CN106723871A - A kind of fingernail polish bar and preparation method thereof - Google Patents
A kind of fingernail polish bar and preparation method thereof Download PDFInfo
- Publication number
- CN106723871A CN106723871A CN201611190796.7A CN201611190796A CN106723871A CN 106723871 A CN106723871 A CN 106723871A CN 201611190796 A CN201611190796 A CN 201611190796A CN 106723871 A CN106723871 A CN 106723871A
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- substrate
- polishing
- chromium film
- nail
- tooth
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- 210000004905 finger nail Anatomy 0.000 title claims abstract description 61
- 238000002360 preparation method Methods 0.000 title claims abstract description 28
- 239000000758 substrate Substances 0.000 claims abstract description 250
- 238000005498 polishing Methods 0.000 claims abstract description 236
- 238000009826 distribution Methods 0.000 claims abstract description 18
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 240
- 229910052804 chromium Inorganic materials 0.000 claims description 181
- 239000011651 chromium Substances 0.000 claims description 181
- 239000011521 glass Substances 0.000 claims description 171
- 229920002120 photoresistant polymer Polymers 0.000 claims description 106
- 239000002131 composite material Substances 0.000 claims description 99
- 238000005530 etching Methods 0.000 claims description 90
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 claims description 60
- 239000002253 acid Substances 0.000 claims description 30
- XMPZTFVPEKAKFH-UHFFFAOYSA-P ceric ammonium nitrate Chemical compound [NH4+].[NH4+].[Ce+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O XMPZTFVPEKAKFH-UHFFFAOYSA-P 0.000 claims description 30
- 239000000463 material Substances 0.000 claims description 19
- 238000012545 processing Methods 0.000 claims description 18
- 238000011161 development Methods 0.000 claims description 15
- 230000003628 erosive effect Effects 0.000 claims description 15
- 239000007788 liquid Substances 0.000 claims description 15
- 238000004528 spin coating Methods 0.000 claims description 15
- 238000004544 sputter deposition Methods 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 9
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 210000000282 nail Anatomy 0.000 abstract description 189
- 230000000694 effects Effects 0.000 abstract description 21
- 230000003796 beauty Effects 0.000 abstract description 4
- 239000002932 luster Substances 0.000 abstract description 3
- 231100001261 hazardous Toxicity 0.000 abstract description 2
- 238000005520 cutting process Methods 0.000 description 20
- 238000004140 cleaning Methods 0.000 description 15
- 238000007688 edging Methods 0.000 description 14
- 238000007747 plating Methods 0.000 description 14
- 230000000717 retained effect Effects 0.000 description 14
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 12
- 239000000908 ammonium hydroxide Substances 0.000 description 12
- 150000001875 compounds Chemical class 0.000 description 12
- 239000012467 final product Substances 0.000 description 12
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 10
- 230000006378 damage Effects 0.000 description 9
- 239000000126 substance Substances 0.000 description 8
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- 231100000481 chemical toxicant Toxicity 0.000 description 4
- 230000036541 health Effects 0.000 description 4
- 231100000784 hepatotoxin Toxicity 0.000 description 4
- 230000007774 longterm Effects 0.000 description 4
- 239000003440 toxic substance Substances 0.000 description 4
- 230000000007 visual effect Effects 0.000 description 4
- 208000027418 Wounds and injury Diseases 0.000 description 3
- 230000001154 acute effect Effects 0.000 description 3
- 208000015181 infectious disease Diseases 0.000 description 3
- 208000014674 injury Diseases 0.000 description 3
- 238000007517 polishing process Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 210000004204 blood vessel Anatomy 0.000 description 2
- 210000002808 connective tissue Anatomy 0.000 description 2
- 210000004185 liver Anatomy 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- 210000005036 nerve Anatomy 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N o-dicarboxybenzene Natural products OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- -1 phthalic acid ester Chemical class 0.000 description 2
- 231100000614 poison Toxicity 0.000 description 2
- 230000007096 poisonous effect Effects 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 206010068655 Nail injury Diseases 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010835 comparative analysis Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000474 nursing effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Classifications
-
- A—HUMAN NECESSITIES
- A45—HAND OR TRAVELLING ARTICLES
- A45D—HAIRDRESSING OR SHAVING EQUIPMENT; EQUIPMENT FOR COSMETICS OR COSMETIC TREATMENTS, e.g. FOR MANICURING OR PEDICURING
- A45D29/00—Manicuring or pedicuring implements
- A45D29/11—Polishing devices for nails
- A45D29/12—Polishing devices for nails manually operated
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention discloses a kind of fingernail polish bar, including substrate and polishing layer, the polishing layer includes the polishing tooth of some dense distributions, and the bottom for polishing tooth is fixed on substrate.The burnishing stick can be by nail surface sanding and polishing, make nail surface that light color and luster attractive in appearance is presented, without using nail beauty surface by the nail polish or cleaner that are hazardous to the human body, the effect of manicure is reached, invention additionally discloses the preparation method of the fingernail polish bar.
Description
Technical field
The present invention relates to a kind of beauty appliance, and in particular to a kind of fingernail polish bar and preparation method thereof.
Background technology
The nail of the mankind is one of appendages of skin, belongs to connective tissue.The blood vessel and nerve of nail nail matrix especially enrich, and refer to
First is also a discharge port of hepatotoxin, while nail is even more the most important part of Ms's hand care of liking to be beautiful, possesses beautiful
Nail be many Mies dream.
It is right containing toxic chemical substances such as acetone, ethyl acetate, phthalic acid ester, formaldehyde, benzene more than conventional nail polish
Human body does harm rather than good, long-term coat nail polish can damage nail health, along with nail polish the parcel of nail is prevented nail from
Hepatotoxin is excluded in time, and this is even more and one kind of liver is damaged.When nail grows a part, newly grow part and just do not refer to
Nail polish is covered, and is had to clean nail polish with cleaner and is coated again in order to attractive in appearance, and cleaner primary raw material is acetone, to people
The injury of body is more more than nail polish, and Long Term Contact nail polish and cleaner will cause significant damage to human body.Also, nail polish and
The manufacturing of cleaner and certain pollution can be also caused to environment using the waste material of rear generation.
The content of the invention
In order to solve the above-mentioned technical problem, the present invention discloses a kind of fingernail polish bar, and the burnishing stick can be by nail surface
Sanding and polishing, makes nail surface that light color and luster attractive in appearance is presented, without using the nail polish or cleaner that are hazardous to the human body i.e.
Can nail beauty surface, reach the effect of manicure.Invention additionally discloses the preparation method of the fingernail polish bar.
The present invention is achieved through the following technical solutions：
A kind of fingernail polish bar, including substrate and polishing layer, the polishing layer include the polishing tooth of some dense distributions, throw
The bottom of light tooth is fixed on substrate.
Nail is one of appendages of skin, belongs to connective tissue.The blood vessel and nerve of nail nail matrix especially enrich, and nail is also
One discharge port of hepatotoxin, the nursing beautification of current nail is more by the way of coat nail polish, and conventional nail polish contains
There are the toxic chemical substances such as acetone, ethyl acetate, phthalic acid ester, formaldehyde, benzene, harmful unhelpful, long-term coating refers to
Nail polish can damage nail health, and along with nail polish prevents nail from excluding hepatotoxin in time the parcel of nail, this is even more
One kind to liver is damaged.Unavoidable while coat nail polish to also need to use cleaner, cleaner primary raw material is acetone, right
The injury of human body is more more than nail polish, and Long Term Contact nail polish and cleaner will cause significant damage to human body.Also, nail polish
Certain pollution can be also caused to environment with the manufacturing of cleaner and using the waste material of rear generation.
A kind of fingernail polish bar of the present invention, by processing one layer of polishing layer on substrate, polishing layer is thrown comprising dense distribution
Light tooth, sanding and polishing is carried out to nail surface using a large amount of small polishing teeth, eliminates the original rough line of nail surface
Reason, makes nail surface flat smooth fine and smooth, and with beautiful gloss, reaches the visual effect after similar coat nail polish, because
This burnishing stick of the present invention can make nail reach bright and clean beautiful visual effect in the case of without using nail polish, beautification
Nail appearance, it is to avoid nail and human body are endangered by nail polish and cleaner.Both ensure that nail was attractive in appearance, make again human body from
The infringement of toxic chemical substance, reaches the manicure effect of safety and Health.
