CN106442408A - Chemical-mechanical polishing liquid automatic preparation control system - Google Patents
Chemical-mechanical polishing liquid automatic preparation control system Download PDFInfo
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- CN106442408A CN106442408A CN201610891559.7A CN201610891559A CN106442408A CN 106442408 A CN106442408 A CN 106442408A CN 201610891559 A CN201610891559 A CN 201610891559A CN 106442408 A CN106442408 A CN 106442408A
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- pipeline
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- chemical
- preparing tank
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D11/00—Control of flow ratio
- G05D11/02—Controlling ratio of two or more flows of fluid or fluent material
- G05D11/03—Controlling ratio of two or more flows of fluid or fluent material without auxiliary power
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention discloses a chemical-mechanical polishing liquid automatic preparation control system. The chemical-mechanical polishing liquid automatic preparation control system comprises a control unit, execution units, measuring units, a tank unit and a pipeline unit, wherein the pipeline unit comprises a polishing liquid pipeline and a hydrogen peroxide pipeline; the measuring units and the execution units are arranged on the polishing liquid pipeline and the hydrogen peroxide pipeline; the tank unit comprises a preparation tank and a stirring device arranged in the preparation tank; the preparation tank is used for storing polishing liquid prepared from a polishing stock solution and a hydrogen peroxide stock solution; each measuring unit is a refractometer; and the control unit is used for receiving data detected by the refractometers in real time, generating an executive command in combination with a preset polishing liquid concentration threshold value and transmitting the executive command to the execution units. The chemical-mechanical polishing liquid automatic preparation control system has the beneficial effects that the chemical-mechanical polishing liquid automatic preparation control system is capable of detecting the concentration value of liquid in the pipelines and a tank in real time and automatically controlling the concentration of polishing liquid in the preparation tank according to the detected real-time data; additional maintenance quantity and maintenance cost are not needed; and the detection accuracy is improved.
Description
Technical field
The invention belongs to lapping liquid intelligence proportion technique field, and in particular to a kind of chemical-mechanical grinding liquid prepares control automatically
System processed.
Background technology
Cmp, i.e. CMP (chemical mechanical polishing).In wafer manufacture, with system
The upgrading of journey technology, the reducing of wire and grid size, planarization of photoetching (Lithography) technology to crystal column surface
(Non-uniformity) requirement more and more higher, after nineteen ninety-five, CMP technique is developed rapidly, and is widely used in half
Conductor industry.Cmp is also known as and chemically-mechanicapolish polishes, and its principle is chemical attack effect and mechanical removal effect phase
In conjunction with process technology, be can uniquely realize in current machining surface global planarization technology.
Lapping liquid is important ingredient in CMP processing procedure, and the lapping liquid used in processing procedure needs and oxidant is (the most frequently used
For hydrogen peroxide) allocated.CMP process needs the change to lapping liquid with the presence of substantial amounts of variable for precise control CMP
Learn and mechanical polishing operation is accurately controlled, particularly in grinding Liquid composition, the amount of the various reagents for being used is necessary
Careful control, to reach desired result.For example, oxidant is generally used for removing material from crystal column surface.If oxidant
Content is too low, then material removal will be too little, if during the excessive concentration of oxidant, can cause excessive chemical reaction, so
Concentration in allocation process to each component, carries out precise control extremely important.
In prior art, the measuring method for using has:(1) electrical conductivity：Electrical conductivity can with the change of monitoring reagent level, but this
The technology of kind generally will not be to non-ionic reagent response, such as hydrogen peroxide, unless concentration is very high；(2) titrator：Pass through
The sample of collection lapping liquid, carries out titrimetry after then being reacted with specific reagent again, however, titration is not real-time,
And generally need to arrange extra sample collecting pipeline, using dangerous chemical reagent, needs are repeatedly titrated, school
Accurate and standard inspection, to guarantee accuracy, but this needs to increase extra maintenance and maintenance cost, and cannot be by measurement
Value automatically controlled in real time；(3) weigh：Poor accuracy.
