CN106817910B - 光学元件堆叠组件 - Google Patents
光学元件堆叠组件 Download PDFInfo
- Publication number
- CN106817910B CN106817910B CN201580055984.6A CN201580055984A CN106817910B CN 106817910 B CN106817910 B CN 106817910B CN 201580055984 A CN201580055984 A CN 201580055984A CN 106817910 B CN106817910 B CN 106817910B
- Authority
- CN
- China
- Prior art keywords
- wafer
- optical element
- optical elements
- substrate
- stack
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/02—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by a sequence of laminating steps, e.g. by adding new layers at consecutive laminating stations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B33/00—Layered products characterised by particular properties or particular surface features, e.g. particular surface coatings; Layered products designed for particular purposes not covered by another single class
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/12—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by using adhesives
- B32B37/1284—Application of adhesive
- B32B37/1292—Application of adhesive selectively, e.g. in stripes, in patterns
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/12—Interconnection of layers using interposed adhesives or interposed materials with bonding properties
- B32B7/14—Interconnection of layers using interposed adhesives or interposed materials with bonding properties applied in spaced arrangements, e.g. in stripes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/0944—Diffractive optical elements, e.g. gratings, holograms
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/0977—Reflective elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/93—Batch processes
- H01L24/94—Batch processes at wafer-level, i.e. with connecting carried out on a wafer comprising a plurality of undiced individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/93—Batch processes
- H01L24/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L24/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of semiconductor or other solid state devices
- H01L25/03—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/075—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H10H20/00
- H01L25/0756—Stacked arrangements of devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/40—Optical elements or arrangements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/32—Stacked devices having two or more layers, each emitting at different wavelengths
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/14—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
- B32B37/24—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with at least one layer not being coherent before laminating, e.g. made up from granular material sprinkled onto a substrate
- B32B2037/243—Coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/412—Transparent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/418—Refractive
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2551/00—Optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B2207/00—Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12041—LED
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12044—OLED
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/005—Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Lens Barrels (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201462063532P | 2014-10-14 | 2014-10-14 | |
| US62/063,532 | 2014-10-14 | ||
| PCT/SG2015/050387 WO2016060615A1 (en) | 2014-10-14 | 2015-10-14 | Optical element stack assemblies |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106817910A CN106817910A (zh) | 2017-06-09 |
| CN106817910B true CN106817910B (zh) | 2019-12-13 |
Family
ID=55747026
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201580055984.6A Active CN106817910B (zh) | 2014-10-14 | 2015-10-14 | 光学元件堆叠组件 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US10741613B2 (enExample) |
| EP (1) | EP3207416B1 (enExample) |
| JP (1) | JP6843745B2 (enExample) |
| KR (1) | KR102433712B1 (enExample) |
| CN (1) | CN106817910B (enExample) |
| SG (1) | SG11201702556TA (enExample) |
