CN106647192A - Exposure equipment - Google Patents
Exposure equipment Download PDFInfo
- Publication number
- CN106647192A CN106647192A CN201710145195.2A CN201710145195A CN106647192A CN 106647192 A CN106647192 A CN 106647192A CN 201710145195 A CN201710145195 A CN 201710145195A CN 106647192 A CN106647192 A CN 106647192A
- Authority
- CN
- China
- Prior art keywords
- exposure
- plane
- light source
- exposure light
- light shield
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70125—Use of illumination settings tailored to particular mask patterns
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention provides exposure equipment. The exposure equipment comprises a plurality of planar exposure photo masks and a light source, wherein a connecting line between the light source and plane centers of the planar exposure photo masks is perpendicular to a plane where the planar exposure photo masks are located; and in addition, the distances from the light source to the plane centers of the respective planar exposure photo masks are equivalent. By adoption of the exposure equipment, multiple substrates can be subjected to exposure by the planar exposure photo masks within a production take-time period; and meanwhile, exposure light rays provided by all light sources can be utilized, so that exposure efficiency can be improved and waste of energy can be avoided.
Description
Technical field
The invention belongs to semiconductor processing technology field, specifically, is related to a kind of exposure sources.
Background technology
Liquid crystal display (Liquid Crystal Display, LCD) is due to frame stabilization, image fidelity, elimination
The advantages of radiation, save space and saving energy consumption, the leading position of plane display field is occupied.TFT-LCD(Thin
Film Transistor-Liquid Crystal Display, Thin Film Transistor-LCD) be current main flow liquid crystal
Display, and thin-film transistor array base-plate (TFT-Thin Film Transistor) and color membrane substrates are its display floaters
Main composition part.The preparation efficiency of array base palte and color membrane substrates is often related to the production section of whole display device
Clap.
In the preparation process of array base palte and color membrane substrates, photoetching process is very important.Current photoetching work
Skill is generally included：Apply photoresist, front baking, exposure, development and rear baking.Wherein, it is after front operation film forming to apply photoresist
Substrate on apply photoresist；Front baking is preheating photoresist, and removes the moisture of photoresist, is increased between photoresist and substrate
Adhesive force；Exposure is irradiated on a photoresist, by photo resist photosensitive by mask plate (or claiming light shield) using exposure light；It is aobvious
Shadow is to be got rid of the photoresist of photosensitive part by developer solution, so as to form required pattern；Afterwards dry be by pattern not
Photosensitive photoetching adhesive curing, while increasing and the adhesive force between substrate.
Exposure sources of the prior art mainly include light source, mask plate and the exposure for providing parallel exposure light
Board etc..In exposure process, the substrate for being coated with photoresist is placed on exposure bench, the parallel exposure light that light source is provided
Vertical irradiation is on substrate after mask plate so as to form the pattern consistent with mask plate.But in existing exposure sources
In, one piece of substrate can only be exposed using one piece of mask plate within a productive temp cycle；Meanwhile, the exposure that light source is provided
Light light only only has a little part to be utilized, and other most of light are all not to be fully used and lose.
Therefore, not only exposure efficiency is low for exposure sources of the prior art, and causes the waste of the energy.
The content of the invention
In order to solve the problems, such as above-mentioned prior art, it is an object of the invention to provide one kind is improving exposure efficiency
While, moreover it is possible to avoid the exposure sources of energy waste.
According to an aspect of the present invention, there is provided a kind of exposure sources, it includes：Multiple plane exposure light shields and a light
Source, the light source with the line of the planar central of the plane exposure light shield perpendicular to the plane exposure light shield place plane,
And the distance of the light source to the planar central of each plane exposure light shield is equal.
Further, the plurality of plane exposure light shield corresponds to each other and is connected, and to surround an accommodation space is formed, described
Light source is arranged in the accommodation space.
Further, the plurality of plane exposure light shield is at least one polygon plane exposure light shield.
