CN106604514A - Exhaust pipe and low temperature plasma generation equipment - Google Patents
Exhaust pipe and low temperature plasma generation equipment Download PDFInfo
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- CN106604514A CN106604514A CN201710094545.7A CN201710094545A CN106604514A CN 106604514 A CN106604514 A CN 106604514A CN 201710094545 A CN201710094545 A CN 201710094545A CN 106604514 A CN106604514 A CN 106604514A
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- temperature plasma
- exhaust pipes
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Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
The invention provides an exhaust pipe and low temperature plasma generation equipment and relates to the medium block discharge technology field. The exhaust pipe comprises a conductive medium and an insulation medium. The insulation medium is in a bottomless prismatic shape and the conductive medium is in a prismatic shape. The insulation medium sleeves the conductive medium. The invention also provides the low temperature plasma generation equipment. The equipment comprises a power supply unit and the plurality of exhaust pipes. The exhaust pipes are in the prismatic shape and the plurality of exhaust pipes are parallel to each other. A gap is arranged between each two adjacent exhaust pipes and side walls of the two exhaust pipes which form the gap are parallel to each other. The exhaust pipes are divided into high potential exhaust pipes and low potential exhaust pipes. The exhaust pipes are distributed around the exhaust pipe, wherein potentials of the exhaust pipes are different from a potential of the exhaust pipe. An output terminal of the power supply unit is connected to terminals of the plurality of high potential exhaust pipes respectively and terminals of the plurality of low potential exhaust pipes are grounded. In the prior art, exhaust-gas treatment efficiency of a low temperature plasma is low and equipment cost is increased. By using the exhaust pipe and the equipment, the above problems are solved. Technical effects of increasing exhaust-gas treatment efficiency and reducing cost are reached.
Description
Technical field
The present invention relates to dielectric barrier discharge technical field, sets more particularly, to a kind of comb and low temperature plasma
It is standby.
Background technology
Low temperature plasma is the 4th state of the material after solid-state, liquid, gaseous state.When applied voltage reaches gas
During firing voltage, gas is breakdown, and produces including the mixture including electronics, various ions, atom and free radical.Discharged
Although electron temperature is very high in journey, heavy particle temperature is very low, and whole system is presented low temperature state, so referred to as low-temperature plasma
Body.Low temperature plasma has the forms such as corona discharge, dielectric barrier discharge.
Dielectric barrier discharge (Dielectric Barrier Discharge, DBD), is that one kind has also known as voltolising
Dielectric inserts the gas discharge form of discharge space, and it can at normal temperatures and pressures produce large volume, high-energy-density
Low temperature plasma.The dielectric of discharge space insertion can make the charge buildup of discharge space generation thereon, produce one
The additional electric field in opposite direction with extra electric field, prevents electric discharge from developing into arcing phase such that it is able to produce under atmospheric pressure steady
The low temperature plasma of fixed operation.Dielectric barrier discharge has more relative to the low pressure discharge applied in current industrial production
Wide application prospect, has been widely used at present ozone synthesis, CO2 laser instrument, ultraviolet source, Surface Modification of Insulating Material
With the industrial circle such as exhaust-gas treatment, become one of hot issue of low temperature plasma in recent years and association area research.
Dielectric barrier discharge low-temperature plasma degradation of contaminant is using low temperature plasma high energy electron, free radical etc.
Pollutant effect in active particle and waste gas, makes contaminant molecule decompose within the extremely short time, and occurs follow-up
It is various to react to reach the purpose of decomposing pollutant.During dielectric barrier discharge, electronics obtains energy from electric field, by touching
The interior energy or kinetic energy that energy is converted into contaminant molecule is hit, these molecules for obtaining energy are excited or occur to ionize to be formed and live
Property group, at the same the oxygen and moisture in air also can produce in the presence of high energy electron substantial amounts of hydrogen in statu nascendi, ozone and
Hydroxyl oxygen isoreactivity group, the active group that the polluter in waste gas has higher-energy with these reacts, final to turn
The materials such as CO2 and H2O are turned to, so as to reach the purpose of purification waste gas.
