CN106485387A - Semiconductor process flow control method and device - Google Patents

Semiconductor process flow control method and device Download PDF

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Publication number
CN106485387A
CN106485387A CN201510551757.4A CN201510551757A CN106485387A CN 106485387 A CN106485387 A CN 106485387A CN 201510551757 A CN201510551757 A CN 201510551757A CN 106485387 A CN106485387 A CN 106485387A
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China
Prior art keywords
examination criteria
quality control
standard
control standard
technological standardss
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CN201510551757.4A
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Chinese (zh)
Inventor
詹祥宇
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Peking University Founder Group Co Ltd
Shenzhen Founder Microelectronics Co Ltd
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Peking University Founder Group Co Ltd
Shenzhen Founder Microelectronics Co Ltd
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Priority to CN201510551757.4A priority Critical patent/CN106485387A/en
Publication of CN106485387A publication Critical patent/CN106485387A/en
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/30Computing systems specially adapted for manufacturing

Abstract

The embodiment of the present invention provides a kind of semiconductor process flow control method and device.The method includes:Obtain the corresponding technological standardss of each processing step of quasiconductor, examination criteria and quality control standard;If technological standardss, examination criteria and quality control standard are unequal, notify technologist's modification technological standardss, notify tester's modification examination criteria and/or notify quality management and control personnel modification quality control standard.The embodiment of the present invention obtains the corresponding technological standardss of each processing step of quasiconductor, examination criteria and quality control standard by computer, and judge whether technological standardss, examination criteria and quality control standard are equal, when technological standardss, examination criteria and quality control standard not etc. when, notify technologist's modification technological standardss, notify tester's modification examination criteria and/or notify quality management and control personnel modification quality control standard, replenishment of process designs, in order to avoid erroneous judgement occurs to product in production process, and cause excessive abnormality processing.

