CN106972239A - A kind of novel plasma body antenna and application method - Google Patents
A kind of novel plasma body antenna and application method Download PDFInfo
- Publication number
- CN106972239A CN106972239A CN201710219886.2A CN201710219886A CN106972239A CN 106972239 A CN106972239 A CN 106972239A CN 201710219886 A CN201710219886 A CN 201710219886A CN 106972239 A CN106972239 A CN 106972239A
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- China
- Prior art keywords
- stainless steel
- wall
- plasma
- glass tube
- arc chamber
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/12—Supports; Mounting means
- H01Q1/22—Supports; Mounting means by structural association with other equipment or articles
- H01Q1/26—Supports; Mounting means by structural association with other equipment or articles with electric discharge tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/36—Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith
Abstract
The invention discloses a kind of novel plasma antenna and its application method, including arc chamber, gas cylinder, radio-frequency power supply, glass tube and AC power, plasma is produced in arc chamber, plasma enters to be operated in glass tube, is formed plasma antenna, is realized the transmitting-receiving of signal, plasma is produced into area and the separation of plasma operation area, it is worked independently, make the plasma density in plasma operation area adjustable, further the operating frequency range of increase plasma antenna.
Description
Technical field
The present invention relates to plasma antenna field, more particularly to a kind of adjustable plasma antenna of plasma density.
Background technology
Plasma antenna is the antenna for using ionized gas as electromagnetic energy transmitting medium, with being made with metallic conductor
Compared for the traditional antenna of transmitting medium, due to medium of the using plasma as electromagnetic radiation, plasma is used as material
The 4th state existed, including ion, electronics and molecule, general performance electroneutral, have the advantages that flexible design, its length can
Be changed with the size with exciting power, the bandwidth of plasma antenna, impedance, directionality, radiation direction can with etc.
The frequency of gas ions and the collision frequency of plasma and change；Because its frequency is very high, when operating, enemy radar transmitting
Electromagnetic wave on the one hand absorbed, original direction is on the other hand deviateed by reflection, and close after carrier wave has been sent day
Gas reverts to rapidly state of insulation in line, pipe, no longer to external radiation, significantly reduces RCS, realizes hidden
Body, has the advantages that good concealment, but it is plasma work that the plasma of plasma antenna, which produces area, mostly at present
Make area, existing gas has plasma again inside its same area, be unfavorable for adjusting the density of plasma, so as to limit it
Operating frequency range.
The content of the invention
The purpose of the present invention is, in order to overcome existing plasma antenna can not adjustment work area plasma density
There is provided a kind of novel plasma antenna and its application method for technological deficiency.
To achieve the above object, the invention provides following scheme：
A kind of novel plasma antenna includes arc chamber, gas cylinder, radio-frequency power supply, glass tube and AC power；
The arc chamber includes stainless steel column and the stainless steel outer wall being arranged on the outside of stainless steel column, the stainless steel
The annular space formed between cylinder and the stainless steel outer wall is that plasma produces area；
The chamber of the glass tube is plasma operation area, and its outer wall is provided with metal patch, and the plasma is produced
Area and the plasma operation area are separate and connect；
One end of the arc chamber is connected with the gas cylinder by tracheae, and the tracheae is the adjustable tracheae of intake velocity,
The stainless steel column is electrically connected with the radio-frequency power supply, the stainless steel outer wall ground connection, the other end of the arc chamber and institute
State glass tube to be tightly connected, the glass tube is electrically connected by the metal patch with the AC power.
The stainless steel column and the stainless steel wall coaxial heart, the arc chamber is by the stainless steel outer wall and institute
The annular space of stainless steel column composition is stated, the stainless steel outer wall is provided with wall bottom, the other end for one end and is provided with wall mouthful
Tubular structure, the arc chamber is connected by the wall mouthful end of the stainless steel outer wall with the glass tube.
One end of the stainless steel column and the wall bottom of the stainless steel outer wall are insulated and are bolted, described stainless
Insulating supporting post is additionally provided with the inside of steel outer wall, the other end of the stainless steel column passes through the exhausted of the stainless steel inside outer wall
Edge support column is supported.
The glass tube is that one end is provided with the elongated cylindrical pipe that ttom of pipe, the other end are provided with the mouth of pipe, its outer wall uniformly
There are two metal patches, two metal patches are connected with two electrodes of AC power respectively.
The wall mouthful end of the stainless steel outer wall is connected with the nose end of the glass tube by guard seal.
The baffle plate is shaped as annular, and material is nitrile rubber, the external diameter of the stainless steel outer wall of its internal diameter and arc chamber
Identical, its external diameter is identical with the internal diameter of glass tube.