At present environmental protection industry (epi) typically produces double-dielectric barrier discharge type low temperature using platoon formula structure or telescoping structure
Plasma.Using telescoping structure, because circulation area is limited in sleeve pipe, when the exhaust gas flow that need to be processed is larger, need
The many group sleeves of arrangement, can cause that equipment size is very huge, heaviness；And platoon formula structure is adopted, because its discharge position is
Distance most weakness between two neighboring pipe, therefore, the discharge type of platoon formula structure is wire electric discharge, when comb quantity it is certain
When, wire region of discharge ratio of the total volume is very low, and the low-temperature plasma bulk concentration for being formed will hinder less than telescopic medium
Gear electric discharge, can cause its reduction to exhaust-gas treatment ability, and then cause the processing cost to giving up to raise.
The content of the invention
In view of this, it is an object of the invention to provide comb and low temperature plasma occur equipment, to alleviate existing skill
Exhaust treatment efficiency present in art is low, high cost technical problem.
In a first aspect, a kind of comb is embodiments provided, including：Conducting medium and dielectric；
The dielectric is bottomless prism-shaped, and the conducting medium is prism-shaped, and the dielectric is placed on described leading
Outside electrolyte.
With reference in a first aspect, embodiments provide the first possible embodiment of first aspect, wherein, institute
State the rectangular cross-section of dielectric.
With reference in a first aspect, embodiments provide second possible embodiment of first aspect, wherein, institute
Conducting medium is stated for conducting metal rod or conductive metal powder.
With reference in a first aspect, embodiments provide the third possible embodiment of first aspect, wherein, institute
The material for stating dielectric is quartz glass.
With reference in a first aspect, embodiments provide the 4th kind of possible embodiment of first aspect, wherein, institute
The length of side for stating the inwall of dielectric is 5mm to 7mm；The wall thickness of the dielectric be 1mm to 3mm, the outer wall of conducting medium
The length of side is 5mm to 7mm.
With reference in a first aspect, embodiments provide the 5th kind of possible embodiment of first aspect, wherein, lead
Dielectric outer wall is brought into close contact with the inwall of dielectric.
With reference in a first aspect, embodiments provide the 6th kind of possible embodiment of first aspect, wherein, institute
The length for stating dielectric is 360mm to 370mm.
Second aspect, embodiments provides a kind of low temperature plasma and equipment occurs, including：Power supply unit and many
The individual comb as described in above-mentioned first aspect is arbitrary；
The comb is prismatic structure, and multiple combs are parallel to each other, shape between the adjacent comb of each two
Into gap, and two comb side walls in the formation gap are parallel to each other；
The comb is divided into high potential comb and electronegative potential comb, is distributed around each described comb different from its current potential
Comb, the outfan of said supply unit is connected respectively with the terminals of multiple high potential combs, multiple electronegative potentials
The terminals ground connection of comb.
With reference to second aspect, the first possible embodiment of second aspect is embodiments provided, wherein, often
Vertical dimension between two adjacent combs is equal.
With reference to second aspect, second possible embodiment of second aspect is embodiments provided, wherein, often
Vertical dimension between two adjacent combs is 2mm to 10mm.
The embodiment of the present invention brings following beneficial effect：In the embodiment of the present invention, the good electric current of power modulation is delivered to
The input of transformator, Jing after transformator is adjusted to voltage, electric current Jing lead-out terminals deliver to high potential comb, high potential row
Turn between pipe and electronegative potential comb, produce low temperature plasma.Due to using square tube, when high potential comb and electronegative potential
When comb is turned on, the low temperature plasma area of greater room can be between them formed, improve the generation of low temperature plasma
Amount, such that it is able to improve the treatment effect to organic gas.User can be arranged side by side multiple combs, and multiple combs it
Between have interval, then to multiple comb applied voltages.When gas between multiple combs interval circulate when, low temperature etc. from
It is decomposed under daughter effect, purifies.
In the embodiment of the present invention, comb form is square tube (rectangle, square etc.), and square tube outer layer is dielectric, interior
Layer is conducting medium, compared with sleeve type structure, present invention technology used can effectively reduce equipment volume, reduction equipment into
This；Compared with pipe platoon formula structure, present invention square tube used can effectively improve the yield of low temperature plasma, so as to can
To reduce equipment cost.Therefore, there is equipment using square tube electrode used by the present invention and low temperature plasma, can effectively improve
Using the efficiency of Low Temperature Plasma Treating waste gas, and reduce the cost of Low Temperature Plasma Treating organic exhaust gas.
Other features and advantages of the present invention will be illustrated in the following description, also, the partly change from description
Obtain it is clear that or being understood by implementing the present invention.The purpose of the present invention and other advantages are in description, claims
And in accompanying drawing specifically noted structure realizing and obtain.
