CN106555163B - Stamping die class bores the method for carbon Coating optimization parameter and the stamping die using it - Google Patents
Stamping die class bores the method for carbon Coating optimization parameter and the stamping die using it Download PDFInfo
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Abstract
The present invention discloses the method and application its stamping die that a kind of stamping die class bores carbon Coating optimization parameter, the method of Coating optimization parameter includes: carrying out field mouthful parameter selection, it defines several functional character demands, select filming parameter appropriate as the factor, choose multiple levels；Product function quantification data of each factor under different level are obtained with field mouthful experimental method；The signal-to-noise ratio of each group parameter is calculated using field mouthful experimental method, and its optimal combination is reasoned out by signal-to-noise ratio, then carry out the confirmation experiment of its parameter optimization, to obtain optimization filming parameter, and the analysis of variance for carrying out each property calculates the contribution degree of each factor, by influence degree between each contribution degree factor of determination；It carries out parameter optimization experiment and multiple experiment repeatedly is carried out by parameter optimization experiment, repeat and detected, to obtain field mouthful steadyization parameter.The present invention can reduce the shear stress born in forming process in tool surfaces, and plated film has preferable adhesion and mechanicalness, corrosion resistance simultaneously.
Description
Technical field
The present invention is special about a kind of method of stamping die class brill carbon Coating optimization parameter and using its stamping die
A kind of plated film found out using Taguchi's method comprising maximum adhesion power and the optimization of more purposes of minimized friction coefficient is not related to
Parameter and the coated stamping die of tool is made using the parameter.
Background technique
Class diamond (Diamond-Like Carbon, abbreviation DLC) film is that carbon atom and a small amount of hydrogen atom are bonded composition
Noncrystalline (do not crystallize) film, since atomic diameter is small and arrangement is very fine and close, the number of unit volume covalently bonded compared with
It is more, become the material that hardness is only second to diamond.To eliminate the dangling bonds on surface, class diamond film up to stabilization chemically
The atom on surface often exists in the form of double bond.Carbon-to-carbon double bond is highly stable structure, because the surface of such diamond film is anti-
Answering property is low (more non-sticky glutinous), and coefficient of friction is small, is very suitable to apply the place needing abrasion performance, especially mold.In addition by
In class diamond film be non-crystalline, it is easy to very smooth film can be deposited on substrate, be very suitable for optics or
Mirror surface mould surface is coating.Also, the chemical stability of class diamond film is splendid, it can be with acid and alkali-resistance, therefore be very suitable to apply
Under acrid environment.It can be finally made due to class diamond film in room temperature, in the process of preparation class diamond film
In the damage of mold will not be caused because of thermal deformation.
Class diamond film have high rigidity, acid and alkali-resistance, smooth surface, low frictional factor, easy mold release, abrasion performance, thermal conductance it is good,
The characteristics such as low temperature process, thus be more suitable for applying in the protection of mold more than other materials, increase die life and reaches 2-
10 times.Class diamond film is plated on mold and can assist to radiate again, improves mould fluidity matter, increases release property, ratio of briquetting and replication rate, contracting
Short processing time promotes product yield and reduces time and the number of demoulding and clear mould.
Summary of the invention
The purpose of the present invention is to provide a kind of in stamping die with the thin film coating of low-friction coefficient, has simultaneously
The method of the sputter parameter designing of relatively preferable coating adhesion.
Another object of the present invention is to provide stamping dies made of a kind of method using above-mentioned sputter parameter designing
Sputtered layer.
For the mesh for reaching the above method, technological means of the invention is that providing a type bores carbon Coating optimization parameter
Method, step include: field mouthful parameter selection are carried out, to define multiple (three) functional character demands and select plated film appropriate
Parameter chooses multiple levels as the factor, those functional character demands include plated film adhesion, coefficient of friction and abrasion performance
Power, the factor include intermediary layer, substrate bias, aluminium target current, chromium target electric current, titanium target current, substrate rotation speed, nitrogen
Throughput and acetylene flow；According to those functional character demands, each factor is obtained in different level with field mouthful experimental method respectively
Under product function quantification data；And the signal-to-noise ratio that each group parameter is analyzed according to product function quantification data is calculated using field mouthful experimental method
(S/N), and its optimal combination is reasoned out by those signal-to-noise ratio and carry out parameter optimization confirmation experiment again, to obtain comprising those functions
More purposes optimization filming parameter.
