematic diagram of the embodiment of the present invention two；
Fig. 7 is displacement measurement system structural representation of the embodiment of the present invention；
Fig. 8 is the Michelson interference measuring principle schematic diagram of the embodiment of the present invention three；
Fig. 9 is the displacement measurement system structural representation of the embodiment of the present invention four.
In figure：1- light sources, 21- reflecting prisms, 22- Amici prisms, 3- diffraction grating, 4- light
Electric explorer, 41- optical fiber, the couplers of 51- first, the couplers of 52- second, 53- the 3rd are coupled
Device, 6- work stages, 61- interferometer measuring systems, 7- silicon chips, 8- airtight packages casing, 9- are whole
Machine frame.
Embodiment
In order to facilitate the understanding of the purposes, features and advantages of the present invention, tie below
Accompanying drawing is closed to be described in detail the embodiment of the present invention.
Embodiment one
Fig. 1 is refer to, the present invention provides a kind of displacement measurement system based on diffraction grating, put
Put in the workbench side that can be moved, the workbench that can be moved is for carrying mask plate
The work that can be moved in mask stage or the work stage 6 for carrying silicon chip 7, the present embodiment
Platform is work stage 6, and the bottom surface of displacement measurement system least significant end and work stage 6 is located at same level
Face, displacement measurement system includes successively：
One light source 1, for providing measurement light；
One prism, is fixed on 6 one sides of work stage, for reflection measurement light, this implementation
Prism is reflecting prism 21 in example, refer to Fig. 4, and the length of reflecting prism 21 is anti-equal to this
Penetrate the length of the side of the corresponding work stage 6 of prism 21；
One diffraction grating 3, is fixed on complete machine framework 9, for receiving measurement light by reflection rib
Diffraction grating 3 is transmission-type binary phase light in reflected light after the reflection of mirror 21, the present embodiment
Grid, this grating is used to carry out incident beam phase-modulation, and can control each level diffraction light
Diffraction efficiency；
One photodetector 4, for receiving measurement diffraction light of the light from the diffraction of diffraction grating 3,
Diffraction light forms interference fringe on photodetector 4, and photodetector 4 is that one kind can be visited
Light-metering is strong and photoelectric signal converter of light distribution, and line array CCD is used in the present embodiment,
Photodetector 4 is located at measurement light on diffraction grating 3 on the optical diffraction of diffraction, and
The plane of photodetector 4 is parallel with the surface of diffraction grating 3 in the present embodiment；
One airtight package casing 8, for wrap up light source 1, reflecting prism 21, diffraction grating 3,
There is vacuum environment, or the airtight package case in photodetector 4, airtight package casing 8
Body 8 be a kind of light-guide device of solid, light source 1, reflecting prism 21, diffraction grating 3 and
Photodetector 4 is all fixed on inside the solid light-guide device, and above two implementation is all
In order that the influence that will not be disturbed when must measure by outside air, improving measurement accuracy；
One control system (not shown), connects photodetector 4, according to photoelectricity for circuit
The position of interference fringe for the diffraction light formation that detector 4 is received and the change of phase calculate work
Displacement of the part platform 6 relative to complete machine framework 9.
It refer to the light for measuring and being formed after light is reflected by reflecting prism 21 in Fig. 2, the present embodiment
Line is vertical with the surface of diffraction grating 3, the light formed after measurement light is reflected by reflecting prism 21
Diffraction is generated after line vertical incidence diffraction grating 3, wherein 0 order diffraction light vertical incidence photoelectricity
Detector 4, and -1 order diffraction light and+1 order diffraction light with the formation acute angle of photodetector 4
The angle of emergence of angle incidence photodetector 4, -1 order diffraction light is A, and+1 order diffraction light goes out
Firing angle is B.
Fig. 4 is refer to, on whole litho machine, four displacement measurement systems are installed altogether, point
Not Dui Ying work stage 6 each side, this four displacement measurement systems are on work stage 6
Central Symmetry, when work stage 6 makees relative shifting on any one direction relative to complete machine framework 9
When dynamic, the displacement measurement system on side corresponding to moving direction can then measure mobile generation
Displacement.And centrosymmetric arrangement can also be easy to measurement work stage 6 in vertical direction
The displacement produced when rotating.
When the displacement measurement system provided using the present invention is measured, dark surrounds should be placed on
In, or airtight package casing 8 can be made using light-proof material so that can during measurement
To exclude the interference of external stray light.
