CN106483219B - Photoresist atomizing treatment equipment and photoresist atomization process system - Google Patents
Photoresist atomizing treatment equipment and photoresist atomization process system Download PDFInfo
- Publication number
- CN106483219B CN106483219B CN201610889971.5A CN201610889971A CN106483219B CN 106483219 B CN106483219 B CN 106483219B CN 201610889971 A CN201610889971 A CN 201610889971A CN 106483219 B CN106483219 B CN 106483219B
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- photoresist
- accommodating cavity
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- air inlet
- sample box
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
- G01N30/02—Column chromatography
Abstract
The present invention discloses a kind of photoresist atomizing treatment equipment comprising: manipulation seat stand, accommodating cavity, sample box, air inlet pipe, ultraviolet lamp tube and adsorption tube；Accommodating cavity is set on operation seat stand；Sample box is set in accommodating cavity, and sample box is for placing photoresist sample；Air inlet pipe is penetrated in accommodating cavity by operation seat stand, and air inlet pipe is connected to sample box, and air inlet pipe is for inert gas to be passed through in sample box；Ultraviolet lamp tube is set on the inner surface of accommodating cavity, and ultraviolet lamp tube is used to carry out ultraviolet photoetching to the photoresist sample being placed in sample box；Adsorption tube is connected to sample box, and adsorption tube is pierced by accommodating cavity, and adsorption tube is used to collect the sliver of the photoresist sample after ultraviolet photoetching by inert gas blowout.Photoresist atomizing treatment equipment of the invention can carry out atomization process to photoresist, consequently facilitating the assessment of the atomization performance of photoresist is reduced with filtering out high-quality photoresist because losing caused by photoresist.
Description
Technical field
The invention belongs to photoresist atomization technique fields, in particular, being related to a kind of photoresist atomizing treatment equipment and photoresist mist
Change processing system.
Background technique
(Thin Film Transistor-Liquid Crystal Display, Thin Film Transistors-LCD are aobvious by TFT-LCD
Show device) it is to show good display in comprehensive performances such as brightness, contrast, power consumption, service life, volume and weights at present, it
Function admirable, characteristic is good for large-scale production, high degree of automation and development space are wide, gradually occupied display neck
The leading position in domain.
In TFT-LCD, liquid crystal display panel is usually (i.e. color by Array substrate (i.e. thin-film transistor array base-plate), CF substrate
Color filter array substrate) and be clipped in liquid crystal between the two and constitute.
In the processing procedure of each substrate, usually designed on the glass substrate by coating, exposure, development, baking etc.
R, G, B, BM (BlackMatrix), PS (Photo Spacer) photoresist pattern.However once there is exposure light shield appearance in processing procedure
The phenomenon that atomization, generates variation so as to cause the photoresist pattern after exposure, and shape and line width (CD) occur abnormal.And cause to expose
The reason of light shield is atomized is when being exposed, and residual solvent takes light initiator sliver out of in photoresist, is attached to exposure light
On cover, so as to cause exposure light shield atomization.
Therefore, it needs a kind of photoresist atomizing treatment equipment when photoresist is assessed to be atomized photoresist, to comment
Estimate influence of the photoresist to exposure light shield.
Summary of the invention
To achieve the goals above, the present invention provides a kind of photoresist atomizing treatment equipments comprising: manipulation seat stand holds
Set cavity, sample box, air inlet pipe, ultraviolet lamp tube and adsorption tube；The accommodating cavity is set on the operation seat stand；It is described
Sample box is set in the accommodating cavity, and the sample box is for placing photoresist sample；The air inlet pipe is by the operation seat
Platform penetrates in the accommodating cavity, and the air inlet pipe is connected to the sample box, and the air inlet pipe is for leading to inert gas
Enter in the sample box；The ultraviolet lamp tube is set on the inner surface of the accommodating cavity, and the ultraviolet lamp tube is used for putting
The photoresist sample being placed in the sample box carries out ultraviolet photoetching；The adsorption tube is connected to the sample box, and the suction
Attached pipe is pierced by the accommodating cavity, and the adsorption tube is for collecting the light after ultraviolet photoetching blown out by the inert gas
Hinder the sliver of sample.
