CN106737195B - A kind of emery wheel location position system and method - Google Patents
A kind of emery wheel location position system and method Download PDFInfo
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- CN106737195B CN106737195B CN201611146599.5A CN201611146599A CN106737195B CN 106737195 B CN106737195 B CN 106737195B CN 201611146599 A CN201611146599 A CN 201611146599A CN 106737195 B CN106737195 B CN 106737195B
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- emery wheel
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- driving device
- sliding panel
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B51/00—Arrangements for automatic control of a series of individual steps in grinding a workpiece
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
Abstract
The present invention provides a kind of emery wheel location position system and methods, and wherein emery wheel location position system includes: driving device；The carriage for connecting with driving device, and moving under the drive of the drive, carriage include sliding rail and the sliding panel moved on the slide rail；Fixed photoelectric sensor on the slide rail；It is set on sliding panel, and with the sensor baffle and measurement sensor of sliding panel movement；And the control system being connect with driving device, photoelectric sensor and measurement sensor；Wherein, when photoelectric sensor is blocked by sensor baffle, control system receives the enabling signal that photoelectric sensor is sent and determines reference zero, after the first signal for sending when receiving measurement sensor and detecting wafer-supporting platform upper edge, the second signal sent when detecting emery wheel lower edge, the distance between emery wheel and wafer-supporting platform are determined.The present invention can automatic, real-time detection emery wheel there is very strong safety at a distance from wafer-supporting platform, and can be improved the cost performance of equipment.
Description
Technical field
The present invention relates to semiconductor equipment emery wheel location position field more particularly to a kind of emery wheel location position system and
Method.
Background technique
Ic chip package trend develops to smallerization, more high density, higher performance, more multi-functional direction,
Chip is thinned as the important procedure in semiconductor post package.Wafer, which is thinned, can reduce chip package volume, improve mechanical
Performance and electric property improve the heat dissipation effect of chip.In semiconductor manufacturing equipment manufacturing process and wafer thinning process
In, eedle is thinned to different technique in wafer, is equipped with different emery wheels, the specification of emery wheel is different and emery wheel thickness low LCL is quasi-
True influence needs to demarcate the position of emery wheel before grinding, and the method routinely used at present is the calibration using 5mm
Block goes to demarcate manually, as shown in Figure 1, calibrating block 9 is arranged between emery wheel 71 and wafer-supporting platform 8 to demarcate the position of emery wheel 71.Tool
The relative position of body determines there is not accurate enough, the complicated for operation problem in calibration position by feel.
Summary of the invention
The embodiment of the present invention provides a kind of emery wheel location position system and method, to solve in the prior art using side manually
Formula demarcates the problem that existing calibration is not accurate enough and complicated for operation when emery wheel position.
The embodiment of the present invention provides a kind of emery wheel location position system, comprising:
Driving device；
It is connect with the driving device, and the carriage moved under the driving of the driving device, the sliding
Device includes sliding rail and the sliding panel that moves on the sliding rail；
The photoelectric sensor being fixed on the sliding rail；
It is set on the sliding panel, and is kept off under the driving of the driving device with the sensor of sliding panel movement
Piece and measurement sensor；And
The control system being connect with the driving device, the photoelectric sensor and the measurement sensor；
Wherein, when the photoelectric sensor is blocked by the sensor baffle, the control system receives the photoelectricity
The enabling signal that sensor is sent determines reference zero, the transmission when receiving the measurement sensor and detecting wafer-supporting platform upper edge
The first signal, after the measurement sensor detects the second signal sent when emery wheel lower edge, according to the reference zero,
First signal and the second signal determine the distance between the emery wheel and the wafer-supporting platform.
Wherein, the emery wheel location position system further include:
For fixing the mounting bracket of the driving device and the carriage, the driving device is set to the peace
Fill the first end face of bracket, the carriage is set to the second end face of the mounting bracket, the first end face with it is described
Second end face is adjacent and vertical.
Wherein, the driving device includes the mounting base connecting with the mounting bracket, is set in the mounting base
Shaft coupling, the driving motor being connect with one end of the shaft coupling, the bearing block and silk being connect with the other end of the shaft coupling
Bumper structure；
Wherein the screw structure is connect by the bearing block with the shaft coupling, the driving device and the control
The signal output end of system connects.
Wherein, the screw structure includes:
The lead screw being connect by the bearing block with the shaft coupling；
Be set on the lead screw, the lead screw rotation when along the lead screw the mother lead screw axially to move up and down；With
And
The lead screw base be set on the lead screw, being fixedly connected with the mother lead screw；
Wherein the direction of motion of the mother lead screw is the extending direction of the emery wheel and the wafer-supporting platform distance.
Wherein, the carriage further include:
The sliding block being set between the sliding panel and the sliding rail；
Wherein the sliding panel is connect with the lead screw base, and the sliding block moves on the sliding rail, the sliding panel
It is fixedly connected with the sliding block.
Wherein, the measurement sensor is fixed on the sliding panel by fixed plate, wherein the fixed plate is fixed on
On first mounting surface of the sliding panel, the second mounting surface of the sliding panel is connect with the lead screw base, first peace
Dress face is opposite with second mounting surface, and the measurement sensor is connect with the signal input part of the control system.
Wherein, the sensor baffle is fixed on the third mounting surface of the sliding panel, the third mounting surface difference
It is vertical and adjacent with first mounting surface, second mounting surface.
