CN106129781B - A kind of super multi-pass amplifier laser beam quality control method - Google Patents
A kind of super multi-pass amplifier laser beam quality control method Download PDFInfo
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- CN106129781B CN106129781B CN201610430579.4A CN201610430579A CN106129781B CN 106129781 B CN106129781 B CN 106129781B CN 201610430579 A CN201610430579 A CN 201610430579A CN 106129781 B CN106129781 B CN 106129781B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0071—Beam steering, e.g. whereby a mirror outside the cavity is present to change the beam direction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2308—Amplifier arrangements, e.g. MOPA
- H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
Abstract
The present invention relates to a kind of super multi-pass amplifier laser beam quality control methods, belong to laser equipment technical field, including measuring and amplifying chamber internal aberrations, and be corrected to the internal aberrations；Measure complete light path aberration, and the complete light path aberration is corrected, the present invention carries out aberration correction using stepping mode, compared with a step corrector in the prior art, multi-way intensified image difference-product can be effectively avoided to tire out problem, the wavefront correction effect optimized is obtained, the amplification laser beam quality control of super multi-way is suitable for.
Description
Technical field
The invention belongs to laser equipment technical fields, relate in particular to a kind of super multi-pass amplifier laser beam quality
Control method.
Background technology
Multi-way amplifying technique has been widely used for the energy amplification of laser pulse, enormously simplifies the knot of amplification light path
Structure.But optical element and the laser amplification medium at heat pump Pu can bring wavefront distortion in light path, seriously affect optical pulse
Beam quality after the smooth realization of amplification process and pulse amplifying.
In order to overcome the negative effect of optical distortion, adaptive optical technique to be applied in amplifying technique (Adaptive
optics-a progress review,《Proc.SPIE》,Vol.1542,1991,2-17).In simple terms, all it is to pass through change
Shape mirror corrects the wavefront distortion of laser pulse in amplification process, ensure that effective perforation of the pulse in amplification process, realizes
The energy gain of pulse.These amplifying techniques generally use round trip or quadruple pass to amplify, and the aberration of amplification process accumulation compares
It is small, fairly simple (the Alignment and wave front control system ofnational of control method
Ignition facility,《Optics Engineering》,Vol.43,2004,2873-2884).In order to improve amplifier
Gain factor, super multi-way amplifying technique is used (Design and optimization of an adaptive optics
system for a high-average-power multi-slab laser,《Applied Optics》,Vol.53,
2014,3255-3261), since the aberration build-up effect of amplification pulse in the technology is than more serious, using current beam quality
After control method carries out aberration correction, beam quality is not significantly improved.
Invention content
For various deficiencies of the prior art, to solve the above-mentioned problems, it is proposed that a kind of that picture is carried out using stepping mode
Difference correction, can effectively avoid multi-way intensified image difference-product from tiring out problem, obtain the wavefront correction effect of optimization, be suitable for super multi-way
Amplification system laser beam quality controls.
To achieve the above object, the present invention provides the following technical solutions：
A kind of super multi-pass amplifier laser beam quality control method, includes the following steps：
S1：Measuring and amplifying chamber internal aberrations, and the internal aberrations are corrected；
S2：Complete light path aberration is measured, and the complete light path aberration is corrected.
Further, wave front detector is arranged in the external of the enlarged cavity, is carried out to enlarged cavity internal aberrations, complete light path aberration
It measures, wave-front corrector is arranged in the inside of the enlarged cavity, is corrected to enlarged cavity internal aberrations, complete light path aberration.