The present invention also provides a kind of above-mentioned displacement measurement system based on diffraction grating of use
Displacement measurement method, be specially：
Light source 1 reflexes to diffraction to the emission measurement light of reflecting prism 21 by reflecting prism 21
The formation diffraction light of grating 3, refer to Fig. 2, and grating equation is d (sin α+sin β)=m λ, its
Middle α is that, to the incident incidence angle of diffraction grating 3, β is the angle of emergence from the outgoing of diffraction grating 3,
D is the cycle of diffraction grating 3, and m is diffraction time, and λ is the wavelength of light beam, due to being reflected
The measurement light vertical incidence diffraction grating 3 that prism 21 reflects, therefore incident angle α is 0 °, then
Grating equation is reduced to d sin β=m λ.
Photodetector 4 receives the interference fringe of the diffraction light formation interfered, continuing with ginseng
According to Fig. 2, it is assumed that the plane of incidence of photodetector 4 is h with the spacing of diffraction grating 3, is utilized
Trigonometric function formula can calculate what two level diffraction lights were shown on photodetector 4
SpacingBecause the angle of emergence of+1 order diffraction light is A, -1 order diffraction light
The angle of emergence be B, when spacing h be 1mm, a length of 632.8nm of light wave of incident diffraction grating 3,
The cycle of diffraction grating 3 is 3um, then can calculate and obtain space D about 0.215mm.Such as will
The incident beam of incident diffraction grating 3 is expanded as the collimated light beam with 3mm spot diameters,
Then producing the region of interference has 2.784mm, CCD identifications common in the art enough.
When work stage 6 makees displacement relative to complete machine framework 9, phase place change occurs for interference fringe,
Workpiece is calculated according to the change of the interference fringe phase on photodetector 4 by control system
Platform 6 is relative to the displacement made by complete machine framework 9.
When being illustrated in figure 3 the change in location of light when light incides diffraction grating 3, do
Relate to the phase place change schematic diagram of striped.Wherein I is light intensity, and b is light intensity peak,For phase
Change, a corresponding light intensity changes when being phase place change.Assuming that x be incident beam in diffraction light
Displacement variable on grid 3, then have：
When x is chosen for 1nm, light intensity variable quantity a is about 0.03 ‰；Such as choose dynamic model
The line array CCD for 16 is enclosed, then the change of distinguishable light intensity turns to 0.015 ‰；So the survey
Amount method can meet the measurement demand when the displacement range of work stage 6 is nm grades.
Embodiment two
Fig. 5 is refer to, the difference of the present embodiment and embodiment one is to measure light by reflecting prism
After 21 reflections the light that is formed intersects with the surface of diffraction grating 3, and photodetector 4 enters
Face is penetrated with the surface of diffraction grating 3 also to intersect.
Refer to Fig. 6, the measurement light that wherein light source 1 is sent after the reflection of reflecting prism 21,
Incidence angle of the reflected light of formation in incident diffraction grating 3 is C, in incident diffraction grating 3
After there occurs diffraction, therefore the angle of emergence of the diffracted beam produced is also changed, wherein+1
The angle of emergence of order diffraction light is D, and the angle of emergence of -1 order diffraction light is D ', for+1 order diffraction
Light, grating equation is d (sin C+sin D)=m λ, and for -1 order diffraction light, grating equation is
D (sin C+sin D')=m λ, d is the cycle of diffraction grating 3, and m is diffraction time, and λ spreads out for incidence
The wavelength of light when penetrating grating 3.
It can be calculated using trigonometric function formula,
The acute angle that photodetector 4 and the surface of diffraction grating 3 are formed is E, and above-mentioned two level is spread out
The distance penetrated between the striped that light is formed on photodetector 4Wherein x be into
Displacement variable of the irradiating light beam on diffraction grating 3.
If 3 cycle of diffraction grating d is 2um, the wavelength X of light is during incident diffraction grating 3
632.8nm, x are 200mm, and angle is 0.001 between photodetector 4 and diffraction grating 3
Radian, the hot spot space D that can calculate two level diffraction lights is 1.6mm.Such as by light source 1
The measurement light of outgoing is expanded into the collimated light beam that spot diameter is 3mm, it is possible to met
Existing CCD identification technologies.
Above-mentioned parameter is a kind of feasible implementation, but can actually be made in the present embodiment any
Interference is produced between the diffraction light of 2 levels, for example with+2 grades and+1 grade, is then calculated
Hot spot spacing to the diffraction light of two levels is 0.6mm.
The optical path difference of two level diffraction lights can be described with following formula：
Phase difference between interference fringe can be calculated by above-mentioned formula, in above-mentioned parameter condition
Under, when x is 1mm, phase place change is 0.00291985, linear change.
Embodiment three
Fig. 7 is refer to, the difference of the present embodiment and embodiment one is that prism is Amici prism 22,
And whole displacement measurement system also includes coupler system.
