CN106119789A - A kind of preparation method of carbon copper composite target material - Google Patents

A kind of preparation method of carbon copper composite target material Download PDF

Info

Publication number
CN106119789A
CN106119789A CN201610656529.8A CN201610656529A CN106119789A CN 106119789 A CN106119789 A CN 106119789A CN 201610656529 A CN201610656529 A CN 201610656529A CN 106119789 A CN106119789 A CN 106119789A
Authority
CN
China
Prior art keywords
target
protective layer
copper
carbon
sand blasted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201610656529.8A
Other languages
Chinese (zh)
Inventor
不公告发明人
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Suzhou Sichuang Yuanbo Electronic Technology Co Ltd
Original Assignee
Suzhou Sichuang Yuanbo Electronic Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Suzhou Sichuang Yuanbo Electronic Technology Co Ltd filed Critical Suzhou Sichuang Yuanbo Electronic Technology Co Ltd
Priority to CN201610656529.8A priority Critical patent/CN106119789A/en
Publication of CN106119789A publication Critical patent/CN106119789A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3407Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C1/00Making non-ferrous alloys
    • C22C1/10Alloys containing non-metals
    • C22C1/1005Pretreatment of the non-metallic additives
    • C22C1/101Pretreatment of the non-metallic additives by coating
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C1/00Making non-ferrous alloys
    • C22C1/10Alloys containing non-metals
    • C22C1/1036Alloys containing non-metals starting from a melt
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C1/00Making non-ferrous alloys
    • C22C1/10Alloys containing non-metals
    • C22C1/1036Alloys containing non-metals starting from a melt
    • C22C1/1047Alloys containing non-metals starting from a melt by mixing and casting liquid metal matrix composites
    • C22C1/1052Alloys containing non-metals starting from a melt by mixing and casting liquid metal matrix composites by mixing and casting metal matrix composites with reaction
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/08Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Composite Materials (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)

Abstract

The invention discloses the preparation method of a kind of carbon copper composite target material, obtain carbon copper composite target material and there is good resistance to bending performance, it is in the case of repeating to bend repeatedly, the problem not havinging fracture, preferably the part surface of target is carried out blasting treatment, do not interfere with other of target simultaneously and need not the part of sandblasting.

