CN106154674A - Display device - Google Patents

Display device Download PDF

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Publication number
CN106154674A
CN106154674A CN201510182273.7A CN201510182273A CN106154674A CN 106154674 A CN106154674 A CN 106154674A CN 201510182273 A CN201510182273 A CN 201510182273A CN 106154674 A CN106154674 A CN 106154674A
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CN
China
Prior art keywords
display device
course
electric connection
dummy pattern
transparent substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201510182273.7A
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Chinese (zh)
Other versions
CN106154674B (en
Inventor
张君维
黄霈霖
黄昆隆
蔡五柳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
E Ink Holdings Inc
Prime View International Co Ltd
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Prime View International Co Ltd
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Priority to CN201510182273.7A priority Critical patent/CN106154674B/en
Publication of CN106154674A publication Critical patent/CN106154674A/en
Application granted granted Critical
Publication of CN106154674B publication Critical patent/CN106154674B/en
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/165Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field
    • G02F1/166Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field characterised by the electro-optical or magneto-optical effect
    • G02F1/167Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field characterised by the electro-optical or magneto-optical effect by electrophoresis
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G3/00Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
    • G09G3/20Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
    • G09G3/34Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source
    • G09G3/3433Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using light modulating elements actuated by an electric field and being other than liquid crystal devices and electrochromic devices
    • G09G3/344Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using light modulating elements actuated by an electric field and being other than liquid crystal devices and electrochromic devices based on particles moving in a fluid or in a gas, e.g. electrophoretic devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/124Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits

Abstract

The invention discloses a kind of display device, comprise transparent substrates, multiple virtual pixel, perimeter circuit layer and display element layer.Virtual pixel is arranged on transparent substrates.Each virtual pixel comprises dummy pattern key-course.Perimeter circuit layer is arranged on transparent substrates, for applying the voltage of same polarity to dummy pattern key-course.Display element layer covers transparent substrates and virtual pixel.Perimeter circuit layer and dummy pattern key-course separated by gap, this gap allows light to reflex to transparent substrates from display element layer.According to the display device of the present invention, the display element layer above gap can be seen from the dorsal view of transparent substrates, thus observe the color of microcapsule in display element layer, and the difference or exception by color judges to damage position.

Description

Display device
Technical field
The present invention relates to a kind of display device, and damage the display device of position particularly to a kind of observable.
Background technology
Typical electrophoretic display apparatus comprises electrophoresis layer and thin-film transistor array base-plate.Electrophoresis layer is arranged On thin-film transistor array base-plate, in use, thin-film transistor array base-plate can produce electric field, with The white charged particles controlling the microcapsule in electrophoresis layer moves with charged black particles, thus shows picture.
Thin-film transistor array base-plate comprises multiple display pixel and multiple virtual pixel (dummy Pixel), these virtual pixels are around display pixel, and it is identical to allow the inner annular zone of display element layer present Color, and visually form housing.
In general, when the circuit of thin-film transistor array base-plate damages, can be from the back side of glass substrate Observe the color of microcapsule, and the exception by color judges it is which bar circuit damages.But, for The whole inner annular zone allowing display element layer forms continuous print housing pattern, and maker can be at this outer shroud Shape is covered with metal electrode below region, to control the microcapsule of whole inner annular zone.In such structure Under, when the circuit of thin-film transistor array base-plate damages, due to metal electrode, system is positioned at display element layer And between glass substrate, so the microcapsule display element layer cannot be seen from glass substrate dorsal view, And cannot learn which bar circuit damages.
Summary of the invention
In consideration of it, it is an object of the present invention to provide a kind of observable to damage the display device of position.
In order to achieve the above object, according to an embodiment of the invention, a kind of display device comprises Photopolymer substrate, multiple virtual pixel, perimeter circuit layer and display element layer.Virtual pixel is arranged at printing opacity On substrate.Each virtual pixel comprises dummy pattern key-course.Perimeter circuit layer is arranged on transparent substrates, For applying the voltage of same polarity to dummy pattern key-course.Display element layer covers transparent substrates and void Intend pixel.Perimeter circuit layer and dummy pattern key-course separated by gap, this gap allows light from display element Layer reflexes to transparent substrates.