The light that light source 1 is sent is divided into the incident measurement light of diffraction grating 3 by Amici prism 22
With the reference light transmitted to coupler system.
Fig. 8 is refer to, coupler system includes receiving respectively measurement light from the diffraction of diffraction grating 3
Diffraction light the first coupler 51, receive measurement light be split prism 22 refraction formed ginseng
The second coupler 52 of light, the first coupler 51 of reception is examined with the second coupler 52 respectively to lead to
Cross the 3rd coupler 53 of the optical signal of the transmission of optical fiber 41, whole coupler system and light splitting rib
Also connected respectively by optical fiber 41 between mirror 22, photodetector 4.
It is preferred that due to having used coupler system, thus photodetector 4 can be direct
The optical signal from coupler is received, without using length in such as embodiment one and embodiment two
Larger line array CCD is spent to be received from the light that diffraction goes out on diffraction grating 3, therefore this reality
Apply photodetector 4 in example and use area array CCD.
Fig. 8 is refer to, the present invention also provides a kind of use the above-mentioned displacement based on diffraction grating
The displacement measurement method of measuring system, the light that specially light source 1 is sent passes through Amici prism 22
Measurement light and reference light are formed after light splitting respectively, measurement light, which is incident to be formed after diffraction grating 3, to spread out
Penetrate light and collected by the first coupler 51, transmitted by light 41 to the 3rd coupler 53,
Reference light is collected by the second coupler 52 after the outgoing of Amici prism 22 and passed by optical fiber 41
Transport to the 3rd coupler 53, the 3rd coupler 53 will measure light and refer to optical coupling, this
Interference is produced on the section of three couplers 53, and interference information is transmitted to photodetector 4
On, so that the information that control system can be received according to photodetector 4 calculates the phase of work stage 6
For the change in displacement of complete machine framework 9, and due to being used as change there is provided reference light in the present embodiment
The references object of change, therefore, it is possible to improve the precision of measurement.
Example IV
Fig. 9 is refer to, the present embodiment and the difference of embodiment one are, in displacement measurement system
Also include interferometer measuring system 61, least significant end and the work stage 6 of interferometer measuring system 61
Bottom surface be located at same level on.
Due to the displacement measurement system that the present invention is provided, when the incident beam of incident diffraction grating 3
After the cycle of whole diffraction grating is moved, relevant light intensity is also to be changed according to the cycle.
So when work stage 6 makees large scale displacement relative to complete machine framework, only by displacement measurement system
This change in displacement, therefore increase interferometer measuring system 61 can not be decoupled, it may be determined that
When change in displacement is rank more than μm level, the present invention with interferometer measuring system 61
The displacement measurement system of offer obtains the displacement of work stage 6 to calculate.Interference in the present embodiment
Instrument measuring system 61 uses two-frequency laser interferometer commonly used in the prior art.
Above-described embodiment is described the present invention, but the present invention is not limited only to above-described embodiment.
Obvious those skilled in the art can carry out various changes and modification without departing from this to invention
The spirit and scope of invention.So, if these modifications and variations of the present invention belong to the present invention
Within the scope of claim and its equivalent technologies, then the present invention be also intended to include these change and
Including modification.
Claims (24)
1. a kind of displacement measurement system based on diffraction grating, it is characterised in that include successively：
One light source, for providing measurement light；
One prism, is fixed on the workbench side that can be moved, for reflecting the measurement light；
One diffraction grating, is fixed on complete machine framework, for receiving by after the prismatic reflection
Measure light；
One photodetector, for receiving the measurement light from spreading out after the diffraction grating diffraction
Light is penetrated, the diffraction light forms interference fringe on the photodetector；
One not airborne light channel structure, is arranged on the diffraction grating and the photodetector
Between, in not airborne light path, propagating the diffraction light；
One control system, connects the photodetector for circuit, is connect according to photodetector
The position for the interference fringe received and the change of phase calculate the workbench relative to complete machine
The displacement of framework.
2. the displacement measurement system as claimed in claim 1 based on diffraction grating, its feature exists
In the not airborne light channel structure is airtight package casing, for wrapping up or partly wrapping
Wrap up in the diffraction grating and the photodetector.
3. the displacement measurement system as claimed in claim 2 based on diffraction grating, its feature exists
In with vacuum environment in the airtight package casing.
4. the displacement measurement system as claimed in claim 2 based on diffraction grating, its feature
It is, transparent optical element is provided with the airtight package casing.
5. the displacement measurement system based on diffraction grating as claimed in claim 1 or 2 or 3 or 4
System, it is characterised in that the prism is reflecting prism.
6. the displacement measurement system as claimed in claim 5 based on diffraction grating, its feature exists
In light and the diffraction grating table that the measurement light is formed after being reflected by the reflecting prism
Intersect in face.
