CN106482839B - Striking cable-styled dual wavelength interference testing device and its synthetic wavelength phase extraction method - Google Patents
Striking cable-styled dual wavelength interference testing device and its synthetic wavelength phase extraction method Download PDFInfo
- Publication number
- CN106482839B CN106482839B CN201510522812.7A CN201510522812A CN106482839B CN 106482839 B CN106482839 B CN 106482839B CN 201510522812 A CN201510522812 A CN 201510522812A CN 106482839 B CN106482839 B CN 106482839B
- Authority
- CN
- China
- Prior art keywords
- wavelength
- phase
- optical axis
- mirror
- spectroscope
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Abstract
The invention discloses a kind of striking cable-styled dual wavelength interference testing device and its synthetic wavelength phase extraction methods.Two kinds of wavelength realize the acquisition of Single wavelength phase-shift interference by using dichroscope when working at the same time, while only needing to carry out the work under achromat-design two kinds of wavelength of realization for part optical path.Secondly, under traditional dual wavelength phase shift interference testing device is using different wave length caused by PZT phase shift aiming at the problem that Phase-shifting Errors, by the way of synthetic wavelength combination Single wavelength Phase Processing, influence of the Phase-shifting Errors to synthesis wavelength phases under different wave length is inhibited, phase shift stepping-in amount under two kinds of wavelength is avoided to be demarcated.This method is equally effective to the vibration under different wave length, multiple-beam interference equal error.Due to only needing to control the measuring accuracy under single wavelength, this method is quick and easy to the extraction process of synthesis wavelength phases data.
Description
Technical field
The invention belongs to field of optical measuring technologies, especially a kind of striking cable-styled dual wavelength interference testing device and its synthesis
Wavelength phases extracting method.
Background technique
Optical interference measuring technology is because having many advantages, such as high-precision, quick, contactless nondestructive measurement, thus in optics member
Part face shape, Performance of Optical System and optical material characteristic etc., which detect, has unrivaled superiority in application aspect, and light
The development of the technologies such as mechanical, electrical son, computer then further improves the precision and the degree of automation of optical interference test.However,
Traditional Single wavelength phase shift interference testing constrains it in big depth or big gradient because measurement range is limited by operation wavelength
Application in terms of surface testing.To solve 2 π phase fuzzy problems when Single wavelength test, dual wavelength interference testing technology is able to
It proposes.Dual wavelength interference detection is detected with the light source of two or more wavelength, by extensive using dual wavelength phase
The phase difference of both multiple algorithm comparisons obtains longer wavelengths of synthetic wavelength phase, and synthetic wavelength is much larger than Detection wavelength.
Dual wavelength phase shift interference testing device has obtained continuous development and improvement, mainly have by phase shift system PZT phase shift,
Wavelength phase shift, grating phase shift etc., wherein the two-wavelength-interferometer of PZT phase shift is more universal and mature.The double wave of PZT phase shift system
Long interferometer has the Phase-shifting Errors under different wave length, and Harry in 2006 breathes out blue (Hariharan) in " Two- thus
wavelength interferometric profilometry with a phase-step error-compensating
Algorithm " (Optical Engineering, 45 (11): 115602-1~3,2006) propose the conjunction based on high-order phase shift
At wavelength phases extraction algorithm, reduce Phase-shifting Errors by using high-order Phase-shifting Errors backoff algorithm for the shadow of measurement accuracy
It rings, but only compensates for the PZT calibrated error under different wave length to a certain extent, can not preferably inhibit the shifting of different wave length
Phase error.In addition, dual wavelength phase shift interference testing device is divided by the working condition of two kinds of wavelength, dual wavelength is synchronous to be done with asynchronous
Relate to test mode.The asynchronous interference testing of dual wavelength needs two kinds of wavelength successively to work respectively, can not achieve rapid survey.Dual wavelength
Synchronous interference testing solves synthetic wavelength phase by the superimposed Moire fringe of two kinds of wavelength-interferometric figures of processing, but it is because direct
Obtaining synthetic wavelength phase, thus precision is not high.It peeps within 2015 and puts down in " Principal component analysis
based simultaneous dual-wavelength phase-shifting interferometry》(Optics
Communications, 341:276-283,2015) it proposes to extract respectively from Moire fringe using the method for principal component analysis
Single wavelength phase out, but it needs to be modulated the light intensity under different wave length, and needs phase shift stepping-in amount in one cycle
It is uniformly distributed.