In one or more embodiments of the present invention, virtual pixel comprises at least one and is electrically connected with knot Structure, connects dummy pattern key-course and perimeter circuit layer and through gap.
In one or more embodiments of the present invention, perimeter circuit layer and dummy pattern key-course along First direction arranges, and the quantity of electric connection structure is multiple, and these a little electric connection structures are along second Direction arranges, first direction and second direction substantial orthogonality.
In one or more embodiments of the present invention, adjacent two electric connection structures are in a second direction Intervening gaps, this spacing is less than or equal to 20 microns.
In one or more embodiments of the present invention, electric connection structure comprises first be connected leads Body and at least one the second conductor.The length direction of the first conductor is substantially parallel to first direction.The The length direction of two conductors is substantially parallel to second direction.
In one or more embodiments of the present invention, electric connection structure is L-shaped structure.
In one or more embodiments of the present invention, electric connection structure is T-shaped structure.
In one or more embodiments of the present invention, the gap of electric connection structure exposed portion.
In one or more embodiments of the present invention, a part for display element layer is positioned at above gap And by the electric field controls of electric connection structure.
In one or more embodiments of the present invention, display device also comprises multiple display pixel, if It is placed on transparent substrates, and shown element layer covers.These a little virtual pixels show picture around this jointly Element, at least two display pixels are applied in the voltage of opposed polarity.
In one or more embodiments of the present invention, at least one of virtual pixel comprises film crystal Pipe, thin film transistor (TFT) and dummy pattern key-course are insulation, are wherein positioned at the display above virtual pixel A part for element layer is by the electric field controls of dummy pattern key-course.
In the above-described embodiment, owing to being positioned at the other perimeter circuit layer of virtual pixel and dummy pattern control Layer separated by gap, and this gap allow light reflex to transparent substrates from display element layer, therefore, detect people Member can see the display element layer above gap from the dorsal view of transparent substrates, thus can be by transparent substrates The color of microcapsule in display element layer is observed at the back side, and the difference or exception by color judges to damage Position.
The above be used merely to explain problem that the present invention to be solved, the technological means solving problem and Its effect produced etc., the detail of the present invention is by detailed in embodiment below and relevant drawings Thin introduction.
Accompanying drawing explanation
For the above and other purpose of the present invention, feature, advantage can be become apparent with embodiment, institute Being described as follows of accompanying drawing:
Fig. 1 is the generalized section of the display device according to one embodiment of the present invention;
Fig. 2 is that the fragmentary top of the thin-film transistor array base-plate according to one embodiment of the present invention regards signal Figure;
Fig. 3 is the thin-film transistor array base-plate generalized section along 3-3 line of Fig. 2;
Fig. 4 is the thin-film transistor array base-plate generalized section along 4-4 line of Fig. 2;
Fig. 5 is that the fragmentary top of the thin-film transistor array base-plate according to another embodiment of the present invention is depending on showing It is intended to;
Fig. 6 is that the fragmentary top of the thin-film transistor array base-plate according to another embodiment of the present invention is depending on showing It is intended to;And
Fig. 7 is that the fragmentary top of the thin-film transistor array base-plate according to another embodiment of the present invention is depending on showing It is intended to.
Detailed description of the invention
Below by the multiple embodiments with the open present invention of accompanying drawing, as clearly stated, many concrete Details will be explained in the following description.But, those skilled in the art it should be appreciated that this In invention section embodiment, these concrete details not necessarily, therefore shall not be applied to limit this Bright.Additionally, for the sake of simplifying accompanying drawing, structure usual known in some and element in the accompanying drawings will be with simply The mode of signal describes.