For the mesh for reaching above-mentioned apparatus, technological means of the invention is to provide a kind of application its class and bores carbon Coating optimization
The stamping die of parametric technique processing procedure.
Present invention has the advantage that: present invention application Taguchi's method, cooperation use the four closed Nonequilibrium magnetics in target source
Sputter system is controlled to carry out reactive plated film sputter, four target sources use 2 chromium targets, 1 titanium target, 1 aluminium target respectively, and are added
Reactant gas nitrogen (N2) and acetylene (C2H2) make (TiCrAl) CN multilayer film using the method for reactive sputter, with field
Mouth experimental method cooperates analysis of variance, provides the filming parameter of more purposes optimizations, and can be according to required purpose, according to the plated film
Parameter forms class on stamping die (such as formed punch, die cavity or pressure plate) surface and bores carbon plated film.Present invention application sputter is in stamping die
The compound quasi cobalt carbon diaphragm of titanium carbonitride chromium aluminium (TiCrAl) CN on tool surface makes mold have rather low coefficient of friction and make plate
Embryo material is easy to slide between mold to increase press formability, and plated film has preferable adhesion and mechanicalness, corrosion resistant simultaneously
Corrosion.
Detailed description of the invention
Fig. 1 is painted the present invention using the schematic diagram of the equipment of the closed Nonequilibrium magnetic control sputter system in four target sources；
Fig. 2 is painted the coefficient of friction of the test piece number experimental group that the present invention is tested using the field cause for gossip figure compared with rate of wear；
Fig. 3 is painted the controlling elements of the test piece number experimental group that the present invention is tested using field cause for gossip and horizontal and coefficient of friction
The coordinate diagram of signal-to-noise ratio；
Fig. 4 is painted the coefficient of friction of the test piece number experimental group that the present invention is tested using the field cause for gossip figure compared with adhesive force；
Fig. 5 is painted the controlling elements for the test piece number experimental group that the present invention applies field cause for gossip to test and the letter of level and adhesive force
It makes an uproar the coordinate diagram of ratio；
Fig. 6 is painted the coefficient of friction of the test piece number experimental group that the present invention is tested using the field cause for gossip figure compared with impression.
In figure:
The closed non-equilibrium magnetic controlled sputter system in 10 4 target sources；
11 cavitys；
12 substrates；
13 targets；
131 chromium targets；
132 aluminium targets；
133 titanium targets；
14 jigs；
15 magnetic confining fields；
L-1, L-2, L-3 are horizontal；
Step S10~step S40 application Taguchi's method determines the method that stamping die class bores carbon Coating optimization parameter.
Specific embodiment
The present invention will be further explained below with reference to the attached drawings and specific examples, so that those skilled in the art can be with
It better understands the present invention and can be practiced, but illustrated embodiment is not as a limitation of the invention.
