CN106277526A - A kind of improved method of stannum copper electroplate rinsing wastewater online resource embrane method closed-system performance - Google Patents
A kind of improved method of stannum copper electroplate rinsing wastewater online resource embrane method closed-system performance Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F9/00—Multistage treatment of water, waste water or sewage
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D65/00—Accessories or auxiliary operations, in general, for separation processes or apparatus using semi-permeable membranes
- B01D65/08—Prevention of membrane fouling or of concentration polarisation
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/001—Processes for the treatment of water whereby the filtration technique is of importance
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/02—Treatment of water, waste water, or sewage by heating
- C02F1/04—Treatment of water, waste water, or sewage by heating by distillation or evaporation
- C02F1/048—Purification of waste water by evaporation
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/02—Treatment of water, waste water, or sewage by heating
- C02F1/04—Treatment of water, waste water, or sewage by heating by distillation or evaporation
- C02F1/08—Thin film evaporation
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
- C02F1/441—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by reverse osmosis
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
- C02F1/442—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by nanofiltration
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/16—Nature of the water, waste water, sewage or sludge to be treated from metallurgical processes, i.e. from the production, refining or treatment of metals, e.g. galvanic wastes
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/14—Maintenance of water treatment installations
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Abstract
The present invention relates to the improved method of a kind of stannum copper electroplate rinsing wastewater online resource embrane method closed-system performance, the method be add in described stannum copper electroplate rinsing wastewater online resource embrane method closed-system mass ratio be 1:1:1～10:10:10 containing phosphono and sulfonic based polycarboxylic acid sodium, ATMP sodium and poly-aspartate ammonia tri compound reagent, addition is that to make the total concentration of its dense side of film in systems be 1.0～100ppm.Compared with prior art, the present invention has a performance being substantially improved stannum copper electroplate rinsing wastewater online resource embrane method closed-system, reduces cost, can be carried out continuously, is formed without the advantages such as secondary pollution.
Description
Technical field
The present invention relates to field of environment protection, specifically, refer to a kind of stannum copper electroplate rinsing wastewater online resource
Change the improved method of embrane method closed-system performance.
Background technology
Plating is the important process link of manufacturing, waste discharge complicated component.The average annual discharge capacity of China's electroplating wastewater
Up to 4,000,000,000 tons, wherein poaching wastewater accounts for 80%, about 3,200,000,000 tons.Tin-coated copper is a kind of main plating in China, corresponding stannum
Copper electroplate rinsing wastewater is also the electroplate rinsing wastewater that discharge capacity is bigger.Except the heavy metal pollutant containing stannum copper ion,
Possibly together with organic compound such as a considerable amount of additives, brighteners, these chemical substances enter environment, will necessarily be good for the mankind
Health and environment cause and serious harm.
Stannum copper electroplate rinsing wastewater processes most common method at present chemical precipitation method, ion exchange and membrance separation
Method, but chemical precipitation method is for the purpose of qualified discharge, and sludge quantity is big, and processing cost is high, and Heavy Metal, Sn copper is not considered as one
Plant resource reusing, cause economic benefit the most negative.Ion exchange can only realize the reuse of Heavy Metal, Sn copper ion, and other
Material such as various additives then must cannot be gone containing the various additives in addition to stannum copper ion in reuse, and waste water further
Except could discharging or reclaim afterwards, additionally, also need medicament to regenerate after ion exchange resin absorption is saturated, produce secondary pollution.Specially
A kind of method that the patent of invention of profit Application No. 201610331251.7 discloses plating piece poaching wastewater online resource, the party
Method be plating piece poaching wastewater is sequentially passed through multi-stage countercurrent cleaning, filtration, reverse-osmosis treated, nanofiltration process and evaporation and concentrating or
Direct reuse, reclaims the metal ion in plating piece poaching wastewater and additive, returns in plating piece groove as plating piece liquid, reclaims plating piece
Water in poaching wastewater, the reuse as plating piece washings, it is achieved online resourceization utilizes.Compared with prior art, this invention
Use reverse osmosis membrane assembly in front, nanofiltration membrane component posterior novel compositions mode, it is possible to effectively in reuse plating piece poaching wastewater
Heavy metal ion and various additives and water, it is achieved the online resource of plating piece poaching wastewater, and greatly reduce operation energy
Consumption and Financial cost.
