CN106324990A - Preparation method of screen mesh photoresist with high water resistance and easy to demould - Google Patents
Preparation method of screen mesh photoresist with high water resistance and easy to demould Download PDFInfo
- Publication number
- CN106324990A CN106324990A CN201610715424.5A CN201610715424A CN106324990A CN 106324990 A CN106324990 A CN 106324990A CN 201610715424 A CN201610715424 A CN 201610715424A CN 106324990 A CN106324990 A CN 106324990A
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- China
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- solution
- preparation
- high water
- water resistance
- demould
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/0163—Non ionic diazonium compounds, e.g. diazosulphonates; Precursors thereof, e.g. triazenes
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Treatments For Attaching Organic Compounds To Fibrous Goods (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
The invention discloses a preparation method of screen mesh photoresist with high water resistance and easy to demould. The preparation method comprises the following steps of 1) fully dissolving 40g of alkali polyvinyl alcohol with 300ml of water to obtain a polyvinyl alcohol solution with mass concentration of 0.114g/ml; 2) sequentially and accurately adding 12g of polyvinyl acetate emulsion, 5g of acrylamide, 3g of ethyl methacrylate, 0.4g of ethanediamine, 1.8g of photoinitiator, 0.3g of polyacrylamide emulsifier, 0.5g of emulsified silicone defoamer and 0.8g of coloring agent to the solution obtained in the step 1); performing reaction of the solution obtained in the step 2) at 85 DEG C for three hours, and continuously stirring the solution during reaction to form an uniformly-dispersed emulsion system; and 4) cooling the solution obtained in the step 3) to a room temperature, standing for 24 hours and deforming, and preserving the product in a sealing and shading condition. The preparation method of the screen mesh photoresist with high water resistance and easy to demould has the advantages of high water resistance and easiness in demoulding.
Description
Technical field
Present invention relates particularly to the preparation method of a kind of high water-fast easy demoulding silk screen photosensitive emulsion.
Background technology
Photosensitizer (photosensitizer), also known as sensitizer, sensitizer, photocrosslinking agent.In photochemical reaction,
Luminous energy is transferred on the reactant that some are insensitive to visible ray to improve or to expand the material of its photosensitive property.
In photochemical reaction, have molecule, they only absorb photons and transfer energy to those can not absorbing light
The molecule of son, promotees it and chemical reaction occurs, itself be then not involved in chemical reaction, return to original state, and this quasi-molecule claims
For photosensitizer.The photochemical reaction caused by photosensitizer is referred to as photosensitivity reaction.Generally, people are adjoint raw have oxygen molecule to participate in
The photosensitivity reaction of thing effect is referred to as photodynamic reaction, calls light power photodynamic reaction can be caused to destroy cyto-architectural medicine
Medicine, i.e. photosensitive drug.
What the present market of photosensitizer commonly used is that the diazo resin that common p-xylene-4-diazol synthesizes is photosensitive
Agent.There is poor water resistance, the shortcoming being difficult to demoulding.
Summary of the invention
For overcoming the problems of the prior art, the invention provides a kind of employing ethylenediamine, 3-methoxy diphenylamine-4-weight
Nitrogen salt and traditional hexichol amine salt 1:1:1, water-tolerant, the preparation method of the water-fast easy demoulding silk screen photosensitive emulsion of height of easy demoulding.
Technology and method in order to solve the employing of the above-mentioned problem present invention are as follows:
The preparation method of a kind of high water-fast easy demoulding silk screen photosensitive emulsion, it is characterised in that comprise the following steps:
1) fully dissolve the polyvinyl alcohol of 40g alkalization with 300ml water, obtain the polyvinyl alcohol that mass concentration is 0.114g/ml
Solution；
2) in step 1) solution of gained the most accurately adds 12g polyvinyl acetate emulsion, 5g acrylamide, 3g methyl
Ethyl acrylate, 0.4g ethylenediamine, 1.8g light trigger 0.3g polyacrylamide amine emulsifier, 0.5g emulsified silicone oil defoamer and
0.8g stain；
3) by step 2) in the solution 85 DEG C reaction 3h of gained, period is stirred continuously, forms finely dispersed emulsion system；
4) by step 3) in the solution of gained be down to room temperature, after standing 24h froth breaking, sealing is kept in Dark Place.
The invention have the benefit that employing ethylenediamine, 3-methoxy diphenylamine-4-diazol and traditional hexichol amine salt
1:1:1 is used in mixed way, and makes latex solid content, viscosity be obtained for bigger lifting, and meanwhile, resolution and resistance to water have also been obtained
Improving, pattern edge is apparent, and time of exposure controls at 0.5-5.5min, and resolution controls at below 0.09mm, and can be
Under giant impact, the 10-30 second does not falls off.
Detailed description of the invention
Below in conjunction with embodiment, the present invention is described in further detail, but they are not to technical solution of the present invention
Restriction, based on present invention teach that any conversion made, all fall within protection scope of the present invention.