Description

Semiconductor process flow control method and device
Technical field
The present embodiments relate to semiconductor production manufactures field, more particularly, to a kind of semiconductor process flow Control method and device.
Background technology
Semiconductor process flow is related to manufacturing process, data collection and analysis process and quality management process, During manufacturing, technologist arranges technological standardss in manufacturing execution system, and according to this Technological standardss manufacture quasiconductor;After semiconductor production manufacture terminates, tester partly leads from all of Whether sample drawn in body, carries out data acquisition detection to sample, and close according to examination criteria judgment sample Lattice are up to standard, and wherein, examination criteria is arranged in data acquisition and analysis system by board standard by board module; In addition, the quality standard that quality management and control personnel press company arranges quality control standard in quality control system, And judge whether the quasiconductor manufactured meets the quality control standard of company.
In actual production manufacture process, due to technological standardss, examination criteria and quality control standard respectively Formulated by different personnel, therefore, three may differ, once occur three not situations such as, then The manufacturing process of quasiconductor will come to a halt, or even have a strong impact on the manufacturing progress of quasiconductor.
Content of the invention
The embodiment of the present invention provides a kind of semiconductor process flow control method and device, and replenishment of process designs, In order to avoid erroneous judgement occurs to product in production process, and cause excessive abnormality processing.
The embodiment of the present invention is to provide a kind of semiconductor process flow control method on one side, including:
Obtain the corresponding technological standardss of each processing step of quasiconductor, examination criteria and quality control standard;
Judge whether described technological standardss, described examination criteria and described quality control standard are equal;
If described technological standardss, described examination criteria and described quality control standard are unequal, notify work Artist person changes described technological standardss, notifies tester to change described examination criteria and/or notice quality pipe Control personnel change described quality control standard.
The embodiment of the present invention is to provide a kind of semiconductor process flow control device on the other hand, including:
Acquisition module, for obtain the corresponding technological standardss of each processing step of quasiconductor, examination criteria and Quality control standard;
Judge module, for judging described technological standardss, described examination criteria and described quality control standard Whether equal;
Notification module, if for described technological standardss, described examination criteria and described quality control standard not Equal, then notify technologist to change described technological standardss, notify tester to change described examination criteria And/or notify quality management and control personnel to change described quality control standard.
Semiconductor process flow control method provided in an embodiment of the present invention and device, are obtained by computer The corresponding technological standardss of each processing step of quasiconductor, examination criteria and quality control standard, and judge work Whether skill standard, examination criteria and quality control standard are equal, when technological standardss, examination criteria and quality When administrative standard does not wait, notify technologist's modification technological standardss, notify tester's modification examination criteria And/or notifying quality management and control personnel modification quality control standard, replenishment of process designs, in order to avoid in production process To product, erroneous judgement occurs, and cause excessive abnormality processing.
Brief description
Fig. 1 is semiconductor process flow control method flow chart provided in an embodiment of the present invention;
Fig. 2 is the structure chart of semiconductor process flow control device provided in an embodiment of the present invention;
The structure chart of the semiconductor process flow control device that Fig. 3 provides for another embodiment of the present invention.
Specific embodiment
Fig. 1 is semiconductor process flow control method flow chart provided in an embodiment of the present invention.The present invention is real Apply example for technological standardss, examination criteria and quality control standard in semiconductor process flow respectively by difference Personnel formulate, therefore, three may differ, once occur three not situations such as, then can be to product Product quality is judged by accident, so certainly will cause mistake or excessive abnormality processing (such as:Should not HOLD Product is suspended production, non-product up to standard is placed to subsequent processing on the contrary), in order to solve this problem this Bright embodiment provides semiconductor process flow control method, and the executive agent of the method is specially computer, The comprising the following steps that of the method:
Step S101, the acquisition corresponding technological standardss of each processing step of quasiconductor, examination criteria and quality Administrative standard;
In embodiments of the present invention, each processing step of quasiconductor corresponds to technological standardss, examination criteria respectively And quality control standard, technological standardss are arranged in manufacturing execution system by technologist, detect mark Standard is arranged in data acquisition and analysis system by board standard by board module, and quality control standard is by quality The quality standard that management and control personnel press company is arranged in quality control system.Computer is specifically from the manufacturing Obtain technological standardss in execution system, obtain examination criteria from data acquisition and analysis system, from quality pipe Quality control standard is obtained in reason system.
Step S102, whether judge described technological standardss, described examination criteria and described quality control standard Equal;
Described technological standardss, described examination criteria and described quality control standard that computer judgement gets Whether equal.
If the described technological standardss of step S103, described examination criteria and described quality control standard are unequal, Technologist is then notified to change described technological standardss, notify tester to change described examination criteria and/or lead to Know that quality management and control personnel change described quality control standard.
If computer judges described technological standardss, described examination criteria and described quality control standard not phase Deng, then notify technologist change described technological standardss, notify tester change described examination criteria and/ Or notify quality management and control personnel to change described quality control standard, specifically, if described technological standardss and institute State examination criteria equal, and unequal with described quality control standard, then notify quality management and control personnel modification Described quality control standard;If described technological standardss, described examination criteria and described quality control standard are mutual Unequal, then notify technologist to change described technological standardss, notify tester to change described inspection respectively Mark is accurate and notifies quality management and control personnel to change described quality control standard, stops this technological design simultaneously Subsequent processes, in order to avoid erroneous judgement to product in production process, and cause excessive abnormality processing, until described After technological standardss, described examination criteria are further continued for this technological design when consistent with described quality control standard Continuous process it is ensured that in production process product normal manufacture.
