CN106455280A - Manufacturing method of electrodes with medium impeding discharging of plasma - Google Patents
Manufacturing method of electrodes with medium impeding discharging of plasma Download PDFInfo
- Publication number
- CN106455280A CN106455280A CN201611009733.7A CN201611009733A CN106455280A CN 106455280 A CN106455280 A CN 106455280A CN 201611009733 A CN201611009733 A CN 201611009733A CN 106455280 A CN106455280 A CN 106455280A
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- quartz ampoule
- earthenware
- dielectrically impeded
- electrode
- making
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
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- Spectroscopy & Molecular Physics (AREA)
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Abstract
The invention discloses a manufacturing method of electrodes with a medium impeding discharging of plasma. The manufacturing method includes following steps: selecting either quartz tubes or ceramic tubes as an impeding medium; coating the inner wall of each of the quartz tubes or the ceramic tubes with a conductive layer, coating one ends of the inner walls with welding points fully, and coating the other ends with nothing, wherein thickness of the conductive coatings is 0.01mm; arranging the quartz tubes or the ceramic tubes parallelly or in a matrix. The defects of tube-wire electrode structure and flat-plate electrode structure are avoided, one conductive coating is arranged on the inner wall of each of the quartz tubes or the ceramic tubes, no air exists between the conductive coating and the corresponding inner wall, so that uniformity is high, applicable environment is wide, requirements on performance of a power source are low, and internal discharging is avoided; 2-3 tubes are parallelly arranged, so that the electrodes are suitable for purifying small space of refrigerators and air conditioners; multiple parallel electrodes are arranged in a staggered matrix, so that high-flow gas can be treated.
Description
Technical field
The present invention relates to a kind of low temperature plasma, the electrode fabrication side of specifically a kind of dielectrically impeded plasma discharge
Method.
Background technology
Low temperature plasma is the 4th state of the material after solid-state, liquid, gaseous state, when applied voltage reaches gas
During breakdown voltage, gas is breakdown, produces the mixture including electronics, various ion, atom and free radical.Discharge process
Although in electron temperature very high, heavy particle temperature is very low, and whole system assumes low-temperature condition, so referred to as low-temperature plasma
Body.Pollutant effect in high energy electron, free radical isoreactivity particle and waste gas that low temperature plasma produces, makes pollutant divide
Son was decomposed within the extremely short time, and the purpose to reach decomposing pollutant for the follow-up various reactions occurs.General employing
Gaseous discharge method prepares isothermal plasma, gaseous discharge method have corona discharge method, dielectric barrier discharge, microwave induced electric discharge,
Magnetron discharge, Capacitance Coupled radio frequency discharge etc., microwave induced electric discharge, magnetron discharge, Capacitance Coupled radio frequency discharge are low
Air pressure or other strict under conditions of realize electric discharge, technique is also complicated, under normal temperature and pressure, typically adopts dielectrically impeded and corona
Electric discharge carrys out degradation of organic substances.
Dielectric barrier discharge (Dielectric Barrier Discharge, DBD) is that have dielectric insertion electric discharge empty
Between a kind of nonequilibrium state gas discharge also known as dielectric impedance corona discharge or voltolising.Dielectric barrier discharge can be in high gas
Pressure and very wide frequency ranges of operation, common operating air pressure is 10～10000.Supply frequency can be from 50Hz to 1MHz.Electricity
The design form of pole structure is varied.It is full of certain working gas between two sparking electrodes, and incite somebody to action one of them or two
Individual electrode dielectric cover it is also possible to by medium be hung directly from discharge space or using granular Filled Dielectrics its
In, when applying sufficiently high alternating voltage when between two electrodes, interelectrode gas can be breakdown and produce electric discharge, that is, create Jie
Matter barrier discharge.In actual applications, the electrode structure of pipeline is widely used in various chemical reactors, and flat board
Formula electrode structure is then widely used in the modification of macromolecule in industry and metallic film and sheet material, grafting, surface tension
Raising, in cleaning and hydrophilic modifying.In terms of air cleaning waste gas pollution control and treatment, in the face of gas ingredients are complicated, environment is changeable, operating mode
Complexity, pipeline and Flat electrode structure existing defects and deficiency：
1st, pipeline or plate armature, gas flowing bad adaptability, windage is big, and dusty gas and plasma field are difficult complete
Face contacts；
2nd, pipeline or plate armature, electrode cable and medium combine uniformity difference it may appear that beating outside internal discharge
The even burning etc. of fiery sounding；
3rd, pipeline or plate armature, high to power source performance and functional requirement, cause power supply high cost, stability adapts to
Property is poor；
4th, pipeline or plate armature, it is impossible to process big flow gas such as industrial waste gas, are not suitable for little space such as refrigerator
Air-conditioning air purifies.
