CN106773334A - 一种制备显示面板的方法及制得的显示面板 - Google Patents
一种制备显示面板的方法及制得的显示面板 Download PDFInfo
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- G—PHYSICS
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Abstract
本发明公开了一种制备显示面板的方法,包括以下步骤:S1.在第一基板和第二基板上分别涂布配向膜,并对所述配向膜进行预热处理;S2.将所述涂布了配向膜的第一基板和第二基板上分别分成照射区和遮蔽区;利用紫外光对所述涂布了配向膜的第一基板和第二基板进行照射,使所述照射区内的配向膜中的聚合物降解;S3.将照射后的第一基板和第二基板上的配向膜进行加热处理,使配向膜固化;S4.对固化后的所述第一基板和第二基板上的配向膜进行定向摩擦处理,形成凹槽;S5.将定向摩擦处理后的第一基板和第二基板对组,注入液晶分子,形成液晶盒,最后制得显示面板。根据本发明提供的显示面板,能够实现多畴显示。
Description
技术领域
本发明涉及液晶显示领域,具有涉及一种制备显示面板的方法,以及制得的显示面板。
背景技术
目前,液晶显示器件最常用的两种显示模式有垂直配向(VA)模式和面内开关(IPS)模式。VA显示以其高对比度和无须摩擦配向等优势,成为大尺寸TV用TFT-LCD的常见显示模式。作为VA显示的共性,不同视野角下的色偏(colorshift)现象是VA产品设计必须面对的重大课题。所谓色偏,是指同一个显示面板表现同一色彩时,在不同的视野角上看到的亮度、色彩也会有差异。为解决不同视野角下的色偏问题,人们发展了在电极表面配向膜植入凸起物以实现多畴排列的MVA技术,不同畴内的液晶分子转动方向不同,保证从不同角度观察都可以获得相应的补偿,从而改善视野角。然而,MVA技术由于引入了凸起物,导致其开口率下降,从而降低了显示器件的穿透率。后续人们在MVA的基础上改进,用蚀刻工艺形成ITO图案代替凸起物,发展了PVA技术。但PVA结构没有凸起物,液晶分子没有预倾角,响应速度比较慢。
发明内容
针对现有技术中的不足,本申请提供了一种制备显示面板的方法及其制得的显示面板。根据本发明的显示面板,能够实现多畴(domain)显示,不需要通过多个TFT来得到多domain,可以得到更高的开口率,也不需要在上下基板额外形成突起的pattern,在制程和工艺上更简单和节约。
根据本发明的一个方面,提供了一种制备显示面板的方法,包括以下步骤:
S1.在第一基板和第二基板上分别涂布配向膜,并对所述配向膜进行预热处理;
S2.将所述涂布了配向膜的第一基板和第二基板上分别分成照射区和遮蔽区;利用紫外光对所述涂布了配向膜的第一基板和第二基板进行照射,使所述照射区内的配向膜中的聚合物降解;
S3.将照射后的第一基板和第二基板上的配向膜进行加热处理,使配向膜固化;
S4.对固化后的所述第一基板和第二基板上的配向膜进行定向摩擦处理,形成凹槽;
S5.将定向摩擦处理后的第一基板和第二基板对组,注入液晶分子,形成液晶盒(Cell),最后制得显示面板。
根据本发明提供的显示面板,从改变配向层(配向膜)的锚定能出发,通过UV光照形成多个具有不同锚定能的配向层(配向膜)区域。配向膜的锚定能不同,则对应的V-T曲线的阀值电压不同,在相同的外加电压下液晶的倾倒程度不同,从而使得不同区域的光透过率不同,结合ITO电极的裂缝方向的不同,实现多domain显示的效果,进而解决了VA显示技术的色偏问题,改善显示面板的视野角。
根据本发明的一个优选实施方式,第一基板和第二基板的顶层均为透明导电膜(如铟锡氧化物透明导电膜ITO)覆盖。其中,在一个具体的实施例中,所述第一基板为阵列基板,所述第二基板为彩膜基板。在一些具体的实施例中,在所述步骤S1中,所述预热处理(如预烘烤)的温度为70-100℃,时间为3-5min。
根据本发明,VA显示模式中,涂布在基板上的配向膜,起到控制液晶分子排列方向的作用,由于液晶与配向膜之间的界面有着很强的锚定作用力,使液晶分子形成一定的预倾角垂直站立,施加外电场后液晶分子可以快速旋转到对应的方位。最常用的配向膜是聚酰亚胺薄膜(PI膜)。