Description

A kind of preparation method of carbon copper composite target material
Technical field
The present invention relates to alloy material and manufacture field, be specifically related to the preparation method of a kind of carbon copper composite target material.
Background technology
In recent years, growing along with sputtering target material and sputtering technology, sputtering target material serves more in sputtering technology Carrying out the most important effect, the quality of sputtering target material has directly influenced the quality of forming film after sputtering.
Carbon copper alloy target is a kind of more typical alloy target material of ratio, and tungsten nickel has low-resistance coefficient, good heat Stability and non-oxidizability;Meanwhile, good processability, the feature that toughness is high, the carbon copper target material being made up of both raw materials becomes One of pipe target for semiconductor applications large usage quantity.For now, for the carbon copper target material of semiconductor manufacturing not only to cause Close property, hardness and can have the highest requirement by processing type, also have the highest requirement to the interior tissue uniformity of material simultaneously.
Owing to, in sputter procedure, the edge of target can leave the particulate matter that sputtering produces, these particulate matters are gradually Accumulation becomes deposit.Deposit gathers on target and peeling phenomenon (peeling) can occur the most afterwards, sinking of peeling Long-pending thing not only can affect sputtering environment, is also easy to drop on product surface, causes that product is defective even to be scrapped.To this end, it is existing There is technology the part non-sputtered region of target can be carried out blasting treatment, the so part surface through sandblasting and become coarse, enter And become easily to adsorb deposit, reduce peeling phenomenon odds.
Summary of the invention
The present invention provides the preparation method of a kind of carbon copper composite target material, obtains carbon-copper composite target material and has good bending resistance Folding endurance energy, it is in the case of repeating to bend repeatedly, the problem not havinging fracture, preferably to enter the part surface of target Row blasting treatment, does not interferes with other of target simultaneously and need not the part of sandblasting.
To achieve these goals, the invention provides the preparation method of a kind of carbon copper composite target material, the method include as Lower step:
(1) target is prepared
Material with carbon element aqueous solution is carried out ultra high shear power dispersion, then in material with carbon element aqueous solution, is separately added into mantoquita, dispersant And stabilizer, it being heated to 75 ~ 85 DEG C, hold temperature 30-60min, obtain reactant liquor, the copper ion in reactant liquor uniformly separates out at carbon material The surface of material;Described dispersant is any in polyvinylpyrrolidone, polyvinyl alcohol, poly-ethylene methacrylic ether, polyacrylic acid One, or any one non-ionic interfacial agent, or any one chelating agen;Described stabilizer be polymine, Any one in sodium citrate, Fructus Vitis viniferae candy, sodium lauryl sulphate, polyvinylpyrrolidone, or any one dendroid is high Molecule;
Reactant liquor is carried out lyophilization, removes solvent, it is thus achieved that surface adsorption has the material with carbon element powder of nano copper particle;
Select raw copper, vacuum smelting equipment is melt into high-temperature fusion liquid copper slurry;
The material with carbon element powder that surface adsorption has nano copper particle puts in copper slurry, obtains high temperature mixed slurry, with surface adsorption Having the material with carbon element powder of nano copper particle and the quality summation of raw copper is 100% meter, and surface adsorption has the carbon material of nano copper particle Material powder, the percentage composition of raw copper are respectively as follows: 15 ~ 35%, 65 ~ 85%;
The warm heat treatment that carries out homogenizing for 5 ~ 7 hours, afterwards, cooling is held in high temperature mixed slurry is poured into the mould of 750 ~ 900 DEG C Obtaining ingot casting, and ingot casting carries out the cold rolling heat treatment that prolongs and anneal, the Parameter Conditions of annealing heat treatment is: temperature is 550 ~ 650 DEG C, the time is 2 ~ 3h, final machine tooling, can obtain carbon-copper composite target material;
(2) blasting treatment
Thering is provided described carbon copper alloy target, described target includes treating sand blasted area and need not the reservation region of sandblasting;
At least close part treating sand blasted area in described reservation region, and part treats that protective layer is pasted in sand blasted area;
Remove and be positioned at the protective layer treating sand blasted area, treat sand blasted area be completely exposed target;
Target is treated, and sand blasted area carries out blasting treatment;
After the step of blasting treatment, remove remaining protective layer on target.
Preferably, in described step (2), it is provided that the step of described carbon copper alloy target includes: remove to be positioned at and treat sandblasting The step of the protective layer in region includes: use the mode of milling remove described in treat the protective layer of sand blasted area;
Wherein, remove and be positioned at the step of the protective layer treating sand blasted area and include: at lathe tool and the target material surface being pasted with protective layer Between arrange be not more than protective layer thickness gap, make described gap in the range of 0.02mm~0.04mm;
After removal is positioned at the step of the protective layer treating sand blasted area, before carrying out the step of blasting treatment, described target is processed Method also includes: use blade to treat that sandblasting region surface carries out process of removing photoresist for target;
After pasting the step of protective layer, before carrying out the step of blasting treatment, described target processing method also includes: use lid The part that protective layer is not pasted in reservation region by plate is blocked.
It is an advantage of the current invention that obtaining carbon-copper composite target material has good resistance to bending performance, it bends repeatedly repeating In the case of, the problem not havinging fracture, preferably the part surface of target is carried out blasting treatment, do not interfere with target simultaneously Other of material need not the part of sandblasting.
Detailed description of the invention
Embodiment one
Prepare target
