CN106555176A - A kind of PECVD device low-temperature control system - Google Patents
A kind of PECVD device low-temperature control system Download PDFInfo
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- CN106555176A CN106555176A CN201510618286.4A CN201510618286A CN106555176A CN 106555176 A CN106555176 A CN 106555176A CN 201510618286 A CN201510618286 A CN 201510618286A CN 106555176 A CN106555176 A CN 106555176A
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- temperature
- heating dish
- oil
- machine
- regulating valve
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Abstract
The invention belongs to semiconductive thin film deposition applications manufacture field with semiconductor equipment, it is particularly a kind of PECVD device low-temperature control system.Including：The pipeline of local temperature controller, regulating valve, oil temperature machine and connection, local temperature controller can read the temperature of heating dish, while adjusted according to the PID of itself, export the signal of 4-20mA to control to adjust the aperture of valve；Regulating valve, according to the signal of local temperature controller input, carrys out the aperture of regulating valve, so as to adjust the flow of liquid in pipeline；Oil temperature machine, is connected to heating dish by regulating valve, controls the temperature of heating dish by adjusting oily temperature.The present invention avoids heating dish from occurring cooling in the cleaning process of cavity.The temperature of heating dish keeps constant, you can to realize the consecutive production of product, the production capacity of equipment is greatly improved very much.
Description
Technical field
The invention belongs to semiconductive thin film deposition applications manufacture field with semiconductor equipment, it is particularly one
Plant PECVD device low-temperature control system.
Background technology
PECVD device occupies very big proportion in film preparation, and low temperature process is applied in PECVD
Equally occupy very big proportion in equipment, therefore the production capacity of guarantee low temperature process is a very important thing.
At present, in PECVD TEOS low temperature process, with the increase of thin film deposition time, electrical heating heating dish
Temperature can be higher than initial set temperature, need to give after deposition the time of heating dish cooling, the phenomenon is serious
Have impact on the production capacity of job shop.Therefore need a kind of new mode of heating so that the temperature of heating dish in technique
Degree keeps constant, improves the efficiency of film preparation.
The content of the invention
The technical problem to be solved is to provide a kind of PECVD device low-temperature control system, solution
Certainly in oil temperature heating process, with the increase of thin film deposition time, the temperature of electrical heating heating dish can be higher than just
Begin to arrange temperature, need to give the time of heating dish cooling after deposition, the phenomenon has had a strong impact on job shop
Production capacity problem.
The present invention is achieved in that
A kind of PECVD device low-temperature control system, including：Local temperature controller, regulating valve, oil temperature machine with
And the pipeline of connection,
Local temperature controller, can read the temperature of heating dish, while being adjusted according to the PID of itself, output
The signal of 4-20mA is controlling to adjust the aperture of valve；
Regulating valve, according to the signal of local temperature controller input, carrys out the aperture of regulating valve, so as to adjust in pipeline
The flow of liquid；
Oil temperature machine, is connected to heating dish by regulating valve, controls the temperature of heating dish by adjusting oily temperature
Degree.
Further, there are two fuel tanks in oil temperature machine, the temperature of fuel tank is controlled respectively, the outlet of oil temperature machine is one
Road pipeline, inside oil temperature machine by control cross valve switching come control export flow out be which fuel tank oil,
The switching of cross valve passes through local temperature controller control realization.
Further, local temperature controller includes the temperature that heating dish is detected using thermocouple.
Further, local temperature controller include input keyboard for input setting oil temperature machine in fuel tank temperature.
Compared with prior art, beneficial effect is the present invention：The present invention is replaced using the system of oil temperature heating
Electrical heating, to reach the purpose of control heating dish temperature.When RF input power is opened, by reducing oil
Temperature reverses plasma and gas reaction heats that heating dish is brought, and then heating dish is protected
Hold constant in design temperature.Need for the temperature of oil to rise to initial temperature at the end of deposition process, it is to avoid plus
Hot plate occurs cooling in the cleaning process of cavity.The temperature of heating dish keeps constant, you can to realize product
Consecutive production, the production capacity of equipment is greatly improved very much.
Description of the drawings
Fig. 1 is the module frame chart of control system provided in an embodiment of the present invention.
Specific embodiment
In order that the objects, technical solutions and advantages of the present invention become more apparent, with reference to embodiments,
The present invention will be described in further detail.It should be appreciated that specific embodiment described herein only to
The present invention is explained, is not intended to limit the present invention.
Referring to Fig. 1, a kind of PECVD device low-temperature control system, including：Local temperature controller 2, regulating valve
3rd, the pipeline of oil temperature machine 4 and connection,
Local temperature controller 2, can read the temperature of heating dish 1, while adjusted according to the PID of itself, it is defeated
Go out the signal of 4-20mA to control to adjust the aperture of valve；
Regulating valve 3, according to the signal of local temperature controller input, carrys out the aperture of regulating valve, so as to adjust pipeline
The flow of interior liquid；
Oil temperature machine 4, is connected to heating dish by regulating valve, controls heating dish by adjusting oily temperature
Temperature.