To enable the above objects, features and advantages of the present invention to become apparent, preferred embodiment cited below particularly, and coordinate
Appended accompanying drawing, is described in detail below.
Description of the drawings
In order to be illustrated more clearly that the specific embodiment of the invention or technical scheme of the prior art, below will be to concrete
The accompanying drawing to be used needed for embodiment or description of the prior art is briefly described, it should be apparent that, in describing below
Accompanying drawing is some embodiments of the present invention, for those of ordinary skill in the art, before creative work is not paid
Put, can be with according to these other accompanying drawings of accompanying drawings acquisition.
Fig. 1 is calandria structure schematic diagram provided in an embodiment of the present invention；
Fig. 2 is top view that cross section is foursquare comb；
Fig. 3 is top view that cross section is rectangular comb；
Fig. 4 is the structural representation that low temperature plasma occurs equipment.
Icon：1- conducting mediums；2- dielectrics；3- power supply units；3.1- power supply；3.2- transformator；4- combs；4.1-
High potential comb；4.2- electronegative potential combs；5- gaps.
Specific embodiment
To make purpose, technical scheme and the advantage of the embodiment of the present invention clearer, below in conjunction with accompanying drawing to the present invention
Technical scheme be clearly and completely described, it is clear that described embodiment is a part of embodiment of the invention, rather than
Whole embodiments.Based on the embodiment in the present invention, those of ordinary skill in the art are not making creative work premise
Lower obtained every other embodiment, belongs to the scope of protection of the invention.
At present for telescopic low temperature plasma occurs equipment, because circulation area is limited in sleeve pipe, when what is need to processed
When gas flow is larger, many group sleeves of arrangement are needed, can cause that equipment size is very huge, heaviness；And adopt platoon formula low
There is equipment in isothermal plasma, because its discharge position is distance most weakness between two neighboring pipe, therefore, platoon formula structure
Discharge type be wire electric discharge, when the timing of comb quantity one, wire region of discharge ratio of the total volume is very low, therefore, institute
The low-temperature plasma bulk concentration of formation will be less than telescopic dielectric barrier discharge, can cause its reduction to exhaust-gas treatment ability,
Further, the processing cost to waste gas is caused to raise, based on this, a kind of comb provided in an embodiment of the present invention can increase adjacent
Relative area between comb, increases the low temperature plasma area formed between high potential comb and electronegative potential comb, improves low
The yield of isothermal plasma.
For ease of understanding the present embodiment, a kind of comb disclosed in the embodiment of the present invention is situated between in detail first
Continue, as shown in figure 1, the comb in the embodiment of the present invention includes：Conducting medium 1 and dielectric 2.
The dielectric 2 is bottomless prism-shaped, and the conducting medium 1 is prism-shaped, and the dielectric 2 is placed on described
Outside conducting medium 1.
In embodiments of the present invention, the shape of dielectric 2 can be straight bottomless prism etc., and the shape of conducting medium 1 can
The cross section for thinking right prism etc., dielectric 2 and conducting medium 1 can be rectangle etc..
The material of conducting medium is for can be for various, such as：Ferrum, copper or other conducting metals etc.；Can also be compound
Metal or metal and nonmetallic complex etc., in actual applications, the conducting medium is conducting metal rod or conductive gold
Category powder, the material of the dielectric is quartz glass etc., and the good insulation preformance of quartz glass is cheap durable, can improve
Production cost is further reduced while the discharge effect of comb.
In another embodiment of the present invention, the rectangular cross-section of the dielectric, in actual applications, dielectric
Cross section can be as shown in Figure 2 for square, or rectangle as shown in Figure 3, such setting can cause height
Discharge between current potential comb and electronegative potential comb uniform.
The length of side of the inwall of the dielectric is 5mm to 7mm；The wall thickness of the dielectric is 1mm to 3mm, conductive
The outer wall length of side of medium is 5mm to 7mm；The length of the dielectric is 360mm to 370mm.
In embodiments of the present invention, the length of side of the inwall of dielectric is set to into 5mm to 7mm；The wall thickness of dielectric
It is set to 1mm to 3mm；The length of dielectric is set to 360mm to 370mm；Such setting can facilitate dielectric with it is outer
Cooperation between portion's support frame and connecting plate is installed, and improves the suitability of comb.
The outer wall length of side of conducting medium is set to into 5mm to 7mm so that conducting medium can be more preferable with external isolation media
Carrying out coordinate, processing to conducting medium and installation requirement are reduced, so as to improve the suitability of comb.
