CN106350849B - The oxidation film electro-deposition preparation method of aluminium surface high-selenium corn and low transmitting solar spectrum - Google Patents
The oxidation film electro-deposition preparation method of aluminium surface high-selenium corn and low transmitting solar spectrum Download PDFInfo
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- 238000004070 electrodeposition Methods 0.000 title claims abstract description 30
- 229910052782 aluminium Inorganic materials 0.000 title claims abstract description 15
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims abstract description 15
- 238000002360 preparation method Methods 0.000 title claims abstract description 14
- 238000001228 spectrum Methods 0.000 title claims abstract description 11
- 238000007254 oxidation reaction Methods 0.000 title claims description 51
- 230000003647 oxidation Effects 0.000 title claims description 44
- 239000004411 aluminium Substances 0.000 title description 13
- 240000008042 Zea mays Species 0.000 title description 9
- 235000005824 Zea mays ssp. parviglumis Nutrition 0.000 title description 9
- 235000002017 Zea mays subsp mays Nutrition 0.000 title description 9
- 235000005822 corn Nutrition 0.000 title description 9
- 229910052711 selenium Inorganic materials 0.000 title description 9
- 239000011669 selenium Substances 0.000 title description 9
- 229910000838 Al alloy Inorganic materials 0.000 claims abstract description 88
- 238000010521 absorption reaction Methods 0.000 claims abstract description 14
- 239000000956 alloy Substances 0.000 claims description 58
- 238000000151 deposition Methods 0.000 claims description 34
- 230000008021 deposition Effects 0.000 claims description 27
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 24
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 24
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 22
- 238000005530 etching Methods 0.000 claims description 16
- 239000011259 mixed solution Substances 0.000 claims description 16
- 239000000243 solution Substances 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 11
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 10
- 229910021642 ultra pure water Inorganic materials 0.000 claims description 8
- 239000012498 ultrapure water Substances 0.000 claims description 8
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 5
- 238000007743 anodising Methods 0.000 claims description 5
- 239000012153 distilled water Substances 0.000 claims description 4
- 230000008569 process Effects 0.000 claims description 4
- 239000003792 electrolyte Substances 0.000 claims description 2
- 239000003513 alkali Substances 0.000 claims 1
- WRUGWIBCXHJTDG-UHFFFAOYSA-L magnesium sulfate heptahydrate Chemical compound O.O.O.O.O.O.O.[Mg+2].[O-]S([O-])(=O)=O WRUGWIBCXHJTDG-UHFFFAOYSA-L 0.000 claims 1
- 238000000576 coating method Methods 0.000 abstract description 14
- 239000011248 coating agent Substances 0.000 abstract description 12
- 239000002131 composite material Substances 0.000 abstract description 9
- 229910002482 Cu–Ni Inorganic materials 0.000 abstract description 8
- 239000000463 material Substances 0.000 abstract description 7
- 239000002073 nanorod Substances 0.000 abstract description 3
- 239000007888 film coating Substances 0.000 abstract description 2
- 238000009501 film coating Methods 0.000 abstract description 2
- 229910018565 CuAl Inorganic materials 0.000 abstract 1
- 230000001590 oxidative effect Effects 0.000 abstract 1
- 239000012528 membrane Substances 0.000 description 20
- 239000007788 liquid Substances 0.000 description 17
- 238000002203 pretreatment Methods 0.000 description 13
- 238000001035 drying Methods 0.000 description 12
- 229910052564 epsomite Inorganic materials 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 7
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 7
- 229910017604 nitric acid Inorganic materials 0.000 description 7
- 238000004062 sedimentation Methods 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- -1 Phosphoric acid Aluminum Chemical compound 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 6
- 239000010439 graphite Substances 0.000 description 6
- 229910002804 graphite Inorganic materials 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000002848 electrochemical method Methods 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 229910000553 6063 aluminium alloy Inorganic materials 0.000 description 1
- 229910018563 CuAl2 Inorganic materials 0.000 description 1
- 229910018576 CuAl2O4 Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/18—After-treatment, e.g. pore-sealing
- C25D11/20—Electrolytic after-treatment
