CN106735917A - A kind of method that high-rate laser etches sapphire eyeglass - Google Patents

A kind of method that high-rate laser etches sapphire eyeglass Download PDF

Info

Publication number
CN106735917A
CN106735917A CN201611103747.5A CN201611103747A CN106735917A CN 106735917 A CN106735917 A CN 106735917A CN 201611103747 A CN201611103747 A CN 201611103747A CN 106735917 A CN106735917 A CN 106735917A
Authority
CN
China
Prior art keywords
sapphire
eyeglass
fixture
processing
sheet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201611103747.5A
Other languages
Chinese (zh)
Inventor
杜彦召
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GUANGDONG SAIFEI SAPPHIRE TECHNOLOGY Co Ltd
Original Assignee
GUANGDONG SAIFEI SAPPHIRE TECHNOLOGY Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GUANGDONG SAIFEI SAPPHIRE TECHNOLOGY Co Ltd filed Critical GUANGDONG SAIFEI SAPPHIRE TECHNOLOGY Co Ltd
Priority to CN201611103747.5A priority Critical patent/CN106735917A/en
Publication of CN106735917A publication Critical patent/CN106735917A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/12Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure
    • B23K26/123Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure in an atmosphere of particular gases
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/12Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure
    • B23K26/126Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure in an atmosphere of gases chemically reacting with the workpiece
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/361Removing material for deburring or mechanical trimming
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/50Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Laser Beam Processing (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

A kind of method that the present invention etches sapphire eyeglass for high-rate laser, when being cut to sapphire sheet, can be passed through auxiliary gas SF6, sapphire main component is Al2O3, high temperature is produced when picosecond laser cuts to sapphire sheet, now SF6In fluorine ion can be reacted with aluminium ion because a SF6Contain 6 fluorine ions in molecule, therefore can be reacted with 6 aluminium ions, therefore use SF6Consumption can be reduced as the more existing frequently-used nitrogen of auxiliary gas, and the reproducibility of fluorine is stronger than the reproducibility of nitrogen, therefore the speed that fluorine ion reacts with aluminium ion is faster, therefore use SF6Cutting speed can be accelerated, and while cutting speed is accelerated the burr of sapphire lens periphery can be avoided to produce.