Summary of the invention
The purpose of the present invention is to provide a kind of striking cable-styled dual wavelength interference testing device and its synthetic wavelength phase extractions
Method solves the problems, such as the Phase-shifting Errors under different wave length.
The technical solution for realizing the aim of the invention is as follows: a kind of striking cable-styled dual wavelength interference testing device, including work
Wavelength is λ1First laser device, operation wavelength λ2Second laser, reflecting mirror, the first spectroscope, beam expanding lens, second point
Light microscopic, collimation object microscope group, reference planes mirror, PZT phase shifter, plane mirror to be measured, aperture, dichroscope, the first imaging are saturating
Microscope group, the first ccd detector, the second imaging lens group and the second ccd detector, wherein λ1<λ2；Common optical axis sets gradually work
Wavelength is λ1First laser device and reflecting mirror, optical axis locating for above-mentioned component be primary optic axis；Common optical axis sets gradually work
Wavelength is λ2Second laser, the first spectroscope, beam expanding lens, the second spectroscope, collimation object microscope group, reference planes mirror and to be measured
Plane mirror, optical axis locating for above-mentioned component are the second optical axis, and the second optical axis is parallel with primary optic axis；Reflecting mirror and the first spectroscope
Common optical axis, and the optical axis is respectively perpendicular to primary optic axis and the second optical axis；Common optical axis sets gradually the second spectroscope, aperture light
Door screen, cutoff wavelength λ3Dichroscope, the second imaging lens group and the second ccd detector, optical axis locating for above-mentioned component is
Third optical axis, third optical axis are vertical with the second optical axis；Common optical axis sets gradually dichroscope, the first imaging lens group, the first CCD
Detector；Reference planes mirror is arranged on PZT phase shifter, and optical axis locating for above-mentioned component is the 4th optical axis, the 4th optical axis and the
Three optical axises are vertical；All optical elements are coaxially contour relative to substrate；First laser device and second laser emit laser simultaneously,
It is λ by operation wavelength1First laser device issue wavelength be λ1Laser through reflecting mirror, the first spectroscope is reflexed to, through first
Spectroscope reflexes to beam expanding lens, becomes divergent beams after beam expanding lens expands, through after the second spectroscope after collimation object microscope group
Become the heavy caliber collimated light beam of collimation, which is successively incident to reference planes mirror and plane mirror to be measured, forms wave
A length of λ1Interference testing optical path；It is λ by operation wavelength2Laser issue wavelength be λ2The first spectroscope of laser light
It is incident to beam expanding lens, becomes divergent beams after beam expanding lens expands, through becoming quasi- after the second spectroscope after collimation object microscope group
Straight heavy caliber collimated light beam, the collimated light beam are successively incident to reference planes mirror and plane mirror to be measured, and foring wavelength is λ2
Interference testing optical path；The light wave of reference planes mirror and plane mirror to be measured is incident in reference planes mirror rear surface and plane to be measured
It is reflected between mirror front surface, obtains reference planes mirror rear surface and flat mirror type information to be measured, carry table after reference planes mirror
The wavelength of face and flat mirror type information to be measured is respectively λ1And λ2Light wave through reference planes mirror, through quilt after collimation object microscope group
The reflection of second spectroscope focuses to aperture, and by being incident to dichroscope after aperture, two are divided into after dichroscope
Beam, a branch of wavelength are λ1Reflected light, another beam is that wavelength is λ2Transmitted light, wavelength λ1Reflected light it is saturating through the first imaging
After microscope group, by the first ccd detector, acquisition obtains wavelength X1Corresponding interference image；Wavelength is λ2Transmitted light through second imaging
It after lens group, is acquired by the second ccd detector, obtains wavelength X2Corresponding interference image.
Second spectroscope and third optical axis angle counterclockwise are 135 ° ± 1 °；Dichroscope and third optical axis are counterclockwise
Angle is 45 ° ± 1 °.
