CN106501898A - Metal nanoparticle-insulation composite material grating coupler - Google Patents
Metal nanoparticle-insulation composite material grating coupler Download PDFInfo
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- CN106501898A CN106501898A CN201710015785.3A CN201710015785A CN106501898A CN 106501898 A CN106501898 A CN 106501898A CN 201710015785 A CN201710015785 A CN 201710015785A CN 106501898 A CN106501898 A CN 106501898A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/124—Geodesic lenses or integrated gratings
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/34—Optical coupling means utilising prism or grating
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Abstract
The invention discloses a kind of metal nanoparticle-insulation composite material grating coupler and its preparation method and application.The grating coupler is made up of metal nanoparticle-insulation composite material coupling grating and insulator optical planar waveguide, metal nanoparticle therein-insulation composite material coupling grating is on the insulator optical planar waveguide surface of metal ion implantation, rely on formed metal nanoparticle-insulator composite modification layer, a kind of two-dimensional quadrature rectangular diffraction grating being prepared from using beamwriter lithography and reactive ion beam etching technique.Compared to the insulator grating coupler of same structure, the present invention has higher coupling efficiency, and there is no the loss that free-carrier Absorption is caused.Additionally, the present invention is insensitive to the polarised direction of light, while optical coupling is realized, the formation by guided wave and diffraction distort, and also can achieve filtering, beam splitting and the deflection of light.The present invention can be used for the fields such as the preparation of large-scale integrated light path.
Description
Technical field：
The invention belongs to nanophotonics technical field, is related to visible and/or near infrared band grating coupler preparation
Technology, concretely relates to a kind of metal nanoparticle-insulator composite wood for working in visible and/or near infrared band
Material grating coupler and preparation method thereof.
Background technology：
Grating coupler has important function in the building process of integrated optical device and large-scale integrated light path, utilizes
Grating coupler, can will be seen that and/or the optical signal of near infrared band is effectively introduced into or draws optical planar waveguide, so as to
Realize the directional transmissions and subsequent treatment of optical signal.Grating coupler is that coupling grating is integrated with the one of slab guide, root
The material being based on according to coupling grating, can by existing grating coupler be divided into two classes, i.e. insulator grating coupler and
Metal grating bonder.Compared with metal grating bonder, there is no free-carrier Absorption to coupling in insulator grating coupler
Close efficiency impact, and be also easier to integrated with insulator optical planar waveguide, therefore, be based on visible and/or near-infrared
In the application of wave band, insulator grating coupler occupies leading position.The coupling efficiency of insulator grating coupler depends on coupling
The diffraction efficiency of closing light grid, and the diffraction efficiency of coupling grating again relies on the thickness of coupling grating, side view, refractive index pair
Than the degree ratio of the refractive index of region of low refractive index (high-refractive-index regions with) and dutycycle, (also referred to as filling fraction, is high index of refraction
The ratio of the width in region and grating constant) etc., for there is the coupling grating for determining structure, contrast of refractive index is to determine
The key factor of its diffraction efficiency, it is however generally that, high contrast of refractive index will produce big diffraction efficiency.Insulator couples light
Grid and insulator optical planar waveguide are integrated with two methods, and one be the cycle first needed for the surface construction of backing material goes out
Property structure, then redeposited upper ducting layer, two is the periodic structure needed for first constructing in ducting layer, then in redeposition
Used as substrate, both approaches have identical effect to coating, and the grating coupler for being formed is due to by coupling grating
Bury in wherein, therefore reliability is higher, but, in refractive index type planar waveguiding structure, the refractive index of waveguide material is than lining
The refractive index of bottom material and covering material is big, and conventional insulator optical planar waveguide material, such as SiO2、Al2O3And PMMA
(lucite) etc., its refractive index are all relatively small, are so limited, and grating coupler that is integrated as stated above and coming will not have
There is higher coupling efficiency.So, how efficient grating could be constructed on conventional insulator optical planar waveguide
Bonder？This has become a recent research emphasis of interest, and in addition, also one problem also needs to cause note
Meaning, that is, in the conventional research with regard to grating coupler, as emphasis is coupling, it would be desirable to will with higher efficiency
The optical signal of certain polarised direction is introduced or draws slab guide, and therefore coupling grating mostly employs one-dimentional structure, rather than two
Dimension structure.In fact, the rectangle coupling grating of the coupling grating of two-dimensional structure, particularly two-dimensional quadrature structure, if it can be made
± 1 order diffraction meet and match condition, the combination of itself and optical planar waveguide can also constitute efficient grating coupler, this
Kind of polarised direction of the two-dimensional grating bonder not only to light is insensitive, and can be while optical coupling is realized, by means of leading
The formation of ripple and diffraction distortion, can also realize filtering, beam splitting and the deflection of light, and this is for the integrated optics device of constructing function
Significant for part and the large-scale integrated light path it based on.