The polishing perpendicular cylindricality in substrate of tooth, polishing tooth footpath is 150~250 μm to Breadth Maximum, polishes between cog
Spacing be 80~150 μm.
Present inventor has done a large amount of trials, finds when polishing tooth footpath to Breadth Maximum at 150~250 μm, polishes tooth
Between spacing in 80~150 μ ms when, burnishing stick can be polished to nail surface, eliminate nail surface it is uneven
Texture and flaw, make nail surface gloss fine and smooth, alternative nail polish carries out landscaping treatment to nail surface, it is to avoid human body meets with
Encroached on by nail polish and cleaner.
When polishing tooth footpath exceeds 150~250 μ ms to Breadth Maximum, the spacing for polishing between cog exceeds 80~150 μm of models
When enclosing, the nail surface after its polishing is rougher, low in glossiness, or cannot be polished polishing, it is difficult to do not using nail
Make nail attractive in appearance in the case of oil.
The polishing perpendicular cylindricality in substrate of tooth, polishing tooth footpath is 180~220 μm to Breadth Maximum, polishes between cog
Spacing be 100~110 μm.
During a large amount of repetition tests of inventor, find, when polishing tooth footpath is 180~220 μm to Breadth Maximum, to throw
When the spacing of light between cog is 100~110 μm, the polishing effect of burnishing stick is optimal, the smooth exquisiteness of nail surface after polishing, gloss
Degree is high, and can completely substitute nail polish makes nail surface attractive in appearance beautiful.
The polishing tooth height is 18~22 μm.When tooth height is polished less than 18 μm, nail chip holds in polishing process
Polishing inter-lobe clearance is easily filled full quickly, burnishing stick is continued polishing, it is necessary to be used by behind cleaning polishing backlash,
Influence polishing efficiency and Consumer's Experience.
The polishing odontoid is the one kind in cylinder, quadrangular, six prisms and triangular prism.
The present invention is to act on nail surface using the corner angle at micron-sized polishing crest top land edge, and nail surface is carried out
Cutting, the most trickle projection of the reluctant nail surface of existing milling tools or flaw treatment is clean, make nail surface light
It is sliding fine and smooth, and beautiful gloss is produced, reach the effect of sanding and polishing nail, nail beauty.
Polishing bottom of the tooth portion is integral type with substrate connection.
The material of the substrate and polishing tooth is glass.
The material of the substrate and polishing tooth is the one kind in blue or green glass, ultra-clear glasses and corning glass.
Because substrate and polishing tooth material are blue or green glass, ultra-clear glasses and corning glass this class hardness glass higher,
And human nails' relative hardness is low, therefore polishing crest top land can carry out sanding and polishing to nail and itself be difficult to be worn, and prolong
Its service life long, and polishing effect will not be influenceed because of the deformation of polishing odontotripsis.
The polishing tooth crest is covered with one layer of layers of chrome.Layers of chrome hardness is higher than glass, and its thickness is 100nm, is thrown for protecting
Light crest top land is not worn and torn by hard thing, while the color and outward appearance of burnishing stick can be improved.
A kind of preparation method of fingernail polish bar, comprises the following steps that：
Mask plate makes：Take one piece of glass plate, by way of sputter coating on its plated surface chromium film, chromium film include with
Chrome green layer on the outside of the layers of chrome and layers of chrome of contact glass sheet, layers of chrome and chrome green layer gross thickness are 150nm, then are led to
Cross laser Nogata formula write on chromium film surface form some a diameter of 150~250 μm, each other away from small convex for 100~150 μm
Point, small salient point top surface shape is the one kind in circle, rhombus, hexagon and triangle, that is, mask plate is obtained；
Processing substrate：One piece of high rigidity glass plate is taken for substrate, in the chromium film of its surface vacuum plating last layer 100nm, then
One layer of photoresist of spin coating, obtains substrate composite bed on chromium film；
Ultraviolet photolithographic：The photoresist of substrate composite bed is contacted with the chromium film of mask plate, makes substrate composite bed and mask plate
After being brought into close contact on ultraviolet photolithographic machine exposure-processed；
Development and etching：The good substrate composite bed of exposure-processed is separated with mask plate, then is placed on four by substrate is compound
Make photoresist developing in ammonium hydroxide solution, originally the photoresist with mask plate small salient point contact site retained, its remaining part
Position is corroded and exposes the chromium film layer of lower floor, then is placed in ceric ammonium nitrate solution and does the etching of chromium film, and chromium film below photoresist is protected
Stay, the chromium film at remaining position is etched and exposes the high rigidity glass plate of lower floor, toasted again after etching is good, now substrate is combined
Some columnar projections are formed on layer, columnar projections shape of cross section is identical with small salient point top surface shape, and columnar projections are in substrate
The pattern consistent with mask plate is constituted on composite bed；
Glass etching：Substrate is combined and is placed on acid etching in glass erosion liquid, finally, high rigidity glass plate is contacted with chromium film
Position retains, and remaining position is eclipsed and carves groove；
Removal photoresist：After the high rigidity glass plate acid etching of substrate composite bed, the photoresist above removal chromium film obtains final product throwing
Light tooth.
Can also be after photoresist be removed, the chromium film on removal columnar projections upper strata.The substrate that to etch again by cutting,
Edging and cleaning, just form burnishing stick one by one.
The high rigidity glass plate is the one kind in blue or green glass, ultra-clear glasses and corning glass.And high rigidity glass thickness of slab
It is 2~4mm to spend.
The preparation method of fingernail polish bar of the invention, by photoetching process and the method for chemical attack, in glass surface
The micron order polishing tooth of the rule arrangement of certain limit size and certain limit depth is obtained, using sharp keen polishing crest top land side
The cutting power of edge is polished to nail surface, nail surface is reached smooth beautiful manicure effect, so as to avoid nail
Injury of the poisonous chemicals to human body and the pollution to environment such as oil and cleaner, and using burnishing stick essence obtained in the method
Degree is high, intensity is good, polishing effect is good, durable in use.
The present invention compared with prior art, has the following advantages and advantages：
1st, a kind of fingernail polish bar of the invention, by processing one layer of polishing layer on substrate, polishing layer includes dense distribution
Polishing tooth, sanding and polishing is carried out to nail surface using a large amount of small polishing teeth, eliminates nail surface original rough
Texture, makes nail surface flat smooth fine and smooth, and with beautiful gloss, reaches the visual effect after similar coat nail polish,
In the case of without using nail polish, nail can be made to reach bright and clean beautiful visual effect, it is to avoid nail and human body are subjected to
The harm of nail polish and cleaner.Both ensure that nail was attractive in appearance, human body had been made again from the infringement of toxic chemical substance；
2nd, the preparation method of a kind of fingernail polish bar of the invention, by photoetching process and the method for chemical attack, in glass
Surface obtains the micron order polishing tooth of the rule arrangement of certain limit size and certain limit depth, using sharp keen polishing tooth top
The cutting power at face edge is polished to nail surface, nail surface is reached smooth beautiful manicure effect, so as to avoid
Injury of the poisonous chemicals such as nail polish and cleaner to human body and the pollution to environment, and using the obtained polishing of the method
Bar high precision, intensity are good, polishing effect is good, durable in use.
Brief description of the drawings
Accompanying drawing described herein is used for providing further understanding the embodiment of the present invention, constitutes of the application
Point, do not constitute the restriction to the embodiment of the present invention.In the accompanying drawings：
Fig. 1 is schematic structural view of the invention；
Fig. 2 is the burnishing stick partial enlarged drawing of the embodiment of the present invention 4；
Fig. 3 is the burnishing stick partial enlarged drawing of the embodiment of the present invention 6；
Fig. 4 is the preparation flow figure of fingernail polish bar of the present invention.
Mark and corresponding parts title in accompanying drawing：
1- substrates, 2- polishing layers, 3- polishing teeth, 4- mask plates, 41- glass plates, 42- chromium films, 43- small salient points, 5- substrates
Composite bed, 51- chromium films, 52- photoresists.