The preparation method of a kind of high water-fast easy demoulding silk screen photosensitive emulsion, it is characterised in that comprise the following steps:
1) fully dissolve the polyvinyl alcohol of 40g alkalization with 300ml water, obtain the polyvinyl alcohol that mass concentration is 0.114g/ml
Solution；
2) in step 1) solution of gained the most accurately adds 12g polyvinyl acetate emulsion, 5g acrylamide, 3g methyl
Ethyl acrylate, 0.4g ethylenediamine, 1.8g light trigger 0.3g polyacrylamide amine emulsifier, 0.5g emulsified silicone oil defoamer and
0.8g stain；
3) by step 2) in the solution 85 DEG C reaction 3h of gained, period is stirred continuously, forms finely dispersed emulsion system；
4) by step 3) in the solution of gained be down to room temperature, after standing 24h froth breaking, sealing is kept in Dark Place.
Experimental example
Water-fast for height obtained by the present invention easy demoulding silk screen photosensitive emulsion is carried out parameter testing, obtains parameter such as following table:
The invention have the benefit that employing ethylenediamine, 3-methoxy diphenylamine-4-diazol and traditional hexichol amine salt
1:1:1 is used in mixed way, and makes latex solid content, viscosity be obtained for bigger lifting, and meanwhile, resolution and resistance to water have also been obtained
Improving, pattern edge is apparent, and time of exposure controls at 0.5-5.5min, and resolution controls at below 0.09mm, and can be
Under giant impact, the 10-30 second does not falls off.
The above, the only detailed description of the invention of the present invention, but protection scope of the present invention is not limited thereto, and any
The change expected without creative work or replacement, all should contain within protection scope of the present invention, therefore, and the present invention's
Protection domain should be as the criterion with the protection domain that claims are limited.
Claims (1)
1. the preparation method of one kind high water-fast easy demoulding silk screen photosensitive emulsion, it is characterised in that comprise the following steps:
1) fully dissolve the polyvinyl alcohol of 40g alkalization with 300ml water, obtain the poly-vinyl alcohol solution that mass concentration is 0.114g/ml；
2) in step 1) solution of gained the most accurately adds 12g polyvinyl acetate emulsion, 5g acrylamide, 3g metering system
Acetoacetic ester, 0.4g ethylenediamine, 1.8g light trigger 0.3g polyacrylamide amine emulsifier, 0.5g emulsified silicone oil defoamer and 0.8g dye
Toner；
3) by step 2) in the solution 85 DEG C reaction 3h of gained, period is stirred continuously, forms finely dispersed emulsion system；
4) by step 3) in the solution of gained be down to room temperature, after standing 24h froth breaking, sealing is kept in Dark Place.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610715424.5A CN106324990A (en) | 2016-08-23 | 2016-08-23 | Preparation method of screen mesh photoresist with high water resistance and easy to demould |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610715424.5A CN106324990A (en) | 2016-08-23 | 2016-08-23 | Preparation method of screen mesh photoresist with high water resistance and easy to demould |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106324990A true CN106324990A (en) | 2017-01-11 |
Family
ID=57790301
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610715424.5A Pending CN106324990A (en) | 2016-08-23 | 2016-08-23 | Preparation method of screen mesh photoresist with high water resistance and easy to demould |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106324990A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106527048A (en) * | 2016-11-25 | 2017-03-22 | 江苏环宇纺织科技有限公司 | Preparation method of photo-sensitive resist with high water resistance and easy flame retardance |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1452011A (en) * | 2003-04-24 | 2003-10-29 | 上海中大科技发展有限公司 | Water- and solvent-resistant diazo screen printing platemaking photoresist |
| CN101957558A (en) * | 2010-10-20 | 2011-01-26 | 武强县武环印刷材料有限公司 | Screen printing photosensitive emulsion and production method thereof |
| CN103760750A (en) * | 2013-12-13 | 2014-04-30 | 浙江荣生科技有限公司 | Preparation method and application method of light-cured silk-screen printing photosensitive glue |
-
2016
- 2016-08-23 CN CN201610715424.5A patent/CN106324990A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1452011A (en) * | 2003-04-24 | 2003-10-29 | 上海中大科技发展有限公司 | Water- and solvent-resistant diazo screen printing platemaking photoresist |
| CN101957558A (en) * | 2010-10-20 | 2011-01-26 | 武强县武环印刷材料有限公司 | Screen printing photosensitive emulsion and production method thereof |
| CN103760750A (en) * | 2013-12-13 | 2014-04-30 | 浙江荣生科技有限公司 | Preparation method and application method of light-cured silk-screen printing photosensitive glue |
Non-Patent Citations (1)
| Title |
|---|
| 胡平藩 等: "《筛网印花》", 31 January 2005, 中国纺织出版社 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106527048A (en) * | 2016-11-25 | 2017-03-22 | 江苏环宇纺织科技有限公司 | Preparation method of photo-sensitive resist with high water resistance and easy flame retardance |
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| PB01 | Publication | ||
| PB01 | Publication | ||
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| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20170111 |