CN106479376A - Anti-radiation optical glass processing polishing fluid - Google Patents
Anti-radiation optical glass processing polishing fluid Download PDFInfo
- Publication number
- CN106479376A CN106479376A CN201610781511.0A CN201610781511A CN106479376A CN 106479376 A CN106479376 A CN 106479376A CN 201610781511 A CN201610781511 A CN 201610781511A CN 106479376 A CN106479376 A CN 106479376A
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- CN
- China
- Prior art keywords
- parts
- optical glass
- polishing fluid
- glass processing
- radiation optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/04—Aqueous dispersions
Abstract
The invention discloses a kind of anti-radiation optical glass processing polishing fluid, composed of the following components by weight：1～2 part of hydroxypropyl cellulose, 1.2 parts of organic amine base, 5.6 parts of Methionine, 0.7 part of rare earth oxide, 1.2 parts of alkyl polyglucoside, 0.8 part of poly-alkoxyl carboxylate, 1.1 parts of chlorination cocotrimonium ammoniums, 0.5 part of Igepon T, 1.3 parts of Fatty alcohol polyoxyethylene polyoxypropylene ether, 44 parts of deionized waters.Anti-radiation optical glass processing polishing fluid of the present invention, its polishing efficiency is high, and polishing effect is good, can improve glass surface hardness and mechanical performance after polishing.
Description
Technical field
The present invention relates to anti-radiation optical glass processing polishing fluid.
Background technology
Existing anti-radiation optical glass processing polishing fluid, its polishing efficiency is low, and polishing effect is general, glass table after polishing
Surface hardness and mechanical performance have much room for improvement.
Content of the invention
It is an object of the invention to provide a kind of anti-radiation optical glass processing polishing fluid, its polishing efficiency height, polishing
Effect is good, can improve glass surface hardness and mechanical performance after polishing.
For achieving the above object, the technical scheme is that a kind of anti-radiation optical glass processing polishing fluid of design,
Composed of the following components by weight：
1～2 part of hydroxypropyl cellulose,
1.2 parts of organic amine base,
5.6 parts of Methionine,
0.7 part of rare earth oxide,
1.2 parts of alkyl polyglucoside,
0.8 part of poly-alkoxyl carboxylate,
1.1 parts of chlorination cocotrimonium ammoniums,
0.5 part of Igepon T,
1.3 parts of Fatty alcohol polyoxyethylene polyoxypropylene ether,
44 parts of deionized waters.
Preferably, anti-radiation optical glass processing polishing fluid, composed of the following components by weight：
1 part of hydroxypropyl cellulose,
1.2 parts of organic amine base,
5.6 parts of Methionine,
0.7 part of rare earth oxide,
1.2 parts of alkyl polyglucoside,
0.8 part of poly-alkoxyl carboxylate,
1.1 parts of chlorination cocotrimonium ammoniums,
0.5 part of Igepon T,
1.3 parts of Fatty alcohol polyoxyethylene polyoxypropylene ether,
44 parts of deionized waters.
Preferably, anti-radiation optical glass processing polishing fluid, composed of the following components by weight：
2 parts of hydroxypropyl celluloses,
1.2 parts of organic amine base,
5.6 parts of Methionine,
0.7 part of rare earth oxide,
1.2 parts of alkyl polyglucoside,
0.8 part of poly-alkoxyl carboxylate,
1.1 parts of chlorination cocotrimonium ammoniums,
0.5 part of Igepon T,
1.3 parts of Fatty alcohol polyoxyethylene polyoxypropylene ether,
44 parts of deionized waters.
Preferably, anti-radiation optical glass processing polishing fluid, composed of the following components by weight：
1.2 parts of hydroxypropyl celluloses,
1.2 parts of organic amine base,
5.6 parts of Methionine,
0.7 part of rare earth oxide,
1.2 parts of alkyl polyglucoside,
0.8 part of poly-alkoxyl carboxylate,
1.1 parts of chlorination cocotrimonium ammoniums,
0.5 part of Igepon T,
1.3 parts of Fatty alcohol polyoxyethylene polyoxypropylene ether,
44 parts of deionized waters.
Advantages of the present invention and having the beneficial effects that：There is provided a kind of anti-radiation optical glass processing polishing fluid, its polishing
Efficiency high, polishing effect is good, can improve glass surface hardness and mechanical performance after polishing.
The performance of " polishing fluid " and purposes are determined by its component and proportioning, and the different component meeting in " polishing fluid "
Influence each other, component and its proportioning can determine the final performance of " polishing fluid ", such as fruit component and its proportioning be not mutually coordinated, single
The beneficial effect that component is brought, even can be eliminated by other components abatement, when serious, different component is mutually conflicted, and rises
Less than whole synthesis effect, produce negative interaction and substandard products.The present invention passes through a large amount of creative works, repeatedly verifies, obtains " polishing
The optimal component of liquid " and proportioning so that multiple component combine, mutually coordinated and produce positive comprehensive effect.
Specific embodiment
With reference to embodiment, the specific embodiment of the present invention is further described.Following examples are only used for more
Plus clearly demonstrate technical scheme, and can not be limited the scope of the invention with this.
The technical scheme that the present invention is embodied as is：
Embodiment 1
Anti-radiation optical glass processing polishing fluid, composed of the following components by weight：
1～2 part of hydroxypropyl cellulose,
1.2 parts of organic amine base,
5.6 parts of Methionine,
0.7 part of rare earth oxide,
1.2 parts of alkyl polyglucoside,
0.8 part of poly-alkoxyl carboxylate,
1.1 parts of chlorination cocotrimonium ammoniums,
0.5 part of Igepon T,
1.3 parts of Fatty alcohol polyoxyethylene polyoxypropylene ether,
44 parts of deionized waters.