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Treatment Of Metals (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
本发明公开了一种铝表面高吸收与低发射太阳光谱的氧化膜电沉积制备方法，以铝合金为氧化基材、分四个步骤实现：一、铝合金表面前处理；二、铝合金阳极氧化；三、将得到的阳极氧化模板进行交流扩孔；四、将扩孔后的阳极氧化铝合金板进行交流电沉积。实验得到CuAl2O3/Cu‑Ni复合纳米棒阵列结构的太阳能吸收涂层，经测试其吸收率α＝0.87～0.91、发射率ε＝0.18～0.26、品质因子α/ε＝3.8～4.9。本发明得到的氧化膜涂层吸收率、发射率波动很小，比较稳定。本发明具有操作简单、成本较低、涂层结合力牢固、太阳能吸收品质因子较高、高温热稳定性较好等优点。The invention discloses an oxide film electrodeposition preparation method with high absorption and low emission solar spectrum on the aluminum surface. The aluminum alloy is used as the oxidized base material and is realized in four steps: 1. pretreatment of the aluminum alloy surface; 2. aluminum alloy anode oxidizing; 3. performing AC hole reaming on the obtained anodized template; 4. performing AC electrodeposition on the anodized aluminum alloy plate after hole reaming. The solar energy absorption coating of CuAl 2 O 3 /Cu-Ni composite nanorod array structure was obtained experimentally, and the absorption rate α=0.87～0.91, the emissivity ε=0.18～0.26, and the quality factor α/ε=3.8～4.9. The absorption rate and emissivity of the oxide film coating obtained by the invention have little fluctuation and are relatively stable. The invention has the advantages of simple operation, low cost, firm coating binding force, high solar energy absorption quality factor, good high temperature thermal stability and the like.
Description
Technical field
The invention belongs to solar energy heat absorbing field of material technology, are related to a kind of anodizing technology and AC electrodeposition phase
In conjunction with the method for preparation solar absorption combined oxidation membrane coat, more particularly to using anodised aluminium as substrate, use is appropriate
Electro-deposition parameter and deposition formula of liquid appropriate prepare solar absorption combined oxidation membrane coat.
Background technique
Solar energy directly by the way of be mainly photothermal conversion technology.Photothermal conversion technology is widely used in the sun
On energy heat collector, solar energy absorbing coating is the key components of heat collector.The method of solar energy absorbing coating is main at present
There are coating method, electrochemical method, vacuum evaporation, magnetron sputtering method etc..But all in place of Shortcomings, the coating of cladding process preparation
It is poor with basal body binding force, it is easy to fall off, weatherability is poor, and it is easy to aging, and also collecting efficiency is low；The coating of electrochemical process preparation,
Thermal stability is poor under the conditions of high temperature, is only limitted to cryogenic conditions use, and preparation process has environmental pollution；Magnetic control splashes
Method higher cost is penetrated, production efficiency is low, and working condition is harsh, and material source is few, and sputtering voltage is very high, and misoperation may be to people
Life security threatens, and is difficult to promote to large-scale industrial production.Aluminum alloy base material is the very good material of optical property
Material, it is very excellent to infrared waves reflecting properties.For solar energy absorbing coating, surface is generated more by anodic oxidation
The nano metal ion of high-absorbility has good protective effect in the oxidation film device to hole of hole, it is therefore prevented that the bad erosion of external environment
And interference.But its solar absorptance is not ideal enough, and absorber coatings thermal stability is poor, hot environment application not enough at
It is ripe.
According to " solar energy materials and solar battery " the 94th phase in 2010, the reports of page 1578 to 1581, Ding et al. is for the first time
It is sunk in situ in alumina pore using electrochemical method and obtains composite nanorod array, which has good light absorption,
But its coating temperature is more than that 300 DEG C of later coating quality factors are begun to decline.Illustrating it, thermal stability is not under the conditions of high temperature
It is good.
According to " Energy Procedia " the 57th phase in 2014, the reports of page 2733 to 2742, Samuel Santiago et al.
It deposited single metallic nickel, the oxygen of preparation into anodic alumina films hole under the conditions of different alternating voltages and a-c cycle
Change film layer and show as lower reflectivity in visible region, but its shown near near-infrared 1500nm~2500nm it is higher
Reflectivity.So its combined oxidation film layer not solar energy mainly absorb spectral coverage 300nm~2500nm show it is very high
Absorptivity.