Further, the accommodating cavity includes four side walls and a roof, and four side walls are opposite two-by-two to be set
It sets, the roof is enclosed in the side of four side walls, and the operation seat stand is enclosed in the other side of four side walls, with
Make the top surface of the operation seat stand towards the roof.
Further, at least one of described four side walls are configured to open or close.
Further, the ultraviolet lamp tube is set on the inner surface of the side wall that can be opened or closed.
Further, the air inlet pipe is penetrated in the operation seat stand by outside, and by the top surface of the operation seat stand
It is pierced by, to penetrate in the accommodating cavity；The adsorption tube is pierced by by the roof of the accommodating cavity；The air inlet pipe by
After the top surface of the operation seat stand is pierced by, the air inlet pipe is carried out on the top surface of the operation seat stand using nut
Fastening；It is right on the outer surface of the roof using nut after the adsorption tube is pierced by by the roof of the accommodating cavity
The adsorption tube is fastened.
Further, the sample box be in cuboid, the sample box include: upper wall, lower wall, left side wall, right side wall,
Front side wall and rear wall, the air inlet pipe are connected to the lower wall, and the adsorption tube is connected to the upper wall；In the air inlet
Pipe is connected to after the lower wall, and the air inlet pipe is fastened on the outer surface of the lower wall using nut；In the adsorption tube
It is connected to after the upper wall, fastens the adsorption tube on the outer surface of the upper wall using nut.
Further, described left side wall or part thereof and/or the right side wall or part thereof be configured to open or
It closes.
Further, the photoresist atomizing treatment equipment further includes hygrosensor, and the hygrosensor is set to institute
It states in accommodating cavity, to detect the temperature in the accommodating cavity.
Further, the manipulation seat stand includes: total gas pressure dial gauge, is used to indicate the pressure of inert gas source；Power supply
Switch, for controlling opening or closing for power supply；Control keyboard, for set operating temperature, photoresist sample processing time and
Gas flow in the sample box；Temperature control system, for the temperature in the accommodating cavity to be remained to the work
Temperature；Display screen, for showing the setup parameter in the course of work；It starts switch, for controlling to the light in the sample box
What resistance sample was handled starts or stops.
The present invention also provides a kind of photoresist atomization process systems comprising inert gas source and the atomization of above-mentioned photoresist
The air inlet pipe of processing equipment, the photoresist atomizing treatment equipment is connected to the inert gas source.
Beneficial effects of the present invention: a kind of photoresist atomizing treatment equipment provided by the invention and photoresist atomization process system
Atomization process can be carried out to photoresist, consequently facilitating the assessment of the atomization performance of photoresist, to filter out high-quality photoresist
Material is reduced because losing caused by photoresist.
Detailed description of the invention
What is carried out in conjunction with the accompanying drawings is described below, above and other aspect, features and advantages of the embodiment of the present invention
It will become clearer, in attached drawing:
Fig. 1 is that the one side wall of the accommodating cavity of embodiment according to the present invention photoresist atomization process in the open state is set
Standby schematic diagram；
Fig. 2 is that the photoresist atomization process that the one side wall of the accommodating cavity of embodiment according to the present invention is in close state is set
Standby schematic diagram；
Fig. 3 is the schematic diagram of the right half of the right side wall of embodiment according to the present invention sample box in the open state；
Fig. 4 is that the right half of the right side wall of embodiment according to the present invention is in close state and is placed with photoresist sample
Sample box schematic diagram；
Fig. 5 is the schematic diagram of the photoresist atomization process system of embodiment according to the present invention.
Specific embodiment
Hereinafter, with reference to the accompanying drawings to detailed description of the present invention embodiment.However, it is possible to come in many different forms real
The present invention is applied, and the present invention should not be construed as limited to the specific embodiment illustrated here.On the contrary, providing these implementations
Example is in order to explain the principle of the present invention and its practical application, to make others skilled in the art it will be appreciated that the present invention
Various embodiments and be suitable for the various modifications of specific intended application.
Hereinafter, the words such as "upper", "lower", "left", "right", "front", "rear", "top", "bottom" are intended merely to facilitate
Embodiment is described, is not meant to limit the present invention.
Fig. 1 is that the one side wall of the accommodating cavity of embodiment according to the present invention photoresist atomization process in the open state is set
Standby schematic diagram.Fig. 2 is at the photoresist atomization that the one side wall of the accommodating cavity of embodiment according to the present invention is in close state
Manage the schematic diagram of equipment.