A kind of synthetic wavelength phase extraction method based on striking cable-styled dual wavelength interference testing device, steps are as follows:
Step 1: striking cable-styled dual wavelength interference testing device is built:
Step 2: when plane mirror to be measured using above-mentioned striking cable-styled dual wavelength interference testing device to test, PZT phase shift is controlled
Device, according to λ1Pi/2 be that phase shift carries out phase shift, synchronous realize interferes detection to the dual wavelength of plane mirror to be measured；
Step 2: being λ according to collected wavelength1Phase-shift interference, solve λ1Briquetting phaseAccording to collecting
Wavelength be λ2Phase-shift interference, solve λ2Briquetting phaseThe λ2Briquetting phase contain Phase-shifting Errors；
Step 3: according to dual wavelength test philosophy, to the briquetting phase difference under two kinds of wavelength, available it includes shiftings
The synthetic wavelength phase of phase error isAnd the phase recovery error of synthetic wavelength is λ2The phase of phase
Restoration errors
Step 4: to the synthetic wavelength phase comprising Phase-shifting ErrorsPhase unwrapping is carried out, it is obtained and unpacks phaseIt includes phase recovery error be still
Step 5: according to the consistency of reference planes mirror and plane mirror to be measured optical path difference at different wavelengths, i.e. composite wave
Long the characteristics of being overlapped with single-wavelength light path difference data, utilize the unpacking phase of the synthetic wavelength phase comprising Phase-shifting Errors
In conjunction with the wavelength X for being free of phase displacement error1Briquetting phaseIt is unpacked, the phase value Φ after being correctedcorrect:
Wherein round is floor operation.
In step 1, PZT phase shifter is according to λ2Pi/2 be that phase shift carries out phase shift, done in the step of thereafter corresponding
Replacement.
Compared with the prior art, the advantages of the present invention are as follows: (1) it with traditional dual wavelength interference device compared with only needs expand
Collimated light path carries out the achromat-design of two kinds of wavelength, and imaging optical path part only needs to carry out Single wavelength design；(2) for tradition
Dual wavelength phase shift interference testing device uses the problem of Phase-shifting Errors under different wave length caused by PZT phase shift, using composite wave
The long mode for combining Single wavelength Phase Processing, it is suppressed that influence of the Phase-shifting Errors to synthesis wavelength phases under different wave length；(3) needle
To the vibration under different wave length, multiple-beam interference equal error, only it need to ensure the test under wherein a certain wavelength using respective algorithms
Synthetic wavelength phase accuracy equally can be improved in precision；(4) it due to only needing to control the measuring accuracy under single wavelength, closes
Extraction process at wavelength phases data is quick and easy.
Detailed description of the invention
Fig. 1 is striking cable-styled dual wavelength interference testing schematic device.
Fig. 2 is the synthetic wavelength phase extraction method flow chart based on striking cable-styled dual wavelength interference testing device.
Fig. 3 is to solve to obtain synthetic wavelength phase using invented method in the embodiment of the present invention 1.
Fig. 4 is to solve to obtain synthetic wavelength phase using invented method in the embodiment of the present invention 2.
Fig. 5 is to solve to obtain synthetic wavelength phase using conventional method in the embodiment of the present invention.
Specific embodiment
Present invention is further described in detail with reference to the accompanying drawing.
In conjunction with Fig. 1, a kind of striking cable-styled dual wavelength interference testing device, including operation wavelength are λ1First laser device 1, work
Making wavelength is λ2Second laser 2, reflecting mirror 3, the first spectroscope 4, beam expanding lens 5, the second spectroscope 6, collimation object microscope group 7,
Reference planes mirror 8, PZT phase shifter 9, plane mirror to be measured 10, aperture 11, dichroscope 12, the first imaging lens group 13,
One ccd detector 14, the second imaging lens group 15 and the second ccd detector 16, wherein λ1<λ2；Common optical axis sets gradually operating wave
A length of λ1First laser device 1 and reflecting mirror 3, optical axis locating for above-mentioned component be primary optic axis；Common optical axis sets gradually work
Wavelength is λ2Second laser 2, the first spectroscope 4, beam expanding lens 5, the second spectroscope 6, collimation object microscope group 7, reference planes mirror 8
With plane mirror 10 to be measured, optical axis locating for above-mentioned component is the second optical axis, and the second optical axis is parallel with primary optic axis；3 He of reflecting mirror
First spectroscope, 4 common optical axis, and the optical axis is respectively perpendicular to primary optic axis and the second optical axis；Common optical axis sets gradually second point
