CN106868504B - A kind of diesel engine piece surface multi-layer wear-resistant antifriction film and preparation method thereof - Google Patents
A kind of diesel engine piece surface multi-layer wear-resistant antifriction film and preparation method thereof Download PDFInfo
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- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
- C23C28/44—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by a measurable physical property of the alternating layer or system, e.g. thickness, density, hardness
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0635—Carbides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/343—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one DLC or an amorphous carbon based layer, the layer being doped or not
Abstract
A kind of diesel engine piece surface multi-layer wear-resistant antifriction film, in diesel engine piece surface from inside to outside successively including Cr layers, Cr/MeC transition zone, MeC-DLC layers, the soft or hard alternating layer of a-C:H and MoS2Layer, wherein Me is transition metal element.First Cr layers are deposited in diesel engine piece surface magnetron sputtering;Then magnetron sputtering deposits Cr/MeC transition zone;MeC-DLC layers are deposited using magnetron sputtering/plasma-enhanced CVD composite deposition method again;Then using plasma auxiliary chemical vapor deposition method deposits the soft or hard alternating layer of a-C:H;Micro- texture is etched on the soft or hard alternating layer of a-C:H using laser ablation method again;Last magnetron sputtering deposits MoS2Layer.Film of the invention can obviously improve the surface property of diesel engine components, improve its service life, energy use efficiency and reliability.
Description
Technical field
The invention belongs to diesel engine part surface treatment and be vacuum-treated field, and in particular to it is a kind of using magnetron sputtering,
Plasmaassisted and laser etching techniques the preparation of diesel engine piece surface have cooperateed with diesel oil lubricating action it is good,
The plural layers that binding force is high, coefficient of friction is low, wear rate is low, the service life is long.
Background technique
As China is to the pay attention to day by day of environmental protection problem, energy-saving and emission-reduction have become imperative important topic.
For diesel engine, the significant of energy consumption and pollutant emission is reduced.One of critical issue therein is exactly
Lubrication problem, traditional plating means are difficult to realize environmental-friendly.Hydrodynamic lubrication is then difficult to meet high-mechanic, low friction, longevity
Life etc. requires.
Existing diesel engine machine part mostly uses electroplating technology and hydrodynamic lubrication technology, and newer technology has diamond-like
Technology, but all have that life-span upgrading is not high, the still lower problem of efficiency.
Summary of the invention
The technical problem to be solved by the present invention is to overcome the existing defects, and it is more to provide a kind of diesel engine piece surface
Layer wear resistant friction reducing film and preparation method thereof.
In order to solve the above-mentioned technical problems, the present invention provides the following technical solutions:
A kind of diesel engine piece surface multi-layer wear-resistant antifriction film, diesel engine piece surface from inside to outside according to
Secondary includes Cr layers, Cr/MeC transition zone, MeC-DLC layers, the soft or hard alternating layer of a-C:H and MoS2Layer, wherein Me is transition metal member
Element.
Preferably, the transition metal element is Ti, W or Cr.
Preferably, in the Cr/MeC transition zone, with the increase of thickness, the content of Cr gradually decreased, MeC contains
Amount gradually increases.
Preferably, the alternating number of plies of the soft or hard alternating layer of the a-C:H is 10~50 layers.
The preparation method of above-mentioned diesel engine piece surface multi-layer wear-resistant antifriction film, includes the following steps:
(1) Cr layers are deposited in diesel engine piece surface magnetron sputtering;
(2) magnetron sputtering deposits Cr/MeC transition zone on Cr layer;
(3) it is deposited on Cr/MeC transition zone using magnetron sputtering/plasma-enhanced CVD composite deposition method
MeC-DLC layers;
(4) using plasma auxiliary chemical vapor deposition method deposits the soft or hard alternating layer of a-C:H on MeC-DLC layer;
(5) micro- texture is etched on the soft or hard alternating layer of a-C:H using laser ablation method;
(6) magnetron sputtering deposits MoS on the soft or hard alternating layer of a-C:H2Layer.
Preferably, in step (1), magnetron sputtering deposits Cr layer of condition are as follows: inert gas flow for 130sccm~
150sccm, Cr target power output are 1.5kw~2kw, and substrate bias is 50V~100V, and sedimentation time is 5min~10min.
