CN106637145A - Intelligent correction and regulation system for process parameters of HVPE (High Voltage Paper Electrophoresis) equipment - Google Patents
Intelligent correction and regulation system for process parameters of HVPE (High Voltage Paper Electrophoresis) equipment Download PDFInfo
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- CN106637145A CN106637145A CN201611254413.8A CN201611254413A CN106637145A CN 106637145 A CN106637145 A CN 106637145A CN 201611254413 A CN201611254413 A CN 201611254413A CN 106637145 A CN106637145 A CN 106637145A
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/301—AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi
- C23C16/303—Nitrides
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- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
The invention provides an intelligent correction and regulation system for process parameters of HVPE (High Voltage Paper Electrophoresis) equipment. The system comprises a first-grade regulation framework and a second-grade regulation framework, wherein the first-grade regulation framework comprises a control platform, a human-computer interaction unit, an execution unit, a monitoring unit and a parameter correction unit, wherein the human-computer interaction unit, the execution unit, the monitoring unit and the parameter correction unit are in bidirectional communication connection with the control platform respectively, so as to carry out real-time data interaction; the second-grade regulation framework is composed of self-adjusting correction rings formed by one-to-one correspondence of a heater, an air flow regulator, a water flow regulator, a pressure regulator and a transmission regulator in the execution unit, and a temperature monitoring module, an air flow monitoring module, a water flow monitoring module, a pressure monitoring module and a sample position monitoring module in the monitoring unit; the monitoring unit also comprises an online monitoring module and a reaction chamber deposition monitoring module except the modules above. The intelligent correction and regulation system provided by the invention can be used for adjusting the process parameters in real time and the stability of producing products is improved.
Description
Technical field
The present invention relates to a kind of intelligent control system, and in particular to a kind of intelligence amendment for HVPE technical parameters
Regulator control system.
Background technology
HVPE equipment is used for quick preparation GaN material.When HVPE equipment carries out technique growth, can be according to technique for fixing parameter
Menu running, but the environment of reative cell can due to by-product deposition real-time change, cause temperature, flow field, pressure to become not
Stable, such as temperature parameter, flow field parameter and pressure parameter can be varied from, if now without adjustment in time, can direct shadow
Stability prepared by GaN material is rung, same menu is difficult to obtain the GaN products of same quality.Exist currently with HVPE equipment
During growth GaN material, various process parameters are difficult to be consistent, in the case where process environments change, it tends to be difficult to right
Technological parameter is adjusted in time, causes the stability for producing product not enough.
The content of the invention
The technical problem to be solved in the present invention is to provide a kind of intelligence amendment regulation and control system for HVPE technical parameters
System, can during growth GaN material real-time adjustment technological parameter, realize prepare stability.
In order to solve above-mentioned technical problem, the present invention takes technical scheme below：
A kind of intelligence amendment regulator control system for HVPE technical parameters, it is characterised in that the system is adjusted including one-level
Control framework and two grades of regulation and control frameworks, one-level regulation and control framework includes control platform, man-machine interaction unit, performance element, monitoring unit
With parameters revision unit, the man-machine interaction unit, performance element, monitoring unit and parameters revision unit are double with control platform respectively
Real time data interaction is carried out to communication connection, performance element includes heater, throughput modulator, water flow regulator, pressure
Modulator and transmission modulator, monitoring unit includes sample on-line monitoring module, reative cell deposition monitoring module, temperature monitoring mould
Block, throughput monitoring modular, discharge monitoring modular, pressure monitoring module and sample position monitoring modular；
Two grades of regulation and control frameworks are by the heater in performance element, throughput modulator, water flow regulator, pressure regulator, biography
Temperature monitoring module, throughput monitoring modular, discharge monitoring modular, pressure monitoring mould that dynamic modulator is included with monitoring unit
The one-to-one Self-tuning System conditioning ring of block, sample position monitoring modular is constituted；
The control platform, respectively with man-machine interaction unit, performance element, monitoring unit, parameters revision unit real-time, interactive number
According to control platform feedback device status information obtains setup parameter to man-machine interaction unit and from man-machine interaction unit, and control is flat
Platform assigns execute instruction to performance element and obtains equipment from performance element and performs state, and control platform assigns Monitoring instruction to prison
Survey unit and obtain monitoring of equipment information from monitoring unit, the status information of equipment for getting is fed back to parameter and repaiied by control platform
Positive unit, the parameters revision unit enters the amendment of line parameter according to the status information of equipment for acquiring, then will be revised
Parameter feedback to control platform, control platform will reach performance element under the revised parameter for receiving.