Further, the internal aberrations are measured using stepping mode, are corrected, and the specific method is as follows：
(1) by the light path aberration outside wave front detector measuring and amplifying chamber, and it is denoted as W1；
(2) control amplification system is MOPA system state, measures MOPA system complete light path aberration, is denoted as W2, then W2-W1For
MOPA system in-cavity aberratio, it is closed-loop corrected using wave-front corrector progress wavefront, obtain round trip correction voltage U2；
(3) control amplification system is quadruple pass magnifying state, applies correction voltage U to wave-front corrector2Afterwards, quadruple pass is measured to put
Big complete light path aberration, is denoted as W4, then W4-W1Amplify in-cavity aberratio residual error for quadruple pass, wavefront closed loop school is carried out using wave-front corrector
Just, quadruple pass correction voltage U is obtained4；
(4) and so on, until when amplification system is n journey magnifying states, correction voltage U is applied to wave-front correctorn-2
Afterwards, n journeys are measured and amplifies complete light path aberration, be denoted as Wn, wherein n is the maximum value that amplification system amplifies number of passes, and n is even number and n >
2, Un-2Correction voltage when for the amplification number of passes of amplification system being n-2, then Wn-W1Amplify in-cavity aberratio residual error for n journeys, utilizes wave
Preceding corrector progress wavefront is closed-loop corrected, obtains n journey correction voltages Un。
Further, the bearing calibration of the complete light path aberration is：
Nominal light is directly injected into wave front detector, obtains optical path aberration W0, control amplification system is that n journeys amplify shape
State applies correction voltage U to wave-front correctornAfterwards, complete light path aberration is measured, is denoted as W, then W-W0It is exactly complete light path aberration residual error,
It is closed-loop corrected using wave-front corrector progress wavefront, obtain full light path correction voltage U.
Further, the measurement method of the light path aberration outside the enlarged cavity is：
Flat normal mirror is set in the input position of the enlarged cavity, laser injects wave after flat normal mirror reflection
Preceding detector, light path remainder aberration of the calibration not comprising enlarged cavity, obtains the light path aberration W outside enlarged cavity1。
Further, the control method of the amplification system amplification number of passes is：
Along the transmission direction of laser, light splitting piece and electrooptical switching are set gradually in the input position of the enlarged cavity, is led to
Cross electrooptical switching control amplification number of passes.
Further, W is measured1、W2To WnAnd when W, first the flat normal mirror is removed, is put using electrooptical switching control
The amplification number of passes of big system, the complete light path aberration under the amplification number of passes is measured by wave front detector.
Further, the outside of the enlarged cavity also sets up control system, the control system respectively with wave front detector, wave
Preceding corrector connection.
The beneficial effects of the invention are as follows：
1, the present invention can be effective compared with a step corrector in the prior art using stepping mode progress aberration correction
It avoids multi-way intensified image difference-product from tiring out problem, obtains the wavefront correction effect of optimization, be suitable for super multi-way and amplify laser beam matter
Amount control.
2, by the way of enlarged cavity external pelivimetry aberration, intracavitary aberration for compensation, wave front detector can both measure the present invention
Enlarged cavity internal aberrations ensure the effective thang-kng of multi-way amplification process, avoid spatial filtering system plug-hole, and can measure full light path
Aberration optimizes full light path system output beam quality.
3, the present invention realizes the change of laser optical path and system amplification number of passes by the cooperation of standard flat mirror and electrooptical switching
Change, it is easily operated, it is at low cost.
Description of the drawings
Fig. 1 is the super multi-pass amplifier structural schematic diagram of the present invention；
Fig. 2, Fig. 4 are the corresponding wavefront distribution map of light path aberration in embodiment one, two outside enlarged cavity respectively；
When Fig. 3 (a) (b), Fig. 5 (a) (b) they are MOPA system state in embodiment one, two respectively, before light path aberration correction,
Corresponding wavefront distribution map afterwards；
When Fig. 3 (c) (d), Fig. 5 (c) (d) they are quadruple pass magnifying state in embodiment one, two respectively, light path aberration correction
Forward and backward corresponding wavefront distribution map；
When Fig. 3 (e) (f), Fig. 5 (e) (f) they are six journey magnifying state in embodiment one, two respectively, before light path aberration correction,
Corresponding wavefront distribution map afterwards；
When Fig. 3 (g) (h), Fig. 5 (g) (h) they are eight journey magnifying state in embodiment one, two respectively, before light path aberration correction,
Corresponding wavefront distribution map afterwards；
When Fig. 3 (i) (j) is ten journey magnifying state in embodiment one, the forward and backward corresponding wavefront distribution of light path aberration correction
Figure；
Fig. 3 (k) (l), Fig. 5 (i) (j) are that complete light path aberration corrects forward and backward corresponding wavefront point in embodiment one, two respectively
Butut.
