CN106944619A - A kind of method for manufacturing chemical mechanical polishing pads conditioner discs - Google Patents
A kind of method for manufacturing chemical mechanical polishing pads conditioner discs Download PDFInfo
- Publication number
- CN106944619A CN106944619A CN201610020466.7A CN201610020466A CN106944619A CN 106944619 A CN106944619 A CN 106944619A CN 201610020466 A CN201610020466 A CN 201610020466A CN 106944619 A CN106944619 A CN 106944619A
- Authority
- CN
- China
- Prior art keywords
- mechanical polishing
- chemical mechanical
- polishing pads
- conditioner discs
- printing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
- B22F10/20—Direct sintering or melting
- B22F10/28—Powder bed fusion, e.g. selective laser melting [SLM] or electron beam melting [EBM]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
- B22F10/30—Process control
- B22F10/34—Process control of powder characteristics, e.g. density, oxidation or flowability
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
- B22F10/30—Process control
- B22F10/36—Process control of energy beam parameters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
- B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C26/00—Alloys containing diamond or cubic or wurtzitic boron nitride, fullerenes or carbon nanotubes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
- B22F10/60—Treatment of workpieces or articles after build-up
- B22F10/64—Treatment of workpieces or articles after build-up by thermal means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
- B22F10/60—Treatment of workpieces or articles after build-up
- B22F10/66—Treatment of workpieces or articles after build-up by mechanical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
- B22F10/60—Treatment of workpieces or articles after build-up
- B22F10/68—Cleaning or washing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/25—Process efficiency
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Automation & Control Theory (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Abstract
A kind of manufacture method of chemical mechanical polishing pads conditioner discs, using increasing material manufacturing mode, i.e. the commonly referred to as mode of 3D printing.Comprise the following steps：The threedimensional model of chemical mechanical polishing pads finishing dish structure is prepared needed for building and is inputted in 3D printing software for editing, two dimensionization processing is carried out after editor, two dimensional slice data is obtained and is conducted into 3D printer computer；The diamond dust that the nickel-containing alloys powder and particle diameter that particle diameter is 0.1~100 μm are 0.1~300 μm is sufficiently mixed and is used as raw material；Set the working process parameter of 3D printer laser fusion system；The sufficient alloy of mixing is taken to be fitted into and spread in metal powder laser melting systems with diamond dust, it is laser sintered according to 3D printer setting program progress successively pointwise under the protection of inert gas；Through past powder, it is heat-treated, cleaning, sandblasting etc. produces chemical mechanical polishing pads conditioner discs to be prepared.
Description
Technical field
The present invention is a kind of chemical mechanical polishing pads (Chemical Mechanical Polishing Pad, CMP
Pad) the manufacture method of conditioner discs.
Background technology
Chemically-mechanicapolish polishing (CMP) is manufactured for integrated circuit (IC, Integrated Circuit)
A kind of technique.With the raising of the development of semiconductor industry, particularly semiconductor wafer integrated level, to its table
The requirement of face finishing is also improved therewith, and chemically mechanical polishing is exactly the technology generally used.Chemical machinery is thrown
The polishing pad (Pad) of gloss is usually organic material (such as polyurethanes), and surface is in fibrous or porous
Shape structure, is attached on the workbench of rotation, and the chemical grinding liquid that abrasive grains are contained during work is persistently added
On polishing pad, workpiece contacts polishing pad with certain pressure and done relative motion, and abrasive grains are to semiconductor die
The chemical composition that the workpiece such as piece are played in mechanical abrasive action, lapping liquid plays chemical attack effect, and workpiece exists
Chemistry is with mechanical double action, reaching the purpose being polished.
The top surface of chemical mechanical polishing pads is typically that grinding is carried by threadiness or small holes structure
Grain, this structure can provide frictional force and be departed from preventing abrasive grains because of the centrifugal force of polishing pad rotation
Polishing pad, it is therefore desirable to have measure to keep the performance at the top of polishing pad, maintains fiber to erect or maintain to have as far as possible
Sufficient amount of apertured orifice can receive new abrasive grains.And because the grinding from workpiece, lapping liquid is broken
The continuous accumulation of bits, the surface of chemical mechanical polishing pads gradually produces air-hole blockage and compression, and surface is hard
Change (hardening), become smooth (glazing), it is impossible to carry the abrasive grains in lapping liquid, make polishing
Efficiency decline, while workpiece polishing can produce it is uneven.Chemical mechanical polishing pads conditioner discs are exactly for throwing
Light pad surface is combed (combing) or cutting (cutting), reaches finishing (dressing) or tune
The effect of whole (conditioning), to maintain the surface state of chemical mechanical polishing pads.
Chemical mechanical polishing pads conditioner discs, it is superhard typically using multiple superabrasive particles as finishing sword
Abrasive grain, which is coupled in the card of plate-shaped base body, forms working face, the coupling between matrix and superabrasive particles
Condensation material has two kinds, and the first material is metal, such as nickel, cobalt, titanium, iron, copper and its alloy, second
It is organic bond such as resinae bonding agent to plant material.