Content of the invention
It is an object of the invention to provide a kind of method for making its electrode of dielectrically impeded plasma discharge, using quartz ampoule
Or earthenware is as obstruction medium, and it is coated with one layer of conductive coating in quartz ampoule or ceramic inside pipe wall, electrode structure is taken flat
Row arrangement；Electrode structure of the present invention and wire technique, can solve problem above very well.
The purpose of the present invention can be achieved through the following technical solutions：
A kind of method for making its electrode of dielectrically impeded plasma discharge, this method for making its electrode following steps：
1) one of quartz ampoule or earthenware, are selected as obstruction medium；
2), the inwall in quartz ampoule or earthenware applies conductive layer, and all solder joint is stayed in coating for one end of this inwall, and the other end stays
Blank does not apply；Described conductive coating thickness is 0.01mm；
3), quartz ampoule or earthenware are taken arranged in parallel or matrix arrangement.
The size of described quartz ampoule or earthenware is as follows：External diameter 1mm ± 0.01mm, internal diameter 0.05mm ± 0.01mm, length
40mm±0.1mm；All solder joint is stayed in coating for inwall one end of described quartz ampoule or earthenware, and the other end stays 4mm ± 0.1mm blank
Do not apply.
Described quartz ampoule or earthenware are as follows as the arrangement of little space purifying dielectrically impeded discharges electrode structure：2 media
Hinder arranged in parallel, tube pitch 0.5mm ± 0.01mm, blank end, full coat end interlock；3 dielectrically impeded arranged in parallel, tube pitch
0.5mm ± 0.01mm, blank end, full coat end interlock.
Size in described quartz ampoule or earthenware is as follows：External diameter 2cm ± 1mm, internal diameter 1.8cm ± 0.1mm, length
500cm±1mm；All solder joint is stayed in coating for described quartz ampoule or ceramic inside pipe wall one end, and the other end stays 4cm ± 1mm blank not apply.
Described quartz ampoule or earthenware are as follows as the arrangement of big flow exhaust-gas treatment dielectrically impeded discharges electrode structure：Using
Many parallel poles misplace matrix arrangement, and 3 dielectrically impeded to be one group, every group of tube pitch 1cm ± 1mm, blank end, full coat end
Staggered, organize spacing 10cm ± 1mm.
Described painting conductive layer using plasma sputtering, chemical deposition or metal sintered technique are processed.
Beneficial effects of the present invention：Present invention, avoiding the deficiency of pipeline and Flat electrode structure, have following excellent
Gesture：Quartz ampoule or earthenware production technology are perfect, specification and tolerance standard；Take conductive painting in quartz ampoule or ceramic inside pipe wall
Layer, between conductive coating and inwall, no air exists, and uniformity is good, adapts to environment extensively, power source performance is required low, it is to avoid inside is put
Electricity；The arrangement of 2-3 root pipe run-in index is taken to be suitable for the little space purifying of refrigerator and air conditioner, many parallel pole dislocation matrix forms can be processed
Big flow gas.
Brief description
For the ease of it will be appreciated by those skilled in the art that the present invention is further illustrated below in conjunction with the accompanying drawings.
Fig. 1 is the dielectrically impeded axial sectional view of the little space purifying of the embodiment of the present invention；
Fig. 2 is the dielectrically impeded figure arranged in parallel of the little space purifying of the embodiment of the present invention 2；
Fig. 3 is the dielectrically impeded figure arranged in parallel of the little space purifying of the embodiment of the present invention 3；
Fig. 4 is the dielectrically impeded axial sectional view of embodiment of the present invention big flow exhaust-gas treatment；
Fig. 5 is the dielectrically impeded matrix arrangement figure of embodiment of the present invention big flow exhaust-gas treatment.
Specific embodiment
Below in conjunction with embodiment, technical scheme is clearly and completely described with the reality it is clear that described
Applying example is only a part of embodiment of the present invention, rather than whole embodiments.Based on the embodiment in the present invention, this area is general
All other embodiment that logical technical staff is obtained under the premise of not making creative work, broadly falls into present invention protection
Scope.
A kind of technical scheme of the method for making its electrode of dielectrically impeded plasma discharge of the present invention is as follows：
1st, hindering medium to select is quartz ampoule or earthenware；
2nd, wire processes and takes in the unified conductive coating of quartz ampoule or ceramic inside pipe wall, and one end blanks end, one end
Stay solder joint, quartz ampoule or ceramic inside pipe wall conductive coating using plasma sputtering, chemical deposition or metal sintered technique
Process；
3rd, in structure design, using many parallel poles dislocation matrix arrangement, little space takes 2-3 root parallel to a large amount of streams
Arrangement.
