CN106064241B - A kind of preparation method of internal diameter controllable foam metal - Google Patents
A kind of preparation method of internal diameter controllable foam metal Download PDFInfo
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- CN106064241B CN106064241B CN201610541602.7A CN201610541602A CN106064241B CN 106064241 B CN106064241 B CN 106064241B CN 201610541602 A CN201610541602 A CN 201610541602A CN 106064241 B CN106064241 B CN 106064241B
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- 229910052751 metal Inorganic materials 0.000 title claims abstract description 37
- 239000002184 metal Substances 0.000 title claims abstract description 37
- 239000006260 foam Substances 0.000 title claims abstract description 14
- 238000002360 preparation method Methods 0.000 title claims abstract description 10
- 239000000758 substrate Substances 0.000 claims abstract description 36
- 238000000034 method Methods 0.000 claims abstract description 27
- 238000007747 plating Methods 0.000 claims abstract description 20
- 239000000126 substance Substances 0.000 claims abstract description 14
- 238000007788 roughening Methods 0.000 claims abstract description 13
- 238000005245 sintering Methods 0.000 claims abstract description 11
- 238000001994 activation Methods 0.000 claims abstract description 6
- 239000011858 nanopowder Substances 0.000 claims abstract description 6
- 230000004913 activation Effects 0.000 claims abstract description 5
- 238000000137 annealing Methods 0.000 claims abstract description 5
- 230000001681 protective effect Effects 0.000 claims abstract description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 24
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 24
- 239000008367 deionised water Substances 0.000 claims description 20
- 229910021641 deionized water Inorganic materials 0.000 claims description 20
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 14
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 8
- 230000003213 activating effect Effects 0.000 claims description 8
- 239000003795 chemical substances by application Substances 0.000 claims description 5
- 239000000377 silicon dioxide Substances 0.000 claims description 5
- 235000011114 ammonium hydroxide Nutrition 0.000 claims description 4
- 239000002274 desiccant Substances 0.000 claims description 4
- 238000001035 drying Methods 0.000 claims description 4
- 239000008236 heating water Substances 0.000 claims description 4
- 239000000741 silica gel Substances 0.000 claims description 4
- 229910002027 silica gel Inorganic materials 0.000 claims description 4
- 229960001866 silicon dioxide Drugs 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 238000003756 stirring Methods 0.000 claims description 2
- 238000002156 mixing Methods 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 4
- 239000002245 particle Substances 0.000 abstract description 4
- 239000007769 metal material Substances 0.000 abstract description 3
- 238000001914 filtration Methods 0.000 abstract description 2
- 239000007777 multifunctional material Substances 0.000 abstract description 2
- 238000004140 cleaning Methods 0.000 abstract 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 16
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 14
- 238000005516 engineering process Methods 0.000 description 7
- 229910052742 iron Inorganic materials 0.000 description 7
- 229910052759 nickel Inorganic materials 0.000 description 6
- 239000011133 lead Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 3
- 238000004062 sedimentation Methods 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 241000790917 Dioxys <bee> Species 0.000 description 1
- 229910003978 SiClx Inorganic materials 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000013016 damping Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002082 metal nanoparticle Substances 0.000 description 1
- 239000013528 metallic particle Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000013265 porous functional material Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/10—Sintering only
- B22F3/11—Making porous workpieces or articles
- B22F3/1103—Making porous workpieces or articles with particular physical characteristics
- B22F3/1112—Making porous workpieces or articles with particular physical characteristics comprising hollow spheres or hollow fibres
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/16—Making metallic powder or suspensions thereof using chemical processes
- B22F9/18—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds
- B22F9/24—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds starting from liquid metal compounds, e.g. solutions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1851—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
- C23C18/1872—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
- C23C18/1886—Multistep pretreatment
- C23C18/1893—Multistep pretreatment with use of organic or inorganic compounds other than metals, first
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Chemically Coating (AREA)
- Powder Metallurgy (AREA)
Abstract
A kind of preparation method of internal diameter controllable foam metal, belong to new structure preparation field integrated with functional material.It has main steps that：(1) pretreating process：Cleaning, roughening and activation substrate；(2) chemical plating process；(3) hollow ball is prepared：The sample that chemical plating is obtained is placed in strong base solution, removes substrate, obtains hollow metal sphere；Cleaning, filtering, fluid-tight preserve；(4) sintering process：Metal nano powder is replaced into laying with hollow metal sphere, dries, vacuumizes, leads to protective gas, 1,200 1600 DEG C of sintering temperature, the 6h of annealing time 2；Hollow metal sphere and metal nano powder mass ratio are 5% 30%.This method prepares the different hollow metal sphere of internal diameter by controlling coarsening time to obtain the different substrate grain of particle diameter.This technique has the advantages that simple, convenient, economic and spherical shell internal diameter is controllable, foam metal material or gradient multifunctional material particularly useful for making different inner diameters.
