CN106715346A - Method for producing an optical glass element - Google Patents
Method for producing an optical glass element Download PDFInfo
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- CN106715346A CN106715346A CN201580048730.1A CN201580048730A CN106715346A CN 106715346 A CN106715346 A CN 106715346A CN 201580048730 A CN201580048730 A CN 201580048730A CN 106715346 A CN106715346 A CN 106715346A
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- Prior art keywords
- impressing
- imprint master
- imprint
- impressing material
- sintering
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Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
- C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
- G02B3/0031—Replication or moulding, e.g. hot embossing, UV-casting, injection moulding
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Glass Compositions (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Glass Melting And Manufacturing (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The invention relates to a method for producing an optical glass element (13) having the follow sequence: a) applying a liquid stamping mass (4) to a stamp (1), b) stamping the stamping mass (4) at a temperature less than 500 DEG C, c) curing the stamping mass (4), d) sintering the stamping mass (4, 4') and thereby performing the primary shaping of the optical glass element (13). The stamping mass can have one of the following components: polyhedral oligomeric silsesquioxane POSS, polydimethylsiloxane PDMS, tetraethyl orthosilicate TEOS, or poly(organo)siloxane silicone. The invention further relates to an optical glass element produced by means of the method, to a device for performing the method, and to a use of said device.
Description
The present invention relates to a kind of method and apparatus of lanthanum element, optical glass device and this use
In the purposes of the device of manufacture optical glass device.
Prior art
In recent years, the increasingly miniaturization of electronics and optical component is had occurred that.Especially, with increasing electronics
With the so-called mobile device of optical function scope, the i.e. electronic equipment of smart phone, mobile phone, notebook and panel computer
It is the driving force of this development behind.Optical element is made up of at least one lens, but is generally made up of multiple lens, these
Lens overlie one another and project light beams upon on imageing sensor.In this case, the quality of optical element must most be received
Pay attention to, to obtain clear and undistorted image as far as possible.
In principle, the optical element for visible light can be by glass, particularly by SiO2Or be made up of polymer.
Mainly due to its excellent optical characteristics, main is that, due to its refractive index, glass is particularly suitable for manufacturing this lens.
However, up to the present, for mobile device lens still mainly by polymers manufacturing.Polymer simply leads to
Cross imprint process and specific die is embossed into required lens shape, therefore still represent so far for lens manufacture
Preferred material.Additionally, injection molding technology is still widely used in the manufacture of this lens.
There are the two big manufacturing process organized for mass producing optical element.
First manufacturing process allows the impressing of multiple optical elements in single imprint step.This group of manufacturing process again can be with
It is divided into the subgroup of manufacturing process, it needs bearing substrate to imprint multiple individually optical elements and can be completely left out thereon
The subgroup of bearing substrate because optical element be completely continuous (zusammenh ngenden) and in imprint step two
A part manufactured between individual die, so-called monoblock type substrate.Monoblock type substrate it should be understood that for impressing product, wherein
The optical element of all impressings is connected to each other and forms the big continuous field of optical element.Because optical element is mainly
Mirror, and most of substrate is circular, therefore in most cases impressing product is referred to as monoblock type lens panel.
In second group of manufacturing process, multiple optical elements are not manufactured by single imprint step, but by institute
Meaning-Step-and-repeat technique individually produces.By the manufacturing process, the impressing of multiple individually optical elements is possible.
Optical element is not connected to each other.In most cases, optical element is directly imprinted at
On bearing substrate.Optical element can also keep closely being connected with bearing substrate, and thus bearing substrate obtains function spy
Property.Then the free space in separating technology between optical element cuts bearing substrate.After separating technology, obtain many
The composite optic element that the individual optical element by bearing substrate part and impressing thereon is constituted.However, in the patent document
Such manufacture method and resulting product are not discussed in more detail.
In the 3rd group of manufacturing process, impression materials are individually applied on multiple positions of bearing substrate.Hereafter carry out
Full surface imprint technique, although each impressing material is embossed into respective shape by it, the combination for not causing impressing to be expected.Thus may be used
To manufacture multiple optical elements simultaneously on bearing substrate.Highly precisely described in publication WO2013/178263A1
This technique.
Glass is actually interpreted as being changed into the amorphous of its glassy state by specific manufacturing process, sometimes
It is the very wide in range and general material class of the material of partially crystallizable.
Although being used for optical device such as camera, telescope from glass manufacture macroscopic view optical element, particularly lens
(Feldstecher) manufactured or telescope (Teleskope) is no longer in principle big challenge, but correspondingly very by glass
Small lens are still very problematic.Its reason is essentially consisted in, and larger optical element is main to be ground by parison.Therefore,
Shaping by stock removal (Formgebung) is mainly carried out under cold state.However, this of optical element, particularly lens is formed in milli
It is almost infeasible in rice or micrometer range.Additionally, too expensive for the common manufacturing method of the lens in modern comfort.Separately
Outward, semiconductor-, in electronics and optics industry, already mentioned monoblock type substrate, therefore be that the substrate of continuous optical element is
Preferably.It is also extremely difficult that this integral glass substrate is manufactured with conventional method.It is contemplated that corresponding using processing
Full-automatic micro- milling cutter of parison.However, the technique has too small output, and be therefore not suitable for large-scale production.