At present, the manufacture method of known metallic bond chemical mechanical polishing pads conditioner discs has：Sintering process,
Hard solder method, galvanoplastic, organic bond bonding method etc..Sintering process is by superabrasive particles and metal alloy
Powder is mixed with certain proportion, be placed on metallic matrix heating make metal alloy powders sintering be mutually bonded and with
Superabrasive particles are bonded；Hard solder method is that metal alloy powders shape or sheet solder are placed on metallic matrix,
Superabrasive particles are inserted thereon, and heating makes solder fusing and superabrasive particles are welded on matrix；
Galvanoplastic are to be put into metallic matrix as anode in electroplate liquid, and superabrasive particles are covered thereon, and energization makes
The metal ingredients such as nickel form coating and superabrasive particles are fixed in coating in anodic deposition；Organically combine
Agent bonding method is that superabrasive particles are directly bonded to the matrix table solidified in organic material with organic bond
On face.
With developing rapidly for 3D printing manufacturing technology, beaten by the 3D printer of various technical embodiments
Print output, it is already possible to produce the complex partses of unlike material；3D printing manufacturing technology is flexible because of it
Change, customized, rapid shaping produce the plurality of advantages of structural elements, as a kind of great development prospect
Increases material manufacturing technology, especially possesses in terms of integrated manufacturing system (IMS) global formation complex partses integral module
Peculiar advantage.
The content of the invention
Disc manufacturing method is repaired it is an object of the invention to provide a kind of new chemical mechanical polishing pads.
The method of the present invention is to use increasing material manufacturing mode, the i.e. commonly referred to as mode of 3D printing.
The method of the present invention comprises the following steps：
1) threedimensional model of chemical mechanical polishing pads finishing dish structure is prepared needed for building and 3D is inputted
Print software for editing in, after editor carry out two dimensionization handle, obtain two dimensional slice data and by its
Import 3D printer computer.
2) by bortz powder that nickel-containing alloys powder that particle diameter is 0.1~100 μm and particle diameter are 0.1~300 μm
End is sufficiently mixed as raw material.
3) working process parameter of 3D printer metal powder laser melting systems is set.
4) the sufficient alloy of mixing is taken to load laser sintering metallic powder system, the gold with diamond dust
Inert gas is vacuumized or be passed through in category selective laser sintering system, is existed to its interior oxygen content
Less than 0.1%.
5) it is laser sintered according to 3D printer setting program progress successively pointwise.
6) through past powder, it is heat-treated, cleaning, sandblasting, that is, preparing chemical mechanical polishing pads needed for obtaining repaiies
Whole disk.
In order to save the time of 3D printing, the mode that mixed-powder can be taken to be sintered on metallic matrix.
A pre-processed sheet matrix, 3D printing only completes the manufacture of card superstructure.The card top knot
Structure, refers to that being used in chemical mechanical polishing pads conditioner discs card combs to pad interface
(combing) or cutting (cutting), reach finishing (dressing) or adjust (conditioning)
Effect the thrust for having Sharp edge.In the present invention, these thrusts are by metal alloy sintering curing
The superhard material particle of bonding is formed.
Brief description of the drawings
Fig. 1 is a kind of Longitudinal cross section schematic of chemical mechanical polishing pads conditioner discs of the inventive method manufacture；
Wherein 1 is the plate-shaped base body of stainless steel, and 2 be the superhard material particle of metal alloy sintering curing bonding.
Embodiment
Here is embodiments of the invention：
Example 1. utilizes the processing generation support of Magics software datas --- and RP Tool data slicers import 3D
Printer computer；With the Ni alloy powder containing 2% chromium, conduct is sufficiently mixed with superhard material diamond dust
Raw material, the size distribution of the Ni alloy powder is 10-25 μm, and the granularity of diamond dust is 20-40 μm,
Weight ratio is 4: 6；Nitrogen is filled with, using printing device (EOS M280), laser emitter is Yb-fibre
Type, to print power as 500w, speed 3mm3/min is printed a diameter of using laser sintered mode
108mm, thickness is 6mm discoid product, and surface is uniformly distributed at intervals of 0.6mm, and bottom surface is
0.2mm × 0.2mm squares, a height of 0.2mm pyramid shape protrusion, these pyramid projections exist
Play cutting edge on conditioner discs.Handled through past powder, annealing, cleaning etc., obtain the chemistry of the present invention
Mechanical polishing pad conditioner discs product.
Example 2. uses an a diameter of 108mm, and 304 stainless steel disks that thickness is 6mm are matrix, with
A diameter of 0.1~40 μm of nickel chromium triangle iron powder, 5~25 μm of diamond dusts of diameter are used as raw material, weight
Than for 2: 8, uniform mixing.Using printing device (EOS M280), laser emitter is Yb-fibre
Type；Using the data slicer of Magics Software Create chemical mechanical polishing pads conditioner discs card superstructures,
Import 3D printer computer；To print power as 500w, speed 5mm3/min, using laser sintered
Mode printed on matrix be evenly distributed in card at intervals of 0.4mm, the bottom surface length of side be 0.15mm just
Triangle, a height of 0.1mm triangular pyramid protrusion is handled through past powder, annealing, cleaning etc., obtained
The finished product arrived is a kind of chemical mechanical polishing pads conditioner discs of the invention.
