CN106799872A - A kind of controllable heat controlled thin film of emissivity - Google Patents
A kind of controllable heat controlled thin film of emissivity Download PDFInfo
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- CN106799872A CN106799872A CN201611260007.2A CN201611260007A CN106799872A CN 106799872 A CN106799872 A CN 106799872A CN 201611260007 A CN201611260007 A CN 201611260007A CN 106799872 A CN106799872 A CN 106799872A
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- B32B15/00—Layered products comprising a layer of metal
- B32B15/20—Layered products comprising a layer of metal comprising aluminium or copper
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/28—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
- B32B27/281—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42 comprising polyimides
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- B32B27/00—Layered products comprising a layer of synthetic resin
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
- B32B9/04—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
- B32B9/04—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B9/041—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material of metal
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
- B32B9/04—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B9/045—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
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Abstract
The invention discloses a kind of controllable heat controlled thin film of emissivity, the heat controlled thin film includes：Substrate；The high refractive index layer of reflectivity >=0.8；The high emissivity layer of infrared emittance 0.3~0.7；And protective layer；Wherein, high refractive index layer, high emissivity layer and protective layer are followed successively by from inside to outside on the surface of the substrate.Heat control material of the present invention can realize the regulation and control of different absorption/transmitting ratios, it is capable of achieving light-weight design, there is the spacecraft controllable thermal control coating of emissivity of lightweight, miniaturization, whole magnitude temperature feature suitable for a new generation, its simple structure, it is with low cost, technique is easy to make, space environment good stability, meets spacecraft surface different parts emissivity different demands and improves the requirement of the resistance to space radiation of heat control material.
Description
Technical field
The invention belongs to space material field, and in particular to a kind of controllable heat controlled thin film of emissivity.
Background technology
Because the spacecrafts such as satellite work in the space of vacuum environment, the heat-conduction medium such as substantially no air of surrounding,
Its thermaltransmission mode relies primarily on heat radiation, therefore in spacecraft thermal control design using itself having different heat-radiating properties
Heat control material turns into a kind of important thermal control means.Existing heat controlled thin film product is generally divided into coating type（With various thermal control paints
To represent）And packaging type（Second surface mirror is aluminized as representative with Kapton）Two kinds, existed according to different use requirements
Different applications.Its common limitation is exactly that the performance of every kind of heat controlled thin film is fixed, it is impossible to by adjusting each film
The composition or thickness of layer change the thermal control performance of itself.
CN104561897A discloses a kind of film for changing intelligent heat control material temperature control ability, and it is used by vulcanizing
In zinc, zinc selenide, silicon and germanium one or more composition first film layers with by magnesium fluoride and fluorination iridium in one kind or
Two kinds of alternately laminated compositions of the second film layer of composition, in order to before the infrared emittance of heat control material itself is as immovable as possible
Put, it is ensured that solar absorptance is small as far as possible, its coating layers need to control, at 8~14 layers, to be unfavorable for the light weight of heat control material
Change design.
The content of the invention
The technical problem to be solved in the present invention is to overcome existing defect, there is provided a kind of controllable thermal control of emissivity is thin
Film.
In order to solve the above-mentioned technical problem, the invention provides following technical scheme：
A kind of controllable heat controlled thin film of emissivity, the heat controlled thin film includes：
Substrate；
The high refractive index layer of reflectivity >=0.8；
The high emissivity layer of infrared emittance 0.3~0.7；
And protective layer；
Wherein, high refractive index layer, high emissivity layer and protective layer are followed successively by from inside to outside on the surface of the substrate.
Preferably, the substrate is flexible substrates or hard substrate.Substrate surface by high refractive index layer, high emissivity layer and
After protective layer covering, the thermal control performance and environmental protection performance of film by reflectivity, high emissivity layer and protective layer performance
Determine, do not receive substrate performance impact in itself substantially.
It is highly preferred that the flexible substrates are aluminium foil, stainless steel band, Kapton（PI）, perfluoroethylene-propylene it is thin
Film or polyester film, the hard substrate are aluminum alloy sheet, titanium alloy piece, aluminium flake or sheet glass.
Preferably, the high refractive index layer is silver or aluminium.
Wherein Ag is higher to the reflectivity of solar spectrum, therefore it is highly preferred that the high refractive index layer is silver.
It is highly preferred that the thickness of the high refractive index layer is 100~200nm, transmitance can be larger if film layer is relatively thin,
So that solar absorptance rises, quality of forming film reduction film adhesion is influenceed if film layer is thicker.