Specific embodiment
To make the object, technical solutions and advantages of the present invention become more apparent, with reference to embodiment and accompanying drawing, to this
Invention is described in further detail, and exemplary embodiment of the invention and its explanation are only used for explaining the present invention, do not make
It is limitation of the invention.
Embodiment 1
A kind of fingernail polish bar, including substrate and polishing layer, the polishing layer include the polishing tooth of some dense distributions, throw
Light odontoid is cylinder of the axis perpendicular to substrate, and polishing bottom of the tooth portion is integral type with substrate connection.Wherein, polishing tooth diameter is
205 μm, the spacing for polishing between cog is 155 μm, and the polishing tooth height is 20 μm.The material of substrate and polishing tooth is blue or green glass,
One layer of layers of chrome is covered with polishing tooth crest.
The preparation method of above-mentioned fingernail polish bar, comprises the following steps that：
Mask plate makes：Take one piece of glass plate, by way of sputter coating on its plated surface chromium film, chromium film include with
Chrome green layer on the outside of the layers of chrome and layers of chrome of contact glass sheet, layers of chrome and chrome green layer gross thickness are 150nm, then are led to
Cross laser Nogata formula write on chromium film surface formed some a diameter of 205 μm, each other away from the small salient point for 155 μm, small salient point top
Face is shaped as circle, that is, mask plate is obtained；
Processing substrate：One piece of high rigidity glass plate is taken for substrate, it is the blue or green glass of 2mm that the present embodiment uses thickness, at it
The chromium film of surface vacuum plating last layer 100nm, then one layer of photoresist of spin coating on chromium film, obtain substrate composite bed；
Ultraviolet photolithographic：The photoresist of substrate composite bed is contacted with the chromium film of mask plate, makes substrate composite bed and mask plate
After being brought into close contact on ultraviolet photolithographic machine exposure-processed；
Development and etching：The good substrate composite bed of exposure-processed is separated with mask plate, then is placed on four by substrate is compound
Make photoresist developing in ammonium hydroxide solution, originally the photoresist with mask plate small salient point contact site retained, its remaining part
Position is corroded and exposes the chromium film layer of lower floor, then is placed in ceric ammonium nitrate solution and does the etching of chromium film, and chromium film below photoresist is protected
Stay, the chromium film at remaining position is etched and exposes the high rigidity glass plate of lower floor, toasted again after etching is good, now substrate is combined
Some columnar projections are formed on layer, columnar projections shape of cross section is identical with small salient point top surface shape, and columnar projections are in substrate
The pattern consistent with mask plate is constituted on composite bed；
Glass etching：Substrate is combined and is placed on acid etching in glass erosion liquid, finally, high rigidity glass plate is contacted with chromium film
Position retains, and remaining position is eclipsed and carves groove；
Removal photoresist：After the high rigidity glass plate acid etching of substrate composite bed, the photoresist above removal chromium film obtains final product throwing
Light tooth.
The substrate that will finally etch just forms burnishing stick one by one by cutting, edging and cleaning.
The burnishing stick that the present embodiment is produced is polished for nail surface, the nail table that can be gone out after polishing with discernable by eye
Face has many trickle cuts, and feel is coarse and tarnish, therefore although the burnishing stick of the present embodiment can be used in polishing and refer to
First, but cannot be used for fingernail polish, it is impossible to reach the effect for making nail gloss beautiful.
Embodiment 2
A kind of fingernail polish bar, including substrate and polishing layer, the polishing layer include the polishing tooth of some dense distributions, throw
Light odontoid is cylinder of the axis perpendicular to substrate, and polishing bottom of the tooth portion is integral type with substrate connection.Wherein, polishing tooth diameter is
145 μm, the spacing for polishing between cog is 140 μm, and the polishing tooth height is 19 μm.The material of substrate and polishing tooth is blue or green glass,
One layer of layers of chrome is covered with polishing tooth crest.
The preparation method of above-mentioned fingernail polish bar, comprises the following steps that：
Mask plate makes：Take one piece of glass plate, by way of sputter coating on its plated surface chromium film, chromium film include with
Chrome green layer on the outside of the layers of chrome and layers of chrome of contact glass sheet, layers of chrome and chrome green layer gross thickness are 150nm, then are led to
Cross laser Nogata formula write on chromium film surface formed some a diameter of 145 μm, each other away from the small salient point for 140 μm, small salient point top
Face is shaped as circle, that is, mask plate is obtained；
Processing substrate：One piece of high rigidity glass plate is taken for substrate, it is the blue or green glass of 4mm that the present embodiment uses thickness, at it
The chromium film of surface vacuum plating last layer 100nm, then one layer of photoresist of spin coating on chromium film, obtain substrate composite bed；
Ultraviolet photolithographic：The photoresist of substrate composite bed is contacted with the chromium film of mask plate, makes substrate composite bed and mask plate
After being brought into close contact on ultraviolet photolithographic machine exposure-processed；
Development and etching：The good substrate composite bed of exposure-processed is separated with mask plate, then is placed on four by substrate is compound
Make photoresist developing in ammonium hydroxide solution, originally the photoresist with mask plate small salient point contact site retained, its remaining part
Position is corroded and exposes the chromium film layer of lower floor, then is placed in ceric ammonium nitrate solution and does the etching of chromium film, and chromium film below photoresist is protected
Stay, the chromium film at remaining position is etched and exposes the high rigidity glass plate of lower floor, toasted again after etching is good, now substrate is combined
Some columnar projections are formed on layer, columnar projections shape of cross section is identical with small salient point top surface shape, and columnar projections are in substrate
The pattern consistent with mask plate is constituted on composite bed；
Glass etching：Substrate is combined and is placed on acid etching in glass erosion liquid, finally, high rigidity glass plate is contacted with chromium film
Position retains, and remaining position is eclipsed and carves groove；
Removal photoresist：After the high rigidity glass plate acid etching of substrate composite bed, the photoresist above removal chromium film obtains final product throwing
Light tooth.
The substrate that will finally etch just forms burnishing stick one by one by cutting, edging and cleaning.
The burnishing stick that the present embodiment is produced is polished for nail surface, and more laborious in operation, burnishing stick is difficult to
, still there is rough nail texture through the nail surface after treatment in sanding and polishing nail, thus the present embodiment polishing
Bar cannot be used for the polishing or polishing of nail.
Embodiment 3
A kind of fingernail polish bar, including substrate and polishing layer, the polishing layer include the polishing tooth of some dense distributions, throw
Light odontoid is cylinder of the axis perpendicular to substrate, and polishing bottom of the tooth portion is integral type with substrate connection.Wherein, polishing tooth diameter is
150 μm, the spacing for polishing between cog is 150 μm, and the polishing tooth height is 20 μm.The material of substrate and polishing tooth is blue or green glass,
One layer of layers of chrome is covered with polishing tooth crest.
The preparation method of above-mentioned fingernail polish bar, comprises the following steps that：
Mask plate makes：Take one piece of glass plate, by way of sputter coating on its plated surface chromium film, chromium film include with
Chrome green layer on the outside of the layers of chrome and layers of chrome of contact glass sheet, layers of chrome and chrome green layer gross thickness are 150nm, then are led to
Cross laser Nogata formula write on chromium film surface formed some a diameter of 150 μm, each other away from the small salient point for 150 μm, small salient point top
Face is shaped as circle, that is, mask plate is obtained；
Processing substrate：One piece of high rigidity glass plate is taken for substrate, it is the blue or green glass of 2mm that the present embodiment uses thickness, at it
The chromium film of surface vacuum plating last layer 100nm, then one layer of photoresist of spin coating on chromium film, obtain substrate composite bed；
Ultraviolet photolithographic：The photoresist of substrate composite bed is contacted with the chromium film of mask plate, makes substrate composite bed and mask plate
After being brought into close contact on ultraviolet photolithographic machine exposure-processed；
Development and etching：The good substrate composite bed of exposure-processed is separated with mask plate, then is placed on four by substrate is compound
Make photoresist developing in ammonium hydroxide solution, originally the photoresist with mask plate small salient point contact site retained, its remaining part
Position is corroded and exposes the chromium film layer of lower floor, then is placed in ceric ammonium nitrate solution and does the etching of chromium film, and chromium film below photoresist is protected
Stay, the chromium film at remaining position is etched and exposes the high rigidity glass plate of lower floor, toasted again after etching is good, now substrate is combined
Some columnar projections are formed on layer, columnar projections shape of cross section is identical with small salient point top surface shape, and columnar projections are in substrate
The pattern consistent with mask plate is constituted on composite bed；
Glass etching：Substrate is combined and is placed on acid etching in glass erosion liquid, finally, high rigidity glass plate is contacted with chromium film
Position retains, and remaining position is eclipsed and carves groove；
Removal photoresist：After the high rigidity glass plate acid etching of substrate composite bed, the photoresist above removal chromium film obtains final product throwing
Light tooth.
