CN107015399B - Color film substrate and manufacturing method thereof, display device and manufacturing method thereof - Google Patents
Color film substrate and manufacturing method thereof, display device and manufacturing method thereof Download PDFInfo
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- CN107015399B CN107015399B CN201710330282.5A CN201710330282A CN107015399B CN 107015399 B CN107015399 B CN 107015399B CN 201710330282 A CN201710330282 A CN 201710330282A CN 107015399 B CN107015399 B CN 107015399B
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13396—Spacers having different sizes
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- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
Abstract
The invention provides a color film substrate and a manufacturing method thereof, a display device and a manufacturing method thereof, wherein the method comprises the following steps: providing a glass substrate, wherein the glass substrate comprises a color film area, a W color film area and a spacer area; manufacturing a color film layer corresponding to the color film area, wherein the color film layer comprises a first color resistance layer, a second color resistance layer and a third color resistance layer; manufacturing a spacer, a flattening layer and a protective film layer; wherein the spacer corresponds to the spacer region; the flattening layer corresponds to the W color film area; the sequence of manufacturing the isolation pad, the smoothing layer and the protective film layer comprises the steps of simultaneously manufacturing the isolation pad and the smoothing layer, and then manufacturing the protective film layer; or, the protective film layer is firstly manufactured, and then the spacer and the smoothing layer are simultaneously manufactured. The manufacturing method of the color film substrate provided by the invention can improve the consistency of response time and display effect, and can avoid the increase of production line operation and product cost.
Description
Technical Field
The invention relates to the technical field of display, in particular to a color film substrate and a manufacturing method thereof, and a display device and a manufacturing method thereof.
Background
The principle of the RGBW lcd panel technology is to add a white (W) sub-pixel to a conventional RGB pixel composed of three colors of red (R), green (G), and blue (B), and then to apply a corresponding sub-pixel imaging technology to better arrange the sub-pixels in such a way that a human sees an image. RGBW subpixel imaging techniques address each subpixel individually and add a white subpixel to the arrangement pattern to form an RGBW pixel design that is brighter and higher resolution than the display panel of a conventional RGB pixel design. Therefore, RGBW liquid crystal panels are increasingly used.
As shown in fig. 1, since the W sub-pixel has no color resistance, after a protective film layer (OC) is entirely coated, there is a step difference between a portion of the protective film layer covering the W sub-pixel and a portion of the protective film layer covering the R, G, B sub-pixel, which results in uneven surface of the alignment layer, and also causes non-uniform diffusion of liquid crystal molecules in contact with the alignment layer, thereby causing defects such as dark unevenness (DNU), afterimage, and contact display unevenness (Touch Mura). In addition, the step causes the liquid crystal Cell Gap (Cell Gap) corresponding to the W sub-pixel after Cell alignment to be higher than the liquid crystal Cell Gap corresponding to the RGB sub-pixel, so that the response time of the W sub-pixel is inconsistent with that of the RGB sub-pixel, and the display effect is affected.
Disclosure of Invention
The invention aims to at least solve one of the technical problems in the prior art, and provides a color film substrate and a manufacturing method thereof, a display device and a manufacturing method thereof, which can not only improve the consistency of response time and improve the display effect, but also avoid the increase of production line operation and product cost.
In order to achieve the object of the present invention, a method for manufacturing a color filter substrate is provided, which includes:
providing a glass substrate, wherein the glass substrate comprises a color film area, a W color film area and a spacer area;
manufacturing a color film layer corresponding to the color film area, wherein the color film layer comprises a first color resistance layer, a second color resistance layer and a third color resistance layer;
manufacturing a spacer, a flattening layer and a protective film layer; wherein the spacer corresponds to the spacer region; the flattening layer corresponds to the W color film area; the sequence of manufacturing the isolation pad, the smoothing layer and the protective film layer comprises the steps of simultaneously manufacturing the isolation pad and the smoothing layer, and then manufacturing the protective film layer; or the protective film layer is manufactured firstly, and then the isolation pad and the flattening layer are manufactured simultaneously.
Preferably, a half-tone mask is used for simultaneously manufacturing the spacer and the flattening layer;
the half-tone mask consists of a non-light-transmitting area, a first light-transmitting area and a second light-transmitting area, wherein the first light-transmitting area corresponds to the spacer area; the second light-transmitting area corresponds to the W color film area.