Wherein, the photoelectric sensor is fixed in the first end face of the sliding rail, the sliding rail and the first end face
Opposite second end face and the shoe contact, and the photoelectric sensor is connect with the signal input part of the control system.
Wherein, the sensor baffle includes the first connecting portion being fixed on the third mounting surface of the sliding panel, with
The first connecting portion is vertical and the second connecting portion of integrally connected, the third of the part first connecting portion and the sliding rail
End face contact, the second connecting portion are located at the side of the first end face of the sliding rail, pre- with the first end face interval first
Set a distance, the third end face of the sliding rail are vertical and adjacent with the first end face, the second end face respectively.
Wherein, the quantity of the photoelectric sensor be two, respectively the first photoelectric sensor and with first photoelectricity
Sensor is located along the same line and is spaced the second photoelectric sensor of the second preset distance.
The embodiment of the present invention also provides a kind of method using above-mentioned emery wheel location position system calibration emery wheel, the side
Method includes:
Control system sends driving signal to driving device, starts the driving device, is driven by the driving device
The movement for the carriage being connect with the driving device；
During the sliding panel of the carriage slides on the slide rail, when photoelectric sensor is because by sensor baffle
When blocking, the control system receives the enabling signal that the photoelectric sensor is sent and determines reference zero and wait measurement to be received
The signal that sensor is sent；
It receives the measurement sensor and detects the first signal sent when the position of wafer-supporting platform upper edge, according to reference zero
The first lifting distance of the measurement sensor is determined with the first signal；And it receives the measurement sensor and detects emery wheel
The second signal sent when the position of lower edge determines the second lifting of the measurement sensor according to reference zero and second signal
Distance；
The emery wheel and the wafer-supporting platform are obtained according to the difference of second lifting distance and first lifting distance
Distance.
The beneficial effect of technical solution of the embodiment of the present invention includes at least:
Technical solution of the present invention starts driving device by control system, drives sliding dress using the operating of driving device
The sliding set, during carriage sliding, when the photoelectric sensor on carriage sliding rail is by the sensing on sliding panel
When device baffle blocks, control system receives the enabling signal that photoelectric sensor is sent and determines reference zero；It is connect in control system
It receives measurement sensor and detects that the first signal sent when the position of wafer-supporting platform upper edge and measurement sensor detect under emery wheel
After the second signal sent when edge placement, emery wheel and wafer-supporting platform are determined according to reference zero, the first signal and the second signal
Distance, the present invention is easy to use, measurement is accurate and reliable, can be realized automatic, real-time detection emery wheel at a distance from wafer-supporting platform, tool
There is very strong safety, and can be improved the cost performance of equipment.
Detailed description of the invention
In order to illustrate the technical solution of the embodiments of the present invention more clearly, needed in being described below to the embodiment of the present invention
Attached drawing to be used is briefly described, it should be apparent that, drawings in the following description are only some embodiments of the invention,
For those of ordinary skill in the art, without any creative labor, it can also obtain according to these attached drawings
Obtain other attached drawings.
Fig. 1 shows the prior arts to demarcate emery wheel position view using calibrating block；
Fig. 2 indicates the emery wheel location position system schematic diagram one that the embodiment of the present invention one provides；
Fig. 3 indicates the emery wheel location position system schematic diagram two that the embodiment of the present invention one provides；
Fig. 4 indicates that the emery wheel that the embodiment of the present invention one provides and wafer-supporting platform cooperate schematic diagram；
Fig. 5 indicates that the emery wheel location position system that the embodiment of the present invention one provides and emery wheel, wafer-supporting platform cooperate schematic diagram；
Fig. 6 indicates the method schematic diagram provided by Embodiment 2 of the present invention using emery wheel location position system calibration emery wheel.
Wherein in figure: 1, driving device；11, mounting base；12, shaft coupling；13, driving motor；14, bearing block；15, lead screw
Structure；151, lead screw；152, mother lead screw；153, lead screw base；2, carriage；21, sliding rail；22, sliding panel；23, sliding block；3,
Photoelectric sensor；31, sensor baffle；4, measurement sensor；5, mounting bracket；6, fixed plate；7, grinding spindle；71, emery wheel；
72, axle sleeve；8, wafer-supporting platform；9, calibrating block.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are some of the embodiments of the present invention, instead of all the embodiments.Based on this hair
Embodiment in bright, every other implementation obtained by those of ordinary skill in the art without making creative efforts
Example, shall fall within the protection scope of the present invention.
Embodiment one
As shown in Fig. 2~Fig. 5, the emery wheel location position system of the offer of the embodiment of the present invention one, comprising:
Driving device 1；The carriage 2 for connecting with driving device 1, and being moved under the driving of driving device 1, sliding
Device 2 includes sliding rail 21 and the sliding panel 22 moved on sliding rail 21；The photoelectric sensor 3 being fixed on sliding rail 21；It is set to
On sliding panel 22, and with the sensor baffle 31 and measurement sensor 4 of the movement of sliding panel 22 under the driving of driving device 1；With
And the control system being connect with driving device 1, photoelectric sensor 3 and measurement sensor 4；
Wherein, when photoelectric sensor 3 is blocked by sensor baffle 31, control system receives what photoelectric sensor 3 was sent
Enabling signal determines reference zero, receive measurement sensor 4 detect 8 upper edge of wafer-supporting platform when send the first signal, survey
After quantity sensor 4 detects the second signal sent when 71 lower edge of emery wheel, according to reference zero, the first signal and the second signal
Determine the distance between emery wheel 71 and wafer-supporting platform 8.