In attached drawing：The outer light path element of 1- laser, 2- speculums one, 3- enlarged cavities, 4- standard flats mirror, 5- light splitting pieces one,
6- electrooptical switchinges, 7- laser amplification mediums, 8- spatial filtering systems, 9- wave-front correctors, 10- speculums two, 11- hysteroscopes, 12-
Light splitting piece two, 13- wave front detectors, 14- control systems, 15- nominal lights；
Wherein, in Fig. 2-Fig. 5, abscissa indicates the lateral dimension of laser beam cross section, and unit is millimeter, main ordinate
Axis indicates the longitudinal size of laser beam cross section, and unit is millimeter, and secondary axis of ordinates indicates that the amplitude of light path aberration, unit are
Wavelength.
Specific implementation mode
It is right with reference to the attached drawing of the present invention in order to make those skilled in the art more fully understand technical scheme of the present invention
Technical scheme of the present invention carries out clear, complete description, and based on the embodiment in the application, those of ordinary skill in the art exist
The other similar embodiments obtained under the premise of not making creative work, shall fall within the protection scope of the present application.
Embodiment one：
A kind of super multi-pass amplifier laser beam quality control method, includes the following steps：
S1：Measuring and amplifying chamber internal aberrations, and the internal aberrations are corrected；
S2：Complete light path aberration is measured, and the complete light path aberration is corrected.
The super multi-pass amplifier is as shown in Figure 1, the beam size of laser 1 is 8 × 8mm, wavelength 1053nm, pulse
Width is 3ns, and the parameters of p state polarised lights, nominal light 15 are identical as laser 1, one 2 pairs of 1 high reflectances of laser of speculum, mark
The bore of directrix plane mirror 4 is 20 × 20mm, to 1 high reflectance of 1053nm laser, one 5 pairs of p state polarised light high transmittances of light splitting piece,
To s state polarised light high reflectances, the size of laser amplification medium 7 is 12 × 12 × 30mm, and spatial filtering system 8 expands ratio
It is 1：5, the bore of hysteroscope 11 is 20 × 20mm, to 1053nm laser high reflections, 2 12 pairs of p state polarised light high transmissions of light splitting piece
Rate, antiradar reflectivity.
The wave front detector 13 is located at the outside of enlarged cavity, is measured to enlarged cavity internal aberrations, complete light path aberration,
The wave-front corrector 9 is located at the inside of enlarged cavity, is corrected to enlarged cavity internal aberrations, complete light path aberration, the present invention adopts
With the mode of enlarged cavity external pelivimetry aberration, intracavitary aberration for compensation, wave front detector 13 can both be protected with measuring and amplifying chamber internal aberrations
The effective thang-kng of multi-way amplification process is demonstrate,proved, 8 plug-hole of spatial filtering system is avoided, and complete light path aberration can be measured, optimizes full light path
System output beam quality, wave-front corrector 9, wave front detector 13 are connect with control system 14 respectively, and wave-front corrector 9 is pressure
Conductive film drives distorting lens, parameter as shown in table 1：
, wave front detector 13 is Hartmann wave front sensor, and parameter is as shown in table 2：
Amplification system is ten Cheng Fang great in the present embodiment, to the laser beam quality control method of the ten journeys amplification system
For：
One, in the input position of enlarged cavity setting flat normal mirror 4, laser 1 is injected into the amplification system, laser 1 according to
Secondary to reach flat normal Jing4Chu by light splitting piece 2 12, speculum 1, the outer light path element 3 of enlarged cavity, laser 1 is put down through described
It after face standard mirror 4 reflects, arrives again at the light splitting piece 2 12, the fraction of the laser 1 is reflected through light splitting piece 2 12, note
Enter wave front detector 13, change laser optical path using flat normal mirror 4, easily operated, light path of the calibration not comprising enlarged cavity is surplus
Remaining part divides aberration, obtains the light path aberration W outside enlarged cavity1, corresponding wavefront distribution map is as shown in Fig. 2, wavefront distortion in figure
For 1.43 wavelength；
Two, by 4 remove and close electrooptical switching 6 of the flat normal mirror, at this point, amplification system is MOPA system state,
Laser 1 passes through light splitting piece 2 12, speculum 1, enlarged cavity outer light path element 3, light splitting piece 1, electrooptical switching 6, laser successively