Material with carbon element aqueous solution is carried out ultra high shear power dispersion, then in material with carbon element aqueous solution, is separately added into mantoquita, dispersant And stabilizer, it being heated to 75 DEG C, hold temperature 30min, obtain reactant liquor, the copper ion in reactant liquor uniformly separates out the table at material with carbon element Face;Described dispersant is any one in polyvinylpyrrolidone, polyvinyl alcohol, poly-ethylene methacrylic ether, polyacrylic acid, or Any one non-ionic interfacial agent, or any one chelating agen;Described stabilizer is polymine, citric acid Any one in sodium, Fructus Vitis viniferae candy, sodium lauryl sulphate, polyvinylpyrrolidone, or any one dendrimer.
Reactant liquor is carried out lyophilization, removes solvent, it is thus achieved that surface adsorption has the material with carbon element powder of nano copper particle.Choosing By raw copper, vacuum smelting equipment is melt into high-temperature fusion liquid copper slurry.
The material with carbon element powder that surface adsorption has nano copper particle puts in copper slurry, obtains high temperature mixed slurry, with surface The quality summation of the material with carbon element powder and raw copper that are adsorbed with nano copper particle is 100% meter, and surface adsorption has nano copper particle Material with carbon element powder, the percentage composition of raw copper are respectively as follows: 15%, 85%.
Holding the warm heat treatment that carries out homogenizing for 5 hours in high temperature mixed slurry is poured into the mould of 750 DEG C, afterwards, cooling obtains Obtaining ingot casting, and ingot casting carries out the cold rolling heat treatment that prolongs and anneal, the Parameter Conditions of annealing heat treatment is: temperature is 550 DEG C, the time For 2h, final machine tooling, carbon-copper composite target material can be obtained.
Blasting treatment
Thering is provided described carbon copper alloy target, described target includes treating sand blasted area and need not the reservation region of sandblasting;At least The close part treating sand blasted area in described reservation region, and partly treat that protective layer is pasted in sand blasted area;Removal is positioned to be painted The protective layer in sand region, treats sand blasted area be completely exposed target;Target is treated, and sand blasted area carries out blasting treatment;In spray After the step that sand processes, remove remaining protective layer on target.
Preferably, it is provided that the step of described carbon copper alloy target includes: remove the step being positioned at the protective layer treating sand blasted area Suddenly include: use the mode of milling remove described in treat the protective layer of sand blasted area.
Wherein, remove and be positioned at the step of the protective layer treating sand blasted area and include: at lathe tool and the target being pasted with protective layer The gap being not more than protective layer thickness is set between surface, makes described gap in the range of 0.02mm~0.04mm.
After removal is positioned at the step of the protective layer treating sand blasted area, before carrying out the step of blasting treatment, described target Processing method also includes: use blade to treat that sandblasting region surface carries out process of removing photoresist for target.
After pasting the step of protective layer, before carrying out the step of blasting treatment, described target processing method also includes: adopt Part reservation region not being pasted protective layer with cover plate is blocked.
Embodiment two
Prepare target
Material with carbon element aqueous solution is carried out ultra high shear power dispersion, then in material with carbon element aqueous solution, is separately added into mantoquita, dispersant And stabilizer, it being heated to 85 DEG C, hold temperature 60min, obtain reactant liquor, the copper ion in reactant liquor uniformly separates out the table at material with carbon element Face;Described dispersant is any one in polyvinylpyrrolidone, polyvinyl alcohol, poly-ethylene methacrylic ether, polyacrylic acid, or Any one non-ionic interfacial agent, or any one chelating agen;Described stabilizer is polymine, citric acid Any one in sodium, Fructus Vitis viniferae candy, sodium lauryl sulphate, polyvinylpyrrolidone, or any one dendrimer.
Reactant liquor is carried out lyophilization, removes solvent, it is thus achieved that surface adsorption has the material with carbon element powder of nano copper particle.Choosing By raw copper, vacuum smelting equipment is melt into high-temperature fusion liquid copper slurry.
The material with carbon element powder that surface adsorption has nano copper particle puts in copper slurry, obtains high temperature mixed slurry, with surface The quality summation of the material with carbon element powder and raw copper that are adsorbed with nano copper particle is 100% meter, and surface adsorption has nano copper particle Material with carbon element powder, the percentage composition of raw copper are respectively as follows: 35%, 65%.
Holding the warm heat treatment that carries out homogenizing for 7 hours in high temperature mixed slurry is poured into the mould of 900 DEG C, afterwards, cooling obtains Obtaining ingot casting, and ingot casting carries out the cold rolling heat treatment that prolongs and anneal, the Parameter Conditions of annealing heat treatment is: temperature is 650 DEG C, the time For 3h, final machine tooling, carbon-copper composite target material can be obtained.
Blasting treatment
Thering is provided described carbon copper alloy target, described target includes treating sand blasted area and need not the reservation region of sandblasting;At least The close part treating sand blasted area in described reservation region, and partly treat that protective layer is pasted in sand blasted area;Removal is positioned to be painted The protective layer in sand region, treats sand blasted area be completely exposed target;Target is treated, and sand blasted area carries out blasting treatment;In spray After the step that sand processes, remove remaining protective layer on target.
Preferably, it is provided that the step of described carbon copper alloy target includes: remove the step being positioned at the protective layer treating sand blasted area Suddenly include: use the mode of milling remove described in treat the protective layer of sand blasted area.
Wherein, remove and be positioned at the step of the protective layer treating sand blasted area and include: at lathe tool and the target being pasted with protective layer The gap being not more than protective layer thickness is set between surface, makes described gap in the range of 0.02mm~0.04mm.
After removal is positioned at the step of the protective layer treating sand blasted area, before carrying out the step of blasting treatment, described target Processing method also includes: use blade to treat that sandblasting region surface carries out process of removing photoresist for target.
After pasting the step of protective layer, before carrying out the step of blasting treatment, described target processing method also includes: adopt Part reservation region not being pasted protective layer with cover plate is blocked.