Specifically, driving device 1 is connect with control system, the driving signal that control system is sent is received, and according to control
The driving signal of system starts running.The operating of driving device 1 drives the movement for the carriage 2 connecting with driving device 1.Its
Middle carriage 2 includes sliding rail 21 and sliding panel 22, and wherein sliding panel 22 is connect with driving device 1, in the band of driving device 1
Under dynamic, sliding panel 22 slides on sliding rail 21.
It is fixed with photoelectric sensor 3 on sliding rail 21, sensor baffle 31 is fixed on sliding panel 22 and measurement passes
Sensor 4.During sliding panel 22 slides, the movement of sliding panel 22 drives sensor baffle 31 and measurement sensor 4
Movement.When sensor baffle 31 during the motion, when sheltering from photoelectric sensor 3, i.e., the light source of photoelectric sensor 3 is sensed
Device baffle 31 blocks, and photoelectric sensor 3 is triggered starting at this time, and photoelectric sensor 3 sends enabling signal to control system, controls
System determines reference zero after receiving enabling signal.
In 22 motion process of sliding panel, measurement sensor 4 on sliding panel 22 according to the sliding of sliding panel 22 and
It moves up and down.Wherein the extending direction of distance is parallel between the glide direction of sliding panel 22 and emery wheel 71 and wafer-supporting platform 8, and is opening
Begin before calibration, emery wheel location position system is located at the side of wafer-supporting platform 8, and measurement sensor 4 can be located at 8 side of wafer-supporting platform
Lower section.
Spaced apart between emery wheel 71 and wafer-supporting platform 8, in the vertical direction, emery wheel 71 is located at the top of wafer-supporting platform 8,
Wherein emery wheel 71 is set to one end of grinding spindle 7, and emery wheel 71 is set on grinding spindle 7, is also arranged on grinding spindle 7
Axle sleeve 72.
After determining reference zero, driving device 1 drives sliding panel 22 to move upwards, in the motion process of sliding panel 22
In, when measurement sensor 4, which is moved to, to be flushed with the upper edge of wafer-supporting platform 8, measurement sensor 4 sends the first letter to control system
Number, when measurement sensor 4, which is moved to, to be flushed with the lower edge of emery wheel 71, measurement sensor 4 sends the second letter to control system
Number.
It should be noted that measurement sensor 4 belongs to infrared sensor, due to being spaced between emery wheel 71 and wafer-supporting platform 8
Certain distance, and measurement sensor 4 is moved from the lower direction of 8 side of wafer-supporting platform close to the direction of emery wheel 71.In measurement sensor 4
When being flushed with the upper edge of wafer-supporting platform 8, at this time measurement sensor 4 issue infrared light by blocked by wafer-supporting platform 8 transit to not by
Wafer-supporting platform 8 blocks, and measurement sensor 4 generates the first signal and is sent to control system, control system receive the first signal it
Afterwards, determined according to the first signal and reference zero from after determining reference zero, the first lifting that measurement sensor 4 moves away from
From.
Measurement sensor 4 continues to move to the direction close to emery wheel 71, when measurement sensor 4 after by wafer-supporting platform 8
When between wafer-supporting platform 8 and emery wheel 71, wafer-supporting platform 8 and emery wheel 71 can not block the infrared light that measurement sensor 4 issues.Work as survey
Quantity sensor 4 moves to when flushing with the lower edge of emery wheel 71, and the infrared light that measurement sensor 4 issues is transitted to by not being blocked
It is blocked by emery wheel 71, measurement sensor 4 generates second signal at this time, and then second signal is sent to control by measurement sensor 4
System.Control system is determined according to second signal and reference zero from determining reference zero after receiving second signal
Later, the second lifting distance that measurement sensor 4 moves.Then the difference for calculating the second lifting distance and the first lifting distance, is obtained
Take the distance between emery wheel 71 and wafer-supporting platform 8.Wherein, in the vertical direction, emery wheel 71, wafer-supporting platform 8 are from top to bottom arranged successively,
Measurement sensor 4, sliding panel 22 are from top to bottom arranged successively.
It should be noted that emery wheel location position system, which is located at, holds piece after determining reference zero, before starting calibration
The side of platform 8, measurement sensor 4 can also rise to the top of 71 side of emery wheel, driving device 1 can drive sliding panel 22 to
Lower movement, in the motion process of sliding panel 22, measurement sensor 4 flushes generation signal with the lower edge of emery wheel 71 first, so
Generation signal is flushed with the upper edge of wafer-supporting platform 8 afterwards, is determined thus according to the signal of reference zero, the generation of measurement sensor 4
The distance between emery wheel 71 and wafer-supporting platform 8.
Technical solution of the present invention after control system receives the starting letter of photoelectric sensor transmission and is determined with reference to zero
Point；The first signal sent when measurement sensor detects wafer-supporting platform upper edge position and measurement sensing are received in control system
It is true according to reference zero, the first signal and the second signal after device detects the second signal sent when the position of emery wheel lower edge
Determine emery wheel at a distance from wafer-supporting platform, may be implemented that easy to use, measurement is accurate and reliable, automatic real-time detection emery wheel and wafer-supporting platform away from
From function, there is very strong safety, and can be improved the cost performance of equipment.
In embodiments of the present invention, as shown in Figures 2 and 3, emery wheel location position system further include:
For fixing the mounting bracket 5 of driving device 1 and carriage 2, driving device 1 is set to the of mounting bracket 5
One end face, carriage 2 are set to the second end face of mounting bracket 5, and first end face is adjacent and vertical with second end face.