Specific embodiment：
Embodiment 1：Little space purifying dielectrically impeded discharges electrode design example
Medium is hindered to be selected from one of quartz ampoule or earthenware, the size of quartz ampoule or earthenware is as follows：External diameter 1mm ±
0.01mm, internal diameter 0.05mm ± 0.01mm, length 40mm ± 0.1mm；
Apply conductive layer in the inwall of quartz ampoule or earthenware, this conductive coating thickness is 0.01mm；
Above-mentioned painting conductive layer using plasma sputtering, chemical deposition or metal sintered technique are processed；Above-mentioned
All solder joint is stayed in coating for inwall one end of quartz ampoule or earthenware, and the other end stays 4mm ± 0.1mm blank not apply, referring to Fig. 1, its
Middle in figure dash area is conductive coating；
Little space purifying dielectrically impeded discharges electrode structure arrangement is as follows：
2 dielectrically impeded arranged in parallel, tube pitch 0.5mm ± 0.01mm, and blank end, full coat end interlock, referring to Fig. 2；
3 dielectrically impeded arranged in parallel, tube pitch 0.5mm ± 0.01mm, and blank end, full coat end interlock, referring to Fig. 3；
Embodiment 2：Big flow exhaust-gas treatment dielectrically impeded discharges electrode design
Medium is hindered to be selected from one of quartz ampoule or earthenware, the size of quartz ampoule or earthenware is as follows：External diameter 2cm ±
1mm, internal diameter 1.8cm ± 0.1mm, length 500cm ± 1mm；
Apply conductive layer in the inwall of quartz ampoule or earthenware, this conductive coating thickness is 0.01mm；
The inwall of above-mentioned quartz ampoule or earthenware applies the sputtering of conductive layer using plasma, chemical deposition or metal powder and burns
Knot technique is processed, and all solder joint is stayed in coating for inwall one end, and the other end stays 4cm ± 1mm blank not apply, referring to Fig. 4；
The arrangement of big flow exhaust-gas treatment dielectrically impeded discharges electrode structure is as follows：Using many parallel poles dislocation matrix forms
Arrangement, 3 are dielectrically impeded to be one group, the tube pitch 1cm ± 1mm of one group of pipe, and blank end, full coat end interlock, group spacing 10cm ±
1mm, referring to Fig. 5；
Plasma sputtering used in technical solution of the present invention, chemical deposition or metal sintered technique are existing
There is the coating process of maturation, the present invention is not described in detail here and limits.
Technical solution of the present invention avoids the deficiency of pipeline and Flat electrode structure, has the advantage that：
1st, quartz ampoule or earthenware production technology are perfect, and supplier is a lot, and specification and tolerance can standardize；
2nd, take conductive coating in inwall, between conductive coating and inwall, no air exists, it is to avoid internal discharge；
3rd, adopt quartz ampoule or the earthenware of conductive coating, uniformity is good, adapt to environment extensively, power source performance is required low；
4th, the arrangement of 2-3 root pipe run-in index is suitable for the little space purifying of refrigerator and air conditioner, and many parallel pole dislocation matrix forms are permissible
Process big flow gas.
Present invention disclosed above preferred embodiment is only intended to help illustrate the present invention.Preferred embodiment is not detailed
Describe all of details, also do not limit the specific embodiment that this invention is only described.Obviously, the content according to this specification,
Can make many modifications and variations.This specification is chosen and is specifically described these embodiments, is to preferably explain the present invention
Principle and practical application so that skilled artisan can be best understood by and utilize the present invention.The present invention is only
Limited by claims and its four corner and equivalent.
Claims (6)
1. a kind of method for making its electrode of dielectrically impeded plasma discharge is it is characterised in that this method for making its electrode walks as follows
Suddenly：
1) one of quartz ampoule or earthenware, are selected as obstruction medium；
2), the inwall in quartz ampoule or earthenware applies conductive layer, and all solder joint is stayed in coating for one end of this inwall, and the other end blanks
Do not apply；Described conductive coating thickness is 0.01mm；
3), quartz ampoule or earthenware are taken arranged in parallel or matrix arrangement.
2. a kind of method for making its electrode of dielectrically impeded plasma discharge according to claim 1 is it is characterised in that institute
State quartz ampoule or the size of earthenware is as follows：External diameter 1mm ± 0.01mm, internal diameter 0.05mm ± 0.01mm, length 40mm ±
0.1mm；All solder joint is stayed in coating for inwall one end of described quartz ampoule or earthenware, and the other end stays 4mm ± 0.1mm blank not apply.