Metal ion implantation is a kind of ripe and flexible Surface Modification of Insulating Material method.By mental retardation, high dose
Metal ion (particularly Drude metal ions) is injected in insulator, can be formed in the near-surface region of insulator and be had
The metal nanoparticle of certain depth distribution, in other words, as can form one layer has certain thickness metal nano
Grain-insulator composite modification layer, the average-size and volume fraction of the thickness and metal nanoparticle of modified layer can be with
Regulated and controled by changing the Implantation Energy and dosage of metal ion.It should be noted that in range of doses, by metal
The metal nanoparticle formed by ion implanting-insulator composite modification layer remains insulation, but compared to unmodified
Insulator for, its optical property is dramatically different.Metal nanoparticle-insulator composite modification layer has one
The resonant absorption wavelengths λ related to metal nanoparticle surface plasmaSPR, when the wavelength of incident illumination is equal to λSPRWhen, incident
Light will be strongly absorbed, and the wavelength for working as incident illumination is more than λSPRWhen：First, the reality of the effective refractive index of composite modification layer
Portion (do not cause obscure in the case of referred to as refractive index) bigger than the refractive index of insulator, the difference between this refractive index with
The volume fraction of metal nanoparticle is related with the wavelength of incident illumination, and the volume fraction of metal nanoparticle is bigger, incident illumination
Wavelength is closer to λSPR, then the difference between refractive index is bigger；Secondly, the imaginary part of the effective refractive index of composite modification layer
(i.e. extinction coefficient) all very little in the sizable wave-length coverage, is substantially negligible；Furthermore, metal nanoparticle
There is scattering to incident illumination in surface plasma, and then cause the reflectance of composite modification layer to have an extra increase,
From from the viewpoint of Fresnel reflections, the extra increase of this reflectance can be regarded as the refractive index of composite modification layer
There is extra an increased result.The above-mentioned optical property showed according to composite modification layer, we have reason to recognize
For based on the modification of the metal ion implantation of insulator optical planar waveguide, by coupling grating structure (particularly grating
Constant) appropriate design, in conjunction with the micro-nano technology technology such as beamwriter lithography and ion beam etching, it is possible to construct one kind
New high efficiency grating coupler.
Recently, Stepanov etc. has delivered an achievement in research (Applied Physics A (2013) 111:261～
264), they are respectively using the Ni systems calibration grid in scanning electron microscope as injection template by energy and dosage
40keV and 5 × 1016cm-2Cu ion implantings, in SiO2The surface of thin plate defines a kind of so-called two-dimensional and periodic plasma
Body structure, for the incident illumination that wavelength is 632.8nm, the structure shows good diffraction characteristic.It should be noted that
Although the two-dimensional and periodic plasma structure of the propositions such as Stepanov can as a kind of diffraction grating, it can't
With SiO2Slab guide constitutes actual available high efficiency grating coupler together, and topmost reason is that its grating is normal
Number is excessive, and the scanning electron microscope observation result according to given by document, its grating constant in row and column are respectively 49 and 36 μm,
For the application of visible and/or near infrared band, so big grating constant causes the diffraction of little series expire at all
Match condition enough, therefore also cannot form stronger guided wave in slab guide.
Content of the invention：
It is contemplated that proposing a kind of metal nanoparticle-insulation bluk recombination for working in visible and/or near infrared band
Material grating coupler and the preparation method and application of the type grating coupler.