The substrate that will finally etch just forms burnishing stick one by one by cutting, edging and cleaning.
The burnishing stick that the present embodiment is produced is polished for nail surface, although after cannot with the naked eye telling polishing
Whether nail surface has cut, and nail surface is smooth, but nail color and luster is more dim, with matte effect, therefore this implementation
The burnishing stick of example can be used in polishing nail and polishing nail, nail surface is had bright and clean matte effect, can be in certain journey
Nail polish is substituted on degree makes nail bright and clean attractive in appearance.
Embodiment 4
As shown in Figure 1, 2, a kind of fingernail polish bar, including substrate 1 and polishing layer 2, the polishing layer 2 include some intensive
The polishing tooth 3 of distribution, polishing tooth 3 is shaped as cylinder of the axis perpendicular to substrate, and the polishing bottom of tooth 3 connects as one with substrate 1
Formula.Wherein, the spacing polished between 3 a diameter of 165 μm of tooth, polishing tooth 3 is 135 μm, and polishing tooth 3 height is 18 μm.Substrate 1
It is blue or green glass with the material of polishing tooth 3, one layer of layers of chrome is covered with polishing tooth crest.
As shown in figure 4, the preparation method of above-mentioned fingernail polish bar, comprises the following steps that：
Mask plate makes：Take one piece of glass plate 41, by way of sputter coating on its plated surface chromium film 42, chromium film 42
Including the chrome green layer on the outside of the layers of chrome and layers of chrome with contact glass sheet, layers of chrome and chrome green layer gross thickness are
150nm, then by laser straight mode write on the surface of chromium film 42 form some a diameter of 165 μm, each other away from small convex for 135 μm
Point 43, the top surface shape of small salient point 43 is circle, that is, mask plate 4 is obtained；
Processing substrate：One piece of high rigidity glass plate is taken for substrate 1, it is the blue or green glass of 3mm that the present embodiment uses thickness, at it
The chromium film 51 of surface vacuum plating last layer 100nm, then one layer of photoresist 52 of spin coating on chromium film 51, obtain substrate composite bed 5；
Ultraviolet photolithographic：The photoresist 52 of substrate composite bed 5 is contacted with the chromium film 42 of mask plate 4, make substrate composite bed 5 with
Mask plate 4 be brought into close contact after on ultraviolet photolithographic machine exposure-processed；
Development and etching：The good substrate composite bed 5 of exposure-processed is separated with mask plate 4, then substrate composite bed 5 is placed in
Make photoresist developing in tetramethyl ammonium hydroxide solution, originally the photoresist 52 with the contact site of mask plate small salient point 43 retained,
Remaining position is corroded and exposes the chromium film layer of lower floor, then is placed in ceric ammonium nitrate solution and does the etching of chromium film, the lower section of photoresist 52
Chromium film retain, the chromium film at remaining position is etched and exposes the high rigidity glass plate of lower floor, is toasted again after etching is good, now
Some columnar projections are formed on substrate composite bed 5, columnar projections shape of cross section is identical with the top surface shape of small salient point 43, and column
Projection constitutes the pattern consistent with mask plate 4 on substrate composite bed；
Glass etching：Substrate composite bed 5 is placed in acid etching in glass erosion liquid, finally, high rigidity glass plate and chromium film 51
Contact site retains, and remaining position is eclipsed and carves groove；
Removal photoresist：After the high rigidity glass plate acid etching of substrate composite bed 5, the photoresist 52 of the top of removal chromium film 51 is
Tooth 3 must be polished.
The substrate 1 that will finally etch just forms burnishing stick one by one by cutting, edging and cleaning.
The burnishing stick that the present embodiment is produced for nail surface polish, it is polished after nail surface Surface feel light
Slide and with gloss, therefore the burnishing stick of the present embodiment can be used in polishing nail and polishing nail, can completely substitute nail polish
Make nail bright and clean attractive in appearance.
Embodiment 5
A kind of fingernail polish bar, including substrate 1 and polishing layer 2, the polishing layer 2 include the polishing tooth of some dense distributions
3, polishing tooth 3 is shaped as quadrangular of the axis perpendicular to substrate 1, and the polishing bottom of tooth 3 connects as one formula with substrate 1.Wherein, throw
The radial direction Breadth Maximum of light tooth 3 is 180 μm, and the spacing between polishing tooth 3 is 120 μm, and polishing tooth 3 height is 21 μm.The He of substrate 1
The material for polishing tooth 3 is Xiao Te B270 ultra-clear glasses, and one layer of layers of chrome is covered with polishing tooth crest.
The preparation method of above-mentioned fingernail polish bar, comprises the following steps that：
Mask plate makes：Take one piece of glass plate, by way of sputter coating on its plated surface chromium film, chromium film include with
Chrome green layer on the outside of the layers of chrome and layers of chrome of contact glass sheet, layers of chrome and chrome green layer gross thickness are 150nm, then are led to
Cross laser Nogata formula write on chromium film surface formed some a diameter of 180 μm, each other away from the small salient point for 120 μm, small salient point top
Face is shaped as rhombus, that is, mask plate is obtained；
Processing substrate：One piece of high rigidity glass plate is taken for substrate, it is the Xiao Te B270 ultrawhites of 4mm that the present embodiment uses thickness
Glass, in the chromium film of its surface vacuum plating last layer 100nm, then one layer of photoresist of spin coating on chromium film, obtains substrate composite bed；
Ultraviolet photolithographic：The photoresist of substrate composite bed is contacted with the chromium film of mask plate, makes substrate composite bed and mask plate
After being brought into close contact on ultraviolet photolithographic machine exposure-processed；
Development and etching：The good substrate composite bed of exposure-processed is separated with mask plate, then is placed on four by substrate is compound
Make photoresist developing in ammonium hydroxide solution, originally the photoresist with mask plate small salient point contact site retained, its remaining part
Position is corroded and exposes the chromium film layer of lower floor, then is placed in ceric ammonium nitrate solution and does the etching of chromium film, and chromium film below photoresist is protected
Stay, the chromium film at remaining position is etched and exposes the high rigidity glass plate of lower floor, toasted again after etching is good, now substrate is combined
Some columnar projections are formed on layer, columnar projections shape of cross section is identical with small salient point top surface shape, and columnar projections are in substrate
The pattern consistent with mask plate is constituted on composite bed；
Glass etching：Substrate is combined and is placed on acid etching in glass erosion liquid, finally, high rigidity glass plate is contacted with chromium film
Position retains, and remaining position is eclipsed and carves groove；
Removal photoresist：After the high rigidity glass plate acid etching of substrate composite bed, the photoresist above removal chromium film obtains final product throwing
Light tooth.
The substrate that will finally etch just forms burnishing stick one by one by cutting, edging and cleaning.
The burnishing stick that the present embodiment is produced for nail surface polish, it is polished after nail surface Surface feel light
Slide and with preferable glossiness, therefore the burnishing stick of the present embodiment can be used in polishing nail and polishing nail, can replace completely
Acute pyogenic infection of finger tip nail polish makes nail bright and clean attractive in appearance.
