CN106546178A - The multi-layer transparent dielectric thickness measuring apparatus and method of confocal white light polarization interference - Google Patents
The multi-layer transparent dielectric thickness measuring apparatus and method of confocal white light polarization interference Download PDFInfo
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- CN106546178A CN106546178A CN201610956898.9A CN201610956898A CN106546178A CN 106546178 A CN106546178 A CN 106546178A CN 201610956898 A CN201610956898 A CN 201610956898A CN 106546178 A CN106546178 A CN 106546178A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
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Abstract
The invention belongs to white light interference thickness measuring field, and disclose the multi-layer transparent dielectric thickness measuring apparatus and method of confocal white light polarization interference.Confocal arrangement is constituted including measured object, the 3rd lens, the second lens, second orifice, collimated white light is Jing after the second prism, it is a branch of to converge to measured surface as the 3rd lens of measuring beam Jing, another Shu Zuowei reference beams are interfered with the measuring beam reflected from measured surface after multiple reflections, the rotatable polarizer of the contrast for improving interference fringe is set between the second prism and the second lens, realizes high-contrast interference fringe is formed on the first imageing sensor.The invention also discloses the method measured using said apparatus.By the present invention, using reference beam and measuring beam in laterally small bias, while utilizing confocal and white light interference technique, the white-light fringe of finite width is quickly and easily defined, it is achieved thereby that the measurement of multi-layer transparent dielectric thickness.
Description
Technical field
The invention belongs to white light interference thickness measuring field, is situated between more particularly, to the multi-layer transparent of confocal white light polarization interference
Matter measurer for thickness and method.
Background technology
In field of optical measurements, the measuring system based on principle of interference has become system the most accurate in physical quantity detection
One of system, modern interferometry and the own Jing of measuring technology can reach several centesimal certainty of measurement of a wavelength.And
The principle of wherein conventional white light interference technique is, once proposition, to be just widely used in optical transport and light sensing is surveyed in 1975
In amount technology.1984, people have developed the displacement sensing measurement system based on white light interference technique of first perfect in shape and function
System；The eighties in 19th century, white light interferometer are directly to improve to add white light source on traditional interferometer, such as Michelson
(Michelson) interferometer, Fabry-Perot (Fabry-Perot) interferometer.After nineteen ninety, due to computer, electronic communication
Technology is developed rapidly, and white light interference technique is combined with computer, define new digitlization white light interference technique measurement side
Method, people also more and more recognize the advantage of white light interference technique.The interference fringe of white light interferometer output is characterized in that
There is a principal maximum, it is corresponding with zero optical path difference position, referred to as center striped；Center fringe position provides one for measurement
Individual reliable absolute position reference, can obtain the absolute value of measurand according to the position.Just because of white light interference this
Significantly a little, it is also quite varied to its research and application.Such as：Using the feature measurement displacement of the absolute measurement of white light interference
Distance；Object surface three-dimensional morphology is measured using scanning white light interference technique；Using white light interference technique measuring strain, pressure temperature
The physical quantitys such as degree, building structure, petrochemical industry ambient noise etc..
Optical coherent chromatographic imaging (the Optical Coherence that the nineties in 20th century progressively develops
Tomography it is) a kind of new three-dimensional chromatography imaging technique, the core component of the imaging pattern includes wideband light source, Michael
Inferior interferometer and photodetector.OCT obtains the chromatography ability of depth direction based on low coherence interference principle, can be with by scanning
The two dimension or 3-D view of biological tissue or material internal structure are reconstructed, is mainly used for biomedical aspect.But existing OCT
SLED light sources and fiber optic interferometric system are all used, can only realize that time domain is interfered, final result is the relation of time and light intensity, is not had
Interference fringe is shown, it is by light strong fix interference fringe center, not high hence for the centralized positioning precision of the interference fringe, far
Less than the positioning precision of white light interference technique.
The content of the invention
For the disadvantages described above or Improvement requirement of prior art, the invention provides the multilayer of confocal white light polarization interference is saturating
Bright dielectric thickness measuring apparatus and method, by the setting of speculum and rotatable polarizer, while using white light interference and altogether
With this, burnt technology, realizes that spatial domain is interfered, thus solve the technical problem that white-light fringe contrast is not high, positioning is not high.