The present invention is as follows for realizing the technical scheme taken by its purpose：
Metal nanoparticle-insulation composite material grating coupler is by metal nanoparticle-insulation composite material
Coupling grating and insulator optical planar waveguide are constituted, and metal nanoparticle therein-insulation composite material coupling grating is
A kind of two-dimensional quadrature rectangular diffraction grating, thickness are 40～150nm, positioned at insulator optical planar waveguide surface because of metal ion
In the modified layer that injects and formed, without obvious separating surface between insulator optical planar waveguide.
Preferably, the metal nanoparticle in the metal nanoparticle-insulation composite material coupling grating be Ag,
Cu and Au these three metal nanoparticles one of them.
Preferably, the metal nanoparticle-insulation composite material coupling grating has identical light on row and column
Grid constant and dutycycle, grating constant are metal nanoparticle surface plasmon absorption in insulator optical planar waveguide
1.05～1.5 times of wavelength, dutycycle are metal nanos in the metal nanoparticle-insulation composite material coupling grating
The width of granule-insulation composite material and the ratio of grating constant, control between 30%～50%.
Preferably, the insulator optical planar waveguide is the solid insulation material transparent by visible and/or near infrared band
Thin film or thin plate that material is constituted.
The preparation method of metal nanoparticle-insulation composite material grating coupler is comprised the following steps：
(1) choose or prepare and there is certain thickness insulator optical planar waveguide；
(2) metal ion of certain energy and dosage is injected in insulator optical planar waveguide by certain way,
The surface of insulator optical planar waveguide forms metal nanoparticle-insulator composite modification layer；
(3) electron beam lithography is utilized, and band is prepared on the insulator optical planar waveguide surface of metal ion implantation
The photoresist mask layer of two dimension coupling grating structure information needed for having；
(4) metal nanoparticle-insulator composite modification for relying on insulator optical planar waveguide surface to be formed
Layer, is performed etching using reactive ion beam etching technique, and etching depth is 40～150nm, processes through subsequent removing glue, builds
Two-dimensional metallic nano-particle-insulation composite material coupling grating needed for going out.
Preferably, metal ion described in step (2) be Ag, Cu and Au these three metal ions one of them.
Preferably, the injection mode of metal ion described in step (2) or be vertical injection, or for incline injection.
Preferably, the injection of metal ion described in step (2) or insulator optical planar waveguide surface is directed to
Regional area, or it is directed to the Zone Full on insulator optical planar waveguide surface.
Preferably, the Implantation Energy and dosage of metal ion described in step (2) is controlled between 40～100keV respectively
With 5 × 1016～8 × 1016cm-2Between, practical application value presses predetermined policy determination.
The predetermined policy includes：When insulator optical planar waveguide thickness be 200～750nm when, selected metal from
The Implantation Energy and dosage of son should be such that the maximum injection depth of metal ion is close to but thick less than insulator optical planar waveguide
The 1/5 of degree, i.e. 40～150nm；When the thickness of insulator optical planar waveguide is more than 750nm, the injection of selected metal ion
Energy and dosage should be such that the maximum injection depth of metal ion is close to but less than 150nm.
Preferably, described in step (4), reactive ion beam etching technique includes coolant technique.
Preferably, maximum injection depth of the etching depth described in step (4) more than or equal to metal ion.
Above-mentioned metal nanoparticle-insulation composite material grating coupler can prepare visible and/or near infrared band
Photo-coupler, wave filter, applied in terms of beam splitter and deflector.
The invention has the beneficial effects as follows：
Compared to metal nanoparticle-insulator composite wood that traditional insulator grating coupler, the present invention are announced
Material grating coupler have higher coupling efficiency, and do not exist betide in metal grating bonder because of free carrier
Absorb the loss for causing.With the Ag nano-particle-SiO mentioned in embodiment2As a example by composite grating coupler, when entering
When the wavelength for penetrating light is 650nm, its coupling efficiency ratio has the SiO of same structure2Grating coupler is higher by least 3 times.Additionally,
Compared with traditional grating coupler being made up of one-dimensional coupling grating, metal nanoparticle-insulator that the present invention is announced
Coupling grating of the composite grating coupler as a result of two-dimensional quadrature structure, therefore it not only to the polarised direction of light not
Sensitivity, and can be while optical coupling is realized, the formation by guided wave and diffraction distort, and can also realize the filtering of light, divide
Beam and deflection, this large-scale integrated light path for the integrated optical device of constructing function and it based on have important
Meaning.
