CN106498344A - A kind of preparation method of elastic lubrication nanometer carbon/agraphitic carbon laminated film - Google Patents

A kind of preparation method of elastic lubrication nanometer carbon/agraphitic carbon laminated film Download PDF

Info

Publication number
CN106498344A
CN106498344A CN201610894584.0A CN201610894584A CN106498344A CN 106498344 A CN106498344 A CN 106498344A CN 201610894584 A CN201610894584 A CN 201610894584A CN 106498344 A CN106498344 A CN 106498344A
Authority
CN
China
Prior art keywords
carbon
argon
sputtering
film
nitrogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201610894584.0A
Other languages
Chinese (zh)
Other versions
CN106498344B (en
Inventor
郝俊英
韩�熙
郑建云
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lanzhou Institute of Chemical Physics LICP of CAS
Original Assignee
Lanzhou Institute of Chemical Physics LICP of CAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lanzhou Institute of Chemical Physics LICP of CAS filed Critical Lanzhou Institute of Chemical Physics LICP of CAS
Priority to CN201610894584.0A priority Critical patent/CN106498344B/en
Publication of CN106498344A publication Critical patent/CN106498344A/en
Application granted granted Critical
Publication of CN106498344B publication Critical patent/CN106498344B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention discloses a kind of preparation method of elastic lubrication nanometer carbon/agraphitic carbon laminated film, concretely comprises the following steps：Plasma sputtering cleaning is carried out to monocrystalline silicon piece and stainless steel thin slice；Transition zone is deposited, using multifunction composite magnetic controlled sputtering sputtering equipment, the indoor initial temperature of deposition is 25 ~ 35 DEG C, and target is set to 7 ~ 14 cm with basal spacing, using high-purity titanium target, it is passed through sputter gas argon, argon/nitrogen and argon/methane/nitrogen successively, opens DC source, is 0.2 ~ 1.0 Pa in operating pressure, 2.0 ~ 4.0 A of electric current, substrate bias are 100 V, and under conditions of dutycycle is 80 %, sputtering Ti, TiN, TiCN multilayer film is used as transition zone successively；Argon and nitrogen is closed, retains methane, close DC source, open radio-frequency power supply, be 20 ~ 40 W in power, operating pressure is 2.5 ~ 3.5 Pa, and substrate bias are 1000 ~ 1200 V, and sputtering target material is Ti, Al or Si, deposits the carbon-base film of single-element doping.The membrane structure densification of present invention preparation, surface roughness are low, and there is in atmospheric environment relatively low coefficient of friction.