Aperture is provided with the wall bottom of the stainless steel outer wall, the aperture is connected by tracheae with gas cylinder.
The gas cylinder 1 is built with inert gas.
A kind of application method of novel plasma antenna, it is characterised in that comprise the following steps：
Step 1：Discharged in use, the inert gas in gas cylinder is entered by tracheae from the aperture at the wall bottom of stainless steel outer wall
Room；
Step 2：Radio-frequency power supply provides Persistent Excitation for the stainless steel column inside arc chamber, makes outside stainless steel column and stainless steel
Wall produces voltage difference, when the voltage difference is more than or equal to breakdown voltage, and the inert gas in arc chamber is ionized, and is produced
Plasma；
Step 3：The plasma of generation is blown into glass tube by the gas entered from aperture, passes through the speed that tracheae adjusts air inlet
Degree, to adjust the density of plasma in glass tube.
Step 4：The AC power provides electric field for the glass tube, makes the plasma in glass tube in AC field
In the presence of constantly vibrate, to prevent the compound of plasma, maintain plasmoid, form plasma antenna, enter
The transmitting-receiving of row signal.
The specific embodiment provided according to the present invention, the invention discloses following technique effect：
Disclosure of the invention a kind of novel plasma body antenna and application method, by stainless steel column and the stainless steel outer wall
Between the annular space that is formed as plasma produce area, the chamber of glass tube and makes as the workspace of plasma
Gas ions produce area and plasma operation area is separate, the inert gas of generation plasma (is produced in plasma
Area) separated with plasma (in plasma operation area), and then make the plasma density in plasma operation area adjustable, enter
One step increases the operating frequency range of plasma antenna.
Brief description of the drawings
In order to illustrate more clearly about the embodiment of the present invention or technical scheme of the prior art, below will be to institute in embodiment
The accompanying drawing needed to use is briefly described, it should be apparent that, drawings in the following description are only some implementations of the present invention
Example, for those of ordinary skill in the art, without having to pay creative labor, can also be according to these accompanying drawings
Obtain other accompanying drawings.
A kind of graph structure for novel plasma that Fig. 1 provides for the present invention；
A kind of sectional view of the arc chamber for novel plasma that Fig. 2 provides for the present invention；
A kind of sectional view of the baffle plate for novel plasma that Fig. 3 provides for the present invention；
Wherein, 1 in figure is arc chamber, and 2 be gas cylinder, and 3 be radio-frequency power supply, and 4 be glass tube, and 5 be AC power, and 6 be gold
Belong to paster, 7 be insulating supporting post, and 8 be baffle plate.
Embodiment
It is an object of the invention to provide a kind of new plasma antenna and application method.
In order to facilitate the understanding of the purposes, features and advantages of the present invention, it is below in conjunction with the accompanying drawings and specific real
Applying mode, the present invention is further detailed explanation.
According to Fig. 1, a kind of novel plasma antenna of the invention includes arc chamber 1, gas cylinder 2, radio-frequency power supply 3, glass
Glass pipe 4, AC power 5；The arc chamber 1 includes stainless steel column and the stainless steel outer wall being arranged on the outside of stainless steel column,
Annular space is formed between the stainless steel column and the stainless steel outer wall as plasma and produces area；The glass tube 4
Chamber as the workspace of plasma, the outer wall of the glass tube 4 is provided with metal patch 6, one end of the arc chamber 1 with
The gas cylinder 2 is connected by tracheae, and the tracheae 2 is the adjustable tracheae of intake velocity, the stainless steel column and the radio frequency
Power supply 3 is electrically connected, the stainless steel outer wall ground connection, and the other end of the arc chamber 1 is tightly connected with the glass tube 4, described
Glass tube is electrically connected by the metal patch 6 with the AC power 5.
The stainless steel column and the stainless steel wall coaxial heart, the stainless steel outer wall be one end be provided with wall bottom,
The other end is provided with the tubular structure of wall mouthful, and the stainless steel column is solid cylinder structure, and the arc chamber passes through described stainless
The wall mouthful end of steel outer wall is connected with the glass tube；One end of the stainless steel column and the wall bottom of the stainless steel outer wall are insulated
And be bolted, insulating supporting post is additionally provided with the inside of the stainless steel outer wall, the other end of the stainless steel column leads to
The insulating supporting post for crossing the stainless steel inside outer wall is supported, and the ratio between radius of the arc chamber 1 and the stainless steel column is between 1
To between 3, it is preferred that the radius of the stainless steel column is 4mm, and the thickness of stainless steel outer wall is 2mm.