Amplification medium 7 and spatial filtering system 8, light path is inversely transmitted after the reflection of wave-front corrector 9, the big portion of the last laser 1
Divide and penetrate light splitting piece 2 12, the fraction of laser 1 is reflected through light splitting piece 2 12, injects wave front detector 13, measures MOPA system
Complete light path aberration (includes thermal aberration and static aberration), is denoted as W2, then W2-W1For MOPA system in-cavity aberratio, control system is utilized
The 14 control progress wavefront of wave-front correctors 9 are closed-loop corrected, obtain round trip correction voltage U2, the forward and backward corresponding wavefront distribution of correction
For figure respectively as shown in Fig. 3 (a), (b), wavefront distortion is respectively 0.80 wavelength, 0.25 wavelength；
Three, correction voltage U is applied to wave-front corrector 92, start electrooptical switching 6, laser 1 be converted into s state polarised lights, s
State polarised light is reconverted into p state polarised lights after quadruple pass amplifies, at this point, amplification system is quadruple pass magnifying state, measures quadruple pass
Amplify complete light path aberration, is denoted as W4, then W4-W1Amplify in-cavity aberratio residual error for quadruple pass, carrying out wavefront using wave-front corrector 9 closes
Ring corrects, and obtains quadruple pass correction voltage U4, forward and backward corresponding wavefront distribution map is corrected respectively as shown in Fig. 3 (c), (d), wavefront
Distortion is respectively 0.73 wavelength, 0.32 wavelength；
Four, correction voltage U is applied to wave-front corrector 94, start electrooptical switching 6, by laser 1 in s states polarised light and p states
It is converted between polarised light, control amplification system is six journey magnifying states, measures six Cheng Fang great complete light path aberrations, is denoted as W6, then W6-W1
It is closed-loop corrected using the progress wavefront of wave-front corrector 9 for six Cheng Fang great in-cavity aberratio residual errors, obtain six journey correction voltage U6, school
For just forward and backward corresponding wavefront distribution map respectively as shown in Fig. 3 (e), (f), wavefront distortion is respectively 0.73 wavelength, 0.38 wavelength；
Five, correction voltage U is applied to wave-front corrector 96, start electrooptical switching 6, by laser 1 in s states polarised light and p states
It is converted between polarised light, control amplification system is eight journey magnifying states, measures eight Cheng Fang great complete light path aberrations, is denoted as W8, then W8-W1
It is closed-loop corrected using the progress wavefront of wave-front corrector 9 for eight Cheng Fang great in-cavity aberratio residual errors, obtain eight journey correction voltage U8, school
For just forward and backward corresponding wavefront distribution map respectively as shown in Fig. 3 (g), (h), wavefront distortion is respectively 0.83 wavelength, 0.34 wavelength；
Six, correction voltage U is applied to wave-front corrector 98, start electrooptical switching 6, by laser 1 in s states polarised light and p states
It is converted between polarised light, control amplification system is ten journey magnifying states, measures ten Cheng Fang great complete light path aberrations, is denoted as W10, then W10-W1
It is closed-loop corrected using the progress wavefront of wave-front corrector 9 for ten Cheng Fang great in-cavity aberratio residual errors, obtain ten journey correction voltage U10, school
For just forward and backward corresponding wavefront distribution map respectively as shown in Fig. 3 (i), (j), wavefront distortion is respectively 0.58 wavelength, 0.34 wavelength；
Seven, nominal light 15 is directly injected into wave front detector 13, obtains optical path aberration W0, start electrooptical switching 6, it will
Laser 1 is converted between s states polarised light and p state polarised lights, and control amplification system is ten journey magnifying states, is applied to wave-front corrector 9
Correction up voltage U10Afterwards, complete light path aberration is measured, is denoted as W, then W-W0It is exactly complete light path aberration residual error, utilizes wave-front corrector 9
It is closed-loop corrected to carry out wavefront, obtains full light path correction voltage U, correct forward and backward corresponding wavefront distribution map respectively as Fig. 3 (k),
(l) shown in, wavefront distortion is respectively 1.69 wavelength, 0.27 wavelength, and the wavefront distortion of entire light path is corrected to 0.27 wavelength, both
The perforation for meeting spatial filtering system 8, also optimizes output beam quality.