Description of the drawings：
Partial structural diagrams of the Fig. 1 for metal nanoparticle-insulation composite material grating coupler.
Preparation flow schematic diagrams of the Fig. 2 for metal nanoparticle-insulation composite material grating coupler.
Fig. 3 a are Ag ion implantings SiO2The depth profile of the Ag nano-particle formed after slab guide.
Fig. 3 b are Ag nano-particle-SiO2The surface topography of composite grating coupler.
Fig. 4 a are Cu ion implantings SiO2The depth profile of the Cu nano-particle formed after slab guide.
Fig. 4 b are Cu nano-particle-SiO2The surface topography of composite grating coupler.
Fig. 5 is Ag nano-particle-SiO2Composite grating coupler and Cu nano-particle-SiO2Composite grating
The transmitted spectrum of bonder.
Formation and control schematic diagram of the Fig. 6 for guided wave.
In figure：1- metal nanoparticles-insulation composite material coupling grating, 2- insulator optical planar waveguides, 3- gold
Metal nano-particle, 4- metal nanoparticles-insulator composite modification layer, 5- photoresist mask layers, 6-SiO2Optical flat
The surface of waveguide, 7-Ag nano-particle, 8-Ag nano-particle-SiO2Composite modification layer, 9-Cu nano-particle, 10-Cu are received
Rice grain-SiO2Composite modification layer, 11-Ag nano-particle-SiO2The transmitted spectrum of composite grating coupler, 12-
Cu nano-particle-SiO2The transmitted spectrum of composite grating coupler, 13- incident illuminations, the direction of propagation of 14- guided waves.
Specific embodiment：
With reference to the accompanying drawings and examples further describing the present invention.This part description belongs to demonstration and explains, should not
It is considered as the restriction of presently disclosed technology contents.
The structure of metal nanoparticle of the present invention-insulation composite material grating coupler is as shown in figure 1, by gold
Metal nano-particle-insulation composite material coupling grating 1 and insulator optical planar waveguide 2 are constituted.Metal nanoparticle-absolutely
Edge composite material coupling grating 1 is a kind of two-dimensional quadrature rectangular diffraction grating, and thickness is 40～150nm, positioned at insulator light
In metal nanoparticle-insulator composite modification layer 4 that the surface of slab guide 2 is formed because of metal ion implantation,
Without obvious separating surface between insulator optical planar waveguide 2.In metal nanoparticle-insulation composite material coupling grating 1
Metal nanoparticle 3 be Ag, Cu and Au these three metal nanoparticles one of them.Metal nanoparticle-insulation bluk recombination
Material coupling grating 1 has identical grating constant and dutycycle on row and column, and grating constant is insulator optical flat ripple
Lead metal nanoparticle surface plasmon absorption wavelength in 2 1.05～1.5 times, dutycycle be metal nanoparticle-
In insulation composite material coupling grating 1, the width of metal nanoparticle-insulation composite material and the ratio of grating constant, control
System is between 30%～50%.Insulator optical planar waveguide 2 is the solid insulation material transparent by visible and/or near infrared band
Thin film or thin plate that material is constituted.
As shown in Figure 2 prepared by step for metal nanoparticle of the present invention-insulation composite material grating coupler：
(1) choose or prepare and there is certain thickness insulator optical planar waveguide 2；
(2) metal ion of certain energy and dosage is injected in insulator optical planar waveguide 2 by certain way,
The near-surface region of insulator optical planar waveguide 2 forms the metal nanoparticle 3 with certain depth distribution, that is, forms one
Layer has certain thickness metal nanoparticle-insulator composite modification layer 4；
(3) electron beam lithography is utilized, is prepared on the surface of the insulator optical planar waveguide 2 of metal ion implantation
Photoresist mask layer 5 with required two-dimentional coupling grating structure information；
(4) metal nanoparticle-insulation composite material for relying on 2 surface of insulator optical planar waveguide to be formed changes
Property layer 4, performed etching using reactive ion beam etching technique, etching depth is 40～150nm, processes through subsequent removing glue,
Two-dimensional metallic nano-particle-insulation composite material coupling grating 1 needed for constructing.