Additionally, the surface of the optical element on glass substrate will be too coarse.Extreme roughness negatively affects the optics of optical element
Characteristic, and therefore should avoid in principle or be minimized by.
However, in the industry, there is the suitable large-scale manufacturing process of integral glass substrate.However, this is to be based on
Etching technique, rather than based on machine-building.In more fully hereinafter illustrating the prior art on the etching technique, to show
How complicated the current manufacture of integral glass substrate is, produces intensive (aufwendig) and expensive.
First step by step in, the coating of selected glass substrate is carried out with metal level.Second step by step in, then
With photosensitive paint coating metal layer, its 3rd step by step in must correspondingly structuring by mask and photoetching process.Hereafter, exist
Photosensitive paint is removed by chemical reagent at desired position, so that metal level exposes.The 6th step by step in, carry out structure turn
Print then removes photosensitive paint to metal level.Metal level now acts as the mask of the structuring for script glass substrate.Then use
Relatively toxic chemistry etches glass substrate.In last processing step, the removal of metal level is finally carried out, most
Again by other chemical reagent in the case of number.
Necessary processing step for this glass substrate of structuring is extremely to produce intensive, time intensive, expensive,
And mainly due to abnormally dangerous and poisonous and very harmful to environment chemical reagent.In addition, there is many step by step
This complicated technique be highly susceptible to error.
In a word, it is adapted to large-scale technique it can be concluded that not existing it is noted that being particularly still in the prior art,
For manufacturing integral glass substrate, particularly integral glass lens panel, its can cost-effectively, it is uncomplicated ground and
Implemented using chemistry as few as possible.
It is therefore an object of the present invention to provide a kind of improved method of lanthanum element.
The content of the invention
The purpose is realized by the inventive method according to claim 1.
Favourable extension implementation method of the invention is given in the dependent claims.Specification, claim and/or
At least two all combinations in the feature be given in accompanying drawing also fall within the scope of the present invention.In the scope of given value
In, it is disclosed that the value in above-mentioned boundary also should be used as boundary value, and should can be claimed with any combinations.
The present invention relates to one kind for manufacturing an optical glass device, the particularly method of multiple optical glass devices,
With following process sequence：
A) liquid impressing material is applied in imprint master, particularly on the substrate of imprint master surface and/or imprint master,
B) the impressing material at a temperature of less than 500 DEG C,
C) hardening impressing material,
D) sintering impressing material, and thus make optical glass device, particularly multiple optical glass device preliminarily formings.
According to the present invention, step a, b, c and d especially occur in succession in time.In a specific implementation method,
Step c and d can be carried out particularly in same equipment simultaneously.This is especially for situation about can be expected with the impressing of thermmohardening.
It is preferred that specify, in step b）In less than 400 DEG C, preferably smaller than 300 DEG C, more preferably preferably smaller than 200 DEG C, also more preferably
Most preferably preferably imprinted at a temperature of preferably smaller than 100 DEG C and at room temperature.Use room temperature（Also referred to as room temperature）To refer at 10 DEG C
And between 30 DEG C, the temperature particularly between 15 DEG C and 25 DEG C.Impressing can advantageously at relatively low temperatures, particularly
Carry out at room temperature, which considerably simplifies impressing.
Further preferably specify, in step a）Afterwards, the coverage rate on imprint master surface is more than 20%, preferably greater than
40%, more preferably preferably greater than 60%, most preferably preferably greater than 80%, most preferably preferably 100%.
According to another preferred embodiment, impressing material is applied to impressing print in the form of multiple small scattered drops
In mould surface.Hence it is advantageous to can realize that the especially uniform distribution or manufacture of impressing material side by side but are separated from each other each other
Multiple optical elements.
Further preferably specify, in step b）In by imprint master, particularly descend imprint master and another imprint master,
Particularly go up the close impressing imprint material of imprint master.Especially, could dictate that, impressing material is applied from above pushing
On print die, and upper imprint master is close to lower imprint master from top.Upper imprint master and/or lower imprint master can be with can
Mobile mode, particularly builds parallel to vertical line mode.
Especially it can be stated that in step c）In by thermal means carry out imprint material hardening, wherein transferring heat to pressure
Print material, wherein the polymerization process for imprinting material starts in more than critical-temperature Tk.In this case, critical-temperature at 0 DEG C and
Between 1000 DEG C, preferably between 10 DEG C and 750 DEG C, even more preferably between 20 DEG C and 500 DEG C, most preferably at 30 DEG C and 250
Between DEG C, most preferably between 50 DEG C and 200 DEG C.
As an alternative, it can be stated that the hardening of impressing material can be in step c）In carried out by electromagnetic method, its
In, by electromagnetic radiation, particularly UV light irradiations impressing material, wherein, the wave-length coverage of electromagnetic radiation 1nm and 10,000nm it
Between, preferably between 10nm and 1000nm, more preferably preferably between 100nm and 500nm, most preferably preferably 200nm and 500nm it
Between.