The glass tube 4 is that one end is provided with the elongated cylindrical pipe that ttom of pipe, the other end are provided with the mouth of pipe, the glass tube
Radius is slightly larger than the radius of stainless steel outer wall, it is preferred that the radius of the glass tube is 15mm.
Be evenly equipped with two metal patches 6 on the outer wall of the glass tube, two metal patches 6 respectively with AC power 5
Two electrodes are connected, and constitute the two poles of the earth of plate condenser, the negative ions in glass tube are applied with the regulation of the direction of motion, preferably
, the thickness of the metal patch 6 is 2mm.
The wall mouthful end of the stainless steel outer wall is connected with the nose end of the glass tube by guard seal, the glass tube
4 communicate with the annular spaces of the stainless steel outer wall and stainless steel post of the arc chamber 1 formation, because gas cylinder 2 is constantly ventilated, can be by
The plasma jet produced in arc chamber 1 is into glass tube 4.
As shown in figure 3, the baffle plate 8 is shaped as annular, material is nitrile rubber, its internal diameter is stainless with arc chamber 1
The external diameter of steel outer wall is identical, and its external diameter is identical with the internal diameter of glass tube, it is preferred that in baffle plate 8 and stainless steel outer wall and glass tube 4
Contact position is sealed with silicone sealant.
Aperture is provided with the wall bottom of the stainless steel outer wall, the aperture is connected by tracheae with gas cylinder.
The gas cylinder 1 is built with inert gas, it is preferred that the inert gas can be helium, neon, argon gas, Krypton,
Either their mixing of one of xenon.
In use, the Continuous aeration of gas cylinder 2, makes the air pressure in arc chamber be under atmospheric pressure, the arc chamber 1 is not
The steel outer wall that becomes rusty is grounded, and the radio-frequency power supply 3 provides Persistent Excitation for the stainless steel column of arc chamber 1, makes stainless steel column and stainless steel
Outer wall produces voltage difference, when the voltage difference is more than or equal to breakdown voltage, occurs dielectric barrier discharge in arc chamber 1,
Inert gas is ionized, and produces electronics and ion, i.e. plasma, and the gas that the electronics and ion produced is continually fed into blows
Enter into glass tube 4, in order to prevent the compound of plasma, AC power is connected by the metal patch 6 on the outer wall of glass tube 4
5, it is that glass tube 4 provides electric field, the ion and electronics that enter in glass tube is distinguished in the glass tube along direction of an electric field
Motion, and change the voltage magnitude and frequency of AC power so that the movement velocity of electronics is more than the speed of electric field change, even if
Plasma in glass tube shakes always under AC field effect, keeps plasmoid, and the length of glass tube
Longer, now glass tube is plasma antenna, for the transmitting-receiving of signal, and can adjust intake velocity by tracheae,
To adjust the plasma density in glass tube, and then increase the operating frequency range of plasma antenna.
It is preferred that, the working frequency of the radio-frequency power supply 3 is 13.56MHz；The magnitude of voltage of the AC power 5 is 220V,
Frequency is 0.25GHz.
Specific case used herein is set forth to the principle and embodiment of invention, the explanation of above example
The method and its core concept for helping to understand the present invention are only intended to, described embodiment is only that the part of the present invention is real
Example, rather than whole embodiments are applied, based on the embodiment in the present invention, those of ordinary skill in the art are not making creation
Property work under the premise of the every other embodiment that is obtained, belong to the scope of protection of the invention.
Claims (9)
1. a kind of novel plasma body antenna, it is characterised in that including arc chamber, gas cylinder, radio-frequency power supply, glass tube and alternating current
Source；
The arc chamber includes stainless steel column and the stainless steel outer wall being arranged on the outside of stainless steel column, the stainless steel column
The annular space formed between the stainless steel outer wall is that plasma produces area；
The chamber of the glass tube is plasma operation area, and its outer wall is provided with metal patch, the plasma produce area with
The plasma operation area is separate and connects；
One end of the arc chamber is connected with the gas cylinder by tracheae, and the tracheae is the adjustable tracheae of intake velocity, described
Stainless steel column is electrically connected with the radio-frequency power supply, the stainless steel outer wall ground connection, the other end of the arc chamber and the glass
The glass seal of tube is connected, and the glass tube is electrically connected by the metal patch with the AC power.
2. a kind of novel plasma body antenna according to claim 1, the stainless steel column and the stainless steel outer wall
Concentric, the arc chamber is the annular space being made up of the stainless steel outer wall and the stainless steel column, the stainless steel
Outer wall is that one end is provided with the tubular structure that wall bottom, the other end are provided with wall mouthful, and the arc chamber passes through the stainless steel outer wall
Wall mouthful end be connected with the glass tube.