Specifically, driving device 1 is fixed in the first end face of mounting bracket 5, carriage 2 is fixed on mounting bracket 5
Second end face on, wherein first end face is adjacent and vertical with second end face, the sliding panel 22 of carriage 2 protrude from installation branch
The second end face of frame 5 is connect with driving device 1.
Driving device 1 includes the mounting base 11 connecting with mounting bracket 5, the shaft coupling 12 being set in mounting base 11, with
The driving motor 13 of one end connection of shaft coupling 12, the bearing block 14 and screw structure 15 being connect with the other end of shaft coupling 12；
Wherein screw structure 15 is connect by bearing block 14 with shaft coupling 12, and driving device 1 is connect with the signal output end of control system.
Specifically, cooperation of the driving device 1 by mounting base 11 and the first end face of mounting bracket 5, is realized and installation branch
The connection of frame 5.Shaft coupling 12 is provided in mounting base 11, wherein the shape of mounting base 11 is a box like structure, box like structure
Opposite first side and second side opening, the third side adjacent and vertical with first side and second side and installation branch
The first end face of frame 5 connects.On the 5th side adjacent and vertical with first side, the 6th side opposite with the 5th side point
Mounting hole is not provided with it.
One end of shaft coupling 12 pass through the 5th side mounting hole after connect with driving motor 13, shaft coupling 12 it is another
It holds and is connect after the mounting hole of the 6th side with bearing block 14.Bearing block 14 is connect with screw structure 15.Wherein driving electricity
The signal input part of machine 13 and the signal output end of control system connect, and control system sends driving signal, and driving motor 13 exists
After receiving driving signal, started running according to driving signal.The operating drive of driving motor 13 is connect with driving motor 13
Shaft coupling 12 rotation, shaft coupling 12 connect by bearing block 14 with screw structure 15, the operating drive lead screw of shaft coupling 12
The movement of structure 15.
Wherein, as shown in Figure 2 and Figure 4, screw structure 15 includes:
The lead screw 151 being connect by bearing block 14 with shaft coupling 12；It is set on lead screw 151, the edge when lead screw 151 rotates
The mother lead screw 152 of lead screw 151 axially to move up and down；And the silk for being set on lead screw 151, being fixedly connected with mother lead screw 152
Thick stick base 153；Wherein the direction of motion of mother lead screw 152 is the extending direction of 8 distance of emery wheel 71 and wafer-supporting platform.
As shown in Fig. 2, Fig. 4 and Fig. 5, when shaft coupling 12 rotates, the lead screw 151 connecting with shaft coupling 12 is rotated, lead screw
151 during rotation, and the mother lead screw 152 being set on lead screw 151 moves up and down along the axial direction of lead screw 151.And lead screw 151
The extending direction of distance is identical between axial direction and emery wheel 71, wafer-supporting platform 8.It moves up and down in mother lead screw 152 along the axial direction of lead screw 151
When, the lead screw base 153 being fixedly connected with mother lead screw 152 moves up and down along the axial direction of lead screw 151.Wherein in the vertical direction,
Mother lead screw 152, lead screw base 153, lead screw 151, bearing block 14, shaft coupling 12, driving motor 13 are from top to bottom arranged successively.
In embodiments of the present invention, as shown in figure 3, carriage 2 further include:
The sliding block 23 being set between sliding panel 22 and sliding rail 21；Wherein sliding panel 22 is connect with lead screw base 153, sliding block
23 move on sliding rail 21, and sliding panel 22 is fixedly connected with sliding block 23.
The sliding block 23 fixed with sliding panel 22 is provided between sliding rail 21 and sliding panel 22, sliding block 23 is sliding on sliding rail 21
It is dynamic, and then to guarantee the relative motion between sliding panel 22 and sliding rail 21.
Wherein as shown in Figures 2 and 3, the lead screw base 153 of sliding panel 22 and screw structure 15 is realized by bolt and is fixed
Connection.When shaft coupling 12 rotates, the lead screw 151 connecting with shaft coupling 12 is rotated, and lead screw 151 during rotation, is set in
Mother lead screw 152 on lead screw 151 moves up and down along the axial direction of lead screw 151.Mother lead screw 152 drives sliding along the movement of lead screw 151
The sliding up and down on sliding rail 21 of plate 22, wherein the extending direction of sliding rail 21 is identical as the axially extending direction of lead screw 151.
Measurement sensor 4 is fixed on sliding panel 22 by fixed plate 6, and wherein fixed plate 6 is fixed on the of sliding panel 22
On one mounting surface, the second mounting surface of sliding panel 22 is connect with lead screw base 153, and the first mounting surface is opposite with the second mounting surface,
And measurement sensor 4 is connect with the signal input part of control system.Sensor baffle 31 is fixed on the third installation of sliding panel 22
On face, third mounting surface is vertical and adjacent with the first mounting surface, the second mounting surface respectively.
Measurement sensor 4 is fixed on the first mounting surface of sliding panel 22 by fixed plate 6, specifically, measurement sensor 4
It is connect with fixed plate 6, fixed plate 6 is connect with sliding panel 22, and one end that wherein fixed plate 6 is connect with measurement sensor 4 forms the
A positioning hole, measurement sensor 4 wear first positioning hole and connect with fixed plate 6.Sliding panel 22 includes plate body and is located on plate body
With the mounting blocks of plate body integrally connected, third location hole is formed on mounting blocks, the other end of fixed plate 6 is formed with the second positioning
Both hole, when fixed plate 6 is connect with sliding panel 22, by the cooperation of bolt and second location hole and third location hole, realize
Connection.Wherein the aperture of second location hole is greater than the aperture of third location hole, and the fine tuning to fixed plate 6 may be implemented.