According to another preferred embodiment, step a）、b）And c）Carried out in imprinting apparatus, and step d）In burning
Knot is carried out in the sintering equipment separated with imprinting apparatus, is preferably provided at outside imprinting apparatus.As such, it is advantageous to can be parallel
Processing.Especially, multiple substrates can be simultaneously heat-treated in sintering furnace.By being heat-treated multiple substrates in sintering furnace, can
Advantageously quickly to carry out the manufacture of glass elements or multiple glass elements.
Further preferably specify, in step d）In sintering carried out by microwave.As an alternative, Ke Yigui
It is fixed, in step d）In be sintered in stove, carried out preferably in continuous furnace, wherein sintering when temperature be more than 50 DEG C, it is excellent
Choosing is more than 100 DEG C, more preferably preferably greater than 300 DEG C, also more preferably preferably greater than 500 DEG C, is particularly preferred more than 700 DEG C, optimal excellent
Choosing is more than 900 DEG C.
According to another preferred embodiment, it is stipulated that, impressing material is with least one in following components and/or with the following group
The combination for dividing：
Polyhedral oligomeric silsesquioxane（POSS）、
Dimethyl silicone polymer（PDMS）、
Tetraethyl orthosilicate（TEOS）、
Poly- (organic) siloxanes（Silicone）.
The invention further relates to a kind of with the optical glass device manufactured according to the method for one of aforementioned embodiments.
The invention further relates to a kind of device for implementing the method according to one of aforementioned embodiments.
The invention further relates to the purposes of the device lanthanum element according to one of aforementioned embodiments.
The present invention be more particularly directed to a kind of method for manufacturing optical element（Method）, the optical element is by glass（Optics glass
Glass element, is particularly built with monoblock type substrate）, particularly glass lens, particularly preferred integral glass lens substrate pass through
Impressing (Imprint) technique is particularly carried out at room temperature at a temperature of less than 500 DEG C.
According to the present invention, glass is especially interpreted as the glass-ceramic being made up of silica and its various variant
(Abwandlungen)。
In this case, the present invention is based on using and particularly can at room temperature be shaped at a temperature of less than 500 DEG C
Impressing material idea, the impressing material can by chemistry and/or physical process be converted at least close to pure silica.
The reduction of an importance of the invention particularly surface roughness, particularly targetedly controllable reduction, and thus increase
The glass lens quality of integral glass lens substrate is added.Additionally, especially, disclosing for particular by microwave sintering pressure
The effective ways of print material or substrate.
According to the present invention, sintering should be expressly understood that as the impressing material of particularly viscosity changes into hard cross-linked material.
Sintering process is specifically resulted in corresponding highdensity very closely knit material.Sintering process is characterised by impressing
The physically and/or chemically conversion of material.In the case of chemical conversion, sintering process especially along with the generation of gas, gas from
Sintered body is discharged, to obtain the closely knit final products especially in the absence of defect.Due to most of impressing material by organic and/or
Organic-silicate material composition, sintering process is often associated with the generation of carbon dioxide and/or carbon monoxide and/or water.In addition,
It is preferred that before sintering process and/or period, be added to impressing material gas and/or additive evaporation or otherwise from
Removed in impressing material.According to the present invention, before sintering process, at the latest, during sintering process, and at the latest just sintered
Before journey terminates, this additive and/or all gas produced during the inventive method are preferably removed, so as in the present invention
Unwanted product, particularly gas are not retained in final products, this is probably the reason for hole is formed.Sintering process preferably with pressure
The reduction of the residual stress in print material or final products is combined.Therefore, the parameter of sintering process is especially so selected so that most
Residual stress in finished product, particularly monoblock type lens panel has specific residual stress.
Referred to room temperature between 10 DEG C and 30 DEG C, particularly the temperature between 15 DEG C and 25 DEG C.
Therefore, optical glass device, particularly monoblock type are manufactured by using impressing material the present invention be more particularly directed to one kind
The method of glass substrate, the material can be imprinted at a temperature of less than 500 DEG C, particularly room temperature, and by subsequent heat
Treatment be converted at least close to pure glass, particularly silica.
In other words, using impressing material, particularly low-viscosity gel, it passes through subsequent processing step just to the inventive method
Especially it is converted into silica or silica.Thus, advantageously, according to the present invention can cost-effectively, rapidly and fit
Degree ground manufactures optical glass device using chemical reagent.
Optical glass device particularly glass lens, particularly preferred integral glass lens panel.Although in subsequent text
Integral glass substrate is mentioned in this, but idea of the invention can be used for manufacturing single optics on bearing substrate
Element, especially by Step-and-repeat technique.Additionally, the inventive method is not limited to use chemical reagent, therefrom by this hair
Bright method forms glass, particularly silica.Embodiments of the present invention more can be applied to imprint at low temperature simultaneously
And all types of chemical reagent of chemical conversion are carried out by chemistry and/or physical process, particularly heat treatment.