Preferably, in step (2), using Cr target and MeC target, by gradually reducing the power of Cr target and stepping up MeC
The power of target, magnetron sputtering deposits Cr/MeC transition zone, preferably magnetron sputtering sedimentary condition on Cr layer are as follows: inert gas flow
Amount is 80sccm~150sccm, and the power of Cr target is down to 0kw by 1.5kw~2kw, the power of MeC target by 0kw mention to 2kw~
4kw, substrate bias are 0V~50V, and sedimentation time is 20min~40min.
Preferably, in step (3), using acetylene as reaction gas, using MeC target, using magnetron sputtering/plasmaassisted
Chemical gaseous phase composite deposition method deposits MeC-DLC layer, preferably sedimentary condition are as follows: inert gas flow for 80sccm~
100sccm, acetylene flow are 30sccm~80sccm, and the power of substrate bias 50V-75V, MeC target is 2kw~4kw, deposition
Time is 30min~120min.
Preferably, in step (4), using plasma auxiliary chemical vapor deposition method passes through using acetylene as reaction gas
The alternate change of acetylene flow and substrate bias obtains the soft or hard alternating layer of a-C:H, it is preferable that the sedimentary condition of a-C:H soft formation:
Acetylene flow 350sccm~400sccm, substrate bias are 1000V~1200V, sedimentation time 5min~10min;A-C:H hard formation
Sedimentary condition: acetylene flow 100sccm~150sccm, substrate bias be 800V~1000V, sedimentation time 5min~
10min。
Preferably, in step (6), magnetron sputtering deposits MoS2Layer condition are as follows: inert gas flow be 80sccm~
130sccm, MoS2The power of target is 1kw~1.5kw, and substrate bias is 50V~100V, and sedimentation time is 30min~60min.
The present invention compared with prior art the utility model has the advantages that Film laminated hardness of the invention reaches HV2500~3000,
For coefficient of friction down to 0.05~0.1, adhesive force > 500mN, material life time of the level is better than 5 × 106R significantly improves diesel engine
The surface property of machine components improves its service life, energy use efficiency and reliability.Diesel engine zero of the invention
Part surface multi-layer wear resistant friction reducing film can significantly improve service life, efficiency of energy utilization and the reliability of diesel engine.Its
Applicable object is more, including the components such as tappet, plunger, cam seat ring, tappet washer.
Detailed description of the invention
Attached drawing is used to provide further understanding of the present invention, and constitutes part of specification, with reality of the invention
It applies example to be used to explain the present invention together, not be construed as limiting the invention.In the accompanying drawings:
Fig. 1 is the structural schematic diagram of diesel engine piece surface multi-layer wear-resistant antifriction film of the present invention, wherein 1 is zero
Part matrix, 2 be Cr layers, and 3 be Cr/MeC transition zone, and 4 be MeC-DLC layers, and 5 be the soft or hard alternating layer of a-C:H, and 51 be micro- texture, and 6 are
MoS2Layer.
Specific embodiment
Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings, it should be understood that preferred reality described herein
Apply example only for the purpose of illustrating and explaining the present invention and is not intended to limit the present invention.
MeC-DLC of the present invention refers to that the hydrogen-containing carbon film for being doped with MeC, a-C:H refer to the hydrogen-containing carbon not adulterated
Film.
Embodiment 1 is by taking diesel engine plunger surface multi-layer wear-resistant antifriction film as an example
(1) chemical cleaning.It is clear that ultrasonic wave is carried out to diesel engine plunger substrate using petroleum ether, acetone, alcohol respectively
It washes, every kind of solvent supersonic time is 5min.
(2) it heats and vacuumizes.Guarantee that heating temperature is when film deposits in certain temperature and vacuum range
160 DEG C, vacuum range is 2 × 10-3Pa。
(3) plasma source (glow discharge) Bombardment and cleaning.It is passed through argon gas to vacuum chamber, opens plasma source to base
Body surface face carries out Bombardment and cleaning, removes the attachment of matrix surface, argon flow 150sccm, plasma ource electric current is
60A, substrate bias 500V, bombardment time 30min.
(4) Cr layers are deposited.It is passed through argon gas, magnetron sputtering C r target is opened in substrate surface and deposits Cr layers, make Cr layers and matrix
Surface forms strong interface, improves adhesive force.Argon flow is 130sccm, and Cr target power output is 2kw, and substrate bias is
50V, sedimentation time 10min.
(5) Cr/TiC layers of gradual transition layer are deposited.It is passed through Ar gas, while opening magnetron sputtering C r target and TiC target, according to
Certain rate of decay reduces the power of Cr target, and increases TiC target power output according to certain promotion rate, forms Cr content gradually
It reduces, the gradual transition layer that TiC content gradually increases, improves the bond strength of film and matrix.Argon flow is 130sccm,
The initial power of Cr target is 2kw, and final power is 0kw, and the initial power of TiC target is 0kw, and final power is 4kw, substrate bias
For 50V, sedimentation time 20min.