Photoelectric sensor 3 is fixed in the first end face of sliding rail 21, the second end face opposite with first end face of sliding rail 21 with
Sliding block 23 contacts.And the second installation face contact of sliding block 23 and sliding panel 22.Sensor baffle 31 is fixed on the of sliding panel 22
On three mounting surfaces, wherein third mounting surface is pacified between the first mounting surface and the second mounting surface, and with the first mounting surface, second
Dress face is vertical.Sensor baffle 31 includes the first connecting portion being fixed on the third mounting surface of sliding panel 22, is connect with first
Portion is vertically and the second connecting portion of integrally connected, part first connecting portion are contacted with the third end face of sliding rail 21, second connecting portion
Positioned at the side of the first end face of sliding rail 21, and the first preset distance of first end face interval, the third end face of sliding rail 21 respectively with
First end face, second end face are vertical and adjacent.
Specifically, photoelectric sensor 3 is arranged in the first end face of sliding rail 21, the first connecting portion of sensor baffle 31 is solid
It is scheduled on the third mounting surface of sliding panel 22, part first connecting portion is contacted with the third end face of sliding rail 21, wherein there are also parts
First connecting portion is located between the third mounting surface of sliding panel 22 and the third end face of sliding rail 21.The second of sensor baffle 31 connects
Socket part is located at the side of the first end face of sliding rail 21, cooperates with photoelectric sensor 3.Wherein the quantity of photoelectric sensor 3 can be
One, when sensor baffle 31 covers the light source of photoelectric sensor 3, triggering photoelectric sensor 3 starts.And photoelectric sensor 3
It is connect with the signal input part of control system, when photoelectric sensor 3 triggers, sends enabling signal, control system to control system
System records reference zero according to enabling signal.
The quantity of photoelectric sensor 3 can be two, respectively the first photoelectric sensor and with the first photoelectric sensor position
In the second photoelectric sensor of the second preset distance of on same straight line and interval.
As shown in Fig. 2~Fig. 5, when control system starts and sends driving signal to driving device 1, sensor baffle 31
Between the first photoelectric sensor and the second photoelectric sensor, driving device 1 drives carriage 2 to move downward at this time, is driving
During the dynamic movement of device 1 drives carriage 2 and then sensor baffle 31 is driven to move downward, when sensor baffle 31
When sheltering from the light source of the first photoelectric sensor, the first photoelectric sensor is triggered, the first photoelectric sensor is sent to control system
Enabling signal, control system record reference zero according to enabling signal, and measurement sensor 4 is located under 8 side of wafer-supporting platform at this time
Side.
After this, the sliding panel 22 of 1 continuous running of driving device, driving carriage 2 moves upwards, sensor baffle
31 move between the first photoelectric sensor and the second photoelectric sensor, when measurement sensor 4 is flushed with the upper edge of wafer-supporting platform 8
When, the infrared light that measurement sensor 4 issues at this time is not blocked by wafer-supporting platform 8 by being blocked to transit to by wafer-supporting platform 8, measurement sensor
4 generate the first signal.Since measurement sensor 4 is connect with the signal input part of control system, measurement sensor 4 is by the first signal
It is sent to control system, control system is determined according to the first signal and reference zero from true after receiving the first signal
After determining reference zero, the first lifting distance of the movement of measurement sensor 4.
Measurement sensor 4 continues to move to the direction close to emery wheel 71, when measurement sensor 4 after by wafer-supporting platform 8
When between wafer-supporting platform 8 and emery wheel 71, wafer-supporting platform 8 and emery wheel 71 can not block the infrared light that measurement sensor 4 issues.Work as survey
When the lower edge that quantity sensor 4 moves to emery wheel 71 flushes, measurement sensor 4 issue infrared light by be not blocked transit to by
Emery wheel 71 blocks, and measurement sensor 4 generates second signal at this time, and then second signal is sent to control system by measurement sensor 4
System.Control system after receiving second signal, according to second signal and reference zero determine from determine reference zero it
Afterwards, the second lifting distance that measurement sensor 4 moves.Then control system calculate the second lifting distance and the first lifting distance it
Difference obtains the distance between emery wheel 71 and wafer-supporting platform 8.Control system sends stop signal, driving device to driving device 1 later
1 stop motion.It should be noted that when measurement sensor 4 moves between wafer-supporting platform 8 and emery wheel 71, sensor baffle 31
It is moved between the first photoelectric sensor and the second photoelectric sensor.
The embodiment of the present invention one starts driving device by control system, drives sliding dress using the operating of driving device
The sliding set, during carriage sliding, when the photoelectric sensor on carriage sliding rail is by the sensing on sliding panel
When device baffle blocks, control system receives the enabling signal that photoelectric sensor is sent and determines reference zero；It is connect in control system
It receives measurement sensor and detects that the first signal sent when the position of wafer-supporting platform upper edge and measurement sensor detect under emery wheel
After the second signal sent when edge placement, emery wheel and wafer-supporting platform are determined according to reference zero, the first signal and the second signal
Distance, may be implemented that easy to use, measurement is accurate and reliable, automatic, purpose of the real-time detection emery wheel at a distance from wafer-supporting platform, tool
There is very strong safety, and can be improved the cost performance of equipment.