Single step is used to carry out aberration correction in the prior art, it is very serious that aberration adds up phenomenon.Under normal circumstances, eight journey
Four times or so of aberration when aberration is MOPA system when amplification, five times of left sides of aberration when aberration is MOPA system when ten Cheng Fang great
The right side leads to " plug-hole " effect that spatial filtering system 8 occurs so that the near field of output beam is imperfect, seriously affects wavefront survey
Amount.
The present embodiment realizes the variation of system amplification number of passes using electrooptical switching 6, and aberration correction is carried out using stepping mode,
From intracavitary round trip to quadruple pass, then to six journeys, eight journeys, until ten journeys, full light path is finally arrived again.In entire laser beam quality control
During system, with the increase of amplification number of passes, aberration effectively avoids multi-way intensified image difference-product is tired from asking there is no generating to add up phenomenon
Topic, obtains the wavefront correction effect of optimization, is suitable for the amplification laser beam quality control of super multi-way.
Embodiment two：
The present embodiment part identical with embodiment one repeats no more, unlike：
The beam size of laser 1 is 10 × 10mm, and wavelength 1053nm, pulse width 1ns, p state polarised light, laser puts
The size of big medium 7 is 15 × 15 × 40mm, and the ratio that expands of spatial filtering system 8 is 1：6, the bore of hysteroscope 11 is 20 ×
20mm, wave-front corrector 9 are that piezoelectric membrane drives distorting lens, parameter as shown in table 3：
, wave front detector 13 is Hartmann wave front sensor, and parameter is as shown in table 4：
Amplification system is eight Cheng Fang great, the light path aberration W outside measuring and amplifying chamber in the present embodiment1, corresponding wavefront
Distribution map is as shown in figure 4, wavefront distortion is 0.42 wavelength；Laser optical path is respectively round trip, quadruple pass, six journeys and eight journey magnifying states
When, the forward and backward corresponding wavefront distribution map of aberration correction respectively as shown in Fig. 5 (a)-(h), wavefront distortion be respectively 0.88 wavelength,
0.16 wavelength, 0.42 wavelength, 0.18 wavelength, 0.33 wavelength, 0.22 wavelength, 0.47 wavelength, 0.25 wavelength；The complete light path aberration
Forward and backward corresponding wavefront distribution map is corrected respectively as shown in Fig. 5 (i), (j), wavefront distortion is respectively 0.42 wavelength, 0.22 wave
Long, the wavefront distortion of entire light path is corrected to 0.22 wavelength, has both met the perforation of spatial filtering system 8, also optimizes defeated
Go out beam quality.
The present invention is described in detail above, described above, only the preferred embodiments of the invention, when cannot
Limit the scope of the present invention, i.e., it is all according to the made equivalent changes and modifications of the application range, it all should still belong to covering scope of the present invention
It is interior.