The embodiment of the present invention obtains the corresponding technological standardss of each processing step of quasiconductor, inspection by computer Mark is accurate and quality control standard, and judges technological standardss, examination criteria and quality control standard whether phase Deng, when technological standardss, examination criteria and quality control standard not etc. when, notify technologist's modification technique Standard, notify tester modification examination criteria and/or notify quality management and control personnel modification quality management mark Standard, replenishment of process designs, in order to avoid erroneous judgement to product in production process, and causes excessive abnormality processing.
On the basis of above-described embodiment, the described acquisition corresponding technological standardss of each processing step of quasiconductor, After examination criteria and quality control standard, also include:
Calculate higher limit and the lower limit of described technological standardss according to described technological standardss;
Calculate higher limit and the lower limit of described examination criteria according to described examination criteria;
Calculate higher limit and the lower limit of described quality control standard according to described quality control standard.
In embodiments of the present invention, technological standardss, examination criteria and quality control standard correspond to one respectively Numerical range, for example, the technological standardss of semiconductor thickness are 0.72 ± 0.06 μm, then the work of semiconductor thickness The higher limit of skill standard is 0.78 μm, and the lower limit of the technological standardss of semiconductor thickness is 0.66 μm.In the same manner, Examination criteria and quality control standard correspond to a numerical range, technological standardss, examination criteria and matter respectively Amount administrative standard may identical it is also possible to different.
Described judge whether described technological standardss, described examination criteria and described quality control standard equal, Including:Judge higher limit, the higher limit of described examination criteria and the described quality management of described technological standardss Whether the higher limit of standard is equal, and judges the lower limit of described technological standardss, described examination criteria Whether the lower limit of lower limit and described quality control standard is equal.
For example, the technological standardss of semiconductor thickness are 0.72 ± 0.06 μm, then the technological standardss of semiconductor thickness Higher limit be 0.78 μm, the lower limit of the technological standardss of semiconductor thickness is 0.66 μm;Semiconductor thickness Examination criteria be 0.71 ± 0.06 μm, then the higher limit of the examination criteria of semiconductor thickness is 0.77 μm, half The lower limit of the examination criteria of conductor thickness is 0.65 μm;The quality control standard of semiconductor thickness is 0.70 ± 0.06 μm, then the higher limit of the quality control standard of semiconductor thickness be 0.76 μm, semiconductor thickness The lower limit of quality control standard be 0.64 μm, then computer judges to know the upper limit of described technological standardss The higher limit of value, the higher limit of described examination criteria and described quality control standard is unequal, and described work The lower limit of the lower limit of skill standard, the lower limit of described examination criteria and described quality control standard not phase Deng.
Described judge described technological standardss, described examination criteria and described quality control standard whether equal it Afterwards, also include:Generate semiconductor process flow control table, described semiconductor process flow control table includes Described technological standardss, described examination criteria and described quality control standard, and described technological standardss, institute State examination criteria and the comparative result of described quality control standard.
Computer judges whether described technological standardss, described examination criteria and described quality control standard are equal Afterwards, generate semiconductor process flow control table, described semiconductor process flow control table includes described work Skill standard, described examination criteria and described quality control standard, and described technological standardss, described detection Standard and the comparative result of described quality control standard, the structure of this semiconductor process flow control table is as follows Shown in table 1:
Table 1
Technological standardss Examination criteria Quality control standard Comparative result
0.72±0.06μm 0.71±0.06μm 0.70±0.06μm Different
If described technological standardss, described examination criteria and described quality control standard are unequal, lead to Know that technologist changes described technological standardss, notifies tester to change described examination criteria and/or notice product Matter management and control personnel change described quality control standard, including:If described technological standardss, described examination criteria Unequal with described quality control standard, then generate warning information, and according to described alarm information noticing work Artist person changes described technological standardss, notifies tester to change described examination criteria and/or notice quality pipe Control personnel change described quality control standard.
If described technological standardss, described examination criteria and described quality control standard are unequal, generate and accuse Alarming information, warning information specifically indicates described technological standardss, described examination criteria and described quality management mark In standard, which two standard differs, or three all differs, and points out three according to above-mentioned this warning information of table 1 Person all differs, then notify technologist to change described technological standardss, notify tester to change described inspection Mark is accurate and notifies quality management and control personnel to change described quality control standard;If described technological standardss and described Examination criteria is equal, and unequal with described quality control standard, then notify quality management and control personnel modification institute State quality control standard;If described technological standardss and described quality control standard are equal, and with described detection Standard is unequal, then notify tester to change described examination criteria;If described examination criteria and described matter Amount administrative standard is equal, and unequal with described technological standardss, then notify technologist to change described technique Standard, concrete Notification Method is the computer or terminal transmission announcement information to corresponding personnel, informs corresponding The interdependent canonical parameter of personnel's modification.
The embodiment of the present invention obtains the corresponding technological standardss of each processing step of quasiconductor, inspection by computer Mark is accurate and quality control standard, and judges technological standardss, examination criteria and quality control standard whether phase Deng, when technological standardss, examination criteria and quality control standard not etc. when, notify technologist's modification technique Standard, notify tester modification examination criteria and/or notify quality management and control personnel modification quality management mark Standard, replenishment of process designs, in order to avoid erroneous judgement to product in production process, and causes excessive abnormality processing.