| TW (1) | TWI684802B (enExample) |
| WO (1) | WO2016060615A1 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10241244B2 (en) | 2016-07-29 | 2019-03-26 | Lumentum Operations Llc | Thin film total internal reflection diffraction grating for single polarization or dual polarization |
| DE102017123798B4 (de) | 2017-10-12 | 2022-03-03 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Halbleiterlaser und Herstellungsverfahren für optoelektronische Halbleiterbauteile |
| TWI645637B (zh) * | 2017-10-18 | 2018-12-21 | 華立捷科技股份有限公司 | 面射型雷射裝置及其製造方法 |
| US12025826B2 (en) | 2018-09-17 | 2024-07-02 | Ams Sensors Singapore Pte. Ltd. | Optical light guides and methods of manufacturing the same |
| US11262644B1 (en) * | 2019-05-10 | 2022-03-01 | Facebook Technologies, Llc | Structured light projector with solid optical spacer element |
| US11551963B2 (en) * | 2020-02-14 | 2023-01-10 | Advanced Semiconductor Engineering, Inc. | Semiconductor device package and method of manufacturing the same |
| DE102023102291A1 (de) * | 2023-01-31 | 2024-08-01 | Lpkf Laser & Electronics Se | Umformverfahren zur Herstellung von Nanostrukturen sowie eine zur Durchführung bestimmte Vorrichtung |
Family Cites Families (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6235141B1 (en) * | 1996-09-27 | 2001-05-22 | Digital Optics Corporation | Method of mass producing and packaging integrated optical subsystems |
| US6669803B1 (en) * | 1997-10-03 | 2003-12-30 | Digital Optics Corp. | Simultaneous provision of controlled height bonding material at a wafer level and associated structures |
| US6074725A (en) * | 1997-12-10 | 2000-06-13 | Caliper Technologies Corp. | Fabrication of microfluidic circuits by printing techniques |
| US6381072B1 (en) | 1998-01-23 | 2002-04-30 | Proxemics | Lenslet array systems and methods |
| US6770503B1 (en) * | 1999-10-21 | 2004-08-03 | The Charles Stark Draper Laboratory, Inc. | Integrated packaging of micromechanical sensors and associated control circuits |
| US7329611B2 (en) * | 2002-04-11 | 2008-02-12 | Nec Corporation | Method for forming finely-structured parts, finely-structured parts formed thereby, and product using such finely-structured part |
| JP3888223B2 (ja) | 2002-05-13 | 2007-02-28 | ソニー株式会社 | 液晶表示素子の製造方法 |
| US7300812B2 (en) * | 2004-10-29 | 2007-11-27 | Hewlett-Packard Development Coompany, L.P. | Micro electrical mechanical system |
| US7482193B2 (en) * | 2004-12-20 | 2009-01-27 | Honeywell International Inc. | Injection-molded package for MEMS inertial sensor |
| JP2007279222A (ja) * | 2006-04-04 | 2007-10-25 | Hitachi Maxell Ltd | 表示パネル用基板の製造方法 |
| JP2007294336A (ja) * | 2006-04-27 | 2007-11-08 | Seiko Epson Corp | 発光装置、発光装置の製造方法及び電子機器 |
| US20080118241A1 (en) | 2006-11-16 | 2008-05-22 | Tekolste Robert | Control of stray light in camera systems employing an optics stack and associated methods |
| US8546739B2 (en) * | 2007-03-30 | 2013-10-01 | Min-Chih Hsuan | Manufacturing method of wafer level chip scale package of image-sensing module |
| CN102016653B (zh) * | 2008-04-28 | 2013-07-10 | 柯尼卡美能达精密光学株式会社 | 晶圆透镜聚合体的制造方法及晶圆透镜的制造方法 |
| US20090321861A1 (en) * | 2008-06-26 | 2009-12-31 | Micron Technology, Inc. | Microelectronic imagers with stacked lens assemblies and processes for wafer-level packaging of microelectronic imagers |
| JP4764942B2 (ja) | 2008-09-25 | 2011-09-07 | シャープ株式会社 | 光学素子、光学素子ウエハ、光学素子ウエハモジュール、光学素子モジュール、光学素子モジュールの製造方法、電子素子ウエハモジュール、電子素子モジュールの製造方法、電子素子モジュールおよび電子情報機器 |
| SG173197A1 (en) * | 2009-02-03 | 2011-09-29 | Digitaloptics Corp East | Optical imaging apparatus and methods of making the same |
| WO2011055655A1 (ja) | 2009-11-05 | 2011-05-12 | コニカミノルタオプト株式会社 | 撮像装置、光学ユニット、ウエハレンズ積層体及びウエハレンズ積層体の製造方法 |
| US20110221950A1 (en) * | 2010-03-12 | 2011-09-15 | Doeke Jolt Oostra | Camera device, wafer scale package |
| US20130037054A1 (en) | 2010-04-28 | 2013-02-14 | Nobuhiro Saruya | Method for producing imaging lens |
| US8000041B1 (en) | 2010-09-20 | 2011-08-16 | Visera Technologies Company Limited | Lens modules and fabrication methods thereof |