Fig. 1 is the generalized section of the display device according to one embodiment of the present invention.As it is shown in figure 1, Display device comprises thin-film transistor array base-plate 10 and display element layer 20.Display element layer 20 sets It is placed on thin-film transistor array base-plate 10, and is driven to show picture by thin-film transistor array base-plate 10 Face.For example, display element layer 20 can be electrophoresis layer, and it comprises multiple microcapsule 21.Each micro-glue Capsule 21 comprises multiple light color charged particle 22 and multiple dark charged particle 23.Light color charged particle 22 Different with the electric charge that dark charged particle 23 is carried, and can be by the electric field of thin-film transistor array base-plate 10 Attract or repel, and mobile to ad-hoc location, with display pattern.
Fig. 2 is that the fragmentary top of the thin-film transistor array base-plate 10 according to one embodiment of the present invention is depending on showing It is intended to.As in figure 2 it is shown, thin-film transistor array base-plate 10 comprises transparent substrates 100, multiple virtual representation Element 200, perimeter circuit layer 300 and multiple display pixel 400, multiple data wire 500 and multiple sweep Retouch line 600.Virtual pixel 200, perimeter circuit layer 300 are arranged at transparent substrates 100 with display pixel 400 On, wherein these a little virtual pixels 200 show pixel 400 jointly a bit around this, and perimeter circuit layer 300 encloses Around these a little virtual pixels 200.In other words, virtual pixel 200 is collectively forming annular patterns, and around institute There is display pixel 400.Perimeter circuit layer 300 also forms annular patterns, and around all virtual pixels 200. Multiple data wires 500 and multiple scan line 600 are used for driving display pixel 400 to show picture.Display Pixel 400 at least both are applied in the voltage of opposed polarity, so that the display element layer 20 above it Microcapsule 21 (as shown in Figure 1) presents different colours, to demonstrate required pattern.
As in figure 2 it is shown, each virtual pixel 200 comprises dummy pattern key-course 210.Dummy pattern controls Layer 210 is electrically connected at perimeter circuit layer 300.Perimeter circuit layer 300 for apply the voltage of same polarity to The dummy pattern key-course 210 of all virtual pixels 200 so that above all dummy pattern key-courses 210 The microcapsule 21 (see Fig. 1) of display element layer 20 can present same color, thus formed continuously Housing pattern.
As in figure 2 it is shown, perimeter circuit layer 300 and the dummy pattern key-course 210 of all virtual pixels 200 Separated by gap G.Display element layer 20 (see Fig. 1) cover transparent substrates 100, virtual pixel 200 with And display pixel 400, and the display element layer 20 of part is positioned at above clearance G.This gap G allows light Transparent substrates 100 is reflexed to from display element layer 20.Consequently, it is possible to testing staff can be from transparent substrates 100 The back side (that is, back to virtual pixel 200, surface of perimeter circuit layer 300 and display pixel 400) see See the display element layer 20 above clearance G, thus observed in clearance G by the back side of transparent substrates 100 The color of microcapsule 21 in the display element layer 20 of side, and by the difference of color or abnormal judge to damage Bad position.
In some embodiments, as in figure 2 it is shown, virtual pixel 200 comprises electric connection structure 220. Electric connection structure 220 is through clearance G and connects dummy pattern key-course 210 and perimeter circuit layer 300, Whereby, perimeter circuit layer 300 can apply voltage to dummy pattern key-course by electric connection structure 220 210, to control the microcapsule 21 (see Fig. 1) of the display element layer 20 above all virtual pixels 200 Same color can be presented, thus form continuous print housing pattern.
Reflex to transparent substrates 100 in order to allow light through clearance G from display element layer 20, electrically connect The clearance G of access node structure 220 exposed portion.Even if consequently, it is possible to electric connection structure 220 is through clearance G To be electrically connected with dummy pattern key-course 210 and perimeter circuit layer 300, testing staff still can be from transparent substrates The color of the microcapsule 21 above clearance G is observed at the back side of 100, and by the different of color or abnormal next Judge to damage position.