根据本发明的一个优选实施方式,在所述步骤S2中,利用图案化的光罩放置于所述涂布了配向膜的第一基板和第二基板上,将其分别分成照射区和遮蔽区,其中,有光罩遮挡的区域为遮蔽区,未被遮挡的部分为照射区。然后采用紫外光进行照射。也即利用图案化的光罩将涂有配向膜(如PI膜)的基板划分为不同的区域,选择性的进行曝光,使得基板表面的锚定能呈现区域化的不同。所述紫外光(UV光)采用低照度的紫外光。照射区内的配向膜中的聚合物在UV光下会发生一定程度地降解,从而降低了照射区内的配向膜的锚定能。在一些具体的实施例中,紫外光照度为4-10mw/cm2,照射时间为5-10min。
根据本发明的一个优选实施方式,在步骤S3中,通过较高温度下的加热,使得配向膜完全固化。为了更好地改变薄膜的表面锚定能,必须在配向膜(如PI膜)完全固化或称硬化前,进行UV光照射,否则很难改变配向膜的表面能。在一些具体的实施例中,在所述步骤S3中,所述加热处理(如烘烤)的处理温度为220-240℃,处理时间为40-60min。
根据本发明的一个优选实施方式,通过步骤S4中的rubbing(定向摩擦)处理,形成凹槽;从而有利于后续的注入的液晶分子定向排列形成预倾角,进而减小响应时间。
根据本发明的另外一个方面,还提供了根据上述方法制备的显示面板,多畴显示,色偏小,显示器件的穿透率强,无须形成额外的突起,用于液晶显示器件,具有广阔的应用前景。
根据本发明,所述显示面板为多畴显示,照射区内的液晶分子和遮蔽区内的液晶分子具有不同的倾倒角度。遮蔽区(未经UV光照射)的配向膜的表面锚定能较大,相应的显示像素电极的阈值电压较高;而照射区(经UV光照射)的配向膜,其表面锚定能降低,则像素电极的阈值电压降低。给像素电极输入相同的电压时,UV光照射与否的两个区域的液晶倾倒角度(穿透率)就会不同,再结合ITO电极的裂缝方向的不同,实现多畴显示面板技术,进而解决VA显示技术的色偏问题,改善显示面板的视野角。
根据本发明,利用光罩将涂有PI膜的基板划分为不同的区域,选择性的进行曝光,使得基板表面的锚定能呈现区域化的不同,再结合ITO电极表面形成不同的裂纹方向,使得液晶分子呈现不同的倒向,形成多畴的液晶显示面板,缩小各个视野角看到的色彩差异,巧妙地解决了VA显示模式的色偏问题。该技术无须引入凸起物,节约成本,操作接单,具有广阔的应用前景。同时,液晶分子也具有一定的预倾角,响应速度也比较快。
附图说明
图1显示了根据本发明的一个实施例的工艺示意图;
图2显示了根据本发明的显示面板不同区域内的液晶转动角度的示意图;
图3显示了根据本发明的一个实施例的显示面板与紫外光照对应示意图。
具体实施方式
下面结合附图和实施例对本发明做进一步说明,但并不构成对本发明的任何限制。
实施例1:
制备多畴显示面板的方法包括如下步骤:
S1.在顶层为ITO覆盖的第一基板(阵列基板)上涂布一层聚酰亚胺(PI)膜1,同时,顶层为ITO覆盖的第二基板(彩膜基板)上涂布一层聚酰亚胺(PI)膜1;然后在80℃下预烘烤3min;
S2.利用印有图案的光罩2遮挡,分成照射区4和遮蔽区3;使用低照度的UV光(4-10mw/cm2)照射PI薄膜1,紫外光照度为,照射时间为5min左右;照射区4(未经过光罩2遮挡的部分),聚酰亚胺会在紫外光的照射下分解,从而降低照射区4的配向膜的表面锚定能;
S3.将照射后的第一基板和第二基板上的配向膜进行加热处理,使配向膜固化;将PI膜在230℃下烘烤1h,是PI膜完全固化;S3必须在S2后进行,否则难以通过UV光改变配向膜的锚定能;
S4.将PI膜rubbing,形成凹槽;从而方便后续步骤S5中的注入的液晶分子定向排列形成预倾角,减小响应时间;
S5.将阵列基板和彩膜基板对组,注入液晶分子5,形成液晶盒(cell基板);经bonding等动作,形成显示面板。
此时,遮蔽区3(未经UV光照射)的配向膜的表面锚定能较大,像素电极的阈值电压较高;而照射区4(经UV光照射)的配向膜,其表面锚定能降低,则像素电极的阈值电压降低。给像素电极输入相同的电压时,UV光照射与否的两个区域的液晶倾倒角度(穿透率)就会不同,再结合ITO电极的裂缝方向的不同,实现多畴显示面板技术,进而解决VA显示技术的色偏问题,改善显示面板的视野角。
