CN106350849B - The oxidation film electro-deposition preparation method of aluminium surface high-selenium corn and low transmitting solar spectrum - Google Patents
The oxidation film electro-deposition preparation method of aluminium surface high-selenium corn and low transmitting solar spectrum Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
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- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/18—After-treatment, e.g. pore-sealing
- C25D11/20—Electrolytic after-treatment
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- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
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- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
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Abstract
The invention discloses the oxidation film electro-deposition preparation methods of a kind of aluminium surface high-selenium corn and low transmitting solar spectrum, are oxidation substrate, in four steps realization: one, aluminum alloy surface pre-treatment with aluminium alloy;Two, aluminium alloy anode oxide;Three, obtained anodic oxidation template is subjected to ac pore-enlarging;Four, the anodized aluminum alloy plate after reaming is subjected to AC electrodeposition.Experiment obtains CuAl2O3The solar energy absorbing coating of/Cu-Ni composite nanorod array structure, after tested its absorptivity α=0.87~0.91, emissivity ε=0.18~0.26, quality factor α/ε=3.8~4.9.Oxidation membrane coat absorptivity that the present invention obtains, emissivity fluctuate very little, more stable.The present invention has many advantages, such as that easy to operate, cost is relatively low, coating binding force is secured, solar absorption quality factor is higher, high high-temp stability is preferable.
Description
Technical field
The invention belongs to solar energy heat absorbing field of material technology, are related to a kind of anodizing technology and AC electrodeposition phase
In conjunction with the method for preparation solar absorption combined oxidation membrane coat, more particularly to using anodised aluminium as substrate, use is appropriate
Electro-deposition parameter and deposition formula of liquid appropriate prepare solar absorption combined oxidation membrane coat.
Background technique
Solar energy directly by the way of be mainly photothermal conversion technology.Photothermal conversion technology is widely used in the sun
On energy heat collector, solar energy absorbing coating is the key components of heat collector.The method of solar energy absorbing coating is main at present
There are coating method, electrochemical method, vacuum evaporation, magnetron sputtering method etc..But all in place of Shortcomings, the coating of cladding process preparation
It is poor with basal body binding force, it is easy to fall off, weatherability is poor, and it is easy to aging, and also collecting efficiency is low;The coating of electrochemical process preparation,
Thermal stability is poor under the conditions of high temperature, is only limitted to cryogenic conditions use, and preparation process has environmental pollution;Magnetic control splashes
Method higher cost is penetrated, production efficiency is low, and working condition is harsh, and material source is few, and sputtering voltage is very high, and misoperation may be to people
Life security threatens, and is difficult to promote to large-scale industrial production.Aluminum alloy base material is the very good material of optical property
Material, it is very excellent to infrared waves reflecting properties.For solar energy absorbing coating, surface is generated more by anodic oxidation
The nano metal ion of high-absorbility has good protective effect in the oxidation film device to hole of hole, it is therefore prevented that the bad erosion of external environment
And interference.But its solar absorptance is not ideal enough, and absorber coatings thermal stability is poor, hot environment application not enough at
It is ripe.
According to " solar energy materials and solar battery " the 94th phase in 2010, the reports of page 1578 to 1581, Ding et al. is for the first time
It is sunk in situ in alumina pore using electrochemical method and obtains composite nanorod array, which has good light absorption,
But its coating temperature is more than that 300 DEG C of later coating quality factors are begun to decline.Illustrating it, thermal stability is not under the conditions of high temperature
It is good.
According to " Energy Procedia " the 57th phase in 2014, the reports of page 2733 to 2742, Samuel Santiago et al.
It deposited single metallic nickel, the oxygen of preparation into anodic alumina films hole under the conditions of different alternating voltages and a-c cycle
Change film layer and show as lower reflectivity in visible region, but its shown near near-infrared 1500nm~2500nm it is higher
Reflectivity.So its combined oxidation film layer not solar energy mainly absorb spectral coverage 300nm~2500nm show it is very high
Absorptivity.
Therefore, about the method for preparing anodised aluminium solar energy absorbing coating, there are deposited metal particles in the prior art
More single, solar energy all band absorptivity is not high, in the problem that 300 DEG C or more oxidation film coating high-temp thermal stability are poor.
Summary of the invention
In order to solve the problems existing in the prior art, the present invention, which provides, a kind of is mutually tied with anodizing technology with AC electrodeposition
The method for closing preparation solar absorption combined oxidation membrane coat, specially using anodised aluminium as substrate, with electro-deposition appropriate
Parameter and deposition formula of liquid appropriate prepare solar absorption combined oxidation membrane coat.