Additionally, due to electric connection structure 220 is through clearance G, and between part display element layer 20 is positioned at Above gap G, so when perimeter circuit layer 300 applies voltage to electric connection structure 220, between being positioned at Part display element layer 20 above gap G can be by the electric field controls of electric connection structure 220, and due to electricity Property attachment structure 220 is identical with the voltage suffered by dummy pattern key-course 210, so being positioned in clearance G The part display element layer 20 of side and the part display element layer 20 being positioned at above dummy pattern key-course 210 Same color can be presented, and be collectively forming continuous print housing pattern.
In some embodiments, as in figure 2 it is shown, the part display element layer above virtual pixel 200 20 (see Fig. 1) are by the electric field controls of dummy pattern key-course 210.Virtual pixel 200 can comprise thin film Transistor 230.Dummy pattern key-course 210 comprises pixel electrode 212.Thin film transistor (TFT) 230 connects number According to line 500 and scan line 600, but thin film transistor (TFT) 230 and dummy pattern key-course 210 are insulation. Due in virtual pixel 200, the pixel electrode 212 of dummy pattern key-course 210 and thin film transistor (TFT) 230 is insulation, without being controlled by thin film transistor (TFT) 230.On the contrary, dummy pattern key-course 210 are electrically connected with perimeter circuit layer 300, and are controlled by perimeter circuit layer 300.Therefore, perimeter line Road floor 300 can pass through dummy pattern key-course 210, controls the part display element above virtual pixel 200 Layer 20.
When detecting display device, testing staff can mark at transparent substrates frontside edge, as detection people Member observes a certain data line 500 fault, and causes above its multiple display pixels 400 connected When display element layer 20 shows abnormal, testing staff need to judge that these display pixel 400 correspondences are to which Mark.But, owing to display pixel 400 has still been separated by virtual pixel 200 with transparent substrates frontside edge, So being difficult to accurately judge abnormal display pixel 400 correspondence is to which mark.Therefore, real in part Executing in mode, testing staff can be initially switched off the electric connection structure 220 of virtual pixel 200 so that virtual representation Element 200 insulate with perimeter circuit layer 300.Then, testing staff can turn on picture in the way of laser welding Element electrode 212 and thin film transistor (TFT) 230, so now, data wire 500 can pass through thin film transistor (TFT) 230 Control dummy pattern key-course 210.Therefore, when data wire 500 is abnormal, dummy pattern key-course 210 The display element layer 20 of top also can be in abnormal show, thus beneficially testing staff judges the aobvious of abnormal show Show which data line is element layer 20 correspondence, to which mark of transparent substrates frontside edge, judge with help 500 faults.
For example, form the grid of thin film transistor (TFT) 230, source electrode is positioned at virtual with the conductive layer of drain electrode The lower section of pattern key-course 210, and this conductive layer and dummy pattern key-course 210 by insulant institute every Open and insulate.When being intended to switch on pixel electrode 212 with thin film transistor (TFT) 230, user can be with laser The mode of welding punches the insulant below pixel electrode 212, and makes formation thin film transistor (TFT) 230 The conductive layer of grid is electrically connected at pixel electrode 212.Consequently, it is possible to thin film transistor (TFT) 230 can control Dummy pattern key-course 210 so that the signal of data wire 500 can be supplied to pixel electrode 212.
Portion is in point embodiment, as in figure 2 it is shown, display pixel 400 can comprise display pattern key-course 410 with thin film transistor (TFT) 430.Display pattern key-course 410 can comprise pixel electrode 412.Film crystal Pipe 430 is electrically connected at data wire 500 and scan line 600.Leading of the grid of formation thin film transistor (TFT) 430 Electric layer is electrically connected at the pixel electrode 412 of display pattern key-course 410, so thin film transistor (TFT) 430 can Control display pattern key-course 410.