Fig. 2 is the structure chart of semiconductor process flow control device provided in an embodiment of the present invention.The present invention It is real that the semiconductor process flow control device that embodiment provides can execute semiconductor process flow control method Apply the handling process of example offer, as shown in Fig. 2 semiconductor process flow control device 20 includes obtaining mould Block 21 is used for obtaining the corresponding technological standardss of each processing step of quasiconductor, examination criteria and quality management mark Accurate;Judge module 22 is used for judging described technological standardss, described examination criteria and described quality control standard Whether equal;If notification module 23 is used for described technological standardss, described examination criteria and described quality management Standard is unequal, then notify technologist to change described technological standardss, notify tester to change described inspection Mark is accurate and/or notifies quality management and control personnel to change described quality control standard.
The embodiment of the present invention obtains the corresponding technological standardss of each processing step of quasiconductor, inspection by computer Mark is accurate and quality control standard, and judges technological standardss, examination criteria and quality control standard whether phase Deng, when technological standardss, examination criteria and quality control standard not etc. when, notify technologist's modification technique Standard, notify tester modification examination criteria and/or notify quality management and control personnel modification quality management mark Standard, replenishment of process designs, in order to avoid erroneous judgement to product in production process, and causes excessive abnormality processing.
The structure chart of the semiconductor process flow control device that Fig. 3 provides for another embodiment of the present invention.? On the basis of above-described embodiment, acquisition module 21 is specifically for calculating described technique according to described technological standardss The higher limit of standard and lower limit;According to described examination criteria calculate described examination criteria higher limit and under Limit value;Calculate higher limit and the lower limit of described quality control standard according to described quality control standard.
Judge module 22 is specifically for judging the higher limit of described technological standardss, the upper limit of described examination criteria Value and described quality control standard higher limit whether equal, and judge described technological standardss lower limit, Whether the lower limit of the lower limit of described examination criteria and described quality control standard is equal.
Semiconductor process flow control device 20 also includes semiconductor process flow control table generation module 24, For generating semiconductor process flow control table, described semiconductor process flow control table includes described technique Standard, described examination criteria and described quality control standard, and described technological standardss, described detection mark The comparative result of accurate and described quality control standard.
If notification module 23 is specifically for described technological standardss, described examination criteria and described quality management mark Accurate unequal, then generate warning information, and change described work according to described alarm information noticing technologist Skill standard, notify tester change described examination criteria and/or notify quality management and control personnel change described matter Amount administrative standard.
Transmission equipment provided in an embodiment of the present invention can be specifically for executing the method that above-mentioned Fig. 1 is provided Embodiment, here is omitted for concrete function.
The embodiment of the present invention obtains the corresponding technological standardss of each processing step of quasiconductor, inspection by computer Mark is accurate and quality control standard, and judges technological standardss, examination criteria and quality control standard whether phase Deng, when technological standardss, examination criteria and quality control standard not etc. when, notify technologist's modification technique Standard, notify tester modification examination criteria and/or notify quality management and control personnel modification quality management mark Standard, replenishment of process designs, in order to avoid erroneous judgement to product in production process, and causes excessive abnormality processing.
In sum, the embodiment of the present invention obtains the corresponding work of each processing step of quasiconductor by computer Skill standard, examination criteria and quality control standard, and judge technological standardss, examination criteria and quality management Whether standard equal, when technological standardss, examination criteria and quality control standard not etc. when, notify technique people Member changes technological standardss, notifies tester's modification examination criteria and/or notify quality management and control personnel modification matter Amount administrative standard, replenishment of process designs, in order to avoid erroneous judgement to product in production process, and causes polyisocyanate Often process.
It should be understood that disclosed apparatus and method in several embodiments provided by the present invention, Can realize by another way.For example, device embodiment described above is only schematically, For example, the division of described unit, only a kind of division of logic function, in addition actual can have when realizing Dividing mode, for example multiple units or assembly can in conjunction with or be desirably integrated into another system, or Some features can be ignored, or does not execute.Another, shown or discussed coupling each other or Direct-coupling or communication connection can be by some interfaces, the INDIRECT COUPLING of device or unit or communication link Connect, can be electrical, mechanical or other forms.
The described unit illustrating as separating component can be or may not be physically separate, make For the part that unit shows can be or may not be physical location, you can with positioned at a place, Or can also be distributed on multiple NEs.Can select according to the actual needs part therein or The whole unit of person is realizing the purpose of this embodiment scheme.
In addition, can be integrated in a processing unit in each functional unit in each embodiment of the present invention, Can also be that unit is individually physically present it is also possible to two or more units are integrated in a list In unit.Above-mentioned integrated unit both can be to be realized in the form of hardware, it would however also be possible to employ hardware adds software The form of functional unit is realized.
The above-mentioned integrated unit realized in the form of SFU software functional unit, can be stored in a computer In read/write memory medium.Above-mentioned SFU software functional unit is stored in a storage medium, including some fingers Order is with so that a computer equipment (can be personal computer, server, or network equipment etc.) Or processor (processor) executes the part steps of each embodiment methods described of the present invention.And it is aforementioned Storage medium include:USB flash disk, portable hard drive, read only memory (Read-Only Memory, ROM), Random access memory (Random Access Memory, RAM), magnetic disc or CD etc. are various permissible The medium of store program codes.
Those skilled in the art can be understood that, for convenience and simplicity of description, only with above-mentioned each The division of functional module is illustrated, and in practical application, can divide above-mentioned functions as desired Join and completed by different functional modules, the internal structure of device will be divided into different functional modules, with Complete all or part of function described above.The specific work process of the device of foregoing description is permissible With reference to the corresponding process in preceding method embodiment, will not be described here.
Finally it should be noted that:Various embodiments above is only in order to illustrating technical scheme rather than right It limits;Although being described in detail to the present invention with reference to foregoing embodiments, this area common Technical staff should be understood:It still can be modified to the technical scheme described in foregoing embodiments, Or equivalent is carried out to wherein some or all of technical characteristic;And these modifications or replacement, and Do not make the scope of the essence disengaging various embodiments of the present invention technical scheme of appropriate technical solution.