Therefore, about the method for preparing anodised aluminium solar energy absorbing coating, there are deposited metal particles in the prior art
More single, solar energy all band absorptivity is not high, in the problem that 300 DEG C or more oxidation film coating high-temp thermal stability are poor.
Summary of the invention
In order to solve the problems existing in the prior art, the present invention, which provides, a kind of is mutually tied with anodizing technology with AC electrodeposition
The method for closing preparation solar absorption combined oxidation membrane coat, specially using anodised aluminium as substrate, with electro-deposition appropriate
Parameter and deposition formula of liquid appropriate prepare solar absorption combined oxidation membrane coat.
The present invention is to adopt the following technical scheme that realize object above:
The oxidation film electro-deposition preparation method of aluminium surface high-selenium corn and low transmitting solar spectrum, comprising the following steps:
(1) carry out anodized to aluminium alloy, anodic oxidation condition: using aluminium alloy as anode, stereotype is as yin
Pole, current density 1.2A/dm2, oxidization time 30min, 15~20 DEG C of temperature to get anodized aluminum alloy；
(2) it is dried up after washing obtained anodized aluminum alloy with distilled water, is put into phosphoric acid solution and carries out exchange expansion
Hole processing；
(3) it after washing the anodized aluminum alloy after reaming with distilled water, is put into deposition liquid and carries out AC electrodeposition,
To obtain the final product.
Further, the electrolyte for carrying out anodic oxidation to aluminium alloy in the step (1) is sulfuric acid solution, mass fraction
It is 15~17%.
Further, progress ac pore-enlarging processing in phosphoric acid solution is put into the step (2) specifically: in 105g/L phosphorus
Ac pore-enlarging in acid solution, alternating voltage are 4V (crest voltage), presoak 10s, pore-enlargement 600s, and temperature is 25 DEG C.
Further, the condition of AC electrodeposition is carried out in the step (3) specifically: deposition voltage is the (peak 6V~12V
Threshold voltage), sedimentation time be 300s~900s, 25 DEG C~55 DEG C of depositing temperature, a-c cycle 50Hz.
Further, the deposition liquid composition in the step (3) are as follows: 40g/L NiSO4·6H2O、4g/L CuSO4、25g/
L H3BO4(pH=4.0), 15g/L MgSO4·7H2O and 3g/L C6H5O7(NH4)3。
Further, it needs to carry out aluminum alloy materials pre-treatment before carrying out anodized to aluminium alloy, specifically: it will
Aluminum alloy materials are placed on 45g/L NaOH, the 2g/L C that temperature is 70 DEG C12H25SO4Alkaline etching 3min in the mixed solution of Na, then,
Aluminum alloy materials after alkaline etching are rinsed with water completely, 10%H is put into2SO4, 4%HNO3Ash disposal 4min in mixed solution, then will
Anodized is carried out after aluminum alloy materials ultrapure water after ash disposal.
Further, aluminum alloy materials of the present invention are 6063 aluminium alloys.
The present invention is using the above-mentioned attainable beneficial effect of technical solution:
The present invention combines preparation solar absorption combined oxidation membrane coat with AC electrodeposition using anodizing technology,
It is multiple with electro-deposition parameter appropriate and deposition formula of liquid appropriate preparation solar absorption specially using anodised aluminium as substrate
Close oxidation membrane coat.The combined oxidation membrane coat is CuAl2O3The solar absorption of/Cu-Ni composite nanorod array structure
Coating, after tested its absorptivity α=0.87~0.91, emissivity ε=0.18~0.26, quality factor α/ε=3.8~4.9.Its
In, dielectric Al2O3、CuAl2O4And the three-component compound system that Ni metal-Ni nano particle is constituted prevents Cu, Ni clipped wire
Son oxidation, through 600 DEG C of high-temperature process of highest for 24 hours after, oxidation membrane coat absorptivity, emissivity fluctuate very little, it is more stable.
The present invention is with easy to operate, cost is relatively low, coating binding force is secured, solar absorption quality factor is higher, high-temperature thermal stability
The advantages that property is preferable.