Embodiment two
Second embodiment of the present invention provides a kind of method using emery wheel location position system calibration emery wheel, wherein emery wheel positions
Calibration system, comprising: driving device；The carriage for connecting with driving device, and moving under the drive of the drive is sliding
Dynamic device includes sliding rail and the sliding panel moved on the slide rail；Fixed photoelectric sensor on the slide rail；It is set on sliding panel,
And under the drive of the drive with the sensor baffle and measurement sensor of sliding panel movement；And with driving device, photoelectricity
The control system that sensor is connected with measurement sensor.Wherein as shown in fig. 6, the method for calibration emery wheel includes:
Step 601, control system send driving signal to driving device, start driving device, are driven by driving device
The movement for the carriage being connect with driving device.
Firstly, control system sends driving signal to driving device, driving device starts after receiving driving signal
Operating, the operating of driving device drive the movement for the carriage connecting with driving device.Wherein driving device and carriage
It is respectively positioned in mounting bracket, the sliding rail of carriage is fixed on the mounting bracket, and the sliding panel and driving device of carriage connect
It connects, under the drive of the drive, sliding panel is moved along sliding rail, wherein between the extending direction and emery wheel and wafer-supporting platform of sliding rail
It is identical apart from extending direction.
Wherein, driving device includes: the mounting base connecting with mounting bracket, the shaft coupling being set in mounting base, with connection
The driving motor of one end connection of axis device, the bearing block and screw structure being connect with the other end of shaft coupling；Wherein screw structure
It is connect by bearing block with shaft coupling, driving motor is connect with control system.Control system sends driving signal, and driving motor exists
Driving signal is received to be operated later.The operating of driving motor drives the rotation for the shaft coupling connecting with driving motor, connection
Axis device is connect by bearing block with screw structure, and the operating of shaft coupling drives the movement of screw structure.
Screw structure includes: the lead screw being connect by bearing block with shaft coupling；It is set on lead screw, the edge in lead screw rotation
The mother lead screw of lead screw axially to move up and down；And the lead screw base for being set on lead screw, being fixedly connected with mother lead screw；Wherein silk
The direction of motion of thick stick mother is the extending direction of emery wheel and wafer-supporting platform distance.In shaft coupling rotation, the lead screw that is connect with shaft coupling
Rotation, during rotation, the mother lead screw being set on lead screw moves up and down lead screw along the axial direction of lead screw.And the axial direction of lead screw and
The extending direction of distance is identical between emery wheel, wafer-supporting platform.In axial up and down motion of the mother lead screw along lead screw, fixed with mother lead screw
Lead screw base along lead screw axial direction move up and down.The sliding panel connecting simultaneously with lead screw base moves on the slide rail, sliding rail
Extending direction is identical as the axial direction of lead screw.
Step 602, during the sliding panel of carriage slides on the slide rail, when photoelectric sensor is because by sensor
When baffle blocks, control system receives the enabling signal that photoelectric sensor is sent and determines reference zero and measurement to be received is waited to sense
The signal that device is sent.
During the sliding of the sliding panel of carriage, the photoelectric sensor on sliding rail remains static, and is located at and slides
Sensor baffle on movable plate is moved with the movement of sliding panel, and wherein sensor baffle is matched with optical sensor, in sensor
When baffle moves to suitable position and shelters from the light source of photoelectric sensor, triggering photoelectric sensor starting.
When sensor baffle shelters from the light source of photoelectric sensor during the motion, photoelectric sensor triggering, to control
System processed sends enabling signal, and control system determines reference zero according to enabling signal is received.After determining reference zero,
The signal sent etc. measurement sensor to be received.
Wherein, when sensor baffle shelters from the light source of photoelectric sensor, measurement sensor is located at wafer-supporting platform side
Lower section.After control system determines reference zero, driving device operating, driving device drives sliding panel upward along sliding rail at this time
Movement.
It should be noted that sheltering from the light source of photoelectric sensor in sensor baffle, control system determines reference zero
Later, when measurement sensor rises to the top of emery wheel side, the sliding panel of driving device driving at this time is moved downward along sliding rail,
Measurement sensor first it is detected that emery wheel lower edge, detect the upper edge of wafer-supporting platform, and then then to determine emery wheel and hold
The distance between piece platform.When light source in various embodiments of the present invention to shelter from photoelectric sensor in sensor baffle, measurement is passed
Sensor, which is located at below wafer-supporting platform side, to be illustrated.
Step 603, reception measurement sensor detect the first signal sent when the position of wafer-supporting platform upper edge, according to reference
Zero point and the first signal determine the first lifting distance of measurement sensor；And it receives measurement sensor and detects that emery wheel is following
The second signal sent when along position determines the second lifting distance of measurement sensor according to reference zero and second signal.
During sliding panel continues movement, when measurement sensor detects wafer-supporting platform upper edge position, that is, measure
When sensor is flushed with the upper edge of wafer-supporting platform, the infrared light that measurement sensor issues at this time is transitted to not by being blocked by wafer-supporting platform
Blocked by wafer-supporting platform, measurement sensor generates the first signal and is sent to control system, control system receive the first signal it
Afterwards, determined according to the first signal and reference zero from after determining reference zero, the first lifting of measurement sensor movement away from
From.