Preferably, the spacer region comprises a main spacer sub-region and a sub-spacer sub-region; the shock insulator comprises a main shock insulator and an auxiliary shock insulator, which respectively correspond to the main shock insulator sub-region and the auxiliary shock insulator sub-region;
the first light-transmitting area comprises a first light-transmitting sub area and a second light-transmitting sub area, wherein the first light-transmitting sub area corresponds to the main spacer sub area; the second light-transmitting subarea corresponds to the auxiliary spacer subarea; and the transmittance of the first light-transmitting subarea is greater than that of the second light-transmitting subarea.
Preferably, the second color resistance layer is located between the first color resistance layer and the third color resistance layer, and the film thickness of the second color resistance layer is smaller than that of the first color resistance layer; the film thickness of the second color resistance layer is smaller than that of the third color resistance layer.
Preferably, the film thickness of the first color-resisting layer is equal to the film thickness of the third color-resisting layer.
As another technical solution, the present invention further provides a color film substrate, including:
the glass substrate comprises a color film area, a W color film area and a spacer area;
the color film layer is arranged in the color film area on the glass substrate and comprises a first color resistance layer, a second color resistance layer and a third color resistance layer;
a spacer, a flattening layer and a protective film layer disposed on the glass substrate; the spacer corresponds to the spacer area; the flattening layer corresponds to the W color film area; the protective film layer is positioned above the spacer and the smoothing layer; alternatively, the spacer and the leveling layer are located on the protective film layer.
Preferably, the spacer region comprises a main spacer sub-region and a sub-spacer sub-region;
the shock insulator comprises a main shock insulator and an auxiliary shock insulator, which respectively correspond to the main shock insulator sub-region and the auxiliary shock insulator sub-region;
the height of the main shock insulator is greater than that of the auxiliary shock insulator.
Preferably, the second color resistance layer is located between the first color resistance layer and the third color resistance layer, and the film thickness of the second color resistance layer is smaller than that of the first color resistance layer; the film thickness of the second color resistance layer is smaller than that of the third color resistance layer.
Preferably, the film thickness of the first color-resisting layer is equal to the film thickness of the third color-resisting layer.
As another technical solution, the present invention further provides a manufacturing method of a display device, which includes the manufacturing method of the color film substrate provided by the present invention.
As another technical solution, the present invention further provides a display device, which includes the color film substrate provided by the present invention.
The invention has the following beneficial effects:
according to the color film substrate and the manufacturing method thereof, the display device and the manufacturing method thereof, provided by the invention, by means of the flattening layer corresponding to the W color film region, the section difference between the part of the protective film layer covering the W color film region and the part of the protective film layer covering the color film region can be reduced, so that the defects of dark state unevenness (DNU), residual image, contact display unevenness (Touch Mura) and the like can be improved, the thickness of a liquid crystal unit gap (Cell gap) corresponding to the W color film region after box alignment can be consistent with the thickness of the liquid crystal unit gap corresponding to the color film region, the consistency of response time can be improved, and the display effect can be improved. In addition, through the above-mentioned smooth layer of preparation when preparation shock insulator, need not to increase the process of preparation smooth layer to can avoid producing the increase of line operation and product cost.
Drawings
Fig. 1 is a schematic structural diagram of a color film substrate;
fig. 2 is a flowchart of a method for manufacturing a color filter substrate according to a first embodiment of the present invention;
fig. 3A is a structural diagram of a color film substrate after a color film layer is manufactured according to a first embodiment of the present invention;
fig. 3B is a structural diagram of the color film substrate after the spacers and the flattening layer are manufactured in the first embodiment of the present invention;
FIG. 3C is a diagram illustrating a mask used for forming a spacer and a planarization layer according to a first embodiment of the present invention;
FIG. 3D is a diagram illustrating a process of fabricating a protective film using a mask according to a first embodiment of the present invention;
fig. 3E is a structural diagram of the color film substrate after the fabrication of the protective film layer is completed according to the first embodiment of the present invention;
fig. 4A is a structural diagram of a color filter substrate after a protective film layer is manufactured according to a second embodiment of the present invention;
fig. 4B is a structural diagram of a color filter substrate after a spacer and a leveling layer are manufactured in the second embodiment of the present invention;
fig. 5 is a structural diagram of a color filter substrate obtained by a method for manufacturing a color filter substrate according to a third embodiment of the present invention;
FIG. 6 is a graph of protective film thickness versus RGBW step.