Referring to Figures 1 and 2, the photoresist atomizing treatment equipment 100 of embodiment according to the present invention include: manipulation seat stand 110,
Accommodate cavity 120, sample box 130, air inlet pipe 140, ultraviolet lamp tube 150 and adsorption tube 160；Accommodating cavity 120 is set to behaviour
Make on seat stand 110；Sample box 130 is set in accommodating cavity 120, and sample box 130 is for placing photoresist sample 300；Air inlet pipe
140 are penetrated in accommodating cavity 120 by operation seat stand 110, and air inlet pipe 140 is connected to sample box 130, and air inlet pipe 140 is used for will
Inert gas is passed through in sample box 130；Ultraviolet lamp tube 150 is set on the inner surface of accommodating cavity 120, and ultraviolet lamp tube 150 is used
In to the progress ultraviolet photoetching of photoresist sample 300 being placed in sample box 130；Adsorption tube 160 is connected to sample box 130, and
Adsorption tube 160 is pierced by accommodating cavity 120, and adsorption tube 160 is used to collect the light after ultraviolet photoetching blown out by inert gas
Hinder the sliver 300A of sample 300.
Specifically, accommodating cavity 120 includes four side walls 121,122,123,124 and a roof 125.Side wall
121 are oppositely arranged with side wall 123, and side wall 122 is oppositely arranged with side wall 124, and side wall 122 connects side wall 121 and side wall 123
One end, side wall 124 connect side wall 121 and side wall 123 the other end, in this way, four side walls 121,122,123,124 surround after be
Both ends open and hollow cuboid.Roof 125 is enclosed in one end of four side walls 121,122,123,124, and manipulates seat stand
110 are enclosed in the other end of four side walls 121,122,123,124, so that the top surface 110A of operation seat stand 110 is towards roof
125.That is, accommodating cavity 120, which borrows operation seat stand 110 as it, closes the another of four side walls 121,122,123,124
" bottom wall " of one end.In addition, four side walls 121,122,123,124 can be formed by transparent material, but the present invention is not restricted to
This.
Certainly, it should be noted that accommodating cavity 120 also may include a bottom wall, and the bottom wall is with roof 125 in face of setting
It sets, so that the bottom wall is enclosed in the other end of four side walls 121,122,123,124.When accommodating cavity 120 and operation seat stand 110
When installation, the bottom wall for accommodating cavity 120 and the top surface 110A of operation seat stand 110 is made to be bonded assembling.
Further, for the ease of installing or dismantle sample box 130, it is preferable that can by four side walls 121,122,
123, it at least one of 124 is configured to turn on or off.In the present embodiment, side wall 121 is configured to beat
On or off is closed.In Fig. 1, side wall 121 is in the open state；In Fig. 2, side wall 121 is in close state.In addition, side wall
It may be provided with handle 126 on 121 outer surface.
Three ultraviolet lamp tubes 150 are set on the inner surface of side wall 121, but the present invention is not restricted to this.Such as it is ultraviolet
Fluorescent tube 150 may be disposed at side wall 122,123,124, on the inner surface of any one in roof 125 and top surface 110A, or
Ultraviolet lamp can be arranged on side wall 122 and/or side wall 123 and/or side wall 124 and/or roof 125 and/or top surface 110A in person
Pipe 150.In addition, the quantity of ultraviolet lamp tube 150 is not also limited with three, quantity can be set according to actual needs.
Three sample boxes 130 are set in accommodating cavity 120, but the present invention does not limit the quantity of sample box 130
System.Fig. 3 is the schematic diagram of the right half of the right side wall of embodiment according to the present invention sample box in the open state.Fig. 4 is
Sample box that is that the right half of the right side wall of embodiment according to the present invention is in close state and being placed with photoresist sample 300
Schematic diagram.In figs. 3 and 4, the air inlet pipe 140 and adsorption tube 160 of part are shown.
Referring to Fig. 3 and Fig. 4, sample box 130 is a cuboid box comprising: upper wall 131, lower wall 132, left side wall
133, right side wall 134, front side wall 135 and rear wall 136.