Compared with chemical precipitation method and ion exchange, embrane method is not only administering method, and is a kind of method of resource,
Realize the recycling of pollutant.But embrane method there is also a shortcoming, i.e. film is vulnerable to the pollution of electroplating bath components, thus logical
Amount declines, and energy consumption increases.For reverse osmosis and NF membrane, Chemical cleaning is the main method controlling fouling membrane." Nanjing Normal University is learned
Report (natural science edition) " the 2nd phase of volume 33 " is applied to the Chemical cleaning of the reverse osmosis membrane of an electroplating wastewater processing " literary composition, to application
Reverse osmosis unit in electroplating wastewater processing has carried out the research of Chemical cleaning, removes removing heavy metals initially with 1% chlorohydric acid pickling
Pollute, then use 1%NaOH and 0.025% dodecylbenzene sodium sulfonate (SDS) mixing cleanout fluid to carry out alkali cleaning and remove face
Organic pollution, the non oxidizing bactericide 2 finally using concentration to be 50mg/L, the double bromo-3-nitrilo--propionic acid amide. of 2-
(DBNPA) biological pollution is cleaned.After cleaning, this device membrane flux under 0.5MPa is by the 13.9L/m before cleaning2H improves
To 28.3L/m2H, membrane flux returns to the 89.4% of initial stage.Obviously, chemical cleaning method also exists following drawback: need to stop
Clean；It is both needed to add abluent every time；After cleaning, waste liquid produces secondary pollution.
Summary of the invention
Defect that the purpose of the present invention is contemplated to overcome above-mentioned prior art to exist and a kind of stannum copper electroplate rinsing is provided
The improved method of waste water online resource embrane method closed-system performance.
The purpose of the present invention can be achieved through the following technical solutions: a kind of stannum copper electroplate rinsing wastewater online resource
The improved method of embrane method closed-system performance, it is characterised in that the method is at described stannum copper electroplate rinsing wastewater online resource
Change embrane method closed-system adds mass ratio be 1:1:1～10:10:10 containing phosphono and sulfonic based polycarboxylic acid sodium, aminotrimethylene
Alendronate and poly-aspartate ammonia tri compound reagent, by stannous sulfate, copper sulfate, dihydroxy two in suppression stannum copper electroplating liquid
The materialization polymerization process of the complexity of benzene sulfone and monobutyl phenyl natrium phenolsulfonicum and nigecose 5 kinds of compositions of slurry, especially abolishes dihydroxy hexichol
The central role of sulfone, stops inorganic organic combined pollution to be formed, the membrane flux that long-time maintenance is higher, improves the plating drift of stannum copper
Wash the performance of waste water online resource embrane method closed-system, reduce economic operation cost.Containing phosphono and sulfonic based polycarboxylic acid sodium, amino three
The addition of methylene phosphonic acid sodium and poly-aspartate ammonia tri compound reagent is that the total concentration making its dense side of film in systems is
1.0～100ppm.
Described stannum copper electroplate rinsing wastewater online resource embrane method closed-system includes plating piece groove, and is depended on by pipeline
The rinse bath of secondary connection, regulating reservoir, low-lift pump, cartridge filter, high-pressure pump, reverse osmosis membrane apparatus, nano filter membrance device and falling liquid film
Formula vaporizer, downward film evaporator is additionally provided with concentrated solution outlet and condensation-water drain, and wherein, concentrated solution outlet is also connected with plating piece
Groove, condensation-water drain is also connected with rinse bath, forms embrane method closed-system.
Described rinse bath is provided with at least one-level.
The clear water side of described reverse osmosis membrane apparatus connects rinse bath, and dense water side connects nano filter membrance device, containing phosphine in system
The addition of sulfonic group polycarboxylic acids sodium, ATMP sodium and poly-aspartate ammonia tri compound reagent is for making it instead
The dense water side total concentration of permeable membrane device is 1.0～100ppm.
