CN106353972A - LED composite light homogenizing device and exposure system using same - Google Patents
LED composite light homogenizing device and exposure system using same Download PDFInfo
- Publication number
- CN106353972A CN106353972A CN201610949067.9A CN201610949067A CN106353972A CN 106353972 A CN106353972 A CN 106353972A CN 201610949067 A CN201610949067 A CN 201610949067A CN 106353972 A CN106353972 A CN 106353972A
- Authority
- CN
- China
- Prior art keywords
- light
- tapered
- uniforming device
- taper
- led
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
Abstract
The invention discloses an LED (light-emitting diode) composite light homogenizing device and an exposure system using the same. The LED composite light homogenizing device and the exposure system using the same comprise a light source and a light homogenizing device, and are characterized in that: the light source is an LED chip array, each LED chip in the LED chip array corresponds to a tapered light stick in a tapered light stick array respectively, the tapered light stick has a tapered shape with a small light inlet end and a big light outlet end, a tapered light homogenizing device is arranged at the light outlet end of the tapered light stick array and has a tapered shape with a small light inlet end and a big light outlet end, a curved surface reflector is arranged at the light outlet end of the tapered light homogenizing device, and a concave surface of the curved surface reflector faces the light outlet end of the tapered light homogenizing device. Compared with the prior art, the LED composite light homogenizing device and the exposure system have significant advantages of high LED ultraviolet utilization rate, good light homogenizing and collimation effects, simple structure and low cost.
Description
Technical field
The present invention relates to a kind of optical technology, the exposure that particularly a kind of led is combined light uniforming device and uses this compound light uniforming device
Photosystem.
Background technology
Traditional ultra violet illumination light source is mercury lamp, and its shortcoming is power consumption height, cost height, short life and safety and environmental protection
Poor performance.In the even lighting system of existing mercury lamp, part is many, and light energy consumption in transmittance process is big, and the efficiency of light energy utilization is low.Ultraviolet led
Application in lithography illuminating system gets more and more, but the collection for led ultraviolet light and even light and collimation still do not obtain
Preferably solve.
Content of the invention
It is an object of the present invention to provide the high and even light of a kind of led utilization rate of ultraviolet light and collimating effect is good and the simple cost of structure
Low led is combined light uniforming device and the exposure system using this compound light uniforming device.
The technical scheme realizing the object of the invention is: a kind of led is combined light uniforming device and the exposure using this compound light uniforming device
System, including light source and light uniforming device it is characterised in that: described light source be led chip array, every in described led chip array
Individual led chip corresponds to one of tapered light pipes array tapered light pipes respectively, and described tapered light pipes go out light end for light inlet is little
Big taper, is provided with taper light uniforming device at the light end that goes out of described tapered light pipes array, described taper light uniforming device is for light inlet is little
Go out the big taper in light end.
It is further preferred that the tapered light pipes in described tapered light pipes array are solid cone shaped optical wand, taper light uniforming device is
Conical hollow light uniforming device.
A kind of exposure system, including light source and light uniforming device, described light source is led chip array, in described led chip array
Each led correspond to one of tapered light pipes array tapered light pipes respectively, described tapered light pipes go out light end for light inlet is little
Big taper, is provided with taper light uniforming device at the light end that goes out of described tapered light pipes array, described taper light uniforming device is for light inlet is little
Go out the big taper in light end;It is externally provided with first surface reflecting mirror and the second curved reflector at the light end that goes out of described taper light uniforming device,
The concave surface of first surface reflecting mirror and described taper light uniforming device go out that optical port is relative, the concave surface of the second curved reflector respectively with
The concave surface of first surface reflecting mirror is relative with exposure worktable face.
The present invention has the high and even light of led utilization rate of ultraviolet light compared with prior art and collimating effect is good and structure is simple
The remarkable advantage of single low cost.
Brief description:
Fig. 1 is that the present invention uses led to be combined the structural representation of the exposure system of light uniforming device.
Specific embodiment
The present invention is to solve above-mentioned technical problem to adopt technical scheme as shown in Figure 1, and light source adopts led chip array 1,
Each led chip in led chip array corresponds to one of tapered light pipes array 2 tapered light pipes, described tapered light pipes respectively
Go out the big taper in light end for light inlet is little, the port of each led chip in described led chip array and described tapered light pipes
Between distance less, then the light utilization efficiency that led chip sends is higher, described tapered light pipes array go out light end arrange a cone
Shape light uniforming device 3, the distance going out between the light inlet of light end and described taper light uniforming device of described tapered light pipes array is zero, that is, described
The entering light end face of the light output end of tapered light pipes array and described taper light uniforming device, in approximately the same plane, makes described tapered light pipes
The light beam that array sends all is directly entered described taper light uniforming device.The light beam that described tapered light pipes array sends all directly enters
Enter described taper light uniforming device.Described taper light uniforming device goes out the big taper in light end for light inlet is little.
Tapered light pipes in described tapered light pipes array can be solid or hollow, and described taper light uniforming device can
To be hollow or solid.Both have a following combination:
Tapered light pipes are hollow, and light uniforming device is hollow;
Tapered light pipes are solid, and light uniforming device is solid;
Tapered light pipes are hollow, and light uniforming device is solid;
Tapered light pipes are solid, and light uniforming device is hollow;
This combination has the optimum implementation of best even light effect and the highest efficiency of light energy utilization and relatively low production cost.