Die
In order to imprint the impressing of material（Structuring）, it is necessary to specific imprint master.Imprint master must is fulfilled for high wanting
Ask so that their micron-scale and the structure of nano-scale can be transferred to impressing using zero defect as negative film (Negativ)
In material.In principle, made a distinction between embossing seal mould and soft die.Embossing seal mould is especially made up of metal, glass or ceramics.It
Be unlikely to deform, it is corrosion-resistant and wear-resisting.The surface of embossing seal mould processes especially by beamwriter lithography or laser beam lithography.Embossing seal mould
Advantage essentially consist in wearability high.Especially, soft die is molded into the negative film of embossing seal mould.It is especially by polymer structure
Into with elastic and low bending strength high.It is particularly entropic elasticity（Caoutchouc elasticity）.Reason is mainly impressing material and soft print
The expansion (Aufschwellen) of adhesion high and/or soft die between mould.Soft die can be by different chemistry, physics
Opened with embossing seal mode discrimination with technical parameter.It is contemplated that the differentiation based on elastic behavior.Soft die have be based primarily upon entropic elasticity
Deformational behavior, embossing seal mould have be based primarily upon can elasticity deformational behavior.In addition, the die of both types can for example lead to
Their hardness is crossed to distinguish.Hardness is the resistance of material resistance press-in body.Because embossing seal model is not made up of metal or ceramics,
Therefore they have corresponding hardness number high.In the presence of the various possible method of the hardness for providing solid.It is a kind of very common
Method is to provide hardness according to Vickers.Embossing seal mould can especially have the Vickers hardness more than 500HV.
For the demoulding particularly advantageously the hydrophobicity stamp surfaces of an advantageous embodiment of the invention and
Imprint the combination of the hydrophobic surface of material.Hydrophily is interpreted as the interaction ability high of material surface and water.Hydrophily
Surface is mainly polarity, and fairly good the permanent dipole with fluid molecule interacts, and is preferably interacted with water.
The hydrophily on surface especially quantifies by contact-angle measurement instrument.In this case, water-wetted surface has very small
Contact angle.If impressing material of the invention must have hydrophilic surface, so as to de- from die as simply as possible
Mould, then should be applicable according to following range of value of the present invention：Hydrophilic surface has less than 90 °, preferably smaller than 60 °, more preferably excellent
Choosing is less than 40 °, also more preferably preferably smaller than 20 °, optimal preferably smaller than 1 ° of contact angle.
Hydrophobicity is correspondingly interpreted as the small interaction ability of material surface and water.The main right and wrong of hydrophobic surface
Polarity, and hardly interacted with the permanent dipole of fluid molecule.If in an embodiment of the invention, root
There is hydrophobic surface according to impressing material of the invention, so as to as simply as possible from stamp removal, then according to the present invention
Following range of value should be applicable：Hydrophobic surface has more than 90 °, preferably greater than 100 °, more preferably preferably greater than 120 °, also more
Good preferably greater than 140 °, optimal preferably greater than 160 ° of contact angle.
Impressing material
Idea of the invention is especially to use the specific impressing material for existing as liquid at room temperature.Impressing material
Particularly aqueous colloidal dispersion.Aqueous colloidal dispersion is interpreted as two kinds of uneven mixtures of material, wherein in the quantity of particle
Less amount of substance is located in the size range between about 1nm and 500nm.Impressing material exists as liquid at room temperature, and
Can be polymerized especially by the effect of photon, free radical, heat, acid and/or alkali lye by chemistry and/or physical process.
Impressing material can especially have silicon and oxygen.These impressing material can become without problems due to their liquid state of aggregation
Shape, and therefore can also be stamped.After successful deformation, liquid impressing material is converted into solid, especially turns in this case
Turn at least close to pure silica or silica.
The present invention specifically now is based on saturating for manufacturing multiple glass lens, particularly glass using corresponding impressing material
The idea of mirror disk.In this case, impressing material is stamped and therefore correspondingly structuring under its liquid condition.Hereafter it is
Special underground heat and/or the hardening process produced by photon, wherein there is the first crosslinking of impressing material.By the cross-linking process,
Impressing is expected dimensionally stable.After shape stability is realized, die can be removed from impressing material.
Therefore, in addition to manufacture method, invention further describes the impressing material for imprint lithography and according to this hair
The application/use of bright impressing material.Impressing material is especially characterized with following mixture：At least one key component, preferably
It is made up of inorganic and/or organic moiety, and at least one accessory constituent for being preferably organic component, it is particularly suitable for/is used for set
The property of the interaction of level pressure print material and water.Key component is interpreted as causing finally to imprint the foundation of shape with significant extent
Component.Accessory constituent is interpreted as the every other component mixed with key component, particularly including by it according to the present invention
Setting/influence hydrophily or hydrophobic those organic components, initiator and solvent.Impressing material therefore can also be by multiple main
Component and/or multiple accessory constituent compositions.Accurate description according to currently preferred impressing material is in such as patent document PCT/
Found in EP2013/062711, its disclosure on impressing material should be understood that in income specification of the invention.However, former
Then go up, it is suitable that can be generated by it all material of glass.