In step (2), metal ion be Ag, Cu and Au these three metal ions one of them, the note of metal ion
Enter energy and dosage is respectively 40～100keV and 5 × 1016～8 × 1016cm-2, injection mode or be vertical injection, or
For inclining injection, injection zone or the local surfaces for insulator optical planar waveguide 2, or it is insulator optical flat ripple
Lead 2 all surfaces.The actual metal ion implantation energy for adopting and dosage can be in the range of being given by predetermined policy, by under
State process determination：1. the injection of the material and metal ion to be injected and metal ion of insulator optical planar waveguide is selected
Mode；2. an Implantation Energy is selected, is entered using SRIM (Stopping and Range of Ions in Matter) software
Row is calculated, and determines corresponding sputtering yield Y, projected range RpWith range straggling △ Rp；3. an implantation dosage is selected, in conjunction with institute
Y, the R for obtainingpWith △ Rp, depth profile function G (z) of injection metal ion is calculated, the maximum injection of metal ion is thereby determined that
Depth；If the maximum injection depth of the metal ion for 4. calculating does not meet predetermined policy, injection energy should be reselected
Amount and dosage, until result of calculation meets predetermined policy.
Predetermined policy includes：When the thickness of insulator optical planar waveguide 2 is 200～750nm, selected metal ion
Implantation Energy and dosage should be such that the maximum injection depth of metal ion is close to but less than 2 thickness of insulator optical planar waveguide
1/5, i.e. 40～150nm；When the thickness of insulator optical planar waveguide 2 is more than 750nm, the Implantation Energy of selected metal ion
The maximum injection depth of metal ion should be close to but less than 150nm with dosage.
The concrete form of depth profile function G (z) of injection metal ion is：
In formula, z is the depth relative to 2 instant surface of insulator optical planar waveguide, and N is 2 institute of insulator optical planar waveguide
With the atomic density of material, implantation dosages of the D for metal ion, erf () are error function.
Reactive ion beam etching technique in step (4) includes coolant technique, and etching depth is more than or equal to gold
The maximum injection depth of category ion.
Step according to Fig. 2, is actually prepared for Ag nano-particle-SiO2Composite grating coupler and Cu nanometers
Granule-SiO2Composite grating coupler, main preparation parameter and is described as follows：SiO2The surface size of slab guide is about
For 20 × 20mm2, thickness is about 0.5mm；Ag and Cu ions are injected by the way of inclining 45 °, for SiO2Slab guide
All surfaces；According to the use condition of implanter, in conjunction with predetermined policy, the Implantation Energy of Ag and Cu ions is set to 90 Hes respectively
60keV, implantation dosage are set to 6 × 1016cm-2；Coupling grating adopts two-dimensional quadrature rectangular configuration, and its surface size about 4 ×
4mm2, thickness is about 100nm, and the grating constant of row and column is 600nm, and dutycycle is the grating constant of 30%, 600nm about
For SiO21.45 times and SiO of middle Ag nano grain surfaces plasmon absorption wavelength (～414nm)2Middle Cu nano-particle
1.06 times of surface plasmon absorption wavelength (～564nm)；The atmosphere that etching link is adopted is for CHF3And Ar, etching is deeply
Degree is about 100nm, more than Ag and Cu ions in SiO2Maximum injection depth in slab guide.