Description

A kind of preparation method of elastic lubrication nanometer carbon/agraphitic carbon laminated film
Technical field
The invention belongs to technology of thin film material preparation field, is related to one kind in room temperature（Without the need for any extra heat source）With without benzene The method for preparing the nanometer carbon/agraphitic carbon composite film material of excellent toughness and lubrication under ring organic reagent.
Background technology
Material with carbon element serves important function in the development of human history, even to this day, its excellent physics and chemical Matter still attracts the attention of researcher.In various material with carbon elements, agraphitic carbon is the sp by carbon without grain boundary3With sp2Any covalent networks structure of hydridization site composition.Numerous studies are it has been shown that agraphitic carbon can be used as solid lubrication material Material, for fields such as space flight and aviation, machine-building.Adulterate in amorphous carbon-base film heterogeneous element（Ti, Si, Al etc.）Can change It is apt to its combination property.Therefore, in order to obtain ultra-low friction and improve its tribology adaptability under severe service condition, accelerate Its practicalization, researcher have been carried out numerous studies to heterogeneous element doping agraphitic carbon base film.Additionally, as carbon materials One of important composition of material, CNT, the elastic modelling quantity for having superelevation（About 1 TPa）With extraordinary tensile strength（20~100 In the range of GPa）.In existing report, the enhanced block materials of CNT toughness show outstanding Resisting fractre behavior. But, due to large volume fraction, interfacial reaction and alignment problem, the enhanced thin film of CNT toughness so far cannot be real Existing.Basic component units of the carbon nano ring as CNT, with the property similar to CNT.Compared with CNT For, carbon nano ring has less volume and simple structure, is expected to incorporate the engineering propertiess for showing in thin film which is unique.
Although carbon nano ring has simple structure, its synthesis remains a huge challenge.In numerous studies Under the effort of work, existing part scientific research personnel has prepared carbon nano ring using the chemical synthesis process with innovative significance. It should be noted that in these methods, the synthesis of carbon nano ring is directed to the organic chemical reagent containing phenyl ring（Such as hexamethylene two Alkene）, and the use of these reagents eventually produces some by-products of pollution environment.Therefore, develop one kind without the organic examination of phenyl ring The synthetic method of agent is very necessary, and it can be effectively facilitated the development and application of carbon nano ring.
Content of the invention
It is an object of the invention to provide a kind of preparation method of elastic lubrication nanometer carbon/agraphitic carbon laminated film.
The present invention adopts CH4The method of plasma self assembly, by forcing band under conditions of higher pressure and bias The C of electric chargexHy n+Between mutually collide, form powered phenyl ring（C6Hz n+）.And when two powered phenyl ring are in plasma Meet in colony, series connection Suzuki couplings/big cyclization sequence reaction will occur.This reaction will be with other charged phenyl ring Add and sustained response, until the generation of carbon nano ring.Meanwhile, in this process, major part does not participate in the C of cyclizationxHy n+Directly Connect and be converted to agraphitic carbon.Nanometer carbon prepared by the present invention/agraphitic carbon complex thin film structure is fine and close, smooth surface, tool There are good elasticity and greasy property.
A kind of preparation method of elastic lubrication nanometer carbon/agraphitic carbon laminated film, it is characterised in that adopt at room temperature With multifunction composite magnetic controlled sputtering equipment, utilize CH4Plasma self-assembling technique prepares nanometer carbon/agraphitic carbon THIN COMPOSITE Film, concrete operation step are as follows：
1）Be cleaned by ultrasonic monocrystalline silicon piece and stainless steel thin slice with dehydrated alcohol and acetone, deposition interior is placed in after dried, is taken out Vacuum is to 3 × 10-3Below Pa, with argon as sputter gas, in the bar that pulsed bias are -1100 V, pressure is 1.0 ~ 2.0 Pa The plasma sputtering cleaning of 20 ~ 30 min is carried out under part；
2）Transition zone is deposited, and the indoor initial temperature of deposition is 25 ~ 35 DEG C, and target is set to 7 ~ 14 cm with basal spacing, adopts High-purity titanium target, is passed through sputter gas argon, argon/nitrogen and argon/methane/nitrogen successively, opens DC source, in work Pressure is 0.2 ~ 1.0 Pa, and 2.0 ~ 4.0 A of electric current, substrate bias are -100 V, under conditions of dutycycle is 80 %, splash successively Ti, TiN, TiCN multilayer film is penetrated as transition zone, 15 ~ 20 min of sputtering time；
3）Argon and nitrogen is closed, is retained methane as sputter gas, is closed DC source, open radio-frequency power supply, in power be 20 ~ 40 W, operating pressure are 2.5 ~ 3.5 Pa, and substrate bias are -1000 ~ -1200 V, and sputtering target material is Ti, Al or Si, deposits The carbon-base film of single-element doping, in 3.0 ~ 3.5 h, after deposition terminates, deposition indoor temperature is not higher than 90 to sedimentation time ℃.
The thickness of the transition zone is 1.0 ± 0.2 μm；The thickness of carbon-base film is 1.0 ± 0.3 μm, laminated film Gross thickness is 2.0 ± 0.3 μm.
Elastic lubrication nanometer carbon/agraphitic carbon laminated film prepared by the present invention has following structure and performance：