Therefore, above-mentioned impressing material is the preferred impressing material for producing integral glass substrate.It will also be appreciated that using appoint
What its suitable material.
It is preferred embodiment that impressing impressing material is monoblock type substrate at room temperature.Moulding process sheet is in being less than
500 DEG C, preferably smaller than 400 DEG C, more preferably preferably smaller than 300 DEG C, optimal preferably smaller than 200 DEG C, optimal preferably smaller than 100 DEG C of temperature
Under degree, preferably occur at room temperature.Then so obtained monoblock type substrate is heat-treated.Heat treatment is sintering process,
Wherein impressing material is compressed.Sintering process can expect occurred before or after the imprint master demoulding in impressing.However, excellent
Selection of land, moulding process and heat treatment are separated from each other, to realize the increase of output.It is therefore especially preferred that ground, Embosser is only
For imprinting, and the monoblock type substrate for imprinting burns in outside Equipment for Heating Processing, particularly stove in particularly preferred continuous furnace
Knot.In this case, sintering process is preferably greater than 100 DEG C, more preferably preferably greater than 300 DEG C, optimal preferably big more than 50 DEG C
It is optimal to be preferably greater than generation at a temperature of 700 DEG C, most preferably greater than 900 DEG C in 500 DEG C.
Sintering is carried out preferably in Equipment for Heating Processing.One quite preferred embodiment in, Equipment for Heating Processing be tool
There is the equipment of microwave source.In this case, glass elements to be sintered or monoblock type substrate with can by microwave-excitation and
Contacted by the component of heating using microwave so that monoblock type substrate is heated and sinters.It is particularly preferred that the component be it is upper and/or
Lower imprint master.Thus, according to the present invention, disclose a kind of equipment closely, its be suitable for impressing monoblock type substrate with
And it is sintered by the effect of microwave.Alternatively, as long as impressing material directly by microwave-excitation can then be contemplated that
Monoblock type substrate is directly heated by microwave.
Another particularly preferred process of the invention occurs during the sintering process of impressing material.In this state
Under, there is the contraction of the monoblock type substrate of impressing.However, due to being mainly amorphous microstructure, contraction equably occurs.
The difference of the ratio between the volume and initial volume after numeral 1 and contraction is referred to as contraction factor f.To be multiplied by 100 contraction because
Son is referred to as shrinkage factor.Therefore, the shrinkage factor before sintering is 0%.According to the present invention, exist using two kinds of shrinkage factor it is different can
The method of energy.
In an exemplary embodiments of the present invention, by the corresponding of correct selection impressing material and sintering process
Parameter, keeps as low as possible by shrinkage factor.
First, the substrate of particularly monoblock type is produced, its shrinkage factor is less than 2%, preferably smaller than 1%, even more preferably less than
0.1%, more preferably less than 0.01%, more preferably less than 0.001%.Due to the low percent shrinkage factor, particularly monoblock type
Substrate preferably do not have differences different from die shape or only very small.Therefore, according to the present invention, even if being set in die
Timing is shunk also without consideration.Therefore, advantageously significantly simplify manufacturing process.
Another preferred embodiment in, shrink for make monoblock type substrate surface smooth.Impressing material is in sintering
During significantly compressed by contraction process.On the one hand compression is based on the release gas process of possible substitution base, but
On the other hand, and mainly it is based on chemical crosslinking process.Due to cross-linking process, atom is mutual by forming covalent chemical bond
Finally (endg ü ltig) and the main equably simultaneously therefore similarly crosslinking on all directions in space.It is mainly very strong
This network that is formed of the silicon-oxygen compound density that causes impressing to be expected increase and actually change into solid, at least mainly contain
The material glass of silica.The compression process not only occurs in the inside of impressing material but also in its surface.Thus injustice is made
Whole correspondingly to smooth, this causes the raising of the quality of the optical element being present on monoblock type substrate.Optical element, particularly thoroughly
The surface of mirror is more coarse, and the diffusion share for scattering light is bigger, and this does not contribute to desired optical imagery completely.Thus photonic throughput
Decline with the increase of roughness.In the case of lens, this causes the contrast of image to reduce, and it is mounted after the lens
The image recording sensor in face and further treatment.By contraction process that is of the invention and targetedly utilizing and companion
With its optical element, particularly lens surface it is smooth, be improved intensity results.
A particular aspect of the invention is to remove the institute that should not exist in impressing material such as monoblock type substrate
Have compound, particularly before sintering process and/or period produce gas and/or additive.In work of the invention
After skill terminates, the ultimate density of these gases and/or additive is particularly less than 100ppm, less than 10ppm, more preferably less than
1ppm, even more preferably less than 100ppb, more preferably less than 1ppb.