Referring again to shown in Fig. 1.Application Taguchi's method (Taguchi methods) of the invention determines that stamping die class is bored
The method of carbon Coating optimization parameter is suitable for the closed Nonequilibrium magnetic in four target sources and controls sputtering method, and the target 13 used includes 2
131,1 titanium targets 133 of a chromium target and an aluminium target 132 carry out plated film to substrate 12, which is alloy tool steel
(SKD11), it is set on the jig 14 in the magnetic confining field 15 of closed Nonequilibrium magnetic control sputter system 10, which exists
First carried out before sputter surface polishing (high-speed steel after purchase after Overheating Treatment, via waterproof abrasive paper grinding and looking-glass finish) and
Removal surface and oil contaminant and foul simultaneously make moisture drying, which first carries out ion bombardment to the substrate 12, with clear in sputter
It is clean and activate 12 surface of substrate (mainly using a significant voltage make generate electric field add argon gas (Ar) formed plasma-based dissociate
At Ar+ and electronics e-, the powerful bias added by the substrate 12 generates the effect of shock, this stage main mesh due to generating and attract
Be by the dirts such as oxide that 12 material surface of substrate may generate and impurity by ion hit in the way of hit substrate
Surface, while sputtering substrate can also be allowed to heat up, ion runner rate when increasing sputter, can so make plated film more evenly with adhesive force
More preferably).The step of method of its class brill carbon Coating optimization parameter, includes:
Step S10 carries out field mouthful parameter selection, to define the coefficient of friction, adhesive force, wear-resisting effort of several such as plated films
Functional character demand simultaneously selects filming parameter appropriate as the factor (such as intermediary layer, substrate bias, aluminium target current, chromium target
Material electric current, titanium target current, substrate rotation speed, nitrogen flow and acetylene flow), and (this experiment is three to the multiple levels of selection
A level: L-1-L-3).As shown in Figure 1, this experiment is carried out instead using the closed non-equilibrium magnetic controlled sputter system 10 in four target sources
Answering property plated film sputter, the target 13 in four target sources uses 2 chromium targets, 131,1 titanium targets 133 and 1 aluminium target 132 respectively, and adds
Enter reactant gas nitrogen (N2) and acetylene (C2H2), prepares titanium carbonitride chromium aluminium-using the method for reactive sputter
(TiCrAl) CN multilayer film.The present invention seeks the process parameter of optimization using field mouthful experimental method, (is deposited first by intermediary layer to improve
Class bore carbon plated film adhesion institute in advance at Cr or CrN layers of the preplating of substrate institute) acquirement experiment parameter, and with substrate bias, chromium,
Aluminium, titanium target current, substrate rotation speed, nitrogen flow, acetylene flow are the experiment factor, and take three horizontal (L-1-L-3), choosing
Take each factor and level using the straight friendship table (Taguchi ' s orthogonal arrays) of L18 (21 × 37) as experiment condition
Configuration, handle altogether for 18 coatings, experimental system and configuration are as shown in Figure 1, the experiment factor and water-glass such as table
Shown in 1.
Table 1
Step S20 obtains each factor in different water with field mouthful experimental method respectively according to those aforementioned functional character demands
Product function quantification data under flat (level).Field mouthful method of experimental design can be tested in the lower reduction of exactness without misalignment, straight using improvement
Hand over table to be applied to planning experiment to configure, may make planning experiment have many advantages, such as to simplify experiment, analysis and calculating it is easy, avoid by
Graph One factor or the reproducibility problems and many and diverse of total divisor experiment, with the most economical and efficient processing procedure item for finding out large-scale production
Part reaches steadyization.Field cause for gossip is tested mainly comprising the two classification factors, and one is controlling elements, that is, designer can grasp simultaneously
The factor under different level is controlled, two be noise factor, is difficult to for controller or the uncontrollable factor, and experiment institute is defined
The factor and number of levels needed hands over table to carry out experimental configuration selection is appropriate straight, is finally divided will test resulting data
Analysis is compared using the S/N (singal to noise) that response table finds out each factor level, and the bigger representation quality characteristic of S/N ratio is more
It is good, then find out Optimal Parameters condition via the relationship between each factor level, then carry out confirmation experiment, and can be speculated by S/N it is each because
The sub horizontal influence degree to target, carries out factorial experiment one by one by different contribution degrees again, is able to find out optimization and steadyization
Parameter designing.
It usesCharacteristic as quality.And mass property can be divided into three kinds of forms: 1. hope
Mesh type mass property approaches target value m,2. hoping miniature mass characteristic smaller better, that is, target
Value m=0,3. hoping that large-scale mass property is bigger better, 1/y is quite asked to hope compact nature, m=0 is at this timeIt is S/N=-10log that MSD, which is converted into the S/N in signal processing than pattern,
[MSD]。
After determining field mouthful L18 (21*37) parameter, sputtering equipment is extracted into predetermined vacuum (4.0*10-5 Bristol) and can open
Beginning sputter needs first to carry out ion bombardment before sputter, surface is heated up and cleans then sputter dura mater.