Furthermore, it is understood that see Fig. 3, this figure is that the thin-film transistor array base-plate 10 of Fig. 2 is along 3-3 The generalized section of line.As it is shown on figure 3, show that pixel 400 also comprises the first insulating barrier 440, centre is led Electric layer the 450, second insulating barrier 460 and bottom conductive layer 470.Bottom conductive layer 470, second insulate Layer 460, intermediate conductive layer the 450, first insulating barrier 440 are sequentially laminated in display pattern key-course 410 On transparent substrates 100.Intermediate conductive layer 450 is positioned at bottom conductive layer 470 and display pattern key-course 410 Between, and bottom conductive layer 470 is electrically connected with display pattern key-course 410.The electricity of intermediate conductive layer 450 Position can be considered reference potential, and they are different from the current potential of bottom conductive layer 470 and display pattern key-course 410, Make intermediate conductive layer 450 and bottom conductive layer 470 can produce electric capacity between the two, and middle conduction Layer 450 and display pattern key-course 410 can produce another electric capacity between the two.Bottom conductive layer 470 Comprise gate electrode, and bottom conductive layer 470 connects scan line 600 (see Fig. 2).Intermediate conductive layer 450 comprise drain electrode and source electrode, and intermediate conductive layer 450 connects data wire 500 and (see figure 2).Also can comprise semiconductor layer between bottom conductive layer 470 and intermediate conductive layer 450 and (be not shown in this figure In), semiconductor layer, the gate electrode of bottom conductive layer 470 and the drain electrode of intermediate conductive layer 450 And source electrode can be collectively forming thin film transistor (TFT) 430 (see Fig. 2).Display pattern key-course 410 Ground is divided to run through the first insulating barrier 440 and the second insulating barrier 460 and be electrically connected with bottom conductive layer 470.Therefore, The pixel electrode 412 (see Fig. 2) of display pattern key-course 410 is electrically connected at bottom conductive layer 470 Gate electrode, thus can be controlled by thin film transistor (TFT) 430.
Fig. 4 is the thin-film transistor array base-plate 10 generalized section along 4-4 line of Fig. 2.Such as Fig. 4 Shown in, virtual pixel 200 also comprises the first insulating barrier 240, intermediate conductive layer the 250, second insulating barrier 260 And bottom conductive layer 270.Bottom conductive layer the 270, second insulating barrier 260, intermediate conductive layer 250, First insulating barrier 240 is sequentially laminated on transparent substrates 100 with dummy pattern key-course 210.Bottom is led Electric layer 270 comprises gate electrode, and bottom conductive layer 270 connects scan line 600 (see Fig. 2).In Between conductive layer 250 comprise drain electrode and source electrode, and intermediate conductive layer 250 connect data wire 500 (can Refering to Fig. 2).Also semiconductor layer can be comprised (not shown between bottom conductive layer 270 and intermediate conductive layer 250 In Yu Bentu), semiconductor layer, the gate electrode of bottom conductive layer 270 and the leakage of intermediate conductive layer 250 Pole electrode and source electrode can be collectively forming thin film transistor (TFT) 230 (see Fig. 2).First insulating barrier 240 Completely separated dummy pattern key-course 210 and intermediate conductive layer 250 so that dummy pattern key-course 210 with Intermediate conductive layer 250 phase insulate.Therefore, dummy pattern key-course 210 is not controlled by thin film transistor (TFT) 230 System, and controlled by perimeter circuit layer 300 (see Fig. 2).In some embodiments, as detection people When member is intended to detect, as shown in Fig. 2 and 4, can first cut electric connection structure 220, make dummy pattern Key-course 210 insulate with perimeter circuit layer 300, then in the way of laser welding, by dummy pattern control Layer 210 is electrically connected with bottom conductive layer 270, and makes dummy pattern key-course 210 and bottom conductive layer 270 Gate electrode be electrically connected with so that dummy pattern key-course 210 can be controlled by thin film transistor (TFT) 230, And receive the signal of data wire 500.
In some embodiments, dummy pattern key-course 210, intermediate conductive layer 250 and bottom conductive layer The material of 270 is metal, but the present invention is not limited thereto.Similarly, in some embodiments, Display pattern key-course 410, intermediate conductive layer 450 are metal with the material of bottom conductive layer 270, but The present invention is not limited thereto.In some embodiments, the material of electric connection structure 220 is metal, But the present invention is not limited thereto.