It is according to another aspect of the present invention the specific settings of the residual stress in impressing material.After sintering process, impressing
Residual stress in material is also more excellent preferably between 500MPa and -500MPa especially between 1000MPa and -1000MPa
It is selected between 250MPa and -250MPa, most preferably from about 0MPa.Compression represents that tension is represented with positive sign with negative sign.It is preferred that
Ground, impressing material therefore the without residual stress after sintering process.The sintered products of without residual stress are not easily susceptible to the damage of residual stress
Evil.However, sometimes, it may be desirable to or need to introduce residual compressive stress, it is that may be present from outside in a situation of use to offset
Additional drawing load.In such circumstances it is desirable to it is more than -100MPa, preferably greater than -250MPa, also more preferably more than -
500MPa, the compression of also more preferably more than -1,000MPa.Residual stress can be especially by heat affecting and by corresponding
Thermal profile sets in sintering and cooling afterwards.
Further advantage of the invention, feature and details manifest from the following description of preferred embodiment and by accompanying drawing.
Figure below shows：
The schematic cross section of the first processing step of one illustrative embodiments of Fig. 1 a the inventive method,
The schematic cross section of the second processing step of one illustrative embodiments of Fig. 1 b the inventive method,
The schematic cross section of the 3rd processing step of one illustrative embodiments of Fig. 1 c the inventive method,
The schematic cross section of the 4th processing step of one illustrative embodiments of Fig. 1 d the inventive method,
The schematic cross section of the 5th processing step of one illustrative embodiments of Fig. 1 e the inventive method,
Fig. 2 according to a schematic cross section for the optical glass device of illustrative embodiments,
Fig. 3 a before sintering process, according to a schematic cross section for the amplification of the substrate of illustrative embodiments,
Fig. 3 b before sintering process, the schematic cross section of the amplification of the substrate according to another illustrative embodiments,
Fig. 3 c after the firing process, according to a diagrammatic cross-sectional for the amplification of the optical glass device of illustrative embodiments
Face figure.
In various figures, identical part is provided with identical reference all the time, and therefore generally also in every kind of feelings
Only named under condition or referred to once.
Fig. 1 a show the schematic diagram of first processing step according to an illustrative embodiment of the invention, wherein pressing
Print material 4 is distributed on the imprint master surface 1o of lower imprint master 1 by dispersal unit 5.Impressing material 4 can be by so-called water
Hole deposition（English：puddle dispense）Apply.In this case, pressure is deposited on by material 4 is imprinted by dispersal unit 5
On print stamp surfaces 1o, until impressing material 4 covers the major part of imprint master surface 1o.It is further envisioned that in further work
Just realize being completely covered in skill step.Impressing material can be applied especially by spin coating process and/or injection coating processes
Plus.During dispersion, the coverage rate of imprint master surface 1o is more than 20%, preferably greater than 40%, more preferably preferably greater than 60%, most
Good preferably greater than 80%, most preferably preferably 100%.
By further technique, as such as rotary coating（English：spin-coating）, coverage can still increase, or
Impressing thickness of feed layer t of the person on position can be homogenized.It is also contemplated that by spraying coating equipment（English：spray
coater）Impressing material 4 is applied on the 1o of imprint master surface.In another unshowned implementation method, impressing material 4 not as
Puddle applies, but small with multiple, and the form of scattered drop applies, however, it has enough impressing material 4, with
Agglomeration and corresponding monoblock type substrate is formed in technique afterwards.The advantage for applying drop in this case essentially consists in impressing material
4 possibility being evenly distributed.Additionally, the drop of the impressing material 4 by applying droplet distribution can be by subsequent rotation
Coating processes are dispersed on the 1o of imprint master surface and the agglomeration in the processing step.However, being separated from each other to imprint
Optical unit, it is also possible to expect the deposition of single drop.This technique is described in open WO2013/178263A1.
In exemplary second processing step shown in Fig. 1 b, the second imprint master 2 is right in the top of the first imprint master 1
It is accurate.In this case, two alignments of imprint master are preferably by multiple（It is unshowned）In imprint master 1 and 2
Alignment mark is carried out.Two at least two different positions being preferably located on edge as far as possible are each opposed
Alignment mark, it is aligned with each other by corresponding aligning equipment.
In exemplary 3rd processing step shown in Fig. 1 c, by two imprint masters 1 and 2 near being imprinted
The impressing of material 4.In this case, impressing material 4 is pressed into the impressing shape 3 of imprint master 2 and/or lower imprint master 1.
In another exemplary process step shown in Fig. 1 d, the hardening of impressing material 4 is carried out between two imprint masters 1 and 2.
In this case, hardening can or by the change of heat, photon, electric current, chemical reagent such as bronsted lowry acids and bases bronsted lowry or any other type
Learn and/or physical stress is carried out.Heat and electromagnetic method are particularly preferred.
By thermal means, heat is delivered to impressing material 4 by upper imprint master 2 and/or lower imprint master 1.In impressing material 4
Thermal initiator starts the polymerization process of impressing material 4 in more than critical-temperature Tk.In this case, critical-temperature is more than room
Temperature, preferably greater than 100 DEG C, more preferably preferably greater than 200 DEG C, optimal preferably greater than 300 DEG C, most preferably greater than 400 DEG C, most preferably greatly
In 500 DEG C.