Claims (10)

1. a kind of semiconductor process flow control method is it is characterised in that include:
Obtain the corresponding technological standardss of each processing step of quasiconductor, examination criteria and quality control standard;
Judge whether described technological standardss, described examination criteria and described quality control standard are equal;
If described technological standardss, described examination criteria and described quality control standard are unequal, notify work Artist person changes described technological standardss, notifies tester to change described examination criteria and/or notice quality pipe Control personnel change described quality control standard.
2. method according to claim 1 is it is characterised in that described each technique of acquisition quasiconductor After the corresponding technological standardss of step, examination criteria and quality control standard, also include:
Calculate higher limit and the lower limit of described technological standardss according to described technological standardss;
Calculate higher limit and the lower limit of described examination criteria according to described examination criteria;
Calculate higher limit and the lower limit of described quality control standard according to described quality control standard.
3. method according to claim 2 it is characterised in that the described technological standardss of described judgement, Whether described examination criteria and described quality control standard are equal, including:
Judge higher limit, the higher limit of described examination criteria and the described quality management mark of described technological standardss Whether accurate higher limit is equal, and judges under the lower limit of described technological standardss, described examination criteria Whether the lower limit of limit value and described quality control standard is equal.
4. method according to claim 3 it is characterised in that the described technological standardss of described judgement, Described examination criteria and described quality control standard whether equal after, also include:
Generate semiconductor process flow control table, described semiconductor process flow control table includes described technique Standard, described examination criteria and described quality control standard, and described technological standardss, described detection mark The comparative result of accurate and described quality control standard.
If 5. the method according to any one of claim 1-4 is it is characterised in that described technique Standard, described examination criteria and described quality control standard are unequal, then notify technologist's modification described Technological standardss, tester is notified to change described examination criteria and/or notify quality management and control personnel modification described Quality control standard, including:
If described technological standardss, described examination criteria and described quality control standard are unequal, generate and accuse Alarming information, and change described technological standardss, notify tester according to described alarm information noticing technologist Member changes described examination criteria and/or notifies quality management and control personnel to change described quality control standard.
6. a kind of semiconductor process flow control device is it is characterised in that include:
Acquisition module, for obtain the corresponding technological standardss of each processing step of quasiconductor, examination criteria and Quality control standard;
Judge module, for judging described technological standardss, described examination criteria and described quality control standard Whether equal;
Notification module, if for described technological standardss, described examination criteria and described quality control standard not Equal, then notify technologist to change described technological standardss, notify tester to change described examination criteria And/or notify quality management and control personnel to change described quality control standard.
7. semiconductor process flow control device according to claim 6 is it is characterised in that described Acquisition module specifically for calculating higher limit and the lower limit of described technological standardss according to described technological standardss; Calculate higher limit and the lower limit of described examination criteria according to described examination criteria;According to described quality management The higher limit of quality control standard described in criterion calculation and lower limit.
8. semiconductor process flow control device according to claim 7 is it is characterised in that described Judge module is specifically for judging higher limit, the higher limit of described examination criteria and the institute of described technological standardss Whether the higher limit stating quality control standard is equal, and judges the lower limit of described technological standardss, described Whether the lower limit of the lower limit of examination criteria and described quality control standard is equal.
9. semiconductor process flow control device according to claim 8 is it is characterised in that also wrap Include:
Semiconductor process flow control table generation module, for generating semiconductor process flow control table, institute State semiconductor process flow control table and include described technological standardss, described examination criteria and described quality management Standard, and the comparative result of described technological standardss, described examination criteria and described quality control standard.
10. the semiconductor process flow control device according to any one of claim 6-9, its feature It is, if described notification module is specifically for described technological standardss, described examination criteria and described quality pipe Reason standard is unequal, then generate warning information, and changes institute according to described alarm information noticing technologist State technological standardss, notify tester to change described examination criteria and/or notify quality management and control personnel modification institute State quality control standard.
CN201510551757.4A 2015-09-01 2015-09-01 Semiconductor process flow control method and device Pending CN106485387A (en)

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Application publication date: 20170308