Description

A kind of method that high-rate laser etches sapphire eyeglass
Technical field
Sapphire eyeglass is etched the present invention relates to sapphire machining eyeglass technical field, more particularly to a kind of high-rate laser Method.
Background technology
Sapphire material has very special characteristic:It is extremely corrosion-resistant, extremely hard, there is high transmission rate etc. to visible ray, because This is widely used on chemical industry and optics.Growing demand has been inverted and the sapphire of low cost has been supplied Demand, meanwhile, the sapphire of low cost also promotes new application field and gradually rises, as the camera of smart mobile phone is protected Mirror, mobile phone faceplate etc., but sapphire hardness makes to be machined with certain difficulty to sapphire.The indigo plant that mobile lens are used is precious Stone lens dimension is smaller, is typically to carry out cutting on big sapphire sheet material in the process for producing sapphire eyeglass to be polished into conjunction The sapphire eyeglass of lattice, is to use picosecond laser cutter compared with widespread practice now.
Psec cutter when being cut to sapphire, the high temperature that its laser for sending brings make sapphire melt so as to The effect of cutting is realized, but the still jagged application being unfavorable for below in sapphire edge is installed and cut in cutting process Efficiency is not high enough.
The content of the invention
Periphery is jagged and inefficient when the purpose of the present invention is directed to existing psec cutter cuts sapphire asks Topic, there is provided a kind of method that high-rate laser etches sapphire eyeglass.
A kind of method that high-rate laser etches sapphire eyeglass, comprises the following steps:
1)The sapphire sheet of polishing both surfaces is fixed on fixture, fixture is installed on the workbench of picosecond laser;
2)Fixture is delivered to processing and is positioned by loading and unloading system, is now passed through auxiliary gas SF6, the processing head at processing is to blue precious Flag is cut, control system control processing head cutting track;
3)Fixture after loading and unloading system will cut delivers to purged and packed, and sapphire eyeglass and the clout in fixture are separated.
Wherein in one embodiment, the step 1)Middle sapphire sheet is circular or rectangle, the work(of picosecond laser Rate is 60-85W.
Wherein in one embodiment, the step 2)Positioned to sapphire sheet locating segmentation position at middle processing, in indigo plant Sapphire eyeglass is cut out on jewel piece, the sapphire eyeglass is uniformly distributed arrangement in sapphire sheet.
Wherein in one embodiment, the step 2)Middle processing head is single head or double end, the processing of the processing head Track is along the shape of sapphire eyeglass and arrangement successively interruption cutting.
Wherein in one embodiment, the step 2)Middle SF6Intake velocity be 200-300sccm, the psec swash Light device switch time delay 100-150us, redirects time delay 150-250us.
Using above-mentioned technical proposal when being cut to sapphire sheet, auxiliary gas SF can be passed through6, it is sapphire main Composition is Al2O3, high temperature is produced when picosecond laser cuts to sapphire sheet, now SF6In fluorine ion meeting and aluminium ion React, because a SF6Contain 6 fluorine ions in molecule, therefore can be reacted with 6 aluminium ions, therefore use SF6Consumption can be reduced as the more existing frequently-used nitrogen of auxiliary gas, and the reproducibility of fluorine is stronger than the reproducibility of nitrogen, therefore fluorine The speed that ion reacts with aluminium ion faster, therefore uses SF6Cutting speed can be accelerated, and accelerating cutting speed While the burr of sapphire lens periphery can be avoided to produce.
Specific embodiment
With reference to implementation method, the present invention is further detailed explanation.
A kind of method that high-rate laser etches sapphire eyeglass, comprises the following steps:
1)The sapphire sheet of polishing both surfaces is fixed on fixture, fixture is installed on the workbench of picosecond laser;2)Folder Tool is delivered to processing and is positioned by loading and unloading system, is now passed through auxiliary gas SF6, the processing head at processing carries out to sapphire sheet Cutting, control system control processing head cutting track;3)Fixture after loading and unloading system will cut delivers to purged and packed, will press from both sides Sapphire eyeglass and clout in tool are separated.The sapphire sheet of polishing both surfaces is fixed on fixture and is cut, excision forming Two sides need not process again afterwards, can directly pack shipment.Sapphire eyeglass and clout after the completion of cutting also on fixture, Therefore need to separate sapphire eyeglass and the clout on fixture.Also include vacuum absorption device on loading and unloading system, can not only Enough stationary fixtures simultaneously can be in clean cut operation process residue and dust.
Picosecond laser laser is precious depending on cutting into sapphire eyeglass on piece in indigo plant according to setting track, and laser is in sapphire sheet Upper generation high temperature needs to be passed through auxiliary gas, actually aids in gas to be chemically reacted with sapphire, so as to realize cutting Effect, therefore the influence of the selection to the smooth of the edge and cutting speed of the sapphire eyeglass after the completion of cutting of auxiliary gas is non- Chang great, the conventional auxiliary gas of prior art is nitrogen, nitrogen under the high temperature action with sapphire in Al2O3Generation chemistry is anti- Should, because sapphire lens dimension is smaller, therefore use N2Sapphire lens periphery still hairiness during as auxiliary gas reaction Thorn, is unfavorable for installation of the sapphire eyeglass later stage again on finished product.Now use SF6Occur as assisted reaction gas and sapphire anti- Should, because the SF of a molecule6In contain 6 fluorine ions, and the oxidisability of fluorine is better than nitrogen, therefore SF6With Al2O3Reaction speed Degree is than N2With Al2O3Reaction speed it is fast, and SF6Amount ratio N2Consumption it is many less.
Wherein in one embodiment, the step 1)Middle sapphire sheet is circular or rectangle, the work(of picosecond laser Rate is 60-85W.Sapphire sheet after treatment can be circular or this kind of regular shape of rectangle, on the one hand facilitate the throwing of early stage Light operation, cutting of the another aspect sapphire eyeglass in sapphire sheet can conveniently be laid out, and can facilitate the processing of processing head The setting of positioning and cutting track.
Wherein in one embodiment, the step 2)Positioned to sapphire sheet locating segmentation position at middle processing, in indigo plant Sapphire eyeglass is cut out on jewel piece, the sapphire eyeglass is uniformly distributed arrangement in sapphire sheet.Sapphire eyeglass exists It is evenly distributed beneficial to the setting that cutting track is processed at processing in sapphire sheet.
Wherein in one embodiment, the step 2)Middle processing head is single head or double end, the processing of the processing head Track is along the shape of sapphire eyeglass and arrangement successively interruption cutting.Processing head be able to can also be used double using single head Head, cutting speed can be then accelerated using double end, then facilitate the setting of psec cutter to operate using single head.
Wherein in one embodiment, the step 2)Middle SF6Intake velocity be 200-300sccm, the psec swash Light device switch time delay 100-150us, redirects time delay 150-250us.
Embodiment 1
1)The circular sapphire piece of polishing both surfaces is fixed on fixture, fixture is installed on the workbench of picosecond laser, The power of picosecond laser is 60W;2)Fixture is delivered to processing and is positioned by loading and unloading system, is now passed through auxiliary gas SF6, SF6 Intake velocity be 200sccm, the single head processing head at processing cuts to sapphire sheet, and control system control processing head is cut Track is cut, picosecond laser switch time delay 100us redirects time delay 150us;3)Fixture after loading and unloading system will cut is delivered to Purged and packed, sapphire eyeglass and the clout in fixture are separated.
Embodiment 2
1)The rectangle sapphire sheet of polishing both surfaces is fixed on fixture, fixture is installed on the workbench of picosecond laser, The power of picosecond laser is 85W;2)Fixture is delivered to processing and is positioned by loading and unloading system, is now passed through auxiliary gas SF6, SF6 Intake velocity be 300sccm, the single head processing head at processing cuts to sapphire sheet, and control system control processing head is cut Track is cut, picosecond laser switch time delay 150us redirects time delay 250us;3)Fixture after loading and unloading system will cut is delivered to Purged and packed, sapphire eyeglass and the clout in fixture are separated.
Embodiment 3
1)The rectangle sapphire sheet of polishing both surfaces is fixed on fixture, fixture is installed on the workbench of picosecond laser, The power of picosecond laser is 70W;2)Fixture is delivered to processing and is positioned by loading and unloading system, is now passed through auxiliary gas SF6, SF6 Intake velocity be 250sccm, the double end processing head at processing cuts to sapphire sheet, and control system control processing head is cut Track is cut, picosecond laser switch time delay 125us redirects time delay 200us;3)Fixture after loading and unloading system will cut is delivered to Purged and packed, sapphire eyeglass and the clout in fixture are separated.
Specific embodiment of the invention is the foregoing is only, but architectural feature of the invention is not limited to this, any this area In the field of the invention, the change or modification made are encompassed by the scope of the claims of the invention technical staff.

