CN106082171A - A kind of preparation method of UV nano impression glue - Google Patents
A kind of preparation method of UV nano impression glue Download PDFInfo
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- CN106082171A CN106082171A CN201610430352.XA CN201610430352A CN106082171A CN 106082171 A CN106082171 A CN 106082171A CN 201610430352 A CN201610430352 A CN 201610430352A CN 106082171 A CN106082171 A CN 106082171A
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Abstract
The invention discloses the preparation method of a kind of UV nano impression glue, comprise the following steps: heating organic gas makes it carry out Pintsch process under an inert atmosphere, and introducing is biased to produce electric arc, so that organic gas cracks under arcing further during Pintsch process；Gas after above-mentioned steps being cracked accelerates to the flow velocity of 400 20000cc/min, and is passed through in coolant and cools down to form nano-particle.After the preparation method of the UV nano impression glue of the present invention makes organic gas carry out abundant cracking reaction by high temperature and electric arc, gas after cracking reaction is passed through in cooling liquid at a high speed, directly form nano-particle, without using catalyst and step to simplify, thus the low cost being not only able to realize UV nano impression glue quantifies to produce, and the purity of product can be greatly improved.
Description
Technical field
The invention belongs to nano material manufacturing technology field, be specifically related to the preparation method of a kind of UV nano impression glue.
Background technology
Nano material refers to that the characteristic size of material is at the following material of 100 nanometers (nm).Wherein carbon nanomaterial includes
CNT, carbon nanohorn, fullerene, carbon Bulbus Allii Cepae ball, Graphene, indefinite form carbon etc. are made up of single or multiple lift carbon atom
Nanostructured.Small physical size imparts many excellent properties of nano material beyond tradition material and is widely applied.
Yet with the restriction of preparation method, carbon nanomaterial is in addition to multi-walled carbon nano-tubes etc. is prepared in a large number, and most yield has
Limit, greatly limit the marketization application of nano material.Since fullerene and CNT are found, the system of carbon nanomaterial
Preparation Method, always based on vacuum arc method and chemical vapour deposition technique, needs catalyst mostly, and the nano material prepared is pure
Spending the highest, the purification in later stage and the removal of catalyst are difficult to and increase cost, use vacuum equipment both complexity further to increase
The cost of equipment itself, the rule of operation of chemical vapour deposition technique is loaded down with trivial details, and production efficiency is low.Problem above makes carbon nanometer material
Preparation and the application of material can only be limited to laboratory, how to break through this bottleneck and always perplex a difficult problem for scientific circles.
Summary of the invention
Goal of the invention: the present invention proposes a kind of UV nano impression glue preparation method, solves setting of existing preparation method existence
Standby complicated, cost height, preparation process is loaded down with trivial details, and the UV nano impression glue purity prepared is the highest, purify difficult problem.
Technical scheme: the preparation method of a kind of UV nano impression glue of the present invention, comprises the following steps:
S1: first prepare cobalt nitrate solution, joins in cobalt nitrate solution by chelating agent and dispersant, and magnetic agitation is to clarification
Solution；
S2: above-mentioned mixed solution is placed in drying baker and is dried, form loose porous presoma；
S3: calcine in precursor is put in Muffle furnace, be continually fed into noble gas while calcining in tube furnace and protect
Protect, and heating organic gas makes it carry out Pintsch process under an inert atmosphere, and introduce during Pintsch process and be biased to
Produce electric arc, so that organic gas cracks under arcing further；
S4: the gas after step S3 being cracked accelerates to the flow velocity of 400-20000cc/min, and is passed through in coolant cooling
To form nano-particle；
Wherein:
Described step S3 is carried out in resistance furnace, and described resistance furnace includes body of heater, resistance wire and furnace chamber, also includes as splitting
Solve the helical tube body of the reacting environment of reaction, for the gases at high pressure transmission body of transferring high voltage gas with at described spiral
The upper and lower two ends of body produce the biasing device of bias；The delivery outlet of described helical tube body and described gases at high pressure transmission body connects
To the same output mouth of pipe,
Described step S3 also includes:
S3-1) preheating step: open described resistance furnace by the preheating temperature of helical tube body to reaction temperature；Steps of exhausting:
And in described helical tube body, it is passed through noble gas to drain the air in described helical tube body；
S3-2) organic gas is together passed through described helical tube body with described noble gas, makes organic gas carry out high temperature
Cracking, and in described helical tube body, during Pintsch process, open described biasing device at organic gas；
Described step S4 includes: be passed through gases at high pressure, by the described output mouth of pipe even in described gases at high pressure transmission body
Pass in coolant, accelerate to predetermined flow velocity with the gas after utilizing described gases at high pressure step S3 to be cracked and be together passed through
In coolant.
Further, the bias size of described bias is in the range of 200～1500V.
Further, in described step S3 the reaction temperature of Pintsch process in the range of 400～1000 DEG C.
Further, described step S3-1) in, described steps of exhausting performed before described preheating step completes.