Light microscopic 6, aperture 11, cutoff wavelength λ3Dichroscope 12, the second imaging lens group 15 and the second ccd detector 16,
Optical axis locating for above-mentioned component is third optical axis, and third optical axis is vertical with the second optical axis；Common optical axis set gradually dichroscope 12,
First imaging lens group 13, the first ccd detector 14；Reference planes mirror 8 is arranged on PZT phase shifter 9, locating for above-mentioned component
Optical axis is the 4th optical axis, and the 4th optical axis is vertical with third optical axis；All optical elements are coaxially contour relative to substrate；First laser
Device 1 and second laser 2 emit laser simultaneously, are λ by operation wavelength1First laser device 1 issue wavelength be λ1Laser warp
Reflecting mirror 3 reflexes to the first spectroscope 4, reflexes to beam expanding lens 5 through the first spectroscope 4, becomes to dissipate after beam expanding lens 5 expands
Light beam, through the heavy caliber collimated light beam for becoming collimation after the second spectroscope 6 after collimation object microscope group 7, the collimated light beam is successively
It is incident to reference planes mirror 8 and plane mirror to be measured 10, foring wavelength is λ1Interference testing optical path；It is λ by operation wavelength2's
The wavelength that laser 2 issues is λ2The first spectroscope of laser light 4 be incident to beam expanding lens 5, become to send out after beam expanding lens 5 expands
Spreading beam, through become after collimation object microscope group 7 after the second spectroscope 6 collimation heavy caliber collimated light beam, the collimated light beam according to
Secondary to be incident to reference planes mirror 8 and plane mirror to be measured 10, foring wavelength is λ2Interference testing optical path；It is incident to reference planes
The light wave of mirror 8 and plane mirror to be measured 10 reflects between 8 rear surface of reference planes mirror and 10 front surface of plane mirror to be measured, is joined
10 face type information of 8 rear surface of plane mirror and plane mirror to be measured is examined, 8 rear surface of reference planes mirror and 10 face type of plane mirror to be measured are carried
The wavelength of information is respectively λ1And λ2Light wave through reference planes mirror 8, it is poly- through being reflected after collimation object microscope group 7 by the second spectroscope 6
Coke is divided into two bundles, Yi Shubo to aperture 11 by being incident to dichroscope 12 after aperture 11 after dichroscope 12
A length of λ1Reflected light, another beam is that wavelength is λ2Transmitted light, wavelength λ1Reflected light after the first imaging lens group 13,
By the first ccd detector 14, acquisition obtains wavelength X1Corresponding interference image；Wavelength is λ2Transmitted light through the second imaging len
It after group 15, is acquired by the second ccd detector 16, obtains wavelength X2Corresponding interference image.Wherein, the second spectroscope 6 and third
Optical axis is counterclockwise, and angle is 135 ° ± 1 °；Dichroscope 12 and third optical axis angle counterclockwise are 45 ° ± 1 °.
In conjunction with Fig. 2, a kind of synthetic wavelength phase extraction method based on striking cable-styled dual wavelength interference testing device, step is such as
Under:
Step 1: striking cable-styled dual wavelength interference testing device is built:
Step 2: when plane mirror 10 to be measured using above-mentioned striking cable-styled dual wavelength interference testing device to test, PZT phase shift is controlled
Device 9, according to λ1Pi/2 be that phase shift carries out phase shift, synchronous realize interferes detection to the dual wavelength of plane mirror 10 to be measured；By
In device according to λ1Pi/2 phase shift stepping-in amount carry out phase shift, therefore λ2Phase-shift interference sequence include Phase-shifting Errors, and by
In the otherness of wavelength, first-order linear Phase-shifting Errors are greater than high-order Phase-shifting Errors, i.e., Phase-shifting Errors can be approximately wherein ε1For linearity error coefficient,
Step 2: being λ according to collected wavelength1Phase-shift interference, solve λ1Briquetting phaseAccording to collecting
Wavelength be λ2Phase-shift interference, solve λ2Briquetting phaseThe λ2Briquetting phase contain Phase-shifting Errors, according to shifting
Influence of the phase error to phase recovery normally behaves as twice of cycle sinusoidal functional form of phase to be measured, then wavelength X2Phase
Restoration errors are as follows:
Wherein,For wavelength X2The phase recovery error of phase,For wavelength X2Notional phase.
Step 3: according to dual wavelength test philosophy, to the briquetting phase difference under two kinds of wavelength, available it includes shiftings
The synthetic wavelength phase of phase error isAccording to above formula, wavelength X2The phase recovery error of phase
Synthetic wavelength phase can be unfolded as theoretical synthetic wavelength phaseWith λ2The phase recovery error of phaseThe sum of.