Description
Technical field
The invention belongs to new structure preparation field integrated with functional material, roughening when being related to substrate control, activation process,
Chemical plating process and technology is removed, to obtain the hollow metal sphere of different inner diameters, then through cold-rolled sintered block is made, more particularly to
Foam metal or gradient porous functional material, it is various suitable for heat-insulated, electrode, catalysis, damping, electromagnetic shielding and biomedicine etc.
High-technology field.
Background technology
Foam metal is a kind of structure-function integration material being widely studied, and has good physical and chemical performance,
As density is small, specific surface area is big, material fine structure designability and optimization property are good.Its hole by the closed hole in ball and
Gap between spheroid is formed, and this unique texture makes it have excellent mechanics, receives, exchanges and the performance such as compound.It is extensive
Applied to the various high-technology fields such as space flight, aviation, environmental protection, the energy and biological medicine.
At present, preparing the method for foam metal has casting, foaming, sintering process and sedimentation.Wherein, first three technique
The foam metal of preparation, there is the shortcomings of distribution of pores and size are uneven, and mechanical property does not protrude and discreteness is big；Sedimentation
In electrochemical process, because substrate is confined to conductive material, and limited by limiting current density, thus deposition velocity compared with
Slowly, low production efficiency, cost are higher.However, chemical plating process not only can on the metallic substrate (iron, stainless steel, aluminium, copper etc.)
Can also on nonmetallic substrate (ceramics, glass, diamond, carbon plate, plastics, resin etc.) deposited metal layer (such as nickel, iron, copper,
Gold, lead etc.).Without additional power source, in the absence of the uneven influence of electric force lines distribution, the coating of deposition uniformly, fine and close, hole
Less, hardness is high, has fabulous physical and chemical properties.
Roughening treatment, chemical plating process and substrate during control are removed technology and combined by the present invention, and it is controllable to obtain internal diameter
Metal hollow ball monomer.Then single body hollow ball is mixed with corresponding metal nanoparticle, cold-rolled sintered shaping obtains foam
Metal blocks.First, by controlling different coarsening times, different-grain diameter particle shape substrate (such as silica-gel desiccant, dioxy are obtained
SiClx, silicon)；Secondly, metal level is prepared on non-metallic particle substrate using chemical plating；Finally lining is removed using strong base solution
Bottom, obtain the metal ball of hollow structure.Substrate size (i.e. metal ball internal diameter) is determined that shell thickness is by chemical plating by coarsening time
Sedimentation time determine.So this technique has the advantages that simple, convenient, economic and spherical shell internal diameter is controllable, it is particularly suitable
In the foam metal material for preparing different inner diameters.
The content of the invention
It is an object of the invention to provide it is a kind of will control when roughening treatment, chemical plating, substrate remove technology and cold-rolled sintered
Combine, the technique for obtaining foam metal block.And it is set to be applied to various high-technology fields.