3. a kind of method for making its electrode of dielectrically impeded plasma discharge according to claim 2 is it is characterised in that institute
State quartz ampoule or earthenware as follows as the arrangement of little space purifying dielectrically impeded discharges electrode structure：2 dielectrically impeded parallel
Row, tube pitch 0.5mm ± 0.01mm, blank end, full coat end interlock；3 are dielectrically impeded arranged in parallel, and tube pitch 0.5mm ±
0.01mm, blank end, full coat end interlock.
4. a kind of method for making its electrode of dielectrically impeded plasma discharge according to claim 1 is it is characterised in that institute
The size stated in quartz ampoule or earthenware is as follows：External diameter 2cm ± 1mm, internal diameter 1.8cm ± 0.1mm, length 500cm ± 1mm；Institute
State quartz ampoule or ceramic inside pipe wall one end is all coated with and stays solder joint, the other end stays 4cm ± 1mm blank not apply.
5. a kind of method for making its electrode of dielectrically impeded plasma discharge according to claim 4 is it is characterised in that institute
State quartz ampoule or earthenware as follows as the arrangement of big flow exhaust-gas treatment dielectrically impeded discharges electrode structure：Using many parallel electricity
Pole misplaces matrix arrangement, and 3 dielectrically impeded to be one group, every group of tube pitch 1cm ± 1mm, and blank end, full coat end interlock, between group
Away from 10cm ± 1mm.
6. a kind of method for making its electrode of dielectrically impeded plasma discharge according to claim 1 is it is characterised in that institute
State painting conductive layer using plasma sputtering, chemical deposition or metal sintered technique to be processed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611009733.7A CN106455280A (en) | 2016-11-17 | 2016-11-17 | Manufacturing method of electrodes with medium impeding discharging of plasma |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611009733.7A CN106455280A (en) | 2016-11-17 | 2016-11-17 | Manufacturing method of electrodes with medium impeding discharging of plasma |
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| Publication Number | Publication Date |
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| CN106455280A true CN106455280A (en) | 2017-02-22 |
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| CN201611009733.7A Pending CN106455280A (en) | 2016-11-17 | 2016-11-17 | Manufacturing method of electrodes with medium impeding discharging of plasma |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108800339A (en) * | 2018-07-14 | 2018-11-13 | 赣南师范大学 | A kind of plasma air purifying device and method |
| CN114126181A (en) * | 2021-12-10 | 2022-03-01 | 青岛华云空气科技有限公司 | Dielectric barrier discharge plasma generator |
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| US20160208397A1 (en) * | 2015-01-15 | 2016-07-21 | Ngk Insulators, Ltd. | Electrode and electrode structural body |
| CN205603215U (en) * | 2016-04-08 | 2016-09-28 | 复旦大学 | Utilize plasma discharge preparation hydrogen peroxide's device |
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- 2016-11-17 CN CN201611009733.7A patent/CN106455280A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202744334U (en) * | 2012-03-02 | 2013-02-20 | 李军 | Sterilizing and purifying ozone generating discharge tube |
| CN103079328A (en) * | 2012-12-31 | 2013-05-01 | 云南航天工业有限公司 | Dielectric barrier discharge electrode and manufacture method of dielectric barrier discharge electrode |
| CN104340956A (en) * | 2014-09-29 | 2015-02-11 | 上海交通大学 | Implantable multi-channel flexible microtube electrode and preparation method thereof |
| CN204206595U (en) * | 2014-09-30 | 2015-03-11 | 赵岳虎 | Normal pressure and temperature High-frequency water body hypothermia plasma generator |
| US20160208397A1 (en) * | 2015-01-15 | 2016-07-21 | Ngk Insulators, Ltd. | Electrode and electrode structural body |
| CN204891560U (en) * | 2015-08-04 | 2015-12-23 | 金华欧亚环保科技有限公司 | Novel tubular dielectric barrier discharge plasma exhaust purification device |
| CN105517311A (en) * | 2016-02-24 | 2016-04-20 | 常州大恒环保科技有限公司 | Dielectric barrier discharge plasma generation device and dielectric barrier discharge plasma generation method |
| CN205603215U (en) * | 2016-04-08 | 2016-09-28 | 复旦大学 | Utilize plasma discharge preparation hydrogen peroxide's device |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108800339A (en) * | 2018-07-14 | 2018-11-13 | 赣南师范大学 | A kind of plasma air purifying device and method |
| CN114126181A (en) * | 2021-12-10 | 2022-03-01 | 青岛华云空气科技有限公司 | Dielectric barrier discharge plasma generator |
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Application publication date: 20170222 |
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