Detailed Description
In order to make those skilled in the art better understand the technical solution of the present invention, the color film substrate and the manufacturing method thereof, and the display device and the manufacturing method thereof provided by the present invention are described in detail below with reference to the accompanying drawings.
Referring to fig. 2 to fig. 3E, the method for manufacturing a color filter substrate according to the present embodiment includes:
A black matrix 2 is also formed on the glass substrate 1.
And 102, manufacturing a color film layer 3 corresponding to the color film area, wherein the color film layer 3 comprises a first color resistance layer, a second color resistance layer and a third color resistance layer.
In this embodiment, the first color resist layer, the second color resist layer and the third color resist layer are RGB, and the thicknesses of the first color resist layer, the second color resist layer and the third color resist layer are equal. Of course, in practical applications, the three color-resist layers may also be CMY respectively. The following description will be given by taking the RGB color resist layer as an example.
103, simultaneously manufacturing a spacer and a flattening layer 5, and then manufacturing a protective film layer 7; wherein, the spacer corresponds to the spacer area; the flattening layer 5 corresponds to the W color film region.
In the present embodiment, as shown in fig. 3B, the spacer region includes a main spacer sub-region and a sub-spacer sub-region. The spacers comprise a main spacer 41 and a secondary spacer 42, which correspond to the above-mentioned main spacer sub-area and secondary spacer sub-area, respectively. The auxiliary spacers 42 are used to provide auxiliary support when the display screen is subjected to external pressure.
As shown in fig. 3C, the main spacer 41, the sub spacer 42, and the flattening layer 5 are simultaneously produced using the half-tone mask 6. Specifically, the half-tone mask 6 is composed of a non-light-transmitting region, a first light-transmitting region and a second light-transmitting region 63, wherein the first light-transmitting region corresponds to a spacer region, the first light-transmitting region includes a first light-transmitting sub-region 61 and a second light-transmitting sub-region 63, and the first light-transmitting sub-region 61 corresponds to a main spacer sub-region; the second light-transmitting sub-region 62 corresponds to the sub-spacer sub-region; the transmittance of the first light-transmitting sub-region 61 is greater than that of the second light-transmitting sub-region 62, so that the height of the main spacer 41 is greater than that of the sub spacer 42. The second light-transmitting region 63 corresponds to the W color filter region. The remaining regions of the half-tone mask 6 are non-light-transmitting regions except for the first light-transmitting sub-region 61, the second light-transmitting sub-region 62, and the second light-transmitting region 63.
In addition, by adjusting the transmittance of the second light-transmitting region 63, different thicknesses of the leveling layer 5 can be obtained, so that the size of the gap between the liquid crystal cells corresponding to the W sub-pixel after cell alignment can be adjusted to compensate for the difference between the gap between the liquid crystal cells corresponding to the W sub-pixel and the gap between the liquid crystal cells corresponding to the RGB sub-pixels, thereby improving the uniformity of response time and improving the display effect.
As shown in fig. 3D, the non-light-transmitting region of the mask used for forming the protective film layer 7 corresponds to the main spacer 41 and the sub spacer 42, and the remaining regions of the mask are light-transmitting regions. As shown in fig. 3E, after the protective film layer 7 is manufactured, a step difference between a portion of the protective film layer 7 covering the W color filter region and a portion of the protective film layer 7 covering the color filter region is reduced or even eliminated, so that defects such as dark state unevenness (DNU), afterimage, and contact display unevenness (Touch Mura) can be improved, and a thickness of a liquid crystal Cell gap (Cell gap) corresponding to the W color filter region after Cell pairing tends to be consistent with a thickness of a liquid crystal Cell gap corresponding to the color filter region, thereby improving uniformity of response time and improving display effect. In addition, through make above-mentioned smooth layer 5 when making the shock insulator, need not to increase the process of making smooth layer 5 to can avoid producing the increase of line operation and product cost.
Fig. 4A is a structural diagram of a color filter substrate after a protective film layer is manufactured according to a second embodiment of the present invention. Fig. 4B is a structural diagram of the color filter substrate after the spacers and the leveling layer are manufactured in the second embodiment of the present invention. Referring to fig. 4A and 4B together, the method for manufacturing a color filter substrate according to the present embodiment is different from the first embodiment only in the order of manufacturing the spacer, the leveling layer, and the protective film layer, that is, the protective film layer 8 is manufactured first, and then the spacer (the main spacer 41 and the sub spacer 42) and the leveling layer 9 are manufactured at the same time.