It, can be by left side wall 133, right side wall 134, front side wall 135 and rear wall for the ease of taking photoresist sample 300
At least one of 136 are configured to open or close.Further, it is configured to the side wall turned on or off,
It can integrally be configured to turn on or off, and can also partially be configured to turn on or off.In this implementation
In example, the right half 134A of right side wall 134 is configured to turn on or off, wherein the right half 134A of right side wall 134
Width need the thickness of slightly larger than photoresist sample 300, sample box 130 can be freed in and out convenient for photoresist sample 300.
In addition, making the photoresist of photoresist sample 300 towards front side wall when photoresist sample 300 is placed in sample box 130
130。
With continued reference to Fig. 1, air inlet pipe 140 is penetrated in operation seat stand 110 (it can refer to shown in Fig. 5) as outside, and by grasping
The top surface 110A for making seat stand 110 is pierced by, to penetrate in accommodating cavity 120.It is penetrated in accommodating cavity 120 in air inlet pipe 140
Later, air inlet pipe 140 is fastened on the top surface 110A of operation seat stand 110 using nut 181.It should be noted that into
The position that tracheae 140 is worn is provided with corresponding interface, in order to air inlet pipe 140 connection or run through.
Referring to Fig. 3, the lower wall 132 that air inlet pipe 140 in accommodating cavity 120 is connected to sample box 130 is penetrated, thus and sample
Connection in box 130.After air inlet pipe 140 is connected to the lower wall 132 of sample box 130 in penetrating accommodating cavity 120, using spiral shell
Mother 182 fastens air inlet pipe 140 on the outer surface of lower wall 132.
Referring to Fig. 4, adsorption tube 160 is connected on the upper wall 131 of sample box 130, thus with being connected in sample box 130.?
After adsorption tube 160 is connected on the upper wall 131 of sample box 130, fastened on the outer surface of upper wall 131 using nut 184
Air inlet pipe 140.It should be noted that corresponding interface is provided with, in order to adsorption tube in the position that adsorption tube 160 is worn
160 connection runs through.
With continued reference to Fig. 1 and Fig. 2, the adsorption tube 160 on the upper wall 131 of sample box 130 is connected to by accommodating cavity 120
Roof 125 is pierced by, wherein collects sliver 300A by the adsorption tube 160 that the roof 125 of accommodating cavity 120 is pierced by.In adsorption tube
After 160 are pierced by by the roof 125 of accommodating cavity 120, using nut 183 on the outer surface of roof 125 to adsorption tube 160 into
Row fastening.
In addition, after the sample box 130 for being placed with photoresist sample 300 is installed in accommodating cavity 120, sample box 130
Inner surface of the front side wall 135 towards side wall 121, to make ultraviolet lamp tube 150 towards photoresist sample 300.
Further, in order to sense accommodating cavity 120 in temperature, the photoresist atomization process of embodiment according to the present invention
Equipment 100 further includes hygrosensor 170, which is set in accommodating cavity 120, to detect accommodating cavity
Temperature in 120, to enable temperature control system to adjust the temperature in accommodating cavity 120 in time, to guarantee to hold
Set the operating temperature that the temperature in cavity 120 is maintained at setting.It should be understood that hygrosensor 170 can be removed.
Manipulating seat stand 110 includes: total gas pressure dial gauge 111, is used to indicate the pressure of inert gas source (200 in Fig. 5)；
Power switch 112, for controlling opening or closing for power supply；Control keyboard 113, for setting operating temperature, photoresist sample 300
Processing the time and sample box 130 in gas flow；Temperature control system (not shown), for that will accommodate in cavity 120
Temperature remain to the operating temperature of setting；LCD display 114, for showing the setup parameter in the course of work；It starts switch
115, it is started or stopped for controlling to what the photoresist sample 300 in sample box 130 was handled.
Fig. 5 is the schematic diagram of the photoresist atomization process system of embodiment according to the present invention.
Referring to Fig. 5, the photoresist atomization process system of embodiment according to the present invention includes: that above-mentioned photoresist atomization process is set
Standby 100 and inert gas source 200；Wherein, the air inlet pipe 140 of photoresist atomizing treatment equipment 100 is connected to inert gas source
200, so that the inert gas (such as nitrogen) in inert gas source 200 is transported in sample box 130.
Photoresist sample will be carried out at atomization to using the photoresist atomization process system of embodiment according to the present invention below
The process of reason is illustrated.