Embodiment 6
As shown in Figure 1,3, a kind of fingernail polish bar, including substrate 1 and polishing layer 2, the polishing layer 2 include some intensive
The polishing tooth 3 of distribution, polishing tooth 3 is shaped as six prisms of the axis perpendicular to substrate, and the polishing bottom of tooth 3 is connected as one with substrate 1
Body formula.Wherein, polishing tooth 3 radial direction Breadth Maximum is 190 μm, and the spacing between polishing tooth 3 is 110 μm, and the polishing height of tooth 3 is
19μm.The material of substrate 1 and polishing tooth 3 is Xiao Te B270 ultra-clear glasses, and one layer of layers of chrome is covered with the top of polishing tooth 3.
As shown in figure 4, the preparation method of above-mentioned fingernail polish bar, comprises the following steps that：
Mask plate makes：Take one piece of glass plate 41, by way of sputter coating on its plated surface chromium film 42, chromium film 42
Including the chrome green layer on the outside of the layers of chrome contacted with glass plate 41 and layers of chrome, layers of chrome and chrome green layer gross thickness are
150nm, then by laser straight mode write on the surface of chromium film 42 form some a diameter of 190 μm, each other away from small convex for 110 μm
Point 43, the top surface shape of small salient point 43 is hexagon, that is, mask plate 4 is obtained；
Processing substrate：One piece of high rigidity glass plate is taken for substrate 1, the present embodiment uses thickness to surpass for the Xiao Te B270 of 2mm
White glass, in the chromium film 51 of its surface vacuum plating last layer 100nm, then one layer of photoresist 52 of spin coating on chromium film 51, obtains base
Plate composite bed 5；
Ultraviolet photolithographic：The photoresist 52 of substrate composite bed 5 is contacted with the chromium film 42 of mask plate 4, make substrate composite bed 5 with
Mask plate 4 be brought into close contact after on ultraviolet photolithographic machine exposure-processed；
Development and etching：The good substrate composite bed 5 of exposure-processed is separated with mask plate 4, then substrate composite bed 5 is placed in
Make photoresist developing in tetramethyl ammonium hydroxide solution, originally the photoresist with mask plate small salient point contact site retained, remaining
Position is corroded and exposes the chromium film layer of lower floor, then be placed in ceric ammonium nitrate solution do chromium film etching, the chromium film below photoresist
Retain, the chromium film at remaining position is etched and exposes the high rigidity glass plate of lower floor, toasted again after etching is good, now substrate is answered
Close and form some columnar projections on layer 5, columnar projections shape of cross section is identical with small salient point top surface shape, and columnar projections are in base
The pattern consistent with mask plate 4 is constituted on plate composite bed 5；
Glass etching：Substrate composite bed 5 is placed in acid etching in glass erosion liquid, finally, high rigidity glass plate and chromium film 51
Contact site retains, and remaining position is eclipsed and carves groove；
Removal photoresist：After the high rigidity glass plate acid etching of substrate composite bed 5, the photoresist 52 of the top of removal chromium film 51 is
Tooth 3 must be polished.
The substrate 1 that will finally etch just forms burnishing stick one by one by cutting, edging and cleaning.
The burnishing stick that the present embodiment is produced for nail surface polish, it is polished after nail surface Surface feel light
Slide and with extraordinary glossiness, therefore the burnishing stick of the present embodiment can be used in polishing nail and polishing nail, can be complete
Substituting nail polish makes nail surface bright and clean beautiful.
Embodiment 7
A kind of fingernail polish bar, including substrate and polishing layer, the polishing layer include the polishing tooth of some dense distributions, throw
Light odontoid is six prisms of the axis perpendicular to substrate, and polishing bottom of the tooth portion is integral type with substrate connection.Wherein, polishing tooth footpath to
Breadth Maximum is 200 μm, and the spacing for polishing between cog is 100 μm, and the polishing tooth height is 20 μm.The material of substrate and polishing tooth
It is corning glass, one layer of layers of chrome is covered with polishing tooth crest.
The preparation method of above-mentioned fingernail polish bar, comprises the following steps that：
Mask plate makes：Take one piece of glass plate, by way of sputter coating on its plated surface chromium film, chromium film include with
Chrome green layer on the outside of the layers of chrome and layers of chrome of contact glass sheet, layers of chrome and chrome green layer gross thickness are 150nm, then are led to
Cross laser Nogata formula write on chromium film surface formed some a diameter of 200 μm, each other away from the small salient point for 100 μm, small salient point top
Face is shaped as hexagon, that is, mask plate is obtained；
Processing substrate：One piece of high rigidity glass plate is taken for substrate, it is the corning glass of 4mm that the present embodiment uses thickness,
The chromium film of its surface vacuum plating last layer 100nm, then one layer of photoresist of spin coating on chromium film, obtain substrate composite bed；
Ultraviolet photolithographic：The photoresist of substrate composite bed is contacted with the chromium film of mask plate, makes substrate composite bed and mask plate
After being brought into close contact on ultraviolet photolithographic machine exposure-processed；
Development and etching：The good substrate composite bed of exposure-processed is separated with mask plate, then is placed on four by substrate is compound
Make photoresist developing in ammonium hydroxide solution, originally the photoresist with mask plate small salient point contact site retained, its remaining part
Position is corroded and exposes the chromium film layer of lower floor, then is placed in ceric ammonium nitrate solution and does the etching of chromium film, and chromium film below photoresist is protected
Stay, the chromium film at remaining position is etched and exposes the high rigidity glass plate of lower floor, toasted again after etching is good, now substrate is combined
Some columnar projections are formed on layer, columnar projections shape of cross section is identical with small salient point top surface shape, and columnar projections are in substrate
The pattern consistent with mask plate is constituted on composite bed；
Glass etching：Substrate is combined and is placed on acid etching in glass erosion liquid, finally, high rigidity glass plate is contacted with chromium film
Position retains, and remaining position is eclipsed and carves groove；
Removal photoresist：After the high rigidity glass plate acid etching of substrate composite bed, the photoresist above removal chromium film obtains final product throwing
Light tooth.
The substrate that will finally etch just forms burnishing stick one by one by cutting, edging and cleaning.
The burnishing stick that the present embodiment is produced for nail surface polish, it is polished after nail surface Surface feel light
Slide and with extraordinary glossiness, therefore the burnishing stick of the present embodiment can be used in polishing nail and polishing nail, can be complete
Substituting nail polish makes nail surface bright and clean beautiful.
Embodiment 8
A kind of fingernail polish bar, including substrate and polishing layer, the polishing layer include the polishing tooth of some dense distributions, throw
Light odontoid is triangular prism of the axis perpendicular to substrate, and polishing bottom of the tooth portion is integral type with substrate connection.Wherein, polishing tooth footpath to
Breadth Maximum is 220 μm, and the spacing for polishing between cog is 95 μm, and the polishing tooth height is 22 μm.The material of substrate and polishing tooth
It is corning glass.
The preparation method of above-mentioned fingernail polish bar, comprises the following steps that：
Mask plate makes：Take one piece of glass plate, by way of sputter coating on its plated surface chromium film, chromium film include with
Chrome green layer on the outside of the layers of chrome and layers of chrome of contact glass sheet, layers of chrome and chrome green layer gross thickness are 150nm, then are led to
Cross laser Nogata formula write on chromium film surface formed some a diameter of 220 μm, each other away from the small salient point for 95 μm, small salient point top surface
Triangle is shaped as, that is, mask plate is obtained；
Processing substrate：One piece of high rigidity glass plate is taken for substrate, it is the corning glass of 3mm that the present embodiment uses thickness,
The chromium film of its surface vacuum plating last layer 100nm, then one layer of photoresist of spin coating on chromium film, obtain substrate composite bed；
Ultraviolet photolithographic：The photoresist of substrate composite bed is contacted with the chromium film of mask plate, makes substrate composite bed and mask plate
After being brought into close contact on ultraviolet photolithographic machine exposure-processed；
Development and etching：The good substrate composite bed of exposure-processed is separated with mask plate, then is placed on four by substrate is compound
Make photoresist developing in ammonium hydroxide solution, originally the photoresist with mask plate small salient point contact site retained, its remaining part
Position is corroded and exposes the chromium film layer of lower floor, then is placed in ceric ammonium nitrate solution and does the etching of chromium film, and chromium film below photoresist is protected
Stay, the chromium film at remaining position is etched and exposes the high rigidity glass plate of lower floor, toasted again after etching is good, now substrate is combined
Some columnar projections are formed on layer, columnar projections shape of cross section is identical with small salient point top surface shape, and columnar projections are in substrate
The pattern consistent with mask plate is constituted on composite bed；
Glass etching：Substrate is combined and is placed on acid etching in glass erosion liquid, finally, high rigidity glass plate is contacted with chromium film
Position retains, and remaining position is eclipsed and carves groove；
Removal photoresist：After the high rigidity glass plate acid etching of substrate composite bed, the photoresist above removal chromium film obtains final product throwing
Light tooth.