Measurement sensor continues to move to the direction close to emery wheel, when measurement sensor is located at after by wafer-supporting platform
When between wafer-supporting platform and emery wheel, wafer-supporting platform and emery wheel can not block the infrared light that measurement sensor issues.When measurement sensor is transported
It moving when being flushed with the lower edge of emery wheel, the infrared light that measurement sensor issues is blocked by not being blocked to transit to by emery wheel, this
When measurement sensor generate second signal, then second signal is sent to control system by measurement sensor.Control system is connecing
It after receiving second signal, is determined according to second signal and reference zero from after determining reference zero, measurement sensor fortune
The second dynamic lifting distance.
Step 604 obtains at a distance from emery wheel and wafer-supporting platform according to the difference of the second lifting distance and the first lifting distance.
After obtaining the first lifting distance and the second lifting distance, according to the second lifting distance and the first lifting distance it
Between difference, to obtain the distance between emery wheel and wafer-supporting platform.
The embodiment of the present invention two starts driving device by control system, drives sliding dress using the operating of driving device
The sliding set, during carriage sliding, when the photoelectric sensor on carriage sliding rail is by the sensing on sliding panel
When device baffle blocks, control system receives the enabling signal that photoelectric sensor is sent and determines reference zero；It is connect in control system
It receives measurement sensor and detects that the first signal sent when the position of wafer-supporting platform upper edge and measurement sensor detect under emery wheel
After the second signal sent when edge placement, emery wheel and wafer-supporting platform are determined according to reference zero, the first signal and the second signal
Distance, may be implemented that easy to use, measurement is accurate and reliable, automatic, purpose of the real-time detection emery wheel at a distance from wafer-supporting platform, tool
There is very strong safety, and can be improved the cost performance of equipment.
Above-described is the preferred embodiment of the present invention, it should be pointed out that the ordinary person of the art is come
It says, can also make several improvements and retouch under the premise of not departing from principle of the present invention, these improvements and modifications also exist
In protection scope of the present invention.
Claims (11)
1. a kind of emery wheel location position system characterized by comprising
Driving device；
It is connect with the driving device, and the carriage moved under the driving of the driving device, the carriage
Including sliding rail and the sliding panel moved on the sliding rail；
The photoelectric sensor being fixed on the sliding rail, the photoelectric sensor are fixed in the first end face of the sliding rail, and
The sliding rail second end face opposite with the first end face is towards the sliding panel；
Be set on the sliding panel, and under the driving of the driving device with the sliding panel movement sensor baffle and
Measurement sensor；And
The control system being connect with the driving device, the photoelectric sensor and the measurement sensor；
Wherein, when the photoelectric sensor is blocked by the sensor baffle, the control system receives the photoelectric sensing
The enabling signal that device is sent determines reference zero, the sent when receiving the measurement sensor and detecting wafer-supporting platform upper edge
After one signal, the measurement sensor detect the second signal sent when emery wheel lower edge, according to the reference zero, described
First signal and the second signal determine the distance between the emery wheel and the wafer-supporting platform.
2. emery wheel location position system according to claim 1, which is characterized in that the emery wheel location position system also wraps
It includes:
For fixing the mounting bracket of the driving device and the carriage, the driving device is set to the installation branch
The first end face of frame, the carriage are set to the second end face of the mounting bracket, the first end face and described second
End face is adjacent and vertical.
3. emery wheel location position system according to claim 2, which is characterized in that the driving device includes and the peace
Fill the mounting base of bracket connection, the shaft coupling being set in the mounting base, the driving electricity connecting with one end of the shaft coupling
Machine, the bearing block and screw structure being connect with the other end of the shaft coupling；
Wherein the screw structure is connect by the bearing block with the shaft coupling, the driving device and the control system
Signal output end connection.
4. emery wheel location position system according to claim 3, which is characterized in that the screw structure includes:
The lead screw being connect by the bearing block with the shaft coupling；
Be set on the lead screw, the lead screw rotation when along the lead screw the mother lead screw axially to move up and down；And
The lead screw base be set on the lead screw, being fixedly connected with the mother lead screw；
Wherein the direction of motion of the mother lead screw is the extending direction of the emery wheel and the wafer-supporting platform distance.
5. emery wheel location position system according to claim 4, which is characterized in that the carriage further include:
The sliding block being set between the sliding panel and the sliding rail；
Wherein the sliding panel is connect with the lead screw base, and the sliding block moves on the sliding rail, the sliding panel and institute
Sliding block is stated to be fixedly connected.
6. emery wheel location position system according to claim 5, which is characterized in that the measurement sensor passes through fixed plate
It is fixed on the sliding panel, wherein the fixed plate is fixed on the first mounting surface of the sliding panel, the sliding panel
Second mounting surface is connect with the lead screw base, and first mounting surface is opposite with second mounting surface, and the measurement passes
Sensor is connect with the signal input part of the control system.
7. emery wheel location position system according to claim 6, which is characterized in that the sensor baffle is fixed on described
On the third mounting surface of sliding panel, the third mounting surface it is vertical with first mounting surface, second mounting surface respectively and
It is adjacent.
8. emery wheel location position system according to claim 7, which is characterized in that the second end face of the sliding rail with
The shoe contact, and the photoelectric sensor is connect with the signal input part of the control system.
9. emery wheel location position system according to claim 8, which is characterized in that the sensor baffle includes being fixed on
First connecting portion on the third mounting surface of the sliding panel, vertical with the first connecting portion and integrally connected second connects
Socket part, the part first connecting portion are contacted with the third end face of the sliding rail, and the second connecting portion is located at the sliding rail
The side of first end face, and first preset distance of first end face interval, the third end face of the sliding rail is respectively with described
One end face, the second end face are vertical and adjacent.