As shown in fig. 4A, after the protective film layer 8 is completely formed, there is a step difference between the portion of the protective film layer 8 covering the W sub-pixel and the portion of the protective film layer 8 covering the R, G, B sub-pixel. As shown in fig. 4B, the main spacer 41, the sub spacer 42, and the leveling layer 9 are simultaneously formed using the half-tone mask 6. The leveling layer 9 can compensate the segment difference, so that the thickness of the liquid crystal Cell gap (Cell gap) corresponding to the W color film region after box alignment tends to be consistent with the thickness of the liquid crystal Cell gap corresponding to the color film region, thereby improving the consistency of response time and improving the display effect.
The structure of the half-tone mask 6 has been described in detail in the first embodiment, and is not described herein again.
Fig. 5 is a structural diagram of a color filter substrate obtained by using a method for manufacturing a color filter substrate according to a third embodiment of the present invention. Referring to fig. 5, compared with the second embodiment, the manufacturing method of the color film substrate provided in this embodiment is different only in that: the thicknesses of the first color resistance layer, the second color resistance layer and the third color resistance layer are different. The following description will be given taking RGB as an example of each of the three color resist layers. Specifically, the G color resistance layer is positioned between the R color resistance layer and the B color resistance layer, and the film thickness of the G color resistance layer is smaller than that of the R color resistance layer; the film thickness of the G color resistance layer is smaller than that of the B color resistance layer.
It was found through experiments that when the thicknesses of the R, G and B color resists are equal, after the fabrication of the protective film layer is completed, there is a step difference between the portion of the protective film layer covering the W subpixel and the portion of the protective film layer covering the R, G, B subpixel, and since both the R and B subpixels are directly adjacent to the W subpixel in the non-flattened state, the protective film material applied to the R and B subpixels preferentially diffuses to the position of the W subpixel, while the protective film material applied to the G subpixel can diffuse only to the peripheral R and B subpixel regions, and the diffusion rate and diffusion amount are lower than those of the R and B subpixels. Therefore, the step difference between the portion of the protective film layer covering the W sub-pixel and the portion of the protective film layer covering the G sub-pixel is largest. As shown in fig. 6, since the smaller the thickness of the protective film layer 8 ', the larger the level difference between the R, G, B, W sub-pixels, it is necessary to increase the thickness of the protective film layer 8 ' as appropriate if the level difference between the portions of the R, G, B, W sub-pixels covered with the protective film layer 8 ' is to be smoothed.
Therefore, by making the film thickness of the G resist layer smaller than that of the R resist layer and the film thickness of the G resist layer smaller than that of the B resist layer, that is, by minimizing the film thickness of the G resist layer, the thickness of the protective film layer 8 'can be reduced while smoothing the step difference between the portions of the protective film layer 8' covering the R, G, B, W subpixels, so that the amount of material used for the protective film layer can be reduced, and the process cost can be reduced.
After the formation of the protective film layer 8 is completed, the main spacer 41, the sub spacer 42, and the flattening layer 9' are simultaneously formed using the half-tone mask 6. The manufacturing process has been described in detail in the second embodiment, and is not described herein again.
Preferably, the film thickness of the R color resistance layer is equal to that of the B color resistance layer, so that the processing is convenient.
As another technical solution, the present invention further provides a color filter substrate, as shown in fig. 3E, where the color filter substrate includes:
the glass substrate 1 comprises a color film area, a W color film area and a spacer area. A black matrix 2 is also formed on the glass substrate 1.
The color film layer 2 is arranged in a color film area on the glass substrate 1, and the color film layer 2 comprises a first color resistance layer, a second color resistance layer and a third color resistance layer. The three may be RGB or CMY, respectively.
A spacer, a flattening layer 5 and a protective film layer 7 provided on the glass substrate 1. Wherein the spacer corresponds to the spacer region. In this embodiment, the spacer includes a main spacer 41 and a sub spacer 42, which correspond to the main spacer sub-area and the sub spacer sub-area, respectively. The height of the main spacer 41 is greater than that of the sub spacer 42. The flattening layer 5 corresponds to the W color film region. A protective film layer 7 is located over the spacer and smoothing layer 5.