Firstly, photoresist sample 300 is placed in sample box 130.Here, photoresist sample 300 is to pass through on the glass substrate
Coating-drying-prebake conditions obtain the full membrane sample of photoresist.
Then, side wall 121 is opened, the sample box 130 for being placed with photoresist sample 300 is installed in accommodating cavity 120, is made
Sample box 130 is connected to air inlet pipe 140 and adsorption tube 160 respectively, and makes photoresist sample 300 towards ultraviolet lamp tube 150.
Then, side wall 121 is closed.
Then, inert gas source 200 is opened, and turns on the power switch 112.
Then, the gas flow of operating temperature, 130 flow path of sample processing time and sample box is set according to actual needs.
Setting method: F key is function key, often by once switching between temperature, time and each sample box flow flow；C is to remove
Key can delete parameter current；S is to save key, can be reserved for the method parameter of setting so that experiment next time continues to use.
Then, it after parameter setting finishes, presses and starts switch 115, ultraviolet lamp tube 150, air-flow and temperature start at this time
Work starts to carry out sample treatment, and light initiator sliver 300A etc. in photoresist sample 300 can be received by the substance that air-flow is taken out of
Collection is in adsorption tube 160.
Finally, photoresist atomization process system is automatically stopped, ultraviolet lamp tube 150, air-flow after being finished according to set time
It stops working with temperature, and buzzing prompts, closes inert gas source 200 and power switch 112.
Later, the sliver 300A in adsorption tube 160 is taken out, is joined with thermal desorption-gas chromatograph or thermal desorption-makings
The analysis of light initiator sliver 300A is carried out with instrument, it is smaller with the atomization performance of the size characterization photoresist sample 300 of its content
Illustrate to be less susceptible to that exposure light shield is caused to be atomized.
In conclusion according to an embodiment of the invention, providing at a kind of photoresist atomizing treatment equipment and photoresist atomization
Reason system can carry out atomization process to photoresist, consequently facilitating the assessment of the atomization performance of photoresist, excellent to filter out
Matter photoresist is reduced because losing caused by photoresist.
Although the present invention has shown and described referring to specific embodiment, it should be appreciated by those skilled in the art that:
In the case where not departing from the spirit and scope of the present invention being defined by the claims and their equivalents, can carry out herein form and
Various change in details.
Claims (10)
1. a kind of photoresist atomizing treatment equipment characterized by comprising operation seat stand, accommodating cavity, sample box, air inlet pipe, purple
Outer fluorescent tube and adsorption tube；
The accommodating cavity is set on the operation seat stand；The sample box is set in the accommodating cavity, the sample
Box is for placing photoresist sample；The air inlet pipe is penetrated in the accommodating cavity by the operation seat stand, and the air inlet pipe with
The sample box connection, the air inlet pipe is for inert gas to be passed through in the sample box；The ultraviolet lamp tube is set to institute
On the inner surface for stating accommodating cavity, the ultraviolet lamp tube is used to carry out ultraviolet light to the photoresist sample being placed in the sample box
Exposure；The adsorption tube is connected to the sample box, and the adsorption tube is pierced by the accommodating cavity, and the adsorption tube is for receiving
Collect the sliver of the photoresist sample after ultraviolet photoetching blown out by the inert gas.
2. photoresist atomizing treatment equipment according to claim 1, which is characterized in that the accommodating cavity includes four side walls
And a roof, four side walls are oppositely arranged two-by-two, the roof is enclosed in the side of four side walls, the behaviour
The other side of four side walls is enclosed in as seat stand, so that the top surface of the operation seat stand is towards the roof.
3. photoresist atomizing treatment equipment according to claim 2, which is characterized in that at least one of described four side walls
It is configured to open or close.
4. photoresist atomizing treatment equipment according to claim 3, which is characterized in that the ultraviolet lamp tube is set to the energy
On the inner surface of the side wall enough opened or closed.
5. photoresist atomizing treatment equipment according to claim 2, which is characterized in that the air inlet pipe is penetrated described by outside
It operates in seat stand, and is pierced by by the top surface of the operation seat stand, to penetrate in the accommodating cavity；The adsorption tube is by institute
The roof for stating accommodating cavity is pierced by；
After the air inlet pipe is pierced by by the top surface of the operation seat stand, using nut in the top surface for operating seat stand
On the air inlet pipe is fastened；After the adsorption tube is pierced by by the roof of the accommodating cavity, using nut in institute
It states and the adsorption tube is fastened on the outer surface of roof.