Test piece after sputter will carry out plated film machinery nature examination, comprising: adhesion (qualitative, quantitative), coefficient of friction with
Abrasion etc..Microstructure analysis includes: scanning electron microscope (SEM) observation cross section kenel, thickness, scratch and impression rail
Mark is analyzed otherwise for film coating composition, electron spectroscopy for chemical analysis instrument (ELECTRON SPECTROSCOPY FOR
CHEMICAL ANALYSIS, ESCA) depth constituent analysis, it carries out each property again by above-mentioned experimental analysis and is compared to each other.
Step S30 calculates the signal-to-noise ratio (S/N) that each group parameter is analyzed according to product function quantification data using field mouthful experimental method,
And its optimal combination is reasoned out by those signal-to-noise ratio, then carry out the confirmation experiment of its parameter optimization, to obtain comprising those functions
The filming parameter of more purposes optimization, and carry out via the Optimal Parameters that field mouthful experimental method obtains the analysis of variance of each property
(ANOVA) contribution degree for calculating each factor, by influence degree between each contribution degree factor of determination.By the above experimental analysis, then benefit
Its each group Parameter SNR (S/N) is calculated with field mouthful experimental method, optimal combination is reasoned out by signal-to-noise ratio and optimizes confirmation again in fact
It tests, and calculates each factor contributions degree via the analysis of variance that the data that field mouthful experimental method obtains carry out each property, by each tribute
Influence degree between the degree factor of determination offered.
Step 40, parameter optimization experiment is carried out according to each functional character demand respectively, and is tested and is carried out by parameter optimization
Multiple experiment repeatedly, then the detection of previous step is carried out, to obtain a field mouthful steadyization parameter.Via preliminary experimental results,
The coefficient of friction and adhesive force that are directed to plated film respectively carry out the experiment of parameter optimization, and repeatedly repeatedly real by optimization experiment progress
The detection such as experiment and step S30 property tested, confirm the reproducibility of this processing procedure, and carry out step S20 again, finally obtains one
Field mouthful steadyization parameter provides industry using multilayer technique and increases die life.
In summary it is found that 18 groups (L1~L18) that aforementioned each factor and horizontal and L18 (21*37) straight friendship table carry out
Experimental group test piece can be divided into three groups to describe, and be that C2H2 (0SCCM), C2H2 (2SCCM), C2H2 (3.5SCCM) can be borrowed respectively
Experimental result is inquired by the number of carbon content and is analyzed.
It carries out the result of abrasion test: the use of 316 stainless steel balls being opposite grinding material (diameter about 6.4mm).It imposes respectively
0.3Kg, the testing length of distance 200M, sliding speed 0.3M/S, rotating diameter 12mm are tested.Whole coefficient of friction
It is distributed between 0.13~1.45, rate of wear is distributed in 0.207~6.359.C2H2 (0SCCM) is with experimental group L1 coefficient of friction
Minimum 1.08, L15 rate of wear is minimum 0.41, abrasion depth is most shallowly 0.347 μm.C2H2 (2SCCM) is with L9 coefficient of friction
Minimum 0.254, rate of wear is minimum 0.267, abrasion depth is most shallowly 0.676 μm.C2H2 (3.5SCCM) is friction with L17
Coefficient minimum about 0.13, rate of wear are minimum 0.207, abrasion depth is most shallowly 0.246 μm.Therefore the higher test piece of carbon content rubs
It is lower to wipe coefficient.Its coefficient of friction compared with rate of wear figure as shown in Fig. 2, its wear away area, wear volume, rate of wear, friction
Coefficient data library is as shown in table 2.
Table 2
Its coefficient of friction S/N is than as shown in table 3:
Table 3
Its coefficient of friction reacts chart as shown in Fig. 3 and table 4.
Table 4
| A | B | C | D | E | F | G | H | |
| L-1 | 3.1577 | 2.9426 | 4.1402 | 7.4118 | 3.0902 | 4.8960 | 5.2564 | -1.5424 |
| L-2 | 5.3188 | 3.9175 | 5.1697 | 4.0732 | 3.0284 | 4.8278 | 3.3099 | 4.9782 |
| L-3 | 0.0000 | 5.8547 | 3.4049 | 1.2297 | 6.5962 | 2.9909 | 4.1484 | 9.2789 |
| Influence degree | 2.1612 | 2.9121 | 1.7647 | 6.1821 | 3.5678 | 1.9051 | 1.9465 | 10.8213 |
| Ranking | 5 | 4 | 8 | 2 | 3 | 7 | 6 | 1 |
It is tested by field cause for gossip and finds out reaction table and be known that (TiCrAl) CN multilayer film L18 coefficient of friction (hope small) S/N parameter
Optimum organization is as shown in table 5.
