CN106128928B - The deriving structure of miniature Penning ion source under a kind of highfield - Google Patents
The deriving structure of miniature Penning ion source under a kind of highfield Download PDFInfo
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- CN106128928B CN106128928B CN201610617120.5A CN201610617120A CN106128928B CN 106128928 B CN106128928 B CN 106128928B CN 201610617120 A CN201610617120 A CN 201610617120A CN 106128928 B CN106128928 B CN 106128928B
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- anode canister
- seam
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- drawn
- extraction electrode
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
The invention belongs to superconducting cyclotron technical field, and in particular to the deriving structure of miniature Penning ion source under a kind of highfield.Anode canister including being arranged on the anode canister side of Penning ion source, which is drawn seam and drawn close to anode canister, seams the extraction electrode put, extraction electrode sealing on extraction electrode corresponds to anode canister and draws seam, the plasma in anode canister can be drawn into seam from anode canister by electrode sealing after high frequency voltage is loaded on extraction electrode to draw, wherein, anode canister is drawn seam and is arranged on the extraction wall of anode canister, and the thickness for drawing wall is less than the other positions thickness of anode canister；Anode canister, which is drawn, stitches long 6mm 10mm, the subtended angle provided with special angle, wide 0.5mm；Electrode sealing long 6mm 10mm, wide 0.5mm；Anode canister draws seam, the length of electrode sealing is consistent.The deriving structure reduces the wall thickness of the outlet of anode canister as far as possible, enhances inner chamber wall voltage, improves extraction stream by force, improves educt beaming flow quality.
Description
Technical field
The invention belongs to superconducting cyclotron technical field, and in particular to miniature Penning ion source under a kind of highfield
Deriving structure.
Background technology
Cyclotron is charged particle is made circumnutation jointly using magnetic field and electric field, during exercise through high-frequency electric field
The device accelerated repeatedly, it is the important instrument in high-energy physics, wherein superconducting cyclotron is that current medical proton therapeutic adds
The nucleus equipment of fast device.Medical proton therapy accelerator can be realized swollen with the proton in microcosmos, Heavy ion beam treatment
Knurl, is the most advanced radiation therapy technology in the world today, and only indivedual developed countries grasp and apply the technology.
In superconducting cyclotron, technology of ion source is that (ion gun is to make neutral atom or molecule to a key technology
Ionization, and therefrom draw the device of ion beam current).Ion gun is the source of line, decides quality of beam, also directly affects
The performance of superconducting cyclotron.
Magnetic field intensity in superconducting cyclotron is about 2.3T, and the line of ion gun is directly led out by high frequency voltage.
In this highfield, intense beam stream are drawn, the deriving structure of ion gun directly determines quality of beam.Between in deriving structure
All it is that quality of beam is directly affected away from, shape of the thickness of subtended angle size, exit, extraction electrode etc..Need to pass through
These factors are studied, determine deriving structure, improve the educt beaming flow quality of ion gun, and then improve the performance indications of accelerator.
Miniature Penning ion source is needed installed in just extremely narrow and small used by due to superconducting cyclotron involved in the present invention
In space, its size closely, therefore proposes higher to the deriving structure used by it including extraction electrode
Design requirement.
The content of the invention
For high magnetic field intensity of the miniature Penning ion source in superconducting cyclotron and the high-frequency electrical of extraction electrode
Pressure ring border is, it is necessary to design a kind of deriving structure strong with higher extraction stream, to ensure the miniature penning of superconducting cyclotron
The quality of educt beaming flow in ion gun.
To achieve the above objectives, the technical solution adopted by the present invention is a kind of extraction of miniature Penning ion source under highfield
Structure, including the anode canister being arranged on the anode canister side of Penning ion source are drawn seam and drawn close to the anode canister and seamed
The extraction electrode put, the extraction electrode sealing on the extraction electrode corresponds to the anode canister and draws seam, when the extraction electrode
The plasma in the anode canister can be drawn from the anode canister by the electrode sealing after upper loading high frequency voltage
Seam is drawn, wherein, the anode canister is drawn seam and is arranged on the extraction wall of the anode canister, and the thickness for drawing wall is less than institute
State the other positions thickness of anode canister；The anode canister, which is drawn, stitches long 6mm-10mm, wide 0.5mm, the subtended angle provided with special angle；
The long 6mm-10mm of electrode sealing, wide 0.5mm；The anode canister draws seam, the length of electrode sealing is consistent.
Further, the subtended angle is 30 degree of -45 degree.
Further, the thickness for drawing wall is 0.12mm.
Further, the anode canister draws seam with the electrode sealing at a distance of 1.5mm.
Further, the anode canister is made using tungsten-copper alloy.
Further, the extraction electrode is made using oxygen-free copper.
Further, the high frequency voltage loaded on the extraction electrode is 14kV.
The beneficial effects of the present invention are：The deriving structure reduces the wall thickness of the outlet of anode canister as far as possible, enhances
Inner chamber wall voltage, improve extraction stream by force, improve educt beaming flow quality.
Brief description of the drawings
Fig. 1 is the side view cutaway drawing of deriving structure described in the specific embodiment of the invention；
Fig. 2 is the vertical view cutaway drawing of deriving structure described in the specific embodiment of the invention；
Fig. 3 is the schematic diagram that the anode canister drawn described in the specific embodiment of the invention on wall draws seam；
In figure：1- anode canisters, 2- extraction electrodes, 3- anode canisters draw seam, 4- extraction electrode sealings, and 5- draws wall, 6- beams
Flow direction.