Therefore the phase recovery error of synthetic wavelength is λ2The phase recovery error of phase
Step 4: to the synthetic wavelength phase comprising Phase-shifting ErrorsPhase unwrapping is carried out, it is obtained and unpacks phaseIt includes phase recovery error be still
Step 5: it according to the consistency of reference planes mirror 8 and plane mirror 10 to be measured optical path difference at different wavelengths, that is, synthesizes
The characteristics of wavelength is overlapped with single-wavelength light path difference data utilizes the unpacking phase of the synthetic wavelength phase comprising Phase-shifting ErrorsIn conjunction with the wavelength X for being free of phase displacement error1Briquetting phaseIt is unpacked, the phase value Φ after being correctedcorrect:
Wherein round is floor operation.The synthetic wavelength phase value comprising phase recovery error in above formulaIt carries out
It is available after expansion:
In above formulaFor theoretically correct synthetic wavelength phase, thus it is rightIt is taken
As a result integer when whole operation.And by wavelength X2Phase recovery error substitute into phase recovery error component in above formula, and take
It is obtained after whole:
The Phase-shifting Errors linear coefficient ε in above formula is unfolded1With synthetic wavelength λsIt is available:
In above formulaObvious < 1, i.e. wavelength X2Phase recovery error will not change composite wave
Long phase data integer part, can effectively eliminate Phase-shifting Errors.
In the step 1, PZT phase shifter is according to λ2Pi/2 be phase shift carry out phase shift, done in the step of thereafter
Corresponding replacement.
Embodiment 1:
A kind of striking cable-styled dual wavelength interference testing device, uses operation wavelength for λ1The He-Ne laser of=632.8nm and
Operation wavelength is λ2For the semiconductor laser of=532nm as light source, synthetic wavelength can achieve 3.339 μm；Two in device
To Look mirror bore 25.4mm, it is greater than 98% in 350-585nm wave band reflectivity, is greater than 90% in 600-850nm wave band transmitance,
Therefore λ is penetrated1The feux rouges of=632.8nm reflects λ simultaneously2The green light of=532nm, CCD are all made of the digital CCD of JAI company, as
Plain size 1392*1020, service band cover near-infrared visible light wave range.Utilize striking cable-styled dual wavelength interference testing device to test
When, synthetic wavelength phase extraction method step are as follows:
Step 1: when using building striking cable-styled dual wavelength interference testing device to test plane mirror to be measured, control interference survey
Trial assembly set in PZT phase shifter voltage output, realize according to the pi/2 under 632.8nm wavelength be phase shift carry out phase shift, benefit
Collect the phase-shift interference under one group of 632.8nm and 532nm respectively with ccd detector；
Step 2: it is solved to obtain the pressure under 632.8nm wavelength according to the phase-shift interference of the one group of 632.8nm collected
Packet phaseInclude the 532nm phase-shift interference of Phase-shifting Errors according to one group, solves the briquetting phase under 532nm wavelengthThe phase recovery error of wavelength 532nm is
Step 3: according to dual wavelength test philosophy, to the briquetting phase difference under two kinds of wavelength, available it includes shiftings
The synthetic wavelength briquetting phase of phase error
Step 4: to the synthetic wavelength phase comprising Phase-shifting ErrorsPhase unwrapping is carried out to operate to obtain its unpacking phaseIt includes phase recovery error be still
Step 5: the characteristics of being overlapped using synthetic wavelength with single-wavelength light path difference data, using including phase recovery error
Synthetic wavelength phase valueIt is unpacked and is corrected in conjunction with briquetting phase value under the 632.8nm wavelength without phase displacement error
Phase value afterwardsAs shown in Figure 3.
Embodiment 2:
When cable-styled dual wavelength interference testing device to test striking using one of embodiment 1, synthetic wavelength phase extraction
Method and step are as follows:
Step 1: when using building striking cable-styled dual wavelength interference testing device to test plane mirror to be measured, control interference survey
Trial assembly set in PZT phase shifter voltage output, realize according to the pi/2 under 532nm wavelength be phase shift carry out phase shift, utilize
Ccd detector collects the phase-shift interference under one group of 632.8nm and 532nm respectively；
Step 2: solve to obtain the briquetting phase under 532nm wavelength according to the phase-shift interference of the one group of 532nm collected
PositionInclude the 632.8nm phase-shift interference of Phase-shifting Errors according to one group, solves the briquetting phase under 632.8nm wavelength
The phase recovery error of wavelength 632.8nm is
Step 3: according to dual wavelength test philosophy, to the briquetting phase difference under two kinds of wavelength, available it includes shiftings
The synthetic wavelength briquetting phase of phase error
Step 4: to the synthetic wavelength phase of briquettingPhase unwrapping is carried out to operate to obtain its unpacking phaseIts
The phase recovery error for including still is
Step 5: the characteristics of being overlapped using synthetic wavelength with single-wavelength light path difference data, using including phase recovery error
Synthetic wavelength phase valueIt is unpacked after obtaining correction in conjunction with briquetting phase value under the 532nm wavelength without phase displacement error
Phase valueAs shown in Figure 4.