For achieving the above object, according to one aspect of the present invention, there is provided the multi-layer transparent of confocal white light polarization interference
Dielectric thickness measuring apparatus, the measurement apparatus include light source, the first aperture, the first lens, the second prism and the 3rd lens, and which is special
Levy and be：
The center of the light source, first aperture, first lens, second prism and the 3rd lens is equal
In same optical axis, wherein, first aperture is arranged on the front focal plane of first lens, for guaranteeing from light source to send out
The light for going out is directional light through the light that the first lens of Jing after the first aperture are transmitted away, after the directional light second prism described in
It is divided into the measuring beam and the reference beam along vertically top reflection for transmiting in the horizontal direction, the tested surface of measured object is arranged on
On the back focal plane of the 3rd lens, the measuring beam is converged on the surface to be measured by the 3rd lens, then former road
Reflex on second prism, then reflected away to vertical lower section by second prism；
Second prism has vertically been sequentially arranged above prism and inclined speculum, the speculum and rib
Displacement platform is also relatively set with the horizontal direction of mirror, in the displacement platform, prism of corner cube is provided with, for making the reference beam
It is irradiated to after lateral shift on the speculum, the vertical lower section of second prism is disposed with the second lens and the first rib
Mirror, in same optical axis, described in the reference beam Jing, vertical top is arranged the part centre that the vertical direction is arranged
Transmitted away by second prism straight down after part reflection；
Any one in the second imageing sensor or second orifice is provided with the back focal plane of second lens, separately
Outer one side for being arranged on the first prism levels direction, and its center to first prism centers distance with it is described
First prism centers to second lens centre apart from the focal length that sum is second lens, after the second orifice
Side is provided with the first imageing sensor, and the center of the second orifice, described first image sensor and first prism
In same optical axis, second imageing sensor is used to show the hot spot that the measurement light and reference ray are formed, described
First imageing sensor is used to show the interference fringe that the measurement light and reference ray are formed, by measuring the interference fringe
The thickness of transparent medium needed for calculating.
Preferably, the measured object, the 3rd lens, second lens and the second orifice constitute confocal knot
Structure, for eliminating the interference of reflecting background light to improve the contrast of the interference fringe.
Preferably, rotatable polarizer is provided between second prism and first prism, and which is with described
Two prisms and the same optical axis of second lens, for adjusting the relative intensity of the measuring beam and reference beam, to improve
State the contrast of interference fringe.
Preferably, the first wave plate is provided between second prism and measured object, and the wave plate and second prism
Same optical axis, the wave plate preferably adopt quarter wave plate.
Preferably, between the speculum and the displacement platform, or arrange between the speculum and the prism
There is the second wave plate, the wave plate preferably adopts quarter wave plate or the one kind in 1/2 wave plate.
Preferably, second and prism preferably adopt polarization splitting prism, described first preferably adopt polarization spectro rib
One kind in mirror and beam splitter.
Preferably, the described the first, the second and the three lens all preferably adopt positive lens.
Preferably, the light source preferably adopts white light source.
Preferably, radius, the measuring beam light of the diameter of the second orifice not less than the reference beam hot spot
The radius of spot and the measurement hot spot are with the reference beam spot center away from three's sum.
According to another aspect of the present invention, the multi-layer transparent dielectric thickness measuring method of confocal white light polarization interference, its
It is characterised by, the measuring method comprises the following steps：
A () opens light source, cause measuring beam to focus on measured object by adjusting the position of the 3rd lens and measured object
First surface, while so that two spot diameters on the second imageing sensor are in the same size, the following position of adjustment speculum
Put and cause the centre-to-centre spacing of described two hot spots equal with preset value；
B () moving displacement platform causes interference fringe occur on the first imageing sensor, wherein, by the position for adjusting polarizer
Put the contrast for changing the interference fringe；
C () records the position L of the now displacement platform horizontal direction1, measure the zero order fringe of the interference fringe with it is pre-
If reference coordinate axle origin apart from d1, and centre-to-centre spacing e of the zero order fringe and one-level striped1；
D () adjusts the position of the 3rd lens, and keep tested object location constant so that light beam focuses on the second of measured object
Surface, while so that two spot diameters on the second imageing sensor are in the same size；Repeat step (b) and (c), record and survey
Amount L2, d2, e2, and the thickness of measured object is calculated according to formula.