Fig. 3 a show Ag ion implantings SiO2The depth profile of the Ag nano-particle formed after slab guide, from figure
As can be seen that Ag nano-particle 7 is approximately spherical, SiO is mainly distributed on2The surface of slab guide 5.5～83.0nm below 6
Region, it can thus be appreciated that Ag nano-particle-SiO2The thickness of composite modification layer 8 is about 77.5nm.Ag nano-particle 7 is obvious
Ground is divided into three layers, and the Ag nano-particle of the upper and lower is relatively small, and the Ag nano-particle in middle level is relatively large.Statistical result
Show, the average diameter of Ag nano-particle 7 is about 3.7nm, using this average diameter, according to the measurement result of absorption spectrum and
Corresponding the Fitting Calculation understands that the shared volume fraction in composite modification layer 8 of Ag nano-particle 7 is about 24%.Utilize
The dielectric function of Ag, the average diameter of Ag nano-particle and volume fraction and SiO2Dielectric constant, theoretical according to M-G, can
To calculate refractive index (i.e. the real part of effective refractive index) and the extinction coefficient of composite modification layer 8, the wavelength of incident illumination is taken
For 650nm, calculated refractive index and extinction coefficient respectively 1.82 and 0.05.Fig. 3 b show Ag nano-particle-SiO2
The surface topography of composite grating coupler, for the grating coupler, when the wavelength of incident illumination is 650nm, its
The contrast of refractive index of coupling grating is about 1.82, and there is the SiO of same structure2The contrast of refractive index of coupling grating is only about
1.46, according to Ghizoni etc. with regard to grating coupler theoretical research (IEEE Journal of Quantum
Electronics(1976)12(2):69～73), even if not considering that Ag nano grain surface plasmas are drawn to scattering of light
The extra modulation of the contrast of refractive index for rising, can also estimate the SiO of the coupling efficiency than same structure of the grating coupler2
The coupling efficiency of grating coupler improves about 318%, further, if suitably increasing the implantation dosage of Ag ions, or adopts
Suppress sputtering certainly in Ag ion implantation process with appropriate method, coupling efficiency can also obtain bigger raising.
As shown in fig. 4 a, Cu ion implantings SiO2The Cu nano-particle 9 formed after slab guide is also generally spherical in shape, main
SiO to be distributed in2The depth areas of surface 5.2～62.5nm below 6 of slab guide, it can thus be appreciated that Cu nano-particle-SiO2
The thickness of composite modification layer 10 is about 57.3nm.Compared with the Ag nano-particle 7 in Fig. 3 a, the size of Cu nano-particle 9
It is not very violent with the change of depth, but it is also possible to be roughly divided into three layers, the Cu nano-particle of the upper and lower is relatively small,
And the Cu nano-particle in middle level is relatively large.Statistical result shows that the average diameter of Cu nano-particle 9 is about 3.2nm, is slightly less than
The average diameter of Ag nano-particle 7 in Fig. 3 a.Fig. 4 b are Cu nano-particle-SiO2The surface shape of composite grating coupler
Looks, which is basically identical with result shown in Fig. 3 b, reflects that beamwriter lithography and reactive ion beam etching technique can be in submicrons
Yardstick provides sufficiently high machining accuracy.Due to Cu ion implantings SiO2After slab guide, except Cu nano-particle 9 can be formed
In addition, Cu can also be formed2O and CuO nanoclusters, therefore, it is difficult to according to the average-size and absorption spectra of Cu nano-particle 9
Measurement result provides the shared volume fraction in composite modification layer 10 of Cu nano-particle 9, thus also just cannot be to Fig. 4 b
Shown Cu nano-particle-SiO2Composite grating coupler carries out the evaluation of coupling efficiency, even so, compared to same
The SiO of spline structure2There is larger raising and remain and can expect in grating coupler, its coupling efficiency.