Further, described step S3-1) preheating step in, the rate of heat addition scope of described resistance furnace is 50 DEG C/min
～between 150 DEG C/min, after resistance furnace reaches described reaction temperature and is incubated 0～120 minute, it is passed through execution described aerofluxus step
Suddenly.
Further, described step S3-1) steps of exhausting in, the flow rates that is passed through of noble gas is: 10 to
1000sccm；Described step S3-2) in, what organic gas and inertia were mentioned be passed through flow rates is: 10 to 3000sccm.
Further, described gases at high pressure are nitrogen or noble gas.
Further, described coolant is liquid nitrogen or water.
Further, the flow velocity of described gases at high pressure is: 200-12000cc/min.
Beneficial effect: the preparation method of the UV nano impression glue of the present invention makes organic gas fill by high temperature and electric arc
After dividing cracking reaction, the gas after cracking reaction is passed through in cooling liquid at a high speed, directly forms nano-particle, it is not necessary to use and urge
Agent and step are simplified, thus the low cost being not only able to realize UV nano impression glue quantifies to produce, and can be greatly improved
The purity of product.
Detailed description of the invention
Below in conjunction with specific embodiment, the invention will be further described:
Embodiment 1
The preparation method of a kind of UV nano impression glue, comprises the following steps:
S1: first prepare cobalt nitrate solution, joins in cobalt nitrate solution by chelating agent and dispersant, and magnetic agitation is to clarification
Solution；
S2: above-mentioned mixed solution is placed in drying baker and is dried, form loose porous presoma；
S3: calcine in precursor is put in Muffle furnace, be continually fed into noble gas while calcining in tube furnace and protect
Protect, and heating organic gas makes it carry out Pintsch process under an inert atmosphere, and introduce during Pintsch process and be biased to
Produce electric arc, so that organic gas cracks under arcing further；
S4: the gas after step S3 being cracked accelerates to the flow velocity of 400-20000cc/min, and is passed through in coolant cooling
To form nano-particle；
Wherein:
Described step S3 is carried out in resistance furnace, and described resistance furnace includes body of heater, resistance wire and furnace chamber, also includes as splitting
Solve the helical tube body of the reacting environment of reaction, for the gases at high pressure transmission body of transferring high voltage gas with at described spiral
The upper and lower two ends of body produce the biasing device of bias；The delivery outlet of described helical tube body and described gases at high pressure transmission body connects
To the same output mouth of pipe,
Described step S3 also includes:
S3-1) preheating step: open described resistance furnace by the preheating temperature of helical tube body to reaction temperature；Steps of exhausting:
And in described helical tube body, it is passed through noble gas to drain the air in described helical tube body；
S3-2) organic gas is together passed through described helical tube body with described noble gas, makes organic gas carry out high temperature
Cracking, and in described helical tube body, during Pintsch process, open described biasing device at organic gas；
Described step S4 includes: be passed through gases at high pressure, by the described output mouth of pipe even in described gases at high pressure transmission body
Pass in coolant, accelerate to predetermined flow velocity with the gas after utilizing described gases at high pressure step S3 to be cracked and be together passed through
In coolant.
Further, the bias size of described bias is in the range of 200～1500V.
Further, in described step S3 the reaction temperature of Pintsch process in the range of 400～1000 DEG C.
Further, described step S3-1) in, described steps of exhausting performed before described preheating step completes.
Further, described step S3-1) preheating step in, the rate of heat addition scope of described resistance furnace is 50 DEG C/min
～between 150 DEG C/min, after resistance furnace reaches described reaction temperature and is incubated 0～120 minute, it is passed through execution described aerofluxus step
Suddenly.
Further, described step S3-1) steps of exhausting in, the flow rates that is passed through of noble gas is: 10 to
1000sccm；Described step S3-2) in, what organic gas and inertia were mentioned be passed through flow rates is: 10 to 3000sccm.
Further, described gases at high pressure are nitrogen or noble gas.
Further, described coolant is liquid nitrogen or water.
Further, the flow velocity of described gases at high pressure is: 200-12000cc/min.
The preparation method of the UV nano impression glue of the present invention makes organic gas fully crack instead by high temperature and electric arc
Ying Hou, is passed through the gas after cracking reaction in cooling liquid at a high speed, directly forms nano-particle, it is not necessary to use catalyst and step
Suddenly simplify, thus the low cost being not only able to realize UV nano impression glue quantifies to produce, and the pure of product can be greatly improved
Degree.
The above, be only presently preferred embodiments of the present invention, and the present invention not makees any pro forma restriction, though
So the present invention is disclosed above with preferred embodiment, but is not limited to the present invention, any technology people being familiar with this specialty
Member, in the range of without departing from technical solution of the present invention, when the technology contents of available the disclosure above makes a little change or modification
For the Equivalent embodiments of equivalent variations, as long as being the content without departing from technical solution of the present invention, the technical spirit of the foundation present invention
Any simple modification, equivalent variations and the modification being made above example, all still falls within the range of technical solution of the present invention.