After photoresist is removed, the chromium film on removal columnar projections upper strata, then substrate through that will etch cutting, edging and
Cleaning, just forms burnishing stick one by one.
The burnishing stick that the present embodiment is produced for nail surface polish, it is polished after nail surface Surface feel light
Slide and with preferable glossiness, therefore the burnishing stick of the present embodiment can be used in polishing nail and polishing nail, can replace completely
Acute pyogenic infection of finger tip nail polish makes nail surface bright and clean beautiful.
Embodiment 9
A kind of fingernail polish bar, including substrate and polishing layer, the polishing layer include the polishing tooth of some dense distributions, throw
Light odontoid is triangular prism of the axis perpendicular to substrate, and polishing bottom of the tooth portion is integral type with substrate connection.Wherein, polishing tooth footpath to
Breadth Maximum is 235 μm, and the spacing for polishing between cog is 130 μm, and the polishing tooth height is 21 μm.The material of substrate and polishing tooth
It is Xiao Te B270 ultra-clear glasses.
The preparation method of above-mentioned fingernail polish bar, comprises the following steps that：
Mask plate makes：Take one piece of glass plate, by way of sputter coating on its plated surface chromium film, chromium film include with
Chrome green layer on the outside of the layers of chrome and layers of chrome of contact glass sheet, layers of chrome and chrome green layer gross thickness are 150nm, then are led to
Cross laser Nogata formula write on chromium film surface formed some a diameter of 235 μm, each other away from the small salient point for 130 μm, small salient point top
Face is shaped as triangle, that is, mask plate is obtained；
Processing substrate：One piece of high rigidity glass plate is taken for substrate, it is the Xiao Te B270 ultrawhites of 4mm that the present embodiment uses thickness
Glass, in the chromium film of its surface vacuum plating last layer 100nm, then one layer of photoresist of spin coating on chromium film, obtains substrate composite bed；
Ultraviolet photolithographic：The photoresist of substrate composite bed is contacted with the chromium film of mask plate, makes substrate composite bed and mask plate
After being brought into close contact on ultraviolet photolithographic machine exposure-processed；
Development and etching：The good substrate composite bed of exposure-processed is separated with mask plate, then is placed on four by substrate is compound
Make photoresist developing in ammonium hydroxide solution, originally the photoresist with mask plate small salient point contact site retained, its remaining part
Position is corroded and exposes the chromium film layer of lower floor, then is placed in ceric ammonium nitrate solution and does the etching of chromium film, and chromium film below photoresist is protected
Stay, the chromium film at remaining position is etched and exposes the high rigidity glass plate of lower floor, toasted again after etching is good, now substrate is combined
Some columnar projections are formed on layer, columnar projections shape of cross section is identical with small salient point top surface shape, and columnar projections are in substrate
The pattern consistent with mask plate is constituted on composite bed；
Glass etching：Substrate is combined and is placed on acid etching in glass erosion liquid, finally, high rigidity glass plate is contacted with chromium film
Position retains, and remaining position is eclipsed and carves groove；
Removal photoresist：After the high rigidity glass plate acid etching of substrate composite bed, the photoresist above removal chromium film obtains final product throwing
Light tooth.
After photoresist is removed, the chromium film on removal columnar projections upper strata.The substrate that to etch again by cutting, edging and
Cleaning, just forms burnishing stick one by one.
The burnishing stick that the present embodiment is produced for nail surface polish, it is polished after nail surface Surface feel light
Slide and with preferable glossiness, therefore the burnishing stick of the present embodiment can be used in polishing nail and polishing nail, can replace completely
Acute pyogenic infection of finger tip nail polish makes nail bright and clean attractive in appearance.
Embodiment 10
A kind of fingernail polish bar, including substrate and polishing layer, the polishing layer include the polishing tooth of some dense distributions, throw
Light odontoid is cylinder of the axis perpendicular to substrate, and polishing bottom of the tooth portion is integral type with substrate connection.Wherein, polishing tooth diameter is
250 μm, the spacing for polishing between cog is 90 μm, and the polishing tooth height is 18 μm.The material of substrate and polishing tooth is Xiao Te B270
Ultra-clear glasses, one layer of layers of chrome is covered with polishing tooth crest.
The preparation method of above-mentioned fingernail polish bar, comprises the following steps that：
Mask plate makes：Take one piece of glass plate, by way of sputter coating on its plated surface chromium film, chromium film include with
Chrome green layer on the outside of the layers of chrome and layers of chrome of contact glass sheet, layers of chrome and chrome green layer gross thickness are 150nm, then are led to
Cross laser Nogata formula write on chromium film surface formed some a diameter of 250 μm, each other away from the small salient point for 90 μm, small salient point top surface
Circle is shaped as, that is, mask plate is obtained；
Processing substrate：One piece of high rigidity glass plate is taken for substrate, it is the Xiao Te B270 ultrawhites of 3mm that the present embodiment uses thickness
Glass, in the chromium film of its surface vacuum plating last layer 100nm, then one layer of photoresist of spin coating on chromium film, obtains substrate composite bed；
Ultraviolet photolithographic：The photoresist of substrate composite bed is contacted with the chromium film of mask plate, makes substrate composite bed and mask plate
After being brought into close contact on ultraviolet photolithographic machine exposure-processed；
Development and etching：The good substrate composite bed of exposure-processed is separated with mask plate, then is placed on four by substrate is compound
Make photoresist developing in ammonium hydroxide solution, originally the photoresist with mask plate small salient point contact site retained, its remaining part
Position is corroded and exposes the chromium film layer of lower floor, then is placed in ceric ammonium nitrate solution and does the etching of chromium film, and chromium film below photoresist is protected
Stay, the chromium film at remaining position is etched and exposes the high rigidity glass plate of lower floor, toasted again after etching is good, now substrate is combined
Some columnar projections are formed on layer, columnar projections shape of cross section is identical with small salient point top surface shape, and columnar projections are in substrate
The pattern consistent with mask plate is constituted on composite bed；
Glass etching：Substrate is combined and is placed on acid etching in glass erosion liquid, finally, high rigidity glass plate is contacted with chromium film
Position retains, and remaining position is eclipsed and carves groove；
Removal photoresist：After the high rigidity glass plate acid etching of substrate composite bed, the photoresist above removal chromium film obtains final product throwing
Light tooth.
The substrate that will finally etch just forms burnishing stick one by one by cutting, edging and cleaning.
The burnishing stick that the present embodiment is produced for nail surface polish, it is polished after nail surface Surface feel light
Sliding and with certain glossiness, still, therefore the burnishing stick of the present embodiment can be used in polishing nail and polishing refers to polishing effect
First, alternative nail polish makes nail bright and clean attractive in appearance.
Embodiment 11
A kind of fingernail polish bar, including substrate and polishing layer, the polishing layer include the polishing tooth of some dense distributions, throw
Light odontoid is six prisms of the axis perpendicular to substrate, and polishing bottom of the tooth portion is integral type with substrate connection.Wherein, polishing tooth footpath to
Breadth Maximum is 240 μm, and the spacing for polishing between cog is 80 μm, and the polishing tooth height is 22 μm.The material of substrate and polishing tooth
It is corning glass, one layer of layers of chrome is covered with polishing tooth crest.