Fig. 5 is direct solution to synthetic wavelength phase distribution, and comparison diagram 3, Fig. 4 and Fig. 5 are it can be found that embodiment 1
It is similar with synthetic wavelength phase in embodiment 2, and it is superior to the synthetic wavelength phase of direct solution.
The advantages of synthetic wavelength phase extraction method based on striking cable-styled dual wavelength interference testing device of the invention, is:
(1) beam-expanding collimation optical path is only needed to carry out the achromat-design of two kinds of wavelength, imaging compared with traditional dual wavelength interference device
Road part only needs to carry out Single wavelength design；(2) caused for traditional dual wavelength phase shift interference testing device using PZT phase shift
Different wave length under Phase-shifting Errors the problem of, by the way of synthetic wavelength combination Single wavelength Phase Processing, it is suppressed that different waves
Long lower influence of the Phase-shifting Errors to synthesis wavelength phases；(3) for the vibration under different wave length, multiple-beam interference equal error, only
It need to ensure the measuring accuracy under wherein a certain wavelength using respective algorithms, synthetic wavelength phase accuracy equally can be improved；(4) by
In only needing to control the measuring accuracy under single wavelength, therefore the extraction process of synthetic wavelength phase data is quick and easy.
Claims (4)
1. a kind of synthetic wavelength phase extraction method based on striking cable-styled dual wavelength interference testing device, which is characterized in that step
It is as follows:
Step 1: striking cable-styled dual wavelength interference testing device is built:
Step 2: when using above-mentioned striking cable-styled dual wavelength interference testing device to test plane mirror to be measured (10), PZT phase shifter is controlled
(9), according to λ1Pi/2 be that phase shift carries out phase shift, synchronous realize interferes detection to the dual wavelength of plane mirror to be measured (10)；
Step 2: being λ according to collected wavelength1Phase-shift interference, solve λ1Briquetting phaseAccording to collected wave
A length of λ2Phase-shift interference, solve λ2Briquetting phaseThe λ2Briquetting phase contain Phase-shifting Errors；
Step 3: according to dual wavelength test philosophy, to the briquetting phase difference under two kinds of wavelength, available it includes phase shift mistakes
Difference synthetic wavelength phase beAnd the phase recovery error of synthetic wavelength is λ2The phase recovery of phase
Error
Step 4: to the synthetic wavelength phase comprising Phase-shifting ErrorsPhase unwrapping is carried out, it is obtained and unpacks phaseIts
The phase recovery error for including still is
Step 5: it according to the consistency of reference planes mirror (8) and plane mirror to be measured (10) optical path difference at different wavelengths, that is, synthesizes
The characteristics of wavelength is overlapped with single-wavelength light path difference data utilizes the unpacking phase of the synthetic wavelength phase comprising Phase-shifting ErrorsIn conjunction with the wavelength X for being free of phase displacement error1Briquetting phaseIt is unpacked, the phase value Φ after being correctedcorrect:
Wherein round is floor operation.
2. the synthetic wavelength phase extraction method according to claim 1 based on striking cable-styled dual wavelength interference testing device,
It is characterized by: PZT phase shifter is according to λ in step 22Pi/2 be phase shift carry out phase shift, do phase in the step of thereafter
The replacement answered.