3. a kind of novel plasma body antenna according to claim 2, it is characterised in that one end of the stainless steel column
Insulate and be bolted with the wall bottom of the stainless steel outer wall, insulating supporting is additionally provided with the inside of the stainless steel outer wall
Post, the other end of the stainless steel column is supported by the insulating supporting post of the stainless steel inside outer wall.
4. a kind of novel plasma body antenna according to claim 3, it is characterised in that the glass tube is set for one end
There are ttom of pipe, the other end to be provided with the elongated cylindrical pipe of the mouth of pipe, its outer wall and be evenly equipped with two metal patches, two metal patches point
It is not connected with two electrodes of AC power.
5. a kind of novel plasma body antenna according to claim 4, it is characterised in that the wall mouthful of the stainless steel outer wall
End is connected with the nose end of the glass tube by guard seal.
6. a kind of novel plasma body antenna according to claim 5, it is characterised in that the baffle plate is shaped as ring
Shape, material is nitrile rubber, and its internal diameter is identical with the external diameter of the stainless steel outer wall of arc chamber, the internal diameter phase of its external diameter and glass tube
Together.
7. a kind of novel plasma body antenna according to claim 6, it is characterised in that the wall bottom of the stainless steel outer wall
On be provided with aperture, the aperture is connected by tracheae with gas cylinder.
8. a kind of application method of novel plasma antenna, it is characterised in that comprise the following steps：
Step 1：In use, the inert gas in gas cylinder enters arc chamber by tracheae from the aperture at the wall bottom of stainless steel outer wall；
Step 2：Radio-frequency power supply provides Persistent Excitation for the stainless steel column inside arc chamber, stainless steel column is produced with stainless steel outer wall
Raw voltage difference, when the voltage difference is more than or equal to breakdown voltage, the inert gas in arc chamber is ionized, produce etc. from
Daughter；
Step 3：The plasma of generation is blown into glass tube by the gas entered from aperture, and the speed of air inlet is adjusted by tracheae,
To adjust the density of plasma in glass tube.
9. the application method of a kind of novel plasma antenna according to claim 8, it is characterised in that also including step 4：
The AC power provides AC field for the glass tube, make the plasma in glass tube in the presence of AC field not
Disconnected vibration, to prevent the compound of plasma, maintains plasmoid, forms plasma antenna, carry out the receipts of signal
Hair.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710219886.2A CN106972239B (en) | 2017-04-06 | 2017-04-06 | A kind of novel plasma body antenna and application method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710219886.2A CN106972239B (en) | 2017-04-06 | 2017-04-06 | A kind of novel plasma body antenna and application method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106972239A true CN106972239A (en) | 2017-07-21 |
| CN106972239B CN106972239B (en) | 2019-05-03 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201710219886.2A Active CN106972239B (en) | 2017-04-06 | 2017-04-06 | A kind of novel plasma body antenna and application method |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109168244A (en) * | 2018-10-24 | 2019-01-08 | 中国科学院国家空间科学中心 | A kind of preparation method of the ionization cavity based on plasma antenna |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102291922A (en) * | 2011-07-22 | 2011-12-21 | 中国科学院空间科学与应用研究中心 | Ion generating device |
| CN102573260A (en) * | 2010-12-08 | 2012-07-11 | 上海华质生物技术有限公司 | Generating device of plasma ion source |
| KR101232198B1 (en) * | 2011-08-09 | 2013-02-12 | 피에스케이 주식회사 | Plasma generating unit, apparatus and method for treating substrate using plasma |
-
2017
- 2017-04-06 CN CN201710219886.2A patent/CN106972239B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102573260A (en) * | 2010-12-08 | 2012-07-11 | 上海华质生物技术有限公司 | Generating device of plasma ion source |
| CN102291922A (en) * | 2011-07-22 | 2011-12-21 | 中国科学院空间科学与应用研究中心 | Ion generating device |
| KR101232198B1 (en) * | 2011-08-09 | 2013-02-12 | 피에스케이 주식회사 | Plasma generating unit, apparatus and method for treating substrate using plasma |
Non-Patent Citations (1)
| Title |
|---|
| 任静: ""单极柱形等离子体天线的多物理场研究"", 《中国优秀硕士学位论文全文数据库 信息科技辑》 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109168244A (en) * | 2018-10-24 | 2019-01-08 | 中国科学院国家空间科学中心 | A kind of preparation method of the ionization cavity based on plasma antenna |
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| Publication number | Publication date |
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| CN106972239B (en) | 2019-05-03 |
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