Preferably, the high emissivity layer is Al2O3、SiO2、ZrO2、WO3。
Al2O3Spectral pattern it is as shown in Figure 2, it can be seen that it is in visible and near infrared band（0.2~4 μm）Have
Transmitance high, in Thermal infrared bands（6~11 μm）Absorptance other different materials it is high, it is easier to infrared emission high is provided
Rate.It has good resistance to elemental oxygen and resistance to space radiation performance simultaneously, can keep out the erosion of elemental oxygen and space ray, prevents
It is silver-colored aluminium reflecting layer and substrate performance degradation, improve life-span and the reliability of whole membrane system.Therefore it is highly preferred that described occurred frequently
It is Al to penetrate rate layer2O3。
Preferably, the protective layer is SiO2, it has transmitance high to visible and near infrared band, with low too
Positive absorptivity；Also there is good resistance to elemental oxygen and resistance to space radiation performance simultaneously, invading for elemental oxygen and space ray can be kept out
Erosion, play prevent it is silver-colored aluminium reflecting layer and base material performance degradation, improve life-span and the reliability of whole membrane system.In addition
SiO2To the absorption spectral coverage of Thermal infrared bands（Main uptake zone is at 5~8 μm）With Al2O3Just it is misaligned, therefore it is to infrared hair
The raising for penetrating rate also has larger contribution.
Preferably, between substrate and high refractive index layer, it is provided with Al2O3Barrier layer, improves the ageing-resistant performance of film, from
And avoid film from exposing the increase of solar absorptance after air for a long time.
Preferably, there is one layer of conductive layer outside described protective layer, the purpose of antistatic can be played, and it is substantially right
Its thermal control is without influence.The choice of conductive layer is general to be determined by satellite entirety antistatic requirement, is not transmitting of the present invention
The controllable heat controlled thin film of rate is prerequisite.
It is highly preferred that the conductive layer is tin indium oxide.
Beneficial effects of the present invention：
Heat control material of the present invention can realize the regulation and control of different absorption/transmitting ratios, be capable of achieving light-weight design, it is adaptable to a new generation's tool
There are the spacecraft controllable thermal control coating of emissivity of lightweight, miniaturization, whole magnitude temperature feature, its simple structure, low cost
Honest and clean, technique is easy to make, space environment good stability, meets spacecraft surface different parts emissivity different demands and improves heat
Control the requirement of the resistance to space radiation of material.
Brief description of the drawings
Accompanying drawing is used for providing a further understanding of the present invention, and constitutes a part for specification, with reality of the invention
Applying example is used to explain the present invention together, is not construed as limiting the invention.In the accompanying drawings：
Fig. 1 is the structural representation of the heat controlled thin film of embodiment 1, wherein, 1, substrate, 2, high refractive index layer, 3, high emissivity layer, 4,
Protective layer.
Fig. 2 is Al2O3Spectral pattern.
Fig. 3 is reflectance spectrum and 300K blackbody radiation intensity of the heat controlled thin film of embodiment 1 in 200~20000nm of wavelength
Curve.
Fig. 4 is the structural representation of the heat controlled thin film of embodiment 1, wherein, 1, substrate, 2, high refractive index layer, 3, high emissivity
Layer, 4, protective layer, 10, Al2O3Barrier layer.
Fig. 5 is the spectral reflectance curve and 300K blackbody radiation intensity curves of the heat controlled thin film heat controlled thin film of embodiment 3.
Specific embodiment
The preferred embodiments of the present invention are illustrated below in conjunction with accompanying drawing, it will be appreciated that preferred reality described herein
Apply example to be merely to illustrate and explain the present invention, be not intended to limit the present invention.
The solar absorptance and infrared emittance of the controllable heat controlled thin film of emissivity of the invention can be by high emissivity films
The different-thickness of layer and protective layer is adjusted, and reaches suitable thermal control performance, and thermal control parameter can be required according to thermal control design
Precise control.Two main thermal control parametersThe design of hemispherical emissivity and solar absorptance, adjustment depend primarily on occurred frequently
Penetrate composition, structure and the gross thickness of rate film layer and protective layer.
Need to judge the reasonability of thickness with reference to calorifics calculating after primarily determining that each thicknesses of layers.Such emissivity is controllable
The infrared emittance and solar absorptance of heat controlled thin film can be by theoretical calculations.
Substitute into the thickness of the high refractive index layer that primarily determines that and high emissivity layer first, build optical model need two with
The optical parametric of wavelength changeRefractive index n and extinction coefficient k, by optical design software, can obtain the ripple of theoretical calculation
250nm long is arrivedThe reflectivity values of the whole membrane system of scope.