The present invention is to adopt the following technical scheme that realize object above:
The oxidation film electro-deposition preparation method of aluminium surface high-selenium corn and low transmitting solar spectrum, comprising the following steps:
(1) carry out anodized to aluminium alloy, anodic oxidation condition: using aluminium alloy as anode, stereotype is as yin
Pole, current density 1.2A/dm2, oxidization time 30min, 15~20 DEG C of temperature to get anodized aluminum alloy;
(2) it is dried up after washing obtained anodized aluminum alloy with distilled water, is put into phosphoric acid solution and carries out exchange expansion
Hole processing;
(3) it after washing the anodized aluminum alloy after reaming with distilled water, is put into deposition liquid and carries out AC electrodeposition,
To obtain the final product.
Further, the electrolyte for carrying out anodic oxidation to aluminium alloy in the step (1) is sulfuric acid solution, mass fraction
It is 15~17%.
Further, progress ac pore-enlarging processing in phosphoric acid solution is put into the step (2) specifically: in 105g/L phosphorus
Ac pore-enlarging in acid solution, alternating voltage are 4V (crest voltage), presoak 10s, pore-enlargement 600s, and temperature is 25 DEG C.
Further, the condition of AC electrodeposition is carried out in the step (3) specifically: deposition voltage is the (peak 6V~12V
Threshold voltage), sedimentation time be 300s~900s, 25 DEG C~55 DEG C of depositing temperature, a-c cycle 50Hz.
Further, the deposition liquid composition in the step (3) are as follows: 40g/L NiSO4·6H2O、4g/L CuSO4、25g/
L H3BO4(pH=4.0), 15g/L MgSO4·7H2O and 3g/L C6H5O7(NH4)3。
Further, it needs to carry out aluminum alloy materials pre-treatment before carrying out anodized to aluminium alloy, specifically: it will
Aluminum alloy materials are placed on 45g/L NaOH, the 2g/L C that temperature is 70 DEG C12H25SO4Alkaline etching 3min in the mixed solution of Na, then,
Aluminum alloy materials after alkaline etching are rinsed with water completely, 10%H is put into2SO4, 4%HNO3Ash disposal 4min in mixed solution, then will
Anodized is carried out after aluminum alloy materials ultrapure water after ash disposal.
Further, aluminum alloy materials of the present invention are 6063 aluminium alloys.
The present invention is using the above-mentioned attainable beneficial effect of technical solution:
The present invention combines preparation solar absorption combined oxidation membrane coat with AC electrodeposition using anodizing technology,
It is multiple with electro-deposition parameter appropriate and deposition formula of liquid appropriate preparation solar absorption specially using anodised aluminium as substrate
Close oxidation membrane coat.The combined oxidation membrane coat is CuAl2O3The solar absorption of/Cu-Ni composite nanorod array structure
Coating, after tested its absorptivity α=0.87~0.91, emissivity ε=0.18~0.26, quality factor α/ε=3.8~4.9.Its
In, dielectric Al2O3、CuAl2O4And the three-component compound system that Ni metal-Ni nano particle is constituted prevents Cu, Ni clipped wire
Son oxidation, through 600 DEG C of high-temperature process of highest for 24 hours after, oxidation membrane coat absorptivity, emissivity fluctuate very little, it is more stable.
The present invention is with easy to operate, cost is relatively low, coating binding force is secured, solar absorption quality factor is higher, high-temperature thermal stability
The advantages that property is preferable.
Specific embodiment
It is prepared by the combined oxidation membrane coat of 1 aluminium surface high-selenium corn of embodiment and low transmitting solar spectrum
(1) aluminum alloy materials aluminum alloy materials pre-treatment: are placed on 45g/L NaOH, the 2g/L that temperature is 70 DEG C
C12H25SO4Then aluminum alloy materials after alkaline etching are rinsed with water and are completely put into 10% by alkaline etching 3min in the mixed solution of Na
H2SO4, 4%HNO3Ash disposal 4min in mixed solution, then by after the aluminum alloy materials ultrapure water after ash disposal, it is spare;
(2) anodic oxidation: the aluminum alloy materials after pre-treatment being put into the sulfuric acid that concentration is 15% and are aoxidized, with
Aluminum alloy materials are as anode, and stereotype is as cathode, oxidate current 1.2A/dm2, oxidization time 30min, temperature is
15 DEG C to get anodized aluminum alloy;
(3) ac pore-enlarging: the aluminium alloy pure water rinsing after oxidation is clean, after drying, it is put into 105g/L H3PO4Phosphoric acid
Aluminum alloy materials are connect anode by solution, and graphite plate connects cathode, and alternating voltage is 4V (crest voltage), presoaks 10s, pore-enlargement
For 600s, temperature is 25 DEG C;
(4) electro-deposition Cu-Ni composite nanometer particle: by the aluminum alloy materials after reaming after, drying clean with pure water rinsing
It being put into deposition liquid and carries out electro-deposition, deposition voltage is 6V (crest voltage), sedimentation time 600s, depositing temperature are 40 DEG C,
A-c cycle is 50Hz, wherein deposition liquid is by 40g/L NiSO4·6H2O、4g/L CuSO4、25g/L H3BO4(pH=4.0),
15g/L MgSO4·7H2O、3g/L C6H5O7(NH4)3Composition.