3. the synthetic wavelength phase extraction method according to claim 1 based on striking cable-styled dual wavelength interference testing device,
It is characterized by: it is λ that the striking cable-styled dual wavelength interference testing device, which includes operation wavelength,1First laser device (1), operating wave
A length of λ2Second laser (2), reflecting mirror (3), the first spectroscope (4), beam expanding lens (5), the second spectroscope (6), collimation object
Microscope group (7), reference planes mirror (8), PZT phase shifter (9), plane mirror to be measured (10), aperture (11), dichroscope (12),
First imaging lens group (13), the first ccd detector (14), the second imaging lens group (15) and the second ccd detector (16),
Middle λ1<λ2；It is λ that common optical axis, which sets gradually operation wavelength,1First laser device (1) and reflecting mirror (3), light locating for above-mentioned component
Axis is primary optic axis；It is λ that common optical axis, which sets gradually operation wavelength,2Second laser (2), the first spectroscope (4), beam expanding lens
(5), the second spectroscope (6), collimation object microscope group (7), reference planes mirror (8) and plane mirror to be measured (10), locating for above-mentioned component
Optical axis is the second optical axis, and the second optical axis is parallel with primary optic axis；Reflecting mirror (3) and the first spectroscope (4) common optical axis, and the light
Axis is respectively perpendicular to primary optic axis and the second optical axis；Common optical axis sets gradually the second spectroscope (6), aperture (11), cut-off
Wavelength is λ3Dichroscope (12), the second imaging lens group (15) and the second ccd detector (16), light locating for above-mentioned component
Axis is third optical axis, and third optical axis is vertical with the second optical axis；Common optical axis sets gradually dichroscope (12), the first imaging lens group
(13), the first ccd detector (14)；Reference planes mirror (8) is arranged on PZT phase shifter (9), and optical axis locating for above-mentioned component is
4th optical axis, the 4th optical axis are vertical with third optical axis；All optical elements are coaxially contour relative to substrate；First laser device (1)
Emit laser simultaneously with second laser (2), is λ by operation wavelength1First laser device (1) issue wavelength be λ1Laser
Through reflecting mirror (3), the first spectroscope (4) are reflexed to, reflex to beam expanding lens (5) through the first spectroscope (4), are expanded through beam expanding lens (5)
Become divergent beams after beam, through the second spectroscope (6) by the heavy caliber directional light for becoming collimation after collimation object microscope group (7)
Beam, the collimated light beam are successively incident to reference planes mirror (8) and plane mirror to be measured (10), and foring wavelength is λ1Interference testing
Optical path；It is λ by operation wavelength2Laser (2) issue wavelength be λ2The first spectroscope of laser light (4) be incident to and expand
Mirror (5) becomes divergent beams after beam expanding lens (5) expands, through the second spectroscope (6) by becoming after collimation object microscope group (7)
The heavy caliber collimated light beam of collimation, the collimated light beam are successively incident to reference planes mirror (8) and plane mirror to be measured (10), form
Wavelength is λ2Interference testing optical path；The light wave of reference planes mirror (8) and plane mirror to be measured (10) is incident in reference planes mirror
(8) it is reflected between rear surface and plane mirror to be measured (10) front surface, obtains reference planes mirror (8) rear surface and plane mirror to be measured
(10) face type information, the wavelength for carrying reference planes mirror (8) rear surface and plane mirror to be measured (10) face type information is respectively λ1And λ2
Light wave through reference planes mirror (8), aperture is focused to by the second spectroscope (6) reflection through after collimation object microscope group (7)
(11), it by being incident to dichroscope (12) after aperture (11), is divided into two bundles after dichroscope (12), a branch of wavelength is
λ1Reflected light, another beam is that wavelength is λ2Transmitted light, wavelength λ1Reflected light after the first imaging lens group (13), quilt
First ccd detector (14), acquisition obtain wavelength X1Corresponding interference image；Wavelength is λ2Transmitted light through the second imaging len
It after group (15), is acquired by the second ccd detector (16), obtains wavelength X2Corresponding interference image.
4. the synthetic wavelength phase extraction method according to claim 3 based on striking cable-styled dual wavelength interference testing device,
It is characterized by: second spectroscope (6) and third optical axis angle counterclockwise are 135 ° ± 1 °；Dichroscope (12) and third
Optical axis is counterclockwise, and angle is 45 ° ± 1 °.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510522812.7A CN106482839B (en) | 2015-08-24 | 2015-08-24 | Striking cable-styled dual wavelength interference testing device and its synthetic wavelength phase extraction method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510522812.7A CN106482839B (en) | 2015-08-24 | 2015-08-24 | Striking cable-styled dual wavelength interference testing device and its synthetic wavelength phase extraction method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106482839A CN106482839A (en) | 2017-03-08 |
| CN106482839B true CN106482839B (en) | 2019-06-21 |
Family
ID=58232952
