CN106483705B - Colored filter and its manufacturing method - Google Patents

Colored filter and its manufacturing method Download PDF

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Publication number
CN106483705B
CN106483705B CN201611217651.1A CN201611217651A CN106483705B CN 106483705 B CN106483705 B CN 106483705B CN 201611217651 A CN201611217651 A CN 201611217651A CN 106483705 B CN106483705 B CN 106483705B
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China
Prior art keywords
chromatograph
ito
colored filter
black matrix
forming
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CN201611217651.1A
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Chinese (zh)
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CN106483705A (en
Inventor
焦峰
孙俊豪
王海宏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nanjing CEC Panda LCD Technology Co Ltd
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Nanjing CEC Panda LCD Technology Co Ltd
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Priority to CN201611217651.1A priority Critical patent/CN106483705B/en
Publication of CN106483705A publication Critical patent/CN106483705A/en
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • G02F1/133516Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133512Light shielding layers, e.g. black matrix
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Filters (AREA)

Abstract

The present invention provides a kind of colored filter and its manufacturing method, includes the following steps: to pass through photoetching process, form the ITO pattern being located in pixel region step 1: deposit ito thin film on the glass substrate;Step 2: by photoetching process, forming black matrix", black matrix" covers corresponding part ITO pattern on the glass substrate for forming above-mentioned figure;Step 3: injecting color ink to specified pixel region, while being powered to the ITO pattern of corresponding pixel area, by electrostatic attraction, induced color ink to specified region forms the first chromatograph or the second chromatograph or third chromatograph using ink-jetting process;Step 4: forming other two chromatograph using the same method of third step;Step 5: forming ITO common electrode.The present invention is used makes ITO image before making black matrix", applies voltage by the ITO to different color blocking positions, the attraction by electrostatic to ink, ink accurately very can be limited in presumptive area, reduce ion and introduce, improve product yield.

Description

Colored filter and its manufacturing method
Technical field
The invention belongs to technical field of liquid crystal display more particularly to a kind of colored filter and its manufacturing methods.
Background technique
CF ink-jet printing technology is using existing ink-jet printing technology, using oleophylic black (ink) and not oleophylic ink (ink) Exclusiveness principle, tri- kinds of pigment inkjets of R, G, B are sprayed into parent's ink pixel regions, form the manufacture of the chromatograph of colored filter Method.
The manufacturing method of colored filter includes the following steps: step 1: as shown in Figure 1, being formed on the glass substrate 10 Glass substrate 10 is partitioned into multiple pixel regions by multiple black matrix"s 20, the black matrix" 20;Step 2: as shown in Fig. 2, in glass The wetting containing photocatalyst and fluorine-containing nonionic surfactant is coated on the black matrix" 20 that glass substrate 10 and the first step are formed Property variable layer 30;Step 3: photocatalyst is triggered as shown in figure 3, be exposed using mask plate 60 to wetability variable layer 30, 20 surface of black matrix" is set to form thin pigment inks water layer 40, pixel region forms close pigment inks water layer 50;Step 4: as shown in figure 4, Several paint ink is disposably sprayed into pixel region and forms color blocking layer 70.
However by the wetting variable layer 30 in the above method or technology mainly using fluorination or other surface-actives Agent thereby produces a prominent question, that is, image retention problem.
In prior art technology, wetting variable layer is mainly surfactant component, and surfactant is with similar In [Rf1 -O-(CF2)n-CO2]i-Mi+General structure, wherein M is the cation that chemical valence is i, thus mostly surfactant all Containing ionic substance, this will lead to display image retention to influence display image quality.
Summary of the invention
The purpose of the present invention is to provide it is a kind of by ink be limited in presumptive area, reduce ion introduce, improve product it is good The colored filter and its manufacturing method of rate.
The present invention provides a kind of manufacturing method of colored filter, includes the following steps:
Step 1: depositing ito thin film on the glass substrate, by photoetching process, the ITO figure being located in pixel region is formed Shape;
Step 2:, by photoetching process, forming black matrix", black matrix" on the glass substrate for forming above-mentioned figure Cover corresponding part ITO pattern;
Step 3: injecting color ink to specified pixel region, while to corresponding pixel area using ink-jetting process ITO pattern is powered, and by electrostatic attraction, induced color ink to specified region forms the first chromatograph or the second chromatograph or the Three chromatographs;
Step 4: forming other two chromatograph using the same method of third step;
Step 5: forming ITO common electrode.
It preferably, further include step 6: forming support column.
Preferably, the support column is located on ITO common electrode.
Preferably, the ITO common electrode covers the first chromatograph, the second chromatograph, third chromatograph and black matrix".
The present invention also provides a kind of colored filters, characterized in that it comprises: glass substrate;Positioned at the glass substrate And it is located at multiple ITO patterns in pixel region;The black matrix" being partially covered in corresponding ITO pattern;Positioned at corresponding ITO figure The first chromatograph, the second chromatograph and third chromatograph in shape;And it is covered on the first chromatograph, the second chromatograph, third chromatograph and black ITO common electrode on matrix.
It preferably, further include the support column on ITO common electrode.
The present invention is used makes ITO image before making black matrix", applies electricity by the ITO to different color blocking positions Ink accurately can be limited in presumptive area very, reduce ion and introduce, improve and produce by pressure, the attraction by electrostatic to ink Product yield.
Detailed description of the invention
Fig. 1 to Fig. 4 is the schematic diagram of existing colored filter making step;
Fig. 5 to Figure 10 is the schematic diagram of the making step of colored filter of the present invention;
Figure 11 is the structural schematic diagram of colored filter of the present invention.
Specific embodiment
In the following with reference to the drawings and specific embodiments, the present invention is furture elucidated, it should be understood that these embodiments are merely to illustrate It the present invention rather than limits the scope of the invention, after the present invention has been read, those skilled in the art are to of the invention each The modification of kind equivalent form falls within the application range as defined in the appended claims.
The manufacturing method of colored filter of the present invention, includes the following steps:
Step 1: depositing ito thin film on glass substrate 11 as shown in Figure 5, by photoetching process, is formed and be located at pixel region ITO pattern 12 in domain;
Step 2: as shown in fig. 6, by photoetching process, forming black matrix" on the glass substrate for forming above-mentioned figure 13, black matrix" 13 covers corresponding part ITO pattern 12;
Step 3: as shown in Figure 7 and Figure 8, using ink-jetting process, being dripped to the injection of specified pixel region by spray head 100 Color ink 14, while being powered to the ITO pattern of corresponding pixel area 12, pass through electrostatic attraction, induced color ink 14 to finger Determine region, that is, forms the first chromatograph 151 or the second chromatograph 152 or third chromatograph 153;
Step 4: as shown in figure 8, forming other two chromatograph using the same method of third step.
Step 5: as shown in figure 9, forming ITO common electrode 16.
Step 6: as shown in Figure 10, forming the support column 17 being located on ITO common electrode 16.
Colored filter is formed by the above method.
The present invention also discloses a kind of colored filter, as shown in figure 11 comprising: glass substrate 11;Positioned at the glass base Plate 11 and the multiple ITO patterns 12 being located in pixel region;The black matrix" 13 being partially covered in corresponding ITO pattern 12;Position The first chromatograph 151, the second chromatograph 152 and third chromatograph 153 in corresponding ITO pattern 12;It is covered on the first chromatograph 151, ITO common electrode 16 on two chromatographs 152, third chromatograph 153 and black matrix" 12;And on ITO common electrode 16 Support column 17.
The present invention is used makes ITO image 12 before making black matrix" 13, is applied by the ITO to different color blocking positions Ink accurately can be limited in presumptive area very, reduce ion and introduce, mention by making alive, the attraction by electrostatic to ink High product yield.