In order to reduce loss of the electric energy in uncorrelated region, energy ecology, outer wall and the insulation of conducting medium are improved
The inwall of medium is brought into close contact, and accordingly, when the cross section of dielectric is square, the cross section of conducting medium can also
For square, when the cross section of dielectric is rectangle, the cross section of conducting medium can also be rectangle.
As shown in Figures 2 and 3, on the basis of above-described embodiment, further, by the control to the course of processing, make
The straight degree for obtaining dielectric and conducting medium is preferable (square or rectangular), you can realize that conducting medium is put into into insulation is situated between
During matter inside, both preferably overlap central axis.The central axis weight of the central axis of conducting medium and the dielectric
Close, conducting medium can be caused to be located at the center of dielectric, the uniformity of comb electric discharge can be improved, and then strengthen putting for comb
Electric effect.
As shown in figure 4, in another embodiment of the present invention, also a kind of low temperature plasma occur equipment, low temperature etc. from
Daughter equipment includes：Power supply unit 3 and multiple combs 4 as described in aforementioned any embodiment；
The comb 4 is prismatic structure, and multiple combs 4 are parallel to each other, between the adjacent comb 4 of each two
Gap 5 is formed, and forms two comb side walls in the gap 5 and be parallel to each other；
The comb is divided into high potential comb 4.1 and electronegative potential comb 4.2, distribution and its current potential around each described comb
Different combs, the outfan of said supply unit 3 is connected respectively with the terminals of multiple high potential combs 4.1, multiple
The terminals ground connection of the electronegative potential comb 4.2.
In embodiments of the present invention, power supply unit 3 includes power supply 3.1 and transformator 3.2, outfan and the change of power supply 3.1
The input connection of depressor 3.2, the power supply 3.1 to multiple combs 4 provide electric energy；The transformator 3.2 is input into power supply 3.1
Electric energy change into power supply needed for multiple combs 4.
In the low-temperature plasma generator, multiple combs can be arranged according to the arrangement mode in Fig. 4, multiple combs
Can arrange according to determinant, high potential comb and electronegative potential comb are crisscross arranged, it is assumed for example that utilize (Nth row, m column)
Mode denotation coordination, in the diagram, in coordinate for (1, position 1) is electronegative potential comb, coordinate for (1, position 2) is high electricity
Position comb, coordinate for (1,3) position be electronegative potential comb, coordinate for (1,4) position be high potential comb, coordinate for (1,
5) it is high potential comb ... for the position of (1,6) that position is electronegative potential comb, coordinate；
It is so corresponding, in coordinate for (2, position 1) is high potential comb, coordinate for (2, position 2) is electronegative potential
Comb, coordinate are (2,5) for electronegative potential comb, coordinate for the position that the position of (2,3) is high potential comb, coordinate is (2,4)
Position be high potential comb, coordinate for (2,6) position be electronegative potential comb ...；
It is for high potential comb, coordinate for the position that the position of (3,1) is electronegative potential comb, coordinate is (3,2) in coordinate
(3,3) it is low electricity for the position that the position of (3,4) is high potential comb, coordinate is (3,5) that position is electronegative potential comb, coordinate
Position comb, coordinate are high potential comb ... for the position of (3,6)；
It is for electronegative potential comb, coordinate for the position that the position of (4,1) is high potential comb, coordinate is (4,2) in coordinate
(4,3) it is high electricity for the position that the position of (4,4) is electronegative potential comb, coordinate is (4,5) that position is high potential comb, coordinate
Position comb, coordinate are electronegative potential comb ... for the position of (4,6)；
It is for high potential comb, coordinate for the position that the position of (5,1) is electronegative potential comb, coordinate is (5,2) in coordinate
(5,3) it is low electricity for the position that the position of (5,4) is high potential comb, coordinate is (5,5) that position is electronegative potential comb, coordinate
Position comb, coordinate are high potential comb ... for the position of (5,6)；
It is so corresponding, in coordinate for (6, position 1) is high potential comb, coordinate for (6, position 2) is electronegative potential
Comb, coordinate are (6,5) for electronegative potential comb, coordinate for the position that the position of (6,3) is high potential comb, coordinate is (6,4)
Position be high potential comb, coordinate for (6,6) position be electronegative potential comb ....