Claims (5)
1. a kind of super multi-pass amplifier laser beam quality control method, it is characterised in that：Include the following steps：
S1：Measuring and amplifying chamber internal aberrations, and the internal aberrations are corrected；
S2：Complete light path aberration is measured, and the complete light path aberration is corrected；
Wave front detector is arranged in the external of the enlarged cavity, is measured to enlarged cavity internal aberrations, complete light path aberration, described to put
Wave-front corrector is arranged in the inside of big chamber, is corrected to enlarged cavity internal aberrations, complete light path aberration；
The internal aberrations are measured using stepping mode, are corrected, and the specific method is as follows：
(1) by the light path aberration outside wave front detector measuring and amplifying chamber, and it is denoted as W1；
(2) control amplification system is MOPA system state, measures MOPA system complete light path aberration, is denoted as W2, then W2-W1For round trip
Amplify in-cavity aberratio, it is closed-loop corrected using wave-front corrector progress wavefront, obtain round trip correction voltage U2；
(3) control amplification system is quadruple pass magnifying state, applies correction voltage U to wave-front corrector2Afterwards, it is complete to measure quadruple pass amplification
Light path aberration, is denoted as W4, then W4-W1Amplify in-cavity aberratio residual error for quadruple pass, it is closed-loop corrected using wave-front corrector progress wavefront,
Obtain quadruple pass correction voltage U4；
And so on, until when amplification system is n journey magnifying states, correction voltage U is applied to wave-front correctorn-2Afterwards, n is measured
Cheng Fang great complete light path aberrations, are denoted as Wn, wherein n is the maximum value that amplification system amplifies number of passes, and n is even number and n > 2, Un-2For
Correction voltage when the amplification number of passes of amplification system is n-2, then Wn-W1Amplify in-cavity aberratio residual error for n journeys, utilizes wavefront correction
Device progress wavefront is closed-loop corrected, obtains n journey correction voltages Un；
The bearing calibration of the complete light path aberration is：
Nominal light is directly injected into wave front detector, obtains optical path aberration W0, control amplification system is n journey magnifying states, right
Wave-front corrector applies correction voltage UnAfterwards, complete light path aberration is measured, is denoted as W, then W-W0It is exactly complete light path aberration residual error, utilizes
Wave-front corrector progress wavefront is closed-loop corrected, obtains full light path correction voltage U.
2. a kind of super multi-pass amplifier laser beam quality control method according to claim 1, it is characterised in that：Institute
The measurement method for stating the light path aberration outside enlarged cavity is：
Flat normal mirror is set in the input position of the enlarged cavity, laser injection wavefront after flat normal mirror reflection is visited
Device is surveyed, light path remainder aberration of the calibration not comprising enlarged cavity obtains the light path aberration W outside enlarged cavity1。
3. a kind of super multi-pass amplifier laser beam quality control method according to claim 2, it is characterised in that：Institute
State amplification system amplification number of passes control method be：
Along the transmission direction of laser, light splitting piece and electrooptical switching are set gradually in the input position of the enlarged cavity, passes through electricity
Photoswitch control amplification number of passes.
4. a kind of super multi-pass amplifier laser beam quality control method according to claim 3, it is characterised in that：It surveys
Measure W1、W2To WnAnd when W, first the flat normal mirror is removed, the amplification number of passes of amplification system is controlled using electrooptical switching,
The complete light path aberration under the amplification number of passes is measured by wave front detector.
5. a kind of super multi-pass amplifier laser beam quality control method according to claim 1, it is characterised in that：Institute
The outside for stating enlarged cavity also sets up control system, and the control system is connect with wave front detector, wave-front corrector respectively.
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| CN107085297B (en) * | 2017-05-24 | 2019-03-12 | 中国工程物理研究院激光聚变研究中心 | A kind of light path design method of High power multi-pass amplification laser system |
| CN109683306B (en) * | 2019-01-31 | 2020-12-25 | 中国工程物理研究院激光聚变研究中心 | Wavefront control method for overcoming thermal lens effect |
| CN109883542A (en) * | 2019-03-29 | 2019-06-14 | 中国科学院长春光学精密机械与物理研究所 | No Wavefront detecting expands the laser beam expanding transmission method and system of optical path compensation |
| CN111211476B (en) * | 2020-01-16 | 2021-06-25 | 中国工程物理研究院激光聚变研究中心 | Wavefront control method for four-pass amplifier |
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| 神光Ⅲ原型装置全光路像差闭环校正实验研究;代万俊 等;《中国激光》;20100228;第37卷(第2期);第414页第1段至第417页第2段，图1-4 * |
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