The preparation method of above-mentioned fingernail polish bar, comprises the following steps that：
Mask plate makes：Take one piece of glass plate, by way of sputter coating on its plated surface chromium film, chromium film include with
Chrome green layer on the outside of the layers of chrome and layers of chrome of contact glass sheet, layers of chrome and chrome green layer gross thickness are 150nm, then are led to
Cross laser Nogata formula write on chromium film surface formed some a diameter of 240 μm, each other away from the small salient point for 80 μm, small salient point top surface
Circle is shaped as, that is, mask plate is obtained；
Processing substrate：One piece of high rigidity glass plate is taken for substrate, it is the corning glass of 2mm that the present embodiment uses thickness,
The chromium film of its surface vacuum plating last layer 100nm, then one layer of photoresist of spin coating on chromium film, obtain substrate composite bed；
Ultraviolet photolithographic：The photoresist of substrate composite bed is contacted with the chromium film of mask plate, makes substrate composite bed and mask plate
After being brought into close contact on ultraviolet photolithographic machine exposure-processed；
Development and etching：The good substrate composite bed of exposure-processed is separated with mask plate, then is placed on four by substrate is compound
Make photoresist developing in ammonium hydroxide solution, originally the photoresist with mask plate small salient point contact site retained, its remaining part
Position is corroded and exposes the chromium film layer of lower floor, then is placed in ceric ammonium nitrate solution and does the etching of chromium film, and chromium film below photoresist is protected
Stay, the chromium film at remaining position is etched and exposes the high rigidity glass plate of lower floor, toasted again after etching is good, now substrate is combined
Some columnar projections are formed on layer, columnar projections shape of cross section is identical with small salient point top surface shape, and columnar projections are in substrate
The pattern consistent with mask plate is constituted on composite bed；
Glass etching：Substrate is combined and is placed on acid etching in glass erosion liquid, finally, high rigidity glass plate is contacted with chromium film
Position retains, and remaining position is eclipsed and carves groove；
Removal photoresist：After the high rigidity glass plate acid etching of substrate composite bed, the photoresist above removal chromium film obtains final product throwing
Light tooth.
The substrate that will finally etch just forms burnishing stick one by one by cutting, edging and cleaning.
The burnishing stick that the present embodiment is produced is polished for nail surface, and polishing process is more laborious, and polishing efficiency is low,
Nail surface Surface feel after polished is smooth and with certain glossiness, polishing effect still, therefore the present embodiment throwing
Striation can be used in polishing nail and polishing nail, and alternative nail polish makes nail bright and clean attractive in appearance.
Embodiment 12
A kind of fingernail polish bar, including substrate and polishing layer, the polishing layer include the polishing tooth of some dense distributions, throw
Light odontoid is triangular prism of the axis perpendicular to substrate, and polishing bottom of the tooth portion is integral type with substrate connection.Wherein, polishing tooth footpath to
Breadth Maximum is 210 μm, and the spacing for polishing between cog is 77 μm, and the polishing tooth height is 18 μm.The material of substrate and polishing tooth
It is blue or green glass, one layer of layers of chrome is covered with polishing tooth crest.
The preparation method of above-mentioned fingernail polish bar, comprises the following steps that：
Mask plate makes：Take one piece of glass plate, by way of sputter coating on its plated surface chromium film, chromium film include with
Chrome green layer on the outside of the layers of chrome and layers of chrome of contact glass sheet, layers of chrome and chrome green layer gross thickness are 150nm, then are led to
Cross laser Nogata formula write on chromium film surface formed some a diameter of 210 μm, each other away from the small salient point for 77 μm, small salient point top surface
Triangle is shaped as, that is, mask plate is obtained；
Processing substrate：One piece of high rigidity glass plate is taken for substrate, it is the blue or green glass of 4mm that the present embodiment uses thickness, at it
The chromium film of surface vacuum plating last layer 100nm, then one layer of photoresist of spin coating on chromium film, obtain substrate composite bed；
Ultraviolet photolithographic：The photoresist of substrate composite bed is contacted with the chromium film of mask plate, makes substrate composite bed and mask plate
After being brought into close contact on ultraviolet photolithographic machine exposure-processed；
Development and etching：The good substrate composite bed of exposure-processed is separated with mask plate, then is placed on four by substrate is compound
Make photoresist developing in ammonium hydroxide solution, originally the photoresist with mask plate small salient point contact site retained, its remaining part
Position is corroded and exposes the chromium film layer of lower floor, then is placed in ceric ammonium nitrate solution and does the etching of chromium film, and chromium film below photoresist is protected
Stay, the chromium film at remaining position is etched and exposes the high rigidity glass plate of lower floor, toasted again after etching is good, now substrate is combined
Some columnar projections are formed on layer, columnar projections shape of cross section is identical with small salient point top surface shape, and columnar projections are in substrate
The pattern consistent with mask plate is constituted on composite bed；
Glass etching：Substrate is combined and is placed on acid etching in glass erosion liquid, finally, high rigidity glass plate is contacted with chromium film
Position retains, and remaining position is eclipsed and carves groove；
Removal photoresist：After the high rigidity glass plate acid etching of substrate composite bed, the photoresist above removal chromium film obtains final product throwing
Light tooth.
The substrate that will finally etch just forms burnishing stick one by one by cutting, edging and cleaning.
The burnishing stick that the present embodiment is produced is polished for nail surface, and polishing process causes high effort for, it is polished after
Still there is rough nail texture in nail surface surface, thus the present embodiment burnishing stick be not used to polishing nail and
Polishing nail.Nail polish can not be substituted makes nail bright and clean attractive in appearance.
Embodiment 13
A kind of fingernail polish bar, including substrate and polishing layer, the polishing layer include the polishing tooth of some dense distributions, throw
Light odontoid is six prisms of the axis perpendicular to substrate, and polishing bottom of the tooth portion is integral type with substrate connection.Wherein, polishing tooth footpath to
Breadth Maximum is 255 μm, and the spacing for polishing between cog is 105 μm, and the polishing tooth height is 17 μm.The material of substrate and polishing tooth
It is corning glass, one layer of layers of chrome is covered with polishing tooth crest.
The preparation method of above-mentioned fingernail polish bar, comprises the following steps that：
Mask plate makes：Take one piece of glass plate, by way of sputter coating on its plated surface chromium film, chromium film include with
Chrome green layer on the outside of the layers of chrome and layers of chrome of contact glass sheet, layers of chrome and chrome green layer gross thickness are 150nm, then are led to
Cross laser Nogata formula write on chromium film surface formed some a diameter of 255 μm, each other away from the small salient point for 105 μm, small salient point top
Face is shaped as hexagon, that is, mask plate is obtained；
Processing substrate：One piece of high rigidity glass plate is taken for substrate, it is the corning glass of 4mm that the present embodiment uses thickness,
The chromium film of its surface vacuum plating last layer 100nm, then one layer of photoresist of spin coating on chromium film, obtain substrate composite bed；
Ultraviolet photolithographic：The photoresist of substrate composite bed is contacted with the chromium film of mask plate, makes substrate composite bed and mask plate
After being brought into close contact on ultraviolet photolithographic machine exposure-processed；
Development and etching：The good substrate composite bed of exposure-processed is separated with mask plate, then is placed on four by substrate is compound
Make photoresist developing in ammonium hydroxide solution, originally the photoresist with mask plate small salient point contact site retained, its remaining part
Position is corroded and exposes the chromium film layer of lower floor, then is placed in ceric ammonium nitrate solution and does the etching of chromium film, and chromium film below photoresist is protected
Stay, the chromium film at remaining position is etched and exposes the high rigidity glass plate of lower floor, toasted again after etching is good, now substrate is combined
Some columnar projections are formed on layer, columnar projections shape of cross section is identical with small salient point top surface shape, and columnar projections are in substrate
The pattern consistent with mask plate is constituted on composite bed；
Glass etching：Substrate is combined and is placed on acid etching in glass erosion liquid, finally, high rigidity glass plate is contacted with chromium film
Position retains, and remaining position is eclipsed and carves groove；
Removal photoresist：After the high rigidity glass plate acid etching of substrate composite bed, the photoresist above removal chromium film obtains final product throwing
Light tooth.
The substrate that will finally etch just forms burnishing stick one by one by cutting, edging and cleaning.