Because the cross section of each comb is square, so comb is four-prism, after arranging according to Fig. 4 modes,
Orthographic projection of each side of comb on the side of adjacent comb is easy to overlap with the side face edge surrounding, that is to say, that
In the embodiment of the present invention, the adjacent side for referring to one of comb between two combs is on the side of another comb
The surrounding edge of the side of orthographic projection and this another comb overlaps.
In the diagram, the circulation of the processing gas for needed for of gap 5 between high potential comb 4.1 and electronegative potential comb 4.2 is led to
Road.
Because multiple combs are parallel to each other, so the vertical dimension between the adjacent comb of each two is between comb
Distance, the vertical dimension between the adjacent comb of each two is equal, will so form uniform low-temperature plasma field, carries
High gas purifying effect；And disposed at equal distance, it is favorably improved plasma yield.
When the embodiment of the present invention is applied to into varying environment, user can be arranged side by side multiple combs, each two phase
Distance is 2mm to 10mm between adjacent comb, then to the conducting medium applied voltage in comb, electric current from power source, Jing transformations
High potential comb is entered after device boosting, current path is formed by micro discharge between high potential comb and electronegative potential comb, it is low
Current potential comb connects earth lead, so as to form complete current loop；When gas is from multiple high potential combs and electronegative potential comb
Between interval circulate when, produce low temperature plasma.
In the embodiment of the present invention, the good electric current of power modulation is delivered to the input of transformator, and Jing transformators enter to voltage
After row adjustment, electric current Jing lead-out terminals deliver to high potential comb, turn between high potential comb and electronegative potential comb, produce low temperature
Plasma.Due to using square tube, when high potential comb and electronegative potential comb are turned on, can be formed between them more
The low temperature plasma area of large space, improves the yield of low temperature plasma, such that it is able to improve the process to organic gas
Effect.User can be arranged side by side multiple combs, and have interval between multiple combs, then apply electricity to multiple combs
Pressure.When gas circulates from the interval between multiple combs, low temperature plasma is produced.
In the embodiment of the present invention, comb form is square tube (rectangle, square etc.), and square tube outer layer is dielectric, interior
Layer is conducting medium, compared with sleeve type structure, present invention technology used can effectively reduce equipment volume, reduction equipment into
This；Compared with pipe platoon formula structure, present invention square tube used can effectively improve the yield of low temperature plasma, so as to can
To reduce equipment cost.Therefore, there is equipment using square tube electrode used by the present invention and low temperature plasma, can effectively improve
Using the efficiency of Low Temperature Plasma Treating waste gas, and reduce the cost of Low Temperature Plasma Treating organic exhaust gas.
In the description of the embodiment of the present invention, unless otherwise clearly defined and limited, term " installation ", " connected ", " company
Connect " should be interpreted broadly, for example, it may be being fixedly connected, or being detachably connected, or it is integrally connected；It can be machine
Tool connects, or electrically connects；Can be joined directly together, it is also possible to be indirectly connected to by intermediary, can be two units
Connection inside part.For the ordinary skill in the art, above-mentioned term can be understood in the present invention with concrete condition
Concrete meaning.
In describing the invention, it should be noted that term " " center ", " on ", D score, "left", "right", " vertical ",
The orientation or position relationship of the instruction such as " level ", " interior ", " outward " be based on orientation shown in the drawings or position relationship, merely to
Be easy to description the present invention and simplify description, rather than indicate or imply indication device or element must have specific orientation,
With specific azimuth configuration and operation, therefore it is not considered as limiting the invention.Additionally, term " first ", " second ",
" the 3rd " is only used for describing purpose, and it is not intended that indicating or implying relative importance.
Finally it should be noted that：Embodiment described above, specific embodiment only of the invention, to illustrate the present invention
Technical scheme, rather than a limitation, protection scope of the present invention is not limited thereto, although with reference to the foregoing embodiments to this
It is bright to be described in detail, it will be understood by those within the art that：Any those familiar with the art
The invention discloses technical scope in, it still can modify to the technical scheme described in previous embodiment or can be light
Change is readily conceivable that, or equivalent is carried out to which part technical characteristic；And these modifications, change or replacement, do not make
The essence of appropriate technical solution departs from the spirit and scope of embodiment of the present invention technical scheme, should all cover the protection in the present invention
Within the scope of.Therefore, protection scope of the present invention described should be defined by scope of the claims.
Claims (10)
1. a kind of comb, it is characterised in that include：Conducting medium and dielectric；
The dielectric is bottomless prism-shaped, and the conducting medium is prism-shaped, and the dielectric is placed on conductive Jie
Outside matter.