The clear water side of described nano filter membrance device connects the influent side of reverse osmosis unit, and dense water side connects falling film type evaporation
Device.
Described containing phosphono and sulfonic based polycarboxylic acid sodium, ATMP sodium and poly-aspartate ammonia tri compound reagent
Can add at arbitrary place in described stannum copper electroplate rinsing wastewater online resource embrane method closed-system.
Described containing phosphono and sulfonic based polycarboxylic acid sodium, ATMP sodium and poly-aspartate ammonia tri compound reagent
It is crystal habit or solution state.
Compared with prior art, the invention have the advantages that
1. additive is containing phosphono and sulfonic based polycarboxylic acid sodium, ATMP sodium and the examination of poly-aspartate ammonia tri compound
Agent can suppress stannous sulfate in stannum copper electroplating liquid, copper sulfate, dihydroxydiphenylsulisomer and monobutyl phenyl natrium phenolsulfonicum and nigecose slurry 5
Plant the complicated materialization polymerization process of composition, especially abolish the central role of dihydroxydiphenylsulisomer, effectively stop inorganic organic
Combined pollution formed, thus maintain higher membrane flux for a long time, be substantially improved stannum copper electroplate rinsing wastewater online resource
The performance of embrane method closed-system, reduces economic operation cost.
2. chemical cleaning method cleans every time and is both needed to add abluent.The poly-carboxylic of inhibitor used in the present invention base Han phosphono and sulfonic
Acid sodium, ATMP sodium and poly-aspartate ammonia tri compound reagent have inertia, in system operation not
There is electrode reaction, the basic no consumption of whole process, be the most also not required to add abluent every time, saved Financial cost；
3. chemical cleaning method needs cleaning during shutdown when flux depression is more.At stannum copper electroplate rinsing wastewater online resource
In embrane method system, plating solution is circulation Guan Bi, and inertia inhibitor is contained phosphono and sulfonic based polycarboxylic acid sodium, aminotrimethylene by the present invention
Alendronate and poly-aspartate ammonia tri compound reagent add plating solution and carry out closed circulation, are therefore not required to stop, can be carried out continuously；
4. chemical cleaning method necessarily leads to waste liquid, and needs process and could discharge.Inertia inhibitor sulphur Han phosphine in the present invention
Acidic group polycarboxylic acids sodium, ATMP sodium and poly-aspartate ammonia tri compound reagent are circulations, and whole process is not
Produce extra waste liquid, be formed without secondary pollution.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of stannum copper electroplate rinsing wastewater online resource embrane method closed-system.
Detailed description of the invention
The present invention is described in detail with specific embodiment below in conjunction with the accompanying drawings.
As it is shown in figure 1, stannum copper electroplate rinsing wastewater online resource embrane method closed-system includes plating piece groove 1, and pass through
Rinse bath that pipeline is sequentially connected with, regulating reservoir 5, low-lift pump 6, cartridge filter 7, high-pressure pump 8, reverse osmosis membrane apparatus 9, NF membrane
Device 10 and downward film evaporator 11, downward film evaporator 11 is additionally provided with concentrated solution outlet and condensation-water drain, wherein, concentrates
Liquid outlet is also connected with plating piece groove 1, and condensation-water drain is also connected with rinse bath, and rinse bath is provided with three grades, as described in Figure: one-level in parallel
2, two grades of rinse baths 3 of rinse bath and three grades of rinse baths 4.
The clear water side of described reverse osmosis membrane apparatus 9 connects rinse bath, reclaims the clear water after reverse osmosis membrane apparatus 9 filters,
Dense water side connects nano filter membrance device 10, filters further, containing phosphono and sulfonic based polycarboxylic acid sodium, aminotrimethylene phosphine in system
The addition of acid sodium and poly-aspartate ammonia tri compound reagent is to make tri compound reagent in the dense water side of reverse osmosis membrane apparatus 9
Total concentration is 1.0～100ppm.
The clear water side of described nano filter membrance device 10 connects the influent side of reverse osmosis membrane apparatus 9, reclaims clear water, and dense water side is even
Connect downward film evaporator 11.
Whole system forms embrane method closed-system.