The burnishing stick that the present embodiment is produced is polished for nail surface, although the nail surface surface after polished is not
There is rough nail texture, but its feel is coarse, it is matt, and in bruting process, polishing tooth depth spend it is shallow, usually
The gap of polishing between cog is filled with due to nail chip, burnishing stick just cannot polish, it is necessary to could be after after clearing up after for a period of time
It is continuous to use, in-convenience in use.Therefore although the burnishing stick of the present embodiment can be used for nail of polishing, but cannot be used for polishing nail,
Nail polish can not be substituted makes nail bright and clean attractive in appearance.
Present inventor has done substantial amounts of experiment to the shape of fingernail polish bar, size and material, herein not example one by one
Lift, be only exemplified by above-mentioned 13 more typical implementation methods.
Fingernail polish bar in embodiment 3~11 can be polished to nail, and substituting nail polish makes nail gloss bright
Beautiful, it is to avoid human body is injured by nail polish and cleaner, the burnishing stick polishing effect wherein in embodiment 5~8 is especially good, real
The burnishing stick polishing effect for applying example 3 is more general, and the burnishing stick polishing effect of embodiment 9,11 is preferable, the burnishing stick of embodiment 10
Polishing effect is fine.
Embodiment 1 can be drawn with other embodiment comparative analysis, because the distance that between cog is polished in embodiment 1 is excessive,
When polishing tooth acts on nail surface, its edge corner angle is too deep in the cutting depth of nail surface, produces nail surface and draws
Trace, makes the coarse tarnish of nail, therefore can not substitute nail polish makes nail gloss beautiful.By embodiment 2 and other embodiment pair
Can be drawn than analysis, too small due to polishing tooth diameter in embodiment 2, polishing tooth edge corner angle are difficult to act on nail surface and carry out
Cutting, therefore can not substitute nail polish makes nail gloss beautiful.Likewise, because polishing between cog spacing is too small in embodiment 12,
Polishing tooth edge corner angle are excessively shallow in the cutting depth of nail surface, almost negligible to disregard, it is impossible to which that nail is processed by shot blasting,
Therefore nail polish can not be substituted makes nail gloss beautiful.Tooth diameter is polished in embodiment 13 excessive, due to acting on nail surface
Particle it is not careful enough, therefore cause the coarse tarnish of nail surface feel for polishing, it is impossible to which substituting nail polish makes nail light
Pool is beautiful.
In sum, can be drawn with reference to a large amount of repetition tests and embodiment 1~13 of present inventor, work as polishing
Tooth footpath is 150~250 μm to Breadth Maximum, and when the spacing for polishing between cog is 80~150 μm, fingernail polish bar can enter to nail
Row polishing, makes nail surface bright and clean beautiful, reaches manicure effect, and alternative nail polish makes human body from nail polish and cleaner
Infringement, ensure nail it is attractive in appearance while protect health.Wherein, when polishing tooth footpath is 180~220 to Breadth Maximum
μm, when the spacing for polishing between cog is 100~110 μm, the polishing effect of fingernail polish bar reaches most preferably, glossiness after fingernail polish
Very good, aesthetics is high, is suitably widely popularized in manicure field and used.
Above-described specific embodiment, has been carried out further to the purpose of the present invention, technical scheme and beneficial effect
Describe in detail, should be understood that and the foregoing is only specific embodiment of the invention, be not intended to limit the present invention
Protection domain, all any modification, equivalent substitution and improvements within the spirit and principles in the present invention, done etc. all should include
Within protection scope of the present invention.
Claims (15)
1. a kind of fingernail polish bar, it is characterised in that including substrate (1) and polishing layer (2), the polishing layer (2) is including some
The polishing tooth (3) of dense distribution, the bottom of polishing tooth (3) is fixed on substrate (1).
2. a kind of fingernail polish bar according to claim 1, it is characterised in that the polishing tooth (3) is perpendicular in substrate
Cylindricality, polishing tooth (3) radial direction Breadth Maximum is 150~250 μm, and the spacing between polishing tooth (3) is 80~150 μm.
3. a kind of fingernail polish bar according to claim 1, it is characterised in that the polishing tooth (3) is perpendicular in substrate
(1) cylindricality, polishing tooth (3) radial direction Breadth Maximum is 180~220 μm, and the spacing between polishing tooth (3) is 100~110 μm.
4. a kind of fingernail polish bar according to any one of claims 1 to 3, it is characterised in that the polishing tooth (3) is high
Spend is 18~22 μm.
5. a kind of fingernail polish bar according to any one of claims 1 to 3, it is characterised in that polishing tooth (3) shape
Shape is the one kind in cylinder, quadrangular, six prisms and triangular prism.
6. a kind of fingernail polish bar according to any one of claims 1 to 3, it is characterised in that polishing tooth (3) bottom with
Substrate (1) connects as one formula.
7. a kind of fingernail polish bar according to any one of claims 1 to 3, it is characterised in that the substrate (1) and throw
The material of light tooth (3) is glass.
8. a kind of fingernail polish bar according to any one of claims 1 to 3, it is characterised in that the substrate (1) and throw
The material of light tooth (3) is the one kind in blue or green glass, ultra-clear glasses and corning glass.
9. a kind of fingernail polish bar according to claim 1, it is characterised in that polishing tooth (3) top is covered with a layer
Layers of chrome.
10. the preparation method of a kind of fingernail polish bar as any one of claim 1~9, it is characterised in that including with
Lower processing step：
Mask plate makes：Take one piece of glass plate (41), chromium film (42) on its plated surface, by laser direct-writing in chromium film surface shape
Into some a diameter of 150~250 μm, each other away from the small salient point (43) for 100~150 μm, that is, mask plate (4) is obtained；
Processing substrate：One piece of high rigidity glass plate is taken for substrate (1), last layer chromium film (51) is plated in its surface vacuum, then in chromium
One layer of photoresist (52) of spin coating, obtains substrate composite bed (5) on film (51)；
Ultraviolet photolithographic：After substrate composite bed (5) and mask plate (4) are brought into close contact on ultraviolet photolithographic machine exposure-processed；
Development and etching：The good substrate composite bed (5) of exposure-processed is separated with mask plate (4), then substrate composite bed (5) is put
Make photoresist developing in tetramethyl ammonium hydroxide solution, then be placed in ceric ammonium nitrate solution and do the etching of chromium film, after etching is good
Toast again, some columnar projections are now formed on substrate composite bed (5), and columnar projections are constituted on substrate composite bed (5)
The pattern consistent with mask plate (4)；
Glass etching：Substrate composite bed (5) is placed in acid etching in glass erosion liquid；
Removal photoresist：After the high rigidity glass plate acid etching of substrate composite bed (5), the photoresist (52) above removal chromium film.
11. a kind of preparation methods of fingernail polish bar according to claim 10, it is characterised in that the mask plate makes
In technique, chromium film (42) includes the chrome green layer on the outside of the layers of chrome contacted with glass plate (41) and layers of chrome, layers of chrome and three oxygen
Change two layers of chrome gross thickness for 150nm, and layers of chrome and chrome green are plated on glass plate (41) by way of sputter coating.
A kind of 12. preparation methods of fingernail polish bar according to claim 10, it is characterised in that the small salient point (43)
Top surface shape is the one kind in circle, rhombus, hexagon and triangle.
A kind of 13. preparation methods of fingernail polish bar according to claim 10, it is characterised in that the high rigidity glass
Plate is the one kind in blue or green glass, ultra-clear glasses and corning glass.
A kind of 14. preparation methods of fingernail polish bar according to claim 10, it is characterised in that the high rigidity glass
Plate thickness is 2~4mm.
A kind of 15. preparation methods of fingernail polish bar according to claim 10, it is characterised in that the substrate composite bed
(6) chromium film (51) thickness on is 100nm.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201611190796.7A CN106723871A (en) | 2016-12-21 | 2016-12-21 | A kind of fingernail polish bar and preparation method thereof |
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| CN201611190796.7A CN106723871A (en) | 2016-12-21 | 2016-12-21 | A kind of fingernail polish bar and preparation method thereof |
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Cited By (1)
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| CN109290895A (en) * | 2017-07-25 | 2019-02-01 | 东华制冷希恩思株式会社 | Exfoliating instrument and its manufacturing method |
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