(6) depositing Ti C-DLC layers.It is passed through Ar gas and C2H2Gas, unlatching TiC target, C-DLC layers of depositing Ti.Argon flow
For 80sccm, acetylene flow is 30sccm, and substrate bias 50V, TiC target power output is 4kw, sedimentation time 30min.
(7) the soft or hard alternating layer of a-C:H is deposited.It is passed through C2H2Gas applies high bias, on sample stage by adjusting acetylene
Flow and substrate bias change film hardness, deposit the soft or hard alternate films of a-C:H.A-C:H soft formation: acetylene flow 350sccm, substrate
Bias is 1000V, sedimentation time 5min;A-C:H hard formation: acetylene flow 100sccm, substrate bias 800V, sedimentation time
5min, the soft or hard total number of plies of alternating are 10 layers.It should be noted that be merely given as soft or hard layer alternate for the soft or hard alternating layer of Fig. 1
Signal, actual 10 layers are not drawn completely.
(8) the soft or hard alternating layer of laser ablation a-C:H.Laser ablation is carried out to a-C:H, on the soft or hard alternating layer of a-C:H
To regularly arranged micro- texture, laser selects femto-second laser, wavelength 1060nm, pulsewidth 500fs, power 10w.
(9) MoS is deposited2Film.It is passed through argon gas, sputtering curing molybdenum target is opened, deposits molybdenum disulfide film.Argon flow
For 80sccm, molybdenum disulfide target power output is 1kw, substrate bias 50V, sedimentation time 30min.
Embodiment 2 is by taking diesel engine tappet washer face multi-layer wear-resistant antifriction film as an example
(1) chemical cleaning.Ultrasound is carried out to diesel engine tappet washer substrate using petroleum ether, acetone, alcohol respectively
Wave cleaning, every kind of solvent supersonic time are 5min.
(2) it heats and vacuumizes.Guarantee that heating temperature is when film deposits in certain temperature and vacuum range
160 DEG C, vacuum range is 2 × 10-3Pa。
(3) plasma source Bombardment and cleaning.It is passed through argon gas to vacuum chamber, plasma source is opened and matrix surface is carried out
Bombardment and cleaning, removes the attachment of matrix surface, argon flow 150sccm, and plasma ource electric current is 60A, substrate bias
For 500V, bombardment time 30min.
(4) Cr layers are deposited.It is passed through argon gas, magnetron sputtering C r target is opened in substrate surface and deposits Cr layers, make Cr layers and matrix
Surface forms strong interface, improves adhesive force.Argon flow is 150sccm, and Cr target power output is 1.5kw, and substrate bias is
100V, sedimentation time 5min.
(5) Cr/WC layers of gradual transition layer are deposited.It is passed through Ar gas, while opening magnetron sputtering C r target and WC target, according to one
Fixed rate of decay reduces the power of Cr target, and increases WC target power output according to certain promotion rate, forms Cr content and gradually subtracts
Less, the gradual transition layer that WC content gradually increases improves the bond strength of film and matrix.Argon flow is 130sccm, Cr target
Initial power be 2kw, final power is 0kw, and the initial power of WC target is 0kw, and final power is 3kw, substrate bias 0V,
Sedimentation time is 20min.
(6) WC-DLC layers are deposited.It is passed through Ar gas and C2H2Gas opens WC target, deposits WC-DLC layers.Argon flow is
100sccm, acetylene flow are 50sccm, and substrate bias 75V, WC target power output is 3kw, sedimentation time 30min.
(7) the soft or hard alternating layer of a-C:H is deposited.It is passed through C2H2Gas applies high bias, on sample stage by adjusting acetylene
Flow and substrate bias change film hardness, deposit the soft or hard alternate films of a-C:H.A-C:H soft formation: acetylene flow 400sccm, substrate
Bias is 1200V, sedimentation time 5min;A-C:H hard formation: acetylene flow 150sccm, substrate bias 1000V, sedimentation time
10min, the soft or hard total number of plies of alternating are 50 layers.
(8) the soft or hard alternating layer of laser ablation a-C:H.Laser ablation is carried out to a-C:H, on the soft or hard alternating layer of a-C:H
To regularly arranged micro- texture, laser selects femto-second laser, wavelength 1060nm, pulsewidth 500fs, power 15w.