Specific embodiment
It is prepared by the combined oxidation membrane coat of 1 aluminium surface high-selenium corn of embodiment and low transmitting solar spectrum
(1) aluminum alloy materials aluminum alloy materials pre-treatment: are placed on 45g/L NaOH, the 2g/L that temperature is 70 DEG C
C12H25SO4Then aluminum alloy materials after alkaline etching are rinsed with water and are completely put into 10% by alkaline etching 3min in the mixed solution of Na
H2SO4, 4%HNO3Ash disposal 4min in mixed solution, then by after the aluminum alloy materials ultrapure water after ash disposal, it is spare；
(2) anodic oxidation: the aluminum alloy materials after pre-treatment being put into the sulfuric acid that concentration is 15% and are aoxidized, with
Aluminum alloy materials are as anode, and stereotype is as cathode, oxidate current 1.2A/dm2, oxidization time 30min, temperature is
15 DEG C to get anodized aluminum alloy；
(3) ac pore-enlarging: the aluminium alloy pure water rinsing after oxidation is clean, after drying, it is put into 105g/L H3PO4Phosphoric acid
Aluminum alloy materials are connect anode by solution, and graphite plate connects cathode, and alternating voltage is 4V (crest voltage), presoaks 10s, pore-enlargement
For 600s, temperature is 25 DEG C；
(4) electro-deposition Cu-Ni composite nanometer particle: by the aluminum alloy materials after reaming after, drying clean with pure water rinsing
It being put into deposition liquid and carries out electro-deposition, deposition voltage is 6V (crest voltage), sedimentation time 600s, depositing temperature are 40 DEG C,
A-c cycle is 50Hz, wherein deposition liquid is by 40g/L NiSO4·6H2O、4g/L CuSO4、25g/L H3BO4(pH=4.0),
15g/L MgSO4·7H2O、3g/L C6H5O7(NH4)3Composition.
Obtaining combined oxidation membrane coat absorptivity is 0.87, emissivity 0.22, quality factor 3.81.It is thermally treated,
Thermostabilization maximum temperature is 400 DEG C.
It is prepared by the combined oxidation membrane coat of 2 aluminium surface high-selenium corn of embodiment and low transmitting solar spectrum
(1) aluminum alloy materials aluminum alloy materials pre-treatment: are placed on 45g/L NaOH, the 2g/L that temperature is 70 DEG C
C12H25SO4Then aluminum alloy materials after alkaline etching are rinsed with water and are completely put into 10% by alkaline etching 3min in the mixed solution of Na
H2SO4, 4%HNO3Ash disposal 4min in mixed solution, then by after the aluminum alloy materials ultrapure water after ash disposal, it is spare；
(2) anodic oxidation: the aluminum alloy materials after pre-treatment being put into the sulfuric acid that concentration is 17% and are aoxidized, with
Aluminum alloy materials are as anode, and stereotype is as cathode, oxidate current 1.2A/dm2, oxidization time 30min, temperature is
20 DEG C to get anodized aluminum alloy；
(3) ac pore-enlarging: the aluminium alloy pure water rinsing after oxidation is clean, after drying, it is put into 105g/L H3PO4Phosphoric acid
Aluminum alloy materials are connect anode by solution, and graphite plate connects cathode, and alternating voltage is 4V (crest voltage), presoaks 10s, pore-enlargement
For 600s, temperature is 25 DEG C；
(4) electro-deposition Cu-Ni composite nanometer particle: by the aluminum alloy materials after reaming after, drying clean with pure water rinsing
It being put into deposition liquid and carries out electro-deposition, deposition voltage is 6V (crest voltage), sedimentation time 900s, depositing temperature are 55 DEG C,
A-c cycle is 50Hz, wherein deposition liquid is by 40g/L NiSO4·6H2O、4g/L CuSO4、25g/L H3BO4(pH=4.0),
15g/L MgSO4·7H2O、3g/L C6H5O7(NH4)3Composition.
Obtaining combined oxidation membrane coat absorptivity is 0.95, emissivity 0.20, quality factor 4.60.It is thermally treated,
Thermostabilization maximum temperature is 500 DEG C.