Further, the polygon plane exposure light shield is shaped as regular polygon.
Further, the plurality of plane exposure light shield is made into magnetic, makes the plurality of plane exposure light shield
Pass through the mutual adhesive of magnetic in connection.
Further, it is connected by conjunction between two plane exposure light shields being connected to each other, the conjunction is card
Tenon structure, thread gluing band structure or magnetic.
Further, the face shaping of the exposure sources selected from positive tetrahedron, regular hexahedron, regular octahedron, positive 12
One kind in face body, regular dodecahedron and Bark spheroid.
Further, the light source is sphere light source, and the light source is supplied to the light quantity phase of each plane exposure light shield
Together.
Beneficial effects of the present invention：The exposure sources of the present invention can use polylith plane within a productive temp cycle
Exposure light shield is exposed to polylith substrate, while the exposure light that can be provided all of light source, such that it is able to improve exposure
Light efficiency, while avoiding the waste of the energy.
Description of the drawings
By combining the following description that accompanying drawing is carried out, above and other aspect of embodiments of the invention, feature and advantage
Will become clearer from, in accompanying drawing：
Fig. 1 is the schematic perspective view of exposure sources according to an embodiment of the invention；
Fig. 2 is the perspective exploded view of exposure sources according to an embodiment of the invention；
Fig. 3 is the schematic perspective view of exposure sources according to another embodiment of the present invention.
Specific embodiment
Hereinafter, with reference to the accompanying drawings to describing embodiments of the invention in detail.However, it is possible to come real in many different forms
Apply the present invention, and the present invention should not be construed as limited to the specific embodiment that illustrates here.On the contrary, there is provided these enforcements
Example is in order to explain the principle and its practical application of the present invention, so that others skilled in the art are it will be appreciated that the present invention
Various embodiments and be suitable for the various modifications of specific intended application.In the accompanying drawings, in order to understand device, Ceng He areas are exaggerated
The thickness in domain.
In order to be exposed to polylith substrate using polylith mask plate (or claiming exposure light shield) within a productive temp cycle
Light；Meanwhile, it is capable to the exposure light provided all of light source, the invention provides a kind of exposure sources, the exposure sources bag
Include：Multiple plane exposure light shields and a light source, the light source is vertical with the line of the planar central of the plane exposure light shield
In the plane exposure light shield place plane, and the distance of the light source to the planar central of each plane exposure light shield is equal.
The exposure sources that the above-mentioned present invention is provided will be described in detail below.
Fig. 1 is the schematic perspective view of exposure sources according to an embodiment of the invention.
With reference to Fig. 1, according to an embodiment of the invention exposure sources 1 include：Plane exposure light shield 100 and light source 200.
In the present embodiment, it is preferable that the face shaping of exposure sources 1 is regular hexahedron.On this basis, plane exposure light shield 100
Square is shaped as, and the quantity of plane exposure light shield 100 is six.
Additionally, further limiting ground, in the present embodiment, the quantity of light source 200 is one.Light source 200 and the plane
The line of the planar central of exposure light shield 100 is perpendicular to the place plane of the plane exposure light shield 100, and light source 200 is to respectively
The distance of the planar central of individual plane exposure light shield 100 is equal.So, right respectively using this six plane exposure light shields 100
When each self-corresponding substrate is exposed, the light quantity that light source 200 can be made to be radiated on each substrate is identical.
Preferably, light source 200 is sphere light source, and light source 200 is supplied to the light quantity phase of each plane exposure light shield 100
Together.
With continued reference to Fig. 1, in the present embodiment, six plane exposure light shields 100 correspond to each other and are connected, and to be formed with surrounding
One accommodation space, light source 200 is arranged in the accommodation space.Certainly, as another embodiment of the present invention, six planes expose
Light light shield 100 can be not connected to each other；When this six plane exposure light shields 100 are not connected to, can each be fixed, and six flat
Face exposure light shield 100 is not connected to each other and surrounds to form a square, and light source 200 is arranged at and surrounds the pros to be formed in vivo.