In electromagnetic method, impressing material 4 is by strong electromagnetic radiation, particularly UV light irradiations.In this case, electromagnetism
Imprint master 2 and/or lower imprint master 1 on radiation transmission.Therefore, the imprint master 1 and/or imprint master 2 of transmission are for electricity
Magnetic radiation must be transparent.The preferred wavelength range of electromagnetic radiation between 1nm and 10,000nm, preferably in 10nm and
Between 1000nm, more preferably preferably between 100nm and 500nm, most preferably preferably between 200nm and 500nm.
After the hardening of impressing material 4, the Solid imprint material 4 ' of dimensionally stable exists in the form of monoblock type substrate 6.
Monoblock type substrate 6 is re-sintered and converts glass former 7 with by impressing material 4'.Fig. 1 e show the 5th work of illustrative embodiments
Skill step.Sintering is preferably carried out in the outside of imprinting apparatus 8.According to the present invention, therefore it is also carried out moulding process and sintering process
Separation, this can to output produce active influence.That is it is particularly preferred that, imprinting apparatus 8 are always only for impressing, and
And corresponding sintering equipment 9 is only used for sintering.Sintering equipment 9 is, for example, stove, more preferably continuous furnace.It is particularly preferred that
Agglomerating plant 9 uses microwave source 10.Microwave source 10 is used for or directly heats the material 4' or heater of monoblock type substrate 6
11, particularly sample holder 11, its as efficiently as possible with the thermal coupling of monoblock type substrate 6.Thermal coupling or by monoblock type
Substrate 6 exists with the directly contact of component 11 or via the gas for conducting heat as efficiently as possible.It is special real at one
Apply in mode, be probably useful by imprinting apparatus 8 and the combination with one another of sintering equipment 9.Therefore, can be same according to the present invention
Moulding process and sintering process are carried out in individual equipment.
Fig. 2 shows the illustrative embodiments of the optical glass device 13 being made up of multiple optical subelements 12.In spy
In the case of different, optical subelement 12 is biconvex lens.However, optical subelement 12 can also be such as concave-concave, convex-concave or concavo-convex
Lens.Further, it is contemplated that optical subelement 12 is diffraction grating, the optical element of any other type or any other type
Glass component.
Fig. 3 a and 3b each illustrate the enlarged drawing of the exemplary monoblock type substrate 6 before sintering process.Fig. 3 c show
There are the exemplary optics glass elements 13 that are made up of glass material 7 of almost preferable surface 13o after the firing process.
Monoblock type substrate 6 is by dimensionally stable but still unsintered material 4 ' is constituted.Fig. 3 a show the surface 6o's with random rough
The enlarged drawing of monoblock type substrate 6.Fig. 3 b show the enlarged drawing of another monoblock type substrate 6, and it has and ideal form 13o systems
The surface 6o for clearly limiting for deviateing.Surface 6o can for example as imprint master 1 or imprint master 2 impressing shape 3 it is negative
Piece is produced.Can especially specify, although build and the manufacture impressing shape 3 that averagely (im Mittel) is matched with intended shape
Surface 3o, but gradually form their shortrange order.
By contraction process, there is the progressively structure of the smooth or substrate 6 of particularly local (leichten) of surface 6o
6o.Therefore, according to a preferred aspect of the present invention, influence to shrink especially by progressively structuring by the structuring of surface 6o
Process.Preferably, the structuring of surface 6o influences contraction process as follows：Generation surface 13o as smooth as possible "（According to figure
3c）.The skin effect of this smooth compression for being the material 4 ' occurred particularly in whole volume.
List of numerals
1 time imprint master
The imprint master surface of imprint master under 1o
Imprint master on 2
3 impressing shapes
4,4' impressing material
5 dispersal units
6 monoblock type substrates
6o surfaces
7 glass materials
8 imprinting apparatus
9 sintering equipments
10 microwave sources
11 components
12 optical subelements
13 optical elements
13o surfaces
Claims (14)
1. a kind of lanthanum element（13）Method, with following process sequence：
a）In imprint master（1）Upper applying liquid impressing material（4）,
b）The impressing material is imprinted at a temperature of less than 500 DEG C（4）,
c）The hardening impressing material（4）,
d）The sintering impressing material（4,4’）, and thus make the optical glass device（13）Preliminarily forming.
2. method according to claim 1, it is characterised in that in step b）In described be stamped in less than 400 DEG C, preferably
Less than 300 DEG C, more preferably preferably smaller than 200 DEG C, also more preferably it is preferably smaller than at a temperature of 100 DEG C, and most preferably preferably at room temperature
Carry out.
3. method according to any one of the preceding claims, it is characterised in that in step a）Afterwards, the imprint master
（1）Imprint master surface（1o）Coverage rate be more than 20%, preferably greater than 40%, more preferably preferably greater than 60%, it is optimal preferably
More than 80%, most preferably preferably 100%.