Content of the invention
In order to solve the above problems, the present invention provides a kind of chemical-mechanical grinding liquid automatic compounding and controlling system, solves mesh
In pre-test, it is impossible to measure the lapping liquid concentration in preparing tank in real time and using measured value, the lapping liquid concentration in preparing tank is entered
Row is automatically controlled, and needs to increase the not high defect of extra maintenance and maintenance cost and accuracy in detection.
The technical scheme that the present invention takes is：A kind of automatic compounding and controlling system of chemical-mechanical grinding liquid, single including control
Unit, performance element, measuring unit, tank body unit and pipeline unit；
Wherein, the pipeline unit includes, lapping liquid pipeline 3 and dioxygen water pipeline 4, and lapping liquid pipeline 3 is used for will grinding
Liquid stock solution is conveyed to preparing tank 2, and dioxygen water pipeline 4 is used for for hydrogen peroxide stock solution being conveyed to preparing tank 2, the lapping liquid pipeline 3
Be mounted on measuring unit and performance element on dioxygen water pipeline 4；
The tank body unit includes preparing tank 2 and the agitating device 23 being arranged in preparing tank, preparing tank 2 be used for storage by
Lapping liquid stock solution and hydrogen peroxide stock solution prepare the lapping liquid for obtaining, and agitating device 23 is opened according to the stirring order that control unit sends
Dynamic stirring or stopping stirring, are provided with measuring unit and performance element on the preparing tank 2；
The measuring unit is refractometer；
The execution order that the performance element is used for being sent according to control unit carries out action；
Described control unit is used for the data of refractometer detection described in real-time reception, and combines default lapping liquid concentration threshold
Value generates execution order and is transferred to performance element.
The pipeline unit also includes plain water lines 5, and plain water lines 5 are used for for pure water being conveyed to the preparing tank 2, are used for
The lapping liquid application for needing to add pure water is prepared, increased motility and the range of application of system.
The performance element includes, pump or valve, and valve is regulating valve, to improve the precision of control, it also avoid executing
The frequent movement of unit.
Preferably, the volume of the preparing tank 2 is a hectolitre a to kilolitre, and the lapping liquid capacity that single is prepared is preparing tank
The 70-80% of 2 volumes, can meet multiple applications according to the usage amount of practical application.
Preferably, in the dioxygen water pipeline, the concentration of hydrogen peroxide stock solution is 30-32%.
Preferably, the control method of the automatic compounding and controlling system of chemical-mechanical grinding liquid, in described cmp
Run on the automatic compounding and controlling system of liquid, comprise the steps of：
s1：Lapping liquid concentration threshold and required lapping liquid capacity is preset with control unit；
s2：The data that in control unit real-time reception pipeline unit, refractometer is detected, and combine lapping liquid concentration threshold
The quantity delivered desired value of each stock solution is obtained with required lapping liquid calculation of capacity；
s3：Control unit is generated according to the quantity delivered desired value for detecting in s2 and executes order control performance element action,
Control unit generates stirring order and starts agitating device stirring；
s4：When the quantity delivered of each stock solution reaches 80% the 90% of quantity delivered desired value, control unit is according to preparing tank
The data that refractometer 21 is detected are adjusted to the quantity delivered of each stock solution；
s5：When the lapping liquid in preparing tank 2 reaches lapping liquid concentration threshold, close in agitating device 23 and pipeline unit
Performance element, open preparing tank performance element 22, the lapping liquid of preparation be conveyed to the day case 6 of rear end.
Using technique scheme, with advantages below：
The automatic compounding and controlling system of chemical-mechanical grinding liquid proposed by the present invention, can be in each pipeline of real-time detection and tank body
Strength of fluid value, and according to measurement real time data the lapping liquid concentration in preparing tank 2 is automatically controlled, it is not necessary to increase
Plus extra maintenance and maintenance cost, and improve the accuracy of detection.
Description of the drawings
Fig. 1 is the system block diagram of the present invention；
Fig. 2 is the process chart of lapping liquid in the present invention；
Fig. 3 is the hydrogen peroxide solution refractive index in the present invention and concentration value corresponding diagram；
Fig. 4 be in the lapping liquid A in the present invention hydrogen peroxide concentration according to actual value and the reference value of calibrating curve measuring
Comparison diagram.
Description of reference numerals：
1 controller；2 preparing tanks；21 preparing tank refractometers；22 preparing tank performance elements；23 agitating devices；
3 lapping liquid pipelines；31 lapping liquid pipeline refractometers；32 lapping liquid pipeline performance elements；
4 dioxygen water pipelines；41 dioxygen water pipeline refractometers；42 dioxygen water pipeline performance elements；
5 plain water lines；51 plain water lines refractometers；52 plain water lines performance elements；
Case on the 6th；Case pump on the 61st；7 station platforms；8 wafers
Specific embodiment
In order that the technical problem to be solved in the present invention, technical scheme and advantage are clearer, below in conjunction with accompanying drawing and
Specific embodiment is described in detail, and description here does not mean that all masters corresponding to the instantiation that states in embodiment
Topic all refer in the claims.
The automatic compounding and controlling system of chemical-mechanical grinding liquid provided by the present invention be can be seen that from Fig. 1, Fig. 2, including control
Unit processed, performance element, measuring unit, tank body unit and pipeline unit；
Wherein, the pipeline unit includes lapping liquid pipeline 3 and dioxygen water pipeline 4, and lapping liquid pipeline 3 is used for lapping liquid
Stock solution is conveyed to preparing tank 2, and dioxygen water pipeline 4 is used for for hydrogen peroxide stock solution being conveyed to preparing tank 2, in the dioxygen water pipeline 4
The concentration of hydrogen peroxide stock solution is 30-32%, is mounted on measuring unit and holds on the lapping liquid pipeline 3 and dioxygen water pipeline 4
Row unit；
The tank body unit includes preparing tank 2 and the agitating device 23 being arranged in preparing tank, preparing tank 2 be used for storage by
Lapping liquid stock solution and hydrogen peroxide stock solution prepare the lapping liquid for obtaining, and the volume of the preparing tank 2 is a hectolitre a to kilolitre, once
Amount of preparation be usually volume 70-80%, be specifically dependent upon actually used demand, usually the same day prepare the same day use；Stir
Mix device 23 to start stirring according to the stirring order that controller 1 sends or stop stirring, after lapping liquid is prepared, by preparing tank
Performance element 22, lapping liquid is transported in day case 6, when lapping liquid is needed on production line, then will grinding by day case pump 61
Liquid is transported on each station platform 7, and the manufacture for wafer 8 is used；
The pipeline unit also includes plain water lines 5, and the measuring unit is that refractometer, the quantity of refractometer is at least 3
Platform, respectively preparing tank refractometer 21, lapping liquid pipeline refractometer 31, dioxygen water pipeline refractometer 41, because there is partial mill
The preparation of liquid, it is not necessary to add pure water, so in some applications, can cancel in plain water lines 5 and the plain water lines 5, phase
The plain water lines refractometer 51 that answers and plain water lines performance element 52；
The performance element is used for the execution order that sends according to control unit carries out action, and performance element includes, pump or
Valve, valve is regulating valve, if feed line inherently has pressure, can to adopt valve.If without pressure or pressure
Power deficiency, then by the way of pump.Preparing tank 2 conveys the performance element of Summer Solstice or the Winter Solstice case and is usually pump；
Described control unit is used for the data of refractometer detection described in real-time reception, and combines default lapping liquid concentration threshold
Value generates execution order and is transferred to performance element.
From figure 3, it can be seen that different hydrogen peroxide concentrations, corresponding different refractivity, controller 1 is detected by refractometer
Refractive index, converse its corresponding hydrogen peroxide concentration value, refractometer can accurately measure the concentration value of hydrogen peroxide.
Fig. 4 is the comparison diagram of actual value of the hydrogen peroxide concentration according to calibrating curve measuring and reference value in lapping liquid A, in figure
Reference represents that hydrogen peroxide concentration reference value change curve in lapping liquid A, Conc represent hydrogen peroxide concentration in lapping liquid A
Actual measured value change curve, Temp represent temperature variation curve；In figure can be seen that the reality of hydrogen peroxide concentration in lapping liquid A
Measurement variation curve is very high with the goodness of fit of reference value change curve, measures the temperature range of medium from 21.0 DEG C to 25.8
DEG C, actual measured value curve and reference value curve tend to overlapping substantially, the unfailing performance height of system.
Preferred embodiment, is preset with lapping liquid concentration threshold and required lapping liquid in controller 1 in a control unit
Capacity；On the data that in control unit real-time reception pipeline unit, refractometer is detected, pipeline unit and preparing tank 2, stream is installed
Gauge, integrated flow and instantaneous delivery can be sent to control unit by effusion meter in real time, and control unit combines lapping liquid concentration threshold
Value and required lapping liquid calculation of capacity obtain the quantity delivered desired value of each stock solution；Control unit is examined according to refractometer and effusion meter
The refractive index for measuring and flow value, generate and execute order control performance element action, and control unit generates stirring order startup and stirs
Mix device stirring 23；When the quantity delivered of each stock solution reaches 80% the 90% of quantity delivered desired value, control unit is according to preparation
The data that tank refractometer 21 is detected are adjusted to the quantity delivered of each stock solution, and reduce adding speed；Grinding in preparing tank 2
When liquid reaches lapping liquid concentration threshold, agitating device 23 and the performance element in pipeline unit is closed, is opened preparing tank and execute list
Unit 22, the lapping liquid of preparation is conveyed to the day case 6 of rear end.
For example, the lapping liquid needed for preparing needs 500L, and 30% hydrogen peroxide needs 30L, and pure water needs 100L.Start to prepare
When, controller controls performance element first toward preparing tank conveying 500L lapping liquid and 100L pure water.If standard refraction rate is
1.335 lapping liquid measured value is 1.3352, and controller can then control the performance element of lapping liquid pipeline to adjust quantity delivered extremely
499.5L；After having added lapping liquid and pure water, the performance element for opening dioxygen water pipeline adds the dioxygen of 30L toward in preparing tank
Water, when addition reaches 90%, reduces adding speed, and the actual measured value according to preparing tank refractometer 21 carries out dynamic control
Until aimed concn.
The operation principle of the present invention is：Lapping liquid concentration threshold and required lapping liquid needed in controller 1, input is prepared
Capacity, the data of refractometer and effusion meter on control unit real-time reception pipeline, and generate the corresponding execution of execution order control
Unit action, agitating device 23 starts stirring, when the quantity delivered of each stock solution reaches 80% the 90% of quantity delivered desired value, drop
Low adding speed, the data that control unit is detected according to preparing tank refractometer 21 are adjusted to the quantity delivered of each stock solution；When joining
When lapping liquid in tank processed 2 reaches lapping liquid concentration threshold, agitating device 23 and the performance element in pipeline unit is closed, is opened
The performance element of preparing tank, the lapping liquid of preparation is conveyed to the day case 6 of rear end.
Finally it should be noted that foregoing description is the preferred embodiments of the present invention, one of ordinary skill in the art exists
Under the enlightenment of the present invention, represent without prejudice to present inventive concept and claim on the premise of, making as multiple types, this
The conversion of sample is each fallen within protection scope of the present invention.
Claims (8)
1. the automatic compounding and controlling system of a kind of chemical-mechanical grinding liquid, it is characterised in that：Including control unit, performance element, survey
Amount unit, tank body unit and pipeline unit；
Wherein, the pipeline unit includes lapping liquid pipeline (3) and dioxygen water pipeline (4), and lapping liquid pipeline (3) is used for will grinding
Liquid stock solution is conveyed to preparing tank (2), and dioxygen water pipeline (4) is used for for hydrogen peroxide stock solution being conveyed to preparing tank (2), the lapping liquid
Measuring unit and performance element are mounted on pipeline (3) and dioxygen water pipeline (4)；
The agitating device (23) that the tank body unit includes preparing tank (2) and is arranged in preparing tank (2), preparing tank (2) is used for
Depositing and the lapping liquid for obtaining being prepared by lapping liquid stock solution and hydrogen peroxide stock solution, agitating device (23) is according to stirring that control unit sends
Mix order to start stirring or stop stirring, on preparing tank (2), measuring unit and performance element are installed；
The measuring unit is refractometer；
The execution order that the performance element is used for being sent according to control unit carries out action；
Described control unit is used for the data of refractometer detection described in real-time reception, and combines default lapping liquid concentration threshold life
Become to execute order and be transferred to performance element.
2. the automatic compounding and controlling system of chemical-mechanical grinding liquid according to claim 1, it is characterised in that：The pipeline list
Unit also includes plain water lines (5), and plain water lines (5) are used for for pure water being conveyed to the preparing tank (2).
3. the automatic compounding and controlling system of chemical-mechanical grinding liquid according to claim 1, it is characterised in that：Described execute list
Unit includes pump or valve.
4. the automatic compounding and controlling system of chemical-mechanical grinding liquid according to claim 3, it is characterised in that：The valve is
Regulating valve.
5. the automatic compounding and controlling system of chemical-mechanical grinding liquid according to claim 1, it is characterised in that：The preparing tank
(2) volume is a hectolitre to a kilolitre.
6. the automatic compounding and controlling system of chemical-mechanical grinding liquid according to claim 5, it is characterised in that：The preparing tank
(2) the lapping liquid capacity that single is prepared is the 70-80% of preparing tank (2) volume.
7. the automatic compounding and controlling system of chemical-mechanical grinding liquid according to claim 1, it is characterised in that：The hydrogen peroxide
In pipeline (4), the concentration of hydrogen peroxide stock solution is 30-32%.
8. chemical-mechanical grinding liquid prepares control method automatically, it is characterised in that in the cmp described in claim 1
Run on the automatic compounding and controlling system of liquid, comprise the steps of：
s1：Lapping liquid concentration threshold and required lapping liquid capacity is preset with control unit；
s2：The data that in control unit real-time reception pipeline unit, refractometer is detected, and combine lapping liquid concentration threshold and institute
Lapping liquid calculation of capacity is needed to obtain the quantity delivered desired value of each stock solution；
s3：Control unit is generated according to the quantity delivered desired value for detecting in s2 and executes order control performance element action, control
Unit generates stirring order and starts agitating device (23) stirring；
s4：When the quantity delivered of each stock solution reaches 80% the 90% of quantity delivered desired value, control unit is according to preparing tank refractive power
The data that instrument (21) is detected are adjusted to the quantity delivered of each stock solution；
s5：When the lapping liquid in preparing tank (2) reaches lapping liquid concentration threshold, close in agitating device (23) and pipeline unit
Performance element, open preparing tank performance element (22), the lapping liquid of preparation be conveyed to day case (6) of rear end.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610891559.7A CN106442408A (en) | 2016-10-12 | 2016-10-12 | Chemical-mechanical polishing liquid automatic preparation control system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610891559.7A CN106442408A (en) | 2016-10-12 | 2016-10-12 | Chemical-mechanical polishing liquid automatic preparation control system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106442408A true CN106442408A (en) | 2017-02-22 |
Family
ID=58173606
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610891559.7A Pending CN106442408A (en) | 2016-10-12 | 2016-10-12 | Chemical-mechanical polishing liquid automatic preparation control system |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109420450A (en) * | 2017-09-05 | 2019-03-05 | 株式会社迪思科 | Lapping liquid density adjusting method |
| CN114699941A (en) * | 2022-03-14 | 2022-07-05 | 长鑫存储技术有限公司 | Liquid mixing device, supply system and supply method |
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|---|---|---|---|---|
| US6463941B1 (en) * | 1998-12-11 | 2002-10-15 | Nec Corporation | Concentration control apparatus of liquid chemical |
| CN1393688A (en) * | 2001-06-26 | 2003-01-29 | 旺宏电子股份有限公司 | Monitor system of oxidant concentration for chemicomechanical grinding technology |
| CN1423307A (en) * | 2001-12-05 | 2003-06-11 | 富士通Vlsi株式会社 | Chemical solution conveying device and method for preparing suspension liquid |
| CN1438932A (en) * | 2000-05-19 | 2003-08-27 | 摩托罗拉公司 | Method of manufacturing a semicondustor component and chemical-mechanical polishing system therefor |
| CN1540725A (en) * | 2003-04-24 | 2004-10-27 | 株式会社海上 | Soup concentration controller of semiconductor processing appts. |
| CN105960585A (en) * | 2014-03-17 | 2016-09-21 | 恩特葛瑞斯-捷特隆解决方案公司 | Disposable liquid chemical sensor system |
-
2016
- 2016-10-12 CN CN201610891559.7A patent/CN106442408A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6463941B1 (en) * | 1998-12-11 | 2002-10-15 | Nec Corporation | Concentration control apparatus of liquid chemical |
| CN1438932A (en) * | 2000-05-19 | 2003-08-27 | 摩托罗拉公司 | Method of manufacturing a semicondustor component and chemical-mechanical polishing system therefor |
| CN1393688A (en) * | 2001-06-26 | 2003-01-29 | 旺宏电子股份有限公司 | Monitor system of oxidant concentration for chemicomechanical grinding technology |
| CN1423307A (en) * | 2001-12-05 | 2003-06-11 | 富士通Vlsi株式会社 | Chemical solution conveying device and method for preparing suspension liquid |
| CN1540725A (en) * | 2003-04-24 | 2004-10-27 | 株式会社海上 | Soup concentration controller of semiconductor processing appts. |
| CN105960585A (en) * | 2014-03-17 | 2016-09-21 | 恩特葛瑞斯-捷特隆解决方案公司 | Disposable liquid chemical sensor system |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109420450A (en) * | 2017-09-05 | 2019-03-05 | 株式会社迪思科 | Lapping liquid density adjusting method |
| CN109420450B (en) * | 2017-09-05 | 2022-06-03 | 株式会社迪思科 | Method for adjusting concentration of polishing slurry |
| CN114699941A (en) * | 2022-03-14 | 2022-07-05 | 长鑫存储技术有限公司 | Liquid mixing device, supply system and supply method |
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| SE01 | Entry into force of request for substantive examination | ||
| CB03 | Change of inventor or designer information | ||
| CB03 | Change of inventor or designer information |
Inventor after: E. M. A. Canrate Inventor before: Xu Tianlong Inventor before: Yu Yan |
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| TA01 | Transfer of patent application right | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20180417 Address after: 200122 China (Shanghai) free trade trial area, 710 Dongfang Road, 1509 house, Tomson financial building. Applicant after: Kay Pates Instrument Technology (Shanghai) Co., Ltd. Address before: 201204 room P314, 4 building, 298 Lian Zhen Road, Pudong New Area, Shanghai. Applicant before: Shanghai Yin Fei Automation Technology Co. Ltd. |
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Application publication date: 20170222 |