By means of the flattening layer corresponding to the W color film region, the section difference between the part of the protective film layer covering the W color film region and the part of the protective film layer covering the color film region can be reduced, so that the defects of light leakage (DNU), residual image, press color difference (Touch Mura) and the like can be improved, the thickness of a liquid crystal unit gap (Cell gap) corresponding to the W color film region after box alignment can be enabled to be consistent with that of the liquid crystal unit gap corresponding to the color film region, the consistency of response time can be improved, and the display effect can be improved. In addition, through the above-mentioned smooth layer of preparation when preparation shock insulator, need not to increase the process of preparation smooth layer to can avoid producing the increase of line operation and product cost.
Alternatively, as shown in fig. 4B, the spacer and smoothing layer 9 is located on top of the protective film layer 8. This also can reduce the level difference between the portion of the protective film layer covering the W color filter region and the portion of the protective film layer covering the color filter region.
Preferably, as shown in fig. 5, the second color resist (G) is located between the first color resist (R) and the third color resist (B), and the film thickness of the second color resist (G) is smaller than that of the first color resist (R); the film thickness of the second color resist layer (G) is smaller than that of the third color resist layer (B). This can reduce the thickness of the protective film layer 8 'while smoothing the level difference between the portions of the protective film layer 8' covering the R, G, B, W subpixels, so that the amount of material used for the protective film layer can be reduced, and the process cost can be reduced.
In addition, the film thickness of the first color-resisting layer (R) is preferably equal to the film thickness of the third color-resisting layer (B) for processing.
As another technical solution, the present invention further provides a manufacturing method of a display device, which includes the manufacturing method of the color film substrate provided in each of the embodiments of the present invention.
According to the manufacturing method of the display device, provided by the invention, by adopting the manufacturing method of the color film substrate provided by each embodiment of the invention, the consistency of response time can be improved, the display effect is improved, and the increase of production line operation and product cost can be avoided.
As another technical solution, the present invention further provides a display device, which includes the color film substrate provided by the present invention.
According to the display device provided by the invention, by adopting the color film substrate provided by the invention, the consistency of response time can be improved, the display effect is improved, and the increase of production line operation and product cost can be avoided.
It will be understood that the above embodiments are merely exemplary embodiments taken to illustrate the principles of the present invention, which is not limited thereto. It will be apparent to those skilled in the art that various modifications and improvements can be made without departing from the spirit and substance of the invention, and these modifications and improvements are also considered to be within the scope of the invention.
Claims (9)
1. A manufacturing method of a color film substrate is characterized by comprising the following steps:
providing a glass substrate, wherein the glass substrate comprises a color film area, a W color film area and a spacer area;
manufacturing a color film layer corresponding to the color film area, wherein the color film layer comprises a first color resistance layer, a second color resistance layer and a third color resistance layer, the second color resistance layer is positioned between the first color resistance layer and the third color resistance layer, and the film thickness of the second color resistance layer is smaller than that of the first color resistance layer; the film thickness of the second color resistance layer is smaller than that of the third color resistance layer;
manufacturing a spacer, a flattening layer and a protective film layer; wherein the spacer corresponds to the spacer region; the flattening layer corresponds to the W color film area; the sequence of manufacturing the isolation pad, the smoothing layer and the protective film layer comprises the steps of simultaneously manufacturing the isolation pad and the smoothing layer, and then manufacturing the protective film layer; or the protective film layer is manufactured firstly, and then the isolation pad and the flattening layer are manufactured simultaneously.
2. The manufacturing method of the color film substrate according to claim 1, wherein the spacer and the flattening layer are simultaneously manufactured by using a half-tone mask;
the half-tone mask consists of a non-light-transmitting area, a first light-transmitting area and a second light-transmitting area, wherein the first light-transmitting area corresponds to the spacer area; the second light-transmitting area corresponds to the W color film area.
3. The manufacturing method of the color film substrate according to claim 2, wherein the spacer region comprises a main spacer subregion and an auxiliary spacer subregion; the shock insulator comprises a main shock insulator and an auxiliary shock insulator, which respectively correspond to the main shock insulator sub-region and the auxiliary shock insulator sub-region;
the first light-transmitting area comprises a first light-transmitting sub area and a second light-transmitting sub area, wherein the first light-transmitting sub area corresponds to the main spacer sub area; the second light-transmitting subarea corresponds to the auxiliary spacer subarea; and the transmittance of the first light-transmitting subarea is greater than that of the second light-transmitting subarea.