(9) MoS is deposited2Film.It is passed through argon gas, sputtering curing molybdenum target is opened, deposits molybdenum disulfide film.Argon flow
For 130sccm, molybdenum disulfide target power output is 1.5kw, substrate bias 100V, sedimentation time 60min.
Finally, it should be noted that the foregoing is only a preferred embodiment of the present invention, it is not intended to restrict the invention,
Although the present invention is described in detail referring to the foregoing embodiments, for those skilled in the art, still may be used
To modify the technical solutions described in the foregoing embodiments or equivalent replacement of some of the technical features.
All within the spirits and principles of the present invention, any modification, equivalent replacement, improvement and so on should be included in of the invention
Within protection scope.
Claims (9)
1. a kind of preparation method of diesel engine piece surface multi-layer wear-resistant antifriction film, diesel engine piece surface by
From inside to outside successively including Cr layers, Cr/MeC transition zone, MeC-DLC layers, the soft or hard alternating layer of a-C:H and MoS2Layer, wherein Me was
Cross metallic element;
Include the following steps:
(1) Cr layers are deposited in diesel engine piece surface magnetron sputtering;
(2) magnetron sputtering deposits Cr/MeC transition zone on Cr layer;
(3) MeC-DLC is deposited on Cr/MeC transition zone using magnetron sputtering/plasma-enhanced CVD composite deposition method
Layer;
(4) using plasma auxiliary chemical vapor deposition method deposits the soft or hard alternating layer of a-C:H on MeC-DLC layer;
(5) micro- texture is etched on the soft or hard alternating layer of a-C:H using laser ablation method;
(6) magnetron sputtering deposits MoS on the soft or hard alternating layer of a-C:H2Layer.
2. preparation method according to claim 1, which is characterized in that the transition metal element is Ti, W or Cr.
3. preparation method according to claim 1, which is characterized in that in the Cr/MeC transition zone, with thickness
Increase, the content of Cr gradually decreases, the content of MeC gradually increases.
4. preparation method according to claim 1, which is characterized in that the alternating number of plies of the soft or hard alternating layer of a-C:H is
10~50 layers.
5. preparation method according to claim 1, which is characterized in that in step (1), magnetron sputtering deposits Cr layers of condition
Are as follows: inert gas flow is 130sccm~150sccm, and Cr target power output is 1.5kw~2kw, and substrate bias is 50V~100V, is sunk
The product time is 5min~10min.
6. preparation method according to claim 1, which is characterized in that in step (2), using Cr target and MeC target, by by
Step reduces the power of Cr target and steps up the power of MeC target, and magnetron sputtering deposits Cr/MeC transition zone on Cr layer, preferably
Magnetron sputtering sedimentary condition are as follows: the power of Cr target is down to 0kw by 1.5kw~2kw, the power of MeC target by 0kw mention to 2kw~
4kw, substrate bias are 0V~50V, and sedimentation time is 20min~40min.
7. preparation method according to claim 1, which is characterized in that in step (3), using acetylene as reaction gas, use
MeC target deposits MeC-DLC layers, preferably sedimentary condition using magnetron sputtering/plasma-enhanced CVD composite deposition method
Are as follows: inert gas flow be 80sccm~100sccm, acetylene flow be 30sccm~80sccm, substrate bias 50V-75V,
The power of MeC target is 2kw~4kw, and sedimentation time is 30min~120min.
8. preparation method according to claim 1, which is characterized in that in step (4), using plasma assistant chemical gas
Phase sedimentation, by the alternate change of acetylene flow and substrate bias, obtains the soft or hard alternating of a-C:H using acetylene as reaction gas
Layer, it is preferable that the sedimentary condition of a-C:H soft formation: acetylene flow 350sccm~400sccm, substrate bias be 1000V~
1200V, sedimentation time 5min~10min;The sedimentary condition of a-C:H hard formation: acetylene flow 100sccm~150sccm, substrate are inclined
Pressure is 800V~1000V, sedimentation time 5min~10min.
9. preparation method according to claim 1, which is characterized in that in step (6), magnetron sputtering deposits MoS2The item of layer
Part are as follows: inert gas flow is 80sccm~130sccm, MoS2The power of target be 1kw~1.5kw, substrate bias be 50V~
100V, sedimentation time are 30min~60min.
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CN109402577B (en) * | 2018-12-27 | 2021-06-22 | 广东省新材料研究所 | Superhard carbon-based film and preparation method thereof |
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