Embodiment 2
Anti-radiation optical glass processing polishing fluid, composed of the following components by weight：
1 part of hydroxypropyl cellulose,
1.2 parts of organic amine base,
5.6 parts of Methionine,
0.7 part of rare earth oxide,
1.2 parts of alkyl polyglucoside,
0.8 part of poly-alkoxyl carboxylate,
1.1 parts of chlorination cocotrimonium ammoniums,
0.5 part of Igepon T,
1.3 parts of Fatty alcohol polyoxyethylene polyoxypropylene ether,
44 parts of deionized waters.
Embodiment 3
Anti-radiation optical glass processing polishing fluid, composed of the following components by weight：
2 parts of hydroxypropyl celluloses,
1.2 parts of organic amine base,
5.6 parts of Methionine,
0.7 part of rare earth oxide,
1.2 parts of alkyl polyglucoside,
0.8 part of poly-alkoxyl carboxylate,
1.1 parts of chlorination cocotrimonium ammoniums,
0.5 part of Igepon T,
1.3 parts of Fatty alcohol polyoxyethylene polyoxypropylene ether,
44 parts of deionized waters.
Embodiment 4
Anti-radiation optical glass processing polishing fluid, composed of the following components by weight：
1.2 parts of hydroxypropyl celluloses,
1.2 parts of organic amine base,
5.6 parts of Methionine,
0.7 part of rare earth oxide,
1.2 parts of alkyl polyglucoside,
0.8 part of poly-alkoxyl carboxylate,
1.1 parts of chlorination cocotrimonium ammoniums,
0.5 part of Igepon T,
1.3 parts of Fatty alcohol polyoxyethylene polyoxypropylene ether,
44 parts of deionized waters.
Through the polishing fluid in the various embodiments described above, polishing efficiency is high, and polishing effect is good, can improve glass surface after polishing
Hardness and mechanical performance.
The above is only the preferred embodiment of the present invention it is noted that ordinary skill people for the art
For member, on the premise of without departing from the technology of the present invention principle, some improvements and modifications can also be made, these improvements and modifications
Also should be regarded as protection scope of the present invention.
Claims (4)
1. anti-radiation optical glass processing polishing fluid is it is characterised in that composed of the following components by weight：
1～2 part of hydroxypropyl cellulose,
1.2 parts of organic amine base,
5.6 parts of Methionine,
0.7 part of rare earth oxide,
1.2 parts of alkyl polyglucoside,
0.8 part of poly-alkoxyl carboxylate,
1.1 parts of chlorination cocotrimonium ammoniums,
0.5 part of Igepon T,
1.3 parts of Fatty alcohol polyoxyethylene polyoxypropylene ether,
44 parts of deionized waters.
2. anti-radiation optical glass processing polishing fluid according to claim 1 it is characterised in that by weight by with
The following group is grouped into：
1 part of hydroxypropyl cellulose,
1.2 parts of organic amine base,
5.6 parts of Methionine,
0.7 part of rare earth oxide,
1.2 parts of alkyl polyglucoside,
0.8 part of poly-alkoxyl carboxylate,
1.1 parts of chlorination cocotrimonium ammoniums,
0.5 part of Igepon T,
1.3 parts of Fatty alcohol polyoxyethylene polyoxypropylene ether,
44 parts of deionized waters.
3. anti-radiation optical glass processing polishing fluid according to claim 1 it is characterised in that by weight by with
The following group is grouped into：
2 parts of hydroxypropyl celluloses,
1.2 parts of organic amine base,
5.6 parts of Methionine,
0.7 part of rare earth oxide,
1.2 parts of alkyl polyglucoside,
0.8 part of poly-alkoxyl carboxylate,
1.1 parts of chlorination cocotrimonium ammoniums,
0.5 part of Igepon T,
1.3 parts of Fatty alcohol polyoxyethylene polyoxypropylene ether,
44 parts of deionized waters.
4. anti-radiation optical glass processing polishing fluid according to claim 1 it is characterised in that by weight by with
The following group is grouped into：
1.2 parts of hydroxypropyl celluloses,
1.2 parts of organic amine base,
5.6 parts of Methionine,
0.7 part of rare earth oxide,
1.2 parts of alkyl polyglucoside,
0.8 part of poly-alkoxyl carboxylate,
1.1 parts of chlorination cocotrimonium ammoniums,
0.5 part of Igepon T,
1.3 parts of Fatty alcohol polyoxyethylene polyoxypropylene ether,
44 parts of deionized waters.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610781511.0A CN106479376A (en) | 2016-08-31 | 2016-08-31 | Anti-radiation optical glass processing polishing fluid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610781511.0A CN106479376A (en) | 2016-08-31 | 2016-08-31 | Anti-radiation optical glass processing polishing fluid |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106479376A true CN106479376A (en) | 2017-03-08 |
Family
ID=58274164
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610781511.0A Pending CN106479376A (en) | 2016-08-31 | 2016-08-31 | Anti-radiation optical glass processing polishing fluid |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106479376A (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101333418A (en) * | 2004-09-28 | 2008-12-31 | 日立化成工业株式会社 | Cmp polishing compound and method for polishing substrate |
-
2016
- 2016-08-31 CN CN201610781511.0A patent/CN106479376A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101333418A (en) * | 2004-09-28 | 2008-12-31 | 日立化成工业株式会社 | Cmp polishing compound and method for polishing substrate |
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| C06 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20170308 |