Preferably, in step (d), the formula preferably adopt following expression formula, wherein, λ be light source center wavelength, n1
For the measured layer inner refractive index of measured object, H1For the thickness of measured object first surface to second surface,
In general, by the contemplated above technical scheme of the present invention compared with prior art, can obtain down and show
Beneficial effect：
1st, the present invention is by constituting confocal arrangement by testee surface, the 3rd lens, the second lens, second orifice.With
The interference of the reflecting background light on the 3rd lens non-focusing surface is eliminated, particularly when measured object internal layer surface is measured, the back of the body is eliminated
Jing Guang, it is easier to obtain the white-light fringe of internal layer surface and improve the contrast of striped, be adapted to the measurement to multilayer film；
2nd, by increasing rotatable polarizer in measuring instrument in the present invention, for adjusting measuring beam and reference beam
Relative intensity, the light intensity of reference beam is held essentially constant, and the light intensity of measuring beam is with tested surface both sides refringence
The light that reflects of reduction can be more and more weaker, particularly when measured object internal layer surface is measured, play raising fringe contrast
The effect of degree；
3rd, the present invention obtains the interference bar in spatial domain by arranging inclined speculum above the prism of vertical direction
Line, adjusting speculum makes to converge in the hot spot of the hot spot of the reference beam on the second imageing sensor and measuring beam not fully
Overlap, but laterally having small suitable bias Δ, thus form the white-light fringe of finite width, speculum is adjusted
The bias Δ of section also affects the width of white-light fringe simultaneously, can obtain suitable width of fringe, so as to measurement.
Description of the drawings
Fig. 1 is the measurement apparatus and schematic diagram according to the measuring instrument constructed by the preferred embodiments of the present invention；
Fig. 2 is according to the hot spot formed on the second imageing sensor constructed by the preferred embodiments of the present invention；
Fig. 3 is according to the interference fringe formed on the first imageing sensor constructed by the preferred embodiments of the present invention.
In all of the figs, identical reference be used for represent identical element or structure, wherein：
The rotatable polarizer 7- of 1- prism of corner cube 2- displacement platform 3- light sources 4- the first aperture 5- the first lens 6-
One imageing sensor 8- second orifices 9- the second imageing sensor 10- the first prism 11- the second lens the first wave plates of 12-
The first surface of the 3rd lens 14- the second prism 15- prism 16- speculums 17- the second wave plate 18- measured objects of 13-
The hot spot 22- measuring beams that 3rd surface 21- reference beams of the second surface 20- measured objects of 19- measured objects are formed are formed
Hot spot 23- the second image sensor surface 24- zero order fringe center line 25- one-level stripe centerline 26- reference coordinates
Axle origin
Specific embodiment
In order that the objects, technical solutions and advantages of the present invention become more apparent, it is below in conjunction with drawings and Examples, right
The present invention is further elaborated.It should be appreciated that specific embodiment described herein is only to explain the present invention, and
It is not used in the restriction present invention.As long as additionally, technical characteristic involved in invention described below each embodiment
Do not constitute conflict each other can just be mutually combined.
Fig. 1 is the measurement apparatus and schematic diagram according to the measuring instrument constructed by the preferred embodiments of the present invention, such as Fig. 1 institutes
Show, light source 3 discharges white light after the first aperture 4 and the first lens 5 to the second prism 14, and the light beam is divided into by the second prism 14
The measuring beam of horizontal transmission and the reference beam for reflecting straight up, measuring beam is horizontal forward to be propagated through the first wave plate 12
With measured object surface is converged in after the 3rd lens 13, then former road reflects back into 14 surface of the second prism, reference beam vertically to
Upper Jing prisms 15 are reflexed on prism of corner cube 1, and Jing after prism of corner cube 1 changes optical path direction, parallel back reflection is to speculum
On 16, speculum 16 reflects reference beam Jing after prism 15 on the second prism 14, reference beam and measuring beam with
One small angle is reflected straight down by the second prism 14, the rotatable polarizers 6 of Jing, the second lens 11 and the first prism 10, most
Afterwards while interference fringe and hot spot, second orifice in the device are formed on the first imageing sensor 7 and the second imageing sensor 9
8 diameter is not less than radius, the radius of the measuring beam hot spot and the measurement hot spot and the institute of the reference beam hot spot
Reference beam spot center is stated away from three's sum, it is as little as possible in the case where the condition is met.