1st, the elastic lubrication nanometer carbon/agraphitic carbon laminated film is mainly made up of two parts：Thickness is 1.0 ± 0.2 μm Ti/TiN/TiCN multilayer transition layers and thickness be 1.0 ± 0.3 μm of carbon-base film；
2nd, the compact structure of the thin film and substrate are firmly combined with, surface roughness is less than 1.5 nm, elastic restoration ratio（W e ） It is more than 65 %；
3rd, there is in atmospheric environment the thin film excellent tribological property, coefficient of friction as little as 0.028, wear rate to be less than 4 ×10-7mm3/（Nm）.
Nanometer carbon prepared by the present invention/agraphitic carbon laminated film is the reason for there is above advantage：In deposition During higher pressure intermolecular distance is reduced, plasma and molecular collision probability are significantly increased, the work of film forming Property ion increase film growth rate increased, and reductions of ion energy drops the etch rate that high-energy ion bombardment causes Low, therefore, thin film has higher sedimentation rate；High back bias voltage is applied to substrate, improve atom in film surface diffusion and The ability of chemical reaction is participated in, consistency and the film forming ability of thin film is improve；Meanwhile, it is self-assembly of in deposition process Nanometer carbon has excellent toughness and very weak shear strength, and incorporating can be with the toughness of enhanced film and tribology in thin film Energy.
Description of the drawings
Transmission electron microscope and its enlarged drawing of the Fig. 1 for laminated film described in the embodiment of the present invention 1.
Fig. 2 is laminated film Raman collection of illustrative plates described in the embodiment of the present invention 1.
Displacement-load curves figures of the Fig. 3 for laminated film described in the embodiment of the present invention 2.
Aerial friction coefficient curves of the Fig. 4 for laminated film described in the embodiment of the present invention 3.
Specific embodiment
For a better understanding of the present invention, the present invention is further illustrated in conjunction with following embodiments.
Embodiment 1
Cleaning substrate：It is cleaned by ultrasonic monocrystalline silicon piece and stainless steel thin slice with dehydrated alcohol and acetone soln, places after dried Indoor in deposition.Deposition pre-treatment：It is evacuated to 2 × 10-3Below Pa, with argon as sputter gas, is 80 % in dutycycle, Pulsed bias be -1100 V under conditions of substrate is carried out plasma sputtering clean 20 min, with remove surface oxide layer and Impurity.Deposition：Using high-purity titanium target, sputter gas argon, argon+nitrogen and argon+nitrogen+methane is passed through successively, open DC source, is 0.4 ~ 1.0 Pa, 2 A of DC current in operating pressure, and -100 V of substrate bias, dutycycle are the condition of 80 % Lower deposition multilayer transition layer Ti/TiN/TiCN, transition zone sedimentation time is 15 min.After transition zone deposition terminates, argon is closed And nitrogen, retaining methane as sputter gas, close DC source, open radio-frequency power supply, power setting is 20 W, in work pressure It is by force 3.0 Pa, substrate bias are -1100 V, dutycycle is the deposition of the carbon-base film for carrying out Ti doping under conditions of 80 %, Sedimentation time is 3.2 h, obtains a series of nanometer carbon/agraphitic carbon laminated film.
The section and surface of laminated film are observed using Flied emission Scanning Electron microscope, its thickness（Including Cross layer）For 1.7 μm, smooth surface, compact structure.Its transmission electron microscope image and its enlarged drawing are as shown in figure 1, multiple Closing thin film and showing typical undefined structure, the presence of some circuluses can be substantially observed in its enlarged drawing. The Raman collection of illustrative plates of laminated film is as shown in Fig. 2 the characteristic peak of carbon nano ring and agraphitic carbon is clearly present in such thin film.Former Sub- force microscope measures laminated film surface roughness for 1.051 nm.Nano-indentation experiment result shows its hardness（H）And bullet Property modulus（E）Respectively 10.04 and 89.0 GPa, elastic restoration ratio（W e ）For 66.0 %.In air friction testing, such thin The average friction coefficient 0.028 of film, wear rate are 3.5 × 10-7mm3/（Nm）.
Embodiment 2
As described in Example 1, radio-frequency power is adjusted to 40 W in carbon layer deposition.
Using Flied emission Scanning Electron microscope viewing film section and surface, its thickness is 2.07 μm, smooth surface, Compact structure.Raman results show that laminated film has the characteristic peak of carbon nano ring and agraphitic carbon.Using atomic force microscope Roughness of film is measured for 0.389 nm.According to nano-indentation experiment result, the consistency and elasticity mould of gained laminated film Amount is respectively 11.36 and 87.8 GPa, elastic restoration ratio（W e ）For 69.0 %, its displacement-load curves is as shown in Figure 3.Big Gas rubs in test, and the average friction coefficient of such laminated film is 0.048, and wear rate is 7.32 × 10-7mm3/（Nm）.
Embodiment 3
As described in Example 1, sputtering target material is changed to silicon target by titanium target after deposition transition zone, opens radio-frequency power supply, power is adjusted Save as 20 W, prepare a series of carbon-base film of Si doping.
Film sections and surface are observed with field emission scanning electron microscope, laminated film thickness is 2.0 μm, Smooth surface, compact structure.Roughness of film is measured for 0.261 nm using atomic force microscope.Raman collection of illustrative plates shows, Laminated film has the characteristic peak of carbon nano ring and agraphitic carbon.In air friction testing, such laminated film average friction Coefficient is 0.03, and wear rate is 2.04 × 10-7mm3/（Nm）, the aerial friction coefficient curve of thin film is as shown in Figure 4.