According to the reflectivity values of whole membrane system, can be calculated using the method for numerical computations by thermodynamics relevant knowledge
Go out the emissivity and solar absorptance of film.It is specific as follows：
Total emissivity under each temperature TCalculating using following classical formulas calculate：
Wherein, ib(λ, T) is the Planck blackbody radiation coefficient of material, ib(λ,T) = (2phc2/l5)·(ehc/kTl−1)−1,
Wherein, λ is wavelength, and h is planck constant, and c is the light velocity, and k is twilight coefficient；It is hemispherical emissivity, due to metal-dielectric
Total transmitance of film can be ignored in multi-layer compound structure heat controlled thin film structure, then haveWherein,It is the solar absorptance of membrane system,Be the spectral reflectivity of membrane system, then formula（1）It is rewritten into：
And the solar absorptance of film can be calculated by below equation：
Wherein isIt is intensity of solar radiation.
The solar absorptance and half of the controllable heat controlled thin film of emissivity for primarily determining that thickness can be calculated according to above method
Ball emissivity, is adjusted according to result of calculation to film thickness, brings optical design software into again and obtains new thermal control parameter,
So the corresponding membrane system thickness results of required thermal control performance are finally can obtain repeatedly.
SiO2With Al2O3In thermal infrared section（5~）With absorptivity higher, particularly in 6~14mm sections of tool
There is absorptivity very high, as long as so thickness reaches micron dimension, material just has infrared emittance higher.
The design of conductive layer is general to be determined by satellite entirety antistatic requirement, typically requires that surface resistivity is less than 106Europe
Nurse, corresponding ito film thickness degree is about more than 100nm, is not influenceed substantially for membrane system emissivity of the present invention.
Embodiment 1
A kind of controllable heat controlled thin film of emissivity, substrate is polyimides, and 150nm thickness is followed successively by from inside to outside in substrate surface
The Al of silverskin, 1.9 μ m-thicks2O3Layer and the thick SiO of 400nm2Layer, structure is as shown in Figure 1.The solar absorptance of film is 0.13.
Heat controlled thin film is shown in Fig. 3 in the reflectance spectrum and 300K blackbody radiation intensity curves of 200~20000nm of wavelength.By
Figure can be seen that film has solar absorptance high in 8~13 μm of thermal infrared area）, the radiation intensity peak value of 300K black matrixes just locates
In this wave band, this heat controlled thin film for showing to prepare has thermal emissivity high, and the hemisphere for calculating film by this curve is launched
Rate is 0.59, and the hemispherical emissivity for passing through AE radiometer measurement films is 0.58, is as a result coincide substantially.
Embodiment 2
Film prepared by embodiment 1 its solar absorptance after long-time exposure air substantially increases, the Ag reflecting layer hair of film
It is black.Think that argentum reflecting layer there occurs oxidation, reason is not fine and close enough polyimide substrate, wear the oxygen molecule in air
Penetrating into aoxidize it in Ag films, is that this film to embodiment 1 is improved, and improvement is in polyimide substrate and silver
Increase the thick Al of one layer of 50nm between film2O3Barrier layer, the film membrane structure after improvement is shown in Fig. 4.Rear film is improved by exposing
Air does not find the decline of absorptivity after 8 months.
Embodiment 3
A kind of controllable heat controlled thin film of emissivity, substrate is polyimides, and 50nm thickness is followed successively by from inside to outside in substrate surface
Al2O3Barrier layer, 150nm thick silverskin, the Al of 1.9 μ m-thicks2O3Layer and the thick SiO of 550nm2Layer.The spectrum of the heat controlled thin film is anti-
Penetrate curve and 300K blackbody radiation intensity curves are shown in Fig. 5（A is the present embodiment film 300K blackbody radiation intensity curves, and B is this reality
A film spectral reflectance curve is applied, C is the film spectral reflectance curve of embodiment 1）, it is seen that increase SiO2The thickness of layer, Ke Yizeng
Plus 5 μm~8 μm of absorption, improve infrared emittance.The solar absorptance of film is 0.12, and hemispherical emissivity is 0.68, is absorbed
Radiation is than being 0.18.
Embodiment 4
A kind of controllable heat controlled thin film of emissivity, substrate is polyimides, and 50nm thickness is followed successively by from inside to outside in substrate surface
Al2O3Barrier layer, 150nm thick silverskin, the Al of 1.9 μ m-thicks2O3Layer, 550nm thick SiO2Layer, 100nm thick tin indium oxide
（ITO）Layer.
Finally it should be noted that：The preferred embodiments of the present invention are the foregoing is only, are not intended to limit the invention,
Although being described in detail to the present invention with reference to the foregoing embodiments, for a person skilled in the art, it still may be used
Modified with to the technical scheme described in foregoing embodiments, or equivalent is carried out to which part technical characteristic.
All any modification, equivalent substitution and improvements within the spirit and principles in the present invention, made etc., should be included in of the invention
Within protection domain.
