CN106707695B - 一种基于主动聚焦的实时聚焦方法及装置 - Google Patents
一种基于主动聚焦的实时聚焦方法及装置 Download PDFInfo
- Publication number
- CN106707695B CN106707695B CN201611066229.0A CN201611066229A CN106707695B CN 106707695 B CN106707695 B CN 106707695B CN 201611066229 A CN201611066229 A CN 201611066229A CN 106707695 B CN106707695 B CN 106707695B
- Authority
- CN
- China
- Prior art keywords
- exposure
- band
- axis
- active
- real
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims abstract description 29
- 238000005259 measurement Methods 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 7
- 238000010276 construction Methods 0.000 claims description 6
- 238000005516 engineering process Methods 0.000 description 3
- 238000012634 optical imaging Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70641—Focus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Automatic Focus Adjustment (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201611066229.0A CN106707695B (zh) | 2016-11-28 | 2016-11-28 | 一种基于主动聚焦的实时聚焦方法及装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201611066229.0A CN106707695B (zh) | 2016-11-28 | 2016-11-28 | 一种基于主动聚焦的实时聚焦方法及装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN106707695A CN106707695A (zh) | 2017-05-24 |
CN106707695B true CN106707695B (zh) | 2018-09-21 |
Family
ID=58934016
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201611066229.0A Expired - Fee Related CN106707695B (zh) | 2016-11-28 | 2016-11-28 | 一种基于主动聚焦的实时聚焦方法及装置 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN106707695B (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114384765A (zh) * | 2020-10-22 | 2022-04-22 | 中国科学院微电子研究所 | 一种光刻设备及其状态调整方法、装置 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1421746A (zh) * | 2001-11-28 | 2003-06-04 | 株式会社东芝 | 曝光方法 |
CN103186053A (zh) * | 2011-12-30 | 2013-07-03 | 无锡华润上华科技有限公司 | 一种光刻条件控制方法 |
CN104216241A (zh) * | 2014-09-15 | 2014-12-17 | 江苏影速光电技术有限公司 | 一种基于Keyence实时聚焦方法及装置 |
CN104614952A (zh) * | 2014-12-30 | 2015-05-13 | 江苏影速光电技术有限公司 | 一种基于被动聚焦的实时聚焦方法及装置 |
CN104793465A (zh) * | 2014-01-16 | 2015-07-22 | 上海微电子装备有限公司 | 投影曝光装置 |
-
2016
- 2016-11-28 CN CN201611066229.0A patent/CN106707695B/zh not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1421746A (zh) * | 2001-11-28 | 2003-06-04 | 株式会社东芝 | 曝光方法 |
CN103186053A (zh) * | 2011-12-30 | 2013-07-03 | 无锡华润上华科技有限公司 | 一种光刻条件控制方法 |
CN104793465A (zh) * | 2014-01-16 | 2015-07-22 | 上海微电子装备有限公司 | 投影曝光装置 |
CN104216241A (zh) * | 2014-09-15 | 2014-12-17 | 江苏影速光电技术有限公司 | 一种基于Keyence实时聚焦方法及装置 |
CN104614952A (zh) * | 2014-12-30 | 2015-05-13 | 江苏影速光电技术有限公司 | 一种基于被动聚焦的实时聚焦方法及装置 |
Also Published As
Publication number | Publication date |
---|---|
CN106707695A (zh) | 2017-05-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6469368B2 (ja) | マシンビジョン検査システム及び高速合焦高さ測定動作を実行する方法 | |
CN102896420B (zh) | 对焦位置调整方法、对焦位置调整装置、及激光加工装置 | |
CN1450398A (zh) | 摄象装置以及摄象系统 | |
CN106814546A (zh) | 焦面检测装置、焦面标定方法与硅片曝光方法 | |
KR101751663B1 (ko) | 전자 빔 시스템을 이용한 관심 영역들의 검사 | |
JPH07118440B2 (ja) | 電子ビ−ム描画装置 | |
CN112132891A (zh) | 一种扩大标定空间的方法 | |
CN109525762A (zh) | 大幅面图像获取方法及设备 | |
CN112132890B (zh) | 一种扩大标定空间的数字光栅投影测量系统标定方法 | |
CN101686406A (zh) | 一种标定参数的获取方法和装置 | |
CN115890012A (zh) | 晶圆切割路径生成及激光切割方法 | |
CN106707695B (zh) | 一种基于主动聚焦的实时聚焦方法及装置 | |
CN104781908A (zh) | 图像处理装置、基于自组装光刻技术的图案生成方法以及计算机程序 | |
CN108550171A (zh) | 基于交比不变性的含有八卦编码信息的线阵相机标定方法 | |
CN114029611A (zh) | 一种直接式振镜校正系统及校正方法 | |
CN111932517B (zh) | 余料板材的轮廓测绘方法、装置、电子设备与存储介质 | |
CN102193340A (zh) | 一种投影光刻调焦的图像处理方法 | |
CN210323577U (zh) | 一种基于五棱镜扫描的光学系统自动检焦调焦装置 | |
CN107024185B (zh) | 一种基底面型测量方法及测量装置 | |
CN115278072B (zh) | 一种用于Micro LED检测的自动对焦方法及系统 | |
CN105651699A (zh) | 一种基于面阵相机的动态跟焦方法 | |
KR102117038B1 (ko) | 광-스폿 분포 구조, 표면 형상 측정 방법, 및 노출 시야 제어 값을 계산하는 방법 | |
CN111694226B (zh) | 水平度测量方法和直接式成像设备 | |
CN107544213B (zh) | 光刻机动态调平调焦方法 | |
CN115810055A (zh) | 一种基于平面棋盘格的环形结构光标定方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20200201 Address after: No.85, Torch Road, high tech Zone, Suzhou, Jiangsu Patentee after: SUZHOU WEIYING LASER TECHNOLOGY CO.,LTD. Address before: 518000, Shenzhen, Guangdong, Baoan District province Xixiang Industrial Road, No. 3012, West building, veterans building, two floor Patentee before: CAIZ OPTRONICS CORP. |
|
PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: A real time focusing method and device based on active focusing Effective date of registration: 20210128 Granted publication date: 20180921 Pledgee: Jiujiang Pohu new city investment and Construction Co.,Ltd. Pledgor: SUZHOU WEIYING LASER TECHNOLOGY Co.,Ltd. Registration number: Y2021980000823 |
|
PC01 | Cancellation of the registration of the contract for pledge of patent right | ||
PC01 | Cancellation of the registration of the contract for pledge of patent right |
Date of cancellation: 20230508 Granted publication date: 20180921 Pledgee: Jiujiang Pohu new city investment and Construction Co.,Ltd. Pledgor: SUZHOU WEIYING LASER TECHNOLOGY CO.,LTD. Registration number: Y2021980000823 |
|
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20180921 |