Fig. 5 gives Ag nano-particle-SiO2Composite grating coupler and Cu nano-particle-SiO2Composite
The transmitted spectrum of grating coupler.It can be seen that Ag nano-particle-SiO2The transmission of composite grating coupler
There are two obvious absorbancies on spectrum 11 and reduce band, one is located near 414nm wavelength, and which derives from Ag nano-particle 7
The surface plasmon absorption of (see Fig. 3 a), another are located between the wave-length coverage of 620～880nm, and the absorbance subtracts
Small band is in Cu nano-particle-SiO2There is also on the transmitted spectrum 12 of composite grating coupler, simply the reduction of absorbance
Degree is relatively small.In Cu nano-particle-SiO2Can also find by Cu on the transmitted spectrum 12 of composite grating coupler
The absorbance that nano-particle 9 (see Fig. 4 a) surface plasmon absorption causes reduces band, and which is located near 564nm.For
The absorbance come across in two groups of spectrum between 620～880nm reduces band, and their generation can be attributed to the formation of guided wave,
As shown in Fig. 6.When the surface of 13 vertical irradiation of incident illumination to grating coupler, ± 1 order diffraction light is due to disclosure satisfy that phase
Matching condition and be introduced into SiO2Slab guide, and then 4 beam guided waves are formed, the direction of propagation 14 of guided wave is respectively x-axis (corresponding coupling
The row of closing light grid) and the y-axis row of coupling grating (corresponding) positive negative direction.As prepared grating coupler employs two dimension
The coupling grating of orthohormbic structure, therefore the formation of guided wave is insensitive to the polarised direction of incident illumination 13, further, since the bar that matches
There is selectivity to the wavelength of incident illumination 13 in part, therefore the incident illumination 13 of not all wavelength can be coupled into SiO2Plane
Waveguide, this are also implied that, using the formation of guided wave, prepared grating coupler can not only realize dividing for incident illumination 13
Beam, and the effect with wideband filtered, relative bandwidth are about 34.7%.It should be noted that change angle of incidence, due to diffraction
Distortion, the direction of propagation 14 of part guided wave will also change, for example, by the incident illumination 13 in x-z-plane around z-axis to x-axis
Negative sense is deflected, and can cause two beam guided waves in the y-axis positive deflection to x-axis in the x-y plane, and this is that is, by guided wave
Formation, distorted using diffraction, prepared grating coupler can also realize the deflection of light.
The present invention by commonly use insulator optical planar waveguide based on, using metal ion implantation, beamwriter lithography and
The technology such as ion beam etching, by species and the injection condition of reasonable selection metal ion, and the structure to coupling grating is entered
Row is appropriate to be designed, and constructs a kind of efficient two-dimensional grating coupler based on metal nanoparticle-insulation composite material,
Which works in visible and/or near infrared band, and not only the polarised direction to light is insensitive, and can realize the same of optical coupling
When, the formation by means of guided wave and diffraction distortion, can also realize filtering, beam splitting and the deflection of light.
Claims (8)
1. a kind of metal nanoparticle-insulation composite material grating coupler, it is characterised in that：By metal nanoparticle-
Insulation composite material coupling grating and insulator optical planar waveguide are constituted, metal nanoparticle therein-insulation bluk recombination
Material coupling grating is a kind of two-dimensional quadrature rectangular diffraction grating, and thickness is 40～150nm, positioned at insulator optical planar waveguide
In the modified layer that surface is formed because of metal ion implantation, without separating surface between insulator optical planar waveguide；The metal
Metal nanoparticle in nano-particle-insulation composite material coupling grating is these three metal nanoparticles of Ag, Cu and Au
One of them.
2. metal nanoparticle according to claim 1-insulation composite material grating coupler, it is characterised in that：Institute
State metal nanoparticle-insulation composite material coupling grating and there is on row and column identical grating constant and dutycycle, light
Grid constant is 1.05～1.5 of metal nanoparticle surface plasmon absorption wavelength in insulator optical planar waveguide
Times, dutycycle is metal nanoparticle-insulation bluk recombination in the metal nanoparticle-insulation composite material coupling grating
The ratio of the width of material and grating constant, controls between 30%～50%.
3. metal nanoparticle according to claim 1-insulation composite material grating coupler, it is characterised in that：Institute
State the thin film or thin that insulator optical planar waveguide is that the solid insulating material transparent by visible and/or near infrared band is constituted
Plate.
4. a kind of preparation method according to metal nanoparticle-insulation composite material grating coupler described in claim 1,
It is characterized in that carrying out according to the following steps：
(1) choose or prepare insulator optical planar waveguide；
(2) from Ag, Cu and Au these three metal ions, one kind is selected to be injected in insulator optical planar waveguide, at insulator
The surface of optical planar waveguide forms metal nanoparticle-insulator composite modification layer, the Implantation Energy of metal ion and
Dosage is respectively 40～100keV and 5 × 1016～8 × 1016cm-2, practical application value press predetermined policy determination；
(3) electron beam lithography is utilized, and band has been prepared on the insulator optical planar waveguide surface of metal ion implantation
Need the photoresist mask layer of two-dimentional coupling grating structure information；
(4) metal nanoparticle-insulator composite modification layer for relying on insulator optical planar waveguide surface to be formed,
Performed etching using reactive ion beam etching technique, etching depth is 40～150nm, needed for removing glue is processed, constructed
Two-dimensional metallic nano-particle-insulation composite material coupling grating.