Plating piece moves towards a by plating piece and electroplates in electroplating bath 1, and the rinsing of electroplating wastewater cleaned groove three stage countercurrent is the denseest
Contracting, comes together in regulating reservoir 5, under low-lift pump 3 acts on, removes more than 5 μm solid particulate matters through cartridge filter 4, protects follow-up
The safe operation of membrane filter.Being pressurized to 1.0Mpa through high-pressure pump 8, plating piece poaching wastewater enters preposition reverse osmosis membrane assembly 6, reverse osmosis
Water outlet c in clear water side can be fully achieved the requirement of plating piece rinsing water quality thoroughly, with the additional clean water b in three grades of rinse baths after recovery
Mixing；Plating piece poaching wastewater concentration obtains reverse osmosis concentrated water side water outlet d, and is delivered in rearmounted nanofiltration membrane component 10 carry further
Dense.Nanofiltration membrane component clear water side water outlet e, it is impossible to reach the requirement of plating piece rinsing water quality, enter preposition reverse osmosis membrane as water inlet
Assembly 9 purifies further.Nanofiltration membrane component dense water side water outlet f is in downward film evaporator 11 after further concentration, and gained concentrates
Liquid g enters plating piece groove 1, and condensed water h is as washings reuse.
Embodiment 1
The poly-carboxylic of the base Han phosphono and sulfonic is added at regulating reservoir in stannum copper electroplate rinsing wastewater online resource embrane method closed-system
Acid sodium, ATMP sodium and poly-aspartate ammonia tri compound reagent crystals, mass ratio is 1:1:1, after interpolation
In system, the total concentration of the dense side of film is 1.0ppm, by stannous sulfate, copper sulfate, dihydroxydiphenylsulisomer in suppression stannum copper electroplating liquid
With the complicated materialization polymerization process that monobutyl phenyl natrium phenolsulfonicum and nigecose starch 5 kinds of compositions, especially abolish dihydroxydiphenylsulisomer
Central role, stops inorganic organic combined pollution to be formed, the membrane flux that long-time maintenance is higher, improves stannum copper electroplate rinsing and gives up
The performance of water online resource embrane method closed-system, reduces economic operation cost.
The present embodiment implementation result:
1. additive is containing phosphono and sulfonic based polycarboxylic acid sodium, ATMP sodium and the examination of poly-aspartate ammonia tri compound
Agent can suppress stannous sulfate in stannum copper electroplating liquid, copper sulfate, dihydroxydiphenylsulisomer and monobutyl phenyl natrium phenolsulfonicum and nigecose slurry 5
Plant the complicated materialization polymerization process of composition, especially abolish the central role of dihydroxydiphenylsulisomer, effectively stop inorganic organic
Combined pollution formed.Compared with chemical cleaning method, maintain the operation time lengthening 4 times of more than 80% membrane flux, be substantially improved
The performance of stannum copper electroplate rinsing wastewater online resource embrane method closed-system, reduces economic operation cost.
Inhibitor the most used in the present invention is containing phosphono and sulfonic based polycarboxylic acid sodium, ATMP sodium and poly-Radix Asparagi ammonia
Acid ammonia tri compound reagent has inertia, and electrode reaction do not occurs in system operation, the basic no consumption of whole process, because of
This is also not required to add abluent every time.Compared with chemical cleaning method, save economic operation cost 50%；
3. inertia inhibitor is contained phosphono and sulfonic based polycarboxylic acid sodium, ATMP sodium and poly-aspartate by the present invention
Ammonia tri compound reagent adds plating solution and carries out closed circulation, compared with chemical cleaning method, is not required to stop, can be carried out continuously；
4. in the present invention, inertia inhibitor contains phosphono and sulfonic based polycarboxylic acid sodium, ATMP sodium and poly-aspartate
Ammonia tri compound reagent is circulation, and whole process does not produce extra waste liquid, is formed without secondary pollution.With chemical cleaning method phase
Ratio, has saved the processing cost cleaning waste liquid, has accounted for the 35% of operating cost.