The man-machine interaction unit includes equipment state display interface and apparatus parameter setting interface.
The heater includes sample area heater, reaction source region heater, transition region heater, gas preheating zone heating
Device and heater exhaust gas, the heater is resistance heater, radio heater or electromagnetic induction heater.
The throughput modulator includes reaction gas flow modulator, separation gas flow control device and flow of purge gas
Amount modulator, the air-flow amount controller is gas mass flow controller or gas flow control valve.
The water flow regulator includes that metal parts heat transmission water flow regulator, rubber components protection are adjusted with discharge
Control device and electric component water-cooled water flow regulator, the water flow regulator is that discharge controls flowmeter or discharge control
Valve.
The pressure regulator includes reative cell forefront pressure modulator and reative cell rear end pressure regulator, and the pressure is adjusted
Control device is piezoelectric ceramic valve pressure controller or butterfly valve pressure controller.
The transmission modulator includes vertical position modulator, horizontal level modulator and rotation position modulator, the biography
Dynamic modulator is linear electric motors, servomotor, stepper motor, electric cylinders or cylinder.
The sample on-line monitoring module includes sample film thickness monitoring submodule and sample topography characteristic monitoring submodule, should
Sample on-line monitoring module is X-ray diffraction device or fluorescent X-ray apparatus.
The reative cell deposition monitoring module includes range of deposition monitoring submodule, deposit thickness monitoring submodule and printing opacity
Property monitoring submodule, the reative cell deposition monitoring module be profile measurer, photoelectric sensor or light transmittance tester.
The temperature monitoring module includes sample area temperature monitoring submodule, reaction source region temperature monitoring submodule, transition
Area's temperature monitoring submodule, gas preheating zone temperature monitoring submodule and exhaust temperature monitoring submodule, the temperature monitoring module
For thermocouple thermometer or radiation pyrometer.
The throughput monitoring modular include reaction gas flow monitoring submodule, separation gas flow monitoring submodule and
Purge gas flow monitors submodule, and the throughput monitoring modular is gas mass flow controller or turbine flowmeter.
The discharge monitoring modular includes metal parts heat transmission discharge monitoring submodule, rubber components protection water
Flow monitoring submodule and electric component water-cooled discharge monitors submodule, the discharge monitoring modular be turbine flowmeter or
Electromagnetic flowmeter.
The pressure monitoring module includes that reative cell forefront pressure monitors submodule and reative cell rear end pressure monitoring submodule
Block, the pressure monitoring module is diaphragm pressure sensor or ceramic pressure sensor.
The sample position monitoring modular includes vertical position monitoring submodule, horizontal level monitoring submodule and rotation position
Monitoring submodule is put, the sample position monitoring modular is laser range finder or ultrasonic range finder.
The various technique real time datas of present invention real-time monitoring when GaN material is carried out using HVPE equipment, join to technique
Number is modified and regulates and controls, it is ensured that the stability of product in production process.
Description of the drawings
Accompanying drawing 1 is system framework schematic diagram of the invention；
Accompanying drawing 2 is the block schematic illustration of performance element of the present invention；
Accompanying drawing 3 is the block schematic illustration of monitoring unit of the present invention.
Specific embodiment
For the ease of the understanding of those skilled in the art, below in conjunction with the accompanying drawings the invention will be further described.