10. emery wheel location position system according to claim 9, which is characterized in that the quantity of the photoelectric sensor is
It two, respectively the first photoelectric sensor and is located along the same line with first photoelectric sensor and is spaced the second pre- spacing
From the second photoelectric sensor.
11. a kind of method using emery wheel location position system as described in claim 1 calibration emery wheel, which is characterized in that institute
The method of stating includes:
Control system sends driving signal to driving device, starts the driving device, is driven by the driving device and institute
State the movement of the carriage of driving device connection；
During the sliding panel of the carriage slides on the slide rail, when photoelectric sensor by sensor baffle because being blocked
When, the control system receives the enabling signal that the photoelectric sensor is sent and determines reference zero and measurement to be received is waited to sense
The signal that device is sent；
It receives the measurement sensor and detects the first signal sent when the position of wafer-supporting platform upper edge, according to reference zero and
One signal determines the first lifting distance of the measurement sensor；And it receives the measurement sensor and detects that emery wheel is following
The second signal sent when along position, according to reference zero and second signal determine the measurement sensor second lifting away from
From；
According to the difference of second lifting distance and first lifting distance obtain the emery wheel and the wafer-supporting platform away from
From.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611146599.5A CN106737195B (en) | 2016-12-13 | 2016-12-13 | A kind of emery wheel location position system and method |
| PCT/CN2017/116017 WO2018108112A1 (en) | 2016-12-13 | 2017-12-13 | Grinding wheel positioning system and method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611146599.5A CN106737195B (en) | 2016-12-13 | 2016-12-13 | A kind of emery wheel location position system and method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106737195A CN106737195A (en) | 2017-05-31 |
| CN106737195B true CN106737195B (en) | 2019-07-09 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201611146599.5A Active CN106737195B (en) | 2016-12-13 | 2016-12-13 | A kind of emery wheel location position system and method |
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| CN (1) | CN106737195B (en) |
| WO (1) | WO2018108112A1 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106737195B (en) * | 2016-12-13 | 2019-07-09 | 北京中电科电子装备有限公司 | A kind of emery wheel location position system and method |
| CN108188900B (en) * | 2018-02-08 | 2021-07-20 | 张玲 | Waste steel plate grinding device |
| CN108687668B (en) * | 2018-05-22 | 2024-02-13 | 深圳先进技术研究院 | High-precision polishing device and high-precision polishing robot |
| CN108942645B (en) * | 2018-06-28 | 2024-02-20 | 厦门达科塔机械有限公司 | Grinding head device capable of accurately controlling sensing quantity |
| CN109227366A (en) * | 2018-11-17 | 2019-01-18 | 焦作大学 | A kind of camshaft sharp edge falls blunt operation bistrique intelligent positioner |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4270276A (en) * | 1979-10-17 | 1981-06-02 | Skura Martin C | Metal working tool |
| CN101750023A (en) * | 2009-12-11 | 2010-06-23 | 深圳职业技术学院 | Non-contact thickness measuring device |
| CN102765015A (en) * | 2012-08-07 | 2012-11-07 | 苏州施莱医疗器械有限公司 | Mechanism for compensating grinding wheel wear automatically |
| CN202885781U (en) * | 2012-11-01 | 2013-04-17 | 上海市质量监督检验技术研究院 | Non-contact type height measuring device for surrounding edge of mattress |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10138135A (en) * | 1996-11-11 | 1998-05-26 | M Tex Matsumura Kk | Grinding machine |
| JP2000225561A (en) * | 1999-02-05 | 2000-08-15 | Okamoto Machine Tool Works Ltd | Grinding wheel starting point positioning mechanism in wafer grinding device |
| CN202748002U (en) * | 2012-09-12 | 2013-02-20 | 上海埃蒙特自动化系统有限公司 | Position detection system |
| CN104625963B (en) * | 2015-02-02 | 2015-11-18 | 佛山市新鹏机器人技术有限公司 | The caliberating device that a kind of robot polishing grinding system program is multiplexing and method |
| CN204431053U (en) * | 2015-02-02 | 2015-07-01 | 佛山市新鹏机器人技术有限公司 | The caliberating device that a kind of robot polishing grinding system program is multiplexing |
| CN106737195B (en) * | 2016-12-13 | 2019-07-09 | 北京中电科电子装备有限公司 | A kind of emery wheel location position system and method |
-
2016
- 2016-12-13 CN CN201611146599.5A patent/CN106737195B/en active Active
-
2017
- 2017-12-13 WO PCT/CN2017/116017 patent/WO2018108112A1/en active Application Filing
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4270276A (en) * | 1979-10-17 | 1981-06-02 | Skura Martin C | Metal working tool |
| CN101750023A (en) * | 2009-12-11 | 2010-06-23 | 深圳职业技术学院 | Non-contact thickness measuring device |
| CN102765015A (en) * | 2012-08-07 | 2012-11-07 | 苏州施莱医疗器械有限公司 | Mechanism for compensating grinding wheel wear automatically |
| CN202885781U (en) * | 2012-11-01 | 2013-04-17 | 上海市质量监督检验技术研究院 | Non-contact type height measuring device for surrounding edge of mattress |
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| Publication number | Publication date |
|---|---|
| WO2018108112A1 (en) | 2018-06-21 |
| CN106737195A (en) | 2017-05-31 |
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