Embodiment 2
The poly-carboxylic of the base Han phosphono and sulfonic is added at electroplating bath in stannum copper electroplate rinsing wastewater online resource embrane method closed-system
Acid sodium, ATMP sodium and poly-aspartate ammonia tri compound reagent solution, mass ratio is 1:5:10, after interpolation
In system, the total concentration of the dense side of film is 50.0ppm, by stannous sulfate, copper sulfate, dihydroxy hexichol in suppression stannum copper electroplating liquid
The materialization polymerization process of the complexity of sulfone and monobutyl phenyl natrium phenolsulfonicum and nigecose 5 kinds of compositions of slurry, especially abolishes dihydroxydiphenylsulisomer
Central role, stop inorganic organic combined pollution to be formed, long-time maintain higher membrane flux, improve stannum copper electroplate rinsing
The performance of waste water online resource embrane method closed-system, reduces economic operation cost.
The present embodiment implementation result:
1. additive is containing phosphono and sulfonic based polycarboxylic acid sodium, ATMP sodium and the examination of poly-aspartate ammonia tri compound
Agent can suppress stannous sulfate in stannum copper electroplating liquid, copper sulfate, dihydroxydiphenylsulisomer and monobutyl phenyl natrium phenolsulfonicum and nigecose slurry 5
Plant the complicated materialization polymerization process of composition, especially abolish the central role of dihydroxydiphenylsulisomer, effectively stop inorganic organic
Combined pollution formed.Compared with chemical cleaning method, maintain the operation time lengthening 8 times of more than 80% membrane flux, be substantially improved
The performance of stannum copper electroplate rinsing wastewater online resource embrane method closed-system, reduces economic operation cost.
Inhibitor the most used in the present invention is containing phosphono and sulfonic based polycarboxylic acid sodium, ATMP sodium and poly-Radix Asparagi ammonia
Acid ammonia tri compound reagent has inertia, and electrode reaction do not occurs in system operation, the basic no consumption of whole process, because of
This is also not required to add abluent every time.Compared with chemical cleaning method, save economic operation cost 60%；
3. inertia inhibitor is contained phosphono and sulfonic based polycarboxylic acid sodium, ATMP sodium and poly-aspartate by the present invention
Ammonia tri compound reagent adds plating solution and carries out closed circulation, compared with chemical cleaning method, is not required to stop, can be carried out continuously；
4. in the present invention, inertia inhibitor contains phosphono and sulfonic based polycarboxylic acid sodium, ATMP sodium and poly-aspartate
Ammonia tri compound reagent is circulation, and whole process does not produce extra waste liquid, is formed without secondary pollution.With chemical cleaning method phase
Ratio, has saved the processing cost cleaning waste liquid, has accounted for the 35% of operating cost.
Embodiment 3
The poly-carboxylic of the base Han phosphono and sulfonic is added at regulating reservoir in stannum copper electroplate rinsing wastewater online resource embrane method closed-system
Acid sodium, ATMP sodium and poly-aspartate ammonia tri compound reagent solution, mass ratio is 10:5:1, after interpolation
In system, the total concentration of the dense side of film is 100.0ppm, by stannous sulfate, copper sulfate, dihydroxy hexichol in suppression stannum copper electroplating liquid
The materialization polymerization process of the complexity of sulfone and monobutyl phenyl natrium phenolsulfonicum and nigecose 5 kinds of compositions of slurry, especially abolishes dihydroxydiphenylsulisomer
Central role, stop inorganic organic combined pollution to be formed, long-time maintain higher membrane flux, improve stannum copper electroplate rinsing
The performance of waste water online resource embrane method closed-system, reduces economic operation cost.
The present embodiment implementation result:
1. additive is containing phosphono and sulfonic based polycarboxylic acid sodium, ATMP sodium and the examination of poly-aspartate ammonia tri compound
Agent can suppress stannous sulfate in stannum copper electroplating liquid, copper sulfate, dihydroxydiphenylsulisomer and monobutyl phenyl natrium phenolsulfonicum and nigecose slurry 5
Plant the complicated materialization polymerization process of composition, especially abolish the central role of dihydroxydiphenylsulisomer, effectively stop inorganic organic
Combined pollution formed.Compared with chemical cleaning method, maintain the operation time lengthening 15 times of more than 80% membrane flux, be substantially improved
The performance of stannum copper electroplate rinsing wastewater online resource embrane method closed-system, reduces economic operation cost.