Fig. 2 is the perspective exploded view of exposure sources according to an embodiment of the invention.
See figures.1.and.2, be connected with each other by conjunction 110 between two for being connected to each other plane exposure light shield 100
Connect, wherein the conjunction 110 is arranged at the side of each plane exposure light shield 100.
In the present embodiment, the structure of the conjunction 110 is Fastening tenon structure, i.e., the combination of one public trip and a master card tenon,
By using the Fastening tenon structure, six plane exposure light shields 100 are made to be mutually combined into polyhedron exposure sources 1 as shown in Figure 1.
Used as the other embodiment of the present invention, the conjunction 110 can select thread gluing band structure, or use with magnetic material
Six plane exposure light shields 100 are mutually combined into polyhedron exposure sources 1 as shown in Figure 1 by structure.
Additionally, in the other embodiment of the present invention, be able to can mix when each plane exposure light shield 100 is made
Enter magnetic material to make each plane exposure light shield 100, so when each plane exposure light shield 100 is combined, be connected to each other
Two plane exposure light shields 100 between without the need for arranging conjunction 110 again, it is possible to use plane exposure light shield 100 has in itself
Magnetic, make six plane exposure light shields 100 be mutually combined into polyhedron exposure sources 1 as shown in Figure 1.
Additionally, the polyhedron exposure sources 1 that face shaping is square are the foregoing described, but the present invention is not restricted to
This, the face shaping of such as polyhedron exposure sources 1 can also be positive tetrahedron, regular octahedron, regular dodecahedron, positive 20 face
Body or other suitable regular polygon shapes, accordingly, the shape of each plane exposure light shield 100 can be equilateral triangle or
Regular pentagon etc..
In addition, in the polyhedron exposure sources 1 of above-described embodiment, the shape of each plane exposure light shield 100 is identical,
But the present invention is not restricted to this, for example, can be exposed by polyhedron is constituted with multiple plane exposure light shields 100 of different shapes
Light device 1, is specifically described below.
Fig. 3 is the schematic perspective view of exposure sources according to another embodiment of the present invention.
With reference to Fig. 3, for example, 20 orthohexagonal plane exposure light shield 100A and 12 regular pentagons can be selected
Plane exposure light shield 100B be mutually combined into the Bark spheroid (Bucky Ball) of a positive icosidodecahedron, and light source (does not show
Go out) be arranged at face shaping in Bark spheroid exposure sources 1A in.Multiple plane exposure light shield 100A and multiple plane exposures
Connected mode between light shield 100B is referred to above description, will not be described here.
Certainly, except using the plane exposure reticle combination of orthohexagonal plane exposure light shield and regular pentagon into outward appearance
Outside exposure sources of the shape in Bark spheroid, the plane exposure light shield of equilateral triangle and the plane of square can also be adopted
Exposure light shield is combined into another polyhedron exposure sources (not shown).
In sum, the exposure sources of each embodiment of the invention, can use within a productive temp cycle
Polylith plane exposure light shield is exposed to polylith substrate, while the exposure light that can be provided all of light source, so as to can
To improve exposure efficiency, while avoiding the waste of the energy.
Although illustrating and describing the present invention with reference to specific embodiment, it should be appreciated by those skilled in the art that：
In the case of without departing from the spirit and scope of the present invention limited by claim and its equivalent, can here carry out form and
Various change in details.
Claims (8)
1. a kind of exposure sources, it is characterised in that include：Multiple plane exposure light shields and a light source, the light source with it is described
The line of the planar central of plane exposure light shield is perpendicular to the plane exposure light shield place plane, and the light source is flat to each
The distance of the planar central of face exposure light shield is equal.
2. exposure sources according to claim 1, it is characterised in that the plurality of plane exposure light shield corresponds to each other connected
Connect, to surround an accommodation space is formed, the light source is arranged in the accommodation space.