Claims (2)

1. a kind of preparation method of elastic lubrication nanometer carbon/agraphitic carbon laminated film, it is characterised in that adopt at room temperature Multifunction composite magnetic controlled sputtering equipment, utilize CH4Plasma self-assembling technique prepares nanometer carbon/agraphitic carbon THIN COMPOSITE Film, concrete operation step are as follows：
1）Be cleaned by ultrasonic monocrystalline silicon piece and stainless steel thin slice with dehydrated alcohol and acetone, deposition interior is placed in after dried, is taken out Vacuum is to 3 × 10-3Below Pa, with argon as sputter gas, in the bar that pulsed bias are -1100 V, pressure is 1.0 ~ 2.0 Pa The plasma sputtering cleaning of 20 ~ 30 min is carried out under part；
2）Transition zone is deposited, and the indoor initial temperature of deposition is 25 ~ 35 DEG C, and target is set to 7 ~ 14 cm with basal spacing, adopts High-purity titanium target, is passed through sputter gas argon, argon/nitrogen and argon/methane/nitrogen successively, opens DC source, in work Pressure is 0.2 ~ 1.0 Pa, and 2.0 ~ 4.0 A of electric current, substrate bias are -100 V, under conditions of dutycycle is 80 %, splash successively Ti, TiN, TiCN multilayer film is penetrated as transition zone, 15 ~ 20 min of sputtering time；
3）Argon and nitrogen is closed, is retained methane as sputter gas, is closed DC source, open radio-frequency power supply, in power be 20 ~ 40 W, operating pressure are 2.5 ~ 3.5 Pa, and substrate bias are -1000 ~ -1200 V, and sputtering target material is Ti, Al or Si, deposits The carbon-base film of single-element doping, in 3.0 ~ 3.5 h, after deposition terminates, deposition indoor temperature is not higher than 90 to sedimentation time ℃.
2. preparation method as claimed in claim 1, it is characterised in that the thickness of the transition zone is 1.0 ± 0.2 μm；Carbon-based The thickness of thin film is 1.0 ± 0.3 μm, and the gross thickness of laminated film is 2.0 ± 0.3 μm.
CN201610894584.0A 2016-10-14 2016-10-14 A kind of preparation method of elastic lubrication nanometer carbon/agraphitic carbon laminated film Active CN106498344B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610894584.0A CN106498344B (en) 2016-10-14 2016-10-14 A kind of preparation method of elastic lubrication nanometer carbon/agraphitic carbon laminated film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610894584.0A CN106498344B (en) 2016-10-14 2016-10-14 A kind of preparation method of elastic lubrication nanometer carbon/agraphitic carbon laminated film

Publications (2)

Publication Number Publication Date
CN106498344A true CN106498344A (en) 2017-03-15
CN106498344B CN106498344B (en) 2018-09-25

Family

ID=58293860

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610894584.0A Active CN106498344B (en) 2016-10-14 2016-10-14 A kind of preparation method of elastic lubrication nanometer carbon/agraphitic carbon laminated film

Country Status (1)

Country Link
CN (1) CN106498344B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108517499A (en) * 2018-03-28 2018-09-11 中国科学院兰州化学物理研究所 A kind of difunctional NbSe of lubrication/conduction2The low temperature preparation method of film
CN109423612A (en) * 2017-08-31 2019-03-05 南京理工大学 Wear-resisting hydrophobic carbon-based laminated film, preparation method and applications