Table 5
By result it is known that the smallest experiment factor of coefficient of friction and horizontal optimum combination condition are intermediary layer Cr/
CrN, substrate bias -70V, aluminium target current 2A, chromium target current 1.5A, substrate revolving speed 2rpm, nitrogen flow 5sccm, titanium electric current 2A,
C2H2Flow 3.5sccm.
Further the parameter to coefficient of friction analysis of variance can be carried out via field mouthful analysis result, it can by this analysis
Learn that the contribution degree in each process parameter for coefficient of friction is as shown in table 6.
Table 6
| The factor | Quadratic sum | Freedom degree | Side and | F value | Contribution degree |
| A | 21.018 | 1.0 | 21.0118 | 6.268 | 3.44 |
| B | 26.368 | 2.0 | 13.184 | 3.932 | 4.32 |
| C | 9.430 | 2.0 | 4.715 | 1.406 | 1.55 |
| D | 114.901 | 2.0 | 57.450 | 17.132 | 18.83 |
| E | 50.049 | 2.0 | 25.025 | 7.463 | 8.20 |
| F | 14.016 | 2.0 | 7.008 | 2.090 | 2.30 |
| G | 11.439 | 2.0 | 5.719 | 1.706 | 1.87 |
| H | 356.231 | 2.0 | 178.116 | 53.116 | 58.38 |
| Error | 6.707 | 2.0 | 3.353 | 1.000 | 1.10 |
| Summation | 610.158 | 17.0 | 35.892 | 100.00 |
Carry out the result of scratch test: with 300 μm of diamond cones of diameter with the loading increment rate of 1N per second, scratch length 1 is public
Point, maximum loading is 100N.Test the situation peeled off with optical microscopy observation plated film and substrate, then scratch tester of arranging in pairs or groups
The curve graph of measured next coefficient of friction and loading is compared to each other the critical load for finding out plated film, when the critical load the big attached
Put forth effort bigger.C2H2 (0SCCM) is up to 33.0147N with L10 adhesive force, and C2H2 (2SCCM) is up to L2 adhesive force
42.411N, C2H2 (3.5SCCM) are up to 56.705N with L17 adhesive force.The higher test piece of carbon content is learnt by experimental result
Adhesive force is bigger.Its coefficient of friction figure compared with adhesive force is as shown in Figure 4.From scratch test it can be observed how when film into
Coefficient of friction is to continue rising, but coefficient of friction can decline when having arrived critical load (adhesive force) when row scratch test.By
The method observation scratch test learn the adhesive force of 18 groups of test pieces and record system it is whole.Since current research direction is low friction system
Number, therefore be that coefficient of friction is minimum simultaneously in this 18 groups of test pieces by L17 from the point of view of the coefficient of friction of Fig. 4 and the comparison chart of adhesive force
And the highest test piece of adhesive force.The S/N of the adhesive force of this experiment is than as shown in table 7.