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510522812.7A Expired - Fee Related CN106482839B (en) | 2015-08-24 | 2015-08-24 | Striking cable-styled dual wavelength interference testing device and its synthetic wavelength phase extraction method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106482839B (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107202548B (en) * | 2017-05-22 | 2019-10-11 | 上海大学 | Wavelength Phase-shifting algorithm sensitivity test system and test method |
| CN108132026B (en) * | 2018-01-24 | 2024-02-27 | 赵智亮 | Infrared and visible light dual-wavelength transmission type interference testing device in semiconductor |
| CN108775861B (en) * | 2018-07-09 | 2019-09-27 | 南京理工大学 | One kind being based on effective wavelength π/(2k) phase shift dual wavelength time domain phase demodulating method |
| CN109521495A (en) * | 2018-12-20 | 2019-03-26 | 安徽源典科技有限公司 | A kind of dual-waveband imaging detection device and method |
| CN109683328B (en) * | 2018-12-25 | 2020-05-19 | 中国科学院长春光学精密机械与物理研究所 | Laser beam expanding system capable of automatically detecting focus and focus detecting method thereof |
| CN109738160B (en) * | 2018-12-29 | 2020-12-29 | 湖北航天技术研究院总体设计所 | Multi-optical-axis consistency testing device and method based on laser communication system |
| CN111947592B (en) * | 2020-06-29 | 2021-10-08 | 中国科学院上海光学精密机械研究所 | Dynamic dual-wavelength phase-shifting interference measuring device and measuring method |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4594003A (en) * | 1983-07-20 | 1986-06-10 | Zygo Corporation | Interferometric wavefront measurement |
| US4832489A (en) * | 1986-03-19 | 1989-05-23 | Wyko Corporation | Two-wavelength phase-shifting interferometer and method |
| US5127731A (en) * | 1991-02-08 | 1992-07-07 | Hughes Aircraft Company | Stabilized two-color laser diode interferometer |
| US5404221A (en) * | 1993-02-24 | 1995-04-04 | Zygo Corporation | Extended-range two-color interferometer |
| US6894788B2 (en) * | 2000-11-20 | 2005-05-17 | Zygo Corporation | Interferometric system for automated radius of curvature measurements |
-
2015
- 2015-08-24 CN CN201510522812.7A patent/CN106482839B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4594003A (en) * | 1983-07-20 | 1986-06-10 | Zygo Corporation | Interferometric wavefront measurement |
| US4832489A (en) * | 1986-03-19 | 1989-05-23 | Wyko Corporation | Two-wavelength phase-shifting interferometer and method |
| US5127731A (en) * | 1991-02-08 | 1992-07-07 | Hughes Aircraft Company | Stabilized two-color laser diode interferometer |
| US5404221A (en) * | 1993-02-24 | 1995-04-04 | Zygo Corporation | Extended-range two-color interferometer |
| US6894788B2 (en) * | 2000-11-20 | 2005-05-17 | Zygo Corporation | Interferometric system for automated radius of curvature measurements |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106482839A (en) | 2017-03-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN106482839B (en) | Striking cable-styled dual wavelength interference testing device and its synthetic wavelength phase extraction method | |
| Yang et al. | A review of interferometry for geometric measurement | |
| De Groot | A review of selected topics in interferometric optical metrology | |
| CN106500589B (en) | Multi-wavelength tunable microscopic interference measuring method and device | |
| US9880377B1 (en) | Multiple wavelengths real time phase shift interference microscopy | |
| CN108981606B (en) | Snapshot type full-field white light interference microscopic measurement method and device thereof | |
| Hu et al. | Absolute three-dimensional micro surface profile measurement based on a Greenough-type stereomicroscope | |
| JP7312278B2 (en) | Apparatus and method for measuring interfaces of optical elements | |
| US20070211256A1 (en) | Linear-carrier phase-mask interferometer | |
| CN101788275B (en) | Method for acquiring 3-D surface topography by utilizing wavelength as phase shift | |
| CN104534979B (en) | A kind of multi-wavelength phase shift micro imaging system and method | |
| WO2005052502A2 (en) | Pixelated phase-mask interferometer | |
| CN206311061U (en) | A kind of measurement apparatus of multi-wavelength tunable micro-interference | |
| Lyda et al. | Advantages of chromatic-confocal spectral interferometry in comparison to chromatic confocal microscopy | |
| CN101324421A (en) | Synchronous phase-shift fiso interferometer | |
| CN104713494B (en) | The dual wavelength tuning interference testing device and method of Fourier transformation phase shift calibration | |
| CN101915559B (en) | Method and system thereof for measuring three-dimensional surface shape of object by electronic speckle phase shift technology | |
| WO2018200350A1 (en) | Radius-of-curvature measurement by spectrally-controlled interferometry | |
| CN108645335A (en) | A kind of laser white light compound interference measuring system and method | |
| Zhang et al. | Fiber optic white light interferometer for areal surface measurement | |
| Hahn et al. | Single-shot low coherence pointwise measuring interferometer with potential for in-line inspection | |
| CN106482664B (en) | A kind of synthetic wavelength phase extraction method based on circle carrier frequency Moire fringe theory | |
| Wu et al. | A synchronous measurement system for the first derivative of out-of-plane deformation of double ends | |
| CN201251428Y (en) | Synchronous phase-shifting fizeau interferometer | |
| CN104075655A (en) | Fizeau synchronous phase-shifting interference test device adopting rotary radial grating |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20190621 Termination date: 20210824 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |