CN106384785A - Tin-doped CH3NH3SnxPb1-xI3 perovskite solar cell - Google Patents
Tin-doped CH3NH3SnxPb1-xI3 perovskite solar cell Download PDFInfo
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- H—ELECTRICITY
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- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
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- H—ELECTRICITY
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- H—ELECTRICITY
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- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/15—Deposition of organic active material using liquid deposition, e.g. spin coating characterised by the solvent used
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Abstract
The invention relates to the field of a solar cell, and particularly to an organic-inorganic hybrid perovskite solar cell. The invention provides a tin-doped CH3NH3SnxPb1-xI3 perovskite solar cell, wherein an active layer is a tin-doped CH3NH3SnxPb1-xI3 perovskite film. The tin-doped CH3NH3SnxPb1-xI3 perovskite film has a planar heterojunction structure. The invention provides a method for preparing the tin-doped CH3NH3SnxPb1-xI3 perovskite solar cell according to a one-step method in which multiple solvent processing procedures are utilized. A high-quality perovskite film is obtained, and high photoelectric conversion efficiency is realized.
Description
Technical field
The present invention relates to area of solar cell, specifically a kind of hybrid inorganic-organic Ca-Ti ore type solaode.
Background technology
Perovskite solar cell light absorption layer is a kind of hybrid inorganic-organic perovskite-type material, and chemical formula is AMX3
(A:CH3NH3+; M:IVA race Pb, Sn blending element;X:Halogen), cell configuration MX6Constitute octahedra and contact with each other,
Constitute three dimensional structure, NH3CH3+It is embedded.The research and development of perovskite solaode are honest and clean to being provided that using the sun on a large scale
Valency electric energy tool is of great significance.At present, the maximum that tin dope methyl ammonium lead iodide perovskite solaode exists
Problem is that photoelectric transformation efficiency is low, and stability is poor, is unsatisfactory for the demand of commercial applications.Improve such cell photoelectric conversion effect
One crucial solution of rate is exactly to improve the quality of forming film of cell light absorption layer.Battery be can ensure that using thick active layer
Light absorbs, but quality of forming film is difficult to ensure that, is unfavorable for the transmission of carrier and effective collects.Prepare active layer using two-step method
Thin film can efficiently solve this problem, that is, utilize two step spin-coating methods, by regulating and controlling annealing temperature and annealing time, same to time control
Solution concentration processed, to improve crystal growth quality, promotes transmission and the collection of carrier, improves the light absorbs of active layer simultaneously, from
And realize efficient tin dope methyl ammonium lead iodide perovskite solaode.For example, 2014, Feng Hao et al. designed
With mesoporous TiO2For electrode, spiro-OMeTAD is the tin dope methyl ammonium lead iodide perovskite electricity of hole mobile material
Pond, making to mix stannum ratio is 25%(I.e. CH3NH3Sn0.25Pb0.75I3)Cell photoelectric transformation efficiency reached 7.37%, mix stannum ratio
For 50%(I.e. CH3NH3Sn0.5Pb0.5I3)Battery reached 7.27%【J. Am. Chem. Soc. 2014, 136, 8094−
8099】;2016, Leize Zhu, et al. employ two-step method and DMSO annealing auxiliary make to mix the cell light of stannum ratio 10%
Electric transformation efficiency has reached 10.25%【Nanoscale, 2016,8, 7621-7630】;In July, 2016, Yunlong Li et al.
Same make to mix the tin-lead perovskite cell photoelectric transformation efficiency that stannum ratio is 50% using two-step method reached 13.6%【Adv.
Energy Mater. 2016, 1601353】, make the efficiency of tin-lead perovskite solaode reach a new high degree.With
Upper document all makes tin dope methyl ammonium lead iodide perovskite solaode using two step method, and these reports are pointed out only to adopt
Make the quality of guarantee battery thin film of two-step method, smooth including the crystallinity of thin film, consistency and film surface
Degree etc., and one-step method preparation is impossible to obtain a high-quality battery thin film.Although obtained higher using two-step method
Electricity conversion, but experiment Making programme is excessively loaded down with trivial details, not only wastes the plenty of time but also also consumes substantial amounts of money
Source, causes cost of manufacture high, and not environmentally.The present invention proposes to process using one-step method and by means of more solvent, makes stannum and mixes
Miscellaneous methyl ammonium lead iodide perovskite battery, makes to mix the battery peak efficiency that stannum ratio is 25% and has reached 12.08%, and this invention is
Fast and low-cost is prepared such battery and is provided a kind of effective scheme, and the commercial applications for promoting such battery have important meaning
Justice.
Content of the invention
The technical problem to be solved is:How tin dope methyl ammonium lead iodide calcium titanium is made using one-step method
Ore deposit battery.
The technical solution adopted in the present invention is:A kind of tin dope methyl ammonium lead iodide perovskite solaode, sinks
The long-pending anode as battery for the substrate of glass having one layer of uniform indium tin oxide ITO, in the substrate of glass of indium tin oxide ITO
A upper redeposited strata (3,4- ethene dioxythiophene)-polystyrolsulfon acid PEDOT:PSS thin film as hole transmission layer,
Poly- (3,4- ethene dioxythiophene)-polystyrolsulfon acid PEDOT:Redeposited one layer of active layer on PSS thin film, then in activity
Layer one layer of [6,6]-phenyl C60- methyl butyrate PC of spin coating more above60BM, as electron transfer layer, is finally steamed by Vacuum Heat again
Plate one layer of continuous aluminium film or silverskin as the negative electrode of battery, active layer is the methyl ammonium lead iodide perovskite of tin dope
CH3NH3SnxPb1-xI3Thin film, x is the positive number less than 1.Tin dope methyl ammonium lead iodide perovskite solaode of the present invention
There is planar heterojunction structure.
As a kind of optimal way:Deposition one layer of active layer process be:By methylpyridinium iodide amine CH3NH3I, lead iodide PbI2
With Tin tetraiodide. SnI2It is 1.08 according to mol ratio:(1-x):xIt is dissolved in DMF DMF and dimethyl sulfoxide DMSO
Form precursor liquid, in precursor liquid, methylpyridinium iodide amine CH in mixed solvent3NH3The molar concentration of I is 1.62 mol/L, N, N- diformazan
The volume ratio of base Methanamide DMF and dimethyl sulfoxide DMSO is 10:1, using solution spin-coating method in poly- (3,4- ethylene dioxy thiophenes
Fen)-polystyrolsulfon acid PEDOT:Spin coating precursor liquid on PSS thin film, spin coating speed is 6000-6500 rpm, and spin-coating time is
30-40s, during this spin coating, Deca sec-butyl alcohol cleans, that is, requires under keeping substrate of glass rotation status, and Deca is secondary
Butanol cleans, and the time starting to clean is carried out after spin coating starts 5-15s, and scavenging period is 1-1.5s, and said process is tied
In N after bundle2In atmosphere, 100 °C of annealing 25 s of keeping temperature, then soak 5-10 s, glass base during immersion using sec-butyl alcohol
Bottom remains static, and soaks rotary glass substrate again after terminating, speed of rotation 6000-6500 rpm, rotational time 25-35
S, then in N2100 °C of annealing 25 min of keeping temperature in atmosphere, finally anneal under DMF vapourss 25 min, annealing temperature
Remain at 100 °C, finally produce the methyl ammonium lead iodide perovskite of the tin dope that thickness is 290 nm -310 nm
CH3NH3SnxPb1-xI3Thin film.
The present invention prepares CH in one-step method3NH3SnxPb1-xI3During perovskite thin film, processed by means of more solvent
Process, including the cleaning of organic reagent sec-butyl alcohol and immersion process, and N2DMF solvent annealing process under atmosphere.In spin coating
CH3NH3SnxPb1-xI3Make use of during perovskite thin film that sec-butyl alcohol instead of traditional toluene, chlorobenzene is carried out to active layer
Cleaning, accelerates the transformation by liquid phase to solid phase for the active layer, improves the crystallization rate of active layer;Recycle secondary after preannealing
Butanol soaks the planarization that active layer has been also greatly facilitate active layer film, is favorably improved the current intensity of battery, is living
Property layer solution configuration process in employ excessive methylpyridinium iodide amine, with sec-butyl alcohol soak also contribute to remove unnecessary methyl
Iodate amine;Sec-butyl alcohol used in the present invention compared with conventionally used toluene, chlorobenzene, low cost, small toxicity;N2Under atmosphere
DMF solvent annealing process contribute to forming big crystal grain, fine and close CH3NH3SnxPb1-xI3Perovskite thin film.With an existing step
Method prepares CH3NH3SnxPb1-xI3Perovskite thin film technology is compared, the CH of present invention preparation3NH3SnxPb1-xI3Perovskite thin film is brilliant
Bigger, the finer and close, degree of crystallinity of grain and flatness are higher, thus the CH of preparation3NH3SnxPb1-xI3Perovskite solar cell photoelectric
Transformation efficiency is significantly larger than prior art【See Adv. Energy Mater. 2016,1601353】.With existing two-step method system
Standby CH3NH3SnxPb1-xI3Perovskite thin film technology【See Nanoscale, 2016,8,7621-7630】Compare, simplify making
Flow process, saves Production Time, reduces cost of manufacture.And the CH prepared by the present invention3NH3SnxPb1-xI3The perovskite sun
Energy battery is compared with prior art【See Adv. Energy Mater. 2016,1601353, Nanoscale, 2016,8,
7621-7630】, there is simpler structure, be mainly omitted cathode buffer layer.In a word, the present invention is better than now from performance
The CH of some one-step method preparations3NH3SnxPb1-xI3Perovskite solaode, is better than existing two-step method system from preparation technology
Standby CH3NH3SnxPb1-xI3Perovskite solaode.
As a kind of optimal way:The substrate of glass thickness of indium tin oxide ITO is 100 nm, hole transport strata (3,
4- ethene dioxythiophene)-polystyrolsulfon acid PEDOT:The thickness of PSS is 30 nm-40 nm, deposition process spin coating speed 3000
Rpm, spin-coating time 30-40 s, after the completion of deposition, 120 °C of annealing temperature of holding in atmosphere, annealing time 10-15 min,
Electron transfer layer thickness is 40 nm- 50 nm, spin coating speed 2800 rpm, spin-coating time 30-40 s, and cathode electrode layer thickness is 150
Nm, evaporation rate is 0.5 nm/s.
The invention has the beneficial effects as follows:The present invention proposes the one-step method preparation that a kind of employing more solvent processes auxiliary
CH3NH3SnxPb1-xI3The method of perovskite solaode, obtains high-quality perovskite thin film it is achieved that high photoelectricity
Transformation efficiency.This invention simplifies the operating process of existing two-step method preparation using one-step method, saves Production Time, reduces
Cost of manufacture;This invention sec-butyl alcohol instead of traditional toluene, chlorobenzene as cleaning and soaks solvent, not only with low cost,
And low toxic and environment-friendly.
Brief description
Fig. 1 is solar battery structure schematic diagram of the present invention;
Fig. 2 is sec-butyl alcohol cleaning and the CH not cleaned3NH3Sn0.25Pb0.75I3Thin film and its scanning electron microscopy of transverse section
(SEM), wherein a is the CH after being cleaned with sec-butyl alcohol3NH3Sn0.25Pb0.75I3The SEM figure of thin film, c is to be cleaned with sec-butyl alcohol
CH afterwards3NH3Sn0.25Pb0.75I3The SEM figure of thin cross-sections, b is the CH not cleaned with sec-butyl alcohol3NH3Sn0.25Pb0.75I3
The SEM figure of thin film, d is the CH not cleaned with sec-butyl alcohol3NH3Sn0.25Pb0.75I3The SEM figure of thin cross-sections;
Fig. 3 sec-butyl alcohol cleans and the CH not cleaned3NH3Sn0.25Pb0.75I3The x-ray diffraction spectrum of thin film(XRD), a represents unclear
The CH washing3NH3Sn0.25Pb0.75I3The XRD spectrum of thin film, b represents the CH after sec-butyl alcohol cleaning3NH3Sn0.25Pb0.75I3Thin film
XRD spectrum;
Fig. 4 is CH under different annealing conditions3NH3Sn0.25Pb0.75I3The SEM picture of thin film, a represents CH3NH3Sn0.25Pb0.75I3
Perovskite thin film is in N2In atmosphere, 100 °C of temperature lower thermal annealing 25 min, then under DMF vapourss, at 100 °C of temperature
The CH that 25 min that anneal are formed3NH3Sn0.25Pb0.75I3The SEM figure of thin film;B represents CH3NH3Sn0.25Pb0.75I3Perovskite is thin
Film in atmosphere, 100 °C of temperature lower thermal annealing 25 min, 25 min shapes of then annealing at 100 °C of temperature under DMF vapourss
The CH becoming3NH3Sn0.25Pb0.75I3The SEM figure of thin film;C represents CH3NH3Sn0.25Pb0.75I3Perovskite thin film is in N2In atmosphere,
The CH that 100 °C of temperature lower thermal annealing 25 min is formed3NH3Sn0.25Pb0.75I3The SEM figure of thin film;
Fig. 5 is CH under different annealing conditions3NH3Sn0.25Pb0.75I3The X-ray diffraction spectrum of thin film(XRD), a represents will
CH3NH3Sn0.25Pb0.75I3Perovskite thin film is in N2In atmosphere, 100 °C of temperature lower thermal annealing 25 min, then in DMF vapourss
The CH that 25 min that anneal at 100 °C of lower temperature are formed3NH3Sn0.25Pb0.75I3The XRD spectrum of thin film;B represents will
CH3NH3Sn0.25Pb0.75I3Perovskite thin film is in N2In atmosphere, 100 °C of temperature lower thermal annealing 25 min formed
CH3NH3Sn0.25Pb0.75I3The XRD spectrum of thin film.C represents CH3NH3Sn0.25Pb0.75I3Perovskite thin film in atmosphere, temperature
100 °C of lower thermal annealing 25 min, then anneal what 25 min were formed at 100 °C of temperature under DMF vapourss
CH3NH3Sn0.25Pb0.75I3The XRD spectrum of thin film;
Fig. 6 is CH3NH3Sn0.25Pb0.75I3The current -voltage curve of perovskite solaode, the open-circuit voltage of this battery
0.77 V, short-circuit current density 24 mA/cm2, fill factor, curve factor 66%, electricity conversion 12.08%;
Fig. 7 is CH3NH3Sn0.25Pb0.75I3The external quantum efficiency curve of perovskite solaode;
Wherein, 1, the substrate of glass of indium tin oxide ITO, 2, poly- (3,4-rthylene dioxythiophene)-polystyrolsulfon acid
(PEDOT:PSS)Thin film, 3, the methyl ammonium lead iodide perovskite of tin dope(CH3NH3SnxPb1-xI3)Thin film, 4, [6,6]-
Phenyl C60- methyl butyrate(PC60BM)Layer, 5, aluminium film or silverskin.
Specific embodiment
As shown in figure 1, tin dope methyl ammonium lead iodide perovskite solaode has planar heterojunction structure:This reality
Applying solar battery structure in example is:ITO/PEDOT:PSS/ CH3NH3SnxPb1-xI3/PC60BM/Al.
In battery structure, the thickness of ito anode is 100 nm, square resistance 10 Ω.
In battery structure, hole transmission layer PEDOT:The thickness of PSS is 30 nm, using solution spin-coating method film forming, Ran Houkong
Anneal in gas and be obtained, spin coating speed 3000 rpm, spin-coating time 30 s, 120 °C of annealing temperature, annealing time 10 min,
In battery structure, active layer is CH3NH3Sn0.25Pb0.75I3Perovskite thin film, by methylpyridinium iodide amine(CH3NH3I), iodate
Lead(PbI2)And Tin tetraiodide.(SnI2)According to 1.08:0.25:0.75 mol ratio is dissolved in DMF(DMF)With two
Methyl sulfoxide(DMSO)In mixed solvent, then make by spin coating proceeding and with reference to more solvent handling process.
In battery structure, electron transport material is fullerene derivate [6,6]-phenyl C60- methyl butyrate(PC60BM)Structure
Become, be obtained using solution spin-coating method, spin coating speed 2800 rpm, spin-coating time 30 s, thickness thickness is 40 nm,
In battery structure, negative electrode is by Al film, is prepared using vacuum thermal evaporation method, film thickness 150 nm, evaporation rate is
0.5 nm/s,
Using solution spin-coating method in ITO/PEDOT:Spin coating CH in PSS substrate3NH3Sn0.25Pb0.75I3Precursor liquid, one-step method system
The standby uniform CH of a layer thickness3NH3Sn0.25Pb0.75I3Perovskite thin film, spin coating speed 6300 rpm, spin-coating time 35 s, here
During rotation Deca sec-butyl alcohol clean once, sec-butyl alcohol consumption 300 l, place it in after rotary sample terminates in thermal station
N2In atmosphere, 100 °C of temperature lower preannealing 25 s, then again Deca sec-butyl alcohol soak 8 s, sec-butyl alcohol consumption 300 l, subsequently
Spin coating 30 s under 6300 rpm speed, then be placed in thermal station in N2In atmosphere, 100 °C of temperature lower thermal annealing 25 min, immediately
25 min that anneal under DMF vapourss, annealing temperature remains at 100 °C, the thickness finally produced is 300 nm,
Described CH3NH3Sn0.25Pb0.75I3Perovskite precursor liquid is by methylpyridinium iodide amine(CH3NH3I), lead iodide(PbI2)And iodine
Change stannum(SnI2)According to 1.08:0.25:0.75 mol ratio is dissolved in DMF(DMF)And dimethyl sulfoxide
(DMSO)A kind of flavous solution being formed in mixed solvent.
Described DMF(DMF)And dimethyl sulfoxide(DMSO)The volume ratio of mixed solvent is 10:1,
Described CH3NH3Molar concentration 1.62 mol/L of I, described Tin tetraiodide.(SnI2)Molar concentration be 0.375
Mol/L, described lead iodide(PbI2)Molar concentration be 1.125 mol/L,
Described sec-butyl alcohol cleaning process, is in spin coating CH3NH3Sn0.25Pb0.75I3Carry out during perovskite thin film,
Start spin coating CH3NH3Sn0.25Pb0.75I3Perovskite thin film starts timing, and the 13rd s starts sec-butyl alcohol cleaning, and cleaning process is in 1 s
Inside complete, butanol cleans and the CH not cleaned3NH3Sn0.25Pb0.75I3Thin film compares figure is as shown in Figures 2 and 3.
Described sec-butyl alcohol immersion process, is in spin coating CH3NH3Sn0.25Pb0.75I3Perovskite thin film terminates and in N2Atmosphere
In, carry out after 100 °C of temperature lower preannealing 25 s, CH in immersion process3NH3Sn0.25Pb0.75I3Perovskite thin film is static not
Dynamic, soak time 8 s.
Described annealing process, is made up of successively three annealing processes, be for the first time sec-butyl alcohol is cleaned after
CH3NH3Sn0.25Pb0.75I3Perovskite thin film, in N2In atmosphere, at 100 °C of temperature, carry out preannealing 25 s, second annealed
Journey is the CH after soaking sec-butyl alcohol3NH3Sn0.25Pb0.75I3Perovskite thin film after spin coating, in N2In atmosphere, 100 ° of temperature
Thermal annealing 25 min under C, anneals followed by third time, is in N2Annealing 25 in atmosphere and DMF vapourss, at 100 °C of temperature
Min, CH under different annealing conditions3NH3Sn0.25Pb0.75I3Thin film is as shown in Figure 4 and Figure 5.
The present invention preparation tin dope methyl ammonium lead iodide perovskite solar cell properties figure as shown in Figure 6 and Figure 7,
It can be seen that present invention obtains high-quality perovskite thin film is it is achieved that high electricity conversion.
Claims (3)
1. a kind of tin dope methyl ammonium lead iodide perovskite solaode it is characterised in that:Deposition has one layer of uniform indium
The substrate of glass of tin-oxide ITO as the anode of battery, a redeposited strata in the substrate of glass of indium tin oxide ITO
(3,4- ethene dioxythiophene)-polystyrolsulfon acid PEDOT:PSS thin film as hole transmission layer, in poly- (3,4- ethylene two
Oxygen thiophene)-polystyrolsulfon acid PEDOT:Redeposited one layer of active layer on PSS thin film, then in active layer spin coating one again
Layer [6,6]-phenyl C60- methyl butyrate PC60BM, as electron transfer layer, finally passes through the continuous aluminum of one layer of vacuum thermal evaporation again
, as the negative electrode of battery, active layer is the methyl ammonium lead iodide perovskite CH of tin dope for film or silverskin3NH3SnxPb1-xI3Thin
Film, x is the positive number less than 1.
2. a kind of tin dope methyl ammonium lead iodide perovskite solaode according to claim it is characterised in that:
Deposition one layer of active layer process be:By methylpyridinium iodide amine CH3NH3I, lead iodide PbI2With Tin tetraiodide. SnI2According to mol ratio it is
1.08:(1-x):xIt is dissolved in formation precursor liquid in DMF DMF and dimethyl sulfoxide DMSO mixed solvent, front
Drive in liquid, methylpyridinium iodide amine CH3NH3The molar concentration of I is 1.62 mol/L, DMF DMF and dimethyl sulfoxide
The volume ratio of DMSO is 10:1, using solution spin-coating method in poly- (3,4-rthylene dioxythiophene)-polystyrolsulfon acid PEDOT:
Spin coating precursor liquid on PSS thin film, spin coating speed is 6000-6500 rpm, and spin-coating time is 30-40s, starts 5-15s in spin coating
In the case of keeping spin coating precursor liquid afterwards, Deca sec-butyl alcohol cleans, and scavenging period is 1-1.5s, before continuing spin coating after the completion of cleaning
Drive liquid until stopping spin coating after completing precursor liquid spin-coating time, in N2In atmosphere, 100 °C of annealing 25 s of keeping temperature, then make
Soak 5-10 s with sec-butyl alcohol, remain static during immersion, soak and terminate rear rotary glass substrate, speed of rotation 6000-
6500 rpm, rotational time 25-35 s, then in N2In atmosphere, 100 °C of annealing 25 min of keeping temperature, finally steam in DMF heat
Anneal under vapour 25 min, and annealing temperature remains at 100 °C, finally produces the tin dope that thickness is 290 nm -310 nm
Methyl ammonium lead iodide perovskite CH3NH3SnxPb1-xI3Thin film.
3. a kind of tin dope methyl ammonium lead iodide perovskite solaode according to claim 1 it is characterised in that:
The substrate of glass thickness of indium tin oxide ITO is 100 nm, hole transport strata (3,4-rthylene dioxythiophene)-polystyrene
Sulfonic acid PEDOT:The thickness of PSS is 30 nm-40 nm, and deposition process spin coating speed 3000 rpm, spin-coating time 30-40 s sink
After the completion of long-pending, keep 120 °C of annealing temperature, annealing time 10-15 min in atmosphere, electron transfer layer thickness is 40 nm-
50 nm, spin coating speed 2800 rpm, spin-coating time 30-40 s, cathode electrode layer thickness is 150 nm, and evaporation rate is 0.5 nm/s.
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