Table 7
| A | B | C | D | E | F | G | H | Adhesive force | S/N | |
| L1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 23.27685 | 27.26611 |
| L2 | 1 | 1 | 2 | 2 | 2 | 2 | 2 | 2 | 42.411 | 32.44461 |
| L3 | 1 | 1 | 3 | 3 | 3 | 3 | 3 | 3 | 43.419 | 32.65087 |
| L4 | 1 | 2 | 1 | 1 | 2 | 2 | 3 | 3 | 36.08993 | 31.10887 |
| L5 | 1 | 2 | 2 | 2 | 2 | 3 | 3 | 1 | 32.70317 | 30.20372 |
| L6 | 1 | 2 | 3 | 3 | 1 | 1 | 2 | 2 | 25.79657 | 27.99016 |
| L7 | 1 | 3 | 1 | 2 | 1 | 3 | 2 | 3 | 27.738 | 28.79478 |
| L8 | 1 | 3 | 2 | 3 | 2 | 1 | 3 | 1 | 26.0483 | 28.11659 |
| L9 | 1 | 3 | 3 | 1 | 3 | 2 | 1 | 2 | 24.13667 | 27.31614 |
| L10 | 2 | 1 | 1 | 3 | 3 | 2 | 2 | 1 | 33.0147 | 30.26951 |
| L11 | 2 | 1 | 2 | 1 | 1 | 3 | 3 | 2 | 31.23597 | 29.76465 |
| L12 | 2 | 1 | 3 | 2 | 2 | 1 | 1 | 3 | 21.528 | 26.65277 |
| L13 | 2 | 2 | 1 | 2 | 3 | 1 | 3 | 2 | 26.75233 | 28.30398 |
| L14 | 2 | 2 | 2 | 3 | 1 | 2 | 1 | 3 | 30.06487 | 29.53052 |
| L15 | 2 | 2 | 3 | 1 | 2 | 3 | 2 | 1 | 25.048 | 27.87225 |
| L16 | 2 | 3 | 1 | 3 | 2 | 3 | 1 | 2 | 33.235 | 30.42854 |
| L17 | 2 | 3 | 2 | 1 | 3 | 1 | 2 | 3 | 56.70492 | 35.05188 |
| L18 | 2 | 3 | 3 | 2 | 1 | 2 | 3 | 1 | 21.39467 | 26.60427 |
Its adhesive force reacts chart as shown in Fig. 5 and table 8.
Table 8
It is tested by field cause for gossip and finds out reaction table and be known that (TiCrAl) CN multilayer film L18 adhesive force (hope big) S/N parameter is excellent
It is as shown in table 9 to change combination.
Table 9
By result it is known that the maximum experiment factor of adhesive force and level optimum combination condition are that intermediary layer Cr, substrate are inclined
Press 0V, aluminium target current 1.5A, chromium target current 2.5A, substrate revolving speed 2rpm, nitrogen flow 15sccm, titanium electric current 2.5A, C2H2 stream
Measure 3.5sccm.
Further the parameter to adhesive force analysis of variance (ANOVA) can be carried out via field mouthful analysis result, by this
Analysis is it can be seen that the contribution degree in process parameter for adhesive force is as shown in table 10.
Table 10
| The factor | Quadratic sum | Freedom degree | Side and | F value | Contribution degree |
| A | 0.11 | 1.00 | 0.11 | 0.01 | 0.12 |
| B | 1.42 | 2.00 | 0.71 | 0.08 | 1.59 |
| C | 21.50 | 2.00 | 10.75 | 1.21 | 24.15 |
| D | 3.61 | 2.00 | 1.81 | 0.20 | 4.06 |
| E | 15.98 | 2.00 | 7.99 | 0.90 | 17.95 |
| F | 3.40 | 2.00 | 1.70 | 0.19 | 3.82 |
| G | 10.14 | 2.00 | 5.07 | 0.57 | 11.39 |
| H | 15.16 | 2.00 | 7.58 | 0.86 | 17.03 |
| Summation | 89.03 | 17.00 | 5.24 | 100.00 |
It carries out the result of indentation test: using 20 times of optical microphotographs after doing hardness test in test piece using Rockwell Hardness machine
Sem observation impression trace.The classification of C2H2 (0SCCM) L10 impression is preferably 1, C2H2 (2SCCM) L6 impression classification preferably 4,
C2H2 (3.5SCCM) L12 impression classification preferably 3.By experimental result it is known that C2H2 (0SCCM) quality is softer therefore film
Toughness is greater than brittleness, and C2H2 (2SCCM) and C2H2 (3.5SCCM) are then that brittleness is greater than toughness.Its coefficient of friction and impression ratio
It is as shown in Figure 6 compared with figure.
Carry out the result of each first table content ratio detection: with high parsing electron spectrometer (XPS) can learn elemental chromium,
The content ratio of silicon, titanium, carbon, aluminium in test piece, wherein C2H2 (0SCCM) is up to 5.85%, C2H2 with L18 carbon content
(2SCCM) is up to 21.8%, C2H2 (3.5SCCM) with L11 carbon content and is up to 61.68% with L4 carbon content.