Fig. 5 is the fragmentary top of the thin-film transistor array base-plate 10a according to another embodiment of the present invention Depending on schematic diagram.As it is shown in figure 5, the master of thin-film transistor array base-plate 10 shown in present embodiment and Fig. 2 Wanting difference to be: in virtual pixel 200a, the quantity of electric connection structure 220 is multiple (such as two), To provide the higher electric field of intensity to the display element layer 20 (see Fig. 1) of top.If furthermore, it is understood that The size of virtual pixel 200a is bigger so that the electric connection structure 220 of adjacent two virtual pixel 200a Spacing excessive time, the electric field intensity of electric connection structure 220 may be not enough to control above clearance G All microcapsules 21 (see Fig. 1).But, when single virtual pixel 200a comprises multiple electric connection During structure 220, and when these electric connection structures 220 both pass through clearance G, these electric connection structures 220 can improve the electric field intensity in clearance G, thus are beneficial to control the microcapsule 21 above clearance G.
Specifically, perimeter circuit layer 300 arranges with dummy pattern key-course 210 A1 along a first direction. Multiple electric connection structures 220 arrange along second direction A2, wherein first direction A1 and second direction A2 substantial orthogonality.By above-mentioned arrangement mode, these electric connection structures 220 are in second direction A2 Upper produced lateral electric fields, can make clearance G electric field intensity in second direction A2 the most uniform.
In some embodiments, adjacent two electric connection structure 220 intervening gaps in second direction A2 d.Spacing d is less than or equal to 20 microns.Size design whereby, adjacent two electric connection structures 220 exist The lateral electric fields provided in second direction A2 can have higher intensity, and more effectively controls clearance G The microcapsule 21 of top.
In the present embodiment, these electric connection structures 220 are list structure, these list structures Length direction the most parallel, and all substantially parallel to first direction A1.It addition, these Shape structure is arranged essentially along second direction A2.For example, these electric connection structures 220 Can be the metal strip thing of substantial parallel arrangement, these metal strip things can provide the electric field that intensity is enough Control the microcapsule 21 above clearance G, and testing staff also can gap between these metal strip things That observes microcapsule 21 displays whether exception.
Fig. 6 is the fragmentary top of the thin-film transistor array base-plate 10b according to another embodiment of the present invention Depending on schematic diagram.As shown in Figure 6, present embodiment and aforementioned film transistor (TFT) array substrate 10a's is main Difference is: the electric connection structure 220b of virtual pixel 200b and aforementioned electric connection structure 220 Shape is different.Furthermore, it is understood that electric connection structure 220b comprises the first conductor 221 and the second conductor 222. First conductor 221 and the second conductor 222 are connected to connect.The length direction of the first conductor 221 is substantially It is parallel to first direction A1.The length direction of the second conductor 222 is substantially parallel to second direction A2.
When electric connection structure 220b is applied in voltage, the first conductor 221 can be in second direction A2 Lateral electric fields is provided, and the second conductor 222 can provide lateral electric fields on A1 in a first direction.Consequently, it is possible to Electric connection structure 220b can make the electric field intensity in clearance G be more uniformly distributed, in order to controlling in clearance G The microcapsule 21 (see Fig. 1) of side.
In the present embodiment, as shown in Figure 6, the second conductor 222 may be disposed at perimeter circuit layer 300 On, rather than be positioned in clearance G.Therefore, the second conductor 222 can in the case of not covering clearance G, Electric field intensity in increase and homogenization clearance G.
In the present embodiment, as shown in Figure 6, electric connection structure 220b is L-shaped structure.Concrete next Saying, the first conductor 221 and the second conductor 222 are list structure.Second conductor 222 is connected to first The end of conductor 221, and both length directions are perpendicular, and collectively form L-shaped structure.Citing comes Saying, the first conductor 221 and the second conductor 222 can be all metal strip thing, but the present invention not as Limit.
