CN106637119A - 一种新型类金刚石薄膜涂层 - Google Patents

一种新型类金刚石薄膜涂层 Download PDF

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CN106637119A
CN106637119A CN201611253870.5A CN201611253870A CN106637119A CN 106637119 A CN106637119 A CN 106637119A CN 201611253870 A CN201611253870 A CN 201611253870A CN 106637119 A CN106637119 A CN 106637119A
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史旭
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Nano Peak Vacuum Coating (shanghai) Co Ltd
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Abstract

本发明公开了镀膜领域的一种新型类金刚石薄膜涂层，包括与不锈钢金属表面结合的基层以及位于该类金刚石薄膜涂层表面的功能层，所述基层为Cr层，所述功能层为类金刚石层：所述基层和所述功能层之间还设有第一过渡层和第二过渡层，所述第一过渡层位于所述功能层的下方，为WC层，所述第二过渡层位于所述基层和所述第一过渡层之间，为CrWC层。其技术效果是：在保证类金刚石薄膜涂层硬度的前提下，类金刚石薄膜涂层的耐磨性有了5～10倍的提升，并不易从作为基材的不锈钢金属的表面脱落，沉积时间也比只沉积相同厚度的功能层的时间缩短15％～20％。

Description

一种新型类金刚石薄膜涂层
技术领域
本发明涉及镀膜领域的一种新型类金刚石薄膜涂层。
背景技术
在纺织、汽车、手表机芯等行业的零部件要求具有较高的硬度和耐磨性，为了达到生产商的硬度和耐磨性要求，必须对零件表面进行涂层处理，以使零部件表面达到所需要的耐摩擦和耐腐蚀性能。根据一些相关标准，零部件表面的薄膜涂层必须通过300℃的淬火实验和24种化学品药剂腐蚀测试等严酷要求，还必须经过1000次橡皮摩擦测试不能有划痕，薄膜涂层的硬度也要求达到2000-3000HV。目前常用的薄膜涂层为在不锈钢金属表面直接涂覆钛底层，再镀类金刚石层，即Ti+C层，采用的工艺为物理气相沉积工艺，这样的工艺，因为钛底层与类金刚石层的性能差异，致使薄膜涂层临界载荷偏低，应用上有限制。而且要求的薄膜涂层的厚度大。
发明内容
本发明的目的是为了克服现有工艺的不足，提供一种新型类金刚石薄膜涂层，其在保证硬度的前提下，耐磨性能有了显著提高，而且沉积时间短。
实现上述目的的一种工艺方案是：一种新型类金刚石薄膜涂层，包括与不锈钢金属表面结合的基层以及位于该类金刚石薄膜涂层表面的功能层，所述基层为Cr层，所述功能层为类金刚石层；
所述基层和所述功能层之间还设有第一过渡层和第二过渡层，所述第一过渡层位于所述功能层的下方，为WC层，所述第二过渡层位于所述基层和所述第一过渡层之间，为CrWC层。
进一步的，所述基层是通过磁控溅射工艺或多弧离子镀工艺沉积而成的。
进一步的，所述第一过渡层和所述第二过渡层均是通过磁控溅射工艺或多弧离子镀工艺沉积而成的。
进一步的，所述功能层是通过过滤阴极真空电弧沉积工艺或多弧离子镀工艺沉积的。
采用了本发明的一种新型类金刚石薄膜涂层的技术方案，包括与不锈钢金属表面结合的基层以及位于该类金刚石薄膜涂层表面的功能层，所述基层为Cr层，所述功能层为类金刚石层：所述基层和所述功能层之间还设有第一过渡层和第二过渡层，所述第一过渡层位于所述功能层的下方，为WC层，所述第二过渡层位于所述基层和所述第一过渡层之间，为CrWC层。其技术效果是：在保证类金刚石薄膜涂层硬度的前提下，类金刚石薄膜涂层的耐磨性有了5～10倍的提升，并不易从不锈钢金属表面脱落，沉积时间也比只沉积相同厚度的功能层的时间缩短15％～20％。
附图说明
图1为本发明的一种新型类金刚石薄膜涂层的结构示意图。
具体实施方式
请参阅图1，本发明的发明人为了能更好地对本发明的技术方案进行理解，下面通过具体的实施例，并结合附图进行详细地说明：
本发明的一种新型类金刚石薄膜涂层，包括从下至上依次设置的基层1，第二过渡层2，第一过渡层3和功能层4。
其中基层1为Cr层，以Cr层为基层1的目的在于：第一，Cr层本身就具有较高的硬度，因为Cr是所有单质金属中最硬的。第二，Cr与作为基材10不锈钢金属表面的结合力大，因此利于在存在微孔或者异型零部件表面形成质量优良的基层1，为整个类金刚石薄膜涂层提供基础。基层1的沉积工艺为磁控溅射工艺或多弧离子镀工艺。第三，Cr的熔点高，保证类金刚石薄膜涂层的高温性能。