After the second prism 14, a branch of to converge to measured surface as the 3rd lens 13 of measuring beam Jing, another beam is made
Interfere with the measuring beam reflected from measured surface after multiple reflections for reference beam；During measurement, by moving
The 3rd lens 13 in dynamic optical path, make measuring beam be respectively aligned to the first surface of measured object, second surface ... N tables
Face, while the prism of corner cube 1 in mobile reference path, makes two light beams remain aplanatism, by the amount of movement of prism of corner cube 1
The thickness ... of the thickness of measured object ground floor, the second layer is can be obtained by with the amount of movement of white-light fringe zero order fringe
(N-1) thickness of layer.
Fig. 2 is according to the hot spot formed on the second imageing sensor constructed by the preferred embodiments of the present invention；Fig. 3 be by
According to the interference fringe formed on the first imageing sensor constructed by the preferred embodiments of the present invention.As shown in Figures 2 and 3, will
Device mode as shown in Figure 1 connects, and adjusts light path.The light source 3 that makes to set gradually in horizontal direction, the first aperture 4, the first lens
5th, prism 14, the first wave plate 12, the 3rd lens 13, center is on the same line；Make the speculum being vertically sequentially arranged above
16th, prism 15, rotatable polarizer 6, the second lens 11, the first prism 10 and the second imageing sensor 9, center is same
On one straight line.
Determine the position of speculum 16.Concrete operations are：Light source 3 is opened, by adjusting the 3rd lens 13 and measured object
Position causes measuring beam to focus on the first surface 18 of measured object, while so that two hot spots on the second imageing sensor 9
Diameter is consistent；Rotating mirror 16, makes the centre-to-centre spacing of two hot spots on the second imageing sensor 9 reach suitable value Δ,
And the fringe spacing size of the white-light fringe for now being formed on the second imageing sensor 9 is suitable (for example：Fringe spacing exists
20 pixels or so), the position of fixed now speculum 16.
Record the position L of the now displacement platform horizontal direction1, measure the zero order fringe center of the interference fringe with it is pre-
If reference coordinate axle origin apart from d1, and the zero order fringe center and one-level fringe center apart from e1；
Mobile 3rd lens 13, make measuring beam converge in second surface 19 of measured object, and repeat the above steps are obtained
Measuring beam and reference beam again aplanatism when displacement platform position L2, interference fringe zero order fringe center and preset reference
The distance of reference axis origin and zero order fringe center are with one-level fringe center apart from e2.In white light source, each wavelength light is dry
Relate to bright fringes all to overlap, striped is white, referred to as zero order fringe.Two symmetrical stripeds of zero order fringe both sides are referred to as
One-level striped.
If reference beam and measuring beam light intensity difference are too big, now suitable position can be arrived with rotatory polarization piece 6, be made
Two-beam light intensity is roughly the same, obtains the higher white-light fringe of contrast.
Therefore according to formula (1), in known measured object ground floor inner refractive index n1In the case of can calculate measured object
The thickness H of ground floor1。
Wherein：λ is white light source centre wavelength.
In the same manner, the measured object second layer, third layer ... (N-1) layer can be calculated according to this kind of measuring method in theory
Thickness H2、H3...Hn-1。
As it will be easily appreciated by one skilled in the art that the foregoing is only presently preferred embodiments of the present invention, not to
The present invention, all any modification, equivalent and improvement made within the spirit and principles in the present invention etc. are limited, all should be included
Within protection scope of the present invention.