Claims (2)

1. a preparation method for carbon copper composite target material, the method comprises the steps:
(1) target is prepared
Material with carbon element aqueous solution is carried out ultra high shear power dispersion, then in material with carbon element aqueous solution, is separately added into mantoquita, dispersant And stabilizer, it being heated to 75 ~ 85 DEG C, hold temperature 30-60min, obtain reactant liquor, the copper ion in reactant liquor uniformly separates out at carbon material The surface of material;Described dispersant is any in polyvinylpyrrolidone, polyvinyl alcohol, poly-ethylene methacrylic ether, polyacrylic acid One, or any one non-ionic interfacial agent, or any one chelating agen;Described stabilizer be polymine, Any one in sodium citrate, Fructus Vitis viniferae candy, sodium lauryl sulphate, polyvinylpyrrolidone, or any one dendroid is high Molecule;
Reactant liquor is carried out lyophilization, removes solvent, it is thus achieved that surface adsorption has the material with carbon element powder of nano copper particle;
Select raw copper, vacuum smelting equipment is melt into high-temperature fusion liquid copper slurry;
The material with carbon element powder that surface adsorption has nano copper particle puts in copper slurry, obtains high temperature mixed slurry, with surface adsorption Having the material with carbon element powder of nano copper particle and the quality summation of raw copper is 100% meter, and surface adsorption has the carbon material of nano copper particle Material powder, the percentage composition of raw copper are respectively as follows: 15 ~ 35%, 65 ~ 85%;
The warm heat treatment that carries out homogenizing for 5 ~ 7 hours, afterwards, cooling is held in high temperature mixed slurry is poured into the mould of 750 ~ 900 DEG C Obtaining ingot casting, and ingot casting carries out the cold rolling heat treatment that prolongs and anneal, the Parameter Conditions of annealing heat treatment is: temperature is 550 ~ 650 DEG C, the time is 2 ~ 3h, final machine tooling, can obtain carbon-copper composite target material;
(2) blasting treatment
Thering is provided described carbon copper alloy target, described target includes treating sand blasted area and need not the reservation region of sandblasting;
At least close part treating sand blasted area in described reservation region, and part treats that protective layer is pasted in sand blasted area;
Remove and be positioned at the protective layer treating sand blasted area, treat sand blasted area be completely exposed target;
Target is treated, and sand blasted area carries out blasting treatment;
After the step of blasting treatment, remove remaining protective layer on target.
2. the method for claim 1, it is characterised in that in described step (2), it is provided that described carbon copper alloy target Step includes: removes and is positioned at the step of the protective layer treating sand blasted area and includes: use the mode of milling remove described in treat sandblasting district The protective layer in territory;
Wherein, remove and be positioned at the step of the protective layer treating sand blasted area and include: at lathe tool and the target material surface being pasted with protective layer Between arrange be not more than protective layer thickness gap, make described gap in the range of 0.02mm~0.04mm;
After removal is positioned at the step of the protective layer treating sand blasted area, before carrying out the step of blasting treatment, described target is processed Method also includes: use blade to treat that sandblasting region surface carries out process of removing photoresist for target;
After pasting the step of protective layer, before carrying out the step of blasting treatment, described target processing method also includes: use lid The part that protective layer is not pasted in reservation region by plate is blocked.
CN201610656529.8A 2016-08-12 2016-08-12 A kind of preparation method of carbon copper composite target material Pending CN106119789A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610656529.8A CN106119789A (en) 2016-08-12 2016-08-12 A kind of preparation method of carbon copper composite target material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610656529.8A CN106119789A (en) 2016-08-12 2016-08-12 A kind of preparation method of carbon copper composite target material