Fig. 7 is the fragmentary top of the thin-film transistor array base-plate 10c according to another embodiment of the present invention Depending on schematic diagram.As it is shown in fig. 7, present embodiment and aforementioned film transistor (TFT) array substrate 10b's is main Difference is: the electric connection structure 220c of virtual pixel 200c and aforementioned electric connection structure 220b's Shape is different.Furthermore, it is understood that electric connection structure 220c is T-shaped structure.Specifically, electrically connect Access node structure 220c can comprise the first conductor 221 and two the second conductors 222.One of them second conductor 222 Vertically being connected to the upside of the first conductor 221, another second conductor 222 is vertically connected to first The downside of conductor 221, whereby, the first conductor 221 can be collectively forming T with the two the second conductor 222 Shape structure.
By above-mentioned design, the electric connection structure 220c of this T-shaped may utilize two the second conductors 222 and increases Add the lateral electric fields intensity on A1 in a first direction, thus the electric field in homogenization clearance G further Intensity, in order to the microcapsule 21 (see Fig. 1) controlled above clearance G.
In the present embodiment, as it is shown in fig. 7, two the second conductors 222 may be contained within perimeter circuit layer On 300, rather than it is positioned in clearance G.Therefore, the two the second conductor 222 can not cover clearance G In the case of, the electric field intensity in increase and homogenization clearance G.
Although the present invention is open as above with embodiment, so it is not intended to limit the present invention, Ren Heben Skilled person, without departing from the spirit and scope of the present invention, can make various different selection and repair Changing, therefore protection scope of the present invention is limited by claims and equivalents thereof.

Claims (11)

1. a display device, it is characterised in that described display device comprises:
Transparent substrates;
Multiple virtual pixels, it is arranged on described transparent substrates, and each the plurality of virtual pixel comprises Dummy pattern key-course;
Perimeter circuit layer, it is arranged on described transparent substrates, for applying the voltage of same polarity to each Described dummy pattern key-course;And
Display element layer, it covers described transparent substrates and the plurality of virtual pixel;
Wherein said perimeter circuit layer is separated with gap, described gap mutually with each described dummy pattern key-course Light is allowed to reflex to described transparent substrates from described display element layer.
2. display device as claimed in claim 1, it is characterised in that the one of the plurality of virtual pixel Person comprises at least one electric connection structure, and it is through described gap and connects described dummy pattern key-course With described perimeter circuit layer.
3. display device as claimed in claim 2, it is characterised in that described perimeter circuit layer is with described Dummy pattern key-course arranges along a first direction, and the quantity of at least one electric connection structure described is Multiple, multiple described electric connection structures arrange along second direction, described first direction and described second Direction is vertical.
4. display device as claimed in claim 3, it is characterised in that the plurality of electric connection structure Adjacent both be separated with spacing mutually, described in be smaller than or equal to 20 microns.
5. display device as claimed in claim 3, it is characterised in that the plurality of electric connection structure One comprise the first conductor being connected and at least one the second conductor, the length of described first conductor Being oriented parallel to described first direction, the length direction of described second conductor is parallel to described second direction.
6. display device as claimed in claim 2, it is characterised in that described electric connection structure is L Shape structure.
7. display device as claimed in claim 2, it is characterised in that described electric connection structure is T Shape structure.
8. display device as claimed in claim 2, it is characterised in that described electric connection structure exposes The described gap of part.
9. display device as claimed in claim 8, it is characterised in that of described display element layer Point it is positioned at above described gap and by the electric field controls of described electric connection structure.
10. display device as claimed in claim 1, it is characterised in that described display device also comprises many Individual display pixel, it is arranged on described transparent substrates, and is covered by described display element layer, described many Individual virtual pixel jointly around the plurality of display pixel, the plurality of display pixel at least both are executed Add the voltage of opposed polarity.
11. display devices as claimed in claim 1, it is characterised in that the plurality of virtual pixel is extremely Few one comprises thin film transistor (TFT), and described thin film transistor (TFT) and described dummy pattern key-course are insulation, The part being wherein positioned at the described display element layer above above-mentioned virtual pixel is controlled by described dummy pattern The electric field controls of layer.
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JP2010224084A (en) * 2009-03-23 2010-10-07 Hitachi Displays Ltd Liquid crystal display device
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