In addition, about optimization coating in the application of mold, using the closed non-equilibrium magnetic controlled sputter system in four target sources come into
Row reactivity plated film sputter, four target sources use Cr*2, Ti, Al target respectively, and reactant gas nitrogen (N2) and second is added
Alkynes (C2H2) prepares (TiCrAl) CN multilayer film using the method for reactive sputter.Because in this 18 groups L17 be it is therein most
Good combination, therefore directly the film-plating process parameter of L17 is applied and does durable test in mold (pressure plate).This step-by-step test pressure
Expect power, punch diameter, punch nose angle radius, die cavity radius of corner.
Experimental result: die surface coating forming height is all higher than no coating.It is existing to have no peeling for coating after experiment 134 times
As.
From above-mentioned analysis of experimental results: 1) can be learnt in 18 groups of test combinations by result when intermediary layer is Cr/
CrN, substrate bias -70V, aluminium target current 2A, chromium target current 1.5A, substrate revolving speed 2rpm, nitrogen flow 5sccm, titanium electric current
When 2.5A, C2H2 flow 3.5sccm, coefficient of friction is up to 0.13.2) friction system is calculated using S/N ratio using Taguchi's method
Number optimum organizations, be intermediary layer Cr/CrN, substrate bias -70V, aluminium target current 2A, chromium target current 1.5A, substrate revolving speed 2rpm,
Nitrogen flow 5sccm, titanium electric current 2A, C2H2 flow 3.5sccm.3) it can be learnt by result and work as intermediary in 18 groups of test combinations
Layer be Cr/CrN, substrate bias -70V, aluminium target current 2A, chromium target current 1.5A, substrate revolving speed 2rpm, nitrogen flow 5sccm,
When titanium electric current 2.5A, C2H2 flow 3.5sccm, adhesive force is up to 56.705N.4) it is calculated using Taguchi's method using S/N ratio
Adhesive force optimum organization, be intermediary layer Cr, substrate bias 0V, aluminium target current 1.5A, chromium target current 2.5A, substrate revolving speed 2rpm,
Nitrogen flow 15sccm, titanium electric current 2.5A, C2H2 flow 3.5sccm.5) by result can learn in 18 groups of test combinations when
Intermediary layer is Cr/CrN, substrate bias -35V, aluminium target current 3A, chromium target current 1.5A, substrate revolving speed 1rpm, nitrogen flow
When 15sccm, titanium electric current 2.5A, C2H2 flow 0sccm, contact angle is up to 110.365 °.6) it can be learnt by result in 18 groups of realities
It tests in combination when intermediary layer is Cr/CrN, substrate bias -35V, aluminium target current 2A, chromium target current 3A, substrate revolving speed 0.5rpm, nitrogen
When throughput 10sccm, titanium electric current 2A, C2H2 flow 3.5sccm, Raman spectrometer (Raman spectrum) analyzing film is utilized
The sp3 diamond bond structures of layer and the area (intensity) of sp2 graphite bond structures are that property is most in 18 groups of test pieces than being 2.235
Close to diamond.7) it can be learnt in 18 groups of test combinations by result when intermediary layer is Cr/CrN, substrate bias -70V, aluminium target electricity
It is average when flowing 1.5A, chromium target current 3A, substrate revolving speed 1rpm, nitrogen flow 15sccm, titanium electric current 2A, C2H2 flow 2sccm
Roughness is 2.014.8) it can be learnt in 18 groups of test combinations by result when intermediary layer is Cr, substrate bias -35V, aluminium target
When electric current 1.5A, chromium target current 3A, substrate revolving speed 1rpm, nitrogen flow 10sccm, titanium electric current 3A, C2H2 flow 3.5sccm, film
Thickness is 0.853 μm.9) stamping experimental result, die surface coating forming height is higher than no coating.10) stamping experiment
Coating has no peeling phenomenon after 134 times.