Obtaining combined oxidation membrane coat absorptivity is 0.87, emissivity 0.22, quality factor 3.81.It is thermally treated,
Thermostabilization maximum temperature is 400 DEG C.
It is prepared by the combined oxidation membrane coat of 2 aluminium surface high-selenium corn of embodiment and low transmitting solar spectrum
(1) aluminum alloy materials aluminum alloy materials pre-treatment: are placed on 45g/L NaOH, the 2g/L that temperature is 70 DEG C
C12H25SO4Then aluminum alloy materials after alkaline etching are rinsed with water and are completely put into 10% by alkaline etching 3min in the mixed solution of Na
H2SO4, 4%HNO3Ash disposal 4min in mixed solution, then by after the aluminum alloy materials ultrapure water after ash disposal, it is spare;
(2) anodic oxidation: the aluminum alloy materials after pre-treatment being put into the sulfuric acid that concentration is 17% and are aoxidized, with
Aluminum alloy materials are as anode, and stereotype is as cathode, oxidate current 1.2A/dm2, oxidization time 30min, temperature is
20 DEG C to get anodized aluminum alloy;
(3) ac pore-enlarging: the aluminium alloy pure water rinsing after oxidation is clean, after drying, it is put into 105g/L H3PO4Phosphoric acid
Aluminum alloy materials are connect anode by solution, and graphite plate connects cathode, and alternating voltage is 4V (crest voltage), presoaks 10s, pore-enlargement
For 600s, temperature is 25 DEG C;
(4) electro-deposition Cu-Ni composite nanometer particle: by the aluminum alloy materials after reaming after, drying clean with pure water rinsing
It being put into deposition liquid and carries out electro-deposition, deposition voltage is 6V (crest voltage), sedimentation time 900s, depositing temperature are 55 DEG C,
A-c cycle is 50Hz, wherein deposition liquid is by 40g/L NiSO4·6H2O、4g/L CuSO4、25g/L H3BO4(pH=4.0),
15g/L MgSO4·7H2O、3g/L C6H5O7(NH4)3Composition.
Obtaining combined oxidation membrane coat absorptivity is 0.95, emissivity 0.20, quality factor 4.60.It is thermally treated,
Thermostabilization maximum temperature is 500 DEG C.
It is prepared by the combined oxidation membrane coat of 3 aluminium surface high-selenium corn of embodiment and low transmitting solar spectrum
(1) aluminum alloy materials aluminum alloy materials pre-treatment: are placed on 45g/L NaOH, the 2g/L that temperature is 70 DEG C
C12H25SO4Then aluminum alloy materials after alkaline etching are rinsed with water and are completely put into 10% by alkaline etching 3min in the mixed solution of Na
H2SO4, 4%HNO3Ash disposal 4min in mixed solution, then by after the aluminum alloy materials ultrapure water after ash disposal, it is spare;
(2) anodic oxidation: the aluminum alloy materials after pre-treatment being put into the sulfuric acid that concentration is 16% and are aoxidized, with
Aluminum alloy materials are as anode, and stereotype is as cathode, oxidate current 1.2A/dm2, oxidization time 30min, temperature is
18 DEG C to get anodized aluminum alloy;
(3) ac pore-enlarging: the aluminium alloy pure water rinsing after oxidation is clean, after drying, it is put into 105g/L H3PO4Phosphoric acid
Aluminum alloy materials are connect anode by solution, and graphite plate connects cathode, and alternating voltage is 4V (crest voltage), presoaks 10s, pore-enlargement
For 600s, temperature is 25 DEG C;
(4) electro-deposition Cu-Ni composite nanometer particle: by the aluminum alloy materials after reaming after, drying clean with pure water rinsing
It being put into deposition liquid and carries out electro-deposition, deposition voltage is 9V (crest voltage), sedimentation time 300s, depositing temperature are 40 DEG C,
A-c cycle is 50Hz, wherein deposition liquid is by 40g/L NiSO4·6H2O、4g/L CuSO4、25g/L H3BO4(pH=4.0),
15g/L MgSO4·7H2O、3g/L C6H5O7(NH4)3Composition.