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1354276A (en) * 2000-10-17 2002-06-19 日新电机株式会社 Carbon film and its forming method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1354276A (en) * 2000-10-17 2002-06-19 日新电机株式会社 Carbon film and its forming method

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
JIANYUN ZHENG等: "Properties of TiN/TiCN multilayer films by direct current magnetron sputtering", 《JOURNAL OF PHYSICS D: APPLIED PHYSICS》 *
JINLONG JIANG等: "Structure and characteristics of amorphous (Ti,Si)–C:H films deposited by reactive magnetron sputtering", 《DIAMOND & RELATED MATERIALS》 *
R. G. LACERDA等: "Hard hydrogenated carbon films with low stress", 《APPLIED PHYSICS LETTERS》 *
XIAOQIANG LIU等: "A Near-Frictionless and Extremely Elastic Hydrogenated Amorphous Carbon Film with Self-Assembled Dual Nanostructure", 《ADVANCED MATERIALS》 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109423612A (en) * 2017-08-31 2019-03-05 南京理工大学 Wear-resisting hydrophobic carbon-based laminated film, preparation method and applications
CN108517499A (en) * 2018-03-28 2018-09-11 中国科学院兰州化学物理研究所 A kind of difunctional NbSe of lubrication/conduction2The low temperature preparation method of film

Also Published As

Publication number Publication date
CN106498344B (en) 2018-09-25

Similar Documents

Publication Publication Date Title
Yin et al. Ultra-wear-resistant MXene-based composite coating via in situ formed nanostructured tribofilm
Wu et al. Preparation and properties of Ag/DLC nanocomposite films fabricated by unbalanced magnetron sputtering
US6080470A (en) Hard graphite-like material bonded by diamond-like framework
Wang et al. Nanocomposite microstructure and environment self-adapted tribological properties of highly hard graphite-like film
Natrayan et al. Evaluating the mechanical and tribological properties of DLC nanocoated aluminium 5051 using RF sputtering
Shaha et al. Effect of process parameters on mechanical and tribological performance of pulsed-DC sputtered TiC/aC: H nanocomposite films
CN109504947B (en) CrN coating, preparation method and application
Ferrari et al. Electron field emission from cluster-assembled carbon thin films
CN106498344B (en) A kind of preparation method of elastic lubrication nanometer carbon/agraphitic carbon laminated film
López et al. Wear resistant coatings: Silica sol–gel reinforced with carbon nanotubes
Li et al. Graphitic encapsulation and electronic shielding of metal nanoparticles to achieve metal–carbon interfacial superlubricity
US20230183851A1 (en) High-entropy carbide ceramic material, carbide ceramic coating and preparation methods and use thereof
Kong et al. Effect of MoS2 content on friction and wear properties of Mo and S co-doped CrN coatings at 25–600° C
Wang et al. Low friction of graphene nanocrystallite embedded carbon nitride coatings prepared with MCECR plasma sputtering
Su et al. Effect of C2H2 flow rate and a Ti/TiN/TiCN interlayer on the structure, mechanical and tribological properties of aC: H films deposited using a hybrid PVD/PECVD process with an anode-layer ion source
Zia et al. A preliminary wear studies of isolated carbon particles embedded diamond-like carbon coatings
Avasthi Effects and uses of ion beams with diamond, DLC and fullerene films
CN103160793B (en) The preparation method of super thick TiN-TiCN multi-layer compound film material
CN108396306A (en) A kind of method for the diamond-like carbon composite film that low temperature depositing hardness is controllable
Waichman et al. Magnetron sputtering of boron carbide coating on aluminum substrate—Experimental considerations for enhancing adhesion
CN100465353C (en) Method for preparing composite film of carbon similar to generic diamond containing Nano granules of silicon dioxide
Marx et al. Tailored crystalline width and wall thickness of an annealed 3D carbon foam composites and their mechanical properties
JP2005076756A (en) Carbon nano-tube sliding member and its manufacturing method
Sala et al. Nb–C thin films prepared by DC-MS and HiPIMS: Synthesis, structure, and tribomechanical properties
CN113072063B (en) Hydrogen-resistant coating based on inner surface of hydrogen storage and transportation equipment and preparation method thereof

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant