CN106978091A - Efficient hardening oxidation zircon ceramic polishing fluid and preparation method thereof - Google Patents
Efficient hardening oxidation zircon ceramic polishing fluid and preparation method thereof Download PDFInfo
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- CN106978091A CN106978091A CN201710260862.1A CN201710260862A CN106978091A CN 106978091 A CN106978091 A CN 106978091A CN 201710260862 A CN201710260862 A CN 201710260862A CN 106978091 A CN106978091 A CN 106978091A
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- polishing fluid
- mohs
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- grinding agent
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
Abstract
The present invention provides a kind of efficient hardening oxidation zircon ceramic polishing fluid, it is characterised in that：It is more than 5 grinding agent comprising 1) Mohs' hardness；2) Mohs' hardness is less than 5 grinding agent；3) surfactant, 4) phosphorus-containing compound buffer, 5) water, polishing fluid pH value is adjusted to 1.5~4.5 by buffer.
Description
Technical field
The present invention relates to a kind of polishing technology of hardening oxidation thing ceramic surface, more particularly to zirconium oxide hard ceramic table
The efficient mirror finish liquid in face and preparation method thereof.
Background technology
Currently marketed zirconia ceramics essence throws polishing fluid and mainly does polishing rubbing agent with Ludox.In alkaline pH 10
Under~11, water and silica and the zirconium surface formation silicon zirconates of Ludox will be hard with the help of mechanical force
Zirconia ceramics is ground, polished.Ludox class zirconia ceramics polishing fluid solid content currently on the market is high, and efficiency
It is low, because temperature rise causes during glossing easily hardened, and easily air-dry, be unsuitable on zirconia ceramics surface
Follow-up cleaning.The stock removal rate of conventional oxidation zircon ceramic polishing fluid increases and increased with pH.Previous experiments show, molten with silicon
Glue is as rubbing agent, and when pH is less than 4.5, non-uniform corrosion occurs in ceramic surface, has a large amount of hole points (pit) in ceramic surface,
Mirror effect can not be realized, and polishing efficiency is reduced and reduced with pH.
The content of the invention
Present invention aims at a kind of polishing efficiency height, surface zero defect is invented, polish and be difficult in long lifespan, polishing process
Occur it is hardened, beneficial to the efficient minute surface zirconia ceramics polishing fluid subsequently cleaned, its polishing efficiency is up to more than 10 μm/hour.
It is of the present invention solve the problems, such as use technical scheme be：
Present invention aims at a kind of polishing efficiency height, surface zero defect is invented, polish and be difficult in long lifespan, polishing process
Occur it is hardened, beneficial to the efficient minute surface zirconia ceramics polishing fluid subsequently cleaned.Its polishing efficiency is in the scopes of pH 1.5~4.5
Interior, its efficiency high is up to more than 10 μm/hour.
The effective ingredient of the present invention is more than 5 grinding agent comprising 1) Mohs' hardness and (abrasive hardcoat is also known as in the present invention
Agent)；2) Mohs' hardness is less than 5 grinding agent (also known as soft grinding agent in the present invention)；3) surfactant, 4) phosphorous chemical combination
Thing buffer, 5) water, polishing fluid pH value is adjusted to 1.5~4.5 by buffer.
In certain embodiments, the pH value preferably 1.5~3.5, more preferably 1.5~2.5.
In certain embodiments, the Mohs' hardness be more than 5 grinding agent for 30~1200nm of particle diameter aluminum oxide, carbonization
One kind in silicon, boron carbide, preferably aluminum oxide.
In wherein some embodiments, the aluminum oxide is Alpha-alumina, and α-crystalline phase accounts for more than the 90% of aluminum oxide.
In certain embodiments, to be less than 5 grinding agent molten for Ludox, alumina sol, titanium oxide for the Mohs' hardness
One kind in glue, cerium hydroxide sol, preferably Ludox.
By the electric double layer performance of suitable pH value control oxide ceramic surface in the present invention, effectively hydration, softening is hard
Hard ceramic oxide surface, by hard, soft grinding agent collective effect, realizes the efficient, oxide ceramics on high-quality surface
Polishing.Easily dried with the soft grinding agent polishing solution such as pure silicon colloidal sol under the conditions of polish temperature and condense and (be commonly called as crystallization) no
Together, the composite polishing liquid that the agent of the abrasive hardcoat such as aluminum oxide/Ludox and soft grinding agent are used in combination can be divided again after air-drying
Dissipate, the generation recycled without causing to scratch.Simultaneously it is different from soft grinding agent, abrasive hardcoat agent not with zirconia ceramics surface
Chemical bond, and effectively substantially reduce soft grinding agent to ceramic surface pitting corrosion phenomenon, high quality mirror can be produced
The ceramics of effect.Product of the present invention is different from conventional oxidation zircon ceramic polishing fluid, is adjusted in phosphorus-containing compound buffer rational formula
Under the conditions of section, zirconia ceramics polishing stock removal rate is raised suddenly in the range of pH 1.5~4.5, and ensures the minute surface of ceramic surface
Precision.Wherein because different grinding agents are different from the complexing situation of phosphorous buffer, therefore it may be selected according to different grinding agents
Different buffers, or suitable effect can be reached in the case where not changing buffer by the regulation of surfactant
Really.
In order to further improve in the performance of product, the polishing fluid effective ingredient, grinding agent of the Mohs' hardness more than 5,
Mohs' hardness be less than 5 grinding agent, phosphorus-containing compound buffer and surfactant account for respectively polishing fluid gross mass 10.0~
30%th, 1.0~10%, 0.05~5% and 0.05~3.0%.
It is preferred that, Mohs' hardness is more than grinding agent, phosphorous buffer and the surface work that 5 grinding agent, Mohs' hardness are less than 5
Property agent accounts for 15.0~25%, 3.0~8%, 0.1~4% and the 0.1~2.5% of polishing fluid gross mass respectively.
It is total that particle diameter accounts for polishing fluid respectively for 30~1200nm aluminum oxide, Ludox, phosphorous buffer and surfactant
10.0~30%, 1.0~10%, 0.05~5% and the 0.05~3.0% of quality.
Another object of the present invention is to invent a kind of preparation method for preparing above-mentioned polishing fluid：
The grinding agent that the grinding agent that a kind of Mohs' hardness is first more than to 5 is less than 5 with a kind of Mohs' hardness is dispersed in water, and is stirred
Mix uniform, sequentially add surfactant, the pH value of suspension is finally adjusted to 1.5 with phosphorus-containing compound buffer~
4.5.The pH value preferably 1.5~3.5, more preferably 1.5~2.5.
Wherein, Mohs' hardness is more than grinding agent, phosphorus-containing compound buffer and the table that 5 grinding agent, Mohs' hardness are less than 5
Face activating agent accounts for 10.0~30%, 1.0~10%, 0.05~5%, the 0.05~3.0% of polishing fluid gross mass respectively.
The method of the present invention is simple, reasonable, it is easy to produce, product stability is good.
Beneficial effects of the present invention：
By the electric double layer performance of suitable pH value control oxide ceramic surface in the present invention, effectively hydration, softening is hard
Hard ceramic oxide surface, by hard, soft grinding agent collective effect, realizes the efficient, oxide ceramics on high-quality surface
Polishing.Easily dried from pure silicon colloidal sol polishing fluid under the conditions of polish temperature and condense and (be commonly called as crystallization) different, aluminum oxide/silicon is molten
Glue composite polishing liquid can be by redisperse after air-drying, the generation recycled without causing to scratch.
Embodiment
The present invention is described in further details below in conjunction with specific embodiment.
First, the influence of pH value
Embodiment 1：
Prepare 12 parts of following suspension：In 720g water, Alpha-alumina, the 100g in about 0.4 micron of 300 gram particle footpath are added
Ludox, 15g Polyethylenimine ethyl acetate surfactants, stir.PH is finally transferred to 10.0 with dodecylphosphoric acid,
8.0,6.0,5,4.5,4.0,3.5,3,2.5,2.0,1.5,1.0 use for zirconia ceramics polishing.
Made sample is polished on holy high single side polishing machine.Push：5psi, lower wall rotating speed 50RPM, polish flow velocity：
100ml/ minutes, polishing pad was Rohm Haas Suba 600.Polishing time 20 minutes.Long 13.8mm, wide 6.7mm zirconium oxides
Potsherd, which is used to polish, to be tested.Under normal temperature condition, the Series Polishing Liquid polishing speed is respectively 18,20,23,27,42,47,
65th, 76,100,128,155,30 nm/minute.Polishing machine and polishing production material surface are without deposition.
Embodiment 2：
Except the grinding agent that Mohs' hardness is more than 5 is carborundum, the grinding agent that Mohs' hardness is less than 5 is cerium hydroxide, table
Face activating agent is hexadecyltrimethylammonium chloride, other all sames from preparation method to polishing method and in embodiment 1.