Technical scheme：
A kind of preparation method of internal diameter controllable foam metal, step are as follows：
(1) pretreating process
A. substrate is cleaned with acetone, ethanol and deionized water successively, filters and dry；Described substrate is silica dehydrator
Agent, silica or silicon；
B. substrate distinguishes heating water bath to 50 DEG C with roughening agent, is mixed, 50 DEG C of keeping temperature, coarsening time 1-
5min；After end, cleaned with deionized water, ammoniacal liquor neutralize, cleaned again with deionized water, filter and dry；
C. in roughening substrate activating solution addition step B obtained, soak time 5-10min, stir to it uniformly, filtering
And dry, obtain activating substrate；
(2) chemical plating process
D. plating solution is put into thermostat water bath, is heated to required temperature；The activation substrate that step C is obtained is placed in plating solution
Middle 1-7min, then cleaned repeatedly with ethanol solution with deionized water, filter simultaneously low temperature drying, in order to prevent from heating up
It hurry up, temperature is too high and causes film separation；
(3) hollow ball is prepared
E. the obtained samples of step D are placed in strong base solution, remove substrate, obtain hollow metal sphere；By hollow metal
Ball is cleaned, filtered repeatedly with deionized water with ethanol solution, and fluid-tight preserves；
(4) sintering process
F. metal nano powder is replaced into laying with hollow metal sphere, dries, vacuumize, lead to protective gas, sintering temperature
1200-1600 DEG C, annealing time 2-6h；Hollow metal sphere and metal nano powder mass ratio are 5%-30%.
Beneficial effects of the present invention：Can be by controlling coarsening time to obtain the different substrate grain of particle diameter and then in preparation
The different hollow metal sphere in footpath, without buying the particle substrate of different-grain diameter.This technique have it is simple, convenient, economical and
The advantages that spherical shell internal diameter is controllable, foam metal material or gradient multifunctional material particularly useful for making different inner diameters.
Embodiment
Below in conjunction with technical scheme, embodiment of the invention is further illustrated.
Embodiment 1：
(1) pretreating process
A. silica-gel desiccant is cleaned with acetone, ethanol and deionized water successively, filters and dry；
B. silica-gel desiccant and roughening agent are distinguished heating water bath to 50 DEG C, are mixed, 50 DEG C of keeping temperature, during roughening
Between 3min；After end, cleaned with deionized water, ammoniacal liquor neutralize, cleaned again with deionized water, filter and dry；
C. in roughening substrate activating solution addition step B obtained, soak time 5min, it is stirred until homogeneous, filters and dry
It is dry, obtain activating substrate；
(2) chemical plating process
D. nickel-plating liquid is put into thermostat water bath, is heated to 88-92 DEG C；The activation substrate that step C is obtained is placed in plating
3min in nickel liquid, then cleaned repeatedly with ethanol solution with deionized water, filter simultaneously low temperature drying, in order to prevent from heating up
It hurry up, temperature is too high and causes film separation；
(3) hollow ball is prepared
E. the obtained samples of step D are placed in strong base solution, remove substrate, obtain hollow nickel sphere；Hollow nickel sphere is used
Deionized water is cleaned, filtered repeatedly with ethanol solution, and fluid-tight preserves；
(4) sintering process
F. nano-nickel powder is replaced into laying with hollow nickel sphere, dries, vacuumize, lead to nitrogen, 1300 DEG C of sintering temperature, annealing
Time 5h；Hollow nickel sphere is 15% with nano-nickel powder mass ratio.
Embodiment 2：
(1) pretreating process
A. silica is cleaned with acetone, ethanol and deionized water successively, filters and dry；
B. silica and roughening agent are distinguished heating water bath to 50 DEG C, are mixed, 50 DEG C of keeping temperature, coarsening time
4min；After end, cleaned with deionized water, ammoniacal liquor neutralize, cleaned again with deionized water, filter and dry；
C. in roughening substrate activating solution addition step B obtained, soak time 8min, it is stirred until homogeneous, filters and dry
It is dry, obtain activating substrate；
(2) chemical plating process
D. iron plating liquid is put into thermostat water bath, is heated to 48-52 DEG C；The activation substrate that step C is obtained is placed in plating
5min in iron liquid, then cleaned repeatedly with ethanol solution with deionized water, filter simultaneously low temperature drying, in order to prevent from heating up
It hurry up, temperature is too high and causes film separation；
(3) hollow ball is prepared
E. the obtained samples of step D are placed in strong base solution, remove substrate, obtain hollow iron ball；With deionized water with
Ethanol solution is cleaned, filtered repeatedly, and fluid-tight preserves；
(4) sintering process
F. nanometer iron powder is replaced into laying with hollow iron ball, dries, vacuumize, lead to argon gas, 1400 DEG C of sintering temperature, annealing
Time 6h；Hollow iron ball is 20% with nanometer iron powder mass ratio.