As shown in accompanying drawing 1,2 and 3, this discloses a kind of intelligence amendment regulation and control system for HVPE technical parameters
System, the system includes that one-level regulates and controls framework and two grades of regulation and control frameworks, and one-level regulation and control framework includes control platform, man-machine interaction list
Unit, performance element, monitoring unit and parameters revision unit, the man-machine interaction unit, performance element, monitoring unit and parameters revision
Unit is connected respectively with control platform both-way communication carries out real time data interaction, and performance element includes that heater, throughput regulate and control
Device, water flow regulator, pressure regulator and transmission modulator, monitoring unit includes that sample on-line monitoring module, reative cell are sunk
Product monitoring modular, temperature monitoring module, throughput monitoring modular, discharge monitoring modular, pressure monitoring module and sample position
Monitoring modular, heater, throughput modulator, water flow regulator, pressure tune that two grades of regulation and control frameworks are included by performance element
Temperature monitoring module, throughput monitoring modular, discharge monitoring modular, pressure that control device, transmission modulator and monitoring unit are included
The one-to-one Self-tuning System conditioning ring of power monitoring modular, sample position monitoring modular is constituted；Control platform, respectively with man-machine interaction
Unit, performance element, monitoring unit, parameters revision unit real-time, interactive data, control platform feedback device status information is to people
Machine interactive unit simultaneously obtains setup parameter from man-machine interaction unit, and control platform assigns execute instruction to performance element and from execution
Unit obtains equipment and performs state, and control platform assigns Monitoring instruction and obtains monitoring of equipment letter to monitoring unit and from monitoring unit
Breath, the status information of equipment for getting feeds back to parameters revision unit by control platform, and the parameters revision unit is according to obtaining
To status information of equipment enter the amendment of line parameter, then by revised parameter feedback to control platform, control platform will connect
Performance element is reached under the revised parameter for receiving.Using parameters revision unit as device intelligence regulate and control it is basic, collection sets
Standby information and the real-time growth data of sample, judge equipment state and sample state, by computing, to equipment setup parameter reality are carried out
Shi Xiuzheng, reaches intelligent control effect.Man-machine interaction unit includes equipment state display interface and apparatus parameter setting interface.
The monitoring unit includes sample on-line monitoring module, reative cell deposition monitoring module, temperature monitoring module, air-flow
Amount monitoring modular, discharge monitoring modular, pressure monitoring module and sample position monitoring modular.Performance element include heater,
Throughput modulator, water flow regulator, pressure regulator and transmission modulator.Heater, throughput modulator, discharge are adjusted
Control device, pressure regulator, transmission modulator.
Further, heater includes sample area heater, reaction source region heater, transition region heater, gas preheating
Area's heater and heater exhaust gas, the heater be resistance heater, radio heater or electromagnetic induction heater, Huo Zheqi
The heater of his type.
Throughput modulator includes that reaction gas flow modulator, separation gas flow control device and purge gas flow are adjusted
Control device, the air-flow amount controller is gas mass flow controller or gas flow control valve, or other kinds of flow control
Device processed.
Water flow regulator includes metal parts heat transmission water flow regulator, rubber components protection water flow regulator
With electric component water-cooled water flow regulator, the water flow regulator is that discharge controls flowmeter or Water flow control valve,
Or other kinds of water flow controller, for controlling the flow of water.
Pressure regulator includes reative cell forefront pressure modulator and reative cell rear end pressure regulator, the pressure regulator
For piezoelectric ceramic valve pressure controller or butterfly valve pressure controller, or other kinds of pressure controller, disclosure satisfy that pressure
Power is controlled.
Transmission modulator includes vertical position modulator, horizontal level modulator and rotation position modulator, and the transmission is adjusted
Control device is linear electric motors, servomotor, stepper motor, electric cylinders or cylinder, or other kinds of driver can carry out position
Adjustment.
Sample on-line monitoring module includes sample film thickness monitoring submodule and sample topography characteristic monitoring submodule, the sample
On-line monitoring module is X-ray diffraction device or fluorescent X-ray apparatus, or other kinds of monitoring instrument.
Reative cell deposition monitoring module includes range of deposition monitoring submodule, deposit thickness monitoring submodule and translucency prison
Survey submodule, the reative cell deposition monitoring module is profile measurer, photoelectric sensor or light transmittance tester, or other classes
The measuring instrument of type.
Temperature monitoring module includes sample area temperature monitoring submodule, reaction source region temperature monitoring submodule, transition region temperature
Degree monitoring submodule, gas preheating zone temperature monitoring submodule and exhaust temperature monitoring submodule, the temperature monitoring module is heat
Dipole thermometer or radiation pyrometer, or other kinds of temperature measuring equipment.
Throughput monitoring modular includes reaction gas flow monitoring submodule, separation gas flow monitoring submodule and purging
Gas flow monitors submodule, and the throughput monitoring modular is gas mass flow controller or turbine flowmeter, or other
The gas flow controller of type.
Discharge monitoring modular includes metal parts heat transmission discharge monitoring submodule, rubber components protection discharge
Monitoring submodule and electric component water-cooled discharge monitor submodule, and the discharge monitoring modular is turbine flowmeter or electromagnetism
Flowmeter, or other kinds of discharge detecting instrument.