4. The manufacturing method of the color filter substrate according to claim 1, wherein a film thickness of the first color resist layer is equal to a film thickness of the third color resist layer.
5. A color film substrate is characterized by comprising:
the glass substrate comprises a color film area, a W color film area and a spacer area;
the color film layer is arranged in the color film area on the glass substrate and comprises a first color resistance layer, a second color resistance layer and a third color resistance layer, the second color resistance layer is positioned between the first color resistance layer and the third color resistance layer, and the film thickness of the second color resistance layer is smaller than that of the first color resistance layer; the film thickness of the second color resistance layer is smaller than that of the third color resistance layer;
a spacer, a flattening layer and a protective film layer disposed on the glass substrate; the spacer corresponds to the spacer area; the flattening layer corresponds to the W color film area; the protective film layer is positioned above the spacer and the smoothing layer; alternatively, the spacer and the leveling layer are located on the protective film layer.
6. The color film substrate of claim 5, wherein the spacer regions comprise primary spacer sub-regions and secondary spacer sub-regions;
the shock insulator comprises a main shock insulator and an auxiliary shock insulator, which respectively correspond to the main shock insulator sub-region and the auxiliary shock insulator sub-region;
the height of the main shock insulator is greater than that of the auxiliary shock insulator.
7. The color filter substrate according to claim 5, wherein a film thickness of the first color resist layer is equal to a film thickness of the third color resist layer.
8. A method for manufacturing a display device, comprising the method for manufacturing a color filter substrate according to any one of claims 1 to 4.
9. A display device comprising the color filter substrate according to any one of claims 5 to 7.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710330282.5A CN107015399B (en) | 2017-05-11 | 2017-05-11 | Color film substrate and manufacturing method thereof, display device and manufacturing method thereof |
| PCT/CN2018/070078 WO2018205650A1 (en) | 2017-05-11 | 2018-01-03 | Color film substrate and manufacturing method therefor, display device and manufacturing method therefor |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710330282.5A CN107015399B (en) | 2017-05-11 | 2017-05-11 | Color film substrate and manufacturing method thereof, display device and manufacturing method thereof |
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| CN107015399A CN107015399A (en) | 2017-08-04 |
| CN107015399B true CN107015399B (en) | 2020-04-24 |
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|---|---|---|---|---|
| CN107015399B (en) * | 2017-05-11 | 2020-04-24 | 京东方科技集团股份有限公司 | Color film substrate and manufacturing method thereof, display device and manufacturing method thereof |
| CN108919547B (en) * | 2018-07-10 | 2020-08-07 | 武汉华星光电半导体显示技术有限公司 | Manufacturing method of color film substrate |
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| KR20070003180A (en) * | 2005-06-30 | 2007-01-05 | 엘지.필립스 엘시디 주식회사 | Method for fabricating color filter substrate of liquid crystal display device |
| TWI418903B (en) * | 2009-09-30 | 2013-12-11 | Au Optronics Corp | Array structure and manufacturing method thereof |
| CN202548354U (en) * | 2012-02-29 | 2012-11-21 | 京东方科技集团股份有限公司 | Colorful film substrate, display panel and display apparatus |
| CN104317098A (en) * | 2014-11-05 | 2015-01-28 | 京东方科技集团股份有限公司 | Display substrate and preparation method thereof |
| CN104678639A (en) * | 2014-12-30 | 2015-06-03 | 深圳市华星光电技术有限公司 | Method for manufacturing color filter substrate |
| CN104793391B (en) * | 2015-03-18 | 2019-04-16 | 深圳市华星光电技术有限公司 | A kind of production method of color membrane substrates, color membrane substrates and liquid crystal display panel |
| CN105259692A (en) * | 2015-10-28 | 2016-01-20 | 信利（惠州）智能显示有限公司 | Manufacturing method for color filter |
| CN106154613B (en) * | 2016-06-30 | 2018-09-18 | 京东方科技集团股份有限公司 | Display base plate and preparation method thereof, display device |
| CN107015399B (en) * | 2017-05-11 | 2020-04-24 | 京东方科技集团股份有限公司 | Color film substrate and manufacturing method thereof, display device and manufacturing method thereof |
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2017
- 2017-05-11 CN CN201710330282.5A patent/CN107015399B/en active Active
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| WO2018205650A1 (en) | 2018-11-15 |
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