Claims (6)

1. a kind of manufacturing method of colored filter, which comprises the steps of:
Step 1: depositing ito thin film on the glass substrate, by photoetching process, the ITO pattern being located in pixel region is formed;
Step 2:, by photoetching process, forming black matrix", black matrix" covering on the glass substrate for forming above-mentioned figure Corresponding part ITO pattern;
Step 3: injecting color ink to specified pixel region, while scheming to the ITO of corresponding pixel area using ink-jetting process Shape is powered, and by electrostatic attraction, induced color ink to specified region forms the first chromatograph or the second chromatograph or third color Layer;
Step 4: forming other two chromatograph using the same method of third step;
Step 5: forming ITO common electrode.
2. the manufacturing method of colored filter according to claim 1, it is characterised in that: further include step 6: forming branch Dagger.
3. the manufacturing method of colored filter according to claim 2, it is characterised in that: the support column is total positioned at ITO It is powered on extremely.
4. the manufacturing method of colored filter according to claim 1, it is characterised in that: the ITO common electrode covering First chromatograph, the second chromatograph, third chromatograph and black matrix".
5. a kind of colored filter comprising: glass substrate;Positioned at the glass substrate and multiple ITO in pixel region Figure;The black matrix" being partially covered in corresponding ITO pattern;The first chromatograph, the second chromatograph in corresponding ITO pattern and Third chromatograph;And it is covered on the ITO common electrode on the first chromatograph, the second chromatograph, third chromatograph and black matrix", feature It is, the colored filter is made using the manufacturing method of any colored filter of claim 1-4.
6. colored filter according to claim 5, it is characterised in that: further include the support on ITO common electrode Column.
CN201611217651.1A 2016-12-26 2016-12-26 Colored filter and its manufacturing method Active CN106483705B (en)

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Application Number Priority Date Filing Date Title
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CN106483705B true CN106483705B (en) 2019-06-11

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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI657270B (en) * 2017-03-27 2019-04-21 友達光電股份有限公司 Manufacturing method of color filter device
CN107422522B (en) * 2017-09-20 2019-12-13 武汉华星光电技术有限公司 Color filter substrate and manufacturing method thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11281810A (en) * 1998-03-27 1999-10-15 Canon Inc Manufacture of color filter and its device
JP2009190241A (en) * 2008-02-14 2009-08-27 Seiko Epson Corp Electrostatic actuator, liquid droplet discharge head and liquid droplet discharge device
CN103700685A (en) * 2013-12-12 2014-04-02 京东方科技集团股份有限公司 Display panel and display device
CN104123054A (en) * 2014-07-22 2014-10-29 昆山龙腾光电有限公司 Touch display device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11281810A (en) * 1998-03-27 1999-10-15 Canon Inc Manufacture of color filter and its device
JP2009190241A (en) * 2008-02-14 2009-08-27 Seiko Epson Corp Electrostatic actuator, liquid droplet discharge head and liquid droplet discharge device
CN103700685A (en) * 2013-12-12 2014-04-02 京东方科技集团股份有限公司 Display panel and display device
CN104123054A (en) * 2014-07-22 2014-10-29 昆山龙腾光电有限公司 Touch display device

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