7. the displacement measurement system as claimed in claim 6 based on diffraction grating, its feature exists
In light and the diffraction grating table that the measurement light is formed after being reflected by the reflecting prism
Face is vertical.
8. the displacement measurement system as claimed in claim 5 based on diffraction grating, its feature exists
It is located at measurement light on the diffraction grating on the optical diffraction of diffraction in, the photodetector.
9. the displacement measurement system as claimed in claim 8 based on diffraction grating, its feature exists
In the plane of the photodetector is parallel with the diffractive grating surface.
10. the displacement measurement system as claimed in claim 5 based on diffraction grating, its feature
It is, the photodetector is line array CCD.
11. the displacement measurement based on diffraction grating as claimed in claim 1 or 2 or 3 or 4
System, it is characterised in that the prism is Amici prism.
12. the displacement measurement system as claimed in claim 11 based on diffraction grating, its feature
It is, in addition to coupler system, receive measurement light the spreading out from the diffraction grating diffraction
Light is penetrated, and the measurement light reflects the reference light to be formed by the Amici prism, and it is sent to institute
State photodetector.
13. the displacement measurement system as claimed in claim 12 based on diffraction grating, its feature
It is, leads to respectively between the coupler system and the Amici prism, the photodetector
Cross optical fiber connection.
14. the displacement measurement system as claimed in claim 13 based on diffraction grating, its feature
It is, the coupler system includes receiving respectively the measurement light from the diffraction grating diffraction
Diffraction light the first coupler, receive it is described measurement light reflect what is formed by the Amici prism
The second coupler, the first coupler of reception of reference light are passed by optical fiber respectively with the second coupler
3rd coupler of the optical signal sent.
15. the displacement measurement system as claimed in claim 11 based on diffraction grating, its feature
It is, the photodetector is area array CCD.
16. the displacement measurement system as claimed in claim 1 based on diffraction grating, its feature
It is, the workbench is the mask stage of carrying mask plate or the work stage of carrying silicon chip.
17. the displacement measurement system as claimed in claim 1 based on diffraction grating, its feature
It is, the edge lengths of the length of the prism workbench corresponding with the prism are equal.
18. the displacement measurement system as claimed in claim 1 based on diffraction grating, its feature
It is, workbench displacement measurement system based on diffraction grating described in correspondence one per a line
System, and all displacement measurement systems based on diffraction grating arrangement on the workbench
Central Symmetry.
19. the displacement measurement system as claimed in claim 1 based on diffraction grating, its feature
It is, in addition to interferometer measuring system, positioned at the workbench side, and the interferometer
The least significant end of measuring system and the bottom surface of the workbench are located at same level.
20. the displacement measurement system based on diffraction grating as described in Claims 2 or 3 or 4,
Characterized in that, the material of the airtight package casing is light-proof material.
21. the displacement measurement system as claimed in claim 1 based on diffraction grating, its feature
It is, the diffraction grating is transmission-type binary phase grat.
22. it is a kind of using as described in any one in claim 1~21 based on diffraction grating
The displacement measurement method of displacement measurement system, it is characterised in that launched by light source to prism and surveyed
Light is measured, and light will be measured by the prism reflexes to diffraction grating and form the diffraction that interferes
Light, the diffraction light receives what is interfered by not airborne light path by photodetector
The interference fringe of diffraction light formation, when the workbench that can be moved relative to complete machine framework makees displacement
When, phase place change occurs for interference fringe, by control system according to the interference bar on photodetector
The change of line phase calculates the workbench that can be moved relative to the position that complete machine framework is made
Shifting amount.
23. the displacement of the displacement measurement system as claimed in claim 22 based on diffraction grating is surveyed
Amount method, it is characterised in that the prism is reflecting prism.
24. the displacement of the displacement measurement system as claimed in claim 22 based on diffraction grating is surveyed
Amount method, it is characterised in that the prism is Amici prism, by prime number light source to described point
Light prism sends light, and light is divided into measurement light and reference light, described point by the Amici prism
The measurement light is reflexed to the diffraction grating formation diffraction light by light prism, by the reference light
Refraction, sets coupler to collect the diffraction light and the reference light and feeds back to institute after coupling
State be shown as on photodetector, the photodetector diffraction light formation interference fringe and
The reference striations of reference light formation, when the workbench makees displacement relative to complete machine framework,
Relative to the reference striations phase place change occurs for the interference fringe, by the control system
According to the interference fringe on the photodetector relative to the phase occurred with reference to striations
Change, calculates the workbench relative to the displacement made by complete machine framework.
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Application publication date: 20170808 |