Claims (11)
1. multi-layer transparent dielectric thickness measuring apparatus of confocal white light polarization interference, the measurement apparatus include light source (3), and first is little
Hole (4), the first lens (5), the second prism (14) and the 3rd lens (13), it is characterised in that：
The light source (3), first aperture (4), first lens (5), second prism (14) and described 3rd saturating
The center of mirror (13) in same optical axis, wherein, first aperture is arranged on the front focal plane of first lens (5)
On, the light for guaranteeing from light source to send is directional light through the light that the first lens of Jing after the first aperture are transmitted away, and this is put down
Row light is divided into the measuring beam and the reference along vertically top reflection for transmiting in the horizontal direction after the second prism (14) described in
Light beam, the tested surface of measured object are arranged on the back focal plane of the 3rd lens (13), and the measuring beam passes through the 3rd lens
(13) converge on the surface to be measured, then former road is reflexed on second prism (14), then by second prism
(14) reflect away to vertical lower section；
Second prism (14) has vertically been sequentially arranged above prism (15) and inclined speculum (16), described anti-
Displacement platform (2) is relatively set with also in the horizontal direction for penetrating mirror (16) and prism (15), the displacement platform is provided with angle in (2)
Cone prism (1), for the speculum (16), second prism (14) are irradiated to after making the reference beam lateral shift
Vertical lower section be disposed with the second lens (11) and the first prism (10), the part centre of the vertical direction setting exists
In same optical axis, after the reference beam part reflection that vertically top is arranged described in by second prism (14) vertically to
It is lower to transmit away；
It is provided with the back focal plane of second lens (11) any in the second imageing sensor (9) or second orifice (8)
One, another is arranged on the side of the first prism (10) horizontal direction, and its center to first prism (10)
The distance at center is saturating for described second apart from sum with the first prism (10) center to the second lens (11) center
The focal length of mirror (11), the rear of the second orifice (8) are provided with the first imageing sensor (7), and the second orifice (8),
The center of described first image sensor (7) and first prism (10) in same optical axis, second imageing sensor
(9) for showing the hot spot of the measurement light and reference ray formation, described first image sensor (7) is described for showing
The interference fringe that measurement light and reference ray are formed, calculates the thickness of required transparent medium by measuring the interference fringe.
2. measurement apparatus as claimed in claim 1, it is characterised in that the measured object, the 3rd lens, described second saturating
Mirror and the second orifice constitute confocal arrangement, for eliminating the interference of reflecting background light to improve the contrast of the interference fringe
Degree.
3. measurement apparatus as claimed in claim 1 or 2, it is characterised in that between second prism and first prism
Rotatable polarizer (6), and itself and second prism and the same optical axis of second lens are provided with, for adjusting the measurement
The relative intensity of light beam and reference beam, to improve the contrast of the interference fringe.
4. measurement apparatus as described in any one of claim 1-3, it is characterised in that set between second prism and measured object
The first wave plate, and the wave plate and the same optical axis of second prism are equipped with, the wave plate preferably adopts quarter wave plate.
5. measurement apparatus as described in any one of claim 1-4, it is characterised in that the speculum and the displacement platform it
Between, or the second wave plate is provided between the speculum and the prism, the wave plate preferably adopts quarter wave plate or 1/2 ripple
One kind in piece.
6. measurement apparatus as described in any one of claim 1-5, it is characterised in that second and prism preferably using polarization
Amici prism, described first preferably using the one kind in polarization splitting prism and beam splitter.
7. measurement apparatus as described in claim 1-6, it is characterised in that the described the first, the second and the three lens are all preferably adopted
Use positive lens.
8. measurement apparatus as described in claim 1-7, it is characterised in that the light source preferably adopts white light source.
9. measurement apparatus as described in claim 1-8, it is characterised in that the diameter of the second orifice is not less than the reference
The radius of beam and focus, the radius of the measuring beam hot spot and the measurement hot spot and the reference beam spot center are away from three
Person's sum.