Publications (1)

Publication Number Publication Date
CN106119789A true CN106119789A (en) 2016-11-16

Family

ID=57257587

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610656529.8A Pending CN106119789A (en) 2016-08-12 2016-08-12 A kind of preparation method of carbon copper composite target material

Country Status (1)

Country Link
CN (1) CN106119789A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104651784A (en) * 2015-03-13 2015-05-27 福建省诺希科技园发展有限公司 Manufacturing method of carbon-silver composite target for curved touch screen
CN105695943A (en) * 2014-11-28 2016-06-22 宁波江丰电子材料股份有限公司 Target processing method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105695943A (en) * 2014-11-28 2016-06-22 宁波江丰电子材料股份有限公司 Target processing method
CN104651784A (en) * 2015-03-13 2015-05-27 福建省诺希科技园发展有限公司 Manufacturing method of carbon-silver composite target for curved touch screen

Similar Documents

Publication Publication Date Title
CN103540790B (en) A kind of preparation method of anti-corrosion CuAlCr laser melting coating layer material
CN104801718A (en) Recycling process of sintering neodymium iron boron discard black wafer
JP2009197332A (en) Tantalum sputtering target
CN105057680B (en) A kind of preparation method of mechanical alloying copper-tungsten powder
CN103740979B (en) The preparation method of a kind of high-density, large size, high uniformity molybdenum-titanium alloy target
CN103774104B (en) A kind of device of ion beam magnetron sputtering composite film coating
CN104018120B (en) Nickel platinum alloy target and preparation method thereof
CN109439961A (en) A kind of high temperature alloy silk material and preparation method thereof
CN113427008B (en) Tantalum-tungsten alloy powder and preparation method thereof
EP2951332B1 (en) Sputter target with Ga-Na, In-Na or Ga-In-Na intermetallic phases
CN1913053A (en) Preparation method of high corrosion resistance sintered neodymium iron boron
CN101862922B (en) Binary alloy sealing solder wire
KR101738067B1 (en) Method for manufacturing tantalum powder
CN104233205B (en) A kind of tantalum ruthenium alloy target and preparation method thereof
US9506141B2 (en) Method for manufacturing a molybdenum sputtering target for back electrode of CIGS solar cell
CN106119789A (en) A kind of preparation method of carbon copper composite target material
CN106119790A (en) A kind of tungsten nickel target processing method
CN106544632A (en) A kind of tungsten niobium alloy target processing method
Sohn Effect of Morphological Change of Ni 3 Sn 4 Intermetallic Compounds on the Growth Kinetics in Electroless Ni-P/Sn-3.5 Ag Solder Joint
CN106077642B (en) A kind of method of alloy nano-powder prepares coating conductor high-tungsten alloy base band billet
CN116970853A (en) Preparation method of tungsten-titanium target blank
CN108588588A (en) The preparation method of metal/non-crystaline amorphous metal diffusion couple
JP2015045035A5 (en)
US11408055B2 (en) Copper alloy production method and method for manufacturing foil from copper alloy
CN113337760A (en) Method for improving O-state conductivity of 5754 alloy

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20161116

WD01 Invention patent application deemed withdrawn after publication