Embodiment described above is only to absolutely prove preferred embodiment that is of the invention and being lifted, protection model of the invention
It encloses without being limited thereto.Those skilled in the art's made equivalent substitute or transformation on the basis of the present invention, in the present invention
Protection scope within.Protection scope of the present invention is subject to claims.
Claims (9)
1. a kind of method that stamping die class bores carbon Coating optimization parameter is suitable for the closed Nonequilibrium magnetic in four target sources and controls sputter
Method, and plated film is carried out to a substrate using 2 chromium targets, 1 titanium target and an aluminium target, which is characterized in that it comprises the steps of:
Field mouthful parameter selection is carried out, to define several functional character demands and select filming parameter appropriate as the factor, and is selected
Multiple levels are taken, those functional character demands include plated film adhesion, coefficient of friction and wear-resisting effort, which includes intermediary
Layer, substrate bias, aluminium target current, chromium target electric current, titanium target current, substrate rotation speed, nitrogen flow and acetylene flow；
According to those functional character demands, product function quantification number of each factor under different level is obtained with field mouthful experimental method respectively
According to；
The signal-to-noise ratio that each group parameter is analyzed according to product function quantification data is calculated using field mouthful experimental method, and by those signal-to-noise ratio inferences
Its optimal combination out, then the confirmation experiment of its parameter optimization is carried out, to obtain the plated film ginseng that more purposes comprising those functions optimize
It counts, and calculates the contribution degree of each factor via the analysis of variance that the Optimal Parameters that field mouthful experimental method obtains carry out each property, by
Influence degree between each contribution degree factor of determination；And
Parameter optimization experiment is carried out according to each functional character demand respectively, and is carried out by parameter optimization experiment multiple repeatedly real
It tests, then carries out the detection of previous step, to obtain a field mouthful steadyization parameter.
2. the method that stamping die class according to claim 1 bores carbon Coating optimization parameter, which is characterized in that wherein, should
Substrate is high-speed steel SKD11.
3. the method that stamping die class according to claim 1 bores carbon Coating optimization parameter, which is characterized in that wherein, should
Substrate first carries out surface polishing and removal surface and oil contaminant and foul before sputter and makes moisture drying.
4. the method that stamping die class according to claim 3 bores carbon Coating optimization parameter, which is characterized in that wherein, should
Substrate first carries out ion bombardment to the substrate, to clean and activate substrate surface in sputter.
5. a kind of stamping die bores carbon Coating optimization parametric technique using the stamping die class of any one of Claims 1-4,
The stamping die of the hardening film surface with titanium carbonitride chromium aluminium coat is made.
6. stamping die according to claim 5, which is characterized in that wherein, in the stamping die surface sputter carbon nitrogen
Before changing titanium chromium aluminium coat, prior to the stamping die surface sputter chromium or chromium nitride intermediary layer.
7. stamping die according to claim 5, which is characterized in that wherein, the parameter packet of the titanium carbonitride chromium aluminium coat
Contain: the intermediary layer is chromium or chromium nitride, substrate bias -70V, aluminium target current 2A, chromium target current 1.5A, substrate revolving speed 2rpm, nitrogen
Throughput 5sccm, titanium electric current 2.5A, C2H2Flow 3.5sccm, coefficient of friction 0.13, adhesive force 56.705N.
8. stamping die according to claim 5, which is characterized in that wherein, the parameter packet of the titanium carbonitride chromium aluminium coat
Contain: intermediary layer is chromium or chromium nitride, substrate bias -70V, aluminium target current 2A, chromium target current 1.5A, substrate revolving speed 2rpm, nitrogen
Flow 5sccm, titanium electric current 2A, C2H2Flow 3.5sccm.
9. stamping die according to claim 5, which is characterized in that wherein, the parameter packet of the titanium carbonitride chromium aluminium coat
Contain: intermediary layer is chromium, substrate bias 0V, aluminium target current 1.5A, chromium target current 2.5A, substrate revolving speed 2rpm, nitrogen flow
15sccm, titanium electric current 2.5A, C2H2Flow 3.5sccm.
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| CN102817032A (en) * | 2011-06-10 | 2012-12-12 | 现代自动车株式会社 | Coating layer structure of basic material of mold |
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