如图2所示,在照射区4和遮蔽区3(图2c)对应的液晶分子呈现不同的倾倒角度。图2a为遮蔽区3对应的液晶的倾倒情况,而图2b为照射区4对应的液晶倾倒情况。因此,照射区和遮蔽区对应的液晶倾倒角度不同,穿透率不同,再加上ITO电极的裂缝方向的不同,实现多畴显示面板技术,进而解决VA显示技术的色偏问题,改善显示面板的视野角。
作为选择,本发明任一实施例步骤S1中的预烘烤(预热处理)温度80℃可以替换为在70-100℃下的其他温度,时间3min可以替换为3-5min内的其他时间;
作为选择,本发明任一实施例步骤S2中的紫外光照度可以为4-10mw/cm2内的光照度,照射时间可以替换为5-10min内的其他时间;
作为选择,本发明任一实施例步骤S3中的烘烤温度(即加热处理温度)230℃可以替换为220-240℃内的其他温度,处理时间1h可以替换为40-60min内的其他时间。
在本发明中的提到的任何数值,如果在任何最低值和任何最高值之间只是有两个单位的间隔,则包括从最低值到最高值的每次增加一个单位的所有值。例如,如果声明一种组分的量,或诸如温度、压力、时间等工艺变量的值为50-90,在本说明书中它的意思是具体列举了51-89、52-88……以及69-71以及70-71等数值。对于非整数的值,可以适当考虑以0.1、0.01、0.001或0.0001为一单位。这仅是一些特殊指明的例子。在本申请中,以相似方式,所列举的最低值和最高值之间的数值的所有可能组合都被认为已经公开。
应当注意的是,以上所述的实施例仅用于解释本发明,并不构成对本发明的任何限制。通过参照典型实施例对本发明进行了描述,但应当理解为其中所用的词语为描述性和解释性词汇,而不是限定性词汇。可以按规定在本发明权利要求的范围内对本发明作出修改,以及在不背离本发明的范围和精神内对本发明进行修订。尽管其中描述的本发明涉及特定的方法、材料和实施例,但是并不意味着本发明限于其中公开的特定例,相反,本发明可扩展至其他所有具有相同功能的方法和应用。
Claims (10)
1.一种制备显示面板的方法,包括以下步骤:
S1.在第一基板和第二基板上分别涂布配向膜,并对所述配向膜进行预热处理;
S2.将所述涂布了配向膜的第一基板和第二基板上分别分成照射区和遮蔽区;利用紫外光对所述涂布了配向膜的第一基板和第二基板进行照射,使所述照射区内的配向膜中的聚合物降解;
S3.将照射后的第一基板和第二基板上的配向膜进行加热处理,使配向膜固化;
S4.对固化后的所述第一基板和第二基板上的配向膜进行定向摩擦处理,形成凹槽;
S5.将定向摩擦处理后的第一基板和第二基板对组,注入液晶分子,形成液晶盒,最后制得显示面板。
2.根据权利要求1所述的方法,其特征在于,在所述步骤S2中,紫外光照度为4-10mw/cm2,照射时间为5-10min。
3.根据权利要求1所述的方法,其特征在于,所述配向膜包括聚酰亚胺膜。
4.根据权利要求1所述的方法,其特征在于,在所述步骤S1中,所述预热处理的温度为70-100℃,时间为3-5min。
5.根据权利要求1所述的方法,其特征在于,在所述步骤S3中,所述加热处理的处理温度为220-240℃,处理时间为40-60min。
6.根据权利要求1所述的方法,其特征在于,在所述步骤S2中,将图案化的光罩放置于所述涂布了配向膜的第一基板和第二基板上,将其分别分成照射区和遮蔽区,其中,有光罩遮挡的区域为遮蔽区,未被遮挡的部分为照射区。
7.根据权利要求1所述的方法,其特征在于,在所述步骤S2中,通过所述照射区内的配向膜中的聚合物降解,从而降低了照射区内的配向膜的锚定能。
8.根据权利要求1所述的方法,其特征在于,所述第一基板为阵列基板,第二基板为彩膜基板;同时,第一基板和第二基板上的顶层均为透明导电膜覆盖。
9.根据权利要求1-9中任意一项所述的方法,其特征在于,所述显示面板为多畴显示,其中,照射区内的液晶分子和遮蔽区内的液晶分子具有不同的倾倒角度。
10.一种根据权利要求1-9中任意一项所述方法制备的显示面板。
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