Claims (9)
1. the preparation method of a UV nano impression glue, it is characterised in that comprise the following steps:
S1: first prepare cobalt nitrate solution, joins in cobalt nitrate solution by chelating agent and dispersant, and magnetic agitation is molten to clarifying
Liquid；
S2: above-mentioned mixed solution is placed in drying baker and is dried, form loose porous presoma；
S3: calcine in precursor is put in Muffle furnace, be continually fed into noble gas while calcining in tube furnace and protect, and
Heating organic gas makes it carry out Pintsch process under an inert atmosphere, and introducing is biased to produce electricity during Pintsch process
Arc, so that organic gas cracks under arcing further；
S4: the gas after step S3 being cracked accelerates to the flow velocity of 400-20000cc/min, and is passed through in coolant and cools down with shape
Become nano-particle；
Wherein:
Described step S3 is carried out in resistance furnace, and described resistance furnace includes body of heater, resistance wire and furnace chamber, also includes as cracking anti-
The helical tube body of the reacting environment answered, gases at high pressure for transferring high voltage gas transmit body and at described helical tube body
Two ends produce the biasing device of bias up and down；The delivery outlet of described helical tube body and described gases at high pressure transmission body is connected to
The one output mouth of pipe,
Described step S3 also includes:
S3-1) preheating step: open described resistance furnace by the preheating temperature of helical tube body to reaction temperature；Steps of exhausting: and to
Described helical tube body is passed through noble gas to drain the air in described helical tube body；
S3-2) organic gas is together passed through described helical tube body with described noble gas, makes organic gas carry out Pintsch process,
And in described helical tube body, during Pintsch process, open described biasing device at organic gas；
Described step S4 includes: is passed through gases at high pressure in described gases at high pressure transmission body, is communicated to by the described output mouth of pipe
In coolant, accelerate to predetermined flow velocity with the gas after utilizing described gases at high pressure step S3 to be cracked and be together passed through cooling
In liquid.
The preparation method of UV nano impression glue the most according to claim 1, it is characterised in that: the bias size of described bias
In the range of 200～1500V.
The preparation method of UV nano impression glue the most according to claim 1, it is characterised in that: high anneal crack in described step S3
The reaction temperature solved is in the range of 400～1000 DEG C.
The preparation method of UV nano impression glue the most according to claim 1, it is characterised in that: described step S3-1) in, institute
State steps of exhausting to perform before described preheating step completes.
The preparation method of UV nano impression glue the most according to claim 4, it is characterised in that: described step S3-1) pre-
In hot step, the rate of heat addition scope of described resistance furnace is 50 DEG C/min～between 150 DEG C/min, resistance furnace reach described instead
The described steps of exhausting of execution it is passed through after answering temperature and being incubated 0～120 minute.
The preparation method of UV nano impression glue the most according to claim 1, it is characterised in that: described step S3-1) row
During jia bombardier is rapid, the flow rates that is passed through of noble gas is: 10 to 1000sccm；Described step S3-2) in, organic gas and inertia
The flow rates that is passed through mentioned is: 10 to 3000sccm.
The preparation method of UV nano impression glue the most according to claim 1, it is characterised in that: described gases at high pressure are nitrogen
Or noble gas.
The preparation method of UV nano impression glue the most according to claim 1, it is characterised in that: described coolant be liquid nitrogen or
Water.
The preparation method of UV nano impression glue the most according to claim 1, it is characterised in that: the flow velocity of described gases at high pressure
For: 200-12000cc/min.
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| CN103101901A (en) * | 2013-01-28 | 2013-05-15 | 深圳青铜剑电力电子科技有限公司 | Preparation method of nano material |
| CN103241726A (en) * | 2013-05-09 | 2013-08-14 | 广州大学 | Method for preparing nano conductive carbon by cracking organic compound through hybrid plasma technology |
| CN104656374A (en) * | 2015-03-16 | 2015-05-27 | 河海大学常州校区 | Nanoimprint glue and preparation method thereof |
| CN105295795A (en) * | 2015-11-11 | 2016-02-03 | 无锡英普林纳米科技有限公司 | Antistatic nano rubber solution |
| CN105328202A (en) * | 2014-08-13 | 2016-02-17 | 南京理工大学 | Preparation method of cobalt nano material |
-
2016
- 2016-06-17 CN CN201610430352.XA patent/CN106082171A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103101901A (en) * | 2013-01-28 | 2013-05-15 | 深圳青铜剑电力电子科技有限公司 | Preparation method of nano material |
| CN103241726A (en) * | 2013-05-09 | 2013-08-14 | 广州大学 | Method for preparing nano conductive carbon by cracking organic compound through hybrid plasma technology |
| CN105328202A (en) * | 2014-08-13 | 2016-02-17 | 南京理工大学 | Preparation method of cobalt nano material |
| CN104656374A (en) * | 2015-03-16 | 2015-05-27 | 河海大学常州校区 | Nanoimprint glue and preparation method thereof |
| CN105295795A (en) * | 2015-11-11 | 2016-02-03 | 无锡英普林纳米科技有限公司 | Antistatic nano rubber solution |
Non-Patent Citations (3)
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| 林宏: "新型紫外纳米压印光刻胶的研究", 《中国博士学位论文全文数据库 工程科技Ⅰ辑》 * |
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Application publication date: 20161109 |