Embodiment
The invention will be further described with reference to the accompanying drawings and examples.
As shown in Figure 1, 2, under a kind of highfield provided by the invention miniature Penning ion source deriving structure, including set
The anode canister drawn on wall 5 in the side of anode canister 1 of Penning ion source draws seam 4 and draws what seam 4 was set close to anode canister
Extraction electrode 2, the corresponding anode canister of extraction electrode sealing 3 on extraction electrode 2 draw seam 4, and anode canister 1 is hollow cylinder type gold
Category pipe.When producing substantial amounts of plasma in anode canister 1, electrode can be passed through after now loading high frequency voltage on extraction electrode 2
Plasma in anode canister 1 is drawn seam 4 from anode canister and drawn by sealing 3, and the ion of extraction, which is injected into accelerator, to be carried out
Accelerate.
Indicated according to research, extraction wall is thinner, and the voltage that ion gun draws internal chamber wall is higher, the extraction stream of educt beaming flow
It is strong also higher.Therefore in the present invention, on the premise of the structural strength of anode canister 1 is not influenceed, should try one's best the thickness for reducing and drawing wall 5
Degree.
(6 be beam direction in figure) as shown in Figure 3, tried one's best thin design according to wall is drawn, the thickness for drawing wall 5 is less than sun
The other positions thickness of pole cylinder 1, it is final to determine：
The thickness X 2 for drawing wall 5 is 0.12mm；It is 6mm-10mm that anode canister, which draws 4 length of seam, provided with special angle
Angle α, wherein subtended angle α are 30 degree of -45 degree.The width X1 that anode canister draws seam 4 is 0.5mm；
The length of electrode sealing 3 on extraction electrode 2 is 6mm-10mm, width 0.5mm.
Wherein, the length of anode canister extraction seam 4 and electrode sealing 3 should be consistent in the range of 6mm-10mm.
According to design, as shown in figure 1, the distance X3 that anode canister draws seam 4 and electrode sealing 3 is 1.5mm.
Wherein, extraction electrode sealing 3 draws seam 4 in a plane with anode canister, can also carry out as needed micro-
Tune makes to keep certain deviation between the two, in addition, the shape of extraction electrode sealing 3 can have certain subtended angle as shown in Figure 1,
Can be straight, the above changes the different extraction effects that can be brought to educt beaming flow.
Anode canister 1 provided by the present invention is made using tungsten-copper alloy, and extraction electrode 2 is made using oxygen-free copper.
The high frequency voltage loaded on extraction electrode 2 is 14kV.
Device of the present invention is not limited to the embodiment described in embodiment, those skilled in the art according to
Technical scheme draws other embodiments, also belongs to the technological innovation scope of the present invention.
Claims (6)
1. the deriving structure of miniature Penning ion source under a kind of highfield, including it is arranged on anode canister (1) side of Penning ion source
Anode canister on face draws seam (4) and the extraction electrode (2) for stitching (4) and setting, the extraction electrode is drawn close to the anode canister
(2) the corresponding anode canister of extraction electrode sealing (3) on draws seam (4), when loading high frequency voltage on the extraction electrode (2)
The plasma in the anode canister (1) can be drawn into seam (4) from the anode canister by the electrode sealing (3) afterwards to draw
Go out, it is characterized in that：The anode canister is drawn seam (4) and is arranged on the extraction wall (5) of the anode canister (1), the extraction wall (5)
Thickness be less than the anode canister (1) other positions thickness；The anode canister draws seam (4) long 6mm-10mm, wide 0.5mm,
Subtended angle provided with special angle, the subtended angle are 30 degree of -45 degree；Electrode sealing (3) the long 6mm-10mm, wide 0.5mm；It is described
Anode canister draws seam (4), the length of electrode sealing (3) is consistent.
2. deriving structure as claimed in claim 1, it is characterized in that：The thickness for drawing wall (5) is 0.12mm.
3. deriving structure as claimed in claim 1, it is characterized in that：The anode canister draws seam (4) and the electrode sealing (3)
At a distance of 1.5mm.
4. deriving structure as claimed in claim 1, it is characterized in that：The anode canister (1) is made using tungsten-copper alloy.
5. deriving structure as claimed in claim 1, it is characterized in that：The extraction electrode (2) is made using oxygen-free copper.
6. deriving structure as claimed in claim 1, it is characterized in that：The high frequency voltage loaded on the extraction electrode (2)
For 14kV.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610617120.5A CN106128928B (en) | 2016-07-29 | 2016-07-29 | The deriving structure of miniature Penning ion source under a kind of highfield |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610617120.5A CN106128928B (en) | 2016-07-29 | 2016-07-29 | The deriving structure of miniature Penning ion source under a kind of highfield |
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| Publication Number | Publication Date |
|---|---|
| CN106128928A CN106128928A (en) | 2016-11-16 |
| CN106128928B true CN106128928B (en) | 2018-01-19 |
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| CN109830419B (en) * | 2019-01-24 | 2020-05-19 | 中国原子能科学研究院 | Miniature penning ion source |
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| US4344019A (en) * | 1980-11-10 | 1982-08-10 | The United States Of America As Represented By The United States Department Of Energy | Penning discharge ion source with self-cleaning aperture |
| CN204088256U (en) * | 2014-09-22 | 2015-01-07 | 中国工程物理研究院流体物理研究所 | Ion source collimater and ion source |
| CN205881868U (en) * | 2016-07-29 | 2017-01-11 | 中国原子能科学研究院 | Miniature penning ion source's extraction structure under high field |
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