Under normal temperature condition, the Series Polishing Liquid polishing speed is respectively 20,22,23,26,50,56,65,76,110,
130th, 150,28 nm/minute.Polishing machine and polishing production material surface are without deposition.
2nd, the influence of particle diameter
Embodiment 3：
Prepare six parts of following suspension：In 700g water, 250 gram particle footpaths about 0.20 of addition, 0.30,0.40,1.00,1.2,
1.3 microns of Alpha-alumina, 50g Ludox, 30g Polyethylenimines ethyl acetate and 20g PEO~PPO~PEO block copolymerizations
Thing, stirs.PH is finally transferred to 2.0 with diethylphosphate, used for zirconia ceramics polishing.
Made sample is polished on holy high single side polishing machine.Push：5psi, lower wall rotating speed 50RPM, polish flow velocity：
100ml/ minutes, the polishing pads of Suba 600.Polishing time 20 minutes.Long 13.8mm, (surface is thick for wide 6.7mm zirconia ceramics piece
400 microns of rugosity) it is used to polish test.Under normal temperature condition, the Series Polishing Liquid polishing speed is respectively 76,102,139,120,
100th, 83 nm/minute, it can be seen that surface polishing stock removal rate is not that simple abrasive particles degree increases and increased, when surface is risen
Polishing stock removal rate is maximum when beginning roughness and close grinding agent granularity.Polishing machine and polishing production material surface are without deposition.
Embodiment 4
Except the grinding agent that Mohs' hardness is more than 5 is boron carbide, the grinding agent that Mohs' hardness is less than 5 is alumina sol,
Surfactant is cetyl potassium sulfonate, other all sames from preparation method to polishing method and in embodiment 3.
Under normal temperature condition, the Series Polishing Liquid polishing speed is respectively 70,100,136,122,105,80 nm/minutes,
Polishing stock removal rate in surface is not that simple abrasive particles degree increases and increased as can be seen here, when surface initial roughness and grinding agent
Stock removal rate is polished when granularity is close maximum.Polishing machine and polishing production material surface are without deposition.
3rd, the influence of each component concentration
Embodiment 5
The polishing fluid formula and polishing test result of following series are shown in Table 1.
Comparative example 1：
Prepare following suspension：In 740g water, the Alpha-alumina in about 0.40 micron of 250 gram particle footpath is added, nitre is finally used
Sour pH is transferred to 2.0, is used for zirconia ceramics polishing.Without under stirring state, polishing fluid is precipitated quickly, serious hardened after a few days,
It is difficult to disperse again.
Made sample is polished on holy high single side polishing machine.Push：5psi, lower wall and load plate rotating speed 100RPM, throw
Light flow velocity：100ml/ minutes, the polishing pads of Suba 600.Polishing time 20 minutes.Long 13.8mm, wide 6.7mm zirconia ceramics
Piece (400 microns of surface roughness), which is used to polish, to be tested.The Series Polishing Liquid polishing speed is respectively 73 nm/minutes.Oxidation
It is serious to there is alumina deposit on a large amount of hole points, polishing machine and polishing pad in zircon ceramic surface.
Comparative example 2：
Prepare following suspension：In 780g water, the Ludox in about 0.80 micron of 200 gram particle footpath is added, finally pH is adjusted
To 2,8.5, used for zirconia ceramics polishing.
Made sample is polished on holy high single side polishing machine.Push：5psi, lower wall and load plate rotating speed 100RPM, throw
Light flow velocity：100ml/ minutes, the polishing pads of Suba 1200.Polishing time 20 minutes.Long 13.8mm, wide 6.7mm zirconia ceramics
Piece (400 microns of surface roughness), which is used to polish, to be tested.The Series Polishing Liquid polishing speed is respectively 18,28 nm/minutes.Oxygen
Change zircon ceramic surface roughness low, but polishing efficiency is low.There are a large amount of hole points in pH 2.0 polishing fluid surface, it is impossible to realize minute surface
Effect.
Comparative example 3：
Prepare following suspension：In 740g water, the Alpha-alumina in about 0.40 micron of 250 gram particle footpath is added, nitre is finally used
Sour pH is transferred to 2.0.Without under stirring state, polishing fluid is precipitated quickly, serious hardened after a few days, it is difficult to disperse again.
Made sample is polished on holy high single side polishing machine.Push：5psi, lower wall and load plate rotating speed 100RPM, throw
Light flow velocity：100ml/ minutes, the polishing pads of Suba 600.Polishing time 20 minutes.Diameter 100mm zirconia ceramics pieces (surface
400 microns of roughness) it is used to polish test.The Series Polishing Liquid polishing speed is respectively to be less than 10 nm/minutes, polishing efficiency
It is extremely low.