It is prepared by the combined oxidation membrane coat of 3 aluminium surface high-selenium corn of embodiment and low transmitting solar spectrum
(1) aluminum alloy materials aluminum alloy materials pre-treatment: are placed on 45g/L NaOH, the 2g/L that temperature is 70 DEG C
C12H25SO4Then aluminum alloy materials after alkaline etching are rinsed with water and are completely put into 10% by alkaline etching 3min in the mixed solution of Na
H2SO4, 4%HNO3Ash disposal 4min in mixed solution, then by after the aluminum alloy materials ultrapure water after ash disposal, it is spare；
(2) anodic oxidation: the aluminum alloy materials after pre-treatment being put into the sulfuric acid that concentration is 16% and are aoxidized, with
Aluminum alloy materials are as anode, and stereotype is as cathode, oxidate current 1.2A/dm2, oxidization time 30min, temperature is
18 DEG C to get anodized aluminum alloy；
(3) ac pore-enlarging: the aluminium alloy pure water rinsing after oxidation is clean, after drying, it is put into 105g/L H3PO4Phosphoric acid
Aluminum alloy materials are connect anode by solution, and graphite plate connects cathode, and alternating voltage is 4V (crest voltage), presoaks 10s, pore-enlargement
For 600s, temperature is 25 DEG C；
(4) electro-deposition Cu-Ni composite nanometer particle: by the aluminum alloy materials after reaming after, drying clean with pure water rinsing
It being put into deposition liquid and carries out electro-deposition, deposition voltage is 9V (crest voltage), sedimentation time 300s, depositing temperature are 40 DEG C,
A-c cycle is 50Hz, wherein deposition liquid is by 40g/L NiSO4·6H2O、4g/L CuSO4、25g/L H3BO4(pH=4.0),
15g/L MgSO4·7H2O、3g/L C6H5O7(NH4)3Composition.
Obtaining combined oxidation membrane coat absorptivity is 0.89, emissivity 0.23, quality factor 3.88.It is thermally treated,
Thermostabilization maximum temperature is 400 DEG C.
It is prepared by the combined oxidation membrane coat of 4 aluminium surface high-selenium corn of embodiment and low transmitting solar spectrum
(1) aluminum alloy materials aluminum alloy materials pre-treatment: are placed on 45g/L NaOH, the 2g/L that temperature is 70 DEG C
C12H25SO4Then aluminum alloy materials after alkaline etching are rinsed with water and are completely put into 10% by alkaline etching 3min in the mixed solution of Na
H2SO4, 4%HNO3Ash disposal 4min in mixed solution, then by after the aluminum alloy materials ultrapure water after ash disposal, it is spare；
(2) anodic oxidation: the aluminum alloy materials after pre-treatment being put into the sulfuric acid that concentration is 15% and are aoxidized, with
Aluminum alloy materials are as anode, and stereotype is as cathode, oxidate current 1.2A/dm2, oxidization time 30min, temperature is
18 DEG C to get anodized aluminum alloy；
(3) ac pore-enlarging: the aluminium alloy pure water rinsing after oxidation is clean, after drying, it is put into 105g/L H3PO4Phosphoric acid
Aluminum alloy materials are connect anode by solution, and graphite plate connects cathode, and alternating voltage is 4V (crest voltage), presoaks 10s, pore-enlargement
For 600s, temperature is 25 DEG C；
(4) electro-deposition Cu-Ni composite nanometer particle: by the aluminum alloy materials after reaming after, drying clean with pure water rinsing
It being put into deposition liquid and carries out electro-deposition, deposition voltage is 9V (crest voltage), sedimentation time 900s, depositing temperature are 25 DEG C,
A-c cycle is 50Hz, wherein deposition liquid is by 40g/L NiSO4·6H2O、4g/L CuSO4、25g/L H3BO4(pH=4.0),
15g/L MgSO4·7H2O、3g/L C6H5O7(NH4)3Composition.
Obtaining combined oxidation membrane coat absorptivity is 0.92, emissivity 0.20, quality factor 4.51.It is thermally treated,
Thermostabilization maximum temperature is 600 DEG C.