Pressure monitoring module includes that reative cell forefront pressure monitors submodule and reative cell rear end pressure monitoring submodule, should
Pressure monitoring module is diaphragm pressure sensor or ceramic pressure sensor, or other kinds of pressure sensor, for examining
Measuring pressure.
Sample position monitoring modular includes vertical position monitoring submodule, horizontal level monitoring submodule and rotation position prison
Submodule is surveyed, the sample position monitoring modular is laser range finder or ultrasonic range finder, or the detection of other kinds of position
Instrument, it is ensured that the accuracy of position detection.
In the present invention, temperature parameter can in real time be monitored by temperature monitoring module, specifically by sample area temperature
Monitoring submodule, reaction source region temperature monitoring submodule, transition region temperature monitoring submodule, gas preheating zone temperature monitoring submodule
Block and exhaust temperature monitoring submodule monitor respectively sample area temperature, reaction source region temperature, transition region temperature, gas preheating zone
Temperature and exhaust temperature.Then each temperature parameter is sent to into control platform, the temperature parameter is sent to ginseng by control platform
Number amending unit, parameters revision unit is compared according to the menu parameter being manually set in man-machine interaction unit, is then analyzed
Which temperature parameter has fluctuation with design temperature parameter, is corrected automatically, and revised temperature parameter is fed back to into control
Platform, control platform is issued again in the heater in control instruction to performance element, and heater enters trip temperature according to corrected parameter
The amendment of parameter.The control process of other modules be also thus, here it is no longer repeated.
For example：Sample temperature turns to 8 DEG C with sample area temperature gap from 10 DEG C of changes, and from monitoring information sample area temperature is judged
For the impact proportion of technique is up to 60%, isolated area temperature contrasts menu preset parameter for the impact proportion of technique is up to 30% etc.
Afterwards, 30 DEG C of sample area temperature degree amendment ﹢, to+5 DEG C of isolated area temperature adjustmemt etc., need to then be assigned instruction and be adjusted to corresponding temperature
Control device, final reality sample temperature recovers to 10 DEG C with sample area temperature gap.So as to realize that parameter is timely corrected automatically, really
Protect the stability of product.
It should be noted that the above is not the restriction to technical solution of the present invention, in the wound without departing from the present invention
On the premise of making design, any obvious replacement is within protection scope of the present invention.
Claims (14)
1. a kind of intelligence for HVPE technical parameters corrects regulator control system, it is characterised in that the system includes one-level
Regulation and control framework and two grades of regulation and control frameworks, one-level regulation and control framework includes that control platform, man-machine interaction unit, performance element, monitoring are single
Unit and parameters revision unit, the man-machine interaction unit, performance element, monitoring unit and parameters revision unit respectively with control platform
Both-way communication connection carries out real time data interaction, and performance element includes heater, throughput modulator, water flow regulator, pressure
Power modulator and transmission modulator, monitoring unit includes sample on-line monitoring module, reative cell deposition monitoring module, temperature monitoring
Module, throughput monitoring modular, discharge monitoring modular, pressure monitoring module and sample position monitoring modular；
Two grades of regulation and control frameworks are by the heater in performance element, throughput modulator, water flow regulator, pressure regulator, biography
Temperature monitoring module, throughput monitoring modular, discharge monitoring modular, pressure monitoring mould that dynamic modulator is included with monitoring unit
The one-to-one Self-tuning System conditioning ring of block, sample position monitoring modular is constituted；
The control platform, respectively with man-machine interaction unit, performance element, monitoring unit, parameters revision unit real-time, interactive number
According to control platform feedback device status information obtains setup parameter to man-machine interaction unit and from man-machine interaction unit, and control is flat
Platform assigns execute instruction to performance element and obtains equipment from performance element and performs state, and control platform assigns Monitoring instruction to prison
Survey unit and obtain monitoring of equipment information from monitoring unit, the status information of equipment for getting is fed back to parameter and repaiied by control platform
Positive unit, the parameters revision unit enters the amendment of line parameter according to the status information of equipment for acquiring, then will be revised
Parameter feedback to control platform, control platform will reach performance element under the revised parameter for receiving.
2. the intelligence for HVPE technical parameters according to claim 1 corrects regulator control system, it is characterised in that institute
Man-machine interaction unit is stated including equipment state display interface and apparatus parameter setting interface.
3. the intelligence for HVPE technical parameters according to claim 2 corrects regulator control system, it is characterised in that institute
State heater to add including sample area heater, reaction source region heater, transition region heater, gas preheating zone heater and tail gas
Hot device, the heater is resistance heater, radio heater or electromagnetic induction heater.