10. the multi-layer transparent dielectric thickness measuring method of confocal white light polarization interference, it is characterised in that under the measuring method includes
Row step：
A () opens light source (3), cause measuring beam to focus on measured object by adjusting the position of the 3rd lens (13) and measured object
First surface (18), while so that two spot diameters on the second imageing sensor (9) are in the same size, next adjustment is anti-
The position for penetrating mirror (16) causes the centre-to-centre spacing of described two hot spots equal with preset value；
B () moving displacement platform (2) causes interference fringe occur on the first imageing sensor (7), wherein, by adjusting polarizer
(6) position changes the contrast of the interference fringe；
C () records the position L of the now displacement platform horizontal direction1, measure the zero order fringe and preset reference of the interference fringe
Reference axis origin apart from d1, and centre-to-centre spacing e of the zero order fringe and one-level striped1；
D () adjusts the position of the 3rd lens (13), and keep tested object location constant so that light beam focuses on the second of measured object
Surface (19), while so that two spot diameters on the second imageing sensor (9) are in the same size；Repeat step (b) and (c),
Record and measurement L2, d2, e2, and the thickness of measured object is calculated according to formula.
11. measuring methods as claimed in claim 10, it is characterised in that in step (d), the formula is preferably using following
Expression formula, wherein, λ be light source center wavelength, n1For the measured layer inner refractive index of measured object, H1Arrive for measured object first surface
The thickness of second surface,
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| CN106940389A (en) * | 2017-02-06 | 2017-07-11 | 华中科技大学 | White light interference atomic force probe caliberating device and scaling method that a kind of super-resolution can trace to the source |
| CN108759698A (en) * | 2018-08-02 | 2018-11-06 | 淮阴师范学院 | The low-coherent light interferometric method and device of more mirror lens group minute surface spacing |
| CN111380472A (en) * | 2018-12-27 | 2020-07-07 | 株式会社迪思科 | Thickness measuring device |
| CN112757796A (en) * | 2020-12-30 | 2021-05-07 | 华中科技大学 | System and method for detecting quality of display device in whole spray printing manufacturing process |
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| CN113639661A (en) * | 2021-08-11 | 2021-11-12 | 中国科学院长春光学精密机械与物理研究所 | Morphology detection system and morphology detection method |
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| CN106940389B (en) * | 2017-02-06 | 2018-06-19 | 华中科技大学 | The white light interference atomic force probe caliberating device and scaling method that a kind of super-resolution can trace to the source |
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| CN108759698B (en) * | 2018-08-02 | 2020-02-14 | 淮阴师范学院 | Low-coherence light interference measuring method and device for mirror surface spacing of multi-mirror lens group |
| CN111380472A (en) * | 2018-12-27 | 2020-07-07 | 株式会社迪思科 | Thickness measuring device |
| CN111380472B (en) * | 2018-12-27 | 2023-12-15 | 株式会社迪思科 | Thickness measuring device |
| CN112762820A (en) * | 2020-12-11 | 2021-05-07 | 深圳市菲森科技有限公司 | Calibration device and calibration method of confocal three-dimensional measurement system |
| CN112757796B (en) * | 2020-12-30 | 2022-04-08 | 华中科技大学 | System and method for detecting quality of display device in whole spray printing manufacturing process |
| CN112757796A (en) * | 2020-12-30 | 2021-05-07 | 华中科技大学 | System and method for detecting quality of display device in whole spray printing manufacturing process |
| CN113790674A (en) * | 2021-08-06 | 2021-12-14 | 河北光兴半导体技术有限公司 | Measuring method, processor and measuring device for glass product |
| CN113639661B (en) * | 2021-08-11 | 2022-10-14 | 中国科学院长春光学精密机械与物理研究所 | Morphology detection system and morphology detection method |
| CN113639661A (en) * | 2021-08-11 | 2021-11-12 | 中国科学院长春光学精密机械与物理研究所 | Morphology detection system and morphology detection method |
| CN114964157A (en) * | 2022-04-26 | 2022-08-30 | 深圳市深视智能科技有限公司 | Inclination angle measuring probe and measuring device |
| CN114964157B (en) * | 2022-04-26 | 2023-11-17 | 深圳市深视智能科技有限公司 | Inclination angle measuring probe and measuring device |
| CN116678331A (en) * | 2023-06-03 | 2023-09-01 | 湖北武汉亮测科技有限公司 | Laser thickness measuring instrument |
| CN116678331B (en) * | 2023-06-03 | 2023-12-15 | 湖北武汉亮测科技有限公司 | Laser thickness measuring instrument |
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