CN106094448B - 光刻系统 - Google Patents
光刻系统 Download PDFInfo
- Publication number
- CN106094448B CN106094448B CN201610607707.8A CN201610607707A CN106094448B CN 106094448 B CN106094448 B CN 106094448B CN 201610607707 A CN201610607707 A CN 201610607707A CN 106094448 B CN106094448 B CN 106094448B
- Authority
- CN
- China
- Prior art keywords
- light
- splitting device
- detection
- optical path
- light source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000001459 lithography Methods 0.000 title claims abstract description 26
- 230000003287 optical effect Effects 0.000 claims abstract description 43
- 238000001514 detection method Methods 0.000 claims abstract description 41
- 238000003384 imaging method Methods 0.000 claims abstract description 17
- 238000001259 photo etching Methods 0.000 claims abstract description 15
- 240000007594 Oryza sativa Species 0.000 claims 1
- 235000007164 Oryza sativa Nutrition 0.000 claims 1
- 235000009566 rice Nutrition 0.000 claims 1
- 239000000428 dust Substances 0.000 abstract description 4
- 239000002245 particle Substances 0.000 abstract description 4
- 230000000694 effects Effects 0.000 abstract description 3
- 238000000034 method Methods 0.000 description 13
- 230000008569 process Effects 0.000 description 6
- 230000004075 alteration Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- UIZLQMLDSWKZGC-UHFFFAOYSA-N cadmium helium Chemical compound [He].[Cd] UIZLQMLDSWKZGC-UHFFFAOYSA-N 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- KPHWPUGNDIVLNH-UHFFFAOYSA-M diclofenac sodium Chemical compound [Na+].[O-]C(=O)CC1=CC=CC=C1NC1=C(Cl)C=CC=C1Cl KPHWPUGNDIVLNH-UHFFFAOYSA-M 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70641—Focus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
- G03F9/7026—Focusing
Abstract
Description
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610607707.8A CN106094448B (zh) | 2016-07-29 | 2016-07-29 | 光刻系统 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610607707.8A CN106094448B (zh) | 2016-07-29 | 2016-07-29 | 光刻系统 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN106094448A CN106094448A (zh) | 2016-11-09 |
CN106094448B true CN106094448B (zh) | 2019-06-07 |
Family
ID=57479106
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201610607707.8A Active CN106094448B (zh) | 2016-07-29 | 2016-07-29 | 光刻系统 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN106094448B (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111694227B (zh) * | 2020-06-03 | 2023-03-21 | 长沙麓邦光电科技有限公司 | 光控系统及方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN201345033Y (zh) * | 2009-01-21 | 2009-11-11 | 中国科学院上海光学精密机械研究所 | 高速多光束并行激光直写装置 |
CN101846890A (zh) * | 2010-05-13 | 2010-09-29 | 苏州苏大维格光电科技股份有限公司 | 并行光刻直写系统 |
CN103744271A (zh) * | 2014-01-28 | 2014-04-23 | 苏州苏大维格光电科技股份有限公司 | 一种激光直写系统与光刻方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103279014B (zh) * | 2013-06-14 | 2016-01-20 | 苏州苏大维格光电科技股份有限公司 | 纳米图形化衬底制备装置与方法 |
CN105445834B (zh) * | 2015-10-26 | 2017-09-01 | 苏州大学 | 一种大尺寸衍射光栅的制作方法及曝光装置 |
CN205942249U (zh) * | 2016-07-29 | 2017-02-08 | 胡煜塨 | 光刻系统 |
-
2016
- 2016-07-29 CN CN201610607707.8A patent/CN106094448B/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN201345033Y (zh) * | 2009-01-21 | 2009-11-11 | 中国科学院上海光学精密机械研究所 | 高速多光束并行激光直写装置 |
CN101846890A (zh) * | 2010-05-13 | 2010-09-29 | 苏州苏大维格光电科技股份有限公司 | 并行光刻直写系统 |
CN103744271A (zh) * | 2014-01-28 | 2014-04-23 | 苏州苏大维格光电科技股份有限公司 | 一种激光直写系统与光刻方法 |
Also Published As
Publication number | Publication date |
---|---|
CN106094448A (zh) | 2016-11-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
CB03 | Change of inventor or designer information |
Inventor after: Li Jigang Inventor before: Hu Yugong |
|
CB03 | Change of inventor or designer information | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20170208 Address after: 434000 Jingzhou province Hubei city Jingzhou District Ying Jie Song Town Street No. 25 Applicant after: Li Jigang Address before: 215000 Jiangsu Province, Suzhou City Industrial Park, Dongcheng District 118 building 501 Applicant before: Hu Yugong |
|
TA01 | Transfer of patent application right | ||
TA01 | Transfer of patent application right | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20190506 Address after: 215123 Room 903, 6th Floor, Business Travel Building, 381 East Suzhou Avenue, Suzhou City, Jiangsu Province Applicant after: SUZHOU BILLION PHOTOELECTRIC TECHNOLOGY Co.,Ltd. Address before: 434000 No. 25 Jusong Street, Yuncheng Town, Jingzhou District, Jingzhou City, Hubei Province Applicant before: Li Jigang |
|
GR01 | Patent grant | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right |
Effective date of registration: 20230912 Address after: Unit 08, 5th Floor, Building 22, No. 388 Xinping Street, Suzhou Industrial Park, Suzhou City, Jiangsu Province, 215000 Patentee after: Hezhi Technology (Suzhou) Co.,Ltd. Address before: 215123 Room 903, 6th Floor, Business Travel Building, 381 East Suzhou Avenue, Suzhou City, Jiangsu Province Patentee before: SUZHOU BILLION PHOTOELECTRIC TECHNOLOGY Co.,Ltd. |
|
TR01 | Transfer of patent right |