Obtaining combined oxidation membrane coat absorptivity is 0.89, emissivity 0.23, quality factor 3.88.It is thermally treated,
Thermostabilization maximum temperature is 400 DEG C.
It is prepared by the combined oxidation membrane coat of 4 aluminium surface high-selenium corn of embodiment and low transmitting solar spectrum
(1) aluminum alloy materials aluminum alloy materials pre-treatment: are placed on 45g/L NaOH, the 2g/L that temperature is 70 DEG C
C12H25SO4Then aluminum alloy materials after alkaline etching are rinsed with water and are completely put into 10% by alkaline etching 3min in the mixed solution of Na
H2SO4, 4%HNO3Ash disposal 4min in mixed solution, then by after the aluminum alloy materials ultrapure water after ash disposal, it is spare;
(2) anodic oxidation: the aluminum alloy materials after pre-treatment being put into the sulfuric acid that concentration is 15% and are aoxidized, with
Aluminum alloy materials are as anode, and stereotype is as cathode, oxidate current 1.2A/dm2, oxidization time 30min, temperature is
18 DEG C to get anodized aluminum alloy;
(3) ac pore-enlarging: the aluminium alloy pure water rinsing after oxidation is clean, after drying, it is put into 105g/L H3PO4Phosphoric acid
Aluminum alloy materials are connect anode by solution, and graphite plate connects cathode, and alternating voltage is 4V (crest voltage), presoaks 10s, pore-enlargement
For 600s, temperature is 25 DEG C;
(4) electro-deposition Cu-Ni composite nanometer particle: by the aluminum alloy materials after reaming after, drying clean with pure water rinsing
It being put into deposition liquid and carries out electro-deposition, deposition voltage is 9V (crest voltage), sedimentation time 900s, depositing temperature are 25 DEG C,
A-c cycle is 50Hz, wherein deposition liquid is by 40g/L NiSO4·6H2O、4g/L CuSO4、25g/L H3BO4(pH=4.0),
15g/L MgSO4·7H2O、3g/L C6H5O7(NH4)3Composition.
Obtaining combined oxidation membrane coat absorptivity is 0.92, emissivity 0.20, quality factor 4.51.It is thermally treated,
Thermostabilization maximum temperature is 600 DEG C.
It is prepared by the combined oxidation membrane coat of 5 aluminium surface high-selenium corn of embodiment and low transmitting solar spectrum
(1) aluminum alloy materials aluminum alloy materials pre-treatment: are placed on 45g/L NaOH, the 2g/L that temperature is 70 DEG C
C12H25SO4Then aluminum alloy materials after alkaline etching are rinsed with water and are completely put into 10% by alkaline etching 3min in the mixed solution of Na
H2SO4, 4%HNO3Ash disposal 4min in mixed solution, then by after the aluminum alloy materials ultrapure water after ash disposal, it is spare;
(2) anodic oxidation: the aluminum alloy materials after pre-treatment being put into the sulfuric acid that concentration is 17% and are aoxidized, with
Aluminum alloy materials are as anode, and stereotype is as cathode, oxidate current 1.2A/dm2, oxidization time 30min, temperature is
18 DEG C to get anodized aluminum alloy;
(3) ac pore-enlarging: the aluminium alloy pure water rinsing after oxidation is clean, after drying, it is put into 105g/L H3PO4Phosphoric acid
Aluminum alloy materials are connect anode by solution, and graphite plate connects cathode, and alternating voltage is 4V (crest voltage), presoaks 10s, pore-enlargement
For 600s, temperature is 25 DEG C;
(4) electro-deposition Cu-Ni composite nanometer particle: by the aluminum alloy materials after reaming after, drying clean with pure water rinsing
It being put into deposition liquid and carries out electro-deposition, deposition voltage is 12V (crest voltage), sedimentation time 600s, depositing temperature are 25 DEG C,
A-c cycle is 50Hz, wherein deposition liquid is by 40g/L NiSO4·6H2O、4g/L CuSO4、25g/L H3BO4(pH=4.0),
15g/L MgSO4·7H2O、3g/L C6H5O7(NH4)3Composition.