Claims (6)
1. a kind of manufacture method of chemical mechanical polishing pads conditioner discs, it is characterized in that：Conditioner discs are with the side of increasing material manufacturing
The mode of formula, i.e. 3D printing, passes through 3D printing superabrasive particles and bonding agent on matrix material
Material manufacture.
2. chemical mechanical polishing pads according to claim 1 repair disc manufacturing method, it is characterized in that：Will be superhard
Abrasive grain is printed upon on matrix material in the way of 3D printing together with combining agent material.
3. chemical mechanical polishing pads according to claim 1 repair disc manufacturing method, it is characterized in that：Superhard abrasive
Material particle is diamond, cubic boron nitride, polycrystalline diamond, polycrystal cubic boron nitride, the life of CVD gas phases
At least one of long diamond.
4. chemical mechanical polishing pads according to claim 1 repair disc manufacturing method, it is characterized in that：The knot
Mixture material include iron, nickel, copper, chromium, titanium, cobalt, one kind of silicon, its two or more mixture,
Or two or more alloys, or contain by main component of one of which other elemental compositions mixture or
Alloy.
5. chemical mechanical polishing pads according to claim 1 repair disc manufacturing method, it is characterized in that：The base
Body material is metal material, ceramic material, one kind of organic polymer material or its mixture.
6. chemical mechanical polishing pads according to claim 1 repair disc manufacturing method, it is characterized in that：Use
It is laser metal powder sintering.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610020466.7A CN106944619A (en) | 2016-01-07 | 2016-01-07 | A kind of method for manufacturing chemical mechanical polishing pads conditioner discs |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610020466.7A CN106944619A (en) | 2016-01-07 | 2016-01-07 | A kind of method for manufacturing chemical mechanical polishing pads conditioner discs |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106944619A true CN106944619A (en) | 2017-07-14 |
Family
ID=59465950
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610020466.7A Pending CN106944619A (en) | 2016-01-07 | 2016-01-07 | A kind of method for manufacturing chemical mechanical polishing pads conditioner discs |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106944619A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107396528A (en) * | 2017-08-14 | 2017-11-24 | 上海联影医疗科技有限公司 | Preparation method in coupled standing wave accelerator tube, while coupled standing wave accelerator tube |
| CN114502324A (en) * | 2019-08-21 | 2022-05-13 | 应用材料公司 | Additive manufacturing of polishing pads |
| CN115026289A (en) * | 2022-07-20 | 2022-09-09 | 华侨大学 | Manufacturing method and application of diamond porous grinding block based on 3D printing |
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| CN101158039A (en) * | 2007-11-21 | 2008-04-09 | 南京航空航天大学 | Method for preparing coating by laser cladding with squash method fore-put powder |
| CN102990529A (en) * | 2011-09-09 | 2013-03-27 | 深圳嵩洋微电子技术有限公司 | Two-sided repairing disc of chemical-mechanical polishing pad |
| CN103264361A (en) * | 2013-05-17 | 2013-08-28 | 华侨大学 | Manufacturing method for abrasive grain tool |
| US20140061838A1 (en) * | 2012-02-17 | 2014-03-06 | Teledyne Scientific & Imaging, Llc | Self-aligning hybridization method |
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| US5609718A (en) * | 1995-09-29 | 1997-03-11 | Micron Technology, Inc. | Method and apparatus for measuring a change in the thickness of polishing pads used in chemical-mechanical planarization of semiconductor wafers |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107396528A (en) * | 2017-08-14 | 2017-11-24 | 上海联影医疗科技有限公司 | Preparation method in coupled standing wave accelerator tube, while coupled standing wave accelerator tube |
| CN107396528B (en) * | 2017-08-14 | 2019-08-23 | 上海联影医疗科技有限公司 | While coupled standing wave accelerator tube production method, while coupled standing wave accelerator tube |
| CN114502324A (en) * | 2019-08-21 | 2022-05-13 | 应用材料公司 | Additive manufacturing of polishing pads |
| US11965103B2 (en) | 2019-08-21 | 2024-04-23 | Applied Materials, Inc. | Additive manufacturing of polishing pads |
| CN114502324B (en) * | 2019-08-21 | 2024-05-03 | 应用材料公司 | Additive manufacturing of polishing pads |
| CN115026289A (en) * | 2022-07-20 | 2022-09-09 | 华侨大学 | Manufacturing method and application of diamond porous grinding block based on 3D printing |
| US20240024952A1 (en) * | 2022-07-20 | 2024-01-25 | Huaqiao University | Manufacturing method of diamond porous grinding block based on 3d printing and application thereof |
| US12053823B2 (en) * | 2022-07-20 | 2024-08-06 | Huaqiao University | Manufacturing method of diamond porous grinding block based on 3D printing and application thereof |
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Application publication date: 20170714 |