Claims (5)

1. a kind of method that high-rate laser etches sapphire eyeglass, it is characterised in that comprise the following steps:
1)The sapphire sheet of polishing both surfaces is fixed on fixture, fixture is installed on the workbench of picosecond laser;
2)Fixture is delivered to processing and is positioned by loading and unloading system, is now passed through auxiliary gas SF6, the processing head at processing is to blue precious Flag is cut, control system control processing head cutting track;
3)Fixture after loading and unloading system will cut delivers to purged and packed, and sapphire eyeglass and the clout in fixture are separated.
2. a kind of method that high-rate laser etches sapphire eyeglass according to claim 1, it is characterised in that:The step 1)Middle sapphire sheet is circular or rectangle, and the power of picosecond laser is 60-85W.
3. a kind of method that high-rate laser etches sapphire eyeglass according to claim 1, it is characterised in that:The step 2)Positioning cuts out sapphire eyeglass, the sapphire to sapphire sheet locating segmentation position in sapphire sheet at middle processing Eyeglass is uniformly distributed arrangement in sapphire sheet.
4. a kind of method that high-rate laser etches sapphire eyeglass according to claim 1, it is characterised in that:The step 2)Middle processing head is single head or double end, the machining locus of the processing head be along the shape of sapphire eyeglass and arrangement successively Interruption cutting.
5. a kind of method that high-rate laser etches sapphire eyeglass according to claim 1, it is characterised in that:The step 2)Middle SF6Intake velocity be 200-300sccm, the picosecond laser switch time delay 100-150us, redirect time delay 150- 250us。
CN201611103747.5A 2016-12-05 2016-12-05 A kind of method that high-rate laser etches sapphire eyeglass Pending CN106735917A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201611103747.5A CN106735917A (en) 2016-12-05 2016-12-05 A kind of method that high-rate laser etches sapphire eyeglass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201611103747.5A CN106735917A (en) 2016-12-05 2016-12-05 A kind of method that high-rate laser etches sapphire eyeglass