Claims (10)
1. a kind of controllable heat controlled thin film of emissivity, the heat controlled thin film includes：
Substrate；
The high refractive index layer of reflectivity >=0.8；
The high emissivity layer of infrared emittance 0.3~0.7；
And protective layer；
Wherein, high refractive index layer, high emissivity layer and protective layer are followed successively by from inside to outside on the surface of the substrate.
2. heat controlled thin film according to claim 1, it is characterised in that：The substrate is flexible substrates or hard substrate.
3. heat controlled thin film according to claim 2, it is characterised in that：The flexible substrates are aluminium foil, stainless steel band, polyamides
Imines film, polyfluorinated ethylene membrane or polyester film, the hard substrate are aluminum alloy sheet, titanium alloy piece, aluminium flake or glass
Glass piece.
4. heat controlled thin film according to claim 1, it is characterised in that：The high refractive index layer is silver or aluminium.
5. heat controlled thin film according to claim 4, it is characterised in that：The high refractive index layer is silver.
6. heat controlled thin film according to claim 4, it is characterised in that：The thickness of the high refractive index layer be 100~
200nm。
7. heat controlled thin film according to claim 1, it is characterised in that：The high emissivity layer is Al2O3、SiO2、ZrO2Or
WO3, it is preferable that the high emissivity layer is Al2O3。
8. heat controlled thin film according to claim 1, it is characterised in that：The protective layer is SiO2。
9. heat controlled thin film according to claim 1, it is characterised in that：Between substrate and high refractive index layer, Al is provided with2O3
Barrier layer.
10. heat controlled thin film according to claim 1, it is characterised in that：Conductive layer is externally provided with described protective layer.
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Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108860664A (en) * | 2018-06-20 | 2018-11-23 | 上海卫星工程研究所 | The novel thermal controls apparatus of spatial flexible mechanism |
| CN109786951A (en) * | 2018-12-20 | 2019-05-21 | 兰州空间技术物理研究所 | A kind of thermoelectricity protection integrated membrane structure |
| CN110438460A (en) * | 2019-05-30 | 2019-11-12 | 兰州空间技术物理研究所 | A kind of solar absorptance and the regulatable heat controlled thin film structure of infrared emittance and its determine method |
| CN110527962A (en) * | 2019-05-30 | 2019-12-03 | 兰州空间技术物理研究所 | A kind of compound heat controlled thin film of low stress wet-heat resisting and preparation method thereof |
| CN110673418A (en) * | 2019-10-11 | 2020-01-10 | 深圳航天东方红海特卫星有限公司 | Graphene intelligent thermal control film |
| CN110724933A (en) * | 2019-11-07 | 2020-01-24 | 中国电子科技集团公司第三十八研究所 | Preparation method of aluminum alloy surface thermal control coating |
| CN111099039A (en) * | 2019-12-11 | 2020-05-05 | 上海卫星工程研究所 | Surface thermal control structure suitable for spacecraft and preparation method thereof |
| CN111204988A (en) * | 2018-11-21 | 2020-05-29 | 中国建筑材料科学研究总院有限公司 | Flexible film type thermal control coating and preparation method thereof |
| CN111893435A (en) * | 2020-07-10 | 2020-11-06 | 中国兵器工业第五九研究所 | Light irradiation-resistant high-reflectivity film and preparation method thereof |
| CN112859216A (en) * | 2021-01-14 | 2021-05-28 | 北京科技大学 | Multilayer thin film structure with significant directionally selective emissivity |
| CN115287617A (en) * | 2022-08-03 | 2022-11-04 | 哈尔滨工业大学 | Preparation method of composite film with infrared long-wave selective emission characteristic |
| CN115928020A (en) * | 2022-09-23 | 2023-04-07 | 南京航空航天大学 | Space cryogenic thermal control coating and preparation method thereof |
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Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108860664A (en) * | 2018-06-20 | 2018-11-23 | 上海卫星工程研究所 | The novel thermal controls apparatus of spatial flexible mechanism |
| CN108860664B (en) * | 2018-06-20 | 2020-07-14 | 上海卫星工程研究所 | Novel thermal control device for space flexible mechanism |
| CN111204988A (en) * | 2018-11-21 | 2020-05-29 | 中国建筑材料科学研究总院有限公司 | Flexible film type thermal control coating and preparation method thereof |
| CN111204988B (en) * | 2018-11-21 | 2023-09-29 | 中国建筑材料科学研究总院有限公司 | Flexible film type thermal control coating and preparation method thereof |
| CN109786951A (en) * | 2018-12-20 | 2019-05-21 | 兰州空间技术物理研究所 | A kind of thermoelectricity protection integrated membrane structure |
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