第二过渡层2为CrWC层，以CrWC层为第二过渡层2的目的在于：第一，CrWC本身就具有极高的硬度。第二，CrWC层与Cr层之间表面结合力大，因此利于在存在微孔或者异型零部件表面形成致密的类金刚石薄膜涂层，也能保证类金刚石薄膜涂层不易脱落或磨损。第三，CrWC的熔点高，保证类金刚石薄膜涂层的高温性能。第二过渡层2的沉积工艺为磁控溅射工艺或多弧离子镀工艺。
第一过渡层3为WC层，以WC层为第一过渡层3的目的在于：第一，WC本身就具有极高的硬度。第二，WC层与CrWC层之间表面结合力大，因此利于在存在微孔或者异型零部件表面形成致密的类金刚石薄膜涂层，也能保证类金刚石薄膜涂层不易脱落或磨损。第三，WC层与作为功能层4的类金刚石层的表面结合力大，因此进一步有利于在存在微孔或者异型零部件表面形成致密的类金刚石薄膜涂层，也能进一步保证类金刚石薄膜涂层不易脱落或磨损。第三，WC的熔点高，保证类金刚石薄膜涂层的高温性能。第一过渡层3的沉积工艺为磁控溅射工艺或多弧离子镀工艺。
功能层4为致密的类金刚层，沉积在第一过渡层3的表面，并与第一过渡层3紧密结合。有利于在存在微孔或者异型零部件表面形成致密的类金刚石薄膜涂层，也能进一步保证类金刚石薄膜涂层不易脱落或磨损。功能层4是通过过滤阴极真空电弧沉积工艺或者多弧离子镀工艺沉积的。
基层1、第二过渡层2和第一过渡层3可采用磁控溅射工艺沉积，将作为基材10的不锈钢金属置于真空室内，基材10与磁控溅射靶的距离为8-15cm，磁控溅射的铬靶、钨靶和碳靶的表面磁场强度为200-500高斯。再对真空室抽真空，使真空室内的本底真空降至2.66×10-3Pa以下。充入氩气，并使真空室内保持10-2Pa数量级的动态平衡压强。继续通入氩气调节真空室内的压强达到磁控溅射所需的总压强，其范围为1.33×10-1Pa～13.3Pa。调节溅射电压为-500V～-800V，溅射电流为10-28A，基材10的表面的温度为室温到200℃。
基层1、第二过渡层2和第一过渡层3可采用多弧离子镀工艺沉积。铬靶、钨靶和碳靶为阴极，阳极为所述真空室。真空室内的本底真空度为2.66×10-3Pa以下，温度为200～400℃，靶弧电流设置为30～120A，负偏压为-150V～-300V。
功能层4可采用多弧离子镀工艺沉积。待涂覆的不锈钢金属为阳极，碳靶为阴极，通入氩气作为保护气体。真空室内的本底真空度为2.66×10-3Pa以下，温度为100℃～200℃，靶弧电流设置为80～120A，负偏压为-150V～-1000V，采用多弧离子镀工艺时，基层1、第二过渡层2、第一过渡层3和功能层4的沉积是连续完成的。
功能层4可采用过滤阴极真空电弧沉积工艺沉积。在过滤阴极真空电弧真空炉内，先在作为基材10的不锈钢金属表面完成基层1、第二过渡层2和第一过渡层3的镀膜。基层1、第二过渡层2和第一过渡层3的沉积可通过磁控溅射工艺或多弧离子镀工艺完成。将过滤阴极真空电弧真空炉抽至本底真空2.66×10-3Pa以下，加负偏压为-200V--1500V，再利用碳靶完成功能层4的沉积。
本发明的一种新型类金刚石薄膜涂层通过在作为基材10的不锈钢金属的表面与功能层4之间依次设置基层1，第二过渡层2和第一过渡层3，在保证类金刚石薄膜涂层硬度的前提下，类金刚石薄膜涂层的耐磨性有了5～10倍的提升，并不易从作为基材10的不锈钢金属表面脱落，耐磨性测试采用标准的橡皮测试，taber CS-17，1kg载荷。同时由于基层1，第二过渡层2和第一过渡层3沉积速度快，该类金刚石薄膜涂层的沉积时间也比只沉积相同厚度的功能层4的时间缩短15％～20％。
本技术领域中的普通技术人员应当认识到，以上的实施例仅是用来说明本发明，而并非用作为对本发明的限定，只要在本发明的实质精神范围内，对以上所述实施例的变化、变型都将落在本发明的权利要求书范围内。

Claims (4)

1.一种新型类金刚石薄膜涂层，包括与不锈钢金属表面结合的基层以及位于该类金刚石薄膜涂层表面的功能层，所述基层为Cr层，所述功能层为类金刚石层；其特征在于：
所述基层和所述功能层之间还设有第一过渡层和第二过渡层，所述第一过渡层位于所述功能层的下方，为WC层，所述第二过渡层位于所述基层和所述第一过渡层之间，为CrWC层。
2.根据权利要求1所述的一种新型类金刚石薄膜涂层，其特征在于：所述基层是通过磁控溅射工艺或多弧离子镀工艺沉积而成的。
3.根据权利要求1所述的一种新型类金刚石薄膜涂层，其特征在于：所述第一过渡层和所述第二过渡层均是通过磁控溅射工艺或多弧离子镀工艺沉积而成的。
4.根据权利要求1所述的一种新型类金刚石薄膜涂层，其特征在于：所述功能层是通过过滤阴极真空电弧沉积工艺或多弧离子镀工艺沉积的。
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