4. method according to any one of the preceding claims, it is characterised in that the impressing material（4）Divided with multiple small
The form of scattered drop is applied to the imprint master（1）On, particularly in the imprint master（1）Imprint master surface
（1o）On.
5. method according to any one of the preceding claims, it is characterised in that in step b）In, printed by the impressing
Mould（1）, particularly descend imprint master（1）With another imprint master（2）, particularly go up imprint master（2）Be close to, carry out described
Impressing material（4）Impressing.
6. method according to any one of the preceding claims, it is characterised in that in step c）In, carried out by thermal means
The impressing material（4）Hardening, wherein transfer heat to it is described impressing material（4）, material is imprinted herein（4）Polymerization process critical
More than temperature Tk starts, and said critical-temperature is also more excellent preferably between 10 DEG C and 750 DEG C between 0 DEG C and 1000 DEG C
It is selected between 20 DEG C and 500 DEG C, it is all most preferably between 50 DEG C and 200 DEG C most preferably between 30 DEG C and 250 DEG C.
7. method according to any one of claim 1 to 5, it is characterised in that in step c）In, entered by electromagnetic method
The row impressing material（4）Hardening, wherein it is described impressing material（4）By electromagnetic radiation, particularly UV light irradiations, in this electromagnetic radiation
Wave-length coverage between 1nm and 10,000nm, preferably between 10nm and 1000nm, more preferably preferably 100nm and 500nm it
Between, most preferably preferably between 200nm and 500nm.
8. method according to any one of the preceding claims, it is characterised in that step a）、b）And c）In imprinting apparatus
（8）In carry out, and in step d）In be sintered in and imprinting apparatus（8）Separate, it is preferably provided in imprinting apparatus（8）'s
Outside sintering equipment（9）In carry out.
9. method according to any one of the preceding claims, it is characterised in that in step d）In the sintering pass through
Microwave is carried out.
10. method according to any one of claim 1 to 8, it is characterised in that in step d）In described be sintered in stove
In, carried out preferably in continuous furnace, wherein the temperature during sintering is more than 50 DEG C, preferably greater than 100 DEG C, it is more preferably preferably big
In 300 DEG C, also more preferably preferably greater than 500 DEG C, it is particularly preferred more than 700 DEG C, optimal preferably greater than 900 DEG C.
11. methods according to any one of the preceding claims, it is characterised in that the impressing material（4）With with the following group
At least one in point：
Polyhedral oligomeric silsesquioxane POSS
Polydimethylsiloxane
Tetraethyl orthosilicate TEOS
Poly- (organic) polysiloxane silicone.
A kind of 12. optical glass devices manufactured with method according to any one of the preceding claims（13）.
A kind of 13. devices for implementing the method according to any one of claim 1 to 11.
14. device lanthanum elements according to claim 13（13）Purposes.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102014113854.6A DE102014113854A1 (en) | 2014-09-24 | 2014-09-24 | Method for producing a glass optical element |
| DE102014113854.6 | 2014-09-24 | ||
| PCT/EP2015/069667 WO2016045907A1 (en) | 2014-09-24 | 2015-08-27 | Method for producing an optical glass element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106715346A true CN106715346A (en) | 2017-05-24 |
| CN106715346B CN106715346B (en) | 2020-03-17 |
Family
ID=54064309
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201580048730.1A Active CN106715346B (en) | 2014-09-24 | 2015-08-27 | Method for manufacturing optical glass element |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US10519057B2 (en) |
| EP (1) | EP3197840B1 (en) |
| JP (2) | JP2017534546A (en) |
| KR (1) | KR102382260B1 (en) |
| CN (1) | CN106715346B (en) |
| DE (1) | DE102014113854A1 (en) |
| SG (1) | SG11201702094YA (en) |
| TW (1) | TWI679098B (en) |
| WO (1) | WO2016045907A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110531449A (en) * | 2019-09-03 | 2019-12-03 | 豪威光电子科技（上海）有限公司 | The production method of single side and two-sided microlens array |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102014113854A1 (en) | 2014-09-24 | 2016-03-24 | Ev Group E. Thallner Gmbh | Method for producing a glass optical element |
| DE102020120565A1 (en) | 2020-08-04 | 2022-02-10 | Sick Ag | Photoelectric sensor, glass lens and method of making a glass lens |
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Also Published As
| Publication number | Publication date |
|---|---|
| TWI679098B (en) | 2019-12-11 |
| DE102014113854A1 (en) | 2016-03-24 |
| TW201617195A (en) | 2016-05-16 |
| JP2020097521A (en) | 2020-06-25 |
| SG11201702094YA (en) | 2017-04-27 |
| EP3197840A1 (en) | 2017-08-02 |
| WO2016045907A1 (en) | 2016-03-31 |
| CN106715346B (en) | 2020-03-17 |
| US20170297943A1 (en) | 2017-10-19 |
| KR20170058923A (en) | 2017-05-29 |
| KR102382260B1 (en) | 2022-04-01 |
| JP2017534546A (en) | 2017-11-24 |
| EP3197840B1 (en) | 2019-02-20 |
| US10519057B2 (en) | 2019-12-31 |
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