Claims (10)
1. efficient hardening oxidation zircon ceramic polishing fluid, it is characterised in that：It is more than 5 grinding agent comprising 1) Mohs' hardness；2) Mohs
Hardness is less than 5 grinding agent；3) surfactant, 4) phosphorus-containing compound buffer, 5) water, polishing fluid pH value is adjusted to by buffer
1.5~4.5.
2. efficiently hardening oxidation zircon ceramic polishing fluid as described in claim 1, it is characterised in that：The pH value preferably 1.5
~3.5, more preferably 1.5~2.5.
3. efficiently hardening oxidation zircon ceramic polishing fluid as described in claim 1, it is characterised in that：The Mohs' hardness is more than
5 grinding agent is one kind in 30~1200nm of particle diameter aluminum oxide, carborundum, boron carbide, preferably aluminum oxide.
4. efficiently hardening oxidation zircon ceramic polishing fluid as described in claim 3, it is characterised in that：The aluminum oxide is α-oxygen
Change aluminium, and α-crystalline phase accounts for more than the 95% of aluminum oxide.
5. efficiently hardening oxidation zircon ceramic polishing fluid as described in claim 1, it is characterised in that：The Mohs' hardness is less than
5 grinding agent is one kind in Ludox, alumina sol, cerium hydroxide sol, preferably Ludox.
6. efficiently hardening oxidation zircon ceramic polishing fluid as described in claim 1, it is characterised in that：Mohs' hardness is more than 5
Grinding agent, phosphorus-containing compound buffer and the surfactant that grinding agent, Mohs' hardness are less than 5 account for polishing fluid gross mass respectively
10.0~30%, 1.0~10%, 0.05~5%, 0.05~3.0%.
7. efficiently hardening oxidation zircon ceramic polishing fluid as described in claim 6, it is characterised in that：It is preferred that, Mohs' hardness
Grinding agent, phosphorous buffer and the surfactant that grinding agent, Mohs' hardness more than 5 are less than 5 account for polishing fluid gross mass respectively
15.0~25%, 3.0~8%, 0.1~4% and 0.1~2.5%.
8. the preparation method of the efficient hardening oxidation zircon ceramic polishing fluid as described in any in claim 1-7, it is characterised in that：
The grinding agent that the grinding agent that a kind of Mohs' hardness is first more than to 5 is less than 5 with a kind of Mohs' hardness is dispersed in water, and is stirred,
Surfactant is sequentially added, the pH value of suspension is finally adjusted to 1.5~4.5 with phosphorus-containing compound buffer.
9. the preparation method of efficiently hardening oxidation zircon ceramic polishing fluid as described in claim 8, it is characterised in that：The PH
Value preferably 1.5~3.5, more preferably 1.5~2.5.
10. the preparation method of efficiently hardening oxidation zircon ceramic polishing fluid as described in claim 8, it is characterised in that：Mohs
Grinding agent, phosphorus-containing compound buffer and the surfactant of grinding agent, Mohs' hardness less than 5 that hardness is more than 5 account for throwing respectively
10.0~30%, 1.0~10%, 0.05~5%, the 0.05~3.0% of light liquid gross mass.
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN108081038A (en) * | 2018-01-18 | 2018-05-29 | 东莞信柏结构陶瓷股份有限公司 | The polishing method of small ceramic |
| CN108102552A (en) * | 2017-12-19 | 2018-06-01 | 北京航天赛德科技发展有限公司 | A kind of polishing fluid polished for zirconia ceramics 3D and preparation method thereof |
| CN108117843A (en) * | 2018-01-18 | 2018-06-05 | 东莞信柏结构陶瓷股份有限公司 | Zirconia ceramics polishing fluid and preparation method thereof |
| CN109111857A (en) * | 2018-09-06 | 2019-01-01 | 北京保利世达科技有限公司 | A kind of polishing fluid and its purposes for polishing 2.5D zirconia ceramics plate |
| CN109988507A (en) * | 2017-12-29 | 2019-07-09 | 上海新安纳电子科技有限公司 | A kind of chemical mechanical polishing liquid and its preparation method and application for zirconia ceramics |
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| CN109111857A (en) * | 2018-09-06 | 2019-01-01 | 北京保利世达科技有限公司 | A kind of polishing fluid and its purposes for polishing 2.5D zirconia ceramics plate |
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Application publication date: 20170725 |