Inhibitor the most used in the present invention is containing phosphono and sulfonic based polycarboxylic acid sodium, ATMP sodium and poly-Radix Asparagi ammonia
Acid ammonia tri compound reagent has inertia, and electrode reaction do not occurs in system operation, the basic no consumption of whole process, because of
This is also not required to add abluent every time.Compared with chemical cleaning method, save economic operation cost 70%；
3. inertia inhibitor is contained phosphono and sulfonic based polycarboxylic acid sodium, ATMP sodium and poly-aspartate by the present invention
Ammonia tri compound reagent adds plating solution and carries out closed circulation, compared with chemical cleaning method, is not required to stop, can be carried out continuously；
4. in the present invention, inertia inhibitor contains phosphono and sulfonic based polycarboxylic acid sodium, ATMP sodium and poly-aspartate
Ammonia tri compound reagent is circulation, and whole process does not produce extra waste liquid, is formed without secondary pollution.With chemical cleaning method phase
Ratio, has saved the processing cost cleaning waste liquid, has accounted for the 35% of operating cost.
Claims (7)
1. the improved method of a stannum copper electroplate rinsing wastewater online resource embrane method closed-system performance, it is characterised in that should
Method is that addition mass ratio is 1:1:1～10:10 in described stannum copper electroplate rinsing wastewater online resource embrane method closed-system:
10 containing phosphono and sulfonic based polycarboxylic acid sodium, ATMP sodium and poly-aspartate ammonia tri compound reagent, addition is
The total concentration making its dense side of film in systems is 1.0～100ppm.
The improvement of a kind of stannum copper electroplate rinsing wastewater online resource embrane method closed-system performance the most according to claim 1
Method, it is characterised in that described stannum copper electroplate rinsing wastewater online resource embrane method closed-system includes plating piece groove (1), with
And be sequentially connected with by pipeline rinse bath, regulating reservoir (5), low-lift pump (6), cartridge filter (7), high-pressure pump (8), reverse osmosis
Film device (9), nano filter membrance device (10) and downward film evaporator (11), downward film evaporator is additionally provided with concentrated solution outlet on (11)
And condensation-water drain, wherein, concentrated solution outlet is also connected with plating piece groove (1), and condensation-water drain is also connected with rinse bath, forms embrane method and closes
Assembly system.
The improvement of a kind of stannum copper electroplate rinsing wastewater online resource embrane method closed-system performance the most according to claim 2
Method, it is characterised in that described rinse bath is provided with at least one-level.
The improvement of a kind of stannum copper electroplate rinsing wastewater online resource embrane method closed-system performance the most according to claim 2
Method, it is characterised in that the clear water side of described reverse osmosis membrane apparatus (9) connects rinse bath, dense water side connects nano filter membrance device
(10), containing phosphono and sulfonic based polycarboxylic acid sodium, ATMP sodium and poly-aspartate ammonia tri compound reagent in system
Addition is 1.0～100ppm for making it in the dense water side total concentration of reverse osmosis membrane apparatus (9).
The improvement of a kind of stannum copper electroplate rinsing wastewater online resource embrane method closed-system performance the most according to claim 2
Method, it is characterised in that the clear water side of described nano filter membrance device (10) connects the influent side of reverse osmosis membrane apparatus (9), dense water
Side connects downward film evaporator (11).
The improvement of a kind of stannum copper electroplate rinsing wastewater online resource embrane method closed-system performance the most according to claim 1
Method, it is characterised in that described containing phosphono and sulfonic based polycarboxylic acid sodium, ATMP sodium and poly-aspartate ammonia ternary
Complex reagent can add at arbitrary place in described stannum copper electroplate rinsing wastewater online resource embrane method closed-system.
The improvement of a kind of stannum copper electroplate rinsing wastewater online resource embrane method closed-system performance the most according to claim 1
Method, it is characterised in that described containing phosphono and sulfonic based polycarboxylic acid sodium, ATMP sodium and poly-aspartate ammonia ternary
Complex reagent is crystal habit or solution state.
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