Obtaining combined oxidation membrane coat absorptivity is 0.91, emissivity 0.18, quality factor 4.92.It is thermally treated,
Thermostabilization maximum temperature is 600 DEG C.
It is prepared by the combined oxidation membrane coat of 6 aluminium surface high-selenium corn of embodiment and low transmitting solar spectrum
(1) aluminum alloy materials aluminum alloy materials pre-treatment: are placed on 45g/L NaOH, the 2g/L that temperature is 70 DEG C
C12H25SO4Then aluminum alloy materials after alkaline etching are rinsed with water and are completely put into 10% by alkaline etching 3min in the mixed solution of Na
H2SO4, 4%HNO3Ash disposal 4min in mixed solution, then by after the aluminum alloy materials ultrapure water after ash disposal, it is spare;
(2) anodic oxidation: the aluminum alloy materials after pre-treatment being put into the sulfuric acid that concentration is 16% and are aoxidized, with
Aluminum alloy materials are as anode, and stereotype is as cathode, oxidate current 1.2A/dm2, oxidization time 30min, temperature is
20 DEG C to get anodized aluminum alloy;
(3) ac pore-enlarging: the aluminium alloy pure water rinsing after oxidation is clean, after drying, it is put into 105g/L H3PO4Phosphoric acid
Aluminum alloy materials are connect anode by solution, and graphite plate connects cathode, and alternating voltage is 4V (crest voltage), presoaks 10s, pore-enlargement
For 600s, temperature is 25 DEG C;
(4) electro-deposition Cu-Ni composite nanometer particle: by the aluminum alloy materials after reaming after, drying clean with pure water rinsing
It being put into deposition liquid and carries out electro-deposition, deposition voltage is 12V (crest voltage), sedimentation time 900s, depositing temperature are 40 DEG C,
A-c cycle is 50Hz, wherein deposition liquid is by 40g/L NiSO4·6H2O、4g/L CuSO4、25g/L H3BO4(pH=4.0),
15g/L MgSO4·7H2O、3g/L C6H5O7(NH4)3Composition.
Obtaining combined oxidation membrane coat absorptivity is 0.92, emissivity 0.26, quality factor 3.45.It is thermally treated,
Thermostabilization maximum temperature is 500 DEG C.
What has been described above is only a preferred embodiment of the present invention, it is noted that for those of ordinary skill in the art
For, without departing from the concept of the premise of the invention, various modifications and improvements can be made, these belong to the present invention
Protection scope.
Claims (1)
1. the oxidation film electro-deposition preparation method of aluminium surface high-selenium corn and low transmitting solar spectrum, which is characterized in that the oxidation
Film electrodeposition preparation method the following steps are included:
(1) carry out anodized to aluminium alloy, anodic oxidation condition: using aluminium alloy as anode, stereotype is as cathode, electricity
Current density 1.2A/dm2, oxidization time 30min, 15 ~ 20 DEG C of temperature to get anodized aluminum alloy;
(2) it is dried up after washing obtained anodized aluminum alloy with distilled water, is put into phosphoric acid solution and carries out at ac pore-enlarging
Reason;
(3) it after washing the anodized aluminum alloy after reaming with distilled water, is put into deposition liquid and carries out AC electrodeposition, i.e.,
, deposition liquid composition are as follows: 40g/L NiSO4·6H2O、4g/L CuSO4、25g/L H3BO3、15g/L MgSO4·7H2O and 3g/
L C6H5O7(NH4)3;
It needs to carry out aluminum alloy materials pre-treatment before carrying out anodized to aluminium alloy, specifically: aluminum alloy materials are put
45g/L NaOH, the 2g/L C for being 70 DEG C in temperature12H25SO4Alkaline etching 3min in the mixed solution of Na, then, by the aluminium after alkaline etching
Alloy material is rinsed with water completely, is put into 10% H2SO4、4% HNO3Ash disposal 4min in mixed solution, then the aluminium after ash disposal is closed
Golden material ultrapure water;
The electrolyte for carrying out anodic oxidation to aluminium alloy in the step (1) is sulfuric acid solution, and mass fraction is 15 ~ 17%;
Progress ac pore-enlarging processing in phosphoric acid solution is put into the step (2) specifically: exchange in 105g/L phosphoric acid solution
Reaming, peak values of ac voltage are 4V, presoak 10s, pore-enlargement 600s, and temperature is 25 DEG C;
The condition of AC electrodeposition is carried out in the step (3) specifically: when crest voltage when electro-deposition is 6V ~ 12V, deposits
Between be 300s ~ 900s, 25 DEG C ~ 55 DEG C of depositing temperature, a-c cycle 50Hz.
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