2. comb according to claim 1, it is characterised in that the rectangular cross-section of the dielectric.
3. comb according to claim 1, it is characterised in that the conducting medium is conducting metal rod or conducting metal
Powder.
4. comb according to claim 1, it is characterised in that the material of the dielectric is quartz glass.
5. comb according to claim 1, it is characterised in that the length of side of the inwall of the dielectric is 5mm to 7mm；
The wall thickness of the dielectric is 1mm to 3mm, and the outer wall length of side of conducting medium is 5mm to 7mm.
6. comb according to claim 5, it is characterised in that the outer wall of conducting medium is closely pasted with the inwall of dielectric
Close.
7. comb according to claim 1, it is characterised in that the length of the dielectric is 360mm to 370mm.
8. there is equipment in a kind of low temperature plasma, it is characterised in that include：Power supply unit and multiple such as claim 1 to 7 times
Comb described in one；
The comb is prismatic structure, and multiple combs are parallel to each other, between being formed between the adjacent comb of each two
Gap, and form two comb side walls in the gap and be parallel to each other；
The comb is divided into high potential comb and electronegative potential comb, and the rows different from its current potential are distributed around each described comb
Pipe, the outfan of said supply unit is connected respectively with the terminals of multiple high potential combs, multiple electronegative potential rows
The terminals ground connection of pipe.
9. there is equipment in low temperature plasma according to claim 8, it is characterised in that the adjacent comb of each two
Between vertical dimension it is equal.
10. there is equipment in low temperature plasma according to claim 9, it is characterised in that the adjacent row of each two
Vertical dimension between pipe is 2mm to 10mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710094545.7A CN106604514A (en) | 2017-02-21 | 2017-02-21 | Exhaust pipe and low temperature plasma generation equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710094545.7A CN106604514A (en) | 2017-02-21 | 2017-02-21 | Exhaust pipe and low temperature plasma generation equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106604514A true CN106604514A (en) | 2017-04-26 |
Family
ID=58587839
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710094545.7A Pending CN106604514A (en) | 2017-02-21 | 2017-02-21 | Exhaust pipe and low temperature plasma generation equipment |
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Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002050500A (en) * | 2000-02-08 | 2002-02-15 | Canon Inc | Discharge generating device and discharge generating method |
| US20110180213A1 (en) * | 2008-06-11 | 2011-07-28 | Tokyo Electron Limited | Plasma processing apparatus and plasma processing method |
| CN202444686U (en) * | 2012-02-02 | 2012-09-19 | 中国印刷科学技术研究所 | Novel packaging discharge electrode plate |
| CN103143245A (en) * | 2013-02-26 | 2013-06-12 | 中维环保科技有限公司 | Louver type large-area cold plasma exhaust gas processing device |
| CN105903321A (en) * | 2016-06-13 | 2016-08-31 | 山东大学 | Low-energy-consumption low-temperature plasma gas reaction device |
| CN106582280A (en) * | 2017-02-21 | 2017-04-26 | 唐山铸锐科技有限公司 | Discharge electrode and waste gas treatment device |
| CN206472362U (en) * | 2017-02-21 | 2017-09-05 | 唐山铸锐科技有限公司 | Equipment occurs for comb and low temperature plasma |
-
2017
- 2017-02-21 CN CN201710094545.7A patent/CN106604514A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002050500A (en) * | 2000-02-08 | 2002-02-15 | Canon Inc | Discharge generating device and discharge generating method |
| US20110180213A1 (en) * | 2008-06-11 | 2011-07-28 | Tokyo Electron Limited | Plasma processing apparatus and plasma processing method |
| CN202444686U (en) * | 2012-02-02 | 2012-09-19 | 中国印刷科学技术研究所 | Novel packaging discharge electrode plate |
| CN103143245A (en) * | 2013-02-26 | 2013-06-12 | 中维环保科技有限公司 | Louver type large-area cold plasma exhaust gas processing device |
| CN105903321A (en) * | 2016-06-13 | 2016-08-31 | 山东大学 | Low-energy-consumption low-temperature plasma gas reaction device |
| CN106582280A (en) * | 2017-02-21 | 2017-04-26 | 唐山铸锐科技有限公司 | Discharge electrode and waste gas treatment device |
| CN206472362U (en) * | 2017-02-21 | 2017-09-05 | 唐山铸锐科技有限公司 | Equipment occurs for comb and low temperature plasma |
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