It is prepared by the combined oxidation membrane coat of 5 aluminium surface high-selenium corn of embodiment and low transmitting solar spectrum
(1) aluminum alloy materials aluminum alloy materials pre-treatment: are placed on 45g/L NaOH, the 2g/L that temperature is 70 DEG C
C12H25SO4Then aluminum alloy materials after alkaline etching are rinsed with water and are completely put into 10% by alkaline etching 3min in the mixed solution of Na
H2SO4, 4%HNO3Ash disposal 4min in mixed solution, then by after the aluminum alloy materials ultrapure water after ash disposal, it is spare；
(2) anodic oxidation: the aluminum alloy materials after pre-treatment being put into the sulfuric acid that concentration is 17% and are aoxidized, with
Aluminum alloy materials are as anode, and stereotype is as cathode, oxidate current 1.2A/dm2, oxidization time 30min, temperature is
18 DEG C to get anodized aluminum alloy；
(3) ac pore-enlarging: the aluminium alloy pure water rinsing after oxidation is clean, after drying, it is put into 105g/L H3PO4Phosphoric acid
Aluminum alloy materials are connect anode by solution, and graphite plate connects cathode, and alternating voltage is 4V (crest voltage), presoaks 10s, pore-enlargement
For 600s, temperature is 25 DEG C；
(4) electro-deposition Cu-Ni composite nanometer particle: by the aluminum alloy materials after reaming after, drying clean with pure water rinsing
It being put into deposition liquid and carries out electro-deposition, deposition voltage is 12V (crest voltage), sedimentation time 600s, depositing temperature are 25 DEG C,
A-c cycle is 50Hz, wherein deposition liquid is by 40g/L NiSO4·6H2O、4g/L CuSO4、25g/L H3BO4(pH=4.0),
15g/L MgSO4·7H2O、3g/L C6H5O7(NH4)3Composition.
Obtaining combined oxidation membrane coat absorptivity is 0.91, emissivity 0.18, quality factor 4.92.It is thermally treated,
Thermostabilization maximum temperature is 600 DEG C.
It is prepared by the combined oxidation membrane coat of 6 aluminium surface high-selenium corn of embodiment and low transmitting solar spectrum
(1) aluminum alloy materials aluminum alloy materials pre-treatment: are placed on 45g/L NaOH, the 2g/L that temperature is 70 DEG C
C12H25SO4Then aluminum alloy materials after alkaline etching are rinsed with water and are completely put into 10% by alkaline etching 3min in the mixed solution of Na
H2SO4, 4%HNO3Ash disposal 4min in mixed solution, then by after the aluminum alloy materials ultrapure water after ash disposal, it is spare；
(2) anodic oxidation: the aluminum alloy materials after pre-treatment being put into the sulfuric acid that concentration is 16% and are aoxidized, with
Aluminum alloy materials are as anode, and stereotype is as cathode, oxidate current 1.2A/dm2, oxidization time 30min, temperature is
20 DEG C to get anodized aluminum alloy；
(3) ac pore-enlarging: the aluminium alloy pure water rinsing after oxidation is clean, after drying, it is put into 105g/L H3PO4Phosphoric acid
Aluminum alloy materials are connect anode by solution, and graphite plate connects cathode, and alternating voltage is 4V (crest voltage), presoaks 10s, pore-enlargement
For 600s, temperature is 25 DEG C；
(4) electro-deposition Cu-Ni composite nanometer particle: by the aluminum alloy materials after reaming after, drying clean with pure water rinsing
It being put into deposition liquid and carries out electro-deposition, deposition voltage is 12V (crest voltage), sedimentation time 900s, depositing temperature are 40 DEG C,
A-c cycle is 50Hz, wherein deposition liquid is by 40g/L NiSO4·6H2O、4g/L CuSO4、25g/L H3BO4(pH=4.0),
15g/L MgSO4·7H2O、3g/L C6H5O7(NH4)3Composition.
Obtaining combined oxidation membrane coat absorptivity is 0.92, emissivity 0.26, quality factor 3.45.It is thermally treated,
Thermostabilization maximum temperature is 500 DEG C.
What has been described above is only a preferred embodiment of the present invention, it is noted that for those of ordinary skill in the art
For, without departing from the concept of the premise of the invention, various modifications and improvements can be made, these belong to the present invention
Protection scope.
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| CN114000180B (en) * | 2021-11-02 | 2023-04-11 | 哈尔滨工业大学 | Method for protecting aluminum alloy surface based on infrared laser absorption and application |
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