6. photoresist atomizing treatment equipment according to claim 1, which is characterized in that the sample box is in cuboid, institute
Stating sample box includes: upper wall, lower wall, left side wall, right side wall, front side wall and rear wall, the air inlet pipe be connected to it is described under
Wall, the adsorption tube are connected to the upper wall；
After the air inlet pipe is connected to the lower wall, the air inlet is fastened on the outer surface of the lower wall using nut
Pipe；After the adsorption tube is connected to the upper wall, the adsorption tube is fastened on the outer surface of the upper wall using nut.
7. photoresist atomizing treatment equipment according to claim 6, which is characterized in that described left side wall or part thereof and/or
Described right side wall or part thereof is configured to open or close.
8. photoresist atomizing treatment equipment according to claim 1, which is characterized in that the photoresist atomizing treatment equipment also wraps
Hygrosensor is included, the hygrosensor is set in the accommodating cavity, to detect the temperature in the accommodating cavity.
9. photoresist atomizing treatment equipment according to claim 8, which is characterized in that the operation seat stand includes:
Total gas pressure dial gauge is used to indicate the pressure of inert gas source；
Power switch, for controlling opening or closing for power supply；
Control keyboard, for setting the gas flow in operating temperature, photoresist sample processing time and the sample box；
Temperature control system, for the temperature in the accommodating cavity to be remained to the operating temperature；
Display screen, for showing the setup parameter in the course of work；
It starts switch, is started or stopped for controlling to what the photoresist sample in the sample box was handled.
10. a kind of photoresist atomization process system, which is characterized in that including any one of inert gas source and claim 1 to 9 institute
The air inlet pipe of the photoresist atomizing treatment equipment stated, the photoresist atomizing treatment equipment is connected to the inert gas source.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610889971.5A CN106483219B (en) | 2016-10-11 | 2016-10-11 | Photoresist atomizing treatment equipment and photoresist atomization process system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610889971.5A CN106483219B (en) | 2016-10-11 | 2016-10-11 | Photoresist atomizing treatment equipment and photoresist atomization process system |
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| Publication Number | Publication Date |
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| CN106483219A CN106483219A (en) | 2017-03-08 |
| CN106483219B true CN106483219B (en) | 2019-09-17 |
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| CN101173953A (en) * | 2006-09-30 | 2008-05-07 | 亚申科技研发中心（上海）有限公司 | System and method for sampling tests |
| CN101540272A (en) * | 2009-04-24 | 2009-09-23 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Plasma cleaning method for removing byproduct in chamber and plasma processing system |
| CN102189617A (en) * | 2010-03-03 | 2011-09-21 | 鸿富锦精密工业（深圳）有限公司 | Surface activation treatment device |
| CN105116570A (en) * | 2015-09-15 | 2015-12-02 | 武汉华星光电技术有限公司 | Glass substrate baking device |
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|---|---|---|---|---|
| TWM320179U (en) * | 2006-06-09 | 2007-10-01 | Gudeng Prec Industral Co Ltd | Gas filling equipment and filling chamber therein for photomask conveying box |
| US9897620B2 (en) * | 2015-01-16 | 2018-02-20 | Htc Corporation | Gas detection device and gas inlet module thereof |
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101173953A (en) * | 2006-09-30 | 2008-05-07 | 亚申科技研发中心（上海）有限公司 | System and method for sampling tests |
| CN101540272A (en) * | 2009-04-24 | 2009-09-23 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Plasma cleaning method for removing byproduct in chamber and plasma processing system |
| CN102189617A (en) * | 2010-03-03 | 2011-09-21 | 鸿富锦精密工业（深圳）有限公司 | Surface activation treatment device |
| CN105116570A (en) * | 2015-09-15 | 2015-12-02 | 武汉华星光电技术有限公司 | Glass substrate baking device |
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Address after: 9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province Patentee after: TCL Huaxing Photoelectric Technology Co.,Ltd. Address before: 9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province Patentee before: Shenzhen China Star Optoelectronics Technology Co.,Ltd. |