5. preparation method according to claim 4, it is characterised in that：The injection of metal ion described in step (2) or
The regional area on insulator optical planar waveguide surface is directed to, or is directed to the whole of insulator optical planar waveguide surface
Region, injection mode is vertical injection, or injects for inclining.
6. preparation method according to claim 4, it is characterised in that：Described in step (2), predetermined policy includes：Work as insulation
When the thickness of bulk optics slab guide is 200～750nm, the Implantation Energy and dosage of selected metal ion should make metal ion
Maximum injection depth is close to but less than insulator optical planar waveguide thickness 1/5, i.e. 40～150nm；When insulation bulk optics
When the thickness of slab guide is more than 750nm, the Implantation Energy and dosage of selected metal ion should make the maximum injection of metal ion
Depth is close to but is less than 150nm.
7. preparation method according to claim 4, it is characterised in that：Reactive ion beam etching technique described in step (4)
Including coolant technique, maximum injection depth of the etching depth more than or equal to metal ion.
8. metal nanoparticle according to claim 1-insulation composite material grating coupler, is characterized in that：The light
Grid bonder is applied to photo-coupler, wave filter, beam splitter and the deflector for preparing visible and/or near infrared band.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108710172A (en) * | 2018-05-23 | 2018-10-26 | 山东大学 | A kind of polarizer and the preparation method and application thereof based on yttrium-aluminium-garnet optical waveguide |
| CN110836868A (en) * | 2019-11-27 | 2020-02-25 | 中国石油大学(华东) | Localized surface plasmon resonance sensor based on noble metal/insulator nanocomposite |
| CN112034546A (en) * | 2020-10-16 | 2020-12-04 | 天津大学 | Terahertz phase grating based on metal nanoparticles and preparation method thereof |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6191404B1 (en) * | 1991-03-18 | 2001-02-20 | Hughes Danbury Optical Systems, Inc. | Two-sided solid-state imager in a navigational device |
| CN1372151A (en) * | 2001-02-26 | 2002-10-02 | 中国科学院半导体研究所 | Method for making plane type DFB inner grating coupling structure |
| JP2008235753A (en) * | 2007-03-23 | 2008-10-02 | Sony Corp | Solid imaging apparatus and method of manufacturing the same |
| CN102692682A (en) * | 2012-06-12 | 2012-09-26 | 中国科学院上海微系统与信息技术研究所 | Grating coupler and manufacturing method thereof |
-
2017
- 2017-01-10 CN CN201710015785.3A patent/CN106501898A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6191404B1 (en) * | 1991-03-18 | 2001-02-20 | Hughes Danbury Optical Systems, Inc. | Two-sided solid-state imager in a navigational device |
| CN1372151A (en) * | 2001-02-26 | 2002-10-02 | 中国科学院半导体研究所 | Method for making plane type DFB inner grating coupling structure |
| JP2008235753A (en) * | 2007-03-23 | 2008-10-02 | Sony Corp | Solid imaging apparatus and method of manufacturing the same |
| CN102692682A (en) * | 2012-06-12 | 2012-09-26 | 中国科学院上海微系统与信息技术研究所 | Grating coupler and manufacturing method thereof |
Non-Patent Citations (1)
| Title |
|---|
| A.L.STEPANOV 等: "Synthesis of periodic plasmonic microstructures with copper nanoparticles in silica glass by low-energy ion implantation", 《APPLIED PHYSICS A MATERIALS SCIENCE&PROCESSING》 * |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108710172A (en) * | 2018-05-23 | 2018-10-26 | 山东大学 | A kind of polarizer and the preparation method and application thereof based on yttrium-aluminium-garnet optical waveguide |
| CN110836868A (en) * | 2019-11-27 | 2020-02-25 | 中国石油大学(华东) | Localized surface plasmon resonance sensor based on noble metal/insulator nanocomposite |
| CN112034546A (en) * | 2020-10-16 | 2020-12-04 | 天津大学 | Terahertz phase grating based on metal nanoparticles and preparation method thereof |
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