It is externally provided with first surface reflecting mirror 4, the song of described first surface reflecting mirror at described taper light uniforming device light-emitting window end
The distance between rate and curved reflector and light uniforming device are that the requirement of area according to exposure and light path is designed, this first
It is additionally provided with the second curved reflector 5, the concave surface of this second curved reflector is anti-with described first surface respectively outside curved reflector
The concave surface penetrating mirror is relative with exposure worktable face 6.
The material of described tapered light pipes is glass, quartzy or crystal.The material of taper light uniforming device is glass or quartz, wherein
The inner surface plating reflectance coating of conical hollow light uniforming device.
The present invention is because using led ultraviolet source, obvious energy conservation, the structure of compound light uniforming device obtains excellent even light efficiency
Really, system structure is simple, good manufacturability, the remarkable advantage of low cost.
Claims (3)
1. a kind of led be combined light uniforming device, includings light source and light uniforming device it is characterised in that: described light source be led chip array, institute
State each the led chip in led chip array and correspond to one of tapered light pipes array tapered light pipes, described tapered light pipes respectively
Go out the big taper in light end for light inlet is little, be provided with taper light uniforming device, described taper at the light end that goes out of described tapered light pipes array
Light uniforming device goes out the big taper in light end for light inlet is little.
2. led according to claim 1 be combined light uniforming device it is characterised in that: the cone of light in described tapered light pipes array
Rod is solid cone shaped optical wand, and taper light uniforming device is conical hollow light uniforming device.
3. a kind of exposure system, including light source and light uniforming device it is characterised in that: described light source be led chip array, described led
Each led in chip array corresponds to one of tapered light pipes array tapered light pipes respectively, and described tapered light pipes are light inlet
Little and go out the big taper in light end, it is provided with taper light uniforming device at the light end that goes out of described tapered light pipes array, described taper light uniforming device is
Light inlet is little and goes out the big taper in light end;It is externally provided with first surface reflecting mirror and the second song at the light end that goes out of described taper light uniforming device
Face reflecting mirror, the concave surface of first surface reflecting mirror and described taper light uniforming device go out that optical port is relative, the second curved reflector
Concave surface is relative with the concave surface of first surface reflecting mirror and exposure worktable face respectively.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201610949067.9A CN106353972A (en) | 2016-11-03 | 2016-11-03 | LED composite light homogenizing device and exposure system using same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610949067.9A CN106353972A (en) | 2016-11-03 | 2016-11-03 | LED composite light homogenizing device and exposure system using same |
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CN106353972A true CN106353972A (en) | 2017-01-25 |
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CN201610949067.9A Pending CN106353972A (en) | 2016-11-03 | 2016-11-03 | LED composite light homogenizing device and exposure system using same |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107861254A (en) * | 2017-12-29 | 2018-03-30 | 河南百合特种光学研究院有限公司 | Single UV L ED exposure light source system |
CN113515023A (en) * | 2021-07-28 | 2021-10-19 | 合肥芯碁微电子装备股份有限公司 | Dual-waveband illumination system and maskless direct-writing photoetching equipment with same |
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US20050007767A1 (en) * | 2001-02-06 | 2005-01-13 | Fischer Robert E. | Led-based flashlight |
CN1736111A (en) * | 2002-11-07 | 2006-02-15 | 索尼德国有限责任公司 | Illumination arrangement for a projection system |
CN101027579A (en) * | 2004-09-24 | 2007-08-29 | 皇家飞利浦电子股份有限公司 | Illumination system |
CN101128942A (en) * | 2005-02-28 | 2008-02-20 | 奥斯兰姆奥普托半导体有限责任公司 | Led array |
US20100135026A1 (en) * | 2008-12-02 | 2010-06-03 | Martin Professional A/S | Reflector system for electrode-less plasma source |
CN204945617U (en) * | 2015-09-09 | 2016-01-06 | 合肥芯碁微电子装备有限公司 | A kind of UVLED array light source Collection utilization device for directly writing exposure machine |
-
2016
- 2016-11-03 CN CN201610949067.9A patent/CN106353972A/en active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050007767A1 (en) * | 2001-02-06 | 2005-01-13 | Fischer Robert E. | Led-based flashlight |
CN1736111A (en) * | 2002-11-07 | 2006-02-15 | 索尼德国有限责任公司 | Illumination arrangement for a projection system |
CN101027579A (en) * | 2004-09-24 | 2007-08-29 | 皇家飞利浦电子股份有限公司 | Illumination system |
CN101128942A (en) * | 2005-02-28 | 2008-02-20 | 奥斯兰姆奥普托半导体有限责任公司 | Led array |
US20100135026A1 (en) * | 2008-12-02 | 2010-06-03 | Martin Professional A/S | Reflector system for electrode-less plasma source |
CN204945617U (en) * | 2015-09-09 | 2016-01-06 | 合肥芯碁微电子装备有限公司 | A kind of UVLED array light source Collection utilization device for directly writing exposure machine |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107861254A (en) * | 2017-12-29 | 2018-03-30 | 河南百合特种光学研究院有限公司 | Single UV L ED exposure light source system |
CN113515023A (en) * | 2021-07-28 | 2021-10-19 | 合肥芯碁微电子装备股份有限公司 | Dual-waveband illumination system and maskless direct-writing photoetching equipment with same |
CN113515023B (en) * | 2021-07-28 | 2023-08-22 | 合肥芯碁微电子装备股份有限公司 | Dual-band illumination system and maskless direct-writing lithography equipment with same |
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Application publication date: 20170125 |