Claims (2)
1. a kind of preparation method of internal diameter controllable foam metal, it is characterised in that step is as follows：
(1) pretreating process
A. substrate is cleaned with acetone, ethanol and deionized water successively, filters and dry；
B. substrate distinguishes heating water bath to 50 DEG C with roughening agent, mixing, 50 DEG C of keeping temperature, coarsening time 1-5min；After end,
Cleaned with deionized water, ammoniacal liquor neutralize, cleaned again with deionized water, filter and dry；
C. in roughening substrate activating solution addition step B obtained, soak time 5-10min, stir to it uniformly, filter and dry
It is dry, obtain activating substrate；
(2) chemical plating process
D. plating solution is put into thermostat water bath, is heated to required temperature；The activation substrate that step C is obtained is placed in 1- in plating solution
7min, then cleaned repeatedly with ethanol solution with deionized water, filter simultaneously low temperature drying；
(3) hollow metal sphere is prepared
E. the obtained samples of step D are placed in strong base solution, remove substrate, obtain hollow metal sphere；Hollow metal sphere is used
Deionized water is cleaned, filtered repeatedly with ethanol solution, and fluid-tight preserves；
(4) sintering process
F. metal nano powder is replaced into laying with hollow metal sphere, dries, vacuumize, lead to protective gas, sintering temperature 1200-
1600 DEG C, annealing time 2-6h；Wherein, hollow metal sphere and metal nano powder mass ratio are 5%-30%.
2. preparation method according to claim 1, it is characterised in that described substrate is silica-gel desiccant, silica
Or silicon.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610541602.7A CN106064241B (en) | 2016-07-09 | 2016-07-09 | A kind of preparation method of internal diameter controllable foam metal |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610541602.7A CN106064241B (en) | 2016-07-09 | 2016-07-09 | A kind of preparation method of internal diameter controllable foam metal |
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| CN106064241A CN106064241A (en) | 2016-11-02 |
| CN106064241B true CN106064241B (en) | 2017-11-10 |
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| CN107052341B (en) * | 2017-01-23 | 2018-10-16 | 郭荞毓 | A kind of continuous preparation process of advanced pore morphology foamed aluminium bead |
| CN109989049B (en) * | 2019-04-17 | 2021-02-09 | 中国工程物理研究院激光聚变研究中心 | Porous metal material with closed pore structure and preparation method thereof |
| CN110000375B (en) * | 2019-04-17 | 2021-04-09 | 中国工程物理研究院激光聚变研究中心 | Ultrahigh-porosity porous metal material and preparation method thereof |
| CN111842854B (en) * | 2020-07-08 | 2021-11-16 | 鞍钢股份有限公司 | Method and device for manufacturing heterogeneous hollow ball foam steel |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4957543A (en) * | 1989-06-16 | 1990-09-18 | Inco Limited | Method of forming nickel foam |
| JPH07118713A (en) * | 1993-10-22 | 1995-05-09 | Katayama Tokushu Kogyo Kk | Superfine metal granular powder, metallic porous body formed with the powder and production of the powder and metallic porous body |
| JPH09143509A (en) * | 1995-11-16 | 1997-06-03 | Hitachi Chem Co Ltd | Production of foam |
| CN1392293A (en) * | 2001-06-14 | 2003-01-22 | 长沙力元新材料股份有限公司 | Foam iron alloy material, foam iron base composite material and their preparing method |
| CN101043077A (en) * | 2006-03-24 | 2007-09-26 | 中国科学院大连化学物理研究所 | Application of polyporous material in sodium polysulfide/bromine accumulation energy power cell electric pole |
| CN101445883B (en) * | 2008-12-30 | 2010-06-09 | 浙江工贸职业技术学院 | Porous foam metal preparation method |
| CN101798222A (en) * | 2010-03-02 | 2010-08-11 | 中国地质大学（北京） | Al2O3-Ni-C-B4C composite ceramic and preparation method thereof |
| JP6331437B2 (en) * | 2014-02-07 | 2018-05-30 | 株式会社村田製作所 | Method for producing porous metal body |
| CN104607640A (en) * | 2014-12-10 | 2015-05-13 | 周宏� | Method for preparing block foam metal through seed-growth method |
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