There are two fuel tanks in oil temperature machine, the temperature of fuel tank is controlled respectively, the outlet of oil temperature machine is pipeline all the way, oily
Inside warm machine by control cross valve switching come control export flow out be which fuel tank oil, cross valve
Switching is by local temperature controller control realization.
The course of work is：
Two fuel tanks of oil temperature machine are respectively provided with a technological temperature and chilling temperature, and heating dish is in technical process
Temperature can more and more higher, temperature controller perform deep fat PID control pattern, according to the elevated temperature of heating dish come
The aperture of control and regulation valve diminishes, and reduces piping flow；Can not expire when temperature controller perceives regulation deep fat flow
During the intensification of sufficient heating dish, the instruction of one switching fuel tank of temperature controller oil supply temperature machine cross valve is passed through in oil pipe
Cold oil, the PID control instruction of now temperature controller execution cold oil, controls oil by the aperture of regulation regulating valve
Flow in pipe, and then reach control heating dish temperature.
Embodiment：
The experiment parameter of 140 DEG C of TEOS techniques is referring to table 1：
Thin film deposition is divided into the following steps：1.He and O2Two kinds of gases are passed through reaction chamber；2. single-frequency 700W rises
Brightness, carries out pretreatment to substrate surface；3., after process terminates, RF input power, TEOS reaction gases are closed
Body is passed through reaction chamber；4. high frequency 1900W build-ups of luminance, deposition film 160s；5. RF input power is closed, it is right
Cavity carries out being evacuated to background pressure.
When doing thin film deposition in electrically heated heating dish, deposition terminates the temperature of post-heating disk can be by initial
140 DEG C are increased to 150 DEG C or so, need the Temperature fall time of about 20 minutes.
When carrying out thin film deposition using oily temperature control heating plate, heating dish initial temperature remains as 140 DEG C, oil temperature
Machine hot oil temperature is set as 140 DEG C, and cold oil temperature is set in 90 DEG C, in technical process whole control system from
Dynamic control heating dish temperature, the temperature that final deposition terminates post-heating disk are remained within 140 ± 2 DEG C.Cause
This can realize successive sedimentation using oily temperature control heating plate, greatly improve production capacity.
Presently preferred embodiments of the present invention is the foregoing is only, it is not to limit the present invention, all at this
Any modification, equivalent and improvement for being made within bright spirit and principle etc., should be included in the present invention
Protection domain within.
Claims (4)
1. a kind of PECVD device low-temperature control system, it is characterised in that include：Local temperature controller, tune
The pipeline of section valve, oil temperature machine and connection,
Local temperature controller, can read the temperature of heating dish, while being adjusted according to the PID of itself, output
The signal of 4-20mA is controlling to adjust the aperture of valve；
Regulating valve, according to the signal of local temperature controller input, carrys out the aperture of regulating valve, so as to adjust in pipeline
The flow of liquid；
Oil temperature machine, is connected to heating dish by regulating valve, controls the temperature of heating dish by adjusting oily temperature
Degree.
2. according to the PECVD device low-temperature control system described in claim 1, it is characterised in that oil temperature
There are two fuel tanks in machine, the temperature of fuel tank is controlled respectively, the outlet of oil temperature machine is pipeline all the way, inside oil temperature machine
Control to export by controlling the switching of cross valve flow out be which fuel tank oil, the switching of cross valve passes through
Local temperature controller control realization.
3. according to the PECVD device low-temperature control system described in claim 1, it is characterised in that local
Temperature controller includes the temperature that heating dish is detected using thermocouple.
4. according to the PECVD device low-temperature control system described in claim 1, it is characterised in that local
Temperature controller include input keyboard for input setting oil temperature machine in fuel tank temperature.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510618286.4A CN106555176A (en) | 2015-09-24 | 2015-09-24 | A kind of PECVD device low-temperature control system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510618286.4A CN106555176A (en) | 2015-09-24 | 2015-09-24 | A kind of PECVD device low-temperature control system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106555176A true CN106555176A (en) | 2017-04-05 |
Family
ID=58413929
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510618286.4A Pending CN106555176A (en) | 2015-09-24 | 2015-09-24 | A kind of PECVD device low-temperature control system |
Country Status (1)
| Country | Link |
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| CN (1) | CN106555176A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108873983A (en) * | 2018-06-27 | 2018-11-23 | 沈阳拓荆科技有限公司 | The compound temperature-controlling system of semiconductor heating dish and temperature control method |
-
2015
- 2015-09-24 CN CN201510618286.4A patent/CN106555176A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108873983A (en) * | 2018-06-27 | 2018-11-23 | 沈阳拓荆科技有限公司 | The compound temperature-controlling system of semiconductor heating dish and temperature control method |
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| PB01 | Publication | ||
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| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20170405 |