| SG193151A1 (en) | 2011-07-19 | 2013-09-30 | Heptagon Micro Optics Pte Ltd | Opto-electronic modules and methods of manufacturing the same and appliances and devices comprising the same |
| SG10201606882XA (en) | 2011-08-25 | 2016-10-28 | Heptagon Micro Optics Pte Ltd | Wafer-level fabrication of optical devices, in particular of modules for computational cameras |
| US8388793B1 (en) | 2011-08-29 | 2013-03-05 | Visera Technologies Company Limited | Method for fabricating camera module |
| US8570669B2 (en) | 2012-01-23 | 2013-10-29 | Optiz, Inc | Multi-layer polymer lens and method of making same |
| US9063005B2 (en) * | 2012-04-05 | 2015-06-23 | Heptagon Micro Optics Pte. Ltd. | Reflowable opto-electronic module |
| US10153179B2 (en) * | 2012-08-24 | 2018-12-11 | Taiwan Semiconductor Manufacturing Company | Carrier warpage control for three dimensional integrated circuit (3DIC) stacking |
| JP6060620B2 (ja) | 2012-10-29 | 2017-01-18 | セイコーエプソン株式会社 | マイクロレンズアレイの製造方法 |
| US9094593B2 (en) * | 2013-07-30 | 2015-07-28 | Heptagon Micro Optics Pte. Ltd. | Optoelectronic modules that have shielding to reduce light leakage or stray light, and fabrication methods for such modules |
| US10153204B2 (en) * | 2014-06-04 | 2018-12-11 | Flir Systems, Inc. | Wafer level packaging of reduced-height infrared detectors |
| WO2017082820A1 (en) * | 2015-11-12 | 2017-05-18 | Heptagon Micro Optics Pte. Ltd. | Optical element stack assemblies |
-
2015
- 2015-10-14 KR KR1020177012941A patent/KR102433712B1/ko active Active
- 2015-10-14 SG SG11201702556TA patent/SG11201702556TA/en unknown
- 2015-10-14 WO PCT/SG2015/050387 patent/WO2016060615A1/en not_active Ceased
- 2015-10-14 CN CN201580055984.6A patent/CN106817910B/zh active Active
- 2015-10-14 TW TW104133747A patent/TWI684802B/zh active
- 2015-10-14 US US15/516,692 patent/US10741613B2/en active Active
- 2015-10-14 JP JP2017519894A patent/JP6843745B2/ja active Active
- 2015-10-14 EP EP15850175.9A patent/EP3207416B1/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| EP3207416A1 (en) | 2017-08-23 |
| WO2016060615A1 (en) | 2016-04-21 |
| EP3207416A4 (en) | 2018-04-18 |
| KR20170072255A (ko) | 2017-06-26 |
| US20170309685A1 (en) | 2017-10-26 |
| TW201626021A (zh) | 2016-07-16 |
| SG11201702556TA (en) | 2017-04-27 |
| US10741613B2 (en) | 2020-08-11 |
| JP6843745B2 (ja) | 2021-03-17 |
| JP2017531832A (ja) | 2017-10-26 |
| TWI684802B (zh) | 2020-02-11 |
| KR102433712B1 (ko) | 2022-08-17 |
| CN106817910A (zh) | 2017-06-09 |
| EP3207416B1 (en) | 2020-02-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN106817910B (zh) | 光学元件堆叠组件 | |
| CN105493282B (zh) | 具有减少漏光或杂散光的屏蔽的光电模块以及用于此类模块的制造方法 | |
| KR102280613B1 (ko) | 광 누설 또는 미광을 감소시키는 차폐를 갖는 광전자 모듈들, 및 이러한 모듈들의 제조 방법들 | |
| CN108780820B (zh) | 具有带有用于接纳光学组件的开口的双重包封的光电模块 | |
| US20090321861A1 (en) | Microelectronic imagers with stacked lens assemblies and processes for wafer-level packaging of microelectronic imagers | |
| KR101966478B1 (ko) | 수동 광학 부품을 제조하기 위한 방법 및 그것을 포함하는 장치 | |
| KR20150013780A (ko) | 웨이퍼 스택 조립 | |
| CN108076671B (zh) | 包括直接粘附到衬底的间隔件的光学组件 | |
| CN104937445B (zh) | 光学元件制造以及并入有所述光学元件的模块 | |
| US10877239B2 (en) | Optical element stack assemblies | |
| CN110168739A (zh) | 光电子模块和光电子模制工具以及其制造方法 | |
| WO2025214692A1 (en) | Oozing phenomena suppression in an optical component | |
| CN115769371A (zh) | 光学装置和制造方法 | |
| WO2020256635A1 (en) | Replicating optical elements onto a substrate |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP03 | Change of name, title or address | ||
| CP03 | Change of name, title or address |
Address after: 26 Woodland Loop, Singapore City, Singapore Patentee after: Ames Osram Asia Pacific Pte. Ltd. Country or region after: Singapore Address before: 26 Woodland Loop, Singapore City, Singapore Patentee before: HEPTAGON MICRO OPTICS Pte. Ltd. Country or region before: Singapore |
|
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20241218 Address after: Singapore City Patentee after: Juguang Singapore Ltd. Country or region after: Singapore Address before: 26 Woodland Loop, Singapore City, Singapore Patentee before: Ames Osram Asia Pacific Pte. Ltd. Country or region before: Singapore |