Publications (1)

Publication Number Publication Date
CN106735917A true CN106735917A (en) 2017-05-31

Family

ID=58874018

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201611103747.5A Pending CN106735917A (en) 2016-12-05 2016-12-05 A kind of method that high-rate laser etches sapphire eyeglass

Country Status (1)

Country Link
CN (1) CN106735917A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107570876A (en) * 2017-10-16 2018-01-12 江南大学 A kind of processing method of induced with laser KOH chemical reactions etching and cutting sapphire

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5270498A (en) * 1975-12-09 1977-06-11 Mitsubishi Electric Corp Method for digging micro pore in silicon crystal plate
US20060249480A1 (en) * 2003-03-04 2006-11-09 Adrian Boyle Laser machining using an active assist gas
CN101983825A (en) * 2010-10-09 2011-03-09 苏州德龙激光有限公司 Picosecond laser scribing device for light emitting diode (LED) wafer
CN104148815A (en) * 2014-07-29 2014-11-19 蓝思科技股份有限公司 Sapphire/ceramic lens laser-cutting method
CN104384728A (en) * 2014-11-18 2015-03-04 蓝思科技股份有限公司 Process and fixture for laser machining of sapphire panel

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5270498A (en) * 1975-12-09 1977-06-11 Mitsubishi Electric Corp Method for digging micro pore in silicon crystal plate
US20060249480A1 (en) * 2003-03-04 2006-11-09 Adrian Boyle Laser machining using an active assist gas
CN101983825A (en) * 2010-10-09 2011-03-09 苏州德龙激光有限公司 Picosecond laser scribing device for light emitting diode (LED) wafer
CN104148815A (en) * 2014-07-29 2014-11-19 蓝思科技股份有限公司 Sapphire/ceramic lens laser-cutting method
CN104384728A (en) * 2014-11-18 2015-03-04 蓝思科技股份有限公司 Process and fixture for laser machining of sapphire panel

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107570876A (en) * 2017-10-16 2018-01-12 江南大学 A kind of processing method of induced with laser KOH chemical reactions etching and cutting sapphire

Similar Documents

Publication Publication Date Title
CN100348391C (en) Great diameter SiC monocrystal cutting method
CN105922083B (en) The surface polishing method of potassium dihydrogen phosphate crystalloid
AU2003211763A1 (en) Method for dicing substrate
CN102632555A (en) Cutting method of crystal blank
CN105382951A (en) Sapphire curved surface multi-line cutting method and device thereof
CN106735917A (en) A kind of method that high-rate laser etches sapphire eyeglass
CN104772830A (en) Cutting method
CN106098624A (en) A kind of method for cutting wafer
CN112935528B (en) Method and device for high-quality cutting of wafer with larger thickness
CN108214954A (en) A kind of cutting method of chip wafer
CN205343490U (en) Many line cutting device of curved surface of sapphire
CN106392785B (en) A kind of sharpening method for cutting the blade of GaAs base LED chips
CN102837369B (en) Process method for green laser scribing sapphire
CN113380702B (en) Cutting method and control system for indium phosphide wafer
CN102990229B (en) LED wafer cutting method
CN206703806U (en) Engraver tool
CN115274424A (en) Semiconductor wafer cutting process
EP3085487B1 (en) Brittle object cutting apparatus and cutting method thereof
WO2016155119A1 (en) Sapphire and processing method therefor
CN107150169A (en) A kind of impulse- free robustness cutting method of aluminium alloy
JP2006114687A (en) Cutting method of crystal wafer and axis control method of dual dicer
JP5334471B2 (en) Glass substrate processing method
CN205272363U (en) Intelligent wafer cutting off machine
JP2009016778A (en) Method for cutting light-emitting diode chip
CN203440240U (en) Round hole cutting system of panel workpiece

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication

Application publication date: 20170531

RJ01 Rejection of invention patent application after publication