3. exposure sources according to claim 1 and 2, it is characterised in that the plurality of plane exposure light shield is at least
Plant polygon plane exposure light shield.
4. exposure sources according to claim 3, it is characterised in that the polygon plane exposure light shield is shaped as just
Polygon.
5. exposure sources according to claim 2, it is characterised in that the plurality of plane exposure light shield is made into be had
Magnetic, makes the plurality of plane exposure light pass through the mutual adhesive of magnetic when covering on connection.
6. exposure sources according to claim 2, it is characterised in that lead between two plane exposure light shields being connected to each other
Cross conjunction to be connected, the conjunction is Fastening tenon structure, thread gluing band structure or magnetic.
7. exposure sources according to claim 1 and 2, it is characterised in that the face shaping of the exposure sources is selected from just
One kind in tetrahedron, regular hexahedron, regular octahedron, regular dodecahedron, regular dodecahedron and Bark spheroid.
8. exposure sources according to claim 1 and 2, it is characterised in that the light source is sphere light source, and the light source
It is supplied to the light quantity of each plane exposure light shield identical.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710145195.2A CN106647192A (en) | 2017-03-10 | 2017-03-10 | Exposure equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710145195.2A CN106647192A (en) | 2017-03-10 | 2017-03-10 | Exposure equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106647192A true CN106647192A (en) | 2017-05-10 |
Family
ID=58848068
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710145195.2A Pending CN106647192A (en) | 2017-03-10 | 2017-03-10 | Exposure equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106647192A (en) |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009050141A1 (en) * | 2007-10-15 | 2009-04-23 | Commissariat A L'energie Atomique | High-resolution lithography mask, apparatus and process for manufacture thereof, and lithography apparatus and process using such a mask |
| CN101911249A (en) * | 2008-01-22 | 2010-12-08 | 罗利诗公司 | Large area nanopatterning method and apparatus |
| CN202024240U (en) * | 2011-04-01 | 2011-11-02 | 陈成达 | Glass flash lamp |
| CN102812285A (en) * | 2010-03-29 | 2012-12-05 | 赫罗伊斯诺布尔莱特股份有限公司 | LED lamp for homogeneously illuminating hollow bodies |
| CN102834778A (en) * | 2010-04-13 | 2012-12-19 | 株式会社尼康 | Exposure apparatus, substrate processing apparatus, and device manufacturing method |
| CN104520771A (en) * | 2012-08-06 | 2015-04-15 | 株式会社尼康 | Processing apparatus and device manufacturing method |
| CN104880907A (en) * | 2015-06-08 | 2015-09-02 | 武汉华星光电技术有限公司 | Mask device and mask system |
-
2017
- 2017-03-10 CN CN201710145195.2A patent/CN106647192A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009050141A1 (en) * | 2007-10-15 | 2009-04-23 | Commissariat A L'energie Atomique | High-resolution lithography mask, apparatus and process for manufacture thereof, and lithography apparatus and process using such a mask |
| CN101911249A (en) * | 2008-01-22 | 2010-12-08 | 罗利诗公司 | Large area nanopatterning method and apparatus |
| CN102812285A (en) * | 2010-03-29 | 2012-12-05 | 赫罗伊斯诺布尔莱特股份有限公司 | LED lamp for homogeneously illuminating hollow bodies |
| CN102834778A (en) * | 2010-04-13 | 2012-12-19 | 株式会社尼康 | Exposure apparatus, substrate processing apparatus, and device manufacturing method |
| CN202024240U (en) * | 2011-04-01 | 2011-11-02 | 陈成达 | Glass flash lamp |
| CN104520771A (en) * | 2012-08-06 | 2015-04-15 | 株式会社尼康 | Processing apparatus and device manufacturing method |
| CN104880907A (en) * | 2015-06-08 | 2015-09-02 | 武汉华星光电技术有限公司 | Mask device and mask system |
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| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20170510 |
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| RJ01 | Rejection of invention patent application after publication |