4. the intelligence for HVPE technical parameters according to claim 3 corrects regulator control system, it is characterised in that institute
Throughput modulator is stated including reaction gas flow modulator, separation gas flow control device and purge gas flow modulator,
The air-flow amount controller is gas mass flow controller or gas flow control valve.
5. the intelligence for HVPE technical parameters according to claim 4 corrects regulator control system, it is characterised in that institute
Water flow regulator is stated including metal parts heat transmission water flow regulator, rubber components protection water flow regulator and electrically
Part water-cooled water flow regulator, the water flow regulator is that discharge controls flowmeter or Water flow control valve.
6. the intelligence for HVPE technical parameters according to claim 5 corrects regulator control system, it is characterised in that institute
Pressure regulator is stated including reative cell forefront pressure modulator and reative cell rear end pressure regulator, the pressure regulator is piezoelectricity
Ceramic valve pressure controller or butterfly valve pressure controller.
7. the intelligence for HVPE technical parameters according to claim 6 corrects regulator control system, it is characterised in that institute
Stating transmission modulator includes vertical position modulator, horizontal level modulator and rotation position modulator, and the transmission modulator is
Linear electric motors, servomotor, stepper motor, electric cylinders or cylinder.
8. the intelligence for HVPE technical parameters according to claim 7 corrects regulator control system, it is characterised in that institute
Stating sample on-line monitoring module includes sample film thickness monitoring submodule and sample topography characteristic monitoring submodule, and the sample is supervised online
It is X-ray diffraction device or fluorescent X-ray apparatus to survey module.
9. the intelligence for HVPE technical parameters according to claim 8 corrects regulator control system, it is characterised in that institute
Reative cell deposition monitoring module is stated including range of deposition monitoring submodule, deposit thickness monitoring submodule and translucency monitoring submodule
Block, the reative cell deposition monitoring module is profile measurer, photoelectric sensor or light transmittance tester.
10. the intelligence for HVPE technical parameters according to claim 9 corrects regulator control system, it is characterised in that
The temperature monitoring module includes sample area temperature monitoring submodule, reaction source region temperature monitoring submodule, transition region temperature prison
Submodule, gas preheating zone temperature monitoring submodule and exhaust temperature monitoring submodule is surveyed, the temperature monitoring module is thermocouple
Thermometer or radiation pyrometer.
The 11. intelligence amendment regulator control systems for HVPE technical parameters according to claim 10, it is characterised in that
The throughput monitoring modular includes reaction gas flow monitoring submodule, separation gas flow monitoring submodule and purge gas
Flow monitoring submodule, the throughput monitoring modular is gas mass flow controller or turbine flowmeter.
The 12. intelligence amendment regulator control systems for HVPE technical parameters according to claim 11, it is characterised in that
The discharge monitoring modular includes that metal parts heat transmission discharge monitoring submodule, rubber components protection are monitored with discharge
Submodule and electric component water-cooled discharge monitor submodule, and the discharge monitoring modular is turbine flowmeter or Electromagnetic Flow
Meter.
The 13. intelligence amendment regulator control systems for HVPE technical parameters according to claim 12, it is characterised in that
The pressure monitoring module includes that reative cell forefront pressure monitors submodule and reative cell rear end pressure monitoring submodule, the pressure
Monitoring modular is diaphragm pressure sensor or ceramic pressure sensor.
The 14. intelligence amendment regulator control systems for HVPE technical parameters according to claim 13, it is characterised in that
The sample position monitoring modular includes vertical position monitoring submodule, horizontal level monitoring submodule and rotation position monitoring
Module, the sample position monitoring modular is laser range finder or ultrasonic range finder.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611254413.8A CN106637145A (en) | 2016-12-30 | 2016-12-30 | Intelligent correction and regulation system for process parameters of HVPE (High Voltage Paper Electrophoresis) equipment |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611254413.8A CN106637145A (en) | 2016-12-30 | 2016-12-30 | Intelligent correction and regulation system for process parameters of HVPE (High Voltage Paper Electrophoresis) equipment |
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| CN106637145A true CN106637145A (en) | 2017-05-10 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN117845197A (en) * | 2024-03-07 | 2024-04-09 | 河套学院 